JPH05339800A - Jet plating device having soluble anode and insoluble anode - Google Patents

Jet plating device having soluble anode and insoluble anode

Info

Publication number
JPH05339800A
JPH05339800A JP14906592A JP14906592A JPH05339800A JP H05339800 A JPH05339800 A JP H05339800A JP 14906592 A JP14906592 A JP 14906592A JP 14906592 A JP14906592 A JP 14906592A JP H05339800 A JPH05339800 A JP H05339800A
Authority
JP
Japan
Prior art keywords
anode
plating
soluble
basket
insoluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14906592A
Other languages
Japanese (ja)
Inventor
Keiichi Okada
圭一 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP14906592A priority Critical patent/JPH05339800A/en
Publication of JPH05339800A publication Critical patent/JPH05339800A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To obtain a plating having uniform thickness and to prolong the service life of a plating soln. in the electroplating using ordinarily a soluble anode of copper, nickel, etc., for a multilayer substrate. CONSTITUTION:In the jet plating device, a pump 10 is provided for ejecting and circulating a plating soln. 12 and a box 5 is provided on the pipeline connected to a plating chamber 6, and a basket 3 charged with a pellet 2 (soluble anode) is placed in the box 5. The basket 3 is covered with an anode bag 4 to prevent anode sliming. The deterioration of a solution is prevented owing to the soluble anode in the basket 3. Meanwhile, an insoluble mesh anode 1 is placed in the plating chamber 6 to make the current distribution reproducible, and the film thickness is easily uniformized.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は可溶性アノードと不溶性
アノードを持つ噴流めっき装置に関する。
FIELD OF THE INVENTION The present invention relates to a jet plating apparatus having a soluble anode and an insoluble anode.

【0002】[0002]

【従来の技術】従来の技術は、図2に示すように、めっ
き液12を入れるためのめっき槽11と、被めっき物7
を置くためのめっきチャンバー6と、その内部に取り付
けられたメッシュアノード13と、めっき液12をめっ
き槽11から、めっきチャンバー5へ循環噴出させるた
めのポンプ10と、めっき電流を供給するための電源8
を有している。
2. Description of the Related Art In the prior art, as shown in FIG. 2, a plating tank 11 for containing a plating solution 12 and an object 7 to be plated are provided.
A plating chamber 6 for placing the metal plating, a mesh anode 13 mounted therein, a pump 10 for circulating and ejecting the plating solution 12 from the plating tank 11 to the plating chamber 5, and a power supply for supplying a plating current. 8
have.

【0003】次に動作について説明する。配線基板等の
平板状の被めっき物7をめっきチャンバー6の上に置
き、電源8と接続する。ポンプ10でめっき液12を循
環させ、非めっき物6上に噴出させる。そして、電源8
から所定の電流を供給することにおり、被めっき物6上
にめっきが行われる。
Next, the operation will be described. A plate-shaped object 7 to be plated such as a wiring board is placed on the plating chamber 6 and connected to the power supply 8. The plating solution 12 is circulated by the pump 10 and jetted onto the non-plated product 6. And power supply 8
By supplying a predetermined current from the plate, the object 6 to be plated is plated.

【0004】[0004]

【発明が解決しようとする課題】従来の技術では、銅め
っき,ニッケルめっき等の一般には可溶性アノードを使
用するめっきの場合に、不溶性アノードを使用すと、め
っき液の組成変動が大きく、めっき液の寿命が著しく短
くなる。また、可溶性アノードをメッシュ状にして使用
した場合は、めっきをするにつれて、アノードが溶解
し、陽極の形状が変化するため電流分布が変化し、よっ
てめっき膜厚分布が変化する。従って、めっき膜厚分布
の再現性が得られないため、めっき膜厚の均一化が困難
であった。さらに、溶解性アノードを使用する場合は陽
極スライムを防ぐため、アノードバックでアノードを覆
う必要がある。そのため、構造が複雑になりアノードの
交換が困難になる。そして、アノード交換後のめっき膜
厚確認の作業に時間がかかるというような問題点があっ
た。
In the prior art, when an insoluble anode is used in the case of plating using a soluble anode, such as copper plating and nickel plating, the composition of the plating solution varies greatly and the plating solution changes. The life of is shortened remarkably. Further, when the soluble anode is used in the form of a mesh, the anode is dissolved as the plating is performed and the shape of the anode is changed, so that the current distribution is changed and thus the plating film thickness distribution is changed. Therefore, since the reproducibility of the plating film thickness distribution cannot be obtained, it is difficult to make the plating film thickness uniform. Further, when using a soluble anode, it is necessary to cover the anode with an anode bag to prevent anode slime. Therefore, the structure becomes complicated and replacement of the anode becomes difficult. Further, there is a problem that it takes time to confirm the plating film thickness after the anode replacement.

