JPH0568054B2 - - Google Patents

Info

Publication number
JPH0568054B2
JPH0568054B2 JP10830184A JP10830184A JPH0568054B2 JP H0568054 B2 JPH0568054 B2 JP H0568054B2 JP 10830184 A JP10830184 A JP 10830184A JP 10830184 A JP10830184 A JP 10830184A JP H0568054 B2 JPH0568054 B2 JP H0568054B2
Authority
JP
Japan
Prior art keywords
electrode
electron beam
thick plate
hole
plate material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP10830184A
Other languages
Japanese (ja)
Other versions
JPS60253128A (en
Inventor
Minoru Yabe
Kenichi Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10830184A priority Critical patent/JPS60253128A/en
Publication of JPS60253128A publication Critical patent/JPS60253128A/en
Publication of JPH0568054B2 publication Critical patent/JPH0568054B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明はカラー受像管用インライン形電子銃の
電極の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a method of manufacturing an electrode for an in-line electron gun for a color picture tube.

〔発明の背景〕[Background of the invention]

一般にカラー受像管用電子銃の電極のレンズ口
径は、フオーカス特性に大きく影響し、好適なフ
オーカス特性を得るにはレンズ口径を可能な限り
大きくすることが望ましい。
In general, the lens aperture of the electrode of an electron gun for a color picture tube greatly affects the focus characteristics, and it is desirable to make the lens aperture as large as possible in order to obtain suitable focus characteristics.

第2図は従来のバイポテンシヤル集束方式のイ
ンライン形電子銃の一例を示す要部断面図であ
る。1A,1B,1Cはそれぞれ3本の電子ビー
ムA,B,Cを頂面から放射するカソード、2は
電子ビームA,B,Cを制御する制御電極、3は
電子ビームA,B,Cを加速させる加速電極、4
は電子ビームA,B,Cを集束させる下部集束電
極であり、前記各電極2,3,4はそれぞれ3本
の電子ビームA,B,Cの電子ビーム通過穴2
A,2B,2C,3A,3B,3Cおよび4A,
4B,4Cを有する。5は上部集束電極、6は陽
極であり、上部集束電極5と陽極6とはそれぞれ
底面に対向して設けられた3個の絞り穴5A,5
B,5Cと6A,6B,6Cとで3本の電子ビー
ムA,B,Cに対応する3個の電極を形成してい
る。7はコンバーゼンス電極である。
FIG. 2 is a sectional view of a main part of an example of a conventional bipotential focusing type in-line electron gun. 1A, 1B, and 1C are cathodes that emit three electron beams A, B, and C from their top surfaces, 2 is a control electrode that controls electron beams A, B, and C, and 3 is a control electrode that controls electron beams A, B, and C. accelerating electrode, 4
is a lower focusing electrode that focuses the electron beams A, B, and C, and each of the electrodes 2, 3, and 4 has an electron beam passage hole 2 for the three electron beams A, B, and C, respectively.
A, 2B, 2C, 3A, 3B, 3C and 4A,
It has 4B and 4C. Reference numeral 5 indicates an upper focusing electrode, and 6 indicates an anode.
B, 5C and 6A, 6B, 6C form three electrodes corresponding to the three electron beams A, B, C. 7 is a convergence electrode.

そこで、3個のカソード1A,1B,1Cに与
える信号電位よつてそれぞれの電子ビーム量が制
御された3本の電子ビームA,B,Cは、加速電
極3と下部集束電極4との対向した各穴間で形成
されるプリフオーカスレンズで若干の集束作用を
受けた後、上部集束電極5と陽極6とで形成され
るそれぞれの電極によつて、図示しない受像管の
螢光面で結像するように集束作用を受ける。同時
に両側の電子ビームA,Cは陽極6の電子ビーム
通過穴6A,6Cを、上部集束電極5の電子ビー
ム通過穴5A,5Cに対して外側に微小偏心させ
る公知の手段によつて角度θの傾斜を与え、3本
の電子ビームA,B,Cを一点にコンバーゼンス
させる。
Therefore, the three electron beams A, B, and C, whose amounts are controlled by the signal potentials applied to the three cathodes 1A, 1B, and 1C, are placed between the accelerating electrode 3 and the lower focusing electrode 4 facing each other. After receiving a slight focusing effect from the prefocus lens formed between each hole, the light is focused on the fluorescent surface of the picture tube (not shown) by the respective electrodes formed by the upper focusing electrode 5 and the anode 6. It is focused like an image. At the same time, the electron beams A and C on both sides are deflected at an angle θ by known means of slightly eccentrically eccentricizing the electron beam passage holes 6A and 6C of the anode 6 outward with respect to the electron beam passage holes 5A and 5C of the upper focusing electrode 5. A tilt is applied to make the three electron beams A, B, and C converge at one point.

