JPH0542990A - Method for supplying special material gas - Google Patents

Method for supplying special material gas

Info

Publication number
JPH0542990A
JPH0542990A JP19899691A JP19899691A JPH0542990A JP H0542990 A JPH0542990 A JP H0542990A JP 19899691 A JP19899691 A JP 19899691A JP 19899691 A JP19899691 A JP 19899691A JP H0542990 A JPH0542990 A JP H0542990A
Authority
JP
Japan
Prior art keywords
material gas
special material
temperature
supplying
clean room
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19899691A
Other languages
Japanese (ja)
Other versions
JP3099441B2 (en
Inventor
Shunsuke Omori
俊介 大森
Hajime Kosugi
肇 小杉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP03198996A priority Critical patent/JP3099441B2/en
Publication of JPH0542990A publication Critical patent/JPH0542990A/en
Application granted granted Critical
Publication of JP3099441B2 publication Critical patent/JP3099441B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Filling Of Jars Or Cans And Processes For Cleaning And Sealing Jars (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Pipeline Systems (AREA)

Abstract

PURPOSE:To supply a special material gas stably and easily by providing a constant temperature and temperature gradient in a method for supplying the special material gas and particularly the gas low in vapor pressure from outside. CONSTITUTION:A special material gas pipe 6 is laid through an insulating duct 4 having fire dampers 7 provided between an outdoor storage shed 3 and a semiconductor manufacturing equipment 5 and air is normally supplied from the side of a clean room 10. The temperature of the special material gas pipe 6 is made the same as that of the clean room to supply the special material gas on a stable basis.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は特殊材料ガスの供給方法
に関し、特に装置間のわたり配管における特殊材料ガス
の供給方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for supplying a special material gas, and more particularly, to a method for supplying a special material gas in piping for connecting devices.

【0002】[0002]

【従来の技術】従来の特殊材料ガスの供給方法は、図3
に示すように屋外の貯蔵庫3内に設置されたガスシリン
ダー1とシリンダーキャビネット2と半導体素子製造設
備5とを1/4インチ又は3/8インチ等のステンレス
製の特殊材料ガス配管6で接続されている。特に、危険
ポテンシャルの高い特殊材料ガス配管6では屋外の貯蔵
庫3とクリーンルーム10間の渡り配管部でのガス漏洩
・大気拡散を防止するため特殊材料ガス配管6を塩化ビ
ニール又はステンレス製の配管6′中に施工し、シリン
ダーキャビネット2側での筐体排気で常にシリンダーキ
ャビネット2側に排気を行なっていた。又同様に、特殊
材料ガス配管6の継手又は溶接部のみを二重化する場合
もあった。
2. Description of the Related Art A conventional method for supplying a special material gas is shown in FIG.
As shown in FIG. 3, the gas cylinder 1, the cylinder cabinet 2 and the semiconductor device manufacturing equipment 5 installed in the outdoor storage 3 are connected by the special material gas pipe 6 made of stainless steel such as 1/4 inch or 3/8 inch. ing. Particularly, in the case of the special material gas pipe 6 having a high danger potential, the special material gas pipe 6 is made of vinyl chloride or stainless steel in order to prevent gas leakage and atmospheric diffusion in the transition pipe portion between the outdoor storage 3 and the clean room 10. It was installed inside and exhausted to the cylinder cabinet 2 side at all times by exhausting the casing on the cylinder cabinet 2 side. Similarly, in some cases, only the joint or weld of the special material gas pipe 6 is duplicated.

【0003】又、特殊な場合として、液体窒素等の極低
温流体を送気する場合には、その送気配管表面に大気中
の水分が凝縮・結露するのを防止するため真空二重配管
として、真空を用いて極低温流体と大気を遮断する場合
もあった。
As a special case, when a cryogenic fluid such as liquid nitrogen is fed, a vacuum double pipe is used to prevent condensation of water in the atmosphere on the surface of the air feeding pipe. In some cases, a vacuum was used to shut off the cryogenic fluid from the atmosphere.

【0004】[0004]

【発明が解決しようとする課題】この従来の特殊材料ガ
スの供給方法では、屋外貯蔵所とクリーンルーム間の渡
りの特殊材料ガス配管において外気温度(特に低温)の
影響を受け、液化ガス及び蒸気圧の低い特殊材料ガスを
半導体素子製造装置に送気する場合、外気温度の影響を
受ける部分において気体が液化したり、分解や組成変化
をおこしたりして、安定にガスが供給できないといった
問題があった。
In this conventional method for supplying a special material gas, the special material gas pipe between the outdoor storage and the clean room is affected by the outside air temperature (especially low temperature), and the liquefied gas and vapor pressure are affected. When a special material gas with a low temperature is sent to the semiconductor device manufacturing equipment, there is a problem that the gas cannot be stably supplied due to liquefaction, decomposition or composition change in the part affected by the outside temperature. It was

【0005】又、真空二重配管は特殊材料ガス配管に対
して一対一の対応のために配管施工が難しく、真空設備
等が膨大で又コスト的にも高くなるといった問題があっ
た。
Further, since the vacuum double pipe has a one-to-one correspondence with the special material gas pipe, it is difficult to construct the pipe, and the vacuum equipment and the like are enormous and the cost becomes high.

