JPH054100U - A device for preventing inclusion of an irradiation target in an electron beam irradiation device - Google Patents

A device for preventing inclusion of an irradiation target in an electron beam irradiation device

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Publication number
JPH054100U
JPH054100U JP5889891U JP5889891U JPH054100U JP H054100 U JPH054100 U JP H054100U JP 5889891 U JP5889891 U JP 5889891U JP 5889891 U JP5889891 U JP 5889891U JP H054100 U JPH054100 U JP H054100U
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JP
Japan
Prior art keywords
slit
irradiation
flow
roller
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5889891U
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Japanese (ja)
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JP2503611Y2 (en
Inventor
啓三 林
洋三 矢田
Original Assignee
日新ハイボルテージ株式会社
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Priority to JP1991058898U priority Critical patent/JP2503611Y2/en
Publication of JPH054100U publication Critical patent/JPH054100U/en
Application granted granted Critical
Publication of JP2503611Y2 publication Critical patent/JP2503611Y2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

(57)【要約】 【目的】 遮蔽体のスリット部における被照射物の巻き
込みを防止すること。 【構成】 照射室のオゾン排気に伴う空気の流れは遮蔽
体3に設けられたスリット7を通過する。スリットの排
気流出口側、被照射物5の入口側に、複数のロ−ラ11
1ないし113を並列に設置する。搬送装置6によって被
照射物5はロ−ラ並設領域を通ってスリットに導入され
る。スリットを通る空気の流れは、スリットとロ−ラ、
ロ−ラとロ−ラとの間隙から流出し、スリットから遠い
間隙ほど流出量が少ない。被照射物先端には排気流によ
るまくれ現象が発生せず、空気の流れで浮き上がっても
ロ−ラで案内されるから、被照射物はスム−ズにスリッ
トに導入され、巻き込み状態が発生しない。
(57) [Abstract] [Purpose] To prevent the irradiation target from being caught in the slit of the shield. [Structure] The flow of air accompanying ozone exhaust in the irradiation chamber passes through a slit 7 provided in the shield 3. A plurality of rollers 11 are provided on the exhaust outlet side of the slit and the inlet side of the irradiation object 5.
Place 1 to 11 3 in parallel. The irradiation target 5 is introduced into the slit through the roller juxtaposed region by the transfer device 6. The flow of air through the slit is the slit and the roller,
It flows out from the gap between the rollers, and the flow amount is smaller in the gap farther from the slit. The tip of the irradiated object does not blister due to the exhaust flow, and even if it floats up due to the flow of air, it is guided by the roller, so the irradiated object is smoothly introduced into the slit and the entrained state does not occur. ..

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、電子線照射装置の遮蔽体のスリット部における被照射物の巻き込み 防止装置に関する。 The present invention relates to a device for preventing entrainment of an irradiation target in a slit portion of a shield of an electron beam irradiation device.

【0002】[0002]

【従来の技術】[Prior Art]

電子線照射装置にあっては、内部に発生する放射線が外に洩れないように遮蔽 体で蔽うようにして構成されており、被照射物の搬出入は、遮蔽体に設けたスリ ットを通して行われている。図4は、かかる電子線照射装置の概略断面図を示し 、照射室1、入口側予備室21、出口側予備室22は鉛或いはコンクリ−トによる 遮蔽体3で蔽われている。図示を省略した、照射室1上部の電子線発生源からの 電子ビ−ムは走査管4を通って被照射物5に照射される。被照射物5を電子線照 射装置内に矢印方向に搬送するために搬送装置6が設けられ、被照射物5は搬送 装置6に載置されて遮蔽体3に設けられたスリット7を通過する。このスリット 7は放射線の漏出が少なくなるように、被照射物5の搬出入に支障のない範囲で 、その開口(幅)については極力狭く構成されている。The electron beam irradiation system is constructed so that the radiation generated inside is shielded by a shield so that it does not leak outside, and the irradiation target is carried in and out through a slit provided on the shield. Has been done. Figure 4 shows a schematic cross-sectional view of a electron beam irradiation device, irradiation chamber 1, the inlet-side preliminary chamber 2 1, the outlet-side preliminary chamber 2 2 lead or concrete - are covered by the shield 3 by preparative. An electron beam from an electron beam generation source above the irradiation chamber 1 (not shown) passes through the scanning tube 4 and is irradiated onto the irradiation target 5. A transfer device 6 is provided to transfer the irradiation target 5 into the electron beam irradiation device in the direction of the arrow, and the irradiation target 5 is placed on the transfer device 6 and passes through the slit 7 provided in the shield 3. To do. The slit 7 is constructed so that the opening (width) of the slit 7 is as narrow as possible within a range that does not interfere with the loading and unloading of the irradiation target 5 so as to reduce the leakage of radiation.

