JPH0547305A - Plasma display panel - Google Patents

Plasma display panel

Info

Publication number
JPH0547305A
JPH0547305A JP20161891A JP20161891A JPH0547305A JP H0547305 A JPH0547305 A JP H0547305A JP 20161891 A JP20161891 A JP 20161891A JP 20161891 A JP20161891 A JP 20161891A JP H0547305 A JPH0547305 A JP H0547305A
Authority
JP
Japan
Prior art keywords
plasma display
display panel
insulating layer
data
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20161891A
Other languages
Japanese (ja)
Other versions
JP2844980B2 (en
Inventor
Tetsuji Okajima
哲治 岡島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
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Filing date
Publication date
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Priority to JP3201618A priority Critical patent/JP2844980B2/en
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Abstract

PURPOSE:To realize a high-sped and reliable plasma display panel operation by enhancing the panel data writing discharge propability. CONSTITUTION:The electrostatic capacity per unit of area of one or both of an insulation layer and a phosphor layer, each layer coating the data electrodes, from which data writing discharge is caused to occur, is set in the range of from 0.5muF/m<2> to 5muF/m<2>. Further, the dielectric constant of the insulation layer coating the data electrodes is made 10 or less. By reducing the electrostatic capacity of such insulation layer, the writing discharge probability is increased to realize a high-speed and reliable panel operation.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は情報表示端末や平面形テ
レビなどに用いられるプラズマディスプレイパネルの、
特に高精細,大表示容量のカラープラズマディスプレイ
パネルの、高速且つ確実な動作を実現するための構造に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel used in an information display terminal, a flat-screen television, etc.
In particular, the present invention relates to a structure for realizing high-speed and reliable operation of a color plasma display panel having high definition and large display capacity.

【0002】[0002]

【従来の技術】カラープラズマディスプレイパネルはガ
ス放電によって発生した紫外線によって蛍光体を励起発
光させ可視光を得て表示動作させるディスプレイである
が、放電方式によりAC型とDC型に分類できる。AC
型の中でも反射型AC面放電型が輝度,発光効率,寿命
の点で優れているのでこれを例に採る。図2に従来の反
射型AC面放電プラズマディスプレイパネルの断面図を
示す。図2において、第2の基板である前面基板1に透
明電極3を形成する。透明電極は通常ITOもしくはS
nO2 で形成するが、シート抵抗が高いためバス電極2
を例えばAl薄膜や銀の厚膜で形成する。この上を低融
点鉛ガラスの絶縁層4で被覆する。この表面を保護層5
で被覆する。保護層はMgO薄膜で形成する。第1の基
板である後面基板11にはデータ電極10を例えばAl
薄膜や銀厚膜で形成し、絶縁層9で被覆する。そして前
面基板1と後面基板11とを隔壁6を間に介して透明電
極3とデータ電極10とが直行するように組合せる。こ
の時蛍光体8は絶縁層9と隔壁6の表面に形成してあ
る。パネル内部には放電可能なガス、例えばHeとXe
の混合ガスが250torr程度封入してある。
2. Description of the Related Art A color plasma display panel is a display which excites and emits a fluorescent substance by ultraviolet rays generated by gas discharge to obtain visible light and performs a display operation. AC
Among the molds, the reflective AC surface discharge type is superior in brightness, luminous efficiency, and life, and is taken as an example. FIG. 2 shows a cross-sectional view of a conventional reflective AC surface discharge plasma display panel. In FIG. 2, the transparent electrode 3 is formed on the front substrate 1 which is the second substrate. The transparent electrode is usually ITO or S
Although it is formed of nO 2 , the bus electrode 2
Is formed of, for example, an Al thin film or a thick silver film. This is covered with an insulating layer 4 of low melting point lead glass. This surface is a protective layer 5
Cover with. The protective layer is formed of a MgO thin film. On the rear substrate 11 which is the first substrate, the data electrode 10 is formed of, for example, Al.
It is formed of a thin film or a thick silver film and covered with an insulating layer 9. Then, the front substrate 1 and the rear substrate 11 are combined so that the transparent electrode 3 and the data electrode 10 are orthogonal to each other with the partition wall 6 interposed therebetween. At this time, the phosphor 8 is formed on the surfaces of the insulating layer 9 and the partition wall 6. Dischargeable gas inside the panel, eg He and Xe
About 250 torr of the mixed gas is enclosed.

