JPH0542648B2 - - Google Patents
Info
- Publication number
- JPH0542648B2 JPH0542648B2 JP12557384A JP12557384A JPH0542648B2 JP H0542648 B2 JPH0542648 B2 JP H0542648B2 JP 12557384 A JP12557384 A JP 12557384A JP 12557384 A JP12557384 A JP 12557384A JP H0542648 B2 JPH0542648 B2 JP H0542648B2
- Authority
- JP
- Japan
- Prior art keywords
- dam
- transparent
- adhesive
- transparent substrate
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 claims description 44
- 239000000758 substrate Substances 0.000 claims description 34
- 239000000853 adhesive Substances 0.000 claims description 25
- 230000001070 adhesive effect Effects 0.000 claims description 25
- 230000003287 optical effect Effects 0.000 claims description 12
- 230000005693 optoelectronics Effects 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 2
- 239000007924 injection Substances 0.000 claims description 2
- 230000002093 peripheral effect Effects 0.000 claims description 2
- 230000000694 effects Effects 0.000 description 9
- 238000010586 diagram Methods 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 4
- 230000002950 deficient Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000001105 regulatory effect Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000003522 acrylic cement Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/03—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
- G02F1/0305—Constructional arrangements
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Transforming Electric Information Into Light Information (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、例えばテレビジヨン画像をスクリー
ン上に投射するプロジエクターに適用して好適な
電気光学効果を有する結晶の電界による複屈折を
利用した光変調器に係る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is applicable to, for example, a projector that projects television images onto a screen, and is suitable for optical modulation using birefringence caused by the electric field of a crystal having an electro-optical effect. Concerning vessels.
背景技術とその問題点
光変調器を用いたプロジエクターは、例えば第
1図に示すように、管体1内にそのフエース部1
fに対向してターゲツト2が配置される。ターゲ
ツト2は、第2図に示すように、電気光学効果を
有する結晶薄板、例えば、KD2PO4(以下DKDP
という)、或いはKH2PO4(以下KDPという)よ
りなる結晶薄板3の一方の面に2次電子放出比が
大で且つ可視光を反射する例えば多層膜構造によ
る誘電体ミラー膜4が被着され、他方の面に透明
銅電膜5、例えば、In2O3膜が蒸着されて、この
透明導電膜5側において透明器板6にクランプさ
れてなる。また、このターゲツト2は、その透明
基板6側がフエース部1fに対向するように配置
される。BACKGROUND TECHNOLOGY AND PROBLEMS The projector using an optical modulator has a face portion 1 inside a tube body 1, for example, as shown in FIG.
Target 2 is placed opposite f. As shown in FIG. 2, the target 2 is a crystal thin plate having an electro-optic effect, for example, KD 2 PO 4 (hereinafter referred to as DKDP).
), or a dielectric mirror film 4 having a multilayer structure, for example, having a high secondary electron emission ratio and reflecting visible light is deposited on one surface of a crystal thin plate 3 made of KH 2 PO 4 (hereinafter referred to as KDP). A transparent copper conductive film 5, for example, an In 2 O 3 film, is deposited on the other surface, and the transparent conductive film 5 is clamped to a transparent plate 6. Further, this target 2 is arranged so that its transparent substrate 6 side faces the face portion 1f.
また、管体内には、ターゲツト2のミラー膜4
側に対向して第1及び第2のグリツド電極G1及
びG2が配置される。 Also, inside the tube, there is a mirror film 4 of the target 2.
First and second grid electrodes G1 and G2 are arranged laterally opposite each other.
そして、第1図に示すように、このターゲツト
2のミラー膜4上にカソードKからの電子ビーム
bを集束走査する。7及び8は夫々その集束及び
走査偏向用電磁手段を示す。 Then, as shown in FIG. 1, an electron beam b from a cathode K is focused and scanned onto the mirror film 4 of this target 2. 7 and 8 indicate the electromagnetic means for focusing and scanning deflection, respectively.
