JPH0564629B2 - - Google Patents
Info
- Publication number
- JPH0564629B2 JPH0564629B2 JP18486185A JP18486185A JPH0564629B2 JP H0564629 B2 JPH0564629 B2 JP H0564629B2 JP 18486185 A JP18486185 A JP 18486185A JP 18486185 A JP18486185 A JP 18486185A JP H0564629 B2 JPH0564629 B2 JP H0564629B2
- Authority
- JP
- Japan
- Prior art keywords
- alkali
- silicate
- chloride
- ppm
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 22
- -1 alkenyl halides Chemical class 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 18
- 239000003513 alkali Substances 0.000 claims description 15
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 claims description 10
- 150000003377 silicon compounds Chemical class 0.000 claims description 8
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims description 4
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 4
- 239000002734 clay mineral Substances 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000000741 silica gel Substances 0.000 claims description 4
- 229910002027 silica gel Inorganic materials 0.000 claims description 4
- 239000010457 zeolite Substances 0.000 claims description 4
- 229910021536 Zeolite Inorganic materials 0.000 claims description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims description 3
- 150000001350 alkyl halides Chemical class 0.000 claims description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 claims 2
- ZNJYPHFHDASPKV-UHFFFAOYSA-N phosphoric acid;zirconium(4+);silicate Chemical compound [Zr+4].OP(O)(O)=O.[O-][Si]([O-])([O-])[O-] ZNJYPHFHDASPKV-UHFFFAOYSA-N 0.000 claims 2
- 150000004760 silicates Chemical class 0.000 claims 2
- 229910000166 zirconium phosphate Inorganic materials 0.000 claims 1
- 238000000034 method Methods 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 16
- 238000006243 chemical reaction Methods 0.000 description 15
- 150000004820 halides Chemical class 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 150000002896 organic halogen compounds Chemical class 0.000 description 7
- GKKCIDNWFBPDBW-UHFFFAOYSA-M potassium cyanate Chemical compound [K]OC#N GKKCIDNWFBPDBW-UHFFFAOYSA-M 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 150000007973 cyanuric acids Chemical class 0.000 description 4
- 239000002274 desiccant Substances 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
- ZVCDLGYNFYZZOK-UHFFFAOYSA-M sodium cyanate Chemical compound [Na]OC#N ZVCDLGYNFYZZOK-UHFFFAOYSA-M 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 238000007086 side reaction Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 125000004434 sulfur atom Chemical group 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- FEWLNYSYJNLUOO-UHFFFAOYSA-N 1-Piperidinecarboxaldehyde Chemical compound O=CN1CCCCC1 FEWLNYSYJNLUOO-UHFFFAOYSA-N 0.000 description 2
- KDISMIMTGUMORD-UHFFFAOYSA-N 1-acetylpiperidine Chemical compound CC(=O)N1CCCCC1 KDISMIMTGUMORD-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- 239000003905 agrochemical Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000543 intermediate Substances 0.000 description 2
