JPH0544738B2 - - Google Patents
Info
- Publication number
- JPH0544738B2 JPH0544738B2 JP59069384A JP6938484A JPH0544738B2 JP H0544738 B2 JPH0544738 B2 JP H0544738B2 JP 59069384 A JP59069384 A JP 59069384A JP 6938484 A JP6938484 A JP 6938484A JP H0544738 B2 JPH0544738 B2 JP H0544738B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- thin film
- resin layer
- transparent resin
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 68
- 239000011347 resin Substances 0.000 claims description 37
- 229920005989 resin Polymers 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 27
- 230000003287 optical effect Effects 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 17
- 238000000149 argon plasma sintering Methods 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 5
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 238000005488 sandblasting Methods 0.000 claims description 3
- 238000001771 vacuum deposition Methods 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims 2
- 239000011241 protective layer Substances 0.000 description 36
- 239000000853 adhesive Substances 0.000 description 13
- 230000001070 adhesive effect Effects 0.000 description 13
- 239000003973 paint Substances 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229920005668 polycarbonate resin Polymers 0.000 description 3
- 239000004431 polycarbonate resin Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000010408 film Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052714 tellurium Inorganic materials 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 229910003069 TeO2 Inorganic materials 0.000 description 1
- 229920001079 Thiokol (polymer) Polymers 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 238000004026 adhesive bonding Methods 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 238000007611 bar coating method Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000004770 chalcogenides Chemical class 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- -1 polysiloxane Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- LAJZODKXOMJMPK-UHFFFAOYSA-N tellurium dioxide Chemical compound O=[Te]=O LAJZODKXOMJMPK-UHFFFAOYSA-N 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、映像・音声・デジタルデータ等の信
号をレーザ光を用いて記録・再生あるいは消去を
行なう光記録デイスクおよびその製造方法に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an optical recording disk for recording, reproducing, or erasing signals such as video, audio, and digital data using a laser beam, and a method for manufacturing the same.
従来例の構成とその問題点
レーザ光のレンズ系によつて収束させると直径
がその光の波長のオーダの小さな光スポツトを作
ることが出来る。従つて小さい出力の光源からで
も単位面積あたりのエネルギ密度の高い光スポツ
トを作ることが可能である。これを情報の記録・
再生に利用したのが光記録デイスクである。Conventional configuration and its problems By converging laser light using a lens system, it is possible to create a small light spot with a diameter on the order of the wavelength of the light. Therefore, it is possible to create a light spot with high energy density per unit area even from a light source with a small output. Record this information.
Optical recording disks were used for playback.
光記録デイスクの基本的な構造は表面が平坦な
円板状の基板上にレーザスポツト光照射によつて
何らかの状態が変化する記録薄膜を設けたもので
ある。信号の記録・再生は以下のような方法を用
いる。すなわち、デイスクをモータ等による回転
手段により回転させ、このデイスクの記録薄膜面
上にレーザ光をレンズ系によつて収束し照射す
る。記録薄膜はレーザ光を吸収し昇温する。レー
ザ光の出力をある閾値以上に大きくすると記録薄
膜の状態が変化して情報が記録される。この閾値
は記録薄膜自体の特性の他に基材の熱的な特性・
デイスクの光スポツトに対する相対速度等に依存
する量である。記録された情報は記録部に前記閾
値よりも十分低い出力のレーザ光スポツトを照射
し、その透過光強度あるいは反射光強度あるいは
それらの偏光方向等何らかの光学的特性が記録部
と未記録部で異なることを検出して再生する。記
録薄膜としてはBi、Teあるいはこれらを主成分
とする金属薄膜、Teを含む化合物薄膜が知られ
ている。これらはレーザ光照射により薄膜が溶融
あるいは蒸発させ小孔を形成して記録を行ない、
この記録部からの反射光量が変化することを検出
して再生を行なう。また他にアモルフアスカルコ
ゲン化物薄膜、TeおよびTeO2からなるTeOxb
(O<x<2)を主成分とする酸化物系薄膜等が
ある。これらはレーザ光照射により薄膜の吸収係
数あるいは屈折率のうち少なくともいずれか1つ
が変化して記録を行ない、この部分で透過率ある
いは反射率が変化することを検出して信号を検出
する。中でもTeOxを主成分とする薄膜は、感
度・変化量とも良好かつ安定性に優れた材料であ
る。 The basic structure of an optical recording disk is that a recording thin film whose state changes in some way by laser spot light irradiation is provided on a disk-shaped substrate with a flat surface. The following methods are used to record and reproduce signals. That is, the disk is rotated by a rotating means such as a motor, and laser light is focused and irradiated onto the recording thin film surface of the disk by a lens system. The recording thin film absorbs the laser light and increases its temperature. When the output of the laser beam is increased above a certain threshold, the state of the recording thin film changes and information is recorded. This threshold value is determined by the thermal characteristics of the substrate as well as the characteristics of the recording thin film itself.
This amount depends on the relative speed of the disk to the light spot, etc. The recorded information is obtained by irradiating the recording section with a laser beam spot with an output sufficiently lower than the threshold value, and some optical characteristics such as the transmitted light intensity, reflected light intensity, or their polarization direction are different between the recorded section and the unrecorded section. Detect and play. As recording thin films, Bi, Te, metal thin films containing these as main components, and compound thin films containing Te are known. These thin films are melted or evaporated by laser light irradiation, forming small holes and recording.
