JPH05330856A - Low-reflecting glass - Google Patents

Low-reflecting glass

Info

Publication number
JPH05330856A
JPH05330856A JP14079692A JP14079692A JPH05330856A JP H05330856 A JPH05330856 A JP H05330856A JP 14079692 A JP14079692 A JP 14079692A JP 14079692 A JP14079692 A JP 14079692A JP H05330856 A JPH05330856 A JP H05330856A
Authority
JP
Japan
Prior art keywords
low reflection
film
reflection glass
glass
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14079692A
Other languages
Japanese (ja)
Other versions
JP2716315B2 (en
Inventor
Kensuke Makita
研介 牧田
Atsushi Takamatsu
敦 高松
Osamu Takahashi
修 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP4140796A priority Critical patent/JP2716315B2/en
Publication of JPH05330856A publication Critical patent/JPH05330856A/en
Application granted granted Critical
Publication of JP2716315B2 publication Critical patent/JP2716315B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To obtain such a low reflection glass that shows significant performance and excellent water-or oil-repellent property, contamination resistance, adhesive strength, scratching resistance and weather resistance, can maintain its performance for a long period and can be cleaned only by wiping the surface even water or dirt deposits, and thereby, is suitable for building material or automotive window or various glass products. CONSTITUTION:This low reflection glass has oxide thin films having different refractive indexes laminated on a glass substrate. The uppermost layer adjacent to air is SiO2 film or oxide mixture film of SiO2 with other oxides and has a rough surface with several 10 to several 100nm height or pores of several 10 to several 100nm diameter and has 1.40-1.60 refractive index and 70-130nm thickness. Further, the surface of the uppermost layer is coated with a silane compd. containing polyfluoroalkyl groups.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光学特性を損なう原因
となる水分や汚れが表面に付着しにくく、かつ付着した
際においても極めて簡単な払拭によってそれらを除去で
きるようになる、建築物用はもちろん、航空機用あるい
は車輌用、ことに自動車用等、各種ガラス物品に採用し
得る、有用な低反射ガラスを提供するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a structure in which water and dirt, which cause deterioration of optical characteristics, hardly adhere to the surface, and even if they adhere, they can be removed by extremely simple wiping. Of course, the present invention provides a useful low reflection glass that can be used for various glass articles for aircraft or vehicles, especially for automobiles.

【0002】[0002]

【従来の技術とその問題点】従来から、例えばガラス基
板上に屈折率の異なる酸化物膜を積層し、その多重干渉
を利用してガラス基板の反射率を下げ透視性を改善す
る、所謂多層膜低反射ガラスが知られており、実際に建
築用、産業用あるいは車輌用等として広く用いられてい
る。
2. Description of the Related Art Conventionally, for example, a so-called multi-layer structure in which an oxide film having a different refractive index is laminated on a glass substrate and the multiple interference is used to reduce the reflectance of the glass substrate and improve the transparency. Low-reflection film glass is known, and is actually widely used for construction, industry, vehicles and the like.

【0003】しかしながら、これら多層膜低反射ガラス
では、所望の光学特性を発現させるために屈折率と膜厚
が厳密に計算されており、所定の膜構成を外れる場合に
は目標とする光学特性が得られなくなり、また低反射膜
上に手垢、油、水垢などの汚れが付着した際にも、それ
らの汚れが低反射膜上に形成された新たな薄膜として作
用することとなるため同様な問題を生じることとなる。
However, in these multi-layered low reflection glass, the refractive index and the film thickness are strictly calculated in order to express the desired optical characteristics, and the target optical characteristics are not obtained when the film composition is out of the predetermined film constitution. The same problem because stains such as hand stains, oil, and water stains adhere to the low reflection film, and these stains act as a new thin film formed on the low reflection film. Will occur.

【0004】この際には、汚れが付着した部分は光学設
計がくずれ、周囲の正常な低反射部分に比べて反射率が
上がり非常に目立ち易くなって、透視性や美観などを損
ねることとなるものであった。
In this case, the optical design of the soiled portion is broken, the reflectance is higher than that of the normal low-reflectance portion in the surroundings, and it becomes very conspicuous, which impairs the transparency and aesthetics. It was a thing.