- LCEDQNDDFOCWGG-UHFFFAOYSA-N morpholine-4-carbaldehyde Chemical compound O=CN1CCOCC1 LCEDQNDDFOCWGG-UHFFFAOYSA-N 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000003880 polar aprotic solvent Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- IFABLCIRROMTAN-MDZDMXLPSA-N (e)-1-chlorooctadec-9-ene Chemical compound CCCCCCCC\C=C\CCCCCCCCCl IFABLCIRROMTAN-MDZDMXLPSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- PIBKGXNSYQOGKL-UHFFFAOYSA-N 1,3,5-tribenzyl-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC=2C=CC=CC=2)C(=O)N(CC=2C=CC=CC=2)C(=O)N1CC1=CC=CC=C1 PIBKGXNSYQOGKL-UHFFFAOYSA-N 0.000 description 1
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 description 1
- YHRUOJUYPBUZOS-UHFFFAOYSA-N 1,3-dichloropropane Chemical compound ClCCCCl YHRUOJUYPBUZOS-UHFFFAOYSA-N 0.000 description 1
- KJDRSWPQXHESDQ-UHFFFAOYSA-N 1,4-dichlorobutane Chemical compound ClCCCCCl KJDRSWPQXHESDQ-UHFFFAOYSA-N 0.000 description 1
- LBKDGROORAKTLC-UHFFFAOYSA-N 1,5-dichloropentane Chemical compound ClCCCCCCl LBKDGROORAKTLC-UHFFFAOYSA-N 0.000 description 1
- OVISMSJCKCDOPU-UHFFFAOYSA-N 1,6-dichlorohexane Chemical compound ClCCCCCCCl OVISMSJCKCDOPU-UHFFFAOYSA-N 0.000 description 1
- JEKYMVBQWWZVHO-UHFFFAOYSA-N 1-chloro-2,2-dimethylpropane Chemical compound CC(C)(C)CCl JEKYMVBQWWZVHO-UHFFFAOYSA-N 0.000 description 1
- NVLHGZIXTRYOKT-UHFFFAOYSA-N 1-chloro-2,3-dimethylbenzene Chemical compound CC1=CC=CC(Cl)=C1C NVLHGZIXTRYOKT-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- ZTEHOZMYMCEYRM-UHFFFAOYSA-N 1-chlorodecane Chemical compound CCCCCCCCCCCl ZTEHOZMYMCEYRM-UHFFFAOYSA-N 0.000 description 1
- YAYNEUUHHLGGAH-UHFFFAOYSA-N 1-chlorododecane Chemical compound CCCCCCCCCCCCCl YAYNEUUHHLGGAH-UHFFFAOYSA-N 0.000 description 1
- GTLWADFFABIGAE-UHFFFAOYSA-N 1-chloroethylbenzene Chemical compound CC(Cl)C1=CC=CC=C1 GTLWADFFABIGAE-UHFFFAOYSA-N 0.000 description 1
- DZMDPHNGKBEVRE-UHFFFAOYSA-N 1-chloroheptane Chemical compound CCCCCCCCl DZMDPHNGKBEVRE-UHFFFAOYSA-N 0.000 description 1
- CLWAXFZCVYJLLM-UHFFFAOYSA-N 1-chlorohexadecane Chemical compound CCCCCCCCCCCCCCCCCl CLWAXFZCVYJLLM-UHFFFAOYSA-N 0.000 description 1
- MLRVZFYXUZQSRU-UHFFFAOYSA-N 1-chlorohexane Chemical compound CCCCCCCl MLRVZFYXUZQSRU-UHFFFAOYSA-N 0.000 description 1
- RKAMCQVGHFRILV-UHFFFAOYSA-N 1-chlorononane Chemical compound CCCCCCCCCCl RKAMCQVGHFRILV-UHFFFAOYSA-N 0.000 description 1
- VUQPJRPDRDVQMN-UHFFFAOYSA-N 1-chlorooctadecane Chemical compound CCCCCCCCCCCCCCCCCCCl VUQPJRPDRDVQMN-UHFFFAOYSA-N 0.000 description 1
- CNDHHGUSRIZDSL-UHFFFAOYSA-N 1-chlorooctane Chemical compound CCCCCCCCCl CNDHHGUSRIZDSL-UHFFFAOYSA-N 0.000 description 1
- NKNYZKFBNQUWTM-UHFFFAOYSA-N 1-chloropent-1-ene Chemical compound CCCC=CCl NKNYZKFBNQUWTM-UHFFFAOYSA-N 0.000 description 1
- SQCZQTSHSZLZIQ-UHFFFAOYSA-N 1-chloropentane Chemical compound CCCCCCl SQCZQTSHSZLZIQ-UHFFFAOYSA-N 0.000 description 1
- ZHKKNUKCXPWZOP-UHFFFAOYSA-N 1-chloroundecane Chemical compound CCCCCCCCCCCCl ZHKKNUKCXPWZOP-UHFFFAOYSA-N 0.000 description 1
- KYWXRBNOYGGPIZ-UHFFFAOYSA-N 1-morpholin-4-ylethanone Chemical compound CC(=O)N1CCOCC1 KYWXRBNOYGGPIZ-UHFFFAOYSA-N 0.000 description 1
- MNNZINNZIQVULG-UHFFFAOYSA-N 2-chloroethylbenzene Chemical compound ClCCC1=CC=CC=C1 MNNZINNZIQVULG-UHFFFAOYSA-N 0.000 description 1
- PNLQPWWBHXMFCA-UHFFFAOYSA-N 2-chloroprop-1-ene Chemical compound CC(Cl)=C PNLQPWWBHXMFCA-UHFFFAOYSA-N 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- CAHQGWAXKLQREW-UHFFFAOYSA-N Benzal chloride Chemical compound ClC(Cl)C1=CC=CC=C1 CAHQGWAXKLQREW-UHFFFAOYSA-N 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- OWIKHYCFFJSOEH-UHFFFAOYSA-N Isocyanic acid Chemical class N=C=O OWIKHYCFFJSOEH-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 241000607479 Yersinia pestis Species 0.000 description 1