第3図は上部集束電極5の上面を示す平面図で
ある。直径Dの3個の電子ビーム通過穴5A,5
B,5Cはそれぞれ間隔Sで一直線上にインライ
ン状に配列されている。
FIG. 3 is a plan view showing the upper surface of the upper focusing electrode 5. FIG. Three electron beam passing holes 5A, 5 with diameter D
B and 5C are arranged in a straight line with an interval S between them.

ところで、受像管の螢光面上での結像点の大き
さ、すなわちフオーカス特性は、画像の解鋭度を
左右するため、可能な限り小さくすることが望ま
しく、またフオーカス特性の向上には一般に電極
の口径を大きくすることが行なわれている。そこ
で、電極の口径を拡大するには電子ビーム通過穴
5A,5B,5Cの直径Dを大きくする必要があ
る。
By the way, the size of the image point on the fluorescent surface of the picture tube, that is, the focus characteristics, affects the sharpness of the image, so it is desirable to make it as small as possible. Efforts have been made to increase the diameter of the electrode. Therefore, in order to enlarge the diameter of the electrode, it is necessary to increase the diameter D of the electron beam passage holes 5A, 5B, and 5C.

しかし、厚さが約0.3mmの非磁性金属、例えば
ステンレス鋼板をプレス加工して形成する上部集
束電極5の電子ビーム通過穴5A,5B,5C
は、陽極6との耐電圧特性改良のため、絞り穴構
造とする必要がある。さらに電極電界の回転対称
性の劣化防止には絞り深さlを穴の直径Dの1/2
以上必要とするため、部品加工上の問題から直径
Dは穴間隔Sよりも0.8〜1.0mm小さい寸法に制約
される。また穴間隔Sを大きくすることは、受像
管動作時の螢光面各点でのコンバーゼンス誤差が
大きくなることおよび電極を形成する上部集束電
極5と陽極6との水平方向の寸法が大きくなつて
電子銃が収容されるバルブネツクを内壁に近接し
て耐電圧特性が劣化するという問題があつた。
However, the electron beam passing holes 5A, 5B, and 5C of the upper focusing electrode 5 are formed by pressing a non-magnetic metal, such as a stainless steel plate, with a thickness of about 0.3 mm.
In order to improve the withstand voltage characteristics with the anode 6, it is necessary to have an aperture hole structure. Furthermore, to prevent deterioration of the rotational symmetry of the electrode electric field, the drawing depth l should be set to 1/2 of the hole diameter D.
Because of the above requirements, the diameter D is limited to a size smaller than the hole spacing S by 0.8 to 1.0 mm due to problems in parts processing. Increasing the hole spacing S also increases the convergence error at each point on the fluorescent surface during operation of the picture tube, and increases the horizontal dimension of the upper focusing electrode 5 and the anode 6 that form the electrodes. There was a problem in that when the valve neck in which the electron gun was housed was placed close to the inner wall, the withstand voltage characteristics deteriorated.

