JPH0583965B2 - - Google Patents
Info
- Publication number
- JPH0583965B2 JPH0583965B2 JP57143459A JP14345982A JPH0583965B2 JP H0583965 B2 JPH0583965 B2 JP H0583965B2 JP 57143459 A JP57143459 A JP 57143459A JP 14345982 A JP14345982 A JP 14345982A JP H0583965 B2 JPH0583965 B2 JP H0583965B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- magnetic material
- layer
- thin film
- soft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000696 magnetic material Substances 0.000 claims description 31
- 239000010409 thin film Substances 0.000 claims description 17
- 230000005415 magnetization Effects 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 2
- 230000001939 inductive effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 24
- 230000005381 magnetic domain Effects 0.000 description 9
- 239000010408 film Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/3113—Details for improving the magnetic domain structure or avoiding the formation or displacement of undesirable magnetic domains
Description
【発明の詳細な説明】 (1) 従来の技術 本発明は薄膜磁気ヘツドの磁極に関する。[Detailed description of the invention] (1) Conventional technology The present invention relates to magnetic poles for thin film magnetic heads.
(2) 技術の背景
薄膜磁気ヘツドの磁極は、磁気記録媒体の高記
録密度化に伴なつて、コア幅すなわち磁極先端の
幅が徐々に小さくなつてきている。一般にコア幅
が減少すると、形状磁気異方性が増大するので、
所望の異方性、すなわちコア幅方向の異方性を付
与することが困難となる。(2) Background of the Technology The core width of the magnetic pole of a thin-film magnetic head, that is, the width of the tip of the magnetic pole, is gradually decreasing as the recording density of magnetic recording media increases. Generally, as the core width decreases, the shape magnetic anisotropy increases, so
It becomes difficult to provide desired anisotropy, that is, anisotropy in the core width direction.
(3) 従来技術と問題点
従来、薄膜磁気ヘツドの磁極としては、軟磁性
材料の単層膜、または非磁性材料層をはさんで積
層した軟磁性材料の多層膜が使用されている。磁
極が多層であつても単層であつても、軟磁性材料
層１には、第１図に示すように磁区２が分布し、
先端部においては、コア端面に向かう方向に磁化
された磁区が、端面に沿う方向に磁化された磁区
よりはるかに大きい。(3) Prior Art and Problems Conventionally, as the magnetic pole of a thin-film magnetic head, a single-layer film of soft magnetic material or a multilayer film of soft magnetic material laminated with layers of non-magnetic material sandwiched therebetween has been used. Regardless of whether the magnetic pole is multi-layered or single-layered, magnetic domains 2 are distributed in the soft magnetic material layer 1 as shown in FIG.
At the tip, the magnetic domain magnetized in the direction toward the core end face is much larger than the magnetic domain magnetized in the direction along the end face.
このような磁区分布を有する磁極が、端面にお
いて、磁気記録媒体に近づいて、コア幅に垂直な
方向の磁化の変化を受けるときは、磁区間の磁壁
が移動して垂直方向の磁区が拡大され、磁極は全
体としてコア幅に垂直な方向に磁化される。しか
し、このような磁壁の移動にもとづく磁化方向の
変化は、１つの磁区内のスピンの回転による磁化
方向の変化より遅いので、高速度処理にはまた硬
質磁性材料として、永久磁石片を使用する場合
は、微細形状の形成や、バイアス磁界の調整が困
難である。 When a magnetic pole with such a magnetic domain distribution approaches the magnetic recording medium at its end face and undergoes a change in magnetization in a direction perpendicular to the core width, the domain wall of the magnetic interval moves and the vertical domain expands. , the magnetic poles are generally magnetized in a direction perpendicular to the core width. However, since the change in magnetization direction due to the movement of domain walls is slower than the change in magnetization direction due to the rotation of spins within one magnetic domain, permanent magnet pieces are also used as hard magnetic materials for high-speed processing. In this case, it is difficult to form fine shapes and adjust the bias magnetic field.
(4) 発明の目的
本発明の目的は上記欠点を解消することであ
る。(4) Object of the invention The object of the invention is to eliminate the above-mentioned drawbacks.
