JPH0575109B2 - - Google Patents
Info
- Publication number
- JPH0575109B2 JPH0575109B2 JP13143387A JP13143387A JPH0575109B2 JP H0575109 B2 JPH0575109 B2 JP H0575109B2 JP 13143387 A JP13143387 A JP 13143387A JP 13143387 A JP13143387 A JP 13143387A JP H0575109 B2 JPH0575109 B2 JP H0575109B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- shielding
- release layer
- shielding release
- fluorescent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000126 substance Substances 0.000 claims description 30
- 230000000873 masking effect Effects 0.000 claims description 18
- 239000002985 plastic film Substances 0.000 claims description 4
- 229920006255 plastic film Polymers 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- -1 polyethylene terephthalate Polymers 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- ZYGHJZDHTFUPRJ-UHFFFAOYSA-N coumarin Chemical compound C1=CC=C2OC(=O)C=CC2=C1 ZYGHJZDHTFUPRJ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007850 fluorescent dye Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- KKAJSJJFBSOMGS-UHFFFAOYSA-N 3,6-diamino-10-methylacridinium chloride Chemical compound [Cl-].C1=C(N)C=C2[N+](C)=C(C=C(N)C=C3)C3=CC2=C1 KKAJSJJFBSOMGS-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- JPIYZTWMUGTEHX-UHFFFAOYSA-N auramine O free base Chemical compound C1=CC(N(C)C)=CC=C1C(=N)C1=CC=C(N(C)C)C=C1 JPIYZTWMUGTEHX-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229960000956 coumarin Drugs 0.000 description 1
- 235000001671 coumarin Nutrition 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920005596 polymer binder Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
Description
〔技術分野〕
本発明は、主として写真製版において所要部分
をカツテイングし、透明画像を形成するために用
いられる遮光性マスキングフイルムに関するもの
である。
〔従来技術〕
従来、プラスチツク支持体上に遮光性剥離層を
設けた遮光性マスキングフイルムは知られてい
る。このものは、写真製版等の分野において、所
望の透明画像を得るために、その遮光性剥離層
に、人手又は機械によりカツトラインを施し、そ
してこのカツトラインに応じて遮光性剥離層を剥
離させる。
ところで、カツトラインに応じて遮光性剥離層
を剥離させる場合、そのカツトラインは鋭利刃に
よつて形成された極めて細い線であるため、非常
に見ずらいといつた難点があり、そのため剥離作
業に多大の困難を生じていた。
〔目的〕
本発明は、遮光性剥離層に施したカツトライン
が明瞭に目視識別し得る遮光性マスキングフイル
ムを提供することを目的とする。
〔構成〕
本発明によれば、第１の発明として、プラスチ
ツクフイルム支持体上に遮光性剥離層を設けたも
のにおいて、該遮光性剥離層に蛍光性物質を含有
させ、該遮光性剥離層に形成したカツトラインが
蛍光を生じることを特徴とする遮光性マスキング
フイルムが提供され、第２の発明として、プラス
チツクフイルム支持体上に遮光性剥離層を設けた
ものにおいて、該遮光性剥離層の上面又は下面に
蛍光性物質を含むオーバーコート層又はアンダー
コート層を設け、該遮光性剥離層に形成したカツ
トラインが蛍光を生じることを特徴とする遮光性
マスキングフイルムが提供される。
本発明においては、カツトラインに蛍光色を生
じさせ、目視識別しやすいように、蛍光性物質を
遮光性剥離層に含有させる。この場合、蛍光性物
質としては、通常、可視光ないし、紫外光を吸収
し、可視光波長の蛍光を発生するもの、好ましく
は可視光中の紫、青、緑等の光線を受けてそれよ
り長い波長の蛍光を発生するものが用いられる。
このような蛍光性物質は従来よく知られており、
一般には、蛍光染料、蛍光顔料が用いられる。例
えば、ウラニン系、エオシン系、ローダミン系、
チオフラビン系、トリパフラビン系、オーラミン
系、クマリン系等の有機系のものが用いられる
が、場合によつては、無機系のものも用いること
ができる。また、これらの蛍光性物質は、通常、
微粉末状、ペースト状等で用いられる。
本発明において、蛍光性物質は、従来用いらて
れる遮光性剥離層に含有させることができる。マ
スキングフイルムにおける遮光性剥離層は、マス
キングフイルムと共に使用される感光性フイルム
等の感光する波長領域を、効率良く、遮光する物
質を含有するが、本発明においては、このような
遮光性物質と共に、蛍光性物質を遮光性剥離層に
含有させることができる。この場合、遮光性物質
としては、通常、染料及び／又は顔料等の着色剤
が用いられるが、光の透過を遮断し得るものであ
れば任意のものを用いることができる。また、遮
光性剥離層には、遮光性物質の他、合成ゴムや合
成樹脂等の高分子物質をバインダー成分として含
むものであるが、遮光性剥離層の具体的構成は従
来良く知られており、従来公知の技術に従つて構
成することができる。この遮光性剥離層を構成す
る組成物としては、例えばニトリルゴム、塩化ビ
ニル−塩化ビニリデン共重合体、遮光性物質およ
び必要に応じて任意の添加剤からなるものあるい
はニトリルゴム、塩化ビニル−酢酸ビニル共重合
体、遮光性物質および前記と同じく必要に応じて
任意の添加剤からなるもの等をあげることができ
る。蛍光性物質の添加量は、遮光性剥離層中、通
常、２〜50重量％、好ましくは５〜30重量％であ
り、また、非蛍光性染料及び／又は顔料と蛍光性
物質との合計量に対して、５〜80重量％、好まし
くは20〜60重量％である。
本発明による蛍光性物質を含む遮光性剥離層
は、これにカツトラインを施した場合、その遮光
性剥離層の全体的な着色を背色として、そのカツ
トラインのみに非常に強い蛍光色を生じ、そのカ
ツトラインの目視による識別は非常に容易であ