また良好なフオーカス特性を得るためには、電
子ビーム通過穴5A,5B,5Cの真円度誤差
(長径−短径)は穴径Dの約0.5%以下が望ましい
とされている。このため、電子銃の組立は、各々
の電子ビーム通過穴を貫通する3本の芯金を備え
た治具(図示せず)上に各電極を保持し、加熱し
たマルチフオームガラス8を支持体9に圧着して
行なわれる。この場合、3本の芯金は各電極部品
の穴ピツチSおよび穴径Dに誤差があるため、穴
径Dよりも0.02〜0.03mm程度細く設定される。し
たがつて、各電極部品製作時の誤差およびマルチ
フオームガラス8の圧着時の応力によつてカツプ
状本体の変形が絞り穴で形成される電子ビーム通
過穴5A,5B,5Cに波及して治具から取り外
した状態で測定した真円度誤差は極端は場合には
約0.05mm、つまり穴径D=3.9mmの場合約1.3%に
達することがある。このように真円度の低下によ
り主レンズの電極が歪むことによつて電子ビーム
に非点収差が生じ、フオーカス特性が損なわれ
る。
Furthermore, in order to obtain good focus characteristics, it is said that the roundness error (major axis - minor axis) of the electron beam passing holes 5A, 5B, and 5C is desirably about 0.5% or less of the hole diameter D. Therefore, to assemble the electron gun, each electrode is held on a jig (not shown) equipped with three core metals passing through each electron beam passage hole, and heated multiform glass 8 is placed on a support. 9. In this case, the three core metals are set to be approximately 0.02 to 0.03 mm thinner than the hole diameter D since there is an error in the hole pitch S and hole diameter D of each electrode component. Therefore, the deformation of the cup-shaped body due to errors in manufacturing each electrode component and stress during crimping of the multiform glass 8 spreads to the electron beam passage holes 5A, 5B, and 5C formed by the aperture holes, and is cured. In extreme cases, the roundness error measured when removed from the tool can reach approximately 0.05 mm, that is, approximately 1.3% when the hole diameter D = 3.9 mm. As described above, the electrode of the main lens is distorted due to the decrease in roundness, which causes astigmatism in the electron beam, impairing focus characteristics.

〔発明の目的〕[Purpose of the invention]

本発明の目的は、電極口径を拡大するとともに
電極の精度を向上させ、フオーカス特性を向上さ
せた電子銃用電極の製造方法を提供することにあ
る。
An object of the present invention is to provide a method for manufacturing an electrode for an electron gun, which increases the electrode diameter, improves the accuracy of the electrode, and improves the focus characteristics.

〔発明の概要〕[Summary of the invention]

本発明は、上記目的を達成するために、厚板素
材にインライン状の3つの電子ビーム通過穴に相
当する箇所にそれぞれ所定のコイニング下穴を形
成し、次いで厚板素材の一方の面に所望とする深
さの凹面を形成し、その後厚板素材の外形を所定
寸法より大きい外形に打抜き加工し、続いて前記
コイニング下穴の箇所に該コイニング下穴より大
きく所定寸法より小さい内径に打抜き加工し、次
に厚板の両面を平面ならしをし、最後に外形及び
3個の電子ビーム通過穴を所定寸法にシエービン
グ加工することを特徴とする。
In order to achieve the above object, the present invention forms predetermined coining pilot holes in a thick plate material at locations corresponding to three inline electron beam passage holes, and then forms desired coining pilot holes on one side of the thick plate material. forming a concave surface with a depth of, then punching the outer shape of the thick plate material into an outer shape larger than a predetermined dimension, and then punching the area of the coining pilot hole to have an inner diameter larger than the coining pilot hole and smaller than the predetermined dimension. Next, both sides of the thick plate are flattened, and finally, the outer shape and three electron beam passage holes are shaved to predetermined dimensions.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の一実施例を第1図により説明す
る。まず同図aに示すように、厚さ約2mmの厚板
素材10に3個の電子ビーム通過穴に相当する箇
所にそれぞれ所定のコイニング下穴11を形成す
る。この場合、これらの下穴11は次の工程で凹
面にコイニング加工するためのコイニング加工力
の低減および高精度の凹面を形成することを目的
としている。したがつて、これらの下穴11の穴
形状は図示の実施例では円穴としているが、円穴
以外の他の形状の穴でもよい。
An embodiment of the present invention will be described below with reference to FIG. First, as shown in FIG. 1A, predetermined coining pilot holes 11 are formed in a thick plate material 10 having a thickness of about 2 mm at locations corresponding to three electron beam passage holes. In this case, the purpose of these prepared holes 11 is to reduce the coining force for coining a concave surface in the next step and to form a highly accurate concave surface. Therefore, although the hole shapes of these prepared holes 11 are circular holes in the illustrated embodiment, they may have other shapes than circular holes.