【0003】駆動は、透明電極3が一本おきに走査電極
と維持電極になっているので、この隣合う透明電極3の
間に維持パルスを印加し、表示データの書き込みは走査
電極とデータ電極10の間にデータパルスを印加し放電
を発生させることによって行う。駆動波形の例を図3に
示す。走査電極に、走査パルス20と維持パルス21を
印加する。維持電極には維持パルス22を印加する。放
電の維持は走査電極と維持電極に印加される、維持パル
ス21及び維持パルス22によって行われる。データの
書き込みはデータ電極に印加されるデータパルス23と
同じタイミングで走査電極に印加される走査パルス20
によって行う。この時、走査パルス20,維持パルス2
1及び維持パルス22はマイナスの電圧パルスである
が、これに対し、データ電極に印加されるデータパルス
23はプラスの電圧パルスである。これはデータ書き込
みの放電によるイオンが蛍光体に損傷を与えないように
するためである。尚、書き込まれたデータは維持パルス
21と22の間で放電が継続されるので消去する必要が
ある。消去は図示していないが走査電極にパルス幅の狭
い消去パルスを印加することによって行う。
In driving, since every other transparent electrode 3 serves as a scan electrode and a sustain electrode, a sustain pulse is applied between the adjacent transparent electrodes 3, and display data is written by scanning electrodes and data electrodes. It is performed by applying a data pulse during 10 to generate a discharge. An example of the drive waveform is shown in FIG. A scan pulse 20 and a sustain pulse 21 are applied to the scan electrodes. The sustain pulse 22 is applied to the sustain electrodes. The sustaining of the discharge is performed by the sustain pulse 21 and the sustain pulse 22 applied to the scan electrode and the sustain electrode. The data writing is performed by the scan pulse 20 applied to the scan electrode at the same timing as the data pulse 23 applied to the data electrode.
Done by At this time, scan pulse 20, sustain pulse 2
The 1 and sustain pulse 22 are negative voltage pulses, whereas the data pulse 23 applied to the data electrodes is a positive voltage pulse. This is to prevent the ions caused by the discharge for writing data from damaging the phosphor. The written data needs to be erased because the discharge is continued between the sustain pulses 21 and 22. Although not shown, erasing is performed by applying an erasing pulse having a narrow pulse width to the scan electrodes.

【0004】尚、従来のパネルは図2のデータ電極10
を被覆している絶縁層9は通常低融点鉛ガラスでできて
いる。プラズマディスプレイパネルに一般的に使用され
る低融点鉛ガラスは、比誘電率が11から14程度であ
る。従って膜厚が5μm程度の絶縁層を形成した場合、
単位面積当りの静電容量が25μF/m2 程度となって
いる。
Incidentally, the conventional panel has the data electrode 10 shown in FIG.
The insulating layer 9 that covers is usually made of low melting point lead glass. Low melting point lead glass generally used for plasma display panels has a relative dielectric constant of about 11 to 14. Therefore, when an insulating layer with a thickness of about 5 μm is formed,
The capacitance per unit area is about 25 μF / m 2 .

【0005】[0005]

【発明が解決しようとする課題】従来のプラズマディス
プレイパネルでは、良好な表示が得られにくく、特にデ
ータの書き込み動作が不完全で、データパルス電圧を高
くする必要があり駆動上の問題を生じていた。この問題
は特に大面積,大表示容量のプラズマディスプレイパネ
ルになるほど顕著である。
In the conventional plasma display panel, it is difficult to obtain a good display, especially the data writing operation is incomplete, and it is necessary to increase the data pulse voltage, which causes a driving problem. It was This problem becomes more noticeable in plasma display panels with large areas and large display capacities.