Reproduction is performed by detecting a change in the amount of reflected light from the recording section. In addition, amorphous ascalcogenide thin film, TeOxb consisting of Te and TeO 2
There are oxide-based thin films whose main component is (O<x<2). These perform recording by changing at least one of the absorption coefficient or refractive index of the thin film by laser beam irradiation, and detect a change in transmittance or reflectance in this portion to detect a signal. Among them, a thin film mainly composed of TeOx is a material that has good sensitivity and variation, and is excellent in stability.
通常光記録デイスクの基板には透明な材質すな
わちガラス、ポリメチルメタアクリレート樹脂、
ポリカーボネート樹脂等の樹脂からなる円板を用
い、デイスクへの記録・再生には、レーザ光をこ
の透明基板の記録薄膜が設けられた面とは反対の
面側から入射させて、この透明基板を通して記録
薄膜上に収束させる。これは基板自身に記録薄膜
を保護する機能を持たせかつ光の入射側に存在す
るゴミ・ホコリ等の異物をレンズ系の焦点深度内
に(透明基板の厚さによつて)侵入させないよう
にする為である。このような構成を取つた場合に
も基板上の記録薄膜は何らかの方法で機械的な損
傷、外気にさらすことによつて生ずる物理的・化
学的な劣化等から保護する必要がある。前記の記
録薄膜の溶融・蒸発による小孔形成による記録を
行なう材料を用いる場合には記録薄膜に直接保護
層を設けることは難しく、通常、スペーサを介し
て保護板を記録薄膜からある距離だけ離れた位置
に設け、基板上の記録薄膜とこの保護板およびス
ペーサで囲まれた密閉された空間を設けて記録薄
膜を外気から遮断するいわゆるエア・サンドイツ
チ構造の保護構造を取るが、これは構造が複雑で
デイスク全体の体積・重量が大きいためデイスク
の回転への負担が大きくなり、製法も複雑であり
実用には適さない。これに対して前記の吸収係数
あるいは屈折率もしくはその双方を変化させて
(記録薄膜の形状を変化させずに)記録を行なう
材料を用いる場合には記録薄膜を直接保護層で覆
うことが可能である。次に図面を用いてこの直接
保護層を密着させて設ける構造(以下密着保護構
造と記述する)を説明する。第1図aはこのよう
な構造のデイスクの部分断面図である。1は透明
基板、2は記録薄膜、3は密着保護層である。こ
のようなデイスクへの記録・再生に用いる手段と
してレーザ光は、Arレーザ、He−Cdレーザ、
He−Neレーザ、GaAlAs系半導体レーザ等が用
いられる。従つて通常光の波長は300nm〜1μm
の範囲を用いる。レンズ系のNAは0.3〜0.7程度
が通常用いられる。基板1の厚さはレンズ系の設
計値にもよるが、0.5mm〜5mmくらい(また基板
の直径は数cm〜数100cmの範囲)を通常用いる。
これに対して記録薄膜の厚さは10nm〜1μmくら
いの範囲である。保護層3は記録薄膜の保護の機
能を有するものであればどのようなものでも用い
ることが出来、その厚さも前記の保護機能を保持
する範囲内であれば特に制限はない。しかし、デ
イスクの体積・重量の点から言えば保護層厚は少
さい方が好ましく、製造法から見てもスピナ塗布
法、スプレー塗布法等で簡単に形成できる樹脂材
料でかつ厚さも500nm〜200μm程度の範囲が好
ましい。 The substrate of optical recording disks is usually made of transparent materials such as glass, polymethyl methacrylate resin,
A disc made of resin such as polycarbonate resin is used, and for recording and reproduction on the disc, a laser beam is incident on the side of the transparent substrate opposite to the side on which the recording thin film is provided, and the laser beam is passed through the transparent substrate. Focus on the recording thin film. This is done so that the substrate itself has the function of protecting the recording thin film and prevents foreign matter such as dirt and dust present on the light incident side from entering the focal depth of the lens system (depending on the thickness of the transparent substrate). It is for the purpose of Even when such a configuration is adopted, the recording thin film on the substrate must be protected by some method from mechanical damage and physical/chemical deterioration caused by exposure to the outside air. When using a material that performs recording by forming small pores through melting and evaporation of the recording thin film, it is difficult to provide a protective layer directly on the recording thin film, and the protective plate is usually separated from the recording thin film by a certain distance via a spacer. A so-called air sanderch structure is used to protect the recording thin film from the outside air by providing a sealed space surrounded by the recording thin film on the substrate, this protection plate, and a spacer. It is complicated and the volume and weight of the entire disk is large, which puts a heavy burden on the rotation of the disk, and the manufacturing method is also complicated, making it unsuitable for practical use. On the other hand, when using a material that performs recording by changing the above-mentioned absorption coefficient, refractive index, or both (without changing the shape of the recording thin film), it is possible to directly cover the recording thin film with a protective layer. be. Next, a structure in which the direct protective layer is provided in close contact with each other (hereinafter referred to as a close contact protective structure) will be explained using the drawings. FIG. 1a is a partial sectional view of a disk having such a structure. 1 is a transparent substrate, 2 is a recording thin film, and 3 is an adhesion protective layer. Laser beams used for recording and reproducing information on such disks include Ar laser, He-Cd laser,
A He-Ne laser, a GaAlAs semiconductor laser, etc. are used. Therefore, the wavelength of normal light is 300nm to 1μm.