【0005】特に、指紋などの油性の汚れが付着した際
には、アルコールなどの溶剤で払拭し完全に除去しない
限り、いつまでも美観を損ねたままとなり易く、環境に
優しいとは言い難く、また溶剤などの払拭跡も残り易い
などの種々の問題が発現することとなるものである。
In particular, when oily stains such as fingerprints are attached, unless they are wiped off completely with a solvent such as alcohol to completely remove the stains, it is easy to keep the aesthetic appearance forever and it is difficult to say that it is environmentally friendly. This causes various problems such as wiping traces remaining easily.

【0006】上記の中で、例えば特公平3ー23493 号公
報には防汚性を有する低反射率ガラスが記載され、ガラ
スの表面上に金属酸化物を含有する縮合体からなる屈折
率1.60以上の薄膜と該薄膜上にフッ素原子が結合した炭
素の数が2以上のポリフルオロカーボン鎖を有する含フ
ッ素シリコーン化合物の縮合体からなる薄膜との二層膜
が形成されてなるものであることが開示されているもの
の、撥水性と低反射性を同時に得ようとして、Fーアル
キルシランとSiーアルコキシドを混合し、ハイブリッド
化させた溶液を用い、Fーアルキルシランの分解を防ぐ
ため、膜の最終加熱温度は400 ℃以下、例えば160 〜20
0 ℃程度にすることとなり、最上膜の硬度や強度が低い
ものしか得ることができないという問題がある。
Among the above, for example, Japanese Examined Patent Publication (Kokoku) No. 3-23493 describes a low reflectance glass having an antifouling property, and a refractive index of 1.60 or more formed of a condensate containing a metal oxide on the surface of the glass. It is disclosed that a two-layer film is formed on the thin film and a thin film made of a condensate of a fluorine-containing silicone compound having a polyfluorocarbon chain having two or more carbon atoms to which fluorine atoms are bonded. However, in order to obtain water repellency and low reflectivity at the same time, the final heating temperature of the film is 400 ° C in order to prevent the decomposition of F-alkylsilane by using a mixed solution of F-alkylsilane and Si-alkoxide. Below, for example, 160 to 20
Since the temperature is about 0 ° C., there is a problem that only the uppermost film having low hardness and strength can be obtained.

【0007】[0007]

【問題点を解決するための手段】本発明は、従来のかか
る問題点に鑑みてなしたものであって、自体低反射ガラ
スであるように、空気側の最上層の低屈折率膜としてSi
O2もしくはSiO2と他の酸化物との混合酸化物を、表面層
に数10〜数100nm の微小な凹凸もしくは径が数10〜数10
0nm の細孔を有する構造とし、かつその膜厚を反射防止
条件を満たすように制御して少なくとも形成し、さらに
その凹凸もしくは細孔を含む表面層全体にポリフルオロ
アルキル基含有シラン化合物を塗布することによって、
低反射効果を付与すると同時に、撥水性、撥油性ならび
に汚染防止性をも付与して、低反射ガラスに特有の汚れ
の付着に起因する透視性ならびに美観の劣化を防止する
こととができ、より長期に亘たり優れたその特性を維持
できる低反射ガラスを提供するものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems in the prior art, and as the low refractive index film on the air side, Si is used as the low refractive index film on the air side, as in the case of the low reflection glass itself.
A mixed oxide of O 2 or SiO 2 and other oxides is formed on the surface layer with minute irregularities of several tens to several hundreds nm or a diameter of several tens to several tens.
The structure has pores of 0 nm, and at least it is formed by controlling the film thickness so as to satisfy the antireflection condition, and then the surface layer including the irregularities or pores is coated with a polyfluoroalkyl group-containing silane compound. By
At the same time as imparting a low reflection effect, it is also possible to impart water repellency, oil repellency and anti-staining property to prevent deterioration of the transparency and aesthetics due to the adhesion of stains peculiar to the low reflection glass. It is intended to provide a low reflection glass capable of maintaining its excellent properties for a long period of time.

