JPH0543702A - Polysilane compounds and their production - Google Patents
Polysilane compounds and their productionInfo
- Publication number
- JPH0543702A JPH0543702A JP3224940A JP22494091A JPH0543702A JP H0543702 A JPH0543702 A JP H0543702A JP 3224940 A JP3224940 A JP 3224940A JP 22494091 A JP22494091 A JP 22494091A JP H0543702 A JPH0543702 A JP H0543702A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- group
- polysilane
- monovalent hydrocarbon
- represented
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000548 poly(silane) polymer Polymers 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 150000001875 compounds Chemical class 0.000 title abstract 4
- 239000012442 inert solvent Substances 0.000 claims abstract description 6
- -1 carbazoyl group Chemical group 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 12
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- 239000003513 alkali Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 150000004756 silanes Chemical class 0.000 claims 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 abstract description 15
- 229910052783 alkali metal Inorganic materials 0.000 abstract description 9
- 150000001340 alkali metals Chemical class 0.000 abstract description 9
- 150000002430 hydrocarbons Chemical class 0.000 abstract description 9
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract description 8
- 229910052708 sodium Inorganic materials 0.000 abstract description 8
- 239000011734 sodium Substances 0.000 abstract description 8
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 abstract description 4
- GNEPOXWQWFSSOU-UHFFFAOYSA-N dichloro-methyl-phenylsilane Chemical compound C[Si](Cl)(Cl)C1=CC=CC=C1 GNEPOXWQWFSSOU-UHFFFAOYSA-N 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 4
- 238000001782 photodegradation Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 125000000962 organic group Chemical group 0.000 abstract description 2
- 125000001424 substituent group Chemical group 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 abstract 2
- 229930195733 hydrocarbon Natural products 0.000 abstract 2
- BCNBLKVVIBLGAW-UHFFFAOYSA-N carbazol-9-ylmethyl-dichloro-propylsilane Chemical compound C1=CC=CC=2C3=CC=CC=C3N(C1=2)C[Si](Cl)(Cl)CCC BCNBLKVVIBLGAW-UHFFFAOYSA-N 0.000 abstract 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000005843 halogen group Chemical group 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 15
- 238000006303 photolysis reaction Methods 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 8
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 7
- 239000008096 xylene Substances 0.000 description 7
- 238000000862 absorption spectrum Methods 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 125000003710 aryl alkyl group Chemical group 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000015843 photosynthesis, light reaction Effects 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- 229910000574 NaK Inorganic materials 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Silicon Polymers (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、耐光分解性に優れ、有
機光導電性材料等として好適な新規なポリシラン類及び
その製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel polysilane which is excellent in photodecomposition resistance and suitable as an organic photoconductive material and a method for producing the same.
【０００２】[0002]
【従来の技術及び発明が解決しようとする課題】従来、
ポリシラン類としては下記一般式（４）で示される鎖状
のホモポリーや、下記一般式（５）で示されるコポリマ
−が下記の文献等に報告されている。2. Description of the Related Art Conventionally, the problems to be solved by the invention
As polysilanes, chain homopolymers represented by the following general formula (4) and copolymers represented by the following general formula (5) are reported in the following documents and the like.
【０００３】[0003]
【化４】 （但し、式中Ｒ5，Ｒ6はそれぞれアルキル基、アリ−ル
基又はアラルキル基であり、また、式中Ｒ7，Ｒ8の少な
くとも一つはＲ5，Ｒ6と異なるアルキル基、アリール基
又はアラルキル基である。）[Chemical 4] (Wherein R 5 and R 6 are each an alkyl group, an aryl group or an aralkyl group, and at least one of R 7 and R 8 is an alkyl group or aryl which is different from R 5 and R 6. A group or an aralkyl group.)