Use the range of The NA of the lens system is usually about 0.3 to 0.7. Although the thickness of the substrate 1 depends on the design values of the lens system, it is usually about 0.5 mm to 5 mm (and the diameter of the substrate is in the range of several cm to several 100 cm).
On the other hand, the thickness of the recording thin film is in the range of about 10 nm to 1 μm. Any material can be used as the protective layer 3 as long as it has the function of protecting the recording thin film, and its thickness is not particularly limited as long as it maintains the above-mentioned protective function. However, from the perspective of the volume and weight of the disk, it is preferable that the protective layer be as thin as possible, and from the viewpoint of the manufacturing method, it is a resin material that can be easily formed using a spinner coating method, spray coating method, etc., and the thickness is 500 nm to 200 μm. A range of degrees is preferred.
しかし、前記のアモルフアス・カルコゲン系記
録薄膜や、TeとTeO2からなるTeOx(O<z<
2)を主成分とする酸化物系薄膜のような記録薄
膜はかなりの透過率があり(膜厚にもよるが5%
〜50%)、照射されたレーザ光のうち記録薄膜を
透過した光が保護層の表面(外気に接した面)に
反射して戻つて来る。従来この反射光が原因で記
録・再生時にノイズが発生するという現象があつ
た。以下図面を用いて詳述する。第2図において
1は透明基板、2は記録薄膜、3は密着保護層、
4はレンズ系の最終段の絞りレンズである。レー
ザ光はレンズ4によつて光路5を通つて透明基板
1を通して記録薄膜2上の1点101に収束され
一部は反射され光路5を逆行して再びレンズ4を
通つてレーザ光の検出系(図示せず)に向う。ま
たレーザ光の他の一部は記録薄膜2を透過して、
密着保護層3と外気の界面201で反射される。
この反射光は、点101の面201に対して対称
な点102から発したごとく光路5aに従つてレ
ンズに入射する。この点101から反射した光と
点102から発したごとき戻り光は互いに干渉し
合つて強度が変化する。 However, the above-mentioned amorphous chalcogen-based recording thin film and TeOx (O< z <
Recording thin films such as oxide-based thin films mainly composed of 2) have a considerable transmittance (up to 5% depending on the film thickness).
~50%), of the irradiated laser light, the light that passes through the recording thin film is reflected back to the surface of the protective layer (the surface in contact with the outside air). Conventionally, this reflected light has caused noise during recording and reproduction. The details will be explained below using the drawings. In Fig. 2, 1 is a transparent substrate, 2 is a recording thin film, 3 is an adhesion protective layer,
4 is an aperture lens at the final stage of the lens system. The laser beam passes through the optical path 5 by the lens 4, passes through the transparent substrate 1, and is converged to a point 101 on the recording thin film 2. A portion of the laser beam is reflected, travels backward along the optical path 5, and passes through the lens 4 again to the laser beam detection system. (not shown). In addition, another part of the laser beam passes through the recording thin film 2,
It is reflected at the interface 201 between the adhesive protective layer 3 and the outside air.
This reflected light enters the lens along the optical path 5a as if it were emitted from a point 102 which is symmetrical with respect to the surface 201 of the point 101. The light reflected from the point 101 and the returning light emitted from the point 102 interfere with each other and their intensity changes.
スピナ法やスプレー法で形成した樹脂層の厚さ
は光の波長のオーダで制御することは難かしく、
この点101からの反射光と点102からの戻り
光の位相差はデイスク上の位置によつて異なりそ
の結果レーザ光の検出系に入射する光強度が変化
する。従つてデイスクを回転しながらレーザ光を
照射しデイスク上の各位置に連続的に再生した場
合再生光強度が変化し、これがノイズとなる。ま
た記録の場合にもデイスク上の位置によつて記録
薄膜に吸収されるレーザ光量に差が生じ、同じレ
ーザ光出力で記録しても記録状態が異なるいわゆ
るムラ書きとなり再生時のノイズとなる。 It is difficult to control the thickness of a resin layer formed by the spinner method or spray method on the order of the wavelength of light;
The phase difference between the reflected light from point 101 and the returned light from point 102 varies depending on the position on the disk, and as a result, the intensity of light incident on the laser light detection system changes. Therefore, when a laser beam is irradiated while rotating the disk to continuously reproduce information at each position on the disk, the intensity of the reproduced light changes, which causes noise. Also, in the case of recording, the amount of laser light absorbed by the recording thin film differs depending on the position on the disk, and even if recorded with the same laser light output, the recorded state will be different, resulting in so-called uneven writing, which will cause noise during reproduction.
従来このような現象を避けるため第1図bのよ
うに十分厚い(基板の厚さと同程度の0.5mm〜5
mmくらい)密着保護層3aを設け密着保護層の表
面では透過光が十分拡つて戻り反射光がほとんど
再生光検出系に入射しないような構造を用いてい
たが、デイスク全体の体積・重量が大きくなると
いう欠点があつた。またこのような構造の密着保
護層は基板と同様な透明板を透明接着剤ではりつ
けるといつた、複雑な形成法が要求され、また原
材料も高価となりデイスクのコスト・アツプの要
因となつていた。 Conventionally, in order to avoid such a phenomenon, the thickness was sufficiently thick (0.5 mm to 5 mm, which is about the same as the thickness of the board), as shown in Figure 1b.
mm), and a structure was used in which the transmitted light is sufficiently spread on the surface of the adhesive protective layer and almost no reflected light enters the reproduction light detection system, but the overall volume and weight of the disk is large. It had the disadvantage of becoming. In addition, the adhesive protective layer with this structure required a complicated formation method, such as gluing a transparent plate similar to the substrate with transparent adhesive, and raw materials were also expensive, contributing to an increase in the cost of the disk. .