【0008】すなわち、本発明は、ガラス基板表面に屈
折率の異なる酸化物薄膜を積層してなる低反射ガラスに
おいて、空気側の最上層が、表面に数10〜数100nm の微
小な凹凸もしくは径が数10〜数100nm の細孔を有し、か
つ屈折率が1.40〜1.60、膜厚が70〜130nm の範囲に制御
したSiO2もしくはSiO2と他の酸化物との混合酸化物であ
り、さらに該表面にポリフルオロアルキル基を含有する
シラン化合物を被膜してなることを特徴とする低反射ガ
ラス。
That is, according to the present invention, in a low reflection glass obtained by laminating oxide thin films having different refractive indexes on the surface of a glass substrate, the uppermost layer on the air side has minute irregularities or diameters of several 10 to several 100 nm on the surface. Is a mixed oxide of SiO 2 or SiO 2 and other oxides having pores of several tens to several hundreds nm, a refractive index of 1.40 to 1.60, and a film thickness of 70 to 130 nm. Further, a low reflection glass characterized in that the surface is coated with a silane compound containing a polyfluoroalkyl group.

【0009】ならびに、前記低反射ガラスが、前記ガラ
ス基板の両面に形成してなる積層膜であって、膜面側へ
の入射光に対する可視光反射率を1%以下に低減せしめ
ることを特徴とする上述した低反射ガラス。
Further, the low reflection glass is a laminated film formed on both surfaces of the glass substrate, and the visible light reflectance for incident light on the film surface side is reduced to 1% or less. The low reflection glass described above.

【0010】また、前記低反射ガラスが、前記ガラス基
板の片側表面のみに形成してなる前記積層膜であって、
膜面側への入射光に対する可視光反射率を3〜5%にせ
しめることを特徴とする上述した低反射ガラス。
The low reflection glass is the laminated film formed on only one surface of the glass substrate,
The low reflection glass described above, which has a visible light reflectance of 3 to 5% with respect to incident light on the film surface side.

【0011】さらに、前記低反射ガラスが、前記ガラス
基板の片側表面のみに形成してなる積層膜であって、膜
面側への40〜80°の入射光に対する可視光反射率を4〜
6%低減せしめることを特徴とする上述した低反射ガラ
ス。
Further, the low reflection glass is a laminated film formed on only one surface of the glass substrate, and has a visible light reflectance of 4 to 40 for incident light of 40 to 80 ° on the film surface side.
The above-mentioned low reflection glass characterized by being reduced by 6%.

【0012】また、前記空気側の最上層の酸化物薄膜
が、少なくとも金属アルコキシドを出発原料とするゾル
ゲル法で形成することを特徴とする上述した低反射ガラ
ス。さらに、前記空気側の最上層の酸化物薄膜が、400
°C 以上の処理温度で行い、その後該酸化物薄膜表面に
ポリフルオロアルキル基を含有するシラン化合物を塗布
してなることを特徴とする上述した低反射ガラス。
Further, the above-described low reflection glass, wherein the oxide film of the uppermost layer on the air side is formed by a sol-gel method using at least a metal alkoxide as a starting material. Furthermore, the oxide thin film of the uppermost layer on the air side is 400
The low reflection glass described above, characterized in that the treatment is carried out at a treatment temperature of ° C or higher, and then the surface of the oxide thin film is coated with a silane compound containing a polyfluoroalkyl group.

【0013】さらにまた、前記SiO2と混合する酸化物
が、TiO2、ZrO2、Al2O3 、B2O3、SnO2、In2O3 、Ta2O3
のいずれかもしくはそれらの混合物であることを特徴と
する上述した低反射ガラスをそれぞれ提供するものであ
る。
Furthermore, the oxide mixed with SiO 2 is TiO 2 , ZrO 2 , Al 2 O 3 , B 2 O 3 , SnO 2 , In 2 O 3 , Ta 2 O 3
One of the above or a mixture thereof is provided.

