JPH05345637A - Etching liquid for pretreatment of metal plating on glass surface, plating method and production of glass substrate - Google Patents

Abstract

PURPOSE:To provide a pretreating liquid to enable the metal plating on a glass surface in high adhesiveness, to provide a plating method using the pretreating liquid and to provide a process for producing a glass substrate. CONSTITUTION:The etching liquid for metal plating on a glass surface is composed of an aqueous solution containing potassium fluoride and acidic ammonium fluoride. A glass raw material is pretreated with the etching liquid and plated. A circuit pattern can be formed on a glass plate by pretreating a glass plate with the etching liquid and plating the treated surface with a conductive material.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an etching solution as a pretreatment liquid for plating a glass material, a plating method using the etching solution, and the etching solution as one aspect of the plating method. It also relates to a method for manufacturing a glass substrate.

[0002]

2. Description of the Related Art Glass has excellent electrical characteristics as a substrate, such as high frequency characteristics and insulation, and at the same time,
Because it is cheaper and easier to obtain than ceramics,
Attempts have been made to provide a printed wiring board by providing a conductor layer on glass.

However, providing a conductor layer on glass by plating has not been put to practical use. That is, in the plating method, since the glass surface is smooth, sufficient adhesion strength cannot be obtained unless the surface is roughened by etching.

In other words, it is well known that the plating adhesion largely depends on the surface roughness and surface deterioration state of the material to be plated, and the surface roughening by the etching treatment can be performed well. Then, the surface area is increased, and it is considered that the adhesion can be improved by the so-called anchoring effect (anchor effect) of the plating film. However, so far, no practical etching solution has been developed for that purpose.

For example, when etching with hydrofluoric acid, the etching cannot be controlled, the surface roughness is insufficient, and the glass surface strength is lowered due to overetching, so that sufficient plating adhesion strength cannot be obtained.

Strong alkaline etching has also been studied as a chemical method for surface roughening, but it is not practical because the etching conditions are strict.

Further, although mechanical surface roughening has been studied, it is difficult to roughen only a pattern portion by a mechanical method.

Further, as a method of forming a pattern without performing etching or surface roughening, there is a method of forming a pattern by a dry method such as sputtering. The formed pattern is further plated to secure a conductor thickness. However, there is a problem in that the process is complicated and the cost is high. Further, it is difficult to form a conductor on the inner surface of the through hole by a dry method such as sputtering.

On the other hand, as a pattern forming method other than plating, a pattern is formed by a method such as electroconductive paste printing, but this method cannot form a conductor on the inner surface of the through hole. There is a problem in practical use such as not being able to attach.

[0010]

SUMMARY OF THE INVENTION An object of the present invention is to provide an etching solution for surface roughening which is a pretreatment for plating a glass material with high adhesion strength.

Another object of the present invention is to provide a method for plating a glass material using such an etching solution, and in particular, a method for producing a glass substrate by forming a conductor on a glass plate.

In particular, the present invention has an object to form a plating or conductor pattern having high adhesion on glass by making the surface roughness of glass constant by etching and preventing overetching.

[0013]

Means for Solving the Problems As a result of intensive studies for achieving the above object, the present inventor has found that potassium fluoride and ammonium acid fluoride are used as an etching solution for pretreatment when plating a glass material. It has been found that an aqueous solution containing is extremely effective.

When the glass material is pretreated with this etching solution and then plated, plating with high adhesion can be obtained, and various plating films can be firmly formed on the glass surface, especially on a glass plate. It has been found that a glass substrate which could not be manufactured by the conventional plating method can be manufactured by performing copper plating using various methods for forming a circuit pattern required as a substrate. The present invention has been completed based on these findings.

The present invention provides an etching solution for pretreatment for plating a glass surface, which is characterized by comprising an aqueous solution containing potassium fluoride and ammonium acid fluoride.

Further, according to the present invention, a glass material is pretreated by using an etching solution composed of an aqueous solution containing potassium fluoride and ammonium acid fluoride as a pretreatment solution, and then the glass material is plated. It also provides a characteristic plating method.