【0006】[0006]

【課題を解決するための手段】本発明の特殊材料ガスの
供給方法は、屋外貯蔵庫とクリーンルーム間の渡りの数
本の特殊材料ガス配管を保温処置を施したステンレス製
ダクト内に貫通させかつ屋外貯蔵庫とクリーンルームは
それぞれ防火ダンパーにて区画し、クリーンルーム側よ
り差圧で温度が調節された(25±4℃程度)空気をス
テンレス製ダクト内を通し、屋外貯蔵庫に供給する又屋
外貯蔵庫も空調機にて温度調節するが、この温度調節は
クリーンルーム室温よりも低く設定される。
The method of supplying a special material gas according to the present invention is a method in which several special material gas pipes between an outdoor storage and a clean room are penetrated into a heat-insulated stainless duct and the outdoors. The storage room and the clean room are each divided by a fireproof damper, and the air whose temperature is adjusted by the differential pressure from the clean room side (about 25 ± 4 ° C) is passed through the stainless duct to the outdoor storage room and the outdoor storage room is also air conditioner. The temperature is adjusted at, but this temperature adjustment is set lower than the room temperature of the clean room.

【0007】温度設定はクリーンルームの温度に対し
て、屋外貯蔵庫は0〜5℃低い温度設定し、かつステン
レス製ダクト内もこの間の温度となる様に排気バランス
をとり風速を設定する。
With respect to the temperature setting, the temperature of the outdoor storage is set to 0 to 5 ° C. lower than the temperature of the clean room, and the exhaust speed is balanced and the wind speed is set so that the temperature in the duct made of stainless steel is also in this range.

【0008】[0008]

【実施例】次に本発明について図面を参照して説明す
る。
The present invention will be described below with reference to the drawings.

【0009】図1は本発明の一実施例の断面図である。
この特殊材料ガスの供給では、まず、供給する特殊材料
ガスシリンダー1は、ガス供給性能(減圧弁、自動弁及
び各種インターロック)を備えたシリンダーキャビネッ
ト2内に装着される。このシリンダーキャビネット2
は、空調機で温調された屋外貯蔵庫3内に設置されてお
り、シリンダーキャビネット2は下方より屋外貯蔵庫3
内の空気を吸気し排気ダクトを通してスクラバー等の排
ガス処置装置内で処置される。
FIG. 1 is a sectional view of an embodiment of the present invention.
In the supply of the special material gas, first, the supplied special material gas cylinder 1 is mounted in a cylinder cabinet 2 having gas supply performance (pressure reducing valve, automatic valve and various interlocks). This cylinder cabinet 2
Is installed in an outdoor store 3 whose temperature is controlled by an air conditioner, and the cylinder cabinet 2 is placed in the outdoor store 3 from below.
The air inside is taken in and treated through an exhaust duct in an exhaust gas treatment device such as a scrubber.

【0010】特殊材料ガスはガスシリンダー1から半導
体素子製造設備5へ特殊材料ガス配管6で送気される
が、この特殊材料ガス配管は保温ダクト4にて接続され
ている。この保温ダクトはそれぞれ防火ダンパー7が設
けられており、貯蔵庫3とクリーンルーム10は区画で
きる様な構造である。通常は、クリーンルーム10側よ
り差圧でクリーンルーム10側の防火ダンパー7を介し
てクリーンルーム10内の空調された空気(25℃±4
℃)が保温ダクト4を通り貯蔵庫3へ供給される。尚貯
蔵庫3はクリーンルーム10より低い温度で空調されて
いて、若干の温度勾配を持つ。
The special material gas is sent from the gas cylinder 1 to the semiconductor element manufacturing facility 5 through the special material gas pipe 6, which is connected by the heat insulation duct 4. A fireproof damper 7 is provided in each of the heat retaining ducts, and the storage 3 and the clean room 10 can be partitioned. Normally, air-conditioned air in the clean room 10 (25 ° C. ± 4
(° C.) is supplied to the storage 3 through the heat insulation duct 4. The storage 3 is air-conditioned at a temperature lower than that of the clean room 10 and has a slight temperature gradient.

【0011】万一の火災、ガス漏洩の場合は図示しない
センサーにて事故を検知し防火ダンパー7をそれぞれ動
作させ各々の部屋を遮断する。
In the unlikely event of a fire or gas leak, a sensor (not shown) detects an accident and the fire dampers 7 are operated to shut off each room.

【0012】尚、渡りのダクト4の他の例として図2に
示すように、防火ダンパー7をダクト4の主管部に設け
ても良い。
As another example of the transition duct 4, a fire protection damper 7 may be provided in the main pipe portion of the duct 4 as shown in FIG.

