JPH0559426A - Method and apparatus for humidifying atmospheric gas in heat treatment furnace - Google Patents

Method and apparatus for humidifying atmospheric gas in heat treatment furnace

Info

Publication number
JPH0559426A
JPH0559426A JP21840491A JP21840491A JPH0559426A JP H0559426 A JPH0559426 A JP H0559426A JP 21840491 A JP21840491 A JP 21840491A JP 21840491 A JP21840491 A JP 21840491A JP H0559426 A JPH0559426 A JP H0559426A
Authority
JP
Japan
Prior art keywords
water
gas
heat treatment
furnace
treatment furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21840491A
Other languages
Japanese (ja)
Inventor
Kaizo Okamoto
改造 岡本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP21840491A priority Critical patent/JPH0559426A/en
Publication of JPH0559426A publication Critical patent/JPH0559426A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To prevent a metal used to the position vaporizing moisture from the heat deformation and the development of crack. CONSTITUTION:This apparatus is constituted of a water tank 1 for weighing and feeding out liquid-phase water, a metering pump 2, a flow meter 3 linked with the pump, a spray nozzle 7 for atomizing the water as mist state, a vaporizing pot 8 for directly connecting to the nozzle and immediately vaporizing by heating the mist with a heating device 13, a humidified gas supplying piping 14 for supplying into a heat treatment furnace 17 by mixing the gasified steam with carrier gas and an injecting header 16.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、鋼材等の熱処理炉で使
用する雰囲気ガスの加湿技術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for humidifying atmospheric gas used in a heat treatment furnace for steel or the like.

【0002】[0002]

【従来の技術】ある種の鋼板、例えば電磁鋼板の熱処理
炉においては、鋼材中の炭素分を除去して所望の品質を
得るために、熱処理炉の雰囲気ガス中に水蒸気を含有さ
せその湿度、または雰囲気ガス中の水蒸気が結露し始め
る温度すなわち露点を管理することが行われている。
2. Description of the Related Art In a heat treatment furnace for a certain type of steel sheet, for example, an electromagnetic steel sheet, in order to remove carbon in the steel material to obtain a desired quality, the atmospheric gas of the heat treatment furnace contains water vapor and its humidity, Alternatively, the temperature at which water vapor in the atmospheric gas starts to condense, that is, the dew point is managed.

【0003】これは、雰囲気ガス中の水蒸気と鋼材中の
炭素との間で、 H2 O + C → H2 + CO の反応を行わせ、脱炭するのである。したがって、露点
制御を精度よく行うためには、含有させる水の量を正確
に管理することが重要となる。水分として雰囲気ガス中
に蒸気を直接吹き込む方法もあるが、一般に知られるよ
うに、少量の水蒸気量を正確に計量することは非常に困
難であり、蒸気の圧力、温度、蒸気量等を正確に測定し
て把握することができないためあまり採用されず、一般
に液相の水の状態でその量を正確に測定し、これを炉内
の雰囲気ガス中に送り込んで気化させることが行われて
いる。
In this method, the reaction of H 2 O + C → H 2 + CO is carried out between the water vapor in the atmospheric gas and the carbon in the steel material to decarburize. Therefore, in order to perform dew point control accurately, it is important to accurately control the amount of water contained. There is also a method of directly blowing steam into the atmospheric gas as water, but as is generally known, it is very difficult to accurately measure a small amount of water vapor, and the pressure, temperature, amount of steam, etc. of the steam can be accurately measured. Since it cannot be measured and grasped, it is not often used. Generally, the amount of water in the liquid phase is accurately measured, and this is sent into the atmospheric gas in the furnace to be vaporized.