Particularly, according to the present invention, a glass plate is pretreated by using an etching solution composed of an aqueous solution containing potassium fluoride and ammonium acid fluoride as a pretreatment liquid, and a conductor plating is applied to the glass plate to form a glass plate. The present invention provides a method for manufacturing a glass substrate, which is characterized by forming a circuit pattern.

Both potassium fluoride and ammonium acid fluoride used in the etching solution of the present invention are known compounds. The potassium fluoride may be in any form such as anhydrous salt and dihydrate.

The etching solution of the present invention can be produced by dissolving both of these components in water in any order. The temperature at the time of dissolution is not particularly limited, and it may be dissolved at room temperature or slightly with heating.

The amount of these components used can be selected from a wide range, but generally potassium fluoride as an anhydrous salt is about 30 to 70 g / l, preferably 40 to 70.
g / l, more preferably about 45 to 65 g / l, is used at a concentration of about 30 to about 30 g of ammonium acid fluoride.
~ 70 g / l, preferably about 40-70 g / l,
More preferably, it is used at a concentration of about 45 to 65 g / l.

The amounts of potassium fluoride and ammonium acid fluoride used may deviate from the above range, but if the amount is less than the lower limit of the above range, the pretreatment is insufficient and the required adhesion strength is difficult to obtain, and the required adhesion is required. In order to obtain the above, it is necessary to lengthen the pretreatment time, and there is a tendency that the productivity is lowered, and on the other hand, when it exceeds the upper limit of the above range, overetching occurs, glass breakage occurs and the adhesion strength decreases. A tendency arises.

The etching liquid thus formed is preferably adjusted to have a pH of about 2.5 to 4, preferably about 3 to 3.8. This pH adjustment is performed by adjusting the concentrations of the potassium fluoride and ammonium acid fluoride within the predetermined range, or if necessary, an inorganic acid such as hydrochloric acid, sulfuric acid, hydrofluoric acid or a carboxylic acid. It is preferable to use an organic acid or the like.

The pH of the etching solution may be out of the above range, but when it is less than 2.5, there is a general tendency to cause overetching, and when the pH exceeds 4, etching becomes insufficient. A tendency arises.

According to the etching solution of the present invention, the surface roughness suitable for plating may be obtained, probably because nonuniform etching of the glass surface occurs. In addition, by appropriately adjusting the contact time and temperature of the etching liquid of the present invention with the glass, it is possible to prevent overetching that is observed when hydrofluoric acid is used.

As the glass material which can be pretreated by using the etching solution of the present invention, various materials can be used and are not particularly limited as long as they are glasses containing silicic acid as a main component.
For example, silicate glass, soda-lime glass, soda glass, lead glass, borosilicate glass, etc. are exemplified.

To perform the pretreatment for plating the glass material according to the present invention, simply contact the glass material with the etching solution of the present invention. As the method of contact, various methods can be adopted, and for example, any method such as immersing a glass material in the etching solution of the present invention, or immersing the glass material and shaking the etching solution can be adopted.

The pretreatment time and temperature may be appropriately selected from the viewpoints of obtaining an appropriate surface roughness and preventing overetching, but generally the temperature is 50 to 90 ° C.
Degree, preferably about 60 to 80 ° C., and the time is 10 to 10.
By setting the time to about 120 minutes, preferably about 30 to 60 minutes, good results can be obtained.

When the etching solution of the present invention is repeatedly used and each component and pH are out of the above ranges,
After the solid content in the system is removed by filtration or the like, the potassium fluoride and ammonium acid fluoride are replenished so as to have a concentration within the predetermined range, and if necessary, the pH is adjusted using the acid such as hydrochloric acid. Therefore, it can be used repeatedly.

The glass material pretreated with the etching solution of the present invention is washed with water if necessary, and then,
Various kinds of plating can be applied. The plating that can be applied to the glass subjected to the pretreatment of the present invention is not particularly limited as long as it can be electrolessly plated, and copper plating, silver plating, gold plating, nickel plating, cobalt plating, palladium plating, tin A wide range of materials such as plating and electroless alloy plating (for example, nickel-iron alloy plating) can be used.

The plating bath used for this plating is also
Any conventionally known electroless plating bath can be used under conventionally known conditions. The following are examples of particularly advantageous plating baths.