る。
本発明においては、蛍光性物質は、前記遮光性
剥離層に含有させて用いることができる他、遮光
性剥離層の上面又は下面に、それぞれオーバーコ
ート層又はアンダーコート層を設け、これらの層
に含有させて用いることができる。このような構
成のマスキングフイルムにおいても、通常の方法
により遮光性剥離層に形成したカツトラインは、
前記の場合と同様に、通い蛍光を生じ、その目視
による識別は非常に容易である。蛍光性物質を含
むオーバーコート層を有するマスキングフイルム
は、蛍光性物質と高分子バインダーを含む塗布液
を、従来のマスキングフイルムのその遮光性剥離
層の表面に塗布乾燥することによつて容易に得る
ことができ、一方、蛍光性物質を含むアンダーコ
ート層を有するマスキングフイルムは、支持体上
に蛍光性物質を含む剥離性塗布液を塗布乾燥して
アンダーコート層を設け、その上に常法により遮
光層を形成することによつて得ることができる。
これらのオーバーコート層やアンダーコート層は
薄層で十分であり、その膜厚は、通常、0.5〜
25μm、好ましくは２〜20μmである。
〔効果〕
本発明のマスキングフイルムは、前記の如き構
成であり、その遮光性剥離層に施したカツトライ
ンは強い蛍光を発し、その目視による識別が非常
に容易であるという特徴を有する。従つて、その
カツトラインに応じて遮光性剥離層を剥離するこ
とが非常に容易になり、剥離作業が効率化される
上に、作業者の被労も従来の場合に比して著しく
軽減される。
〔実施例〕
次に本発明を実施例によりさらに詳細に説明す
る。
実施例 １
(1) 遮光性剥離層塗布液
下記成分組成の均一混合物を塗布液として用い
た。
[Technical Field] The present invention relates to a light-shielding masking film used primarily in photolithography to cut out required portions and form transparent images. [Prior Art] Light-shielding masking films in which a light-shielding release layer is provided on a plastic support are known. In the field of photolithography, etc., in order to obtain a desired transparent image, cut lines are formed on the light-shielding release layer manually or mechanically, and the light-shielding release layer is peeled off in accordance with the cut lines. By the way, when peeling off the light-shielding release layer according to the cut line, the cut line is an extremely thin line formed by a sharp blade, so there is a problem that it is very difficult to see. It was causing difficulties. [Objective] An object of the present invention is to provide a light-shielding masking film in which a cut line formed on a light-shielding release layer can be clearly visually identified. [Structure] According to the present invention, as the first invention, in the light-shielding release layer provided on the plastic film support, the light-shielding release layer contains a fluorescent substance, and the light-shielding release layer contains a fluorescent substance. There is provided a light-shielding masking film characterized in that the formed cut line generates fluorescence, and as a second invention, a light-shielding release layer is provided on a plastic film support, in which the upper surface of the light-shielding release layer or There is provided a light-shielding masking film characterized in that an overcoat layer or an undercoat layer containing a fluorescent substance is provided on the lower surface, and cut lines formed on the light-shielding release layer generate fluorescence. In the present invention, a fluorescent substance is contained in the light-shielding peeling layer so that the cut line has a fluorescent color and is easily visually identified. In this case, the fluorescent substance is usually one that absorbs visible light or ultraviolet light and generates fluorescence in the visible wavelength range, preferably one that absorbs visible light or ultraviolet light, and preferably absorbs visible light such as violet, blue, or green light. A device that emits fluorescence with a long wavelength is used.
Such fluorescent substances are well known,
Generally, fluorescent dyes and fluorescent pigments are used. For example, uranine, eosin, rhodamine,
Organic types such as thioflavin type, trypaflavin type, auramine type, and coumarin type are used, but in some cases, inorganic types can also be used. Additionally, these fluorescent substances usually
