JPH0572995A - Liquid crystal display device - Google Patents

Liquid crystal display device

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Publication number
JPH0572995A
JPH0572995A JP23291891A JP23291891A JPH0572995A JP H0572995 A JPH0572995 A JP H0572995A JP 23291891 A JP23291891 A JP 23291891A JP 23291891 A JP23291891 A JP 23291891A JP H0572995 A JPH0572995 A JP H0572995A
Authority
JP
Japan
Prior art keywords
thin film
liquid crystal
film transistor
potential
gate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23291891A
Other languages
Japanese (ja)
Other versions
JP3135627B2 (en
Inventor
Koji Suzuki
幸治 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP23291891A priority Critical patent/JP3135627B2/en
Publication of JPH0572995A publication Critical patent/JPH0572995A/en
Application granted granted Critical
Publication of JP3135627B2 publication Critical patent/JP3135627B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Liquid Crystal Display Device Control (AREA)

Abstract

PURPOSE:To provide the liquid crystal display device which can remove a switching noise without making the device large in size nor complex. CONSTITUTION:This device is equipped with a thin film transistor T11 whose source is connected to a picture element electrode, a gate line G1 and a data line Dr which control the thin film transistor T11, a bus line B1 provided between gate lines connected to a low power source potential VCSL, a storage capacitor CS11 provided between the bus line B1 and a liquid crystal layer LC11, parallel connected thin film transistors T1a and T1b which have their common drain connected to the storage capacitor body CS11 and also connected to a high power source potential VCSH through a resistance body R1, have the common source connected to a low power source potential VCSL and have their two gates connected to the bus line B1 connected to gate lines G1 and G2 adjoining to the bus line B1, and the resistance body R1 which is connected to the bus line B1 and also connected to the high power source potential VCSH.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶表示装置に係り、
特に薄膜トランジスタを用いたアクティブマトリックス
型液晶表示装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device,
In particular, it relates to an active matrix type liquid crystal display device using a thin film transistor.

【0002】[0002]

【従来の技術】液晶表示装置は薄型・軽量であり、低電
圧駆動が可能で更にカラ―化も容易である等の特徴を有
し、近年、パ―ソナルコンピュ―タ,ワ―プロなどの表
示装置として利用されている。中でも各画素毎に、スイ
ッチング素子として薄膜トランジスタを設けたいわゆる
アクティブマトリックス型液晶表示装置は、多画素にし
てもコントラスト,レスポンス等の劣化がなく、更に、
中間調表示も可能であることから、フルカラ―テレビ
や、OA用の表示装置として最適な方式である。
2. Description of the Related Art Liquid crystal display devices are thin and lightweight, can be driven at low voltage, and can be easily colored. In recent years, they have been used in personal computers, word processors, etc. It is used as a display device. Above all, a so-called active matrix type liquid crystal display device, in which a thin film transistor is provided as a switching element for each pixel, has no deterioration in contrast, response, etc. even if the number of pixels is large.
Since it can display halftones, it is the most suitable system as a display device for full-color television and OA.

【0003】このアクティブマトリックス型液晶表示装
置は、2枚の平面ガラスからなる基板(アレイ基板,対
向基板)と、これら基板間に挟まれた液晶層とからなる
基本構成をとっている。一方のガラス基板、即ち、対向
基板上には、各画素に対応したカラ―フィルタ―配列
と、透明電極(対向電極)とが形成されており、アレイ
基板には、マトリックス状に配列された透明電極からな
る画素電極と、各画素電極にソ―ス電極が接続された薄
膜トランジスタが設けられている。薄膜トランジスタの
ゲ―ト電極は、X方向に設けられたゲ−ト線に接続さ
れ、ドレイン電極はゲ−ト線と直角方向に設けられたデ
―タ線に接続されている。
This active matrix type liquid crystal display device has a basic structure composed of two flat glass substrates (array substrate and counter substrate) and a liquid crystal layer sandwiched between these substrates. On one of the glass substrates, that is, the counter substrate, a color filter array corresponding to each pixel and transparent electrodes (counter electrodes) are formed. On the array substrate, transparent arrays arranged in a matrix are formed. A pixel electrode formed of an electrode and a thin film transistor in which a source electrode is connected to each pixel electrode are provided. The gate electrode of the thin film transistor is connected to the gate line provided in the X direction, and the drain electrode is connected to the data line provided in the direction orthogonal to the gate line.

【0004】このように構成された液晶表示装置では、
ゲ−ト線及びデ−タ線に線順次方式と呼ばれるタイミン
グで電気信号を印加することにより、各画素電極の表示
に対応した電圧を選択的に印加することができる。液晶
の配向は、即ち、光透過率は、対向電極と画素電極との
電位差で制御でき、これにより任意の表示が可能とな
る。詳細は、T.P.Brodyらの文献(IEEE
Tvans on Elect.Deu.Vol ED
−20,Nov.1973,pp.995−1001)
に述べられている。
In the liquid crystal display device constructed as described above,
By applying an electric signal to the gate line and the data line at a timing called a line-sequential system, a voltage corresponding to the display of each pixel electrode can be selectively applied. The orientation of the liquid crystal, that is, the light transmittance can be controlled by the potential difference between the counter electrode and the pixel electrode, which enables arbitrary display. For details, see T.W. P. Reference by Brody et al. (IEEE
Tvans on Select. Deu. Vol ED
-20, Nov. 1973, pp. 995-1001)
Are described in.

【0005】しかしながら、このような液晶表示装置で
は、液晶層の寄生容量や薄膜トランジスタの寄生容量な
どが原因して、薄膜トランジスタがオン状態からオフ状
態及びオフ状態からオン状態に制御される際に、画素電
極電位に非線形なスイッチングノイズが重畳するため、
表示特性が劣化したり、直流成分により液晶層が劣化す
るという問題があった。
However, in such a liquid crystal display device, when the thin film transistor is controlled from the on state to the off state and from the off state to the on state due to the parasitic capacitance of the liquid crystal layer and the parasitic capacitance of the thin film transistor, Since non-linear switching noise is superimposed on the electrode potential,
There are problems that the display characteristics are deteriorated and the liquid crystal layer is deteriorated due to the DC component.

【0006】このようなスイッチングノイズを除去する
方法として補償駆動法がある。図5(a)はこの方法を
実現するための液晶表示装置の要部構成を示す等価回路
図であり、図5(b)は同液晶表示装置の印加電圧波形
である。なお、図中VCOM は対向電極電位を表してい
る。
As a method of removing such switching noise, there is a compensation driving method. FIG. 5A is an equivalent circuit diagram showing the configuration of the main part of a liquid crystal display device for implementing this method, and FIG. 5B is an applied voltage waveform of the liquid crystal display device. In the figure, V COM represents the counter electrode potential.