(1) Electroless copper plating bath Copper sulfate 7 to 10 g / l formalin 10 to 20 g / l Complexing agent 20 to 25 g / l Sodium hydroxide 10 g / l Stabilizer Trace amount Plating conditions pH 11 to 12 Temperature 50 to 60 ° C.

(2) Electroless nickel plating bath Nickel sulfate 20 to 80 g / l Sodium hypophosphite 10 to 30 g / l Complexing agent 10 to 30 g / l Plating conditions pH 3.5 to 6 Temperature 75 to 90 ° C.

(3) Electroless cobalt plating bath Cobalt chloride 30 to 35 g / l Sodium hypophosphite 10 to 20 g / l Complexing agent 10 to 35 g / l Ammonium chloride 50 g / l Plating conditions pH 8 to 10 Temperature 85 to 85 100 ° C.

(4) Electroless gold plating bath Potassium gold cyanide 14 g / l Complexing agent 40 g / l Plating conditions pH 5-6 Temperature 80 ° C.

(5) Electroless silver plating bath Silver cyanide 2 g / l Sodium cyanide 0.2 g / l Sodium hypophosphite 10 g / l Plating conditions pH 7 Temperature 95 ° C.

(6) Electroless tin plating bath stannous chloride 19 g / l sodium hydroxide 23 g / l sodium cyanide 185 g / l plating conditions pH 12-13 temperature room temperature.

(7) Electroless palladium plating bath Palladium chloride 2 g / l Hydrochloric acid 4 ml / l Ammonia water 160 ml / l Sodium hypophosphite 10 g / l Plating conditions pH 8 Temperature 55 ° C.

(8) Electroless nickel-iron alloy plating bath nickel sulfate + ferrous sulfate 28.3 g / l sodium hypophosphite 20 g / l complexing agent 40 g / l plating conditions pH 10 temperature 80 to 95 ° C.

The above-mentioned plating baths are described only for the purpose of illustration, and plating baths other than the above can be used, and in particular, any commercially available electroless plating bath can be used.

Further, on the electroless plating film formed on the surface of the glass material according to the present invention as described above, various kinds of electroplating, for example, electroplating copper, electroplating nickel, It is also possible to apply electro gold plating, solder plating, alloy plating, or the like. Such electroplating is carried out using a commonly known and commonly used electroplating bath,
It can be used and formed under normal conditions.

The glass material on which various kinds of metal films are formed as described above can be used in various fields such as decoration, reflection of light and heat, electromagnetic wave shielding, glass substrate and the like.

In the present invention, as one aspect of the above plating method, in particular, a glass plate pretreated by using the above etching solution as a pretreatment liquid is used, and copper or other conductive metal is plated on the glass plate. When the circuit pattern is formed, the circuit pattern adhesion strength and the pattern surface state as a printed wiring board can be obtained.

In this case, the glass plate is conventionally used for a glass substrate, and any glass plate that can be etched with the pretreatment liquid of the present invention can be used. It is sufficient to use a thick one. Further, the glass plate may be provided with holes to form through holes.

This glass plate is pretreated with the pretreatment liquid of the present invention as described above, and then a circuit pattern is formed to form a printed wiring board by a so-called additive method which has been conventionally used. Various methods known per se, such as application, can be adopted without requiring particularly significant changes.

For example, after pretreating the entire surface of the glass plate with the pretreatment solution of the present invention, a catalyst for copper plating is attached to the entire surface (including the inner surface of the hole if there is a through hole) to perform electroless copper plating. Alternatively, electroless nickel plating is applied to the entire surface, and then electroless copper plating is applied to the electroless copper plating or electroless nickel plating film, and an etching resist (for example, a photoresist film) is applied to a portion to be a circuit and a through hole portion. It is possible to adopt a method of attaching, forming a pattern, and removing an unnecessary portion of the copper plating film by etching.

Further, after pretreating the entire surface of the glass plate with the pretreatment liquid of the present invention, a catalyst for copper plating is attached to the entire surface and electroless copper plating is performed over the entire surface, except for the portion to be a circuit. Apply a plating resist to form a pattern,
Next, electrolytic copper plating is applied to a portion to be a circuit to make thick plating, solder or nickel that functions as an etching resist is applied on the thick plating, the above plating resist is removed, and the electroless coating covered with the plating resist is performed. A method of removing the copper plating by etching can also be adopted.