【0004】しかしこの方法では、トータルの炉への水
分の投入量は正確に把握できるものの水の気化を炉内で
行わせるため、炉内ガスの組成や濃度の不均一が避けら
れないという欠点がある。そこで計量して切り出された
水を直接炉に投入せず、炉外で予めこの水を加熱して気
化させたのちに雰囲気ガスに混合することが提案されて
いる。その一例として、特開平1-263216号公報に開示さ
れた雰囲気ガスの加湿供給装置の構成を図2に示す。
In this method, however, the total amount of water input to the furnace can be accurately grasped, but since the water is vaporized in the furnace, the composition and concentration of the gas in the furnace cannot be avoided. There is. Therefore, it has been proposed that the water that has been measured and cut out is not directly put into the furnace, but that the water is preheated outside the furnace to be vaporized and then mixed with the atmospheric gas. As one example thereof, FIG. 2 shows the configuration of a humidifying / supplying device for atmospheric gas disclosed in Japanese Patent Laid-Open No. 1-263216.

【0005】この図において、21は水蒸気用の液相の水
の供給配管、22は乾燥雰囲気ガスの供給配管である。3
1、32は水および乾燥雰囲気ガスの流量制御弁、33、34
はそれぞれの流量計である。51は液相の水を加熱する第
1加熱装置、52は雰囲気ガスを加熱する第2加熱装置、
53は第1加熱装置で発生した水蒸気と、第2加熱装置で
加熱した高露点乾燥雰囲気ガスを混合した加湿雰囲気ガ
スを加熱する第3加熱装置である。
In this figure, 21 is a supply pipe for liquid water for steam, and 22 is a supply pipe for dry atmosphere gas. 3
1, 32 are flow control valves for water and dry atmosphere gas, 33, 34
Are respective flow meters. 51 is a first heating device for heating liquid water, 52 is a second heating device for heating atmospheric gas,
Reference numeral 53 is a third heating device for heating the humidified atmospheric gas in which the steam generated by the first heating device and the high dew point dry atmospheric gas heated by the second heating device are mixed.

【0006】61、62、63はそれぞれ水蒸気、乾燥雰囲気
ガス、加湿雰囲気ガスの温度計、64は乾燥雰囲気ガスの
圧力計、17は加湿雰囲気ガスを供給する熱処理炉であ
る。熱処理炉17において必要な加湿雰囲気ガスの量およ
び露点が決まると、21、22に供給する水および乾燥雰囲
気ガスの必要量が決定し、前記流量制御弁、流量計を経
て、液相の水は第1加熱装置において、その出口を通過
する水蒸気が、乾燥雰囲気ガスの圧力に対応する飽和蒸
気温度以上の過熱蒸気となるように加熱制御装置41によ
り加熱される。
Reference numerals 61, 62, and 63 are thermometers for steam, dry atmosphere gas, and humid atmosphere gas, 64 is a pressure gauge for dry atmosphere gas, and 17 is a heat treatment furnace for supplying the humid atmosphere gas. When the amount of humidified atmospheric gas and the dew point required in the heat treatment furnace 17 are determined, the required amount of water and dry atmospheric gas to be supplied to 21, 22 are determined, and the liquid phase water is passed through the flow control valve and the flow meter. In the first heating device, the steam passing through the outlet is heated by the heating control device 41 so as to become superheated steam having a saturated steam temperature or higher corresponding to the pressure of the dry atmosphere gas.

【0007】一方、乾燥雰囲気ガスは第2加熱装置にお
いて、その出口における温度および流量により、露点温
度以上となるように加熱制御装置42により加熱される。
さらにこれら過熱蒸気および乾燥雰囲気ガスを混合させ
てなる加湿雰囲気ガスは第3加熱装置においてその露点
温度以上に加熱、保温されて熱処理炉17に供給されるの
である。
On the other hand, the dry atmosphere gas is heated in the second heating device by the heating control device 42 so as to have a dew point temperature or higher due to the temperature and flow rate at the outlet thereof.
Further, the humidified atmosphere gas obtained by mixing the superheated steam and the dry atmosphere gas is heated and kept at a temperature higher than the dew point temperature in the third heating device and supplied to the heat treatment furnace 17.