- YVBSAPDHRXHFHV-UHFFFAOYSA-N [chloro(methoxy)methyl]benzene Chemical compound COC(Cl)C1=CC=CC=C1 YVBSAPDHRXHFHV-UHFFFAOYSA-N 0.000 description 1
- NNIIQTJRTNNLKR-UHFFFAOYSA-N [chloro(phenoxy)methyl]benzene Chemical compound C=1C=CC=CC=1C(Cl)OC1=CC=CC=C1 NNIIQTJRTNNLKR-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- BTGRAWJCKBQKAO-UHFFFAOYSA-N adiponitrile Chemical compound N#CCCCCC#N BTGRAWJCKBQKAO-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- IGZGOSZOYWXTLI-UHFFFAOYSA-M cesium;cyanate Chemical compound [Cs+].[O-]C#N IGZGOSZOYWXTLI-UHFFFAOYSA-M 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- HRYZWHHZPQKTII-UHFFFAOYSA-N chloroethane Chemical compound CCCl HRYZWHHZPQKTII-UHFFFAOYSA-N 0.000 description 1
- YTKRILODNOEEPX-NSCUHMNNSA-N crotyl chloride Chemical compound C\C=C\CCl YTKRILODNOEEPX-NSCUHMNNSA-N 0.000 description 1
- 150000001913 cyanates Chemical class 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- OAGOUCJGXNLJNL-UHFFFAOYSA-N dimethylcyanamide Chemical compound CN(C)C#N OAGOUCJGXNLJNL-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- POMZBEGASDKMRR-UHFFFAOYSA-M lithium;cyanate Chemical compound [Li+].[O-]C#N POMZBEGASDKMRR-UHFFFAOYSA-M 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- IMNDHOCGZLYMRO-UHFFFAOYSA-N n,n-dimethylbenzamide Chemical compound CN(C)C(=O)C1=CC=CC=C1 IMNDHOCGZLYMRO-UHFFFAOYSA-N 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- LJZPPWWHKPGCHS-UHFFFAOYSA-N propargyl chloride Chemical compound ClCC#C LJZPPWWHKPGCHS-UHFFFAOYSA-N 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003623 transition metal compounds Chemical class 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Description
〔産業上の利用分野〕
本発明はイソシアヌレートの新規なる製造法に
関するものであり、可塑剤、農薬、合成中間体、
架橋剤、樹脂原料、耐熱性有機材料等として需要
の多いイソシアヌレートを収率よく大量に生産す
る改良法にかゝるものである。本発明の適用によ
つて、従来からのイソシアヌレート生産に伴なう
副生物の伴生を可及的に防止し工業生産を極めて
経済的に行ないうることができるようになつたの
ある。
〔従来の技術〕
有機ハロゲン化合物とシアン酸アルカリとを極
性非プロトン溶媒中で反応させイソシアヌレート
を生産する方法は本発明者らによつて発見され、
発展させられ技術的に完成されるに至つたもので
ある。以下その要点を順に示して説明する。
、シアヌール酸誘導体の製造法(日特公、昭36
−3985)は有機ハロゲン化合物とシアン酸アルカ
リとを窒素原子または硫黄原子を有する有機化合
物中で反応させる基本的な方法に関するものであ
る。、イソシアヌール酸エステルの製造法(日
特公、昭36−4376)は窒素原子または硫黄原子を
有する有機化合物中でイソシアネートを三量体化
してイソシアヌレートにする基本的な方法に関す
るものである。、イソシアヌール酸エステルの
製造法(日特公、昭40−6635)は窒素原子または
硫黄原子を有する有機化合物中でシアヌール酸
(またはその塩)と有機ハロゲン化合物とを反応
させる基本的方法に関するものである。、イソ
シアヌール酸トリエステルの精製法(日特公、昭
42−9345)は製品中の不純物をグリコールまたは
グリセリンで抽出除去する方法である。、イソ
シアヌール酸エステルの精製法(日特公、昭42−
12913)は製品中の不純物をハロゲン化水素酸水
溶液で分解除去する方法である。、イソシアン
酸誘導体の製造法(日特公、昭42−26766)はシ
アン酸アルカリと有機ハロゲン化合物とを反応さ
せるに際し第2金属塩を存在せしめる改良法に関
するものである。、イソシアヌル酸トリエステ
ルの製造法(日特公、昭47−14395)は粗生成物
を含む反応混合物をアルカリ性水溶液と加熱する
精製法に関するものである。、イソシアヌル酸
エステルの製造法(日特公、昭47−16308)は脂
肪族ハロゲン化合物とシアン酸アルカリとを酸ア
ミド中で反応させるに際し難溶性に遷移金属化合
物を存在させ収率を向上させる方法に関するもの
である。、イソシアヌル酸エステルの不純物除
去法(日特公、昭47−22588)は粗生成物をアン
モニアまたはアミンと接触させ精製する方法であ
る。、イソシアヌル酸トリアルリルの精製法
(日特公、昭48−26022)は粗生成物をホルマリン
およびアンモニアと接触させ精製する方法であ
る。、イソシアヌル酸トリエステルの製造法
(日特公開、昭55−40633)は有機ハロゲン化合物
とシアン酸アルカリとを反応させる系に亜硫酸
塩、亜リン酸塩を存在させ反応中の酸化的副反応
を防除して目的物の収率を向上させる方法に関す
るものである。
以上の各特許は代表的なものではあるが、これ
に関連する全特許は基本的なもの、改良法的なも
のの、精製法的なものを含めてそれぞれ実用的な
価値を有しているものである。しかしながらイソ
シアヌレートの合成に際して副反応を完全に防徐