そして、管体1のフエース部1fの前方からタ
ーゲツト2に向つて光源9からの可視光を偏光子
10を介して照射し、ミラー膜4からの反射光を
検光子11を介してスクリーン12上に投射す
る。一方、透明導電膜5と第2グリツドG2との
間にビデオ信号、すなわちスクリーン12上に投
射すべき映像信号を印加する。この時、カソード
Kから電子ビームを一定の電流密度Ipをもつてタ
ーゲツト2の2次電子放出比δの高い誘電体ミラ
ー膜4上に走査し、ビデオ信号に応じて荷電させ
る。 Visible light from a light source 9 is irradiated from the front of the face portion 1f of the tube body 1 toward the target 2 via a polarizer 10, and the reflected light from the mirror film 4 is transmitted via an analyzer 11 onto a screen 12. to project. On the other hand, a video signal, that is, a video signal to be projected onto the screen 12, is applied between the transparent conductive film 5 and the second grid G2. At this time, an electron beam from the cathode K is scanned with a constant current density Ip over the dielectric mirror film 4 of the target 2, which has a high secondary electron emission ratio δ, and is charged in accordance with the video signal.
尚、第2グリツドG2は、ミラー膜4と近接し
た例えば40μmの距離を有する位置に配置され
る。また、第1グリツドG1は、これに、例えば
150Vの電位が与えられて、ミラー膜4より発生
した浮遊する2次電子を捕捉して、この浮遊する
2次電子によつて解像度の変化が生じないように
するものである。 The second grid G2 is placed close to the mirror film 4 at a distance of, for example, 40 μm. Moreover, the first grid G1 can be used, for example, to
A potential of 150 V is applied to capture floating secondary electrons generated from the mirror film 4, so that the floating secondary electrons do not cause a change in resolution.
この構成によれば、電子ビームbの衝撃、すな
わち1次電子の入射によつて誘電体ミラー膜4か
ら2次電子が放出されるか1次電子が蓄積される
かによつて、これに応じた電荷が誘電体ミラー膜
4に生じ、これによつて誘導体ミラー膜4に電位
が与えられる。この電位は、第2グリツドG2と
同電位となつたところで2次電子の放出が抑制さ
れるので、この電位で平衡する。すなわち、電子
ビームbの各走査位置で第2グリツドG2に与え
られたビデオ信号による電圧変化に応じた電荷パ
ターンが生じ、これによつてミラー膜4と透明導
電膜5との間において、結晶薄板3にビデオ信号
に応じた電界パターンが与えられてビデオ信号に
応じた縦効果による複屈折が生じる。 According to this configuration, depending on whether secondary electrons are emitted from the dielectric mirror film 4 or primary electrons are accumulated due to the impact of the electron beam b, that is, the incidence of primary electrons, An electric charge generated in the dielectric mirror film 4 is applied to the dielectric mirror film 4, thereby applying a potential to the dielectric mirror film 4. Since the emission of secondary electrons is suppressed when this potential reaches the same potential as the second grid G2, it is balanced at this potential. That is, at each scanning position of the electron beam b, a charge pattern is generated in accordance with the voltage change due to the video signal applied to the second grid G2, and as a result, a thin crystal plate is generated between the mirror film 4 and the transparent conductive film 5. 3 is given an electric field pattern according to the video signal, and birefringence occurs due to the longitudinal effect according to the video signal.
一方、偏光子10と検光子11とは、結晶薄板
3に電位パターンを与えない状態で光源9よりの
ターゲツト2に入射する光と、これにより反射す
る光に対してその光軸方向が直交するように配置
される。 On the other hand, the polarizer 10 and the analyzer 11 have optical axes that are perpendicular to the light incident on the target 2 from the light source 9 without applying a potential pattern to the thin crystal plate 3 and the light reflected thereby. It is arranged like this.
このような構成によれば、偏光子10を通じて
ターゲツト2に入る直線偏光が、誘電体ミラー膜
4で反射されて結晶薄板3中を往復通過すること
によつてここにおけるビデオ信号に応じて生じた
複屈折によつて変調され、これによつて検光子1
1を通過する光の濃淡が生じ、スクリーン12上
に光学像が投射されることになる。 According to such a configuration, linearly polarized light entering the target 2 through the polarizer 10 is reflected by the dielectric mirror film 4 and passes back and forth through the crystal thin plate 3, so that linearly polarized light is generated in accordance with the video signal there. is modulated by birefringence, thereby causing the analyzer 1
The light passing through the screen 12 is shaded, and an optical image is projected onto the screen 12.
このように、光変調基を用いることによつてプ
ロジエクターを構成できるものであり、この種の
プロジエクターは種々提案のなされているところ
である。その1例としては、特公昭43−29086号
公報が挙げられる。 In this way, a projector can be constructed by using a light modulation group, and various proposals have been made for this type of projector. One example is Japanese Patent Publication No. 43-29086.