【0008】この方法によれば、水分量は液相の水とし
て正確に計量され、かつ炉に供給されるまでに露点温度
以上に加熱され、雰囲気ガスと均一に混合されるから炉
内での水の気化はなく、炉内ガスの組成や濃度の不均一
は発生しないけれども、3基の加熱装置とこれらの制御
装置等を必要とするという設備上の問題がある。これに
対して、図3に示すのは、実開平2-53959 号公報により
提案されている蒸発ポット方式で、水タンク1からポン
プ2、流量計3、流量制御器4、流量制御弁5を経て必
要量計量して切り出された水を水配管7により熱処理炉
の外壁部18に埋め込まれた蒸発ポット8内に送り、水配
管先端部10から滴下させる。
According to this method, the amount of water is accurately measured as water in the liquid phase, and it is heated to the dew point temperature or higher before being supplied to the furnace and uniformly mixed with the atmospheric gas. Although there is no vaporization of water and non-uniformity of the composition and concentration of the gas in the furnace does not occur, there is a facility problem that three heating devices and their control devices are required. On the other hand, FIG. 3 shows an evaporation pot system proposed by Japanese Utility Model Laid-Open No. 2-53959, in which the water tank 1 is connected to the pump 2, the flow meter 3, the flow rate controller 4, and the flow rate control valve 5. After that, the necessary amount of water is measured and cut out, and is sent by a water pipe 7 into an evaporation pot 8 embedded in an outer wall portion 18 of the heat treatment furnace and dropped from a water pipe tip 10.

【0009】蒸発ポット8は内部空間に水を収容できる
よう下方は全周が仕切り板で囲まれているが、炉内に面
した上方は開口しており、炉内の熱によって内部の水を
蒸発させ、蒸気はこの開口部8aから炉内に供給されるよ
うになっている。このほか、この蒸発ポットに代えて水
配管を炉内に延長し、S字状の蛇管として先端の開口部
に至る間に完全に気化させたり、この蛇管部を炉外とし
て加熱装置により加熱し、完全に気化させた状態で炉内
に供給するなどの方式も行われている。
The evaporating pot 8 is surrounded by a partition plate around the lower side so that water can be stored in the inner space, but the upper side facing the inside of the furnace is open so that the water in the inside can be removed by the heat inside the furnace. The vaporized vapor is supplied into the furnace through the opening 8a. In addition, instead of this evaporation pot, a water pipe is extended into the furnace so that it is completely vaporized as an S-shaped flexible pipe until it reaches the opening at the tip, or the flexible pipe is heated outside the furnace by a heating device. A method is also used in which the gas is completely vaporized and fed into the furnace.

【0010】[0010]

【発明が解決しようとする課題】ところで、これらの蒸
発ポット方式あるいは蛇管方式は、さきの図2の加熱混
合方式に比較して設備としては簡単であるが、いずれの
場合も、高熱にさらされる露出金属部分が存在する一方
で蒸発ポット底部あるいは蛇管の特定位置には水滴が落
下し、部分的に大きい熱応力が発生して蒸発ポットや蛇
管に変形が生じ、さらにこの変形によって水滴の当たる
位置が一層特定されて変形が助長される結果クラックが
発生したり、周囲に加熱装置のある場合これを変形させ
たりするという問題がある。これらの変形により、蒸発
ポットや蛇管の交換作業も困難をきわめていた。
By the way, the evaporation pot system or the flexible tube system is simpler as a facility than the heating and mixing system of FIG. 2, but in any case, it is exposed to high heat. While there is an exposed metal part, water droplets drop at the bottom of the evaporation pot or at a specific position of the flexible pipe, large thermal stress is generated locally and the evaporation pot and flexible pipe are deformed. As a result, the crack is generated as a result of being further specified and the deformation is promoted, and if there is a heating device in the vicinity, the crack may be deformed. Due to these deformations, it was extremely difficult to replace the evaporation pot and the flexible pipe.

【0011】本発明はこうした問題点を解消し、簡単な
設備で、変形等を生じない熱処理炉の雰囲気ガス加湿を
実現することを目的とする。
An object of the present invention is to solve the above problems and to realize humidification of atmospheric gas in a heat treatment furnace with a simple facility without causing deformation or the like.