Further, in the above, a method of applying a catalyst, coating a non-circuit portion with a plating resist, immersing it in a known electroless copper plating solution to obtain a predetermined pattern thickness, and then peeling the resist is also applicable.

In any of the above cases, the catalyst treatment for copper plating can be carried out by a conventional method using a conventionally known catalyst such as palladium. When manufacturing a non-through-hole substrate or a low-aspect ratio substrate (a substrate having through-holes larger than the substrate thickness), the glass surface is roughened with the etching solution of the present invention, and then a dry method such as sputtering or vapor deposition is used. It is also possible to add a catalyst by plating. The plating baths for electroless copper plating and electrolytic copper plating, etching resists, etching solutions for removing copper platings, plating resists, etc. are all conventionally known and commonly used in the production of ordinary printed wiring boards. Can be used.

Further, unlike the above, the entire surface of the glass plate is not pretreated with the pretreatment liquid of the present invention, but the glass surface is left in advance before the pretreatment, leaving a portion to be a circuit of the glass plate. Cover with acid-resistant etching resist to expose the part that should become the circuit, and then expose the exposed glass.
A method of pretreating with the pretreatment liquid of the present invention, and then subjecting this portion to a catalyst treatment according to a conventional method, thickly applying electroless copper plating, and removing the above acid-resistant etching resist can also be employed.

In this method, any acid-resistant etching resist can be used as long as it has resistance to the pretreatment liquid of the present invention. For example, it is usually used in a known additive method. The etching resist etc. which are used can be used. In particular, it is preferable to use one having high adhesion to the glass surface. As the acid-resistant etching resist, for example, acrylic-based or epoxy-based etching resist can be used, but the acid-resistant etching resist is not limited thereto.

The glass substrate on which the circuit pattern is formed in this manner is manufactured as a product by a usual finishing process, for example, after applying an epoxy-based solder resist and then leveling or fusing.

[0052]

According to the present invention, the following excellent effects are exhibited.

(1) By using an aqueous solution containing potassium fluoride and ammonium acid fluoride of the present invention as a pretreatment liquid for an etching solution, it is possible to obtain various plating films having high adhesion to a glass material, which has been difficult in the past. It has become possible to form.

(2) In particular, according to the etching solution of the present invention and the plating method using the same as the pretreatment solution, a circuit pattern having an adhesion strength required for a printed wiring board, which cannot be produced by conventional plating, is provided. The glass substrate can be manufactured.

(3) In particular, when a glass plate pretreated with the etching solution of the present invention is subjected to, for example, electroless copper plating or electroless nickel plating and then electrolytic copper plating, a printed wiring board is obtained. As a result, it is possible to obtain an adhesion strength (1 kg / mm ² ) which is in a practical range or an adhesion strength higher than that.

(4) Further, the copper plating film obtained as described in (3) above has high heat resistance, and blister caused by heat,
Hard to peel off.

(5) Furthermore, according to the present invention, a through-hole glass substrate, which has been difficult to manufacture by the conventional glass substrate manufacturing method, can be easily manufactured by applying the conventionally known ordinary printed wiring board manufacturing method. Moreover, the conventional equipment can be used as it is.

[0058]

EXAMPLES The present invention will be described in more detail with reference to Examples and Comparative Examples.

Example 1 An aqueous solution containing 50 g / l of potassium fluoride anhydrous and 50 g / l of ammonium acid fluoride was used as an etching solution at a pH of about 3.

Plate of soda glass (10 cm × 10 c
m, thickness 3 mm) in the above etching solution at 70 ° C for 45
It was immersed for a minute and the whole surface was etched.

Next, using an electroless copper plating bath having the following composition, at a temperature of 55 ° C., for 30 minutes, a thickness of 2 μm was obtained.
No electroless copper plating film was formed on the entire surface.

Electroless Copper Plating Composition Copper sulfate 10 g / l EDTA 20 g / l formalin 20 g / l sodium hydroxide 10 g / l pH 12 temperature 55 ° C.