(5) 発明の構成
本発明の上記目的は、少なくとも１層以上の薄
膜磁極と記録再生用導体コイルを有するインダク
テイブ型薄膜磁気ヘツドにおいて、１層または複
数層の軟磁性材料層に少なくとも１層の硬磁性材
料層を積層し、硬磁性材料をコア幅方向に硬化し
ておき、この磁化方向によつて、誘導磁気異方性
を軟磁性材料に付与したことを特徴とする、薄膜
磁気ヘツドの磁極によつて達成される。ここで言
う薄膜の軟磁性層または硬磁性層は、その場で形
成した磁性薄膜であつて、たとえば真空成膜特に
スパツタ成膜によつて形成することが便宜であ
る。(5) Structure of the Invention The above-mentioned object of the present invention is to provide an inductive thin-film magnetic head having at least one layer of thin-film magnetic poles and a recording/reproducing conductor coil, in which at least one layer of soft magnetic material is added to one or more soft magnetic material layers. A thin film magnetic head characterized in that hard magnetic material layers are laminated, the hard magnetic material is hardened in the core width direction, and induced magnetic anisotropy is imparted to the soft magnetic material by the magnetization direction. This is accomplished by magnetic poles. The thin-film soft magnetic layer or hard magnetic layer referred to herein is a magnetic thin film formed in situ, and is conveniently formed, for example, by vacuum deposition, particularly sputter deposition.
(6) 実施例
第２図は本発明の薄膜磁気ヘツドの１つの実施
態様を示すものであつて、磁極１は、基板３の上
に軟磁性材料層４を形成する前に、硬磁性材料層
５としてγ−Fe2O3を磁場中でスパツタリングし
て厚み約1μｍに形成し、その上に軟磁性材料層
４としてパーマロイをスパツタリングして厚み約
3μｍに形成して下部磁性材料とした。絶縁膜６
として二酸化ケイ素をスパツタリング法によつ
て、厚み約1μｍに成長させた上に、下部磁性材
料とは逆の順で軟磁性材料層４および硬磁性材料
層５を絶縁層６の上に形成した。この場合に、磁
極１を形成する硬磁性材料層５は、第３Ａ図に示
すように、コア幅の方向に磁化しておく。硬磁性
材料層５と密着する軟磁性材料層４は、第３Ｂ図
に示すように、磁極の先端部において、コア幅の
方向に磁化された磁区２は先端部の大部を占め
る。(6) Embodiment FIG. 2 shows one embodiment of the thin film magnetic head of the present invention, in which the magnetic pole 1 is made of a hard magnetic material before forming the soft magnetic material layer 4 on the substrate 3. Layer 5 is formed by sputtering γ-Fe 2 O 3 in a magnetic field to a thickness of about 1 μm, and on top of that, permalloy is sputtered to form a soft magnetic material layer 4 to a thickness of about 1 μm.
The lower magnetic material was formed to have a thickness of 3 μm. Insulating film 6
Silicon dioxide was grown to a thickness of about 1 μm by sputtering, and a soft magnetic material layer 4 and a hard magnetic material layer 5 were formed on the insulating layer 6 in the reverse order of the lower magnetic material. In this case, the hard magnetic material layer 5 forming the magnetic pole 1 is magnetized in the direction of the core width, as shown in FIG. 3A. In the soft magnetic material layer 4 that is in close contact with the hard magnetic material layer 5, as shown in FIG. 3B, at the tip of the magnetic pole, the magnetic domain 2 magnetized in the direction of the core width occupies most of the tip.
(7) 発明の効果
本発明の薄膜磁気ヘツドの磁極は、従来の軟磁
性材料のみからなる磁極と比べて、その磁化反転
速度は増加し、記録の高速転送が可能となる。(7) Effects of the Invention The magnetic pole of the thin-film magnetic head of the present invention has an increased magnetization reversal speed compared to a conventional magnetic pole made only of soft magnetic material, thereby enabling high-speed recording transfer.