【0007】この液晶表示装置の特徴は、ゲ−ト線
1 ,G2 ,…と液晶層LC11,LC21,…との間に補
償用キャパシタC11,C21,…を挿設し、ゲ−ト線
1 ,G2 ,…にそれぞれ図4(b)に示すようなゲ−
トパルス信号VG1,VG2,…を印加することにある。こ
の結果、所定の時間間隔でゲ−トパルス信号VG1
G2,…をそれぞれのゲ−ト線G1 ,G2 ,…に印加
し、薄膜トランジスタT12,T21,…を順位オンにする
と、例えば、蓄積容量体CS12 に接続された画素電極の
電位、つまり、画素電極電位VS は、ゲ−トパルス信号
G2 の立ち下がり(VGSから−VE )でいったん降下
するが、パルス信号VG1の立ち上がり(−VE から0)
の際に、その電圧が補償用キャパシタC12を介して印加
されるため、電位VS は上昇し所定のレベルに保持され
る。詳細は、K.Suzukiらの文献(“Compe
nsation Addressing for Sw
itchingDistortion in a−Si
TFT LCD”,Proceechings 7+h
IDRC,PP107−110,Sept.198
7)に述べられている。
The characteristic of this liquid crystal display device is that compensation capacitors C 11 , C 21 , ... are inserted between the gate lines G 1 , G 2 , ... and the liquid crystal layers LC 11 , LC 21 ,. , And the gate lines G 1 , G 2 , ... As shown in FIG.
Pulse signals V G1 , V G2 , ... As a result, the gate pulse signal V G1 ,
When V G2 , ... Is applied to the respective gate lines G 1 , G 2 , ... And the thin film transistors T 12 , T 21 , ... Are sequentially turned on, for example, the pixel electrodes of the storage capacitor C S12 are connected. The potential, that is, the pixel electrode potential V S , temporarily drops at the trailing edge of the gate pulse signal V G2 (from V GS to −V E ), but rises at the pulse signal V G1 (from −V E to 0).
At that time, since the voltage is applied through the compensation capacitor C 12 , the potential V S rises and is maintained at a predetermined level. For details, see K. Suzuki et al. ("Compe
nation Addressing for Sw
etchingDistortion in a-Si
TFT LCD ”, Processings 7 + h
IDRC, PP107-110, Sept. 198
7).

【0008】しかしながら、このような補償駆動法で
は、例えば、パルス信号VG1の立上がり(0からVGS
の際に、その電圧が補償用キャパシタC12を介して画素
電極電位VS にスイッチングノイズNとして重畳され
る。このため、直流成分の除去が不十分になり液晶層の
信頼性が低下したり、液晶層に低周波のノイズが発生し
フリッカ−や焼付が生じるという問題があった。図6は
他の補償駆動法を説明するための液晶表示装置の要部構
成を示す等価回路図である。
However, in such a compensation driving method, for example, the rise of the pulse signal V G1 (0 to V GS )
At that time, the voltage is superimposed as the switching noise N on the pixel electrode potential V S via the compensation capacitor C 12 . For this reason, there are problems that the removal of the DC component becomes insufficient, the reliability of the liquid crystal layer is lowered, and that low-frequency noise is generated in the liquid crystal layer to cause flicker and image sticking. FIG. 6 is an equivalent circuit diagram showing a configuration of a main part of a liquid crystal display device for explaining another compensation driving method.

【0009】この補償駆動法の特徴は、バスライン
1 ,B2 ,…を設け、これらを介して蓄積容量体C
S11 ,CS12,…に補償用パルス信号を印加し、スイッ
チングノイズを相殺することにある。これら補償用キャ
パシタはゲ−ト線G1 ,G2 ,G3,…に接続されてい
ないので先の補償駆動法のようなスイッチングノイズN
は生じない。
The characteristic of this compensation driving method is that the bus lines B 1 , B 2 , ... Are provided, and the storage capacitor C is provided through these bus lines.
The purpose is to apply a compensation pulse signal to S11 , C S12 , ... To cancel the switching noise. Since these compensation capacitors are not connected to the gate lines G 1 , G 2 , G 3 , ...
Does not occur.

【0010】しかしながら、このような方法では、デ−
タ線D1 ,D2 ,D3 ,…の駆動用IC10の出力端子
数は先の方法と変わらないが、ゲ−ト線G1 ,G2 ,G
3 ,…の駆動用IC11の出力端子はバスラインB1
2 ,…の数だけ増加し、更にゲ−トパルスと補償パル
スの2種類の電圧を発生させなければならないため、端
子数の増大による駆動用IC11のチップサイズの大型
化や複雑化,駆動用IC11の実装工程の増加による信
頼性の低下,狭ピッチ化による接続技術の高度化などの
問題が生じる。
However, in such a method, the data
The number of output terminals of the driving IC 10 for the gate lines D 1 , D 2 , D 3 , ... Is the same as that of the previous method, but the gate lines G 1 , G 2 , G
3, ... the output terminal of the driving IC11 of the bus line B 1,
It is necessary to increase the number of B 2 , ... And generate two kinds of voltages of a gate pulse and a compensation pulse. Therefore, the chip size of the driving IC 11 becomes large and complicated due to the increase in the number of terminals. Problems such as a decrease in reliability due to an increase in the number of mounting steps of the IC 11 and a sophistication of connection technology due to a narrow pitch occur.

【0011】[0011]

【発明が解決しようとする課題】上述の如く、従来の薄
膜トランジスタをスイッチング素子に用いた液晶表示装
置では、補償駆動法により、薄膜トランジスタの寄生容
量や液晶層の寄生容量に起因するスイッチングノイズを
除去する試みが行われていたが、直流成分の除去が不十
分だったり、ゲ−ト線の駆動用ICの大型化や複雑化を
招いたり、信頼性が低下するという問題があった。
As described above, in the liquid crystal display device using the conventional thin film transistor as the switching element, the switching noise caused by the parasitic capacitance of the thin film transistor and the parasitic capacitance of the liquid crystal layer is removed by the compensation driving method. Although attempts have been made, there are problems that the removal of the DC component is insufficient, the gate line driving IC becomes large and complicated, and the reliability decreases.

【0012】本発明は、上記事情を考慮してなされたも
ので、その目的とするところは、装置の大型化を招くこ
と無くスイッチングノイズを除去できる液晶表示装置を
提供することにある。
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a liquid crystal display device capable of removing switching noise without increasing the size of the device.