またこのような現象をさける為の他の方法とし
て不透明な保護層を設けることが試みられたが、
金属等で形成した保護層では熱伝導率が大きく、
記録薄膜がレーザ光照射により昇温することを妨
げるという点で実用に耐えなかつた。また樹脂中
に顔料を混入して不透明にすることも試みられた
が、記録薄膜と保護層の界面で記録膜と顔料が接
触する部分と樹脂本体が接触する部分で、光学
的・熱的特性が異なり記録・再生時にノイズが発
生し実用に供するに至らなかつた。 In addition, attempts have been made to provide an opaque protective layer as another method to avoid this phenomenon, but
A protective layer made of metal etc. has high thermal conductivity,
This was not practical in that it prevented the recording thin film from increasing in temperature due to laser beam irradiation. Attempts have also been made to mix pigments into the resin to make it opaque, but the optical and thermal properties of the area where the recording film and pigment contact at the interface between the recording thin film and the protective layer and the resin body contact Due to the difference in noise, noise occurred during recording and playback, making it impossible to put it into practical use.
発明の目的
本発明の目的は、上述の問題点に鑑み、記録・
再生時のノイズが少なく、体積・重量が小さく、
製造が容易で安価な光記録デイスクおよびその製
造方法を提供することにある。Purpose of the invention In view of the above-mentioned problems, the purpose of the present invention is to
Low noise during playback, small volume and weight,
An object of the present invention is to provide an optical recording disk that is easy to manufacture and inexpensive, and a method for manufacturing the same.
発明の構成
本発明の光記録デイスクは、前記目的を達成す
る為に、透明な基板上に設けられたレーザ光等の
光の照射により何らかのその状態が変化する記録
薄膜を設け、さらにこの記録薄膜上に透明な樹脂
による保護層を設け、この透明樹脂からなる保護
層の表面を光散乱面としたもので、このような構
成を取ることにより前記従来例において詳述した
ような記録薄膜を透過した光は保護層表面で散乱
され再生光検出系に戻つて来ず、再生時のノイズ
が発生しないものである。Structure of the Invention In order to achieve the above-mentioned object, the optical recording disk of the present invention is provided with a recording thin film which is provided on a transparent substrate and whose state changes when irradiated with light such as a laser beam. A protective layer made of transparent resin is provided on top, and the surface of the protective layer made of transparent resin is used as a light scattering surface.By adopting such a structure, light can be transmitted through the recording thin film as detailed in the conventional example above. The emitted light is scattered on the surface of the protective layer and does not return to the reproduction light detection system, so that no noise is generated during reproduction.
なお、ここで言う散乱面とは記録薄膜上に収束
されたレーザ光のうち記録薄膜を透過した光が保
護層表面で拡がる面積内において十分光を散乱さ
せる機能を持つものを言う。通常NA0.3〜0.7程
度の収束レンズでレーザ光を収束する場合、この
面積は保護層の厚さtに対して、0.6〜1.4×t程
度の円の面積に相当する。従つてこの面積よりも
十分小さい光散乱機能を有した部分が均一に保護
層表面に分布していることが必要である。 Note that the scattering surface referred to herein refers to a surface that has a function of sufficiently scattering light within the area where the light transmitted through the recording thin film spreads on the surface of the protective layer, out of the laser light focused on the recording thin film. When converging a laser beam with a converging lens having an NA of about 0.3 to 0.7, this area corresponds to the area of a circle of about 0.6 to 1.4×t with respect to the thickness t of the protective layer. Therefore, it is necessary that portions having a light scattering function that are sufficiently smaller than this area are uniformly distributed on the surface of the protective layer.
実施例の説明
第3図に本発明の実施例の一形態を示す。1は
透明な基板で、光学的に均質かつ内部異物の少な
い材質を用いる。例えばソーダガラス、ホウケイ
酸ガラス、パイレツクスガラス、石英ガラス等の
ガラス板、ポリエチルテレフタレート樹脂、ポリ
塩化ビニル樹脂、ポリメチルメタアクリレート樹
脂、ポリカーボネート樹脂、ポリエーテルサルホ
ン樹脂等の樹脂板を用いることが出来る。厚さは
0.5mm〜5mm程度の範囲が通常用いられる。2は
光照射による状態の変化する記録薄膜であり、例
えば、Ge−Te−Sb−S系薄膜(Phys.Rev.