【０００４】報告文献： （１）ジャーナル・オブ・オルガノメタリック・ケミス
トリー（Ｊ．Ｏｒｇａｎｏｍｅｔ．Ｃｈｅｍ．），３０
０（１９８６）３２７，Ｒ．Ｗｅｓｔ； （２）ジャーナル・オブ・ポリマー・サイエンス・ポリ
マー・ケミストリー・エディション（Ｊ．Ｐｏｌｙｍ．
Ｓｃｉ．，Ｐｏｌｙｍ．Ｃｈｅｍ．Ｅｄ．），１７（１
９７９）２８３３，Ｊ．Ｐ．Ｗｅｓｓｏｎ； （３）アメリカン・セラミック・ソサエティー・オブ・
ブリテン（Ａｍ．Ｃｅｒａｍ．Ｓｏｃ．Ｂｕｌｌ．），
６２（１９８３）８２５，Ｒ．Ｗｅｓｔ； （４）ジャーナル・オブ・ポリマー・サイエンス・ポリ
マー・ケミストリー・エディション（Ｊ．Ｐｏｌｙｍ，
Ｓｃｉ．，Ｐｏｌｙｍ．Ｃｈｅｍ．Ｅｄ）．，２１（１
９８３）８１９，Ｐ．Ｔｒｅｆｏｎａｓ ＩＩＩ； （５）ジャーナル・オブ・ポリマー・サイエンス・ポリ
マ・ケミストリー・エディション（Ｊ．Ｐｏｌｙｍ，Ｓ
ｃｉ．，Ｐｏｌｙｍ．Ｃｈｅｍ．Ｅｄ．），２２（１９
８４）１５９； （６）ジャーナル・オブ・ポリマー・サイエンス・ポリ
マー・ケミストリー・エディション（Ｊ．Ｐｏｌｙｍ，
Ｓｃｉ．，Ｐｏｌｙｍ．Ｃｈｅｍ．Ｅｄ．），２２（１
９８４）２２５； しかしながら、上記ポリシラン類はいずれもその耐光分
解性が十分満足できるものとは言い難かった。References: (1) Journal of Organometallic Chemistry (J. Organomet. Chem.), 30
0 (1986) 327, R.A. West; (2) Journal of Polymer Science Polymer Chemistry Edition (J. Polym.
Sci. , Polym. Chem. Ed. ), 17 (1
979) 2833, J. Am. P. Wesson; (3) American Ceramic Society of
Bulletin (Am. Ceram. Soc. Bull.),
62 (1983) 825, R.M. West; (4) Journal of Polymer Science Polymer Chemistry Edition (J. Polym,
Sci. , Polym. Chem. Ed). , 21 (1
983) 819, p. Trefonas III; (5) Journal of Polymer Science Polymer Chemistry Edition (J. Polym, S
ci. , Polym. Chem. Ed. ), 22 (19
84) 159; (6) Journal of Polymer Science Polymer Chemistry Edition (J. Polym,
Sci. , Polym. Chem. Ed. ), 22 (1
984) 225; However, it has been difficult to say that any of the above polysilanes is sufficiently satisfactory in photodecomposition resistance.
【０００５】[0005]
【課題を解決するための手段及び作用】本発明者は、上
記事情に鑑み、ポリシラン類の耐光分解性の向上を目的
として鋭意検討を重ねた結果、下記一般式（２）及び
（３）で示される２種類のジハロゲノシラン類（ジオル
ガノジハロゲノシラン及びカルバゾイル基含有ジハロゲ
ノシラン）を不活性溶媒中、アルカリ金属と反応させる
ことにより、置換基として紫外線吸収効果を有するカル
バゾイル基を含有する下記一般式（１）で示される新規
なポリシラン類が得られ、このポリシラン類は耐光分解
性に優れ、有機光導電性材料等として好適であることを
知見し、本発明をなすに至ったものである。In view of the above circumstances, the present inventor has conducted extensive studies in order to improve the photodecomposition resistance of polysilanes. As a result, the following general formulas (2) and (3) By reacting two kinds of dihalogenosilanes (diorganodihalogenosilane and carbazoyl group-containing dihalogenosilane) shown with an alkali metal in an inert solvent, a carbazoyl group having an ultraviolet absorbing effect is contained as a substituent. New polysilanes represented by the following general formula (1) were obtained, and it was found that these polysilanes are excellent in photodecomposition resistance and suitable as an organic photoconductive material, etc. Is.