【0003】[0003]

【考案が解決しようとする課題】[Problems to be solved by the device]

空気雰囲気中で電子線照射を行うと、オゾンが発生する。かかる照射の場合、 照射室1に排気口8を設け、照射室内の雰囲気を強制排気する必要がある。この ことは電子線照射装置外から遮蔽体3のスリット7を通して照射室1内への空気 の流れを生じさせ、特に流れの速度が大きいスリット部において、搬送される被 照射物5の先端部にめくれ、まくれ現象を発生させる。被照射物5は搬送装置6 で搬送されており、この搬送は一般に高速であるから、まくれ現象が発生すると 一瞬のうちに、被照射物5の巻き込み状態aが発生してスリット7に詰まってし まうという状態になる。これに伴い、被照射物5の搬送が不能となって搬送装置 6が過負荷状態となり、最悪の場合には、搬送装置6の切断という同装置の損傷 、故障をもたらすことになる。この点、スリット7にガイド板9を設けたものも あるが、これはスリット7のコ−ナ−、角(カド)に被照射物5が当るのを防ぐ 効果はあるが、空気の流れ、排気流の速度はかえって増加するから、被照射物5 のまくれ現象は防止できないし、巻き込み状態の検出手段を設け、その出力に搬 送装置6を応動させれば、同装置の故障を防ぐことはできたとしても、巻き込み 状態自体は解消することができず、まくれ現象に起因する巻き込み状態の発生は 、電子線照射装置による生産作業をストップさせるという状況を引き起こしてい る。 When electron beam irradiation is performed in an air atmosphere, ozone is generated. In the case of such irradiation, it is necessary to provide an exhaust port 8 in the irradiation chamber 1 and forcibly exhaust the atmosphere in the irradiation chamber. This causes a flow of air from the outside of the electron beam irradiation device into the irradiation chamber 1 through the slit 7 of the shield 3, and especially at the slit portion where the flow velocity is high, the tip of the irradiation target object 5 to be conveyed is generated. The phenomenon of curling up and rolling up occurs. The irradiation target 5 is transferred by the transfer device 6, and since this transfer is generally high-speed, when the burr phenomenon occurs, the rolled-up state a of the irradiation target 5 occurs instantly and the slit 7 is clogged. It will be in a state where it will stop. As a result, the object to be irradiated 5 cannot be transported, and the transport device 6 is overloaded, and in the worst case, the transport device 6 is disconnected, resulting in damage or failure of the device. In this respect, there is a slit 7 provided with a guide plate 9, which has the effect of preventing the irradiated object 5 from hitting the corners and corners of the slit 7, but the air flow, Since the speed of the exhaust flow rather increases, it is not possible to prevent the phenomenon that the irradiated object 5 blisters, and if a means for detecting the entrainment state is provided and the output of the carrying device 6 is responded to, the device can be prevented from malfunctioning. Even if it is possible, the trapped state itself cannot be eliminated, and the occurrence of the trapped state due to the blistering phenomenon causes a situation in which the production work by the electron beam irradiation device is stopped.

【0004】 本考案は、遮蔽体3のスリット部における被照射物の巻き込み状態の発生を防 ぐことができる装置を提供することを目的とするものである。It is an object of the present invention to provide an apparatus capable of preventing the occurrence of a wound state of an irradiation target object in the slit portion of the shield 3.

【0005】[0005]

【課題を解決するための手段】[Means for Solving the Problems]

本考案は、電子線照射装置において、遮蔽体のスリット部に隣接して、複数の ロ−ラを並設したことを特徴とするものである。 The present invention is characterized in that, in the electron beam irradiation apparatus, a plurality of rollers are juxtaposed adjacent to the slit portion of the shield.