することが完成されていず、それぞれ品位の良い
有機ハロゲン化合物、シアン酸アルカリおよび溶
媒を使用したとしても、目的物の収率は80〜95%
の間にあることが実験的あるいは工業的な規模の
実験から確かめられるに至つたのである。
〔発明が解決しようとする問題点〕
こゝにおいて本発明者らはイソシアヌレートの
製造法に関して詳細な研究を行ない、反応を促進
する水分量と副反応を惹起する水分量との間に微
妙な関係のあることをつき止め、有機ハロゲン化
合物とシアン酸アルカリとを極性非プロトン含窒
素溶媒中で反応させてイソシアヌレートを生成さ
せる為に必要な最適必要量の水分量を実験的に求
めることに成功し、本発明を完成するに至つたも
のである。そして本発明の技術を保守することに
よりイソシアヌレートを従来より格段に収率よく
取得できることを明らかにしたのである。
〔問題点を解決するための手段〕と〔作用〕
本発明者らはアルキルハライド、アルケニルハ
ライド、アルキニルハライドおよびアラルキルハ
ライドよりなる群からえらばれた少くとも一つの
ハロゲノメチル基を有する化合物(以下単にハラ
イドと称する)とシアン酸アルカリとを極性非プ
ロトン含窒素溶媒(以下単に溶媒と称す)中で反
応させるにあたり系中の水分含有量を10〜
200ppmに保持するときには、これ以外の水分含
有量下において反応させる場合に比して格段に目
的物の収率がすぐれていることを見いだしたので
ある。そして反応系中の水分含有量つまり反応溶
液中に溶出される水分量を10〜200ppmに保持す
るための手段としてシリカゲル、ケイ酸アルカ
リ、ゼオライト、脱水粘土鉱物、ケイ酸リン酸ジ
ルコニウムおよびケイ酸エステルよりなる群から
えらばれた少くとも一つのケイ素化合物を反応系
中に存在せしめるか、該ケイ素化合物の存在下に
おいて炭酸アルカリ、炭酸アルカリ土類金属、ア
ルカリ金属酸化物あるいはアルカリ土類金属酸化
物を共存させ反応を行なわせることもまた有効で
あることを認めたのである。
本発明にいうハライドとは一般に次のような化
学式で示される第一級ハロゲン化物である。
RCH2X(ただし式中Rは脂肪族炭化水素基ま
たは芳香族炭化水素基で、それらは飽和していた
も不飽和であつても差支えがなく、また若干の置
換基が含まれていても差支えがない。また、Xは
塩素原子、臭素原子または沃素原子のいずれかで
ある)
次に代表的なハライドを具体的に示す(こゝで
は塩化物のみを記載するが、勿論臭化物であつて
も、沃化物であつてもよく、またノルマル、シク
ロ、イソ、セカンダリー、オルト、メタ、パラ等
の接頭語は省略して記載する)。すなわち、塩化
メチル、塩化エチル、塩化プロピル、塩化ブチ
ル、塩化アミル、塩化ヘキシル、塩化ヘプチル、
塩化オクチル、塩化ノニル、塩化デシル、塩化ウ
ンデシル、塩化ラウリル、塩化セチル、塩化ステ
アリル、塩化アリル、塩化メタアリル、塩化クロ
チル、塩化イソプロペニル、塩化ブテニル、塩化
ペンテニル、塩化オレイル、塩化プロパルギル、
塩化ベンジル、塩化フエニルエチル、塩化メチル
ベンジル、塩化キシリル等がモノハロゲノメチル
基を有する汎用の化合物である。なお上記にいう
若干の置換基を含むハライドとしては、1,2−
ジクロルエタン、1,3−ジクロルプロパン、
1,4−ジクロルブタン、1,5−ジクロルペン
タン、1,6−ジクロルヘキサン、ネオペンチル
クロリド、クロルベンジルクロリド、メトキシベ
ンジルクロリド、ブチル・ヒドロキシベンジルク
ロリド、ジブチル・ヒドロキシベンジルクロリ
ド、キシリレンジクロリド、フエノキシベンジル
クロリドが代表的なものである。
シアン酸アルカリとはシアン酸リチウム、シア
ン酸ナトリウム、シアン酸カリウム、シアン酸セ
シウム等の単独もしくは混合物であり、工業的に
はシアン酸ナトリウムあるいはシアン酸カリウム
もしくはこれらを主成分とした5〜20重量%の炭
酸アルカリを混入した安価な製品が入手できるも
のである。
本発明にいう溶媒としてはジメチルホルムアミ
ド、ジエチルホルムアミド、ジメチルアセタミ
ド、N−メチルピロリドン、アセトニトリル、プ
ロピオニトリル、アジポニトリル、ベンゾニトリ
ル、ニトロメタン、ニトロエタン、ニトロベンゼ
ン、N−ホルミルピペリジン、N−アセチルピペ
リジン、N−ホルミルモルホリン、N−アセチル
モルホリン、N,N1−ジホルミルピペラジン、
N,N1−ジアセチルピペラジン、N,N−ジメ
チルベンズアミド、N,N−ジメチルベンゼンス
ルホアミド、テトラメチル尿素、ジメチルアミノ
シアナイド、ジメチルアニリン等のごとく極性が
高く解離し易い活性水素原子を有していない含窒
素溶剤の単独もしくはこれらの二種以上の混合物
あるいはこれらを70重量%以上含有する活性水素
不含の無水有機溶剤との混合物である。
さて、系中の水分含有量、つまり溶液中に溶出
される水分量が10〜200ppmに保持されているか
どうかは、反応混合物の上澄液もしくは蒸留物を
カール・フイツシヤー分析法で定量することによ
り知ることができる。水分に関連して最も重要な
ことは反応に用いる溶媒の精製についてである。
市販されている本発明に用いる溶媒というのは特
別に品位の悪いものを除き大体500ppm(0.05%)
〜1000ppm(0.1%)程度の水分を含んでいる。こ
の程度の水分は通常の溶剤としての使用目的には
充分であり、特に脱水が必要な場合には乾燥剤を
加えたのち蒸留精製される。代表的な溶媒である
ジメチルホルムアミド(DMR)の場合について
乾燥剤の種類と乾燥限度を測定するとともに溶媒
の分解具合をしらべた結果は次表のとおりであ
る。次表は水分700ppmのDMF1000mlに乾燥剤
100gを投入して3日間放置後、注意して蒸留し
たものを分析したものである。
[Industrial Application Field] The present invention relates to a new method for producing isocyanurate, which includes plasticizers, agricultural chemicals, synthetic intermediates,
This invention relates to an improved method for producing isocyanurate in high yield and in large quantities, which is in high demand as a crosslinking agent, resin raw material, heat-resistant organic material, etc. By applying the present invention, it has become possible to prevent as much as possible the production of by-products associated with conventional isocyanurate production, and to perform industrial production extremely economically. [Prior Art] A method for producing isocyanurate by reacting an organic halogen compound and an alkali cyanate in a polar aprotic solvent was discovered by the present inventors.