【０００６】[0006]
【化５】 （但し、式中Ｒ1，Ｒ2，Ｒ3，Ｒ4はそれぞれ水素原子又
は一価の炭化水素基であるが、Ｒ3，Ｒ4の少なくとも１
つは下記式で示されるカルバゾイル基を含有する一価炭
化水素基である。また、ｋ，ｍ，ｎは０≦ｋ≦１，０＜
ｍ≦１，ｋ＋ｍ＝１，ｎ≧６である。以下同様。）[Chemical 5] (However, in the formula, R 1 , R 2 , R 3 , and R 4 are each a hydrogen atom or a monovalent hydrocarbon group, and at least one of R 3 and R 4 is
One is a monovalent hydrocarbon group containing a carbazoyl group represented by the following formula. Moreover, k, m, and n are 0 ≦ k ≦ 1,0 <
m ≦ 1, k + m = 1, n ≧ 6. The same applies below. )
【０００７】[0007]
【化６】 以下、本発明につき更に詳細に説明すると、本発明の新
規なポリシラン類は下記一般式（１）で示されるもので
ある。[Chemical 6] The present invention will be described in more detail below. The novel polysilanes of the present invention are represented by the following general formula (1).
【０００８】[0008]
【化７】 ここで、（１）式中Ｒ1，Ｒ2はそれぞれ水素原子又は一
価炭化水素基であり、一価炭化水素基としては炭素数１
〜１２のものが好適に使用され、例えばアルキル基、ア
リール基、アラルキル基等が挙げられる。また、Ｒ3，
Ｒ4もアルキル基、アリール基、アラルキル基が挙げら
れ、そのうちの少なくとも１つはカルバゾイル基を含有
する一価炭化水素基である。このカルバゾイル基を含有
する炭化水素残基は、特に下記一般式（６）であること
が好ましい。[Chemical 7] Here, in the formula (1), R 1 and R 2 are each a hydrogen atom or a monovalent hydrocarbon group, and the monovalent hydrocarbon group has 1 carbon atoms.
Preferably, those of 12 to 12 are used, and examples thereof include an alkyl group, an aryl group and an aralkyl group. Also, R 3 ,
R 4 also includes an alkyl group, an aryl group, and an aralkyl group, at least one of which is a monovalent hydrocarbon group containing a carbazoyl group. The hydrocarbon residue containing the carbazoyl group is particularly preferably represented by the following general formula (6).
【０００９】[0009]
【化８】 （６）式のカルバゾイル基含有炭化水素残基として具体
的には、Ｎ−カルバゾイルプロピル基、Ｎ−カルバゾイ
ルエチル基等が例示されるまた、ｋ，ｍ，ｎは０≦ｋ≦
１，０＜ｍ≦１，ｋ＋ｍ＝１，ｎ≧６である。[Chemical 8] Specific examples of the carbazoyl group-containing hydrocarbon residue of the formula (6) include N-carbazoylpropyl group, N-carbazoylethyl group, and the like, and k, m, and n are 0 ≦ k ≦.
1,0 <m ≦ 1, k + m = 1, n ≧ 6.
【００１０】本発明の（１）式のポリシラン類は、下記
一般式（２）で示されるジオルガノジハロゲノシラン及
び下記一般式（３）式で示されるカルバゾイル基含有ジ
ハロゲノシランを不活性溶媒中、アルカリ金属と反応さ
せることにより製造することができる。The polysilanes of the formula (1) of the present invention are obtained by using a diorganodihalogenosilane represented by the following general formula (2) and a carbazoyl group-containing dihalogenosilane represented by the following general formula (3) as an inert solvent. It can be produced by reacting with an alkali metal.