Further, using an electrolytic copper sulfate plating bath having the following composition, the temperature was 30 ° C. and the cathode current density was 2 A / dm ² .
It took 0 minutes to form an electrolytic copper plating film having a thickness of 28 μm on the entire surface.

Electrolytic copper sulfate plating bath composition Copper sulfate 180 g / l Sulfuric acid 45 g / l Brightening agent Small amount The copper plating film having a thickness of 30 μm obtained above is heat treated at 200 ° C. for 60 minutes to improve adhesion, and then By removing the copper plating film from unnecessary parts by etching, a 2mm x 2mm square pattern with a 20mm
With 25 pieces left at intervals, a copper wire was soldered to the copper film of each pattern, and the peeling strength was measured by an ordinary method.

As a result, the peeling strength was found to be 6.2 kg or more at the maximum and 4 kg at the minimum among the 25 patterns, and it was revealed that the peeling strength was high.

Comparative Example 1 A copper plating film was formed in the same manner as in Example 1 except that hydrofluoric acid having a concentration of 10% by weight was used instead of the etching solution of the present invention, and then heat treated at 200 ° C. for 60 minutes.

However, at the time of copper plating, the formed film was partially peeled off by liquid stirring. The formed copper plating film also has blisters due to heat treatment, or 2 mm × 2 formed in the same manner as in Example 1.
Peeling occurred due to heat when the copper wire was soldered to the mm square pattern. Although there was a pattern in which the peeling strength could be measured without causing such a problem, the peeling strength was only 0.5 kg at maximum.

Example 2 A soda glass plate (10 cm × 10 cm, thickness 3 mm) having a plurality of through-holes with a diameter of 1 mm at predetermined locations was prepared.
A printed circuit board was manufactured by being subjected to the following steps. First, it was immersed in the following etching solution at 70 ° C. for 45 minutes.

Potassium fluoride anhydrous 50 g / l ammonium acid fluoride 50 g / l pH 3. Next, it is immersed in a commercially available electroless copper plating bath at 55 ° C. for 30 minutes, electroless copper plating with a thickness of 2 μm is applied, an acrylic plating resist is applied to the non-patterned portion, and a commercially available electrolytic copper sulfate plating solution is used as a cathode. Using a current density of 2 A / dm ² ,
It was plated for 80 minutes, plated with copper having a thickness of 28 μm, and further soldered.

After that, the resist is peeled off, alkali copper etching is performed, and heat treatment is performed at 200 ° C. for 1 hour to obtain 260.
The printed circuit board was dipped in molten solder at ℃. During this time,
No defect due to poor adhesion did not occur in the pattern part including the inside of the through hole.

Test Example 1 Using an etching solution in which the concentration (g / l) of potassium fluoride (as an anhydrous salt) and the concentration (g / l) of ammonium acid fluoride were changed as shown in Table 1 below, The test was conducted as follows.

Plate of soda glass (10 cm × 10 c
m, thickness 3 mm) in the above etching solution at 70 ° C for 45
It was immersed for a minute and the whole surface was etched. Then, immerse in the following electroless copper plating bath or electroless nickel plating bath,
Platings having a thickness of 2 μm and 5 μm were formed, respectively. Copper plating was further performed on these electroless plating layers using the following electrolytic copper sulfate plating bath to obtain a plating film having a total thickness of 15 μm.

Electroless copper plating bath Copper sulfate 10 g / l EDTA 20 g / l formalin 20 g / l sodium hydroxide 10 g / l pH 12 temperature 55 ° C.

Electroless nickel plating bath Nickel sulfate 30 g / l Complexing agent 10 g / l Sodium hypophosphite 10 g / l pH 4.5 Temperature 85 ° C.

Electrolytic copper sulfate plating bath Copper sulfate 180 g / l Sulfuric acid 45 g / l Brightening agent Small amount Temperature 30 ° C. Cathode current density 2 A / dm ² .

The plating film thus obtained was heated at 200 ° C. for 1 hour, and the adhesion strength was measured in the same manner as in Example 1. Adhesion strength tended to be higher when electroless nickel plating was used than when electroless copper plating was used, but no significant difference was observed between the two. The overall tendency is shown in Table 1 below.

[0077]

[Table 1]

In Table 1, o and x have the following meanings: o: good adhesion x: poor adhesion or large variation in adhesion.