一般に、この種の変調器において、結晶薄板3
はその厚さを例えば250μmという薄い厚さに研
磨して用いられる。この研磨加工は、基台上に仮
接着して行われ、その後、これを基台からとりは
ずして、透明基板6に接着される。しかしながら
このように薄く研磨された結晶薄板3を、損傷さ
せることなく透明基板6に接着する作業は極めて
難しく作業性が著しく低いものであると共に、接
着剤の硬化処理時の熱歪、接着剤の硬化による収
縮に伴う歪によつて結晶薄板3に亀裂や破損を来
すとか、変形を生じさせて平面度を低下させるな
ど、不良品の発生率を高めている。また、上述の
公変調器においては結晶薄板3を透明基板6に接
着するに当り、接着剤の厚みむらが生じ易いなど
の問題がある。 Generally, in this type of modulator, a thin crystal plate 3
is used after polishing it to a thinner thickness of, for example, 250 μm. This polishing process is performed by temporarily adhering it to a base, and then removing it from the base and adhering it to the transparent substrate 6. However, it is extremely difficult to bond the thinly polished crystal thin plate 3 to the transparent substrate 6 without damaging it, and the workability is extremely low. Distortion caused by shrinkage due to hardening may cause cracks or damage to the thin crystal plate 3, or may cause deformation to reduce flatness, increasing the incidence of defective products. Further, in the above-mentioned modulator, there is a problem that when the thin crystal plate 3 is bonded to the transparent substrate 6, the thickness of the adhesive tends to be uneven.
発明の目的
本発明は上述した諸欠点を回避し、不良品の発
生率が低く、作業性にすぐれ、信頼性の高い光変
調器を提供するものである。OBJECTS OF THE INVENTION The present invention provides an optical modulator that avoids the above-mentioned drawbacks, has a low incidence of defective products, is easy to work with, and is highly reliable.
発明の概要
本発明は、透明導電膜が被着された電気光学効
果を有する結晶薄板と、この結晶薄板が透明接着
剤によつて接着される透明基板とを有するもので
あり、透明基板の結晶薄板が接着される周縁部
に、一様な高さを有し、透明基板と、結晶薄板と
の間隔を設定する導電性接着剤による堰堤を設け
る。また透明基板の堰堤下から堰堤外に延在して
導電パターンを被着すると共に、堰堤を横切つて
透明接着剤の注入溝を設ける。そして、この堰堤
によつて囲まれた透明基板と結晶薄板との間に接
着剤を充填して透明基板に結晶薄板を接着する。Summary of the Invention The present invention comprises a thin crystal plate having an electro-optic effect on which a transparent conductive film is adhered, and a transparent substrate to which the thin crystal plate is bonded with a transparent adhesive. A dam made of conductive adhesive having a uniform height and setting the distance between the transparent substrate and the crystal thin plate is provided at the peripheral edge where the thin plate is bonded. Further, a conductive pattern is applied extending from below the dam of the transparent substrate to the outside of the dam, and a transparent adhesive injection groove is provided across the dam. Then, an adhesive is filled between the transparent substrate and the thin crystal plate surrounded by the dam to bond the thin crystal plate to the transparent substrate.
実施例
第3図以下を参照して本発明の一例を説明す
る。第3図は本発明による変調器を用いたプロジ
エクターの一例の構成図で、第4図はその光変調
器の略線的断面図を示す。第3図及び第4図にお
いて、第1図及び第2図と対応する部分には同一
符号を付して重複説明を省略する。図中22は本
発明による変調器、すなわちターゲツトを示す。
本発明の理解を容易にするために、第5図以下を
参照してその製造工程順に説明する。Embodiment An example of the present invention will be described with reference to FIG. 3 and subsequent figures. FIG. 3 is a block diagram of an example of a projector using a modulator according to the present invention, and FIG. 4 is a schematic cross-sectional view of the optical modulator. In FIGS. 3 and 4, parts corresponding to those in FIGS. 1 and 2 are designated by the same reference numerals, and redundant explanation will be omitted. In the figure, 22 indicates a modulator, ie, a target, according to the present invention.
In order to facilitate understanding of the present invention, the manufacturing process will be explained in order with reference to FIG. 5 and subsequent figures.