【００１１】[0011]
【化９】 ここで、出発原料の（３）式のカルバゾイル基を含有す
るジハロゲノシランは、例えばＮ−アルケニルカルバゾ
−ルと（オルガノ）ジハロゲノヒドロシランとをモル比
１〜１．５の割合で混合し、付加反応させることにより
合成することができる。この場合、付加反応は塩化白金
酸等の付加反応触媒の存在下で行うことが好ましく、そ
の反応条件は特に制限されないが３０〜１１０℃で１〜
４時間とすることが望ましい。反応終了後は、活性炭処
理して濃縮することにより、目的とするカルバゾイル基
含有ジハロゲノシランを得ることができる。[Chemical 9] Here, as the starting material, the dihalogenosilane containing a carbazoyl group represented by the formula (3) is, for example, N-alkenylcarbazol and (organo) dihalogenohydrosilane mixed in a molar ratio of 1 to 1.5. , And can be synthesized by addition reaction. In this case, the addition reaction is preferably carried out in the presence of an addition reaction catalyst such as chloroplatinic acid, and the reaction conditions are not particularly limited, but are 1 to 30 to 110 ° C.
4 hours is desirable. After completion of the reaction, the target carbazoyl group-containing dihalogenosilane can be obtained by treating with active carbon and concentrating.
【００１２】上記式（２）、（３）のジハロゲノシラン
類の反応に用いられるアルカリ金属しては、例えばリチ
ウム、カリウム、カリウムナトリウム合金、ナトリウム
等を用いることができるが、中でもナトリウムが好まし
く用いられる。このアルカリ金属の添加量は、（２）及
び（３）式のジハロゲノシラン類の合計使用量１モルに
対して２〜３モル、特に２〜２．１モルとすることが好
ましく、添加量が２モルに満たないと反応が十分に進ま
ない場合がある。As the alkali metal used in the reaction of the dihalogenosilanes of the above formulas (2) and (3), for example, lithium, potassium, potassium sodium alloy, sodium and the like can be used, among which sodium is preferred. Used. The amount of the alkali metal added is preferably 2 to 3 mol, and more preferably 2 to 2.1 mol per 1 mol of the total amount of the dihalogenosilanes of the formulas (2) and (3) used. If the amount is less than 2 mol, the reaction may not proceed sufficiently.
【００１３】また、不活性溶媒として具体的には、トル
エン、キシレンなどの芳香族系炭化水素や、デカン、ド
デカン、テトラリンなどの脂肪族系炭化水素が好適に使
用され、その使用量は（２）及び（３）式のジハロゲノ
シラン類の合計使用量に対して１〜１０倍量、特に２〜
５倍量とすることが望ましい。As the inert solvent, specifically, aromatic hydrocarbons such as toluene and xylene and aliphatic hydrocarbons such as decane, dodecane and tetralin are preferably used, and the amount thereof is (2 ) And 1 to 10 times the total amount of dihalogenosilanes of the formula (3) used, especially 2 to
It is desirable that the amount be 5 times.
【００１４】上記（２）及び（３）式のジハロゲノシラ
ン類とアルカリ金属との反応条件は適宜調整できるが、
１００℃以上の温度条件下で１〜６時間行うことが望ま
しい。The reaction conditions of the dihalogenosilanes of the above formulas (2) and (3) and the alkali metal can be adjusted appropriately.
It is desirable to perform the treatment under a temperature condition of 100 ° C. or higher for 1 to 6 hours.