【0006】[0006]

【作用】[Action]

スリットを通る空気の流れ、排気流は、スリットとロ−ラ、ロ−ラとロ−ラと の間隙から順に弱められて流出するから、被照射物は、殆ど空気の流れの影響を 受けないロ−ラ配置位置からロ−ラ並設部に搬送導入されると共に、被照射物の 先端部が浮き上がってもロ−ラの円周部で案内されて、スム−ズにスリットに入 り、まくれ現象、ひいては巻き込み状態の発生が防止される。 Air flow and exhaust flow through the slit are weakened and flow out from the gap between the slit and the roller, and between the roller and the roller, so that the irradiated object is hardly affected by the air flow. While being transferred from the roller placement position to the roller side-by-side installation part, even if the tip of the irradiated object floats up, it is guided by the circumferential part of the roller and enters the slit into the smooth, The burr phenomenon and the occurrence of the entrained state are prevented.

【0007】[0007]

【実施例】【Example】

本考案の実施例について図1ないし図3を参照して説明する。図1はスリット 部の斜視図、図2は電子線照射装置における概略断面図、図3は排気流について の説明図である。図4を含めて同一符号は同等部分を示す。遮蔽体3に設けられ たスリット7の排気流出口側、被照射物5の搬送路の上部に、複数のロ−ラ11 1 ないし113を並列に設置する。スリット7を通る排気流は、図3に矢印で示す ようにスリット7とロ−ラ111、ロ−ラ111とロ−ラ112、ロ−ラ112とロ −ラ113との間隙から流出し、流出量はスリット7に近い間隙ほど多く、スリ ットから遠ざかるほど流出量は少なくなる。したがって、被照射物5は搬送装置 6によって図1、図2の矢印方向に搬送されて、排気流の影響を殆ど受けないと ころからロ−ラ設置領域内に導入され、スム−ズにスリット7に入ることになる 。そして、被照射物5の先端部が、ロ−ラ設置領域通過過程で、排気流の影響を 受けて浮き上がっても、各ロ−ラ111ないし113の円周面、被照射物との接触 により回転するロ−ラの円周面で案内されて被照射物5の先端部はスム−ズにス リット7に導入される。 An embodiment of the present invention will be described with reference to FIGS. FIG. 1 is a perspective view of a slit portion, FIG. 2 is a schematic sectional view of an electron beam irradiation device, and FIG. 3 is an explanatory diagram of an exhaust flow. The same reference numerals indicate the same parts including FIG. A plurality of rollers 11 are provided on the exhaust outlet side of the slit 7 provided on the shield 3 and on the upper part of the conveyance path of the irradiation target 5. 1 Through 113Are installed in parallel. The exhaust gas flow passing through the slit 7 is directed to the slit 7 and the roller 11 as shown by the arrow in FIG.1, Roller 111And roller 112, Roller 112And Rolla 113The amount of outflow is larger in the gap closer to the slit 7, and the amount of outflow is smaller as the distance from the slit increases. Therefore, the irradiation object 5 is conveyed by the conveying device 6 in the direction of the arrow in FIGS. It will enter 7. Then, even if the tip of the irradiation object 5 floats up under the influence of the exhaust gas flow in the process of passing through the roller installation area, each roller 111Through 113The tip of the irradiation object 5 is smoothly introduced into the slit 7 while being guided by the circumferential surface of the roller, which is rotated by contact with the irradiation object.

【0008】 上述の実施例では照射室1のオゾンを排気するものについて示したが、本考案 は照射室に不活性ガスを供給し、不活性ガスの雰囲気中で電子線照射を行うもの についても実施することができ、この場合にあっても、各ロ−ラ111ないし1 13は、スリットにおける排気流出口側で被照射物入口側に設けられる。各ロ− ラ111ないし113は中実体またはパイプを用い中空体で構成することができ、 また回転しないものであってもよいし、鉛などで構成することにより、放射線遮 蔽効果を持たせることができる。そして、各スリット部に設けられるロ−ラ数は 、被照射物の搬送速度、排気流量、スリット開口の大きさ等に応じて適宜決定す ればよい。In the above-mentioned embodiment, the one in which the ozone in the irradiation chamber 1 is exhausted is shown. However, the present invention also supplies the inert gas to the irradiation chamber and performs the electron beam irradiation in the atmosphere of the inert gas. can be implemented, even in this case, the b - La 11 1 to 1 1 3 is provided to be irradiated inlet side exhaust flow outlet side in the slit. Each of the rollers 11 1 to 11 3 can be formed of a hollow body using a solid body or a pipe, and may be a non-rotating body. If it is made of lead or the like, it has a radiation shielding effect. Can be made. Then, the number of rollers provided in each slit portion may be appropriately determined according to the conveyance speed of the irradiation object, the exhaust flow rate, the size of the slit opening, and the like.