It is used in the form of fine powder, paste, etc. In the present invention, the fluorescent substance can be contained in a conventionally used light-shielding release layer. The light-shielding peeling layer in the masking film contains a substance that efficiently blocks light in the wavelength range to which the photosensitive film used together with the masking film is sensitive, but in the present invention, along with such a light-shielding substance, A fluorescent substance can be included in the light-shielding release layer. In this case, colorants such as dyes and/or pigments are usually used as the light-blocking substance, but any substance can be used as long as it can block the transmission of light. In addition, the light-shielding release layer contains a polymeric substance such as synthetic rubber or synthetic resin as a binder component in addition to the light-shielding substance, but the specific structure of the light-shielding release layer is well known and conventional It can be constructed according to known techniques. The composition constituting this light-shielding peeling layer includes, for example, nitrile rubber, vinyl chloride-vinylidene chloride copolymer, a light-shielding substance, and optional additives, or nitrile rubber, vinyl chloride-vinylidene acetate. Examples include a copolymer, a light-shielding substance, and, as mentioned above, an optional additive as required. The amount of the fluorescent substance added is usually 2 to 50% by weight, preferably 5 to 30% by weight in the light-shielding release layer, and the total amount of the non-fluorescent dye and/or pigment and the fluorescent substance 5 to 80% by weight, preferably 20 to 60% by weight. When a cut line is applied to the light-shielding release layer containing a fluorescent substance according to the present invention, a very strong fluorescent color is generated only at the cut line, with the overall coloring of the light-shielding release layer being the background color. Visual identification of the cut line is very easy. In the present invention, the fluorescent substance can be used by being contained in the light-shielding release layer, or an overcoat layer or an undercoat layer is provided on the upper surface or lower surface of the light-shielding release layer, respectively, and these layers are provided with an overcoat layer or an undercoat layer. It can be used by containing it. Even in a masking film with such a structure, the cut line formed on the light-shielding release layer by the usual method is
As in the case described above, fluorescent light is produced and visual identification is very easy. A masking film having an overcoat layer containing a fluorescent substance can be easily obtained by applying and drying a coating liquid containing a fluorescent substance and a polymer binder onto the surface of the light-shielding release layer of a conventional masking film. On the other hand, a masking film having an undercoat layer containing a fluorescent substance can be prepared by coating a support with a releasable coating solution containing a fluorescent substance and drying it to form an undercoat layer, and applying the undercoat layer thereon by a conventional method. This can be obtained by forming a light shielding layer.