【0005】[0005]

【課題を解決するための手段】本発明の可溶性アノード
と不溶解性アノードを持つ噴流めっき装置は、ポンプと
めっきチャンバーの間の配管の途中にボックスを設置
し、前記ボックスの中に粒状の可溶性アノードであるペ
レットを入れるためのバスケットを設け、陽極スライム
を防ぐためにバスケットをアノードバックで覆い、めっ
き電源と接続させ、また、めっきチャンバー内には不溶
性アノードを取り付け、別の電源と接続させる構成を有
している。
A jet plating apparatus having a soluble anode and an insoluble anode according to the present invention is provided with a box in the middle of a pipe between a pump and a plating chamber, and a granular soluble particle is placed in the box. A basket is provided to hold the anode pellets, the basket is covered with an anode bag to prevent anode slime, and the plating power source is connected.In addition, an insoluble anode is installed in the plating chamber and connected to another power source. Have

【0006】[0006]

【実施例】次に本発明について図面を参照して説明す
る。
The present invention will be described below with reference to the drawings.

【0007】図1は本発明の一実施例を示す断面図であ
る。めっき液12を入れるためのめっき槽11と、めっ
き槽11の上部に被めっき物7を置くためのめっきチャ
ンバー6を設置する。めっきチャンバー6の内部には、
メッシュ状の不溶解性アノード1を取り付け、電源8と
接続させる。めっき液12はポンプ10によりめっき槽
11から、めっきチャンバー6へ循環、噴出させる。ポ
ンプ10とめっきチャンバー6を結ぶ配管の途中に、ボ
ックス5を設置し、その中にアノードバック4で覆った
バスケット3を入れる。バスケット3の内部には、小さ
な粒状の溶解性アノードであるペレット2を入れ、バス
ケット3を不溶解性アノード1に接続したのとは別の電
源9に接続させる。次に動作について説明する。配線基
板等の被めっき物7をメッキチャンバー6上にめっき面
を下にして置き、電源8,9と接続させる。ポンプ10
により、めっき液12をめっき槽11から、ボックス5
中のペレット2及びめっきチャンバー6内の不溶性アノ
ード1を通して、めっきチャンバー6の下にあるめっき
槽11に戻る。電源8は不溶性アノード1に接続され、
電源9は可溶性アノードであるペレット2に接続されて
いて、所定のめっき電源を任意の割り合で不溶性アノー
ド1とペレット2に流すことができるようになってい
る。めっき液12をポンプ10により、めっきチャンバ
ー6上の被めっき物7のめっき面上に噴出、循環させて
いる時、電源8,9から所定のめっき電流を流すこと
で、被めっき物7の表面上に電気化学的に金属が検出
し、めっきされる。
FIG. 1 is a sectional view showing an embodiment of the present invention. A plating tank 11 for containing a plating solution 12 and a plating chamber 6 for placing an object 7 to be plated on the plating tank 11 are installed. Inside the plating chamber 6,
A mesh-shaped insoluble anode 1 is attached and connected to a power supply 8. The plating solution 12 is circulated and jetted from the plating tank 11 to the plating chamber 6 by the pump 10. A box 5 is installed in the middle of a pipe connecting the pump 10 and the plating chamber 6, and the basket 3 covered with the anode bag 4 is put therein. Inside the basket 3, pellets 2 which are small granular soluble anodes are placed, and the basket 3 is connected to a power source 9 different from that connected to the insoluble anode 1. Next, the operation will be described. An object 7 to be plated such as a wiring board is placed on the plating chamber 6 with the plating surface facing down and connected to the power sources 8 and 9. Pump 10
The plating solution 12 from the plating tank 11 to the box 5
The pellet 2 inside and the insoluble anode 1 in the plating chamber 6 are returned to the plating tank 11 below the plating chamber 6. The power supply 8 is connected to the insoluble anode 1,
The power source 9 is connected to the pellet 2, which is a soluble anode, so that a predetermined plating power source can be supplied to the insoluble anode 1 and the pellet 2 at an arbitrary ratio. When the plating solution 12 is jetted by the pump 10 onto the plating surface of the object 7 to be plated in the plating chamber 6 and is circulated, a predetermined plating current is caused to flow from the power sources 8 and 9 to thereby cause the surface of the object 7 to be plated. The metal is electrochemically detected and plated on.