Letters21(1968)1450参照)、As−Se−Ge−S系
薄膜(特開昭52−46464参照)のようなアモルフ
アス、カルコゲン化物薄膜、あるいはTeおよび
TeO2からなるTeOx(O<x<2)を主成分とす
る酸化物系薄膜(特公昭54−3725、54−7457、54
−7558参照)等が用いられる。これらの材料は光
照射により形状変化を伴なわずに屈折率、吸収係
数のうち少くともいずれか1つが変化する。3b
は透明樹脂による密着保護層で材質としては透明
で平滑な層を形成するコーテイング剤であれば使
用できるが、機械的強度、記録薄膜との密着性等
を考慮して選択をする必要がある。例えばニトロ
セルロースラツカー、メラミン樹脂系塗料、エポ
キシ樹脂系塗料、ポリウレタン樹脂系塗料、アミ
ノ樹脂系塗料、ポリエステル樹脂系塗料、ポリシ
ロキサン系樹脂塗料等が用いられる。塗布方法と
しては材料に応じてスピナコート法、デイツピン
グ法、スプレー法、バーコート法、ロールコート
法等が適用できる。透明樹脂による保護層の表面
102bは表面がこの樹脂層の厚さtに対して1/
10t以下の周期で荒らされた凹凸面を形成してい
る。このような面は前記透明樹脂層を形成後その
表面を粗い研磨処理を施すことによつて形成する
ことが出来る。例えばサンドペーパー処理、サン
ドブラスト処理等が有効である。特にサンドブラ
スト処理はデイスク全面を同時にかつ均一に処理
することが可能な為特に有効である。また他の方
法として密着保護層表面を有機溶剤で短時間処理
して表面を侵し散乱面を作る方法がある。使用す
る有機溶剤は保護層の材質によつて選択しなけれ
ばならないが、一般的にはトリフロルエチレン、
パークロルエチレン、メチルエチルケトン等に用
いられる。DESCRIPTION OF EMBODIMENTS FIG. 3 shows one form of an embodiment of the present invention. 1 is a transparent substrate made of a material that is optically homogeneous and has few internal foreign substances. For example, glass plates such as soda glass, borosilicate glass, pyrex glass, and quartz glass, and resin plates such as polyethyl terephthalate resin, polyvinyl chloride resin, polymethyl methacrylate resin, polycarbonate resin, and polyethersulfone resin may be used. I can do it. The thickness is
A range of about 0.5 mm to 5 mm is usually used. 2 is a recording thin film whose state changes due to light irradiation, such as a Ge-Te-Sb-S thin film (Phys.Rev.
Letters 21 (1968) 1450), amorphous amorphous, chalcogenide thin films such as As-Se-Ge-S thin films (see JP-A-52-46464), or Te and
Oxide-based thin film whose main component is TeOx (O<x<2) consisting of TeO2
-7558) etc. are used. When these materials are irradiated with light, at least one of their refractive index and absorption coefficient changes without changing their shape. 3b
is an adhesive protective layer made of a transparent resin, and any coating agent that forms a transparent and smooth layer can be used, but the material must be selected in consideration of mechanical strength, adhesion to the recording thin film, etc. For example, nitrocellulose lacquer, melamine resin paint, epoxy resin paint, polyurethane resin paint, amino resin paint, polyester resin paint, polysiloxane resin paint, etc. are used. As a coating method, a spinner coating method, a dipping method, a spraying method, a bar coating method, a roll coating method, etc. can be applied depending on the material. The surface 102b of the protective layer made of transparent resin has a surface that is 1/1/2 with respect to the thickness t of this resin layer.
It forms an uneven surface that is roughened at a period of 10 tons or less. Such a surface can be formed by rough polishing the surface after forming the transparent resin layer. For example, sandpaper treatment, sandblasting treatment, etc. are effective. In particular, sandblasting is particularly effective because the entire surface of the disk can be treated simultaneously and uniformly. Another method is to treat the surface of the adhesive protective layer with an organic solvent for a short time to attack the surface and create a scattering surface. The organic solvent used must be selected depending on the material of the protective layer, but generally trifluorethylene,
Used for perchlorethylene, methyl ethyl ketone, etc.
次に具体的な実施例による実験結果を示す。 Next, experimental results based on specific examples will be shown.
実施例 1
基材にキヤステイング法によつて作られたポリ
メチルメタアクリレートPMMA板の厚さ1.2mm、
直径300mmの円板を用いる。この基板を真空蒸着
装置中で回転させ、TeとTeO2をそれぞれ別の2
個の蒸発源から真空蒸着を行ない、この2個の蒸
発源からの蒸着速度を独立に制御し、基板上で
TeOx(x≒1.2)薄膜を形成する。このTeOx薄
膜が蒸着された面にウレタンアクリレート系のオ
リゴマー(例えば日本合成化学工業製商品名XP
−4200B)を主成分とする紫外線硬化性塗料をス
ピナコート法で厚さ15μmに塗布した後、4KW高
圧水銀ランプで約30秒間紫外線を照射し、重合硬
化させる。紫外線硬化性樹脂は硬化速度が速く、
小規模な装置で簡便に硬化することが出来る。ま
た硬化収縮が小さいことや、硬化に熱を使わない
こと、溶剤を使わないこと、などから記録薄膜に
物理的、化学的な影響を与えずに硬化を行なうこ
とが出来、光記録の保護層には特に有用である。
この密着保護層表面を10000番程度の研磨剤を用
いたサンドプラストで約60秒間処理すると表面に
平均周期約1μm深さ約0.5μm程度の細いキズがつ
き表面が光散乱面となる。また1000番程度の研磨
剤を用いたサンドブラストで約60秒間処理すると
表面に平均周期約10μmで深さが約5μmの凹凸キ
ズがつき表面が光散乱面となる。これらのデイス
ク回転数1800rpmで回転させ波長633nmのHe−
Neレーザ光をNA0.5の収束レンズで収速して、
基板のPMMA板を通して記録薄膜面上に焦点を
合わせて収束させ、この反射光を検出した。He
−Neレーザ光を記録薄膜を変化させる閾値より
も十分低い1mW程度にして反射光強度をモニタ
ーした。サンドブラストを施さないデイスクの場
合にはスパイク状のノイズが発生したが1000番の
研磨剤でサンドブラスト処理したデイスクではこ
のノイズは発生しなかつた。しかし、1000番の研
磨剤でサンドブラスト処理したデイスクではスパ
イク状のノイズは発生しなかつたがホワイトノイ
ズ的な時間的に均一なノイズが増大した。Example 1 A polymethyl methacrylate PMMA plate with a thickness of 1.2 mm made by the casting method as a base material.