【0014】ここで、前記したように、SiO2もしくはSi
O2と他の酸化物との混合酸化物を、表面表層に微小な凹
凸もしくは細孔を有する構造とすることとしたのは、表
面表層に特異な形状と特異な大きさで充分強固な微小な
凹凸もしくは細孔を形成せしめて膜の表面積を増やし、
撥水性、撥油性ならびに汚染防止性を発現するポリフル
オロ基含有シラン化合物を、単に表面に塗布するだけで
なく微小な凹凸もしくは細孔にも充分行き届いて溜まる
ようにし、表面層の付着量を多くしてその機能を高める
とともに、さらに払拭などの表面の摩耗に対しても、前
記ポリフルオロ基含有シラン化合物が充分長期に亘り残
せ、それらの特性が損なわれることがないようにしたも
のである。
Here, as described above, SiO 2 or Si
The mixed oxide of O 2 and other oxides has a structure that has minute irregularities or pores on the surface layer because it has a unique shape and size on the surface layer, Increase the surface area of the membrane by forming irregularities or pores,
A polyfluoro group-containing silane compound that exhibits water repellency, oil repellency, and anti-staining property is applied not only on the surface but also on minute irregularities or pores so that it accumulates sufficiently to increase the amount of adhesion on the surface layer. In addition to enhancing its function, the polyfluoro group-containing silane compound can be left for a sufficiently long time even when the surface is worn away such as wiping so that the characteristics thereof are not impaired.

【0015】また、表面表層に形成した凹凸や細孔は、
可視域の光の波長と同じか、あるいはそれ以下の大きさ
で、自体透視性を損なうものではなく、さらにこの上に
塗布されるポリフルオロアルキル基含有シラン化合物
は、無色透明であり、かつフッ素原子の分極率が小さい
ため屈折率が低く、低屈折率酸化物膜と同じかそれ以下
であるため、これらの処理によって低反射ガラスの透視
性を損なうことはないものである。
The irregularities and pores formed on the surface layer are
The wavelength of light in the visible region is equal to or less than the wavelength of light, and does not impair the transparency itself, and the polyfluoroalkyl group-containing silane compound applied on this is colorless and transparent, and Since the atomic polarizability is small, the refractive index is low, and since it is the same as or lower than that of the low refractive index oxide film, these treatments do not impair the transparency of the low reflection glass.

【0016】さらに、前記SiO2と混合される他の酸化物
とは、TiO2、ZrO2、Al2O3 、B2O3、SnO2、In2O3 あるい
はTa2O3 など種々の酸化物の中から適宜自由自在に選択
することができるものであり、最上層となる当該SiO2
酸化物薄膜を金属アルコキシドを出発原料とするゾルゲ
ル法で形成することがよく、SiO2系のゾル溶液と可溶性
で混合後、均質な混合酸化物ゾル溶液となり、かつその
混合酸化物の薄膜を形成した際に膜の屈折率を1.60以上
にすることがないような酸化物を選択することが必要で
ある。
Further, the other oxides mixed with SiO 2 include various oxides such as TiO 2 , ZrO 2 , Al 2 O 3 , B 2 O 3 , SnO 2 , In 2 O 3 or Ta 2 O 3 . are those that can be appropriately freely selected from among oxides, it is formed by a sol-gel method for the SiO 2 based oxide thin film to be the uppermost layer as a starting material a metal alkoxide well, the SiO 2 system It is possible to select an oxide that becomes a homogeneous mixed oxide sol solution after it is soluble and mixed with the sol solution, and that does not make the refractive index of the film 1.60 or more when a thin film of the mixed oxide is formed. is necessary.