【0008】また、バスケット3内にある可溶性アノー
ドであるペレット2はめっき中に金属イオンとして溶出
し、めっき液中に金属イオンを補充することができる。
Further, the pellet 2 which is a soluble anode in the basket 3 is eluted as metal ions during plating, and the plating solution can be supplemented with metal ions.

【0009】[0009]

【発明の効果】以上説明したように本発明は、不溶性ア
ノードと可溶性アノードの2種類のアノードを持ち、か
つ、それぞれのアノードに別々の電源を取り付けたの
で、不溶性アノードにより、電流分布の再現性が得られ
るようになり、めっき膜厚の均一化が容易になるという
効果、および可能性アノードにより、めっき液の金属イ
オンを補充することができるようになるため、めっき液
の寿命が伸びるという効果を有する。
As described above, the present invention has two types of anodes, an insoluble anode and a soluble anode, and separate power sources are attached to the respective anodes, so that the current distribution can be reproducible by the insoluble anodes. And the possibility that the plating film thickness can be easily made uniform, and the possibility that the anode can replenish the metal ions of the plating solution, thus extending the life of the plating solution. Have.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】従来の一例を示す断面図である。FIG. 2 is a cross-sectional view showing a conventional example.

【符号の説明】[Explanation of symbols]

1 不溶性メッシュアノード 2 ペレット(可溶性アノード) 3 バスケット 4 アノードバック 5 ボックス 6 めっきチャンバー 7 被めっき物 8 電源 9 電源 10 ポンプ 11 めっき槽 12 めっき液 13 メッシュアノード 1 Insoluble mesh anode 2 Pellet (soluble anode) 3 Basket 4 Anode back 5 Box 6 Plating chamber 7 Plated object 8 Power source 9 Power source 10 Pump 11 Plating tank 12 Plating solution 13 Mesh anode

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 めっきチャンバー上の被めっき物表面上
にめっき液を噴出させるためのポンプとめっきチャンバ
ーの間の配管途中に粒状の可溶性アノードを入れるバス
ケットを持ち、かつ、めっきチャンバー内部に不溶解性
のアノードを備えることを特徴とする可溶性アノードと
不溶性アノードとを持つ噴流めっき装置。
1. A pump for ejecting a plating solution onto the surface of an object to be plated on the plating chamber and a basket for putting a granular soluble anode in the middle of a pipe between the plating chamber, and insoluble in the plating chamber. Plating apparatus having a soluble anode and an insoluble anode, characterized in that it is provided with a conductive anode.
JP14906592A 1992-06-09 1992-06-09 Jet plating device having soluble anode and insoluble anode Pending JPH05339800A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14906592A JPH05339800A (en) 1992-06-09 1992-06-09 Jet plating device having soluble anode and insoluble anode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14906592A JPH05339800A (en) 1992-06-09 1992-06-09 Jet plating device having soluble anode and insoluble anode

Publications (1)

Publication Number Publication Date
JPH05339800A true JPH05339800A (en) 1993-12-21

Family

ID=15466913

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14906592A Pending JPH05339800A (en) 1992-06-09 1992-06-09 Jet plating device having soluble anode and insoluble anode

Country Status (1)

Country Link
JP (1) JPH05339800A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004510888A (en) * 2000-10-02 2004-04-08 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド Plating apparatus with remote second anode for semiconductor manufacturing
KR100877923B1 (en) * 2001-06-07 2009-01-12 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 Electrolytic copper plating method
JP2012219372A (en) * 2011-04-14 2012-11-12 Sumitomo Electric Ind Ltd Method for manufacturing aluminum porous member
CN111118582A (en) * 2020-01-10 2020-05-08 中国石油大学(华东) Preparation device and method of Ni-SiC composite coating with (220) high preferred orientation

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004510888A (en) * 2000-10-02 2004-04-08 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド Plating apparatus with remote second anode for semiconductor manufacturing
KR100877923B1 (en) * 2001-06-07 2009-01-12 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 Electrolytic copper plating method
JP2012219372A (en) * 2011-04-14 2012-11-12 Sumitomo Electric Ind Ltd Method for manufacturing aluminum porous member
CN111118582A (en) * 2020-01-10 2020-05-08 中国石油大学(华东) Preparation device and method of Ni-SiC composite coating with (220) high preferred orientation
CN111118582B (en) * 2020-01-10 2022-04-12 中国石油大学(华东) Preparation device and method of Ni-SiC composite coating with (220) high preferred orientation

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Effective date: 19990323