【0013】[0013]

【課題を解決するための手段】本発明の骨子は、ゲ−ト
パルス信号を利用した薄膜トランジスタからなる回路で
補償パルス信号を生成することにある。
The essence of the present invention is to generate a compensating pulse signal by a circuit composed of a thin film transistor using a gate pulse signal.

【0014】即ち、上記の目的を達成するために、本発
明の液晶表示装置は、マトリクス配列された画素電極の
電位により液晶の配向が制御される液晶層と、前記画素
電極にソ−スが接続されたスイッチング素子としての薄
膜トランジスタと、同一行の前記薄膜トランジスタのゲ
−トに接続されたゲ−ト線と、同一列の前記薄膜トラン
ジスタのドレインに接続されたデ―タ線と、ゲ−ト線間
に設けられ且つ低電位電源に繋がったバスラインと、こ
のバスラインと前記画素電極との間に設けられた蓄積容
量体と、前記バスラインに設けられ、共通ソ−スが前記
低電位電源に繋がれ、共通ドレインが前記蓄積容量体に
接続され、2つのゲ−トがそれぞれ前記バスラインに隣
接したゲ−ト線に接続された並列接続された薄膜トラン
ジスタと、一端がこの薄膜トランジスタの共通ドレイン
に接続され、他端が高電位電源に繋がった抵抗体とを備
えていることを特徴とする。
In other words, in order to achieve the above object, the liquid crystal display device of the present invention has a liquid crystal layer in which the alignment of the liquid crystal is controlled by the potential of the pixel electrodes arranged in a matrix, and a source on the pixel electrodes. A thin film transistor as a connected switching element, a gate line connected to the gates of the thin film transistors in the same row, a data line connected to the drains of the thin film transistors in the same column, and a gate line. A bus line provided between and connected to the low potential power source, a storage capacitor provided between the bus line and the pixel electrode, and a common source provided on the bus line and having the low potential power source. And a common drain connected to the storage capacitor, two gates connected in parallel to a gate line adjacent to the bus line, and a thin film transistor connected in parallel. It is connected to the common drain of the thin film transistor, and the other end is provided with a resistor that is connected to the high-potential power supply.

【0015】[0015]

【作用】本発明の液晶表示装置では、並列接続された薄
膜トランジスタの2つのゲ−トをそれぞれ隣接したゲ−
ト線に接続しているので、ゲ−トパルス信号に同期して
共通ドレインの電位が変わる。この共通ドレインの電位
は高電位電源と低電位電源との電圧差で調整できる。
In the liquid crystal display device of the present invention, the two gates of the thin film transistors connected in parallel are adjacent to each other.
Since it is connected to the gate line, the potential of the common drain changes in synchronization with the gate pulse signal. The potential of the common drain can be adjusted by the voltage difference between the high potential power source and the low potential power source.

【0016】したがって、スイッチング素子としての薄
膜トランジスタのゲ−ト・ソ−ス間の寄生容量とに起因
する、ゲ−トパルス信号に同期して生じるスイッチング
ノイズは、高電位電源と低電位電源との電圧差を調整し
て上記共通ドレインの電位をスイッチングノイズを打ち
消すことができるレベルに設定すれば除去される。ま
た、ゲ−ト線間に接続される補償用キャパシタを用いて
いないので、これに起因するスイッチングノイズは発生
しない。
Therefore, the switching noise generated in synchronization with the gate pulse signal due to the parasitic capacitance between the gate and the source of the thin film transistor as the switching element is caused by the voltage between the high potential power source and the low potential power source. If the difference is adjusted and the potential of the common drain is set to a level capable of canceling the switching noise, it is removed. Further, since the compensation capacitor connected between the gate lines is not used, switching noise due to this does not occur.

【0017】更に、共通接続された薄膜トランジスタの
ゲ−トを制御する余分な配線や回路が不要なので、従来
のようにゲ−ト線の駆動用ICの出力端子が増加して装
置が大型化したり、複雑化するという問題は生じない。
Furthermore, since no extra wiring or circuit for controlling the gate of the commonly connected thin film transistors is required, the number of output terminals of the gate line driving IC increases and the device becomes large in size as in the prior art. , The problem of complication does not occur.

【0018】[0018]

【実施例】以下、図面を参照しながら実施例を説明す
る。図1は本発明の一実施例に係る液晶表示装置の要部
構成を示す等価回路図である。
Embodiments will be described below with reference to the drawings. FIG. 1 is an equivalent circuit diagram showing a main configuration of a liquid crystal display device according to an embodiment of the present invention.

【0019】この液晶表示装置は、大きく分けて、ゲ−
ト線GX とデ―タ線DX (X =1,2,…)との交点に
設けられたスイッチング素子としての薄膜トランジスタ
XY(XY=11,12,…)と蓄積容量体CSXY (S
XY=S11,S12,…)と画素電極とからなる画素
と、この画素の画素電極の電位により液晶の配向(光透
過率)が制御される液晶層LCXY(XY=11,12,
…)と、画素電極の電位を補償するための補償パルス発
生回路PGX (X =1,2,…)とからなる。なお、図
中、各液晶層LCXYは対向電極電位VCOM に接続されて
いる。
This liquid crystal display device is roughly classified into a gate.
The thin film transistor T XY (XY = 11, 12, ...) As a switching element provided at the intersection of the data line G X and the data line D X (X = 1, 2, ...) And the storage capacitor C SXY ( S
XY = S11, S12, ...) and a pixel electrode, and a liquid crystal layer LC XY (XY = 11, 12, 12, in which the liquid crystal orientation (light transmittance) is controlled by the potential of the pixel electrode of this pixel.
,) And a compensation pulse generation circuit PG X (X = 1, 2, ...) For compensating the potential of the pixel electrode. In the figure, each liquid crystal layer LC XY is connected to the counter electrode potential V COM .

【0020】補償パルス発生回路PG1 は、並列接続さ
れた薄膜トランジスタT1a,T1bと抵抗体R1 とで構成
されている。なお、抵抗体R1 の抵抗値は薄膜トランジ
スタT1a,T1bのオン抵抗値より十分大きいことが望ま
しい。
The compensating pulse generating circuit PG 1 is composed of thin film transistors T 1a and T 1b and a resistor R 1 which are connected in parallel. The resistance value of the resistor R 1 is preferably sufficiently larger than the on resistance values of the thin film transistors T 1a and T 1b .