【0013】[0013]

【発明の効果】以上説明したように、本発明は特殊材料
ガスの受け側から空調された空気を供給側へ送風するた
め、特殊材料ガスは常時一定温度に保たれ、かつ若干の
温度勾配を持つ様にしたので、特殊材料ガスは常に安定
に供給できるという結果を有する。
As described above, according to the present invention, the conditioned air is blown from the receiving side of the special material gas to the supplying side, so that the special material gas is always kept at a constant temperature and has a slight temperature gradient. Since it has the special material gas, it has the result that the special material gas can always be stably supplied.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す断面図。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】本発明の変更例を示す断面図。FIG. 2 is a sectional view showing a modified example of the present invention.

【図3】従来の例を示す断面図。FIG. 3 is a sectional view showing a conventional example.

【符号の説明】[Explanation of symbols]

1 ガスシリンダー 2 シリンダーキャビネット 3 貯蔵庫 4 保温ダクト 5 半導体素子製造設備 6 特殊材料ガス配管 7 防火ダンパー 10 クリーンルーム 1 Gas Cylinder 2 Cylinder Cabinet 3 Storage Cabinet 4 Heat Insulation Duct 5 Semiconductor Device Manufacturing Equipment 6 Special Material Gas Pipe 7 Fire Prevention Damper 10 Clean Room

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 半導体素子製造等に使用される材料ガス
を貯蔵所等から半導体素子製造設備へ送気・供給する方
法において、貯蔵所と前記半導体素子製造設備との間に
設置されたガス配管と、該ガス配管中に設置され前記貯
蔵所と前記半導体素子製造設備とを隔離する防火ダンパ
ーと、前記ガス配管内の雰囲気を一定にするダクトとを
備えることを特徴とする特殊材料ガスの供給方法。
1. A method for supplying / supplying a material gas used for semiconductor device manufacturing or the like from a storage or the like to a semiconductor device manufacturing facility, wherein a gas pipe installed between the store and the semiconductor device manufacturing facility. And a fire protection damper installed in the gas pipe for isolating the storage and the semiconductor device manufacturing equipment, and a duct for making the atmosphere in the gas pipe constant, Method.
【請求項2】 前記ガス配管を前記ダクトで包囲し、該
ダクトを通して前記材料ガスを前記半導体素子製造設備
側へ送気することを特徴とする請求項1記載の特殊材料
ガスの供給方法。
2. The method for supplying a special material gas according to claim 1, wherein the gas pipe is surrounded by the duct, and the material gas is sent to the semiconductor device manufacturing facility side through the duct.
JP03198996A 1991-08-08 1991-08-08 Supply method of special material gas Expired - Fee Related JP3099441B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03198996A JP3099441B2 (en) 1991-08-08 1991-08-08 Supply method of special material gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03198996A JP3099441B2 (en) 1991-08-08 1991-08-08 Supply method of special material gas

Publications (2)

Publication Number Publication Date
JPH0542990A true JPH0542990A (en) 1993-02-23
JP3099441B2 JP3099441B2 (en) 2000-10-16

Family

ID=16400371

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03198996A Expired - Fee Related JP3099441B2 (en) 1991-08-08 1991-08-08 Supply method of special material gas

Country Status (1)

Country Link
JP (1) JP3099441B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10277380A (en) * 1996-11-25 1998-10-20 L'air Liquide System and method for control distribution of liquefied gas
JP2008208877A (en) * 2007-02-23 2008-09-11 Matsushita Electric Ind Co Ltd Method and device for detecting liquid leakage from double pipe
WO2022249398A1 (en) * 2021-05-27 2022-12-01 株式会社日立ハイテク Plasma processing device
US11742214B2 (en) 2016-09-16 2023-08-29 Hitachi High-Tech Corporation Plasma processing method
US11961719B2 (en) 2020-06-25 2024-04-16 Hitachi High-Tech Corporation Vacuum processing method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10277380A (en) * 1996-11-25 1998-10-20 L'air Liquide System and method for control distribution of liquefied gas
JP4531873B2 (en) * 1996-11-25 2010-08-25 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード Controlled distribution system and method for liquefied gas
JP2008208877A (en) * 2007-02-23 2008-09-11 Matsushita Electric Ind Co Ltd Method and device for detecting liquid leakage from double pipe
US11742214B2 (en) 2016-09-16 2023-08-29 Hitachi High-Tech Corporation Plasma processing method
US11961719B2 (en) 2020-06-25 2024-04-16 Hitachi High-Tech Corporation Vacuum processing method
WO2022249398A1 (en) * 2021-05-27 2022-12-01 株式会社日立ハイテク Plasma processing device
JPWO2022249398A1 (en) * 2021-05-27 2022-12-01

Also Published As

Publication number Publication date
JP3099441B2 (en) 2000-10-16

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