第１図は従来の薄膜磁気ヘツドの磁極の軟磁性
材料層の磁区を例示する平面図であり、第２図は
本発明の薄膜磁気ヘツドの磁極先端部の構造を示
す斜視図である。第３Ａ図は本発明の薄膜磁気ヘ
ツドの磁極の硬磁性材料層の磁化方向を示す平面
図であり、第３Ｂ図は本発明の薄膜磁気ヘツドの
磁極の硬磁性材料層に積層した軟磁性材料層の磁
区を例示する平面図である。
１……磁極、２……磁区、３……基板、４……
軟磁性材料層、５……硬磁性材料層、６……絶縁
層、７……コイル。
FIG. 1 is a plan view illustrating the magnetic domains of the soft magnetic material layer of the magnetic pole of a conventional thin film magnetic head, and FIG. 2 is a perspective view showing the structure of the tip of the magnetic pole of the thin film magnetic head of the present invention. FIG. 3A is a plan view showing the magnetization direction of the hard magnetic material layer of the magnetic pole of the thin film magnetic head of the present invention, and FIG. 3B is a soft magnetic material laminated on the hard magnetic material layer of the magnetic pole of the thin film magnetic head of the present invention. FIG. 3 is a plan view illustrating magnetic domains of a layer. 1... Magnetic pole, 2... Magnetic domain, 3... Substrate, 4...
Soft magnetic material layer, 5... Hard magnetic material layer, 6... Insulating layer, 7... Coil.
Claims (1)
導体コイルを有するインダクテイブ型薄膜磁気ヘ
ツドにおいて、 １層または複数層の軟磁性材料層に少なくとも
１層の硬磁性材料層を積層し、硬磁性材料をコア
幅方向に磁化しておき、この磁化方向によつて誘
導磁気異方性を軟磁性材料に付与したことを特徴
とする、薄膜磁気ヘツドの磁極。[Claims] 1. In an inductive thin film magnetic head having at least one layer of thin film magnetic poles and a recording/reproducing conductor coil, at least one hard magnetic material layer is laminated on one or more soft magnetic material layers. A magnetic pole of a thin film magnetic head, characterized in that a hard magnetic material is magnetized in the core width direction, and induced magnetic anisotropy is imparted to the soft magnetic material by the magnetization direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14345982A JPS5933613A (en) | 1982-08-20 | 1982-08-20 | Magnetic pole of thin film magnetic head and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14345982A JPS5933613A (en) | 1982-08-20 | 1982-08-20 | Magnetic pole of thin film magnetic head and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5933613A JPS5933613A (en) | 1984-02-23 |
| JPH0583965B2 true JPH0583965B2 (en) | 1993-11-30 |
Family
ID=15339192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14345982A Granted JPS5933613A (en) | 1982-08-20 | 1982-08-20 | Magnetic pole of thin film magnetic head and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5933613A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61275341A (en) * | 1985-05-31 | 1986-12-05 | Denki Kagaku Kogyo Kk | Thermoplastic resin composition |
| US5108837A (en) * | 1987-12-04 | 1992-04-28 | Digital Equipment Corporation | Laminated poles for recording heads |
| JPH062875B2 (en) * | 1990-11-28 | 1994-01-12 | 旭化成工業株式会社 | Polyphenylene ether resin composition |
| EP0580027A2 (en) * | 1992-07-20 | 1994-01-26 | Read-Rite Corporation | Thin film magnetic head |
| WO1995014991A1 (en) * | 1993-11-23 | 1995-06-01 | Seagate Technology, Inc. | Thin film magnetic heads with thin nickel underlayers |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410997A (en) * | 1977-06-24 | 1979-01-26 | Ibm | Magnetic thin film structure |
| JPS5539536B2 (en) * | 1977-08-05 | 1980-10-13 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5853696Y2 (en) * | 1978-09-01 | 1983-12-06 | 日本電気株式会社 | thin film magnetic head |
-
1982
- 1982-08-20 JP JP14345982A patent/JPS5933613A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410997A (en) * | 1977-06-24 | 1979-01-26 | Ibm | Magnetic thin film structure |
| JPS5539536B2 (en) * | 1977-08-05 | 1980-10-13 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5933613A (en) | 1984-02-23 |
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