【0021】薄膜トランジスタT1a,T1bのゲ−トはそ
れぞれゲ−ト線G1 ,G2 に接続され、共通ソ−スは低
電源電位VCSL に接続され、共通ドレインはバスライン
1を介して蓄積容量体CS11 ,CS12 ,…に接続され
ると共に、抵抗体R1 を介して高電源電位VCSH に接続
されている。
The gates of the thin film transistors T 1a and T 1b are connected to the gate lines G 1 and G 2 , respectively, the common source is connected to the low power supply potential V CSL , and the common drain is connected to the bus line B 1 . Are connected to the storage capacitors C S11 , C S12 , ... Through the resistor R 1 and to the high power supply potential V CSH .

【0022】他の補償パルス発生回路PGX (X=2,
3…)も同様に構成されている。なお、本実施例では、
スイッチング用及び補償パルス発生回路の薄膜トランジ
スタの活性層の材料並びに抵抗体の材料としてn+ アモ
ルファスシリコンを用いている。
Other Compensation Pulse Generation Circuit PGX(X = 2
3 ...) is similarly configured. In this example,
Thin film transistor for switching and compensation pulse generator
N as the material of the active layer of the star and the material of the resistor+ Ammo
Rufus silicon is used.

【0023】このように構成された液晶表示装置では、
以下に示すように高電源電位VCSH,低電位電源VCSL
を調整することで、スイッチングノイズを除去できる。
In the liquid crystal display device constructed as described above,
As shown below, high power supply potential V CSH , low power supply potential V CSL
Switching noise can be removed by adjusting.

【0024】図2は液晶表示装置の印加電圧波形を示す
図である。ゲ−ト線G1 にはパルス振幅ΔV(=VGH
GL),パルス幅TG ,パルス間隔TF のゲ−トパルス
信号VG1が印加されている。ここで、VGHは選択電位,
GLは非選択電位である。ゲ−トパルス信号VG1の電位
が選択電位VGHになると、薄膜トランジスタT11がオン
になる。この結果、液晶層LC11の画素電極にはデ−タ
線D1 の電圧が印加されるので、その画素電極電位V
p11 はVSLからVSHに上がる。次いでゲ−トパルス信号
G1の電位が選択電位VGHから非選択電位VGLに変わる
と、画素電極電位Vp11 にはスイッチングノイズΔVp
が重畳される。このスイッチングノイズΔVp は次式で
表される。 ΔVp =CGS・ΔVG /(CS +CLC+CGS) ここで、CGSは薄膜トランジスタT11のゲ−ト・ソ−ス
間の寄生容量,CS は蓄積容量体CS11 の容量,CLC
液晶層LC11の容量である。
FIG. 2 is a diagram showing an applied voltage waveform of the liquid crystal display device. The gate line G 1 has a pulse amplitude ΔV (= V GH
V GL ), pulse width T G , and pulse interval T F of the gate pulse signal V G1 . Where V GH is the selection potential,
V GL is a non-selection potential. When the potential of the gate pulse signal V G1 becomes the selection potential V GH , the thin film transistor T 11 is turned on. As a result, since the voltage of the data line D 1 is applied to the pixel electrode of the liquid crystal layer LC 11 , the pixel electrode potential V
p11 goes up from V SL to V SH . Next, when the potential of the gate pulse signal V G1 changes from the selection potential V GH to the non-selection potential V GL , the switching noise ΔV p is added to the pixel electrode potential V p11.
Are superimposed. This switching noise ΔV p is expressed by the following equation. ΔV p = C GS · ΔV G / (C S + C LC + C GS ) where C GS is the parasitic capacitance between the gate and the source of the thin film transistor T 11 , C S is the capacitance of the storage capacitor C S11 , C LC is the capacity of the liquid crystal layer LC 11 .

【0025】一方、補償パルス発生回路PG1 もゲ−ト
線G1 に接続されているので、ゲ−トパルス信号VG1
電位が選択電位VGHになると、薄膜トランジスタT1a
オンになり、バスラインB1 の電位VCS1 は低電位電源
CSL と等しくなる。したがって、蓄積容量体CS11
は低電位電源VCSL が印加される。そしてゲ−トパルス
信号VG1の電位が選択電位VGHから非選択電位VGLに変
わると、ゲ−ト線G2に選択電位VGHが印加されるので
薄膜トランジスタT1bがオンになる。このため、バスラ
インB1 の電位VCS1 は低電位電源VCSL のままで、蓄
積容量体CS11には低電位電源VCSL が印加される。こ
の後、パルス信号VG2が選択電位VGHから非選択電位V
GLに変わると、薄膜トランジスタT1a,T1bが伴にオフ
となるので、抵抗体R1 を介して高電位電源VCSH が蓄
積容量体CS11 に印加される。この結果、補償パルス発
生回路PG1 により、画素電極電位Vp11 には、次式で
表される補償パルス信号Vcpが印加される。 Vcp=CS ・VZ /(CS +CLC+CGS) ここで、VZ =VCSH −VCSL である。したがって、Δ
p =Vcpであれば、スイッチングノイズを除去でき
る。
On the other hand, since the compensation pulse generating circuit PG 1 is also connected to the gate line G 1, when the potential of the gate pulse signal V G1 becomes the selection potential V GH , the thin film transistor T 1a is turned on and the bus T 1a is turned on. The potential V CS1 of the line B 1 becomes equal to the low potential power supply V CSL . Therefore, the low potential power supply V CSL is applied to the storage capacitor C S11 . When the potential of the gate pulse signal V G1 changes from the selection potential V GH to the non-selection potential V GL , the selection potential V GH is applied to the gate line G 2 and the thin film transistor T 1b is turned on. Therefore, the potential V CS1 bus line B 1 represents remains low-potential power supply V CSL, the storage capacitor element C S11 the low-potential power supply V CSL is applied. After that, the pulse signal V G2 changes from the selection potential V GH to the non-selection potential V GH.
When changed to GL , the thin film transistors T 1a and T 1b are turned off together, so that the high potential power supply V CSH is applied to the storage capacitor C S11 via the resistor R 1 . As a result, the compensation pulse generation circuit PG 1 applies the compensation pulse signal V cp represented by the following equation to the pixel electrode potential V p11 . V cp = C S · V Z / (C S + C LC + C GS ) Here, V Z = V CSH −V CSL . Therefore, Δ
If V p = V cp , switching noise can be removed.