第5図Aに平面図を示し、同図Bに側面図を示
すように、透明基板26を用意する。この透明基
板26は、電気光学効果を有する結晶薄板をクラ
ンプしてピエゾ効果を抑制し、変調器の動作時に
その結晶薄板をキユリー点近傍の温度に冷却する
ための例えばペルチエ素子を取着するなどの目的
をもつて設けられるものであり、これらの目的に
沿う特性を有すると共に、可視光に対して光透過
率が高いこと、熱伝動率が高いことなどの特性を
有することが要求される。更にこの透明基板26
は、その屈折率が結晶薄板のそれと近い値を有す
ることが望まれる。この透明基板26は、例えば
厚さ5mm、幅56mm、長さ66mmのCaF2基板によつ
て構成される。この基板26の一方の主面26a
には、第4図に示すように、電気光学効果を有す
る結晶薄板23を接着するものであるが、今、こ
の結晶薄板23の配置領域を、第5図Aに示すよ
うに鎖線aで囲んで示すと、基板26の主面26
aに、この領域a内から外周緑に延在するよう
に、2本以上の溝28A及び28Bを形成する。
これら溝28A及び28Bは、領域aの対角位置
近傍に配置し得る。 A transparent substrate 26 is prepared as shown in a plan view in FIG. 5A and as shown in a side view in FIG. 5B. This transparent substrate 26 clamps a thin crystal plate having an electro-optical effect to suppress the piezo effect, and attaches, for example, a Peltier element to cool the thin crystal plate to a temperature near the Curie point during operation of the modulator. It is provided with the following objectives, and is required to have characteristics that meet these objectives, as well as characteristics such as high light transmittance for visible light and high thermal conductivity. Furthermore, this transparent substrate 26
is desired to have a refractive index close to that of the crystal thin plate. This transparent substrate 26 is composed of, for example, a CaF 2 substrate having a thickness of 5 mm, a width of 56 mm, and a length of 66 mm. One main surface 26a of this substrate 26
As shown in FIG. 4, a thin crystal plate 23 having an electro-optical effect is bonded to the thin crystal plate 23. Now, the area where this thin crystal plate 23 is placed is surrounded by a chain line a as shown in FIG. , the main surface 26 of the substrate 26
Two or more grooves 28A and 28B are formed in the area a so as to extend from within the area a to the outer periphery.
These grooves 28A and 28B may be arranged near diagonal positions of area a.
そして、第6A図に平面図を示し、同図Bに側
面図を示すように、基板26の主面26aに導電
パターン29を形成する。この導電パターン29
は、例えば厚さ0.3μm程度のAl蒸着膜によつて形
成し得る。また、この導電パターン29は、例え
ば、基板26の各辺に沿うように、領域a内から
外周緑に延在し、例えば各辺に沿う部分が互いに
欠除部30によつて分割されて形成される。 Then, as shown in a plan view in FIG. 6A and a side view in FIG. 6B, a conductive pattern 29 is formed on the main surface 26a of the substrate 26. This conductive pattern 29
can be formed by, for example, an Al vapor-deposited film with a thickness of about 0.3 μm. Further, the conductive pattern 29 extends from the inside of the area a to the outer periphery along each side of the substrate 26, for example, and is formed such that the portions along each side are separated from each other by the cutouts 30. be done.
これら各導電パターン29の各内縁上に跨つ
て、第7図Aに平面図を示し、第7図Bに側面図
を示すように、領域a内に、そのほぼ前周縁に沿
つて導電性接着剤による堰堤31を各部一様の高
さに形成する。 As shown in the plan view in FIG. 7A and in the side view in FIG. The dam 31 is formed with a uniform height at each part.
第8図Aに平面図を示し、第8図Bに側面図を
示し、第8図Cに第8図AのC−C線上の断面図
を示すように、堰堤31の全域上に跨つて電気光
学効果を有する結晶板33を載せる。この結晶板
33は、例えばDKDP、KDP等より成り、最終
的に得る結晶薄板23に比してその厚さが充分大
きい、例えば3mmの厚さを有し、幅30mm、長さ40
mmの長方形をなす。また、この結晶板33の堰堤
31に接着される側の主面33aは、平滑な面に
仕上げられ、この面33aに例えば厚さ1500Åの
透明導電膜25、例えば酸化インジウム、或いは
ITO(InとSnの複合酸化物)膜が被着される。こ
の場合、透明導電膜25は、少くともその一部、
望ましくはそのほぼ全周に亘つて、導電性接着剤
による堰堤に直接的に接着されて電気的に連結さ
れるようにする。 As shown in FIG. 8A a plan view, FIG. 8B a side view, and FIG. 8C a sectional view taken along line C-C in FIG. A crystal plate 33 having an electro-optic effect is mounted. This crystal plate 33 is made of, for example, DKDP, KDP, etc., and has a thickness sufficiently larger than that of the crystal thin plate 23 finally obtained, for example, 3 mm, a width of 30 mm, and a length of 40 mm.