【0009】[0009]

【考案の効果】[Effect of the device]

本考案は以上説明したように構成したので、並設された複数のロ−ラによって 被照射物に対するスリットからの排気流の影響を少なくすることが可能となり、 放射線遮蔽上問題となる遮蔽体のスリット開口を従来のものと比べて狭くするこ とができると共に、ロ−ラ自体に遮蔽機能を持たせることができるから、放射線 防護機能を向上させることができる。また、スリット部に複数のロ−ラを並設す るものであるから、電子線照射装置におけるその実施は容易であり、現在使用さ れている電子線照射装置にあっても内部構造を特に変改することなく実施するこ とができる。 Since the present invention is configured as described above, it is possible to reduce the influence of the exhaust gas flow from the slit on the irradiation target by the plurality of rollers arranged side by side, and it is possible to reduce the influence of the shield that is a problem in radiation shielding. The slit opening can be made narrower than the conventional one, and the roller itself can be provided with a shielding function, so that the radiation protection function can be improved. In addition, since a plurality of rollers are installed in parallel in the slit part, it is easy to implement in an electron beam irradiation device, and even in the electron beam irradiation device currently used, the internal structure is particularly It can be implemented without modification.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案の実施例の斜視図である。FIG. 1 is a perspective view of an embodiment of the present invention.

【図2】実施例の電子線照射装置全体の概略断面図であ
る。
FIG. 2 is a schematic sectional view of the entire electron beam irradiation apparatus of the embodiment.

【図3】排気流についての説明図である。FIG. 3 is an explanatory diagram of an exhaust flow.

【図4】従来の電子線照射装置全体の概略断面図であ
る。
FIG. 4 is a schematic sectional view of an entire conventional electron beam irradiation apparatus.

【符号の説明】[Explanation of symbols]

3 遮蔽体 5 被照射物 6 搬送装置 7 スリット 111〜113 ロ−ラ3 Shield 5 Object to be irradiated 6 Transfer device 7 Slit 11 1 to 11 3 Roller

Claims (1)

【実用新案登録請求の範囲】 【請求項1】 遮蔽体のスリット部に隣接して、複数の
ロ−ラを並設したことを特徴とする電子線照射装置にお
ける被照射物の巻き込み防止装置。
Claims for utility model registration: 1. A device for preventing entrainment of an object to be irradiated in an electron beam irradiation device, wherein a plurality of rollers are arranged in parallel adjacent to a slit portion of a shield.
JP1991058898U 1991-07-02 1991-07-02 A device for preventing inclusion of an irradiation target in an electron beam irradiation device Expired - Fee Related JP2503611Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1991058898U JP2503611Y2 (en) 1991-07-02 1991-07-02 A device for preventing inclusion of an irradiation target in an electron beam irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1991058898U JP2503611Y2 (en) 1991-07-02 1991-07-02 A device for preventing inclusion of an irradiation target in an electron beam irradiation device

Publications (2)

Publication Number Publication Date
JPH054100U true JPH054100U (en) 1993-01-22
JP2503611Y2 JP2503611Y2 (en) 1996-07-03

Family

ID=13097619

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1991058898U Expired - Fee Related JP2503611Y2 (en) 1991-07-02 1991-07-02 A device for preventing inclusion of an irradiation target in an electron beam irradiation device

Country Status (1)

Country Link
JP (1) JP2503611Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6124700U (en) * 1984-07-16 1986-02-14 日新ハイボルテ−ジ株式会社 Electron beam irradiation device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6124700U (en) * 1984-07-16 1986-02-14 日新ハイボルテ−ジ株式会社 Electron beam irradiation device

Also Published As

Publication number Publication date
JP2503611Y2 (en) 1996-07-03

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