【００１５】而して、本発明の製造方法では、不活性溶
媒にアルカリ金属を添加し、加熱、攪拌を行った後、
（２）及び（３）式のジハロゲノシラン類の混合物を滴
下すると反応は発熱的に進行し、アルカリ金属が消費さ
れたところで反応が終了するものである。反応終了後
は、過剰のアルカリ金属をアルコ−ルで失活させた後、
加水分解し、有機層を取り出して濃縮後、トルエン／ア
セトン等の混合有機溶媒から再沈澱を行うことにより、
分子量１００００〜１００００００の（１）式のカルバ
ゾイル基含有ポリシラン類を得ることができる。Thus, in the production method of the present invention, an alkali metal is added to an inert solvent, and after heating and stirring,
When the mixture of the dihalogenosilanes of the formulas (2) and (3) is dropped, the reaction exothermically proceeds, and the reaction ends when the alkali metal is consumed. After completion of the reaction, after deactivating the excess alkali metal with alcohol,
By hydrolyzing, removing the organic layer, concentrating, and then reprecipitating from a mixed organic solvent such as toluene / acetone,
A carbazoyl group-containing polysilane of the formula (1) having a molecular weight of 10,000 to 1,000,000 can be obtained.
【００１６】[0016]
【発明の効果】本発明の（１）式のポリシラン類は、カ
ルバゾイル基を含有することにより、優れた耐光分解性
を有するもので、有機光導電性材料などとして有用であ
る。また、本発明の製造方法によれば、上記（１）式の
ポリシラン類を工業的に有利に製造することができる。INDUSTRIAL APPLICABILITY The polysilanes of the formula (1) of the present invention have excellent photodecomposition resistance by containing a carbazoyl group and are useful as an organic photoconductive material and the like. Further, according to the production method of the present invention, the polysilanes of the above formula (1) can be produced industrially advantageously.
【００１７】[0017]
【実施例】以下、実施例及び比較例を示して本発明を具
体的に説明するが、本発明は下記実施例に制限されるも
のではない。なお、下記例においてＭｅはメチル基、Ｐ
ｈはフェニル基、ＣｚはＮ−カルバゾイル基である。EXAMPLES The present invention will be specifically described below with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples. In the following examples, Me is a methyl group, P
h is a phenyl group and Cz is an N-carbazoyl group.
【００１８】〔実施例１〕Ｎ−アリルカルバゾ−ル３
１．８ｇをトルエン１５０ｇに溶解し、フラスコに収め
た後、塩化白金酸を触媒量添加し、溶液を７０〜８０℃
に保った。これにメチルヒドロジクロロシラン２０．０
ｇをゆっくり液中滴下により加えた。更に原料が消失す
るまで４時間攪拌を行い、反応を終了させた。次に、反
応溶液を室温に戻し、活性炭処理を行なって濃縮したと
ころ、９０％以上の収率でＮ−カルバゾイル−３−プロ
ピルメチルジクロロシラン（以下、ＣｚＭｅＤＣＳと略
す）を淡橙色固体として得た。[Example 1] N-allylcarbazol 3
After dissolving 1.8 g in 150 g of toluene and placing in a flask, chloroplatinic acid was added in a catalytic amount, and the solution was heated to 70 to 80 ° C.
Kept on. Methylhydrodichlorosilane 20.0
g was slowly added dropwise in the liquid. Further, stirring was continued for 4 hours until the raw materials disappeared to complete the reaction. Next, the reaction solution was returned to room temperature, treated with activated carbon and concentrated to obtain N-carbazoyl-3-propylmethyldichlorosilane (hereinafter abbreviated as CzMeDCS) as a light orange solid in a yield of 90% or more. ..
【００１９】次いで、四つ口フラスコにナトリウム１．
５ｇ、キシレン２０ｇを収め、加熱攪拌し、ナトリウム
ディスパ−ジョンを形成させた。更に、反応温度を１３
８℃とし、ＣｚＭｅＤＣＳ１．６０ｇ（５．０ｍｍｏ
ｌ）、フェニルメチルジクロロシラン４．７８ｇ（２
５．０ｍｍｏｌ）及びキシレン５ｇの溶液を約５分間で
滴下した。反応は発熱的に進行し、紫色に呈色した。加
熱攪拌６時間後、ナトリウムはほぼ消失し、反応溶液を
室温に戻して反応を終了させた。反応終了後、後処理と
して約５ｍｌのメタノ−ルを添加した後、数回水洗を行
ない、有機層を取り出して濃縮後、トルエン／アセトン
系より分別沈澱を行ったところ、表１に示すポリシラン
を得た。Next, sodium 1.