It has been developed and technically perfected. The main points will be shown and explained in order below. , Method for producing cyanuric acid derivatives (Nittokuko, 1962)
-3985) relates to a basic method of reacting an organic halogen compound and an alkali cyanate in an organic compound containing a nitrogen atom or a sulfur atom. , Method for Producing Isocyanuric Acid Esters (Nippon Tokko, 1984-4376) relates to a basic method of trimerizing isocyanate to form isocyanurate in an organic compound having a nitrogen or sulfur atom. , Process for the Production of Isocyanuric Acid Esters (Nippon Tokko, 1972-6635) relates to a basic method of reacting cyanuric acid (or its salt) with an organic halogen compound in an organic compound containing a nitrogen or sulfur atom. It is. , Purification method of isocyanuric acid triester (Nittokuko, Akira
42-9345) is a method for extracting and removing impurities in products using glycol or glycerin. , Purification method of isocyanuric acid ester (Nittokuko, 1972-
12913) is a method of decomposing and removing impurities in products using an aqueous solution of hydrohalic acid. , Method for Producing Isocyanic Acid Derivatives (Nippon Tokko, 1976-26766) relates to an improved method in which a second metal salt is present in the reaction between an alkali cyanate and an organic halogen compound. , Method for Producing Isocyanuric Acid Triesters (Nippon Tokuko, 14395/1982) relates to a purification method in which a reaction mixture containing a crude product is heated with an alkaline aqueous solution. , a method for producing isocyanuric acid esters (Nippon Tokko, 16308/1982) is a method in which a poorly soluble transition metal compound is present in the reaction of an aliphatic halogen compound and an alkali cyanate in an acid amide to improve the yield. It is related to. , A method for removing impurities from isocyanuric acid ester (Nippon Tokuko, 1972-22588) is a method of purifying the crude product by contacting it with ammonia or amine. , A method for purifying triallyl isocyanurate (Nippon Tokko, 1972-26022) is a method for purifying a crude product by contacting it with formalin and ammonia. , a method for producing isocyanuric acid triester (Japanese Patent Publication, 1984-40633) involves the presence of sulfites and phosphites in the system in which an organic halogen compound and an alkali cyanate are reacted to prevent oxidative side reactions during the reaction. The present invention relates to a method for controlling pests and improving the yield of a target product. Although each of the above patents is representative, all related patents, including basic, improved, and refined patents, each have practical value. It is. However, it has not been achieved to completely prevent side reactions during the synthesis of isocyanurates, and even if high-quality organic halogen compounds, alkali cyanates, and solvents are used, the yield of the target product is 80 to 95%.