【0017】さらにまた、前記ポリフルオロアルキル基
を含有するシラン化合物としては、CF3(CH2)2Si(OC
H3)3、CF3(CF2)5(CH2)2Si(OCH3)3、CF3(CF2)7(CH2)2Si
(OCH3)3、CF3(CF2)7(CH2)2SiCH3(OCH3)2 、CF3(CF2)3(C
H2)2Si(OCH3)3、CF3(CF2)7(CH2)2SiCl3、CF3(CH2)2SiCl
3、CF3(CF2)3(CH2)2SiCl3、CF3(CF2)5(CH2)2SiCl3等の
ような炭素数が1〜20のパーフルオロアルキル基を含む
シラン化合物、もしくはこれらを加水分解した縮合体が
採用できる。
Furthermore, as the silane compound containing a polyfluoroalkyl group, CF 3 (CH 2 ) 2 Si (OC
H 3) 3, CF 3 ( CF 2) 5 (CH 2) 2 Si (OCH 3) 3, CF 3 (CF 2) 7 (CH 2) 2 Si
(OCH 3 ) 3 , CF 3 (CF 2 ) 7 (CH 2 ) 2 SiCH 3 (OCH 3 ) 2 , CF 3 (CF 2 ) 3 (C
H 2 ) 2 Si (OCH 3 ) 3 , CF 3 (CF 2 ) 7 (CH 2 ) 2 SiCl 3 , CF 3 (CH 2 ) 2 SiCl
3 , CF 3 (CF 2 ) 3 (CH 2 ) 2 SiCl 3 , CF 3 (CF 2 ) 5 (CH 2 ) 2 SiCl 3 and other silane compounds containing a perfluoroalkyl group having 1 to 20 carbon atoms Alternatively, a condensate obtained by hydrolyzing these can be used.

【0018】またさらに、前記表面層形状を有する前記
酸化物薄膜の形成方法としては、例えば本出願人が先に
出願した特願平3ー316992号に記載した形成方法が最適
であり、当該方法は、基板上に形成する酸化物の原料溶
液として平均分子量が異なる、例えば数1000と数10万、
2種類の前駆体ゾルを混合した溶液を用い、その混合の
割合を制御することのみによって任意の表面層形状、例
えば凹凸もしくは細孔、を特異に発現することができる
ものである。
Further, as a method for forming the oxide thin film having the surface layer shape, for example, the method described in Japanese Patent Application No. 3-316992 filed previously by the present applicant is the most suitable. Are different in average molecular weight as a raw material solution of oxides formed on a substrate, for example, several thousand and several hundred thousand,
By using a solution in which two kinds of precursor sols are mixed and controlling the mixing ratio thereof, an arbitrary surface layer shape, for example, irregularities or pores, can be specifically expressed.

【0019】またさらに、前記ポリフルオロアルキル基
を含有するシラン化合物を、前記凹凸もしくは細孔を有
する表面層形状を備えた前記酸化物薄膜上に塗布する方
法としては、例えば本出願人が先に出願した特願平4ー
16688 号に記載した塗布方法であり、さらにこれらの方
法を厳密な光学設計に基づき酸化物薄膜を積層して成る
低反射ガラスとしたものであって、もともと可視光低反
射性能を有する耐久性を備えた特異な表面層に、撥水・
撥油ならびに耐汚染性を付与することとなり、相乗かつ
総合的に一体となって長期に亘っても、その性能を充分
発揮するものとなるものである。
Further, as a method of applying the silane compound containing a polyfluoroalkyl group onto the oxide thin film having the surface layer shape having the irregularities or pores, for example, the present applicant first Japanese Patent Application No. 4 filed
The coating methods described in No. 16688, which are made into low reflection glass by laminating oxide thin films based on strict optical design, and originally have durability with low visible light reflection performance. The unique surface layer provided with water repellency
It imparts oil repellency and stain resistance, and synergistically and comprehensively becomes one and sufficiently exerts its performance even for a long period of time.

【0020】すなわち、前記空気側の最上層となる酸化
物薄膜の低屈折率膜を、種々の酸化物薄膜の中で最も低
屈折率が得られるSiO2系酸化物薄膜(屈折率n=1.43〜
1.47) 、もしくは該SiO2に種々の物性を付与するため他
の酸化物を微量混合したあくまでも、SiO2系の酸化物薄
膜(屈折率n≦1.60) とすることによって、低屈折率と
特異な前記凹凸や細孔形状が得られる表面層形状制御性
とを確保しつつ、かつその膜厚を光学設計に基づいた所
定の厚さに形成することによって所定の光学特性をも同
時に発現させるため、従来低反射ガラスの致命的な欠陥
であった汚れの付着による低反射効果の劣化を飛躍的に
防止制御することが可能となったものである。
That is, the low refractive index film of the oxide thin film which is the uppermost layer on the air side is a SiO 2 -based oxide thin film (refractive index n = 1.43) which gives the lowest refractive index among various oxide thin films. ~
1.47), or merely by mixing trace amounts of other oxides to impart various physical properties in the SiO 2, by an oxide film of SiO 2 system (refractive index n ≦ 1.60), specificity and the low refractive index While ensuring the surface layer shape controllability in which the irregularities and pore shapes are obtained, and at the same time to express the predetermined optical characteristics by forming the film thickness to a predetermined thickness based on the optical design, It is possible to dramatically prevent and control deterioration of the low reflection effect due to adhesion of dirt, which has been a fatal defect of low reflection glass.