A disk with a diameter of 300 mm is used. This substrate was rotated in a vacuum evaporator, and Te and TeO 2 were deposited in two different amounts.
Vacuum deposition is performed from two evaporation sources, and the evaporation rates from these two evaporation sources are independently controlled.
Form a TeOx (x≒1.2) thin film. The surface on which this TeOx thin film is deposited is coated with urethane acrylate oligomer (for example, Nippon Gosei Chemical Industry Co., Ltd. product name:
-4200B) is applied to a thickness of 15 μm using the spinner coat method, and then irradiated with ultraviolet light for about 30 seconds using a 4KW high-pressure mercury lamp to polymerize and harden. UV-curable resin has a fast curing speed,
It can be easily cured using small-scale equipment. In addition, because curing shrinkage is small, no heat is used for curing, and no solvent is used, curing can be performed without physically or chemically affecting the recording thin film, and it can be used as a protective layer for optical recording. It is particularly useful for
When the surface of this adhesive protective layer is treated with sandplast using an abrasive of about 10,000 for about 60 seconds, fine scratches with an average period of about 1 μm and a depth of about 0.5 μm are created on the surface, and the surface becomes a light-scattering surface. In addition, when sandblasted for about 60 seconds using an abrasive of about 1000, the surface becomes uneven and scratched with an average period of about 10 μm and a depth of about 5 μm, making the surface a light-scattering surface. These disks were rotated at a rotation speed of 1800 rpm to generate He− with a wavelength of 633 nm.
Concentrate the Ne laser beam with a converging lens of NA0.5,
The reflected light was focused and converged onto the recording thin film surface through the PMMA plate of the substrate, and the reflected light was detected. He
-Ne laser light was set to about 1 mW, which is sufficiently lower than the threshold value for changing the recording thin film, and the reflected light intensity was monitored. A spike-like noise occurred when the disk was not sandblasted, but this noise did not occur when the disk was sandblasted with No. 1000 abrasive. However, when the disk was sandblasted with No. 1000 abrasive, spike-like noise did not occur, but temporally uniform noise similar to white noise increased.
実施例 2
実施例1と同様に作成した光記録デイスクの密
着保護層の表面にメチルエチルケトンを約50c.c.ス
ピナー法で塗布し、自然乾燥させた所、表面が白
濁し、光散乱面となつた。この表面を顕微鏡で観
察すると周期約1μmで巾1μ以下の細いクラツク
が一面に観察された。このデイスクを前記実施例
1と同様な再生を行なつた所、スパイク状ノイズ
の発生もなく、ホワイトノイズの増大もなかつ
た。Example 2 Approximately 50 c.c. of methyl ethyl ketone was applied to the surface of the adhesive protective layer of an optical recording disk prepared in the same manner as in Example 1 using a spinner method, and when it was air-dried, the surface became cloudy and became a light-scattering surface. Ta. When this surface was observed under a microscope, thin cracks with a period of about 1 μm and a width of less than 1 μm were observed all over the surface. When this disc was reproduced in the same manner as in Example 1, no spike noise was generated and no increase in white noise occurred.
次に本発明の実施例の他の形態を第4図を用い
て説明する。第4図において、1は透明な基板、
2は記録薄膜である。3cは透明樹脂による密着
保護層でその表面201cにはその大きさが密着
保護層の厚さtに対して1/10t以下の光散乱性の
粒子が均一かつすき間なく埋めこまれている。こ
のような構成を取ることにより、密着保護層の表
面を実質的に光散乱性とすることが出来、本発明
の目的を達成することが出来る。以下に具体的な
実施例を示す。 Next, another embodiment of the present invention will be explained using FIG. 4. In FIG. 4, 1 is a transparent substrate;
2 is a recording thin film. Reference numeral 3c denotes an adhesive protective layer made of transparent resin, and its surface 201c is filled with light-scattering particles having a size of 1/10 t or less of the thickness t of the adhesive protective layer uniformly and without gaps. By adopting such a configuration, the surface of the adhesive protective layer can be made substantially light-scattering, and the object of the present invention can be achieved. Specific examples are shown below.
実施例 3
基材にポリカーボネート樹脂の厚さ1.2mm、直
径120mmの円板で表面に巾0.6μm、深さ70nmの凹
状の溝がピツチ1.6μmでスパイラル状に形成され
円板を用い、この基板上に実施例1に記述したの
と同様な方法にTeとTeO2を主成分とする酸化物
系薄膜TeOx(x≒1.1)蒸着して記録薄膜を形成
した。Example 3 A disk made of polycarbonate resin with a thickness of 1.2 mm and a diameter of 120 mm was used as a base material, and concave grooves with a width of 0.6 μm and a depth of 70 nm were formed in a spiral shape on the surface with a pitch of 1.6 μm. A recording thin film was formed by depositing an oxide thin film TeOx (x≈1.1) containing Te and TeO 2 as main components in the same manner as described in Example 1 above.