【0026】即ち、VZ =CGS・ΔVG /CS となるよ
うに、高電源電位VCSH ,低電位電源VCSL を設定すれ
ば良い。本実施利では、VCSH を6.0[V]、VCSL
を2.5[V]に設定し、対向電極電位VCOM を6.0
[V]、データ線DX には6[V]を中心とするフレー
ム毎に極性が反転する交流表示信号(最大振幅は5
[V])を印加する。なお、本実施例では、従来のよう
にゲ−ト線に接続される補償用コンデンサを用いていな
いので、図4で示したようなスイッチングノイズNは発
生しない。同様にして他の薄膜トランジスタTXYXY
12,13,…)のスイッチングノイズも除去される。
That is, the high power supply potential V CSH and the low potential power supply V CSL may be set so that V Z = C GS · ΔV G / C S. In this implementation, V CSH is 6.0 [V], V CSL
Is set to 2.5 [V], and the counter electrode potential V COM is set to 6.0.
[V], an AC display signal (maximum amplitude is 5) of which the polarity is inverted for each frame centered on 6 [V] on the data line D X.
[V]) is applied. In this embodiment, since the compensation capacitor connected to the gate line is not used unlike the conventional case, the switching noise N as shown in FIG. 4 does not occur. Similarly, other thin film transistors T XY ( XY =
12, 13, ...) Switching noise is also removed.

【0027】また、補償パルス発生回路PGX の薄膜ト
ランジスタTXa,TXb並びに抵抗体RX は、スイッチン
グ素子の薄膜トランジスタTXYと同一のプロセスで形成
できるので、製造プロセス数が増加するという不都合は
生じない。
Further, since the thin film transistors T Xa and T Xb and the resistor R X of the compensation pulse generating circuit PG X can be formed in the same process as the thin film transistor T XY of the switching element, the disadvantage that the number of manufacturing processes increases increases. Absent.

【0028】また、補償パルス発生回路PGX の薄膜ト
ランジスタTXa,TXbは、スイッチング素子の薄膜トラ
ンジスタTXYと同一のパルス信号が印加されるので、そ
の信頼性は、薄膜トランジスタTXYのそれと同程度であ
る。
Further, since the same pulse signal as that of the thin film transistor T XY of the switching element is applied to the thin film transistors T Xa and T Xb of the compensation pulse generating circuit PG X , its reliability is about the same as that of the thin film transistor T XY. is there.

【0029】本発明者等は、ゲート線480本(デュー
ティ比1/500)、ΔVG =26[V]の条件で、長
時間動作させても、薄膜トランジスタTXa,TXbのしき
い値電圧の変動ΔVTHは、非常に小さいことを確認し
た。例えば、70℃,1000時間の連続動作において
は、薄膜トランジスタTXYのしきい値電圧のΔVTH量は
4.0[V]であり、一方、薄膜トランジスタTXa,T
Xbのそれは5.0[V]以下で、十分実用に耐えるもの
であることが分かった。
The inventors of the present invention have found that the threshold voltage of the thin film transistors T Xa and T Xb can be maintained even if they are operated for a long time under the condition of 480 gate lines (duty ratio 1/500) and ΔV G = 26 [V]. It was confirmed that the fluctuation ΔV TH of Δ was very small. For example, in continuous operation at 70 ° C. for 1000 hours, the ΔV TH amount of the threshold voltage of the thin film transistor T XY is 4.0 [V], while the thin film transistors T Xa and T Xa
It was found that the value of Xb was 5.0 [V] or less, and was sufficiently practical.

【0030】また、本実施例では、補償パルス信号の発
生に必要な信号を、外部からの多数のコントロ−ル信号
を与えずに、ゲ−トパルス信号のみで発生できるので、
従来のようにゲ−ト線の駆動用ICの出力端子数の増大
による駆動用ICのチップサイズの大型化や複雑化,駆
動用ICの実装工程の増加による信頼性の低下,狭ピッ
チ化による接続技術の高度化などの問題は生じない。
Further, in this embodiment, the signal necessary for generating the compensation pulse signal can be generated only by the gate pulse signal without giving a large number of external control signals.
Due to the increase in the number of output terminals of the gate line driving IC as in the past, the chip size of the driving IC becomes large and complicated, and the reliability decreases due to the increase in the mounting process of the driving IC and the narrow pitch. There will be no problems such as sophistication of connection technology.

【0031】以上述べたように、本実施例では、製造プ
ロセス数の増加を招くこと無く、しかも、外部から多数
のコントロール信号を与えずに、ゲートパルス信号のみ
で制御できる補償パルス発生回路でスイッチングノイズ
の除去でき、もって直流電圧による液晶層の信頼性の低
下や低周波のノイズによるフリッカ−,焼付を防止でき
る。
As described above, in this embodiment, switching is performed by the compensation pulse generating circuit which can be controlled only by the gate pulse signal without increasing the number of manufacturing processes and without giving a large number of control signals from the outside. It is possible to remove noise, thereby preventing the reliability of the liquid crystal layer from being deteriorated by the DC voltage and preventing flicker and image sticking due to low frequency noise.

【0032】なお、本実施例では、抵抗体RX をn+
モルファスシリコンで形成したが、他の材料、例えば、
ゲート配線材料,データ配線材料,透明電極材料,薄膜
トランジスタ等を用いても良い。ただし、この場合も、
抵抗体RX の抵抗値は、薄膜トランジスタTXa,TXb
オン抵抗値よりも十分高くしておくことが望ましい。こ
れは薄膜トランジスタTXa,TXbがオンのときに、高電
源電位VCSH による低電源電位VCSL の電位上昇を抑制
する必要があるからである。
In this embodiment, the resistor R X is n +. It was made of amorphous silicon, but other materials such as
A gate wiring material, a data wiring material, a transparent electrode material, a thin film transistor, etc. may be used. However, even in this case,
It is desirable that the resistance value of the resistor R X be sufficiently higher than the ON resistance values of the thin film transistors T Xa and T Xb . This is because when the thin film transistors T Xa and T Xb are on, it is necessary to suppress the potential rise of the low power supply potential V CSL due to the high power supply potential V CSH .