Form a rectangle of mm. The main surface 33a of this crystal plate 33 on the side to be bonded to the dam 31 is finished as a smooth surface, and a transparent conductive film 25 with a thickness of, for example, 1500 Å, such as indium oxide or
An ITO (complex oxide of In and Sn) film is deposited. In this case, the transparent conductive film 25 includes at least a portion thereof,
Desirably, it is electrically connected to the dam by directly bonding it to the dam using a conductive adhesive over almost its entire circumference.
このようにして結晶板33と、基板26とが両
者間に介在された堰堤31の高さで規制された一
様の間隔が設定されたこれら結晶板33と基板2
6との間に堰堤31によつて囲まれた空間34が
形成されるようにする。この場合、上述した各溝
28A及び28Bは、堰堤31下を横切つて空間
34から空間34外に延在するようにその配置位
置が設定される。そして、一方の溝28Aに、注
入器を挿入して空間34内に、透明接着剤27を
注入充填する。この場合、他方の溝28Bは、空
間34内から空気を逃がす孔として作用させるも
のであり、したがつてこれら溝28A及び28B
の配置位置は前述したように空間34の対角点位
置に設けることが好ましい。 In this way, the crystal plate 33 and the substrate 26 are set at a uniform interval regulated by the height of the dam 31 interposed between the crystal plate 33 and the substrate 26.
A space 34 surrounded by a dam 31 is formed between the dam 6 and the dam 31. In this case, the above-mentioned grooves 28A and 28B are arranged so as to extend from the space 34 to the outside of the space 34 across the bottom of the dam 31. Then, a syringe is inserted into one of the grooves 28A to inject and fill the space 34 with the transparent adhesive 27. In this case, the other groove 28B acts as a hole through which air escapes from within the space 34, and therefore these grooves 28A and 28B
As described above, it is preferable to provide the position at the diagonal point of the space 34.
このようにして空間34内に、接着剤27を充
填して後は、両溝28A及び28Bによる空間3
4の外部との連通孔は、封止される。 After filling the space 34 with the adhesive 27 in this way, the space 34 formed by both grooves 28A and 28B is
The communication hole 4 with the outside is sealed.
このようにして、堰堤及び透明接着剤27によ
つて結晶板33を、透明基板26に接着させて
後、この状態で、結晶板33をその外面から、例
えば機械加工によつて第8図B及びCに鎖線bで
示す所要の厚さt、例えばt=250μmとなる迄、
研磨して肉薄にする。 After the crystal plate 33 is bonded to the transparent substrate 26 using the dam and the transparent adhesive 27 in this manner, the crystal plate 33 is in this state shown in FIG. 8B by machining, for example. and until the required thickness t, for example, t = 250 μm, shown by the chain line b in C, is reached.
Polish and make it thin.
上述の構成において、堰堤31は、この堰堤3
1によつて囲まれた空間34内に充填される透明
接着剤27と同一ないしは同種の接着剤が用いら
れ、両者のなじみが良く、また熱膨張率が近似し
ていて、光変調器22の動作状態すなわち、冷却
状態と、常温ないしは接着剤の硬化温度等との温
度差に基く、熱歪を回避し、剪断力の発生を回避
する。これら堰堤31及び透明接着剤27として
の接着剤は、エポキシ系接着剤、或いはアクリル
系接着を用い得る。 In the above configuration, the dam 31 is
The same or the same type of adhesive as the transparent adhesive 27 filled in the space 34 surrounded by Thermal distortion and generation of shear force due to the temperature difference between the operating state, that is, the cooling state, and room temperature or the curing temperature of the adhesive is avoided. As the adhesive for the dam 31 and the transparent adhesive 27, an epoxy adhesive or an acrylic adhesive may be used.