この記録薄膜上にアクリルウレタン系のオリゴ
マー(チオコール社製商品名コビサン893)を主
成分とする紫外線硬化性塗料を約20μm厚で、ス
ピナコート法で塗布し、この上に粒径1μm以下
のMgO粉末を20mg/cm2程度の割合で均一に撤布
する。約5min放置した後、4KW高圧水銀ランプ
により約60秒間紫外線を照射して紫外線硬化性塗
料を重合硬化させる。この場合MgO粉末は保護
層表面に埋まり込んで固定され表面が光散乱面と
なる。顕微鏡で観察するとMgO粒子が表面にす
き間なく固定されていることが観察された。 On this recording thin film, an ultraviolet curable paint containing an acrylic urethane oligomer (product name: Covisan 893, manufactured by Thiokol Co., Ltd.) as a main component is applied to a thickness of approximately 20 μm using the spinner coat method, and on top of this is coated with MgO with a particle size of 1 μm or less. Dispense the powder uniformly at a rate of about 20 mg/cm 2 . After leaving it for about 5 minutes, irradiate it with ultraviolet light for about 60 seconds using a 4KW high-pressure mercury lamp to polymerize and harden the UV-curable paint. In this case, the MgO powder is embedded and fixed in the surface of the protective layer, and the surface becomes a light scattering surface. When observed under a microscope, it was observed that the MgO particles were fixed on the surface without any gaps.
このデイスクを回転数1200rpmで回転させ、波
長830nmの半導体レーザ光をNA0.45の収束レン
ズで収束して、基板のポリカーボネート板を通し
て記録薄膜面に焦点を合わせるように焦点制御を
行ない、前記の巾0.6μm、深さ70nmのスパイラ
ル溝上をトラツキングするような制御を加えなが
ら、出力7mWで周波数2MHzの短形波で変調し
たレーザ光を照射し信号を記録した。この信号記
録部を再び今度は出力1mMのレーザ光を照射し
てその反射光を検出して信号を再生したところ、
密着保護層表面にMgO粉末を設けていないデイ
スクではスパイク状のノイズが発生して、2MHz
の再生信号のC/N比(バンド巾30KHz)は
45dBであつたのに対して、MgO粉末を設けた場
合はノイズが発生せず、C/N比52dBが得られ
た。またこのデイスクの重量は約16gで従来のデ
イスク構造に較べて約半分に低減できた。 This disk is rotated at a rotation speed of 1200 rpm, and the semiconductor laser beam with a wavelength of 830 nm is converged by a converging lens with an NA of 0.45, and the focus is controlled so that it is focused on the recording thin film surface through the polycarbonate plate of the substrate. A laser beam modulated with a rectangular wave with an output of 7 mW and a frequency of 2 MHz was irradiated and a signal was recorded while controlling to track a spiral groove of 0.6 μm and a depth of 70 nm. This signal recording section was again irradiated with a laser beam with an output of 1mM, and the reflected light was detected to reproduce the signal.
Disks that do not have MgO powder on the surface of the adhesion protective layer generate spike-like noise at 2MHz.
The C/N ratio of the reproduced signal (bandwidth 30KHz) is
On the other hand, when MgO powder was provided, no noise was generated and a C/N ratio of 52 dB was obtained. The weight of this disc is approximately 16g, which is approximately half the weight of conventional disc structures.
以上の実施に示されるよに密着保護層表面にそ
の厚さの1/10程度以下の光散乱部をデイスク全面
にわたつて均一に設けることにより保護層表面か
らの反射光に起因するノイズの発生を防ぐことが
出来、高品質の信号再生が可能であつた。またこ
れら実施例に示される保護層の製造法は従来の方
法に較べて簡便でかつ低コストであると言える。 As shown in the above implementation, by uniformly providing a light scattering part of about 1/10 or less of the thickness on the surface of the adhesive protective layer over the entire disk surface, noise caused by reflected light from the surface of the protective layer is generated. This made it possible to prevent high-quality signal reproduction. It can also be said that the method of manufacturing the protective layer shown in these Examples is simpler and lower in cost than conventional methods.
発明の効果
以上詳述したように、本発明によれば、
(1) 記録・再生時のノイズが少なく高品質の信号
の記録再生が行なえる、
(2) 体積・重量が小さくデイスクの回転系、移送
系の負担が小さく、取り扱いも容易で、
(3) 低コストかつ製法が容易な、
光記録デイスクおよびその製造法を提供するこ
とが出来る。Effects of the Invention As detailed above, according to the present invention, (1) recording and reproduction of high-quality signals with little noise during recording and reproduction can be performed, (2) a disk rotation system with small volume and weight; (3) It is possible to provide an optical recording disk and a method for manufacturing the same, which have a small burden on the transport system, are easy to handle, and (3) are low cost and easy to manufacture.
第1図a,bは光記録デイスクの従来例を示す
部分断面図、第2図は従来例の問題点を説明する
説明図、第3図は本発明の光記録デイスクの一実
施例を示す部分断面図、第4図は本発明の他の実
施例を示す部分断面図である。
1……透明基板、2……記録薄膜、3,3a,
3b,3c……密着保護層、4……レンズ、5,
5a……光路。
1A and 1B are partial cross-sectional views showing a conventional example of an optical recording disk, FIG. 2 is an explanatory diagram explaining the problems of the conventional example, and FIG. 3 shows an embodiment of the optical recording disk of the present invention. FIG. 4 is a partial sectional view showing another embodiment of the present invention. 1... Transparent substrate, 2... Recording thin film, 3, 3a,
3b, 3c...Adhesive protective layer, 4...Lens, 5,
5a... Light path.