【0033】図3に抵抗体RX として薄膜トランジスタ
を用いた場合の液晶表示装置の要部構成図を示す。これ
は図1の液晶表示装置と異なる部分のみを示した図であ
る。これが図1の液晶表示装置と異なる点は、抵抗体R
1,R2 ,…をそれぞれ薄膜トランジスタTR1 ,TR
2 ,…で置き換えたことである。ここで薄膜トランジス
タTR1a,TR1b,…のオン抵抗が薄膜トランジスタT
1 ,…のオン抵抗よりも十分小さくし、且つ高電位電
源の電圧VCSH を薄膜トランジスタTR1 ,TR2 ,…
のしきい値電圧VTH分だけ高くしておけば、薄膜トラン
ジスタTR1a,TR1b,…がオフのとき、バスラインB
1 ,B2 ,…にはVCSH −VTHの電位が印加され、薄膜
トランジスタTR1a,TR1b,…がオンのときには、バ
スラインB1 ,B2 ,…にVVCSL が印加されるため、
所望の動作を得ることができる。このような構成であれ
ば、全ての素子を同じプロセスの薄膜トランジスタで形
成でき、特別な工程を追加せず、且つ抵抗値の大小関係
もパタ−ン寸法で決められるため、歩留り高く製造する
ことができる。
FIG. 3 is a schematic view of a main part of a liquid crystal display device using a thin film transistor as the resistor R X. This is a view showing only a portion different from the liquid crystal display device of FIG. This differs from the liquid crystal display device of FIG. 1 in that the resistor R
1 , R 2 , ... Are thin film transistors TR 1 , TR, respectively.
It was replaced by 2 , ... Here, the on-resistance of the thin film transistors TR 1a , TR 1b , ...
The resistance of the thin film transistors TR 1 , TR 2 , ... Is made sufficiently smaller than the on resistance of R 1 ,.
If it is increased by the threshold voltage V TH of the bus line B when the thin film transistors TR 1a , TR 1b , ... Are off.
A potential of V CSH −V TH is applied to 1 , B 2 , ..., And when the thin film transistors TR 1a , TR 1b , ... Are on, V V CSL is applied to the bus lines B 1 , B 2 ,.
The desired motion can be obtained. With such a configuration, all the elements can be formed by thin film transistors of the same process, no special process is added, and the magnitude relation of the resistance value can be determined by the pattern size, so that it can be manufactured with high yield. it can.

【0034】図4は本発明の他の実施例に係る液晶表示
装置の要部構成を示す等価回路図である。なお、図1の
液晶表示装置と対応する部分には図1と同一符号を付
し、詳細な説明は省略する。本実施例の液晶表示装置が
先の実施例のそれと異なる点は、抵抗体に薄膜トランジ
スタを用いたことにある。
FIG. 4 is an equivalent circuit diagram showing a main configuration of a liquid crystal display device according to another embodiment of the present invention. The parts corresponding to those of the liquid crystal display device of FIG. 1 are designated by the same reference numerals as those of FIG. 1, and detailed description thereof will be omitted. The liquid crystal display device of this embodiment is different from that of the previous embodiment in that a thin film transistor is used as a resistor.

【0035】並列接続された薄膜トランジスタT1a,T
1bの共通ドレインは、先の実施例と同様に蓄積容量体C
S1Y (S1Y=S11,S12,…)に接続されている
と共に、薄膜トランジスタT1eを介して高電源電位V
CSH に接続されている。一方、薄膜トランジスタT1a
1bの共通ソ−スは、低電源電位VCSL に接続されてい
る。
Thin film transistors T 1a and T 1 connected in parallel
The common drain of 1b is the storage capacitor C as in the previous embodiment.
S1Y (S1Y = S11, S12, ...) And the high power supply potential V through the thin film transistor T 1e.
Connected to CSH . On the other hand, the thin film transistor T 1a ,
The common source of T 1b is connected to the low power supply potential V CSL .

【0036】薄膜トランジスタT1eのゲ−トは、抵抗体
1eを介して電源電位V1 に接続されていると共に、並
列接続された薄膜トランジスタT1c,T1dを介して電源
電位V2 に接続されている。なお、抵抗体R1eの抵抗値
は、薄膜トランジスタT1c,T1dのオン抵抗値より十分
高いことが望ましい。同様に他の並列接続された薄膜ト
ランジスタTxa,Txb(x =2,3,…)にも薄膜トラ
ンジスタからなる抵抗体が接続されている。
The gate of the thin film transistor T 1e is connected to the power supply potential V 1 via the resistor R 1e and is connected to the power supply potential V 2 via the thin film transistors T 1c and T 1d connected in parallel. ing. The resistance value of the resistor R 1e is preferably sufficiently higher than the on resistance values of the thin film transistors T 1c and T 1d . Similarly, another thin film transistor T xa , T xb (x = 2, 3, ...) Connected in parallel is also connected with a resistor made up of a thin film transistor.

【0037】また、高電源電位VCSH ,低電位電源V
CSL は、先の実施例の場合と同様に設定されている。本
実施例では、高電源電位VCSH ,低電位電源VCSL をそ
れぞれ6[V],2.5[V]とし、ゲ−トパルス信号
の振幅を26[V],対向電極電位VCOM を6.0
[V]とし、ゲ−ト線の本数を480本とした。このよ
うに構成された液晶表示装置では、以下の如く電源電位
1 ,V2 を設定することで、スイッチングノイズを除
去できる。
Further, the high power supply potential V CSH and the low potential power supply V
The CSL is set as in the case of the previous embodiment. In this embodiment, the high power source potential V CSH and the low potential power source V CSL are set to 6 [V] and 2.5 [V], respectively, the gate pulse signal amplitude is 26 [V], and the counter electrode potential V COM is 6 [V]. .0
[V] and the number of gate lines was 480. In the liquid crystal display device thus configured, switching noise can be eliminated by setting the power supply potentials V 1 and V 2 as follows.

【0038】ゲ−ト線G1 (ゲ−ト線G2 )に選択電位
が印加されると、薄膜トランジスタT1a(T1b),T1c
がオンになる。薄膜トランジスタT1cがオンになると、
薄膜トランジスタT1eのゲ−トに電源電位V2 が印加さ
れる。このとき、先の実施例のように、低電源電位CSL
だけを蓄積容量体CS11 に印加する必要がある。したが
って、薄膜トランジスタT1eがオンにならいように電源
電位V2 を設定する。
When a selection potential is applied to the gate line G 1 (gate line G 2 ), the thin film transistors T 1a (T 1b ) and T 1c are formed.
Turns on. When the thin film transistor T 1c is turned on,
The power supply potential V 2 is applied to the gate of the thin film transistor T 1e . At this time, as in the previous embodiment, the low power supply potential CSL
Need only be applied to the storage capacitor C S11 . Therefore, the power supply potential V 2 is set so that the thin film transistor T 1e does not turn on.