【0012】[0012]

【課題を解決するための手段】本発明の熱処理炉の雰囲
気ガス加湿方法は、液相の水を計量してこれを霧化手段
に供給し、霧化させたのち直ちに加熱して気化させ、気
化した蒸気を搬送ガスと混合させてから熱処理炉に供給
することを特徴とする。また、本発明の熱処理炉の雰囲
気ガス加湿装置は、液相の水を計量して送り出す水供給
手段と、供給された水をミスト状に霧化させる霧化手段
と、このミストを加熱して気化させる気化手段と、気化
した蒸気を搬送ガスと混合させて炉内へ供給する加湿ガ
ス供給手段とから構成される。
A method for humidifying an atmosphere gas in a heat treatment furnace according to the present invention is to measure water in a liquid phase, supply the water to atomizing means, atomize it, and immediately heat it to vaporize it. It is characterized in that the vaporized vapor is mixed with a carrier gas and then supplied to a heat treatment furnace. Further, the atmosphere gas humidifier of the heat treatment furnace of the present invention is a water supply means for measuring and sending out liquid phase water, an atomizing means for atomizing the supplied water into a mist, and heating this mist. It is composed of vaporizing means for vaporizing, and humidified gas supplying means for mixing vaporized vapor with a carrier gas and supplying the mixture into the furnace.

【0013】[0013]

【作 用】本発明によれば、水分は液相の水を計量する
から精度よく管理でき、かつ一旦スプレイノズルにより
霧化させたのち直ちにこれを加熱して気化させるので、
気化手段である蒸発ポットや蛇管の加熱面全体から均一
に気化が行われ、熱負荷が平均しており変形やクラック
の発生は少ない。
[Operation] According to the present invention, since the water content in the liquid phase is measured, the water content can be accurately controlled, and once atomized by the spray nozzle, it is immediately heated and vaporized.
Evaporation is performed uniformly from the entire heating surface of the evaporation pot or the flexible tube, which is the vaporizing means, and the heat load is averaged, so that deformation and cracking are small.

【0014】[0014]

【実施例】本発明の一実施例の構成を図1に示す。水タ
ンク1の水は流量計3の指示値をフィードバックし、定
量ポンプ2で所定量が水配管7を経てスプレイノズル9
へ供給される。6はポンプ停止時に水が逆流しないため
の逆止弁である。一方、スプレイ用気体として炉内雰囲
気ガスと同一ガスか、混合して支障のない炉内雰囲気ガ
スの構成ガス(例えば、雰囲気ガスがH2 +N2 である
とき、スプレイ用ガスとしてN2 ) をおなじく逆止弁11
を経てスプレイ用気体配管12によりスプレイノズル9へ
供給する。
FIG. 1 shows the configuration of one embodiment of the present invention. The water in the water tank 1 feeds back the indicated value of the flow meter 3, and a predetermined amount is supplied by the metering pump 2 to the spray nozzle 9 through the water pipe 7.
Is supplied to. Reference numeral 6 is a check valve for preventing water from flowing backward when the pump is stopped. On the other hand, as the spray gas, the same gas as the furnace atmosphere gas or a constituent gas of the furnace atmosphere gas that does not interfere with mixing (for example, when the atmosphere gas is H 2 + N 2 is used as the spray gas N 2 ). The same check valve 11
And is supplied to the spray nozzle 9 through the spray gas pipe 12.

【0015】スプレイノズル9は蒸発ポット8の内面に
向けて直接取り付けられており、水はスプレイノズル9
により微細なミスト状に霧化されて蒸発ポット8内に噴
出し、直ちにこれを囲む加熱装置13により加熱を受けて
気化する。最近では1〜4kg/cm2 の気体圧で粒径70μ
m以下という霧化性能を持つノズルも市販されているか
ら、 100μm以下のミストは容易に実現できる。
The spray nozzle 9 is directly attached to the inner surface of the evaporation pot 8, and the water is sprayed on the spray nozzle 9.
Is atomized into a fine mist and is ejected into the evaporation pot 8 and immediately heated by a heating device 13 surrounding the evaporation pot 8 to be vaporized. Recently, particle size 70μ at a gas pressure of 1 to 4 kg / cm 2.
Nozzles with atomization performance of m or less are also commercially available, so mist of 100 μm or less can be easily realized.