そして、堰堤31を構成する接着剤中には、そ
の高さ、すなわち、結晶板33と透明基板26と
の間隔を規制する均一寸法のフイラー、例えば均
一径のガラス繊維と、導電性を付与するための
Ag等の導電製粉末とを混合させる。また、フイ
ラーとしてのガラスは、変調器の動作時の冷却状
態で低いヤング率を有するようにガラス転移点が
低いガラス、例えばそのガラス転移点が40℃以下
の例えば25℃のものを用い得る。 In the adhesive constituting the dam 31, a filler of uniform dimensions, for example, glass fiber of a uniform diameter, is added to regulate the height, that is, the distance between the crystal plate 33 and the transparent substrate 26, and conductivity is added. for
Mix with conductive powder such as Ag. Further, the glass used as the filler may be a glass having a low glass transition point such that it has a low Young's modulus in a cooled state during operation of the modulator, for example, a glass whose glass transition point is 40° C. or less, for example, 25° C.
尚、この導電性粉末は、或る場合はこれ自体で
上述のフイラーの効果を得るようにすることもで
きる。この堰堤31は、例えばスクリーン印刷に
よつて所定のパターン、例えば長方形の額縁状に
形成し得るものであり、その高さには、例えば3
〜5μm、幅4mm、短辺側の内側間隔26mm、長辺
側内側間隔は36mmに選定し得る。 Incidentally, in some cases, this conductive powder can also be used by itself to obtain the above-mentioned filler effect. This dam 31 can be formed in a predetermined pattern, for example, in the shape of a rectangular frame, by screen printing, for example, and has a height of, for example, 3.
~5 μm, width 4 mm, inner spacing on the short side 26 mm, and inner spacing on the long side 36 mm.
このような構成によれば、電気光学効果を有す
る結晶薄板23上の透明導電膜25は、導電性堰
堤31を介して、透明基板26上の導電パターン
29に電気的に連結される。したがつて、この導
電パターン29を透明導電膜25に対する例えば
外部リード等の接続端子とすることができる。 According to this configuration, the transparent conductive film 25 on the crystal thin plate 23 having an electro-optic effect is electrically connected to the conductive pattern 29 on the transparent substrate 26 via the conductive dam 31. Therefore, this conductive pattern 29 can be used as a connection terminal for, for example, an external lead to the transparent conductive film 25.
そして、この場合、上述したように導電パター
ン29を複数部分に分割するときは、対のパター
ン、例えば互いに対向するパターンを組として各
対のパターン間の導電性を測定することによつて
これらパターン、すなわち、外部端子と透明導電
膜25との接触、ひいては、結晶板33の接着の
良否を判断することができる。 In this case, when dividing the conductive pattern 29 into a plurality of parts as described above, pair patterns, for example, patterns facing each other, are set and the conductivity between each pair of patterns is measured. In other words, it is possible to judge whether the contact between the external terminal and the transparent conductive film 25 and the adhesion of the crystal plate 33 are good or bad.
尚、空間34内に充填する透明接着剤27が導
電パターンと反応するおそれがある場合は堰堤3
1によつて囲まれる内側に両者を隔絶する分離堰
堤を設けることができる。 In addition, if there is a possibility that the transparent adhesive 27 filled in the space 34 may react with the conductive pattern, the dam 3
A separation dam can be provided inside the area surrounded by 1 to separate the two.
発明の効果
上述の本発明構成によれば、電気光学効果を有
する結晶薄板23を堰堤31によつて規制された
厚さの透明接着剤27によつて透明基板26に接
着した構成を採るので結晶薄板23は適量の接着
剤によつて厚みむらなく、したがつて確実強固に
接着される。また、透明導電膜25の外部端子導
出を導電性堰堤31を介して結晶薄板23に比し
広面積の基板26側から、すなわち広面積となし
得る導電パターン29からなすので、これに対す
る例えば外部リードの接続を容易且つ確実に行う
ことができる。Effects of the Invention According to the above-described configuration of the present invention, the thin crystal plate 23 having an electro-optical effect is bonded to the transparent substrate 26 with the transparent adhesive 27 having a thickness regulated by the dam 31, so that the crystal thin plate 23 having an electro-optic effect is bonded to the transparent substrate 26 with the transparent adhesive 27 having a thickness regulated by the dam 31. The thin plate 23 has an even thickness and is therefore reliably and firmly bonded with an appropriate amount of adhesive. Furthermore, since the external terminals of the transparent conductive film 25 are led out through the conductive dam 31 from the substrate 26 side, which has a wider area than the crystal thin plate 23, that is, from the conductive pattern 29 which can have a wide area, for example, external leads for this can be easily and reliably connected.