【0039】一方、ゲ−ト線G1 及びゲ−ト線G2 に非
選択電位が印加されると、薄膜トランジスタT1a
1b,T1c,T1dがオフとなる。この結果、抵抗体R1e
を介して電源電位V2 が薄膜トランジスタT1eのゲ−ト
に印加される。このとき、先の実施例のように、蓄積容
量体CS11 に高電源電位VCSH を印加する必要がある。
したがって、薄膜トランジスタT1eがオンになるように
電源電位V1 を設定する。
On the other hand, when a non-selection potential is applied to the gate lines G 1 and G 2 , the thin film transistors T 1a ,
T 1b , T 1c and T 1d are turned off. As a result, the resistor R 1e
The power supply potential V 2 is applied to the gate of the thin film transistor T 1e via the. At this time, it is necessary to apply the high power supply potential V CSH to the storage capacitor C S11 as in the previous embodiment.
Therefore, the power supply potential V 1 is set so that the thin film transistor T 1e is turned on.

【0040】上記の如く電源電位V1 ,V2 を設定すれ
ば、ゲ−ト線G2 の電位が選択電位から非選択電位に変
わるときに、バスラインB1 を介して蓄積容量体CS11
に先の実施例と同じ補償パルス信号を印加できるので、
スイッチングノイズを除去できる。本実施例では電源電
位V1 を12[V],電源電位V2 を0.0[V]とし
た。
By setting the power supply potentials V 1 and V 2 as described above, when the potential of the gate line G 2 changes from the selected potential to the non-selected potential, the storage capacitor C S11 via the bus line B 1
Since the same compensation pulse signal as in the previous embodiment can be applied to
Switching noise can be removed. In this embodiment, the power supply potential V 1 is 12 [V] and the power supply potential V 2 is 0.0 [V].

【0041】更に、本実施例では、抵抗体として薄膜ト
ランジスタを用いたので補償パルス信号の立ち上がりや
立ち下がりを改善できる。これは薄膜トランジスタのオ
ン抵抗が小さいからである。
Further, in this embodiment, since the thin film transistor is used as the resistor, the rising and falling of the compensation pulse signal can be improved. This is because the ON resistance of the thin film transistor is small.

【0042】また、本実施例でも補償パルス発生回路の
薄膜トランジスタとスイッチング素子としての薄膜トラ
ンジスタとを同一のゲ−トパルス信号で駆動できるので
先の実施例と同様に実用上十分な信頼性を得ることがで
きる。
Also in this embodiment, since the thin film transistor of the compensating pulse generating circuit and the thin film transistor as the switching element can be driven by the same gate pulse signal, practically sufficient reliability can be obtained as in the previous embodiment. it can.

【0043】なお、薄膜トランジスタT1e,T2e,…
は、ほとんどの時間オン状態となるが、そのゲ−ト電圧
を12[V](=V2 ),ソ−ス電圧(=VCSH )を
6.0[V]としてあるので、ゲ−ト・ソ−ス間電圧V
GSは12−6.0=6.0[V]と極めて低い値とな
る。しきい値電圧の変動量ΔVTHは、VGS n (n=2〜
3)に比例するので、ゲ−ト・ソ−ス間電圧VGSが6.
0[V]の場合、膜トランジスタTXYがオン状態のゲ−
ト電圧25[V]に比べバイアス電圧が十分小さいた
め、長時間使用しても実用上問題は生じない。
The thin film transistors T 1e , T 2e , ...
Is turned on most of the time, but its gate voltage is 12 [V] (= V 2 ) and source voltage (= V CSH ) is 6.0 [V]. .Source voltage V
GS has an extremely low value of 12-6.0 = 6.0 [V]. The variation amount ΔV TH of the threshold voltage is V GS n (N = 2
Since it is proportional to 3), the gate-source voltage V GS is 6.
In the case of 0 [V], the film transistor T XY is in the ON state.
Since the bias voltage is sufficiently smaller than the operating voltage of 25 [V], there is no practical problem even if it is used for a long time.

【0044】本発明者等は、70℃,1000時間の動
作での薄膜トランジスタT1eのしきい値電圧の変動量Δ
THを調べたところ、その値は3.0[V]と低く、十
分な信頼性が得られることを確認した。
The inventors of the present invention have found that the threshold voltage variation Δ of the thin film transistor T 1e during the operation at 70 ° C. for 1000 hours.
When V TH was examined, the value was as low as 3.0 [V], and it was confirmed that sufficient reliability was obtained.

【0045】なお、動作の安定化を図るために、薄膜ト
ランジスタTXeのゲ−トに接続された薄膜トランジスタ
XC,TXDの共通ドレインと電源電位V1 又は電源電位
2との間にキャパシタを設けても良い。
In order to stabilize the operation, a capacitor is provided between the common drain of the thin film transistors T XC and T XD connected to the gate of the thin film transistor T Xe and the power supply potential V 1 or the power supply potential V 2. It may be provided.

【0046】なお、本発明は上述した実施例に限定され
るものではない。例えば、上記実施例では、バスライン
1 ,B2 ,…への補償パルスが2レベルの場合につい
て説明したが、本実施例は3レベル以上の多レベルの場
合にも適用できる。この場合、補償パルス発生回路を複
数個設ければよい。また、スイッチングノイズの補償パ
ルス信号以外の電気信号の発生も可能である。その他、
本発明の要旨を逸脱しない範囲で、種々変形して実施で
きる。
The present invention is not limited to the above embodiment. For example, in the above embodiment, the case where the compensation pulse to the bus lines B 1 , B 2 , ... Has two levels has been described, but this embodiment can be applied to the case of multiple levels of three levels or more. In this case, a plurality of compensation pulse generation circuits may be provided. It is also possible to generate an electrical signal other than the switching noise compensation pulse signal. Other,
Various modifications can be made without departing from the scope of the present invention.

【0047】[0047]

【発明の効果】以上詳述したように本発明によれば、装
置の複雑化や大型化を招くこと無く、液晶層の寄生容量
と蓄積容量体の容量とスイッチング素子としての薄膜ト
ランジスタのソ−ス・ドレイン間の寄生容量に起因する
スイッチングノイズを除去できるので、信頼性や表示性
能の高い液晶表示装置を得ることができる。
As described in detail above, according to the present invention, the parasitic capacitance of the liquid crystal layer, the capacitance of the storage capacitor, and the source of the thin film transistor as a switching element are not brought about without complicating or increasing the size of the device. -Since switching noise caused by parasitic capacitance between drains can be removed, a liquid crystal display device with high reliability and display performance can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例に係る液晶表示装置の要部構
成を示す等価回路図。
FIG. 1 is an equivalent circuit diagram showing a main configuration of a liquid crystal display device according to an embodiment of the present invention.

【図2】液晶表示装置の印加電圧波形を示す図。FIG. 2 is a diagram showing an applied voltage waveform of a liquid crystal display device.

【図3】抵抗体に代わりに薄膜トランジスタを用いた場
合の液晶表示装置の要部構成を示す等価回路図。
FIG. 3 is an equivalent circuit diagram showing a main configuration of a liquid crystal display device when a thin film transistor is used instead of a resistor.