【0006】本発明の目的は、このような問題を解決し
たプラズマディスプレイパネルを提供することにある。
An object of the present invention is to provide a plasma display panel that solves such a problem.

【0007】[0007]

【課題を解決するための手段】本発明は、データ電極と
なる電極群上に少なくとも第1の絶縁層あるいは蛍光体
層あるいは第1の絶縁層と蛍光体層の両方が含まれる第
1の絶縁性被覆層が形成されてなる第1の基板と、第2
の絶縁層に被覆された表示用の主放電を発生させる面放
電電極群が形成されてなる第2の基板とを、所定の放電
ギャップを持って相対向させ、気密封止して内部に放電
可能なガスを封入してなるプラズマディスプレイパネル
において、前記第1の絶縁性被覆層の単位面積当りの静
電容量が0.5μF/m2 以上5μF/m2 以下である
ことを特徴とする。
According to the present invention, there is provided a first insulating layer or a phosphor layer or a first insulating layer including at least a first insulating layer and a phosphor layer on an electrode group which becomes a data electrode. A first substrate having a functional coating layer formed thereon, and a second substrate
And a second substrate having a surface discharge electrode group for generating a main discharge for display, which is covered with the insulating layer, are opposed to each other with a predetermined discharge gap, hermetically sealed, and discharged inside. in a possible gas plasma display panel formed by sealing a, characterized in that the capacitance per unit area of the first insulating coating layer is 0.5μF / m 2 or more 5μF / m 2 or less.

【0008】また本発明は、上述のプラズマディスプレ
イパネルにおいて、前記第1の絶縁層が比誘電率10以
下であることを特徴とする。
Further, the present invention is characterized in that, in the above-mentioned plasma display panel, the first insulating layer has a relative dielectric constant of 10 or less.

【0009】[0009]

【作用】データの書き込み動作を詳細に検討した結果、
データ電極上の絶縁性被覆層の静電容量と書き込み放電
確率の間には、図1に示す様に、絶縁性被覆層の静電容
量を減少させることにより、書き込み放電確率を高くす
ることができることが判った。従来は放電空間にかかる
電圧を大きくするために、なるべく絶縁性被覆層を薄く
したり、比誘電率の高い材料を使用したりして絶縁耐圧
のある範囲で絶縁性被覆層の静電容量を大きくする方が
良いと考えられていた。このように正反対の結果となっ
た理由は以下のように説明できる。図3のような駆動波
形を用いると書き込み放電の起きる走査電極とデータ電
極間の電位差は常にデータ電極側がプラスもしくは電位
差ゼロで、データ電極側がマイナスになることはない。
従って書き込み放電は常にデータ電極側が陽極、走査電
極側が陰極の単極性放電となる。これは書き込み放電に
よって生成されたイオンがデータ電極上の蛍光体に損傷
を与えない様にするためである。この結果、書き込み放
電によって生成される壁電荷は、常にデータ電極側がマ
イナス、走査電極側がプラスとなる。壁電荷による壁電
界はデータパルスと走査パルスの和とは逆方向で、これ
を打ち消す働きをする。書き込み放電の確率は電極間に
かかる電圧にほぼ比例するので、同じデータパルス電圧
と走査パルス電圧を印加する場合、壁電界が弱いほど書
き込み放電の確率が高くなる。壁電荷の量は書き込み放
電の電流に比例するので、データ電極上の絶縁性被覆層
の静電容量が大きいほど、大きくなる。
[Operation] As a result of detailed examination of the data write operation,
Between the capacitance of the insulating coating layer on the data electrode and the writing discharge probability, the writing discharge probability can be increased by reducing the capacitance of the insulating coating layer as shown in FIG. I knew I could do it. Conventionally, in order to increase the voltage applied to the discharge space, the insulating coating layer should be made as thin as possible or a material with a high relative dielectric constant should be used to increase the capacitance of the insulating coating layer within the range of withstand voltage. It was considered better to make it larger. The reason for the opposite results can be explained as follows. When the drive waveform as shown in FIG. 3 is used, the potential difference between the scan electrode and the data electrode where the writing discharge occurs is always positive on the data electrode side or zero, and does not become negative on the data electrode side.
Therefore, the writing discharge is always a unipolar discharge in which the data electrode side is the anode and the scanning electrode side is the cathode. This is to prevent the ions generated by the write discharge from damaging the phosphor on the data electrode. As a result, the wall charges generated by the write discharge are always negative on the data electrode side and positive on the scan electrode side. The wall electric field due to the wall charges is in the opposite direction to the sum of the data pulse and the scanning pulse and serves to cancel it. Since the probability of the write discharge is substantially proportional to the voltage applied between the electrodes, when the same data pulse voltage and scan pulse voltage are applied, the weaker the wall electric field, the higher the probability of the write discharge. Since the amount of wall charges is proportional to the current of the writing discharge, it increases as the capacitance of the insulating coating layer on the data electrodes increases.