It has been confirmed through experiments on an experimental or industrial scale that there is a gap between the two. [Problems to be solved by the invention] The present inventors have conducted detailed research on the production method of isocyanurate, and have found that there is a delicate difference between the amount of water that promotes the reaction and the amount of water that causes side reactions. After identifying the relationship, we decided to experimentally determine the optimal amount of water required to produce isocyanurate by reacting an organic halogen compound and an alkali cyanate in a polar aprotic nitrogen-containing solvent. This was a success and led to the completion of the present invention. It was also revealed that by maintaining the technology of the present invention, it is possible to obtain isocyanurate in a much higher yield than in the past. [Means for Solving the Problem] and [Operation] The present inventors have developed a compound having at least one halogenomethyl group selected from the group consisting of alkyl halide, alkenyl halide, alkynyl halide, and aralkyl halide (hereinafter simply referred to as When reacting a halide (referred to as a halide) and an alkali cyanate in a polar aprotic nitrogen-containing solvent (hereinafter simply referred to as a solvent), the water content in the system is
They found that when the water content was maintained at 200 ppm, the yield of the target product was much better than when the reaction was carried out at other water contents. Silica gel, alkali silicate, zeolite, dehydrated clay mineral, zirconium silicate phosphate, and silicate ester are used to maintain the water content in the reaction system, that is, the amount of water eluted into the reaction solution, at 10 to 200 ppm. At least one silicon compound selected from the group consisting of They recognized that it is also effective to allow them to coexist and react. The halide referred to in the present invention is generally a primary halide represented by the following chemical formula. RCH 2 There is no problem. Moreover, or iodide, and prefixes such as normal, cyclo, iso, secondary, ortho, meta, para, etc. are omitted). Namely, methyl chloride, ethyl chloride, propyl chloride, butyl chloride, amyl chloride, hexyl chloride, heptyl chloride,
Octyl chloride, nonyl chloride, decyl chloride, undecyl chloride, lauryl chloride, cetyl chloride, stearyl chloride, allyl chloride, methalyl chloride, crotyl chloride, isopropenyl chloride, butenyl chloride, pentenyl chloride, oleyl chloride, propargyl chloride,
Benzyl chloride, phenylethyl chloride, methylbenzyl chloride, xylyl chloride, and the like are general-purpose compounds having a monohalogenomethyl group. The halides containing some substituents mentioned above include 1,2-
dichloroethane, 1,3-dichloropropane,
1,4-dichlorobutane, 1,5-dichloropentane, 1,6-dichlorohexane, neopentyl chloride, chlorbenzyl chloride, methoxybenzyl chloride, butyl hydroxybenzyl chloride, dibutyl hydroxybenzyl chloride, xylylene dichloride, Phenoxybenzyl chloride is a typical example. Alkali cyanate refers to lithium cyanate, sodium cyanate, potassium cyanate, cesium cyanate, etc. alone or as a mixture.Industrially, sodium cyanate, potassium cyanate, or 5 to 20% by weight of these as main components are used. % of alkali carbonate is available. Solvents referred to in the present invention include dimethylformamide, diethylformamide, dimethylacetamide, N-methylpyrrolidone, acetonitrile, propionitrile, adiponitrile, benzonitrile, nitromethane, nitroethane, nitrobenzene, N-formylpiperidine, N-acetylpiperidine, N-formylmorpholine, N-acetylmorpholine, N, N1 -diformylpiperazine,
N,N 1 -Diacetylpiperazine, N,N-dimethylbenzamide, N,N-dimethylbenzenesulfamide, tetramethylurea, dimethylaminocyanide, dimethylaniline, etc., which have highly polar and easily dissociated active hydrogen atoms. A nitrogen-containing solvent alone or a mixture of two or more thereof, or a mixture with an anhydrous organic solvent containing no active hydrogen and containing 70% by weight or more of these nitrogen-containing solvents. Now, whether or not the water content in the system, that is, the amount of water eluted into the solution, is maintained at 10 to 200 ppm can be determined by quantifying the supernatant liquid or distillate of the reaction mixture using Karl-Fitschier analysis. You can know. The most important issue regarding water is the purification of the solvent used in the reaction.
Commercially available solvents used in the present invention are generally 500 ppm (0.05%), unless they are of particularly poor quality.
Contains about 1000ppm (0.1%) of water. This level of moisture is sufficient for normal use as a solvent, and if dehydration is particularly required, a desiccant is added and then purified by distillation. The following table shows the results of measuring the type of desiccant and drying limit of dimethylformamide (DMR), a typical solvent, and examining the degree of decomposition of the solvent. The table below shows 1000ml of DMF with a moisture content of 700ppm and a desiccant agent.
100g was added and left to stand for 3 days, then carefully distilled and analyzed.
【表】【table】
【表】
上表はDMFを例にとつて示したが、乾燥剤に
よる極性非プロトン溶媒の乾燥限度と分解程度は
大体同じような傾向にあることが本発明者らの多
く研究を通じて明らかにされた。以上のような脱
水溶媒を用いて次の反応についてモデル実験が行
なわれた。
3C6H5CH2Cl+3KNCO→(C6H5CH2NCO)3
こゝに用いられたC6H5CH2Clは無水炭酸カリ
ウムを用いて一旦脱水して蒸留したのちモレキユ
ラーシーブで乾燥した水分150ppmのものを用い、
シアン酸カリウムは自家合成したKNCOとして
純度99.8%(K2CO3 0.2%以下、水分50ppm、
100メツシユ粉末)のものを使用した。
乾燥限度の異なる溶媒30モルを使用して塩化ベ
ンジン3モルとシアン酸カリウム4モルとを120
〜150℃で3〜4時間反応させトリベンジルイソ
シアヌレートを合成した結果はつぎのとおりであ
る。[Table] Although the above table uses DMF as an example, it has been revealed through numerous studies by the present inventors that the drying limit and degree of decomposition of polar aprotic solvents by desiccant tend to be roughly the same. Ta. A model experiment was conducted for the following reaction using the dehydrated solvent as described above. 3C 6 H 5 CH 2 Cl + 3KNCO → (C 6 H 5 CH 2 NCO) The C 6 H 5 CH 2 Cl used for 3 is dehydrated and distilled using anhydrous potassium carbonate, and then distilled using a molecular sieve. Use dry material with a moisture content of 150 ppm.