【図4】本発明の他の実施例に係る液晶表示装置の要部
構成を示す等価回路図。
FIG. 4 is an equivalent circuit diagram showing a main configuration of a liquid crystal display device according to another embodiment of the present invention.

【図5】従来の液晶表示装置の要部構成を示す等回路
図。
FIG. 5 is an equivalent circuit diagram showing a configuration of a main part of a conventional liquid crystal display device.

【図6】従来の液晶表示装置の要部構成を示す等価回路
図。
FIG. 6 is an equivalent circuit diagram showing a main part configuration of a conventional liquid crystal display device.

【符号の説明】[Explanation of symbols]

1a,T1b,T1c,T1e,T11,T12,T21,T22…薄
膜トランジスタ、R1,R2 ,Re1,Re2…抵抗体、C
S11 ,CS12 ,CS21 ,CS22…蓄積容量体、LC11
LC12,LC21,LC22…液晶層、VCOM …対向電極電
位、VCSH…高電源電位、VCSL …低電位電源、V1
2 …電源電位。
T 1a , T 1b , T 1c , T 1e , T 11 , T 12 , T 21 , T 22 ... Thin film transistor, R 1 , R 2 , R e1 , R e2 ... Resistor, C
S11 , C S12 , C S21 , C S22 ... Storage capacitor, LC 11 ,
LC 12 , LC 21 , LC 22 ... Liquid crystal layer, V COM ... Counter electrode potential, V CSH ... High power supply potential, V CSL ... Low potential power supply, V 1 ,
V 2 ... Power supply potential.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】マトリクス配列された画素電極の電位によ
り液晶の配向が制御される液晶層と、 前記画素電極に
ソ−スが接続されたスイッチング素子としての薄膜トラ
ンジスタと、 同一行の前記薄膜トランジスタのゲ−トに接続されたゲ
−ト線と、 同一列の前記薄膜トランジスタのドレインに接続された
デ―タ線と、 ゲ−ト線間に設けられ且つ低電位電源に繋がったバスラ
インと、 このバスラインと前記画素電極との間に設けられた蓄積
容量体と、 前記バスラインに設けられ、共通ソ−スが前記低電位電
源に繋がれ、共通ドレインが前記蓄積容量体に接続さ
れ、2つのゲ−トがそれぞれ前記バスラインに隣接した
ゲ−ト線に接続された並列接続された薄膜トランジスタ
と、 一端がこの薄膜トランジスタの共通ドレインに接続さ
れ、他端が高電位電源に繋がった抵抗体とを有すること
を特徴とする液晶表示装置。
1. A liquid crystal layer in which the orientation of liquid crystal is controlled by the potentials of pixel electrodes arranged in a matrix, a thin film transistor as a switching element having a source connected to the pixel electrode, and a thin film transistor of the thin film transistors in the same row. A gate line connected to the gate, a data line connected to the drains of the thin film transistors in the same column, a bus line provided between the gate lines and connected to a low potential power supply, A storage capacitor provided between a line and the pixel electrode; and a bus line, a common source connected to the low-potential power supply, and a common drain connected to the storage capacitor. The gates are connected in parallel to the gate lines adjacent to the bus lines and connected in parallel. One end is connected to the common drain of the thin film transistor and the other end is connected to the high drain. A liquid crystal display device, comprising: a resistor connected to a potential power source.
JP23291891A 1991-09-12 1991-09-12 Liquid crystal display Expired - Fee Related JP3135627B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23291891A JP3135627B2 (en) 1991-09-12 1991-09-12 Liquid crystal display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23291891A JP3135627B2 (en) 1991-09-12 1991-09-12 Liquid crystal display

Publications (2)

Publication Number Publication Date
JPH0572995A true JPH0572995A (en) 1993-03-26
JP3135627B2 JP3135627B2 (en) 2001-02-19

Family

ID=16946881

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23291891A Expired - Fee Related JP3135627B2 (en) 1991-09-12 1991-09-12 Liquid crystal display

Country Status (1)

Country Link
JP (1) JP3135627B2 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6144042A (en) * 1998-06-25 2000-11-07 Hyundai Electronics Industries Co., Ltd. Polysilicon thin film transistor
US6191831B1 (en) 1998-06-30 2001-02-20 Hyundai Electronics Industries Co., Ltd. LCD having a pair of TFTs in each unit pixel with a common source electrode
JP2006011392A (en) * 2004-05-21 2006-01-12 Sanyo Electric Co Ltd Display device
JP2006011394A (en) * 2004-05-21 2006-01-12 Sanyo Electric Co Ltd Display device
JP2006220947A (en) * 2005-02-10 2006-08-24 Sharp Corp Active matrix type display device and driving circuit thereof in scanning side
US7646370B2 (en) 2004-05-21 2010-01-12 Sanyo Electric Co., Ltd. Display device
US7652649B2 (en) * 2005-06-15 2010-01-26 Au Optronics Corporation LCD device with improved optical performance
WO2016188036A1 (en) * 2015-05-26 2016-12-01 京东方科技集团股份有限公司 Array substrate and display device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6144042A (en) * 1998-06-25 2000-11-07 Hyundai Electronics Industries Co., Ltd. Polysilicon thin film transistor
US6391693B1 (en) 1998-06-25 2002-05-21 Hyundai Display Technology Inc. Method for making polysilicon thin film transistor having multiple gate electrodes
US6191831B1 (en) 1998-06-30 2001-02-20 Hyundai Electronics Industries Co., Ltd. LCD having a pair of TFTs in each unit pixel with a common source electrode
JP2006011392A (en) * 2004-05-21 2006-01-12 Sanyo Electric Co Ltd Display device
JP2006011394A (en) * 2004-05-21 2006-01-12 Sanyo Electric Co Ltd Display device
US7646370B2 (en) 2004-05-21 2010-01-12 Sanyo Electric Co., Ltd. Display device
US7696960B2 (en) * 2004-05-21 2010-04-13 Sanyo Electric Co., Ltd. Display device
JP2006220947A (en) * 2005-02-10 2006-08-24 Sharp Corp Active matrix type display device and driving circuit thereof in scanning side
US7652649B2 (en) * 2005-06-15 2010-01-26 Au Optronics Corporation LCD device with improved optical performance
WO2016188036A1 (en) * 2015-05-26 2016-12-01 京东方科技集团股份有限公司 Array substrate and display device
US10078251B2 (en) 2015-05-26 2018-09-18 Boe Technology Group Co., Ltd. Array substrate and display apparatus

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