A thin layer is sufficient for these overcoat layers and undercoat layers, and the film thickness is usually 0.5~
25 μm, preferably 2 to 20 μm. [Effects] The masking film of the present invention has the above-described structure, and has the feature that the cut line formed on the light-shielding release layer emits strong fluorescence, making it very easy to visually identify it. Therefore, it becomes very easy to peel off the light-shielding peeling layer according to the cut line, and not only is the peeling work more efficient, but the labor on the worker is also significantly reduced compared to the conventional case. . [Example] Next, the present invention will be explained in more detail with reference to Examples. Example 1 (1) Light-shielding release layer coating liquid A uniform mixture having the following component composition was used as a coating liquid.
【表】【table】
【表】
(2) マスキングフイルムの作成
前記塗布液を、支持体としてのポリエチレンテ
レフタレートフイルム（厚さ：100μm）の表面に
塗布乾燥し、厚さ25μmの遮光性剥離層を形成し
た。
このようにして作成されたマスキングフイルム
は、橙色の色調を有し、波長300〜490nmの光を
遮断するものであつた。この遮光性剥離層にカツ
ターナイフ刃により細いカツトラインを施すと、
そのカツトラインに強い桃色の蛍光色を生じ、そ
のカツトラインの識別は極めて容易であつた。
実施例 ２
実施例１に示した塗布液から蛍光性物質を除い
たものを塗布液として用い、これを実施例１と同
様にして、ポリエチレンテレフタレートフイルム
上に塗布乾燥して、膜厚13μmの遮光性剥離層を
形成した後、その上に、実施例１で示した蛍光性
物質２重量部とバインダー（アクリロニトリル−
ブタジエンラバー）６重量部、塩化ビニル、塩化
ビニリデン共重合体20重量部と溶媒トルエンとメ
チルエチルケトン36重量部との混合物を塗布乾燥
し、膜厚12μmのオーバーコート層を形成した。
このようにして得たマスキングフイルムに対
し、そのオーバーコート層上からカツターナイフ
刃によりカツトラインを施すと、そのカツトライ
ンは桃色の強い蛍光色を発し、そのカツトライン
の識別は非常に容易であつた。
実施例 ３
ポリエチレンテレフタレートフイルム上に、実
施例２で示した蛍光物質を含む混合物を塗布乾燥
して膜厚12μmのアンダーコート層を形成した後、
実施例２で示した遮光性剥離層塗布液を塗布乾燥
して膜厚13μmの遮光性剥離層を形成した。
このようにして得たマスキングフイルムに対
し、その遮光性剥離層上からカツターナイフ刃に
よりカツトラインを施すと、そのカツトラインは
桃色の強い蛍光色を発し、そのカツトラインの識
別は非常に容易であつた。[Table] (2) Preparation of masking film The coating solution was applied onto the surface of a polyethylene terephthalate film (thickness: 100 μm) as a support and dried to form a light-shielding release layer with a thickness of 25 μm. The masking film thus produced had an orange tone and blocked light with a wavelength of 300 to 490 nm. When a thin cut line is made on this light-shielding release layer with a cutter knife blade,
A strong pink fluorescent color was generated at the cut line, and the cut line was extremely easy to identify. Example 2 The coating liquid shown in Example 1 except for the fluorescent substance was used as a coating liquid, and this was applied and dried on a polyethylene terephthalate film in the same manner as in Example 1 to form a light-shielding film with a thickness of 13 μm. After forming the release layer, 2 parts by weight of the fluorescent substance shown in Example 1 and a binder (acrylonitrile-
A mixture of 6 parts by weight of vinyl chloride (butadiene rubber), 20 parts by weight of vinylidene chloride copolymer, toluene as a solvent, and 36 parts by weight of methyl ethyl ketone was applied and dried to form an overcoat layer with a thickness of 12 μm. When a cut line was formed on the overcoat layer of the masking film thus obtained using a cutter knife blade, the cut line emitted a strong pink fluorescent color and was very easy to identify. Example 3 A mixture containing the fluorescent substance shown in Example 2 was coated on a polyethylene terephthalate film and dried to form an undercoat layer with a thickness of 12 μm.