Potassium cyanate is a self-synthesized KNCO with a purity of 99.8% (K 2 CO 3 0.2% or less, moisture 50 ppm,
100 mesh powder) was used. Using 30 moles of solvents with different drying limits, 3 moles of benzine chloride and 4 moles of potassium cyanate were prepared in 120
Tribenzylisocyanurate was synthesized by reacting at ~150°C for 3 to 4 hours, and the results are as follows.
【表】【table】
実施例 1〜10
次表に示すハライド(1モル、水分20〜
30ppm)、ケイ素化合物(添加量は次表に示す)
99.5%シアン酸カリウム粉末(2モル、水分
40ppm)およびジメチルホルムアミド250ml(反
応混合物の上澄中の水分量は次表に示す)を電磁
攪拌式オートクレーブに入れ150℃で3時間反応
させたのち冷却して反応混合物を氷水中に投入
し、エーテル抽出して抽出液を無水硫酸ナトリウ
ムで乾燥後、蒸留してえられたイソシアヌレート
の収率を求めた。その結果は次表のとおりであ
る。
Examples 1 to 10 Halides shown in the following table (1 mol, moisture 20~
30ppm), silicon compounds (the amount added is shown in the table below)
99.5% potassium cyanate powder (2 mol, water
40 ppm) and 250 ml of dimethylformamide (the amount of water in the supernatant of the reaction mixture is shown in the table below) were placed in a magnetic stirring autoclave and reacted at 150°C for 3 hours, then cooled and the reaction mixture was poured into ice water. After extraction with ether and drying the extract over anhydrous sodium sulfate, the yield of isocyanurate obtained by distillation was determined. The results are shown in the table below.
【表】
実施例 11〜20
次表に示すハライド(0.5モル、水分20〜
30ppm)、ケイ素化合物(添加量は次表に示す)、
98.2%シアン酸ナトリウム粉末(0.70モル、ただ
しNa2CO3約0.9%含有)および次表に示す溶媒
(5モル、水分50〜75ppm)を密閉式ガラス反応
容器中に入れ、150〜160℃の油浴中に浸漬して攪
拌しつつ4時間反応を行なわせたのち冷却し、反
応混合物を水中に投入してエーテル抽出し抽出液
を無水硫酸ナトリウムで乾燥して蒸留しイソシア
ヌレートの収率を求めた。その結果は次表のとお
りである。なお系中の溶解水分量は溶媒の項に示
した。[Table] Examples 11 to 20 Halides shown in the following table (0.5 mol, moisture 20 to
30ppm), silicon compounds (the amount added is shown in the table below),
98.2% sodium cyanate powder (0.70 mol, but containing about 0.9% Na2CO3 ) and the solvent shown in the following table (5 mol , moisture 50-75 ppm) were placed in a closed glass reaction vessel and heated at 150-160℃. The reaction mixture was immersed in an oil bath and stirred for 4 hours, then cooled. The reaction mixture was poured into water and extracted with ether. The extract was dried over anhydrous sodium sulfate and distilled to determine the yield of isocyanurate. I asked for it. The results are shown in the table below. The amount of water dissolved in the system is shown in the solvent section.
【表】【table】
【表】
実施例 21〜28
滴下ロート、逆流冷却器、攪拌機および温度計
を付したフラスコに次表の溶媒(10モル、反応混
合物の上澄液中の水分量は次表に示す)、工業用
シアン酸ナトリウム粉末(100g、ただしNa2
CO3約9%含有、水分200ppm)および次表に示
すケイ素化合物(添加量は次表に示す)を入れ、
150〜160℃で攪拌しつつ滴下ロートより次表に示
すハライド(1モル、水分20〜30ppm)を1時間
を要して滴下後反応を2時間続け冷却する。反応
混合物より無機塩を別したのち液を蒸留して
イソシアヌレートの収率を求めると次表のごとく
なる。[Table] Examples 21 to 28 A flask equipped with a dropping funnel, a backflow condenser, a stirrer, and a thermometer was equipped with the solvent shown in the following table (10 mol, the amount of water in the supernatant liquid of the reaction mixture is shown in the table below), industrial Sodium cyanate powder (100g, however, Na 2
Add CO 3 (approximately 9% content, moisture 200 ppm) and the silicon compounds shown in the following table (the amounts added are shown in the next table).
The halides shown in the following table (1 mol, moisture 20-30 ppm) were added dropwise from the dropping funnel at 150 to 160°C with stirring over a period of 1 hour, and the reaction was continued for 2 hours and cooled. After separating the inorganic salts from the reaction mixture, the liquid was distilled to determine the yield of isocyanurate, as shown in the following table.
本発明は従来から行なわれていたイソシアヌレ
ートすなわちイソシアヌル酸トリエステルの製造
における収率を向上させるに有用なものである。
その要点は反応系中の水分量つまり反応に関与す
る溶液中の水分量が10〜200ppmである間におい
て最高範囲の好収率を挙げうることを明らかに
し、この状態を確保するための一方法としてケイ
素化合物を反応系中に共存させることを示し、こ
の化合物の存在下ではシアン酸アルカリ中の不純
物としての、アルカリもしくはアルカリ土類金属
の炭酸塩とか酸化物の随伴状態においても反応系
中の水分量を10〜200ppmに保持し工業的に有用
な各種のイソシアヌレートを収率よく取得するこ
とができるようになつた点にある。
本発明は化学工業上重要な発明であり、本法に
よつて合成されたイソシアヌレートは可塑剤、農
薬、合成中間体、架橋剤、樹脂原料、耐熱性有機
材料等として産業上賞用されるものが多く含まれ
ている。
The present invention is useful for improving the yield in the conventional production of isocyanurate, that is, isocyanuric acid triester.