【0016】スプレイノズル9へ供給されたスプレイ用
気体はそのまま搬送ガスとなり、蒸発ポット8で生成さ
れた水蒸気と混合され加湿ガスとなって加湿ガス供給配
管14により、さらにスーパーヒータ15によって炉内温度
にまで加熱され、吹き出しヘッダ16から熱処理炉17内へ
供給される。水供給手段としてはこの実施例で示した定
量ポンプ2と流量計3の組み合わせが制御精度において
優れているが、定量ポンプ2に代えて通常のポンプを使
用し、さきの図3の例のように流量調整弁や制御器を組
み合わせてもよい。
The spraying gas supplied to the spray nozzle 9 becomes a carrier gas as it is, is mixed with the steam generated in the evaporation pot 8 and becomes a humidifying gas, and becomes a humidifying gas supply pipe 14, and further, a super heater 15 makes a temperature inside the furnace. And is supplied from the blowout header 16 into the heat treatment furnace 17. As the water supply means, the combination of the metering pump 2 and the flow meter 3 shown in this embodiment is excellent in control accuracy, but an ordinary pump is used instead of the metering pump 2, and as shown in the example of FIG. 3 above. A flow rate adjusting valve or controller may be combined with.

【0017】霧化手段として、スプレイノズル9をスプ
レイ用気体を使用しないで水の圧力により噴霧する圧力
噴霧方式とする場合は、スプレイ用気体配管12は不要と
なり、必要に応じ搬送ガスを蒸発ポットに送り込んでや
るだけでよい。炉内雰囲気の露点変更等により供給水量
が変化すると蒸発ポット8の熱負荷も変動するので、水
量の変化に対応してスプレイ用気体の供給量を適宜調整
することが望ましい。
When the spray nozzle 9 is a pressure spraying system which sprays by the pressure of water without using the spraying gas as the atomizing means, the spraying gas pipe 12 becomes unnecessary, and the carrier gas is evaporated into an evaporation pot if necessary. All you have to do is send it to. Since the heat load of the evaporation pot 8 also changes when the amount of supplied water changes due to a change in the dew point of the atmosphere in the furnace, it is desirable to appropriately adjust the supply amount of the spray gas according to the change in the amount of water.

【0018】また、この実施例では気化手段として蒸発
ポット8を炉外に設置して加熱装置13により加熱し、さ
らにさらにスーパーヒータ15によって炉内温度にまで加
熱し、炉温や板温に影響を与えないようにして炉内に供
給しているが、温度条件によってはスーパーヒータ15は
省略してもよい。蒸発ポットに代えて蛇管を使用しても
よい。さらに、注水量が微小で、炉温や板温への影響が
懸念されない場合は、蒸発ポット8をさきの図3のよう
に外壁部に埋め込んで炉内熱により加熱し、蒸発ポット
8の炉内への開口部から加湿ガスを直接炉内に供給して
もよい。この場合、搬送ガスを系外から供給する必要は
なく、蒸発ポット8の炉内への開口部から侵入する雰囲
気ガスがそのまま搬送ガスとなる。
Further, in this embodiment, the evaporation pot 8 is installed outside the furnace as a vaporizing means and heated by the heating device 13, and further heated by the super heater 15 to the temperature inside the furnace to influence the furnace temperature and the plate temperature. However, the super heater 15 may be omitted depending on temperature conditions. A flexible tube may be used instead of the evaporation pot. Further, when the water injection amount is small and there is no concern about the influence on the furnace temperature and the plate temperature, the evaporation pot 8 is embedded in the outer wall portion as shown in FIG. The humidified gas may be directly supplied into the furnace through the opening to the inside. In this case, it is not necessary to supply the carrier gas from outside the system, and the atmospheric gas that enters from the opening of the evaporation pot 8 into the furnace becomes the carrier gas as it is.

【0019】[0019]

【発明の効果】本発明によって、高温状態の蒸発ポット
や蛇管の金属部分に直接水滴を落下させることがなくな
ったので、これらの気化手段の熱変形やクラックの発生
が防止され、熱処理炉の操業トラブルが減少し、生産能
率が向上した。
As described above, according to the present invention, it is possible to prevent water droplets from directly dropping on the metal part of the evaporation pot or the flexible tube in a high temperature state, so that thermal deformation and crack generation of these vaporization means are prevented, and the operation of the heat treatment furnace is prevented. Trouble was reduced and production efficiency was improved.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の雰囲気ガス加湿装置の一実施例の構成
を示す説明図である。
FIG. 1 is an explanatory diagram showing the configuration of an embodiment of an atmospheric gas humidifying device of the present invention.