The light-shielding release layer coating solution shown in Example 2 was applied and dried to form a light-shielding release layer with a thickness of 13 μm. When a cut line was formed on the light-shielding release layer of the masking film thus obtained using a cutter knife blade, the cut line emitted a strong pink fluorescent color and was very easy to identify.
Claims (1)
層を設けたものにおいて、該遮光性剥離層に蛍光
性物質を含有させ、該遮光性剥離層に形成したカ
ツトラインが蛍光を生じることを特徴とする遮光
性マスキングフイルム。 ２ プラスチツクフイルム支持体上に遮光性剥離
層を設けたものにおいて、該遮光性剥離層の上面
又は下面に蛍光性物質を含むオーバーコート層又
はアンダーコート層を設け、該遮光性剥離層に形
成したカツトラインが蛍光を生じることを特徴と
する遮光性マスキングフイルム。[Scope of Claims] 1. In a light-shielding release layer provided on a plastic film support, the light-shielding release layer contains a fluorescent substance, and the cut line formed on the light-shielding release layer emits fluorescence. A light-shielding masking film featuring: 2 A light-shielding release layer provided on a plastic film support, in which an overcoat layer or an undercoat layer containing a fluorescent substance is provided on the upper or lower surface of the light-shielding release layer, and A light-shielding masking film characterized by fluorescent cut lines.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62131433A JPS63298247A (en) | 1987-05-29 | 1987-05-29 | Light shieldable masking film |
| CA000584817A CA1307981C (en) | 1987-05-29 | 1988-12-02 | Lightsafe masking film |
| KR1019880016178A KR920005768B1 (en) | 1987-05-29 | 1988-12-05 | Light shieldable masking film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62131433A JPS63298247A (en) | 1987-05-29 | 1987-05-29 | Light shieldable masking film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63298247A JPS63298247A (en) | 1988-12-06 |
| JPH0575109B2 true JPH0575109B2 (en) | 1993-10-19 |
Family
ID=15057847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62131433A Granted JPS63298247A (en) | 1987-05-29 | 1987-05-29 | Light shieldable masking film |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS63298247A (en) |
| KR (1) | KR920005768B1 (en) |
| CA (1) | CA1307981C (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6314423B2 (en) * | 2013-10-25 | 2018-04-25 | 凸版印刷株式会社 | Reflective mask |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5230859U (en) * | 1975-08-21 | 1977-03-04 | ||
| JPS57191053A (en) * | 1981-05-09 | 1982-11-24 | Roehm Gmbh | Light transmitting plastic molding material extruded simultaneously and its manufacture |
| JPS61143758A (en) * | 1984-12-17 | 1986-07-01 | Kimoto & Co Ltd | Light interrupting masking film |
-
1987
- 1987-05-29 JP JP62131433A patent/JPS63298247A/en active Granted
-
1988
- 1988-12-02 CA CA000584817A patent/CA1307981C/en not_active Expired - Fee Related
- 1988-12-05 KR KR1019880016178A patent/KR920005768B1/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5230859U (en) * | 1975-08-21 | 1977-03-04 | ||
| JPS57191053A (en) * | 1981-05-09 | 1982-11-24 | Roehm Gmbh | Light transmitting plastic molding material extruded simultaneously and its manufacture |
| JPS61143758A (en) * | 1984-12-17 | 1986-07-01 | Kimoto & Co Ltd | Light interrupting masking film |
Also Published As
| Publication number | Publication date |
|---|---|
| KR900010469A (en) | 1990-07-07 |
| CA1307981C (en) | 1992-09-29 |
| JPS63298247A (en) | 1988-12-06 |
| KR920005768B1 (en) | 1992-07-18 |
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