5 g and 20 g of xylene were placed and heated with stirring to form a sodium dispersion. Furthermore, the reaction temperature is set to 13
8 ° C, CzMeDCS 1.60g (5.0mmo
l), 4.78 g of phenylmethyldichlorosilane (2
5.0 mmol) and 5 g of xylene were added dropwise in about 5 minutes. The reaction proceeded exothermically and turned purple. After heating and stirring for 6 hours, sodium almost disappeared, and the reaction solution was returned to room temperature to terminate the reaction. After completion of the reaction, about 5 ml of methanol was added as a post-treatment, followed by washing with water several times. The organic layer was taken out, concentrated and subjected to fractional precipitation from a toluene / acetone system. Obtained.
【００２０】また、ＩＲ分析を行ったところ、得られた
ポリシランの組成は仕込量にほぼ依存し、下記式で示さ
れるものであった。When IR analysis was carried out, the composition of the obtained polysilane was almost dependent on the charged amount and was shown by the following formula.
【００２１】[0021]
【化１０】 [Chemical 10]
【００２２】[0022]
【表１】 [Table 1]
【００２３】〔実施例２〕ナトリウム２．７６ｇ、キシ
レン２０ｇをフラスコに収め、実施例１と同様の条件
下、ＣｚＭｅＤＣＳ１．６０ｇ、フェニルメチルジクロ
ロシラン９．５５ｇ及びキシレン５ｇの溶液を約５分間
で滴下した。６時間反応させた後、実施例１と同様の後
処理を行ったところ、表２に示すポリシランを得た。[Example 2] 2.76 g of sodium and 20 g of xylene were placed in a flask, and under the same conditions as in Example 1, a solution of 1.60 g of CzMeDCS, 9.55 g of phenylmethyldichlorosilane and 5 g of xylene was added in about 5 minutes. Dropped. After reacting for 6 hours, the same post-treatment as in Example 1 was carried out to obtain polysilane shown in Table 2.
【００２４】また、得られたポリシランの組成は仕込量
にほぼ依存し、下記式で示されるものであった。The composition of the obtained polysilane substantially depends on the charged amount and is represented by the following formula.
【００２５】[0025]
【化１１】 [Chemical 11]
【００２６】[0026]
【表２】 [Table 2]
【００２７】〔実施例３〕ナトリウム０．９４ｇ、キシ
レン２０ｇをフラスコに収め、実施例１と同様の条件
下、ＣｚＭｅＤＣＳ３．２ｇ、フェニルメチルジクロロ
シラン１．９１ｇ及びキシレン１０ｇの溶液を約５分間
で滴下した。６時間反応させた後、実施例１と同様の後
処理を行ったところ、表３に示すポリシランを得た。[Example 3] 0.94 g of sodium and 20 g of xylene were placed in a flask, and under the same conditions as in Example 1, a solution of 3.2 g of CzMeDCS, 1.91 g of phenylmethyldichlorosilane and 10 g of xylene was added in about 5 minutes. Dropped. After reacting for 6 hours, the same post-treatment as in Example 1 was carried out to obtain polysilanes shown in Table 3.
【００２８】また、得られたポリシランの組成は仕込量
にほぼ依存し、下記式で示されるものであった。The composition of the obtained polysilane was almost dependent on the charged amount and was represented by the following formula.