次に同図bに示すように、厚板素材10の一方
の面に所定の楕円状の凹面とほぼ同形状の楕円状
の凹面12をコイニング加工によつて形成する。
その後同図cに示すように、厚板素材の外形を所
定寸法より大きい外形に打抜き加工して長円形厚
板状電極13を形成する。引き続き3個の電子ビ
ーム通過穴に相当する箇所に前記コイニング下穴
11より大きく所定寸法より小さい内径の打抜き
穴を打抜き加工する。この場合、両サイドの打抜
き穴と外形とのブリツジ部Rには板厚減少及びね
じれによる変形が生じ、この部分の平面度が著し
く低下する。これを矯正するために、次に長円形
厚板の両面に平面ならしを施す。この平面ならし
は、厚板の外形及び楕円凹面を拘束しながらプレ
ス金型などの方法により施される。最後に、同図
dに示すように、長円形厚板の外形及び3個の電
子ビーム通過穴14A,14B,14Cをそれぞ
れ所定寸法にシエービング加工して電子銃用電極
15を完成する。
Next, as shown in Figure b, an elliptical concave surface 12 having substantially the same shape as a predetermined elliptical concave surface is formed on one surface of the thick plate material 10 by coining.
Thereafter, as shown in FIG. 3C, the outer shape of the thick plate material is punched out to have an outer shape larger than a predetermined size to form an oval thick plate electrode 13. Subsequently, punched holes having an inner diameter larger than the coining pilot hole 11 and smaller than a predetermined size are punched at locations corresponding to the three electron beam passage holes. In this case, the bridge portion R between the punched hole on both sides and the outer shape is deformed due to a reduction in plate thickness and twisting, and the flatness of this portion is significantly reduced. In order to correct this, both sides of the oblong plank are then leveled. This flattening is performed by a method such as a press mold while constraining the outer shape and elliptical concave surface of the thick plate. Finally, as shown in Figure d, the outer shape of the oblong thick plate and the three electron beam passage holes 14A, 14B, 14C are each shaved to predetermined dimensions to complete the electron gun electrode 15.

このように、電極の強度を確保する為に、例え
ば約2mmの厚板素材を使用しても、コイニング加
工、打抜き加工及びシエービング加工を本発明の
如く組合せることにより、隣接する二つの電子ビ
ーム通過穴の間に設けなければならないブリツジ
幅を、素材厚の1/4程度、例えば約2mmの素材厚
の場合0.5mm程度まで狭くかつ高精度に形成する
ことが出来るので、電子ビーム通過穴の穴間隔が
従来通りであつてもブリツジ幅を従来より細く形
成した分電子ビーム通過穴の直径を拡大出来る。
従来のプレス加工による絞り穴構造を形成した場
合は、前述した様にブリツジ幅を0.8〜1.0mmにせ
ねばならなかつた。さらに電子ビーム通過穴は、
電子ビーム通過穴が並ぶインライン方向及び中央
電子ビーム通過穴を通りこのインラインに垂直な
方向の双方に関して対称にコイニング加工で形成
された凹面上に形成されているので、電子ビーム
通過孔から電極周辺に行くに従つて電極肉厚が増
加するので、従来の一様な厚みの電極の場合に比
し、電極の変形が少なく電子ビーム通過穴の真円
度が大幅に向上し、フオーカス特性が改善され
る。
In this way, in order to ensure the strength of the electrode, even if a thick plate material of approximately 2 mm is used, by combining coining, punching, and shaving as in the present invention, two adjacent electron beams can be The bridge width that must be provided between the electron beam passing holes can be formed narrowly and with high precision to about 1/4 of the material thickness, for example, about 0.5 mm for a material thickness of about 2 mm. Even if the hole spacing is the same as before, the diameter of the electron beam passing hole can be expanded by making the bridge width narrower than before.
When a drawing hole structure is formed by conventional press working, the bridge width must be set to 0.8 to 1.0 mm, as described above. Furthermore, the electron beam passage hole is
It is formed on a concave surface formed by coining symmetrically with respect to both the inline direction in which the electron beam passage holes are lined up and the direction perpendicular to this inline through the central electron beam passage hole, so that there is As the electrode thickness increases as it goes, the electrode deforms less and the roundness of the electron beam passage hole is significantly improved compared to conventional electrodes with a uniform thickness, resulting in improved focus characteristics. Ru.

さらに電子ビーム通過穴の直径を拡大するに際
し電極外径を大きくする必要がないので、電極外
径をバルブ内径に過度に近接させる必要がないの
で耐電圧特性が劣化するという問題も生じない。
Furthermore, since there is no need to increase the outer diameter of the electrode when enlarging the diameter of the electron beam passage hole, there is no need to make the outer diameter of the electrode excessively close to the inner diameter of the bulb, so there is no problem of deterioration of withstand voltage characteristics.