【0010】尚、ここで述べている放電確率とは、放電
が常に一定の確率で生じるとした場合の単位時間当りの
平均の確率である。
The discharge probability described here is an average probability per unit time when discharge is always generated with a constant probability.

【0011】[0011]

【実施例】次に本発明の実施例を図面を参照して説明す
る。ここでは従来例で説明した反射型AC面放電プラズ
マディスプレイパネルを例にとって説明するが、これ以
外でもデータ電極が絶縁性被覆層で被覆され、且つこれ
とは別に主放電を発生させる電極を有する構造のAC型
プラズマディスプレイパネルであれば、同様な効果が得
られる。従来例で述べたプラズマディスプレイパネル
は、データ電極上の絶縁性被覆層の静電容量が、例えば
25μF/m2 程度と非常に大きい。これはデータ電極
上の絶縁性被覆層が比誘電率が11〜14程度の低融点
鉛ガラスでできており、また膜厚が通常5μm程度であ
るためである。図1よりデータ電極を被覆する絶縁性被
覆層の静電容量を、書き込み放電確率が大きく上がり始
める5μF/m2 以下にすると、高速且つ確実な書き込
み動作ができる。5μF/m2 は絶縁性被覆層を例えば
比誘電率13.5の低融点鉛ガラスで形成したとき膜厚
は約24μmである。これをスクリーン印刷で形成する
場合、乳材を厚く塗ったスクリーンを用いるか、または
多重回印刷が必要である。また絶縁層の厚さが厚い方が
よいが実際は50μm程度までであり、これ以上は製造
が困難である。50μmの膜厚の時、単位面積当りの静
電容量は約2.4μF/m2 である。
Embodiments of the present invention will now be described with reference to the drawings. Here, the reflective AC surface discharge plasma display panel described in the conventional example will be described as an example. However, in addition to this, the structure in which the data electrode is covered with the insulating coating layer and the electrode for generating the main discharge is separately provided The same effect can be obtained with the AC plasma display panel. In the plasma display panel described in the conventional example, the capacitance of the insulating coating layer on the data electrode is very large, for example, about 25 μF / m 2 . This is because the insulating coating layer on the data electrode is made of low melting point lead glass having a relative dielectric constant of about 11 to 14 and the film thickness is usually about 5 μm. As shown in FIG. 1, if the capacitance of the insulating coating layer that covers the data electrode is set to 5 μF / m 2 or less at which the probability of writing discharge starts to increase greatly, a fast and reliable writing operation can be performed. The film thickness of 5 μF / m 2 is about 24 μm when the insulating coating layer is formed of, for example, low melting point lead glass having a relative dielectric constant of 13.5. When this is formed by screen printing, it is necessary to use a screen thickly coated with dairy material or to perform multiple printing. Moreover, the thicker the insulating layer is, the more practically it is up to about 50 μm, and it is difficult to manufacture the insulating layer more than this. When the film thickness is 50 μm, the capacitance per unit area is about 2.4 μF / m 2 .