【００２９】[0029]
【化１２】 [Chemical formula 12]
【００３０】[0030]
【００３１】[0031]
【表３】 [Table 3]
【００３２】耐光分解性試験１：石英板上に実施例１〜
３で得られたポリシランを１μｍに製膜し、大気中にお
いて紫外線（３１２ｎｍ）を照射し、紫外線吸収スペク
トルを用いて分解の様子を調べた。更に、比較のため
（ＭｅＰｈＳｉ）nについても同様な試験を行った。紫
外線吸収スペクトルのチャ−トを図１に示すと共に、紫
外線照射量と３３４ｎｍにおけるポリシランの紫外線吸
収度との関係を示すグラフを図３に示す。Photodegradation resistance test 1: Examples 1 to 1 on a quartz plate
The polysilane obtained in 3 was formed into a film having a thickness of 1 μm, and the film was irradiated with ultraviolet rays (312 nm) in the atmosphere, and the state of decomposition was examined using an ultraviolet absorption spectrum. Further, for comparison, a similar test was performed on (MePhSi) n . A chart of the ultraviolet absorption spectrum is shown in FIG. 1, and a graph showing the relationship between the ultraviolet irradiation amount and the ultraviolet absorption of polysilane at 334 nm is shown in FIG.
【００３３】図１及び図３の結果より、カルバゾイル基
含有ポリシランは耐光分解性が良好であることがわかっ
た。From the results shown in FIGS. 1 and 3, it was found that the carbazoyl group-containing polysilane has good photodecomposition resistance.
【００３４】耐光分解性試験２：ケイ素板上に実施例１
〜３で得られたポリシランを８μｍに製膜し、大気中に
おいて紫外線（３１２ｎｍ）を照射し、赤外線吸収スペ
クトルを用いて分解の様子を調べた。更に、比較のため
（ＭｅＰｈＳｉ）nについても同様な試験を行った。赤
外線吸収スペクトルのチャ−トを図２に示すと共に、紫
外線照射量とポリシラン中での増加シロキサン量との関
係を示すグラフを図４に示す。Photodegradation resistance test 2: Example 1 on silicon plate
The polysilane obtained in 3 to 3 was formed into a film having a thickness of 8 μm, irradiated with ultraviolet rays (312 nm) in the atmosphere, and the state of decomposition was examined using an infrared absorption spectrum. Further, for comparison, a similar test was performed on (MePhSi) n . A chart of the infrared absorption spectrum is shown in FIG. 2, and a graph showing the relationship between the ultraviolet irradiation amount and the increased siloxane amount in polysilane is shown in FIG.
【００３５】図２及び４の結果より、カルバゾイル基含
有ポリシランは耐光分解性が良好であることがわかっ
た。From the results shown in FIGS. 2 and 4, it was found that the carbazoyl group-containing polysilane had good photodecomposition resistance.
【図１】耐光分解性試験１において紫外線を照射したポ
リシランの紫外線吸収スペクトルを示すチャ−トであ
る。FIG. 1 is a chart showing an ultraviolet absorption spectrum of polysilane irradiated with ultraviolet rays in a photolysis resistance test 1.
【図２】耐光分解性試験２において紫外線を照射したポ
リシランの赤外線吸収スペクトルを示すチャ−トであ
る。FIG. 2 is a chart showing an infrared absorption spectrum of polysilane irradiated with ultraviolet rays in photolysis resistance test 2.
【図３】耐光分解性試験１においてポリシランに照射し
た紫外線照射量と３３４ｎｍにおけるポリシランの紫外
線吸収度との関係を示すグラフである。FIG. 3 is a graph showing the relationship between the amount of ultraviolet irradiation of polysilane in photolysis resistance test 1 and the ultraviolet absorption of polysilane at 334 nm.