【図2】従来の技術による雰囲気ガス加湿装置の構成を
示す説明図である。
FIG. 2 is an explanatory diagram showing a configuration of an atmospheric gas humidifier according to a conventional technique.

【図3】他の従来の技術による雰囲気ガス加湿装置の構
成を示す説明図である。
FIG. 3 is an explanatory diagram showing a configuration of an atmospheric gas humidifier according to another conventional technique.

【符号の説明】[Explanation of symbols]

1 水タンク 2 ポンプ 3 流量計 7 水配管 8 蒸発ポット 9 スプレイノズル 13 加熱装置 17 熱処理炉 1 water tank 2 pump 3 flow meter 7 water pipe 8 evaporation pot 9 spray nozzle 13 heating device 17 heat treatment furnace

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 液相の水を計量してこれを霧化手段に供
給し、霧化させたのち直ちに加熱して気化させ、気化し
た蒸気を搬送ガスと混合させてから熱処理炉に供給する
ことを特徴とする熱処理炉の雰囲気ガス加湿方法。
1. A liquid phase water is measured and supplied to an atomizing means, atomized and then immediately heated to be vaporized, and the vaporized vapor is mixed with a carrier gas and then supplied to a heat treatment furnace. A method for humidifying an atmosphere gas in a heat treatment furnace, comprising:
【請求項2】 液相の水を計量して送り出す水供給手段
と、供給された水をミスト状に霧化させる霧化手段と、
このミストを加熱して気化させる気化手段と、気化した
蒸気を搬送ガスと混合させて炉内へ供給する加湿ガス供
給手段とから構成される熱処理炉の雰囲気ガス加湿装
置。
2. Water supply means for measuring and sending out liquid phase water, and atomization means for atomizing the supplied water in a mist form,
An atmosphere gas humidifying device for a heat treatment furnace, which comprises a vaporizing means for heating and vaporizing the mist and a humidifying gas supplying means for mixing the vaporized vapor with a carrier gas and supplying the mixed gas into the furnace.
JP21840491A 1991-08-29 1991-08-29 Method and apparatus for humidifying atmospheric gas in heat treatment furnace Pending JPH0559426A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21840491A JPH0559426A (en) 1991-08-29 1991-08-29 Method and apparatus for humidifying atmospheric gas in heat treatment furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21840491A JPH0559426A (en) 1991-08-29 1991-08-29 Method and apparatus for humidifying atmospheric gas in heat treatment furnace

Publications (1)

Publication Number Publication Date
JPH0559426A true JPH0559426A (en) 1993-03-09

Family

ID=16719386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21840491A Pending JPH0559426A (en) 1991-08-29 1991-08-29 Method and apparatus for humidifying atmospheric gas in heat treatment furnace

Country Status (1)

Country Link
JP (1) JPH0559426A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009036505A (en) * 2007-07-12 2009-02-19 Ngk Insulators Ltd Dew point control device of atmospheric gas
WO2018212029A1 (en) * 2017-05-15 2018-11-22 株式会社エアレックス Incubator
CN114743900A (en) * 2022-04-25 2022-07-12 北京北方华创微电子装备有限公司 Vaporization system and semiconductor processing equipment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009036505A (en) * 2007-07-12 2009-02-19 Ngk Insulators Ltd Dew point control device of atmospheric gas
WO2018212029A1 (en) * 2017-05-15 2018-11-22 株式会社エアレックス Incubator
JP2018191546A (en) * 2017-05-15 2018-12-06 株式会社エアレックス incubator
US11142742B2 (en) 2017-05-15 2021-10-12 Airex Co., Ltd. Incubator
CN114743900A (en) * 2022-04-25 2022-07-12 北京北方华创微电子装备有限公司 Vaporization system and semiconductor processing equipment

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