In the above test, when the surface condition after etching was observed, if the potassium fluoride concentration was too high, the surface irregularities became fine, and the minute holes on the surface exhibiting the anchor effect were reduced, resulting in a favorable result. Adhesion was not obtained. On the other hand, when the concentration of ammonium acid fluoride was too high, a large number of fine glass pieces were observed on the plating peeling surface, and it was confirmed that the glass surface was deteriorated and the adhesion strength was lowered.

Test Example 2 An aqueous solution containing 50 g / l of potassium fluoride anhydrous and 50 g / l of ammonium acid fluoride was used as an etching solution.

Plate of soda glass (10 cm × 10 c
m, thickness 3 mm) in the above etching solution at 70 ° C for 45
It was immersed for a minute and the whole surface was etched.

Next, the following electroless plating baths were used under the following plating conditions to form an electroless plating film having a thickness of 1 to 10 μm according to each electroless plating bath.

(1) Electroless cobalt plating bath Cobalt chloride 30 g / l Sodium hypophosphite 10 g / l Complexing agent 10 g / l Ammonium chloride 50 g / l Plating conditions pH 9 Temperature 90 ° C.

(2) Electroless gold plating bath Potassium gold cyanide 14 g / l Complexing agent 40 g / l Plating conditions pH 5-6 Temperature 80 ° C.

(3) Electroless silver plating bath silver cyanide 2 g / l sodium cyanide 0.2 g / l sodium hypophosphite 10 g / l plating conditions pH 7 temperature 95 ° C.

(4) Electroless tin plating bath stannous chloride 19 g / l sodium hydroxide 23 g / l sodium cyanide 185 g / l plating conditions pH 12 temperature room temperature.

(5) Electroless palladium plating bath Palladium chloride 2 g / l Hydrochloric acid 4 ml / l Ammonia water 160 ml / l Sodium hypophosphite 10 g / l Plating conditions pH 8 Temperature 55 ° C.

(6) Electroless nickel-iron alloy plating bath nickel sulfate + ferrous sulfate 28.3 g / l sodium hypophosphite 20 g / l complexing agent 40 g / l plating conditions pH 10 temperature 80 ° C.

Next, according to the cross-cut method, vertical and horizontal cuts (cross-cuts) were made in the obtained plating film at 1 mm intervals, and cellophane tape was attached to the part, and the tape was rapidly pulled apart to obtain adhesion of the film. Was measured.

As a result, no peeling was observed in any of the electroless plating films obtained above, and they had good adhesion.

Front Page Continuation (72) Inventor Shingo Saijo 6-12-7 Minamihanadai, Kawachinagano City, Osaka Prefecture (72) Inventor Takayuki Nakatani 348 Tomitabayashi City, Osaka 348

Claims (6)

[Claims] 1. An etching solution for pretreatment for plating a glass surface, which comprises an aqueous solution containing potassium fluoride and ammonium acid fluoride. 2. Potassium fluoride (as anhydrous salt) 30-
70 g / l and ammonium acid fluoride 30-70 g /
The etching solution according to claim 1, wherein the etching solution contains 1 and has a pH in the range of 2.5 to 4. 3. A plating characterized by pretreating a glass material using an etching solution comprising an aqueous solution containing potassium fluoride and ammonium acid fluoride as a pretreatment solution, and then plating the glass material. Method. 4. An aqueous solution containing 30 to 70 g / l of potassium fluoride (as an anhydrous salt) and ammonium acid fluoride 30.
The plating method according to claim 3, wherein the plating solution contains ~ 70 g / l and has a pH in the range of 2.5-4. 5. A circuit pattern is formed on a glass plate by pretreating the glass plate using an etching solution composed of an aqueous solution containing potassium fluoride and ammonium acid fluoride as a pretreatment liquid and conducting conductor plating. A method of manufacturing a glass substrate, comprising: 6. The aqueous solution comprises 30 to 70 g / l of potassium fluoride (as an anhydrous salt) and ammonium acid fluoride 30.
The method for producing a glass substrate according to claim 5, wherein the glass substrate contains ˜70 g / l and has a pH in the range of 2.5 to 4.