【図４】耐光分解性試験２においてポリシランに照射し
た紫外線照射量とポリシラン中での増加シロキサン量と
の関係を示すグラフである。FIG. 4 is a graph showing the relationship between the amount of ultraviolet irradiation of polysilane and the amount of increased siloxane in polysilane in photolysis resistance test 2.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 林田 章 神奈川県川崎市高津区坂戸100−１ 信越 化学工業株式会社コーポレートリサーチセ ンター内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Hayashida 100-1 Sakado, Takatsu-ku, Kawasaki-shi, Kanagawa Shin-Etsu Chemical Co., Ltd. Corporate Research Center
Claims (2)
類。 【化１】 （但し、式中Ｒ1，Ｒ2，Ｒ3，Ｒ4はそれぞれ水素原子又
は一価の炭化水素基であるが、Ｒ3，Ｒ4の少なくとも１
つは下記式で示されるカルバゾイル基を含有する一価炭
化水素基である。また、ｋ，ｍ，ｎは０≦ｋ≦１，０＜
ｍ≦１，ｋ＋ｍ＝１，ｎ≧６である。） 【化２】 1. A polysilane represented by the following general formula (1). [Chemical 1] (However, in the formula, R 1 , R 2 , R 3 , and R 4 are each a hydrogen atom or a monovalent hydrocarbon group, and at least one of R 3 and R 4 is
One is a monovalent hydrocarbon group containing a carbazoyl group represented by the following formula. Moreover, k, m, and n are 0 ≦ k ≦ 1,0 <
m ≦ 1, k + m = 1, n ≧ 6. ) [Chemical 2]
ロゲノシランと下記一般式（３）で示されるカルバゾイ
ル基含有ジハロゲノシランとを不活性溶媒中、アルカリ
金属と反応させることを特徴とする請求項１記載のポリ
シラン類の製造方法。 【化３】 Ｒ1Ｒ2ＳｉＸ2 ・・・・（２） Ｒ3 Ｒ4ＳｉＸ2 ・・・・（３） （但し、式中Ｒ1，Ｒ2，Ｒ3，Ｒ4はそれぞれ水素原子又
は一価炭化水素基であるが、Ｒ3，Ｒ4の少なくとも１つ
はカルバゾイル基を含有する一価炭化水素基である。）2. A diorganoha represented by the following general formula (2):
Logenosilane and carbazoi represented by the following general formula (3)
With dihalogenosilane containing an alkali group in an inert solvent
The poly according to claim 1, wherein the poly is reacted with a metal.
Method for producing silanes. [Chemical 3] R1R2SiX2 ・ ・ ・ ・ (2) R3 RFourSiX2 ... (3) (However, in the formula, R1, R2, R3, RFourAre hydrogen atoms or
Is a monovalent hydrocarbon group, but R3, RFourAt least one of
Is a monovalent hydrocarbon group containing a carbazoyl group. )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3224940A JP2650524B2 (en) | 1991-08-09 | 1991-08-09 | Polysilanes and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3224940A JP2650524B2 (en) | 1991-08-09 | 1991-08-09 | Polysilanes and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0543702A true JPH0543702A (en) | 1993-02-23 |
| JP2650524B2 JP2650524B2 (en) | 1997-09-03 |
Family
ID=16821577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3224940A Expired - Fee Related JP2650524B2 (en) | 1991-08-09 | 1991-08-09 | Polysilanes and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2650524B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2300196A (en) * | 1995-04-10 | 1996-10-30 | Sumitomo Chemical Co | Polysilanes |
| CN102532183A (en) * | 2011-12-31 | 2012-07-04 | 济南大学 | Carbazole chlorosilane and preparation method thereof |
-
1991
- 1991-08-09 JP JP3224940A patent/JP2650524B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2300196A (en) * | 1995-04-10 | 1996-10-30 | Sumitomo Chemical Co | Polysilanes |
| GB2300196B (en) * | 1995-04-10 | 1999-04-28 | Sumitomo Chemical Co | Polysilane, its production process and starting materials therefor |
| CN102532183A (en) * | 2011-12-31 | 2012-07-04 | 济南大学 | Carbazole chlorosilane and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2650524B2 (en) | 1997-09-03 |
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