また、本発明構成によれば、結晶板33を肉厚
の透明基板26上に接着してから、所要の厚さに
研磨して結晶薄板23とすることができるので、
その取扱いが容易となり、また破損、変形などの
不都合を回避でき、不良品の発生率を激減できる
と共に信頼性の向上をはかることができるなど、
多くの利益をもたらすことができる。 Furthermore, according to the configuration of the present invention, the thin crystal plate 23 can be obtained by bonding the crystal plate 33 onto the thick transparent substrate 26 and then polishing it to a desired thickness.
It becomes easier to handle, avoids problems such as damage and deformation, drastically reduces the incidence of defective products, and improves reliability.
It can bring many benefits.
第1図は従来の光変調器によるプロジエクター
の構成図、第2図はその光変調器の略線的断面
図、第3図は本発明によるプロジエクターの一例
の構成図、第4図はその光変調器の略線的断面
図、第5〜8図は本発明による光変調器の製造工
程図である。
1は管体、9は光源、10は偏光子、11は検
光子、12はスクリーン、22はターゲツト、2
3は結晶薄板、24は誘電体ミラー膜、25は透
明導電膜、26は透明基板、27は透明絶縁性接
着剤、29は導電パターン、31は導電性接着剤
による堰堤である。
FIG. 1 is a block diagram of a projector using a conventional optical modulator, FIG. 2 is a schematic sectional view of the optical modulator, FIG. 3 is a block diagram of an example of a projector according to the present invention, and FIG. 4 is a block diagram of a projector using a conventional optical modulator. The schematic cross-sectional views of the optical modulator and FIGS. 5 to 8 are manufacturing process diagrams of the optical modulator according to the present invention. 1 is a tube, 9 is a light source, 10 is a polarizer, 11 is an analyzer, 12 is a screen, 22 is a target, 2
3 is a crystal thin plate, 24 is a dielectric mirror film, 25 is a transparent conductive film, 26 is a transparent substrate, 27 is a transparent insulating adhesive, 29 is a conductive pattern, and 31 is a dam made of conductive adhesive.
Claims (1)
る結晶薄板と、該結晶薄板が透明接着剤によつて
接着される透明基板とを有して成り、上記透明基
板には、上記結晶薄板が接着される周縁部に、一
様な高さを有し該透明基板と上記結晶薄板との間
隔を設定する導電性接着剤による堰堤を設け、該
堰堤下から該堰堤外に延在する導電パターンが被
着形成され、該堰堤を横切つて透明接着剤の注入
溝が設けられ、上記堰堤によつて囲まれた上記透
明基板と上記結晶薄板との間に接着剤が充填され
て上記透明基板に上記結晶薄板が接着されて成る
光変調器。1 Comprising a crystal thin plate having an electro-optical effect on which a transparent conductive film is adhered, and a transparent substrate to which the crystal thin plate is adhered with a transparent adhesive, and the crystal thin plate is attached to the transparent substrate. A dam made of a conductive adhesive having a uniform height and setting a distance between the transparent substrate and the crystal thin plate is provided on the peripheral edge to be bonded, and a conductive pattern extends from below the dam to outside the dam. A transparent adhesive injection groove is provided across the dam, and an adhesive is filled between the transparent substrate and the crystal thin plate surrounded by the dam to form the transparent substrate. An optical modulator comprising the above-mentioned thin crystal plate bonded to the substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12557384A JPS615230A (en) | 1984-06-19 | 1984-06-19 | Optical modulator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12557384A JPS615230A (en) | 1984-06-19 | 1984-06-19 | Optical modulator |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS615230A JPS615230A (en) | 1986-01-11 |
JPH0542648B2 true JPH0542648B2 (en) | 1993-06-29 |
Family
ID=14913525
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12557384A Granted JPS615230A (en) | 1984-06-19 | 1984-06-19 | Optical modulator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS615230A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01189625A (en) * | 1988-01-25 | 1989-07-28 | Hamamatsu Photonics Kk | Spatial light modulating tube |
JP4892990B2 (en) * | 2006-01-27 | 2012-03-07 | 日産自動車株式会社 | Drive device for four-wheel drive vehicle |
-
1984
- 1984-06-19 JP JP12557384A patent/JPS615230A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS615230A (en) | 1986-01-11 |
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