The key point is that the highest yield can be achieved when the amount of water in the reaction system, that is, the amount of water in the solution involved in the reaction, is between 10 and 200 ppm, and one method to ensure this condition is achieved. This indicates that a silicon compound coexists in the reaction system, and in the presence of this compound, the presence of alkali or alkaline earth metal carbonate or oxide as an impurity in the alkali cyanate also occurs in the reaction system. The point is that it has become possible to maintain the moisture content at 10 to 200 ppm and obtain various industrially useful isocyanurates in good yields. The present invention is an important invention in the chemical industry, and the isocyanurate synthesized by this method is used industrially as a plasticizer, agricultural chemical, synthetic intermediate, crosslinking agent, resin raw material, heat-resistant organic material, etc. Contains many things.
Claims (1)
ルキニルハライドおよびアラルキルハライドより
なる群からえらばれた少くとも一つのハロゲノメ
チル基を有する化合物とシアン酸アルカリとを極
性非プロトン含窒素溶媒中で反応させるにあたり
系中の水分含有量を10〜200ppmに保持すること
を特徴とするイソシアヌレートの製造法。 2 系中の水分含有量を10〜200ppmに保持する
ためシリカゲル、ケイ酸アルカリ、ゼオライト、
脱水粘土鉱物、ケイ酸リン酸ジルコニウムおよび
ケイ酸エステルよりなる群からえらばれた少くと
も一つのケイ素化合物を存在せしめることを特徴
とする特許請求の範囲第1項記載のイソシアヌレ
ートの製造法。 3 系中の水分含有量を10〜200ppmに保持する
ためアルカリもしくはアルカリ土類金属の炭酸塩
とシリカゲル、ケイ酸アルカリ、ゼオライト、脱
水粘土鉱物、ケイ酸リン酸ジルコニウムおよびケ
イ酸エステルよりなる群からえらばれた少くとも
一つのケイ素化合物とを存在せしめることを特徴
とする特許請求の範囲第1項記載のイソシアヌレ
ートの製造法。 4 系中の水分含有量を10〜200ppmに保持する
ためアルカリもしくはアルカリ土類金属の酸化物
とシリカゲル、ケイ酸アルカリ、ゼオライト、脱
水粘土鉱物、ケイ酸リン酸ジルコニウムおよびケ
イ酸エステルよりなる群からえらばれた少くとも
一つのケイ素化合物とを存在せしめることを特徴
とする特許請求の範囲第1項記載のイソシアヌレ
ートの製造法。[Claims] 1. A compound having at least one halogenomethyl group selected from the group consisting of alkyl halides, alkenyl halides, alkynyl halides and aralkyl halides is reacted with an alkali cyanate in a polar aprotic nitrogen-containing solvent. A method for producing isocyanurate, which is characterized in that the water content in the system is maintained at 10 to 200 ppm. 2 Silica gel, alkali silicate, zeolite,
The method for producing isocyanurate according to claim 1, characterized in that at least one silicon compound selected from the group consisting of dehydrated clay minerals, zirconium phosphate silicates, and silicate esters is present. 3. In order to maintain the water content in the system between 10 and 200 ppm, from the group consisting of alkali or alkaline earth metal carbonate, silica gel, alkali silicate, zeolite, dehydrated clay mineral, zirconium phosphate silicate, and silicate ester. The method for producing isocyanurate according to claim 1, characterized in that at least one selected silicon compound is present. 4. From the group consisting of alkali or alkaline earth metal oxides, silica gel, alkali silicates, zeolites, dehydrated clay minerals, zirconium phosphate silicate, and silicate esters to maintain the water content in the system between 10 and 200 ppm. The method for producing isocyanurate according to claim 1, characterized in that at least one selected silicon compound is present.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18486185A JPS6245578A (en) | 1985-08-21 | 1985-08-21 | Production of isocyanurate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18486185A JPS6245578A (en) | 1985-08-21 | 1985-08-21 | Production of isocyanurate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6245578A JPS6245578A (en) | 1987-02-27 |
JPH0564629B2 true JPH0564629B2 (en) | 1993-09-16 |
Family
ID=16160588
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18486185A Granted JPS6245578A (en) | 1985-08-21 | 1985-08-21 | Production of isocyanurate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6245578A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100806553B1 (en) | 2000-12-27 | 2008-02-27 | 카네카 코포레이션 | Curing agents, curable compositions, compositions for optical materials, optical materials, their production, and liquid crystal displays and led's made by using the materials |
-
1985
- 1985-08-21 JP JP18486185A patent/JPS6245578A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6245578A (en) | 1987-02-27 |
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