【0012】絶縁性被覆層のうち絶縁層を従来のように
低融点鉛ガラスのみで形成すると、上述のように非常に
厚い膜厚が必要になり、製造が困難になる。そこで絶縁
層を低融点鉛ガラスに、比誘電率が低融点鉛ガラスより
低い物質を混ぜるとより薄い膜厚で静電容量の小さい絶
縁層が形成できる。例えばMgO(比誘電率〜3),S
iO2 (比誘電率〜4),Al2 3 (比誘電率〜8)
等である。これらのすくなくとも一種類以上を、低融点
鉛ガラスと混ぜた絶縁層を形成することにより極端に膜
厚を増やさなくても静電容量の少ない絶縁層を形成する
ことができる。例えば低融点鉛ガラスとMgOを2:8
の割合で混合し絶縁層を形成すると比誘電率は4程度に
なり膜厚を50μmとした場合、静電容量は約0.7μ
F/m2 となる。また、5μF/m2 の静電容量を得る
には膜厚は、約7μmとスクリーン印刷で、非常に製造
し易い膜厚となる。また低融点鉛ガラスとAl2 3
2:8の割合で混合して絶縁層を形成すると、比誘電率
は10程度となり5μF/m2 の静電容量を得るには約
18μmの膜厚でよい。これはスクリーン印刷で絶縁層
を形成する場合、多重回印刷をしなくても済むほぼ上限
の膜厚である。
If the insulating layer of the insulating coating layer is formed of only the low melting point lead glass as in the conventional case, a very thick film thickness is required as described above, which makes manufacturing difficult. Therefore, when an insulating layer is mixed with a low melting point lead glass and a substance having a relative dielectric constant lower than that of the low melting point lead glass, an insulating layer having a smaller film thickness and a smaller capacitance can be formed. For example, MgO (relative permittivity ~ 3), S
iO 2 (dielectric constant ~4), Al 2 O 3 (dielectric constant 8)
Etc. By forming an insulating layer in which at least one of these is mixed with low melting point lead glass, an insulating layer having a small capacitance can be formed without extremely increasing the film thickness. For example, low melting point lead glass and MgO are 2: 8
When the insulating layer is formed by mixing at a ratio of, the relative dielectric constant becomes about 4, and when the film thickness is 50 μm, the capacitance is about 0.7 μm.
It becomes F / m 2 . Further, in order to obtain a capacitance of 5 μF / m 2, the film thickness is about 7 μm, which is very easy to manufacture by screen printing. When low melting point lead glass and Al 2 O 3 are mixed at a ratio of 2: 8 to form an insulating layer, the relative dielectric constant is about 10 and a film thickness of about 18 μm is required to obtain a capacitance of 5 μF / m 2. Good. This is almost the upper limit of the film thickness that does not require multiple printing when the insulating layer is formed by screen printing.

【0013】[0013]

【発明の効果】以上述べたように本発明のプラズマディ
スプレイパネルにより、高速且つ確実なデータの書き込
み動作ができるプラズマディスプレイパネルを作ること
ができた。
As described above, according to the plasma display panel of the present invention, a plasma display panel capable of high speed and reliable data writing operation can be manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】データ電極上の絶縁層容量と、書き込み放電確
率の関係のグラフである。
FIG. 1 is a graph showing a relationship between an insulating layer capacitance on a data electrode and a write discharge probability.

【図2】AC面放電型カラープラズマディスプレイパネ
ルの断面図である。
FIG. 2 is a cross-sectional view of an AC surface discharge type color plasma display panel.

【図3】AC面放電型からプラズマディスプレイパネル
の駆動波形である。
FIG. 3 is a driving waveform of an AC surface discharge type to a plasma display panel.

【符号の説明】[Explanation of symbols]

1 前面基板 2 バス電極 3 透明電極 4 絶縁層 5 保護層 10 隔壁 11 放電ガス 12 蛍光体 13 絶縁層 14 データ電極 15 後面基板 20 走査パルス 21,22 維持パルス 23 データパルス 1 Front Substrate 2 Bus Electrode 3 Transparent Electrode 4 Insulating Layer 5 Protective Layer 10 Partition 11 Discharge Gas 12 Phosphor 13 Insulating Layer 14 Data Electrode 15 Rear Substrate 20 Scanning Pulse 21, 22 Sustaining Pulse 23 Data Pulse