〔発明の効果〕〔Effect of the invention〕

以上の説明から明らかなように、本発明になる
電子銃用電極の製造方法によれば、耐電圧特性を
損うことなしに電極口径を拡大することができ、
また電極口径の真円度も向上し、フオーカス特性
を向上できる電子銃用電極が得られる。
As is clear from the above description, according to the method of manufacturing an electrode for an electron gun according to the present invention, the electrode diameter can be expanded without impairing the withstand voltage characteristics.
Further, the roundness of the electrode diameter is improved, and an electrode for an electron gun with improved focus characteristics can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a,b,c,dは本発明になる電子銃用
電極の製造方法の一実施例の工程説明を示す平面
及び断面図、第2図は従来のインライン形電子銃
の要部断面図、第3図は第2図の上部集束電極の
平面図である。 10……厚板素材、11……コイニング下穴、
12……凹面、13……長円形厚板状電極、14
A,14B,14C……電子ビーム通過穴、15
……電子銃用電極。
Figures 1a, b, c, and d are plan and cross-sectional views showing a process explanation of an embodiment of the method for manufacturing an electrode for an electron gun according to the present invention, and Figure 2 is a cross-sectional view of a main part of a conventional in-line electron gun. FIG. 3 is a plan view of the upper focusing electrode of FIG. 2. 10...Thick plate material, 11...Coining pilot hole,
12...Concave surface, 13...Oval thick plate electrode, 14
A, 14B, 14C...Electron beam passing hole, 15
... Electrode for electron gun.

Claims (1)

【特許請求の範囲】 1 厚板素材にインライン状の3個の電子ビーム
通過穴に相当する箇所にそれぞれ所定のコイニン
グ下穴を形成する工程と、 前記厚板素材の一方の面に、所定の深さを有
し、所定の幅および長さからなる面積に亘る、前
記3個の電子ビーム通過穴のうちの中央に位置す
る電子ビーム通過穴を通り前記インラインに垂直
な直線および前記インラインの双方に関し対称な
凹面をコイニングにより形成する工程と、 前記厚板素材を、前記凹面部を内部に含めた最
終電子銃電極寸法により大きい外形に打抜き加工
する工程と、 前記コイニング下穴の箇所を該コイニング下穴
より大きく前記電子ビーム通過穴の最終寸法より
小さい内径に打抜き加工する工程と、 次いで前記厚板素材の両面を平面ならしする工
程と、 前記厚板素材を前記凹面部を内部に含めた前記
最終電子銃電極の外形に、又前記3個の電子ビー
ム通過穴を前記最終寸法にシエービング加工する
工程とからなる電子銃用電極の製造方法。
[Claims] 1. A step of forming predetermined coining pilot holes in a thick plate material at locations corresponding to three inline electron beam passage holes, and forming a predetermined coining hole on one side of the thick plate material. Both a straight line perpendicular to the inline and a straight line passing through the electron beam passing hole located at the center of the three electron beam passing holes and extending over an area having a depth and having a predetermined width and length; forming a symmetrical concave surface by coining; punching the thick plate material into a larger external shape according to the final electron gun electrode dimensions including the concave surface portion; a step of punching to an inner diameter larger than the prepared hole and smaller than the final dimension of the electron beam passage hole, a step of smoothing both sides of the thick plate material, and a step of making the thick plate material include the concave portion inside. A method of manufacturing an electrode for an electron gun, comprising the step of shaving the three electron beam passage holes to the outer shape of the final electron gun electrode and the final dimensions.
JP10830184A 1984-05-30 1984-05-30 Manufacture of electrode for electron gun Granted JPS60253128A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10830184A JPS60253128A (en) 1984-05-30 1984-05-30 Manufacture of electrode for electron gun

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10830184A JPS60253128A (en) 1984-05-30 1984-05-30 Manufacture of electrode for electron gun

Publications (2)

Publication Number Publication Date
JPS60253128A JPS60253128A (en) 1985-12-13
JPH0568054B2 true JPH0568054B2 (en) 1993-09-28

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP10830184A Granted JPS60253128A (en) 1984-05-30 1984-05-30 Manufacture of electrode for electron gun

Country Status (1)

Country Link
JP (1) JPS60253128A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2554628B2 (en) * 1986-06-04 1996-11-13 株式会社東芝 Method for manufacturing plate-shaped electrode of electron gun for electron tube

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Publication number Publication date
JPS60253128A (en) 1985-12-13

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