Claims (1)
射により状態の変化する記録薄膜と、この記録薄
膜上に設けられた透明な樹脂層を有し、前記透明
な樹脂層の表面が光散乱面であることを特徴とす
る光記録デイスク。 2 記録薄膜は光照射により形状の変化を伴なわ
ずに屈折率、吸収係数のうち少なくともいずれか
1つが変化する材料からなることを特徴とする特
許請求の範囲第1項記載の光記録デイスク。 3 光散乱面は、透明な樹脂層の厚さtに対して
1/10t以下の周期で前記透明な樹脂層表面が荒ら
された凹凸面からなることを特徴とする特許請求
の範囲第1項記載の光記録デイスク。 4 光散乱面は、透明な樹脂層の厚さtに対して
直径1/10t以下の光散乱性の粒子を前記透明な樹
脂層の表面に均一、かつ互に近接して埋め込まれ
た状態からなることを特徴とする特許請求の範囲
第1項記載の光記録デイスク。 5 透明な基板上に真空蒸着法により光照射によ
り状態の変化する記録薄膜を設け、この記録薄膜
上に透明樹脂層を設け、この透明樹脂層の表面を
サンドブラスト法によつて光散乱性にすることを
特徴とする光記録デイスクの製造方法。 6 透明な基板上に真空蒸着法により光照射によ
り状態の変化する記録薄膜を設け、この記録薄膜
上に透明樹脂層を設け、この透明樹脂層の表面を
有機容剤処理によつて光散乱性にすることを特徴
とする光記録デイスクの製造方法。 7 透明樹脂層を光硬化性樹脂を塗布して光照射
により硬化させて形成することを特徴とする特許
請求の範囲第6項記載の光記録デイスクの製造方
法。 8 透明な基板上に真空蒸着法により光照射で状
態の変化する記録薄膜を設け、この記録薄膜上に
透明樹脂層を塗布し、この透明樹脂層の表面に、
この透明樹脂層の厚さtに対して、直径が0.1t以
下の光散乱性の粒子を撤布し、しかる後に透明樹
脂層を硬化することを特徴とする光記録デイスク
の製造方法。[Scope of Claims] 1. A device comprising a transparent substrate, a recording thin film provided on the substrate whose state changes when irradiated with light, and a transparent resin layer provided on the recording thin film, the transparent resin layer being provided on the recording thin film. An optical recording disk characterized in that the surface of the layer is a light scattering surface. 2. The optical recording disk according to claim 1, wherein the recording thin film is made of a material that changes at least one of refractive index and absorption coefficient without changing its shape upon irradiation with light. 3. Claim 1, characterized in that the light scattering surface consists of an uneven surface in which the surface of the transparent resin layer is roughened at a period of 1/10 t or less with respect to the thickness t of the transparent resin layer. The optical recording disk described. 4. The light-scattering surface has light-scattering particles with a diameter of 1/10 t or less of the thickness t of the transparent resin layer embedded uniformly and close to each other on the surface of the transparent resin layer. An optical recording disk according to claim 1, characterized in that: 5. A recording thin film whose state changes when irradiated with light is provided on a transparent substrate by vacuum evaporation, a transparent resin layer is provided on this recording thin film, and the surface of this transparent resin layer is made light scattering by sandblasting. A method for manufacturing an optical recording disk, characterized in that: 6 A recording thin film whose state changes when irradiated with light is provided on a transparent substrate by vacuum evaporation, a transparent resin layer is provided on this recording thin film, and the surface of this transparent resin layer is treated with an organic medium to make it light scattering. A method for manufacturing an optical recording disk, characterized by: 7. The method of manufacturing an optical recording disk according to claim 6, wherein the transparent resin layer is formed by applying a photocurable resin and curing it by irradiation with light. 8. A recording thin film whose state changes when irradiated with light is provided on a transparent substrate using a vacuum evaporation method, a transparent resin layer is coated on this recording thin film, and a transparent resin layer is coated on the surface of this transparent resin layer.
A method for manufacturing an optical recording disk, which comprises removing light-scattering particles having a diameter of 0.1 t or less with respect to the thickness t of the transparent resin layer, and then hardening the transparent resin layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59069384A JPS60212839A (en) | 1984-04-06 | 1984-04-06 | Optical recording disk and its manufacture |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59069384A JPS60212839A (en) | 1984-04-06 | 1984-04-06 | Optical recording disk and its manufacture |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60212839A JPS60212839A (en) | 1985-10-25 |
JPH0544738B2 true JPH0544738B2 (en) | 1993-07-07 |
Family
ID=13401031
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59069384A Granted JPS60212839A (en) | 1984-04-06 | 1984-04-06 | Optical recording disk and its manufacture |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60212839A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5860443A (en) * | 1981-10-06 | 1983-04-09 | Canon Inc | Photothermomagnetic recording medium |
-
1984
- 1984-04-06 JP JP59069384A patent/JPS60212839A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5860443A (en) * | 1981-10-06 | 1983-04-09 | Canon Inc | Photothermomagnetic recording medium |
Also Published As
Publication number | Publication date |
---|---|
JPS60212839A (en) | 1985-10-25 |
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