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】データ電極となる電極群上に少なくとも第
1の絶縁層あるいは蛍光体層あるいは第1の絶縁層と蛍
光体層の両方が含まれる第1の絶縁性被覆層が形成され
てなる第1の基板と、第2の絶縁層に被覆された表示用
の主放電を発生させる面放電電極群が形成されてなる第
2の基板とを、所定の放電ギャップを持って相対向さ
せ、気密封止して内部に放電可能なガスを封入してなる
プラズマディスプレイパネルにおいて、前記第1の絶縁
性被覆層の単位面積当りの静電容量が0.5μF/m2
以上5μF/m2 以下であることを特徴とするプラズマ
ディスプレイパネル。
1. A first insulating coating layer including at least a first insulating layer, a phosphor layer, or both a first insulating layer and a phosphor layer is formed on an electrode group serving as a data electrode. A first substrate and a second substrate covered with a second insulating layer, on which a surface discharge electrode group for generating a main discharge for display is formed, facing each other with a predetermined discharge gap; In a plasma display panel which is hermetically sealed and a dischargeable gas is sealed inside, the capacitance per unit area of the first insulating coating layer is 0.5 μF / m 2.
A plasma display panel characterized by being 5 μF / m 2 or less.
【請求項2】請求項1記載のプラズマディスプレイパネ
ルにおいて、前記第1の絶縁層が比誘電率10以下であ
ることを特徴とするプラズマディスプレイパネル。
2. The plasma display panel according to claim 1, wherein the first insulating layer has a relative dielectric constant of 10 or less.
JP3201618A 1991-08-12 1991-08-12 Plasma display panel Expired - Fee Related JP2844980B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3201618A JP2844980B2 (en) 1991-08-12 1991-08-12 Plasma display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3201618A JP2844980B2 (en) 1991-08-12 1991-08-12 Plasma display panel

Publications (2)

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JPH0547305A true JPH0547305A (en) 1993-02-26
JP2844980B2 JP2844980B2 (en) 1999-01-13

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000019479A1 (en) 1998-09-29 2000-04-06 Fujitsu Limited Method of manufacturing plasma display and substrate structure
WO2001071761A1 (en) * 2000-03-24 2001-09-27 Matsushita Electric Industrial Co., Ltd. Plasma display panel and method for its manufacure
JP2008262931A (en) * 2008-08-05 2008-10-30 Toray Ind Inc Paste for buffer layer formation of plasma display panel
US7647849B2 (en) 2005-03-29 2010-01-19 Denso Corporation Starter with intermediate gear

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143754A (en) * 1979-04-25 1980-11-10 Fujitsu Ltd Gas discharge panel

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143754A (en) * 1979-04-25 1980-11-10 Fujitsu Ltd Gas discharge panel

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000019479A1 (en) 1998-09-29 2000-04-06 Fujitsu Limited Method of manufacturing plasma display and substrate structure
EP1119015A1 (en) * 1998-09-29 2001-07-25 Fujitsu Limited Method of manufacturing plasma display and substrate structure
US6888310B2 (en) 1998-09-29 2005-05-03 Fujitsu Limited Plasma display panel with dielectric layer containing a filler of mica coated with titanium dioxide
KR100662061B1 (en) * 1998-09-29 2006-12-27 가부시끼가이샤 히다치 세이사꾸쇼 Method of manufacturing plasma display and substrate structure
EP1119015A4 (en) * 1998-09-29 2007-08-22 Hitachi Hppl Method of manufacturing plasma display and substrate structure
WO2001071761A1 (en) * 2000-03-24 2001-09-27 Matsushita Electric Industrial Co., Ltd. Plasma display panel and method for its manufacure
US6940227B2 (en) 2000-03-24 2005-09-06 Matsushita Electric Industrial Co., Ltd. Plasma display panel and manufacturing method thereof
US7647849B2 (en) 2005-03-29 2010-01-19 Denso Corporation Starter with intermediate gear
JP2008262931A (en) * 2008-08-05 2008-10-30 Toray Ind Inc Paste for buffer layer formation of plasma display panel

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