【0021】さらにまた、前記ガラス基板としては、無
機質あるいは有機質の透明板ガラスであって、無色また
は着色、ならびにその種類あるいは色調、形状等に特に
限定されるものではなく、さらに曲げ板ガラスとしては
もちろん、各種被膜ガラス、各種強化ガラスや強度アッ
プガラス、平板や単板で使用できるとともに、複層ガラ
スあるいは合せガラスとしても使用できることは言うま
でもない。
Furthermore, the glass substrate is an inorganic or organic transparent plate glass, and is not particularly limited to colorless or colored and its kind, color tone, shape, etc., and further, as a bent plate glass, of course, It goes without saying that it can be used as various coated glass, various tempered glass, strength-up glass, flat plate or single plate, and also as multi-layer glass or laminated glass.

【0022】[0022]

【作用】前述したとおり、本発明の低反射ガラスは、ガ
ラス基板上に異なる屈折率の酸化物を積層して成る中
で、表面層に特定深さの微小な凹凸もしくは特定径の細
孔を特異に有し、かつ特定の屈折率と膜厚に制御したSi
O2もしくはSiO2と他の酸化物薄膜との混合酸化物でもっ
て、最上層を少なくとも形成し、該最上層の上に特定し
た化合物を塗布し被膜することによるものてあり、付着
性も向上し頑固な薄膜とすることでき、ガラス基板との
界面はもちろん、積層膜での膜と膜の界面においても密
着性を格段に向上し、充分透視性があってかつ優れた耐
摩耗性、耐久性を有するものとなり、透明で硬度が高
い、しかも所定の光学特性等も同時に発現させて充分に
満足できるものとでき、低反射効果を付与すると同時
に、撥水性、撥油性ならびに汚染防止性をも付与して、
低反射ガラスに特有の汚れの付着に起因する透視性の劣
化、低反射効果の劣化ならびに美観の劣化を飛躍的に制
御することができて防止することができ、光学特性を損
なう水分や汚れが付着しにくく、しかも仮に付着しても
極めて簡単に払拭によってこれらを除去でき、さらに払
拭などでの表面摩耗も低減しこれらの特性を損なうこと
が激減し、より長期に亘たりその優れた特性を維持でき
るものであるとともに、高安全で厄介な工程を必要とせ
ず、安価に効率よく得られることとなって、建築用窓材
にはもちろん車両用窓材等に、広く有用な低反射ガラス
となるものである。
As described above, the low reflection glass of the present invention is formed by laminating oxides having different refractive indexes on a glass substrate, and in the surface layer, fine irregularities with a specific depth or pores with a specific diameter are formed. Si having a unique and controlled refractive index and film thickness
This is because at least the uppermost layer is formed with a mixed oxide of O 2 or SiO 2 and another oxide thin film, and the specified compound is applied and coated on the uppermost layer to improve the adhesion. The film can be made a stubborn thin film, and the adhesiveness is significantly improved not only at the interface with the glass substrate but also at the film-to-film interface in the laminated film, with sufficient transparency and excellent abrasion resistance and durability. It is also transparent and has high hardness, and at the same time, it can be sufficiently satisfied by exhibiting predetermined optical characteristics and the like, and at the same time imparts a low reflection effect and at the same time has water repellency, oil repellency and anti-staining properties. Grant,
It is possible to dramatically control and prevent the deterioration of the transparency, the deterioration of the low reflection effect and the deterioration of the aesthetics due to the adhesion of stains peculiar to low reflection glass, and to prevent water and stains that impair the optical characteristics. It is difficult to adhere, and even if it adheres, it can be removed very easily by wiping, and further, surface abrasion during wiping etc. is reduced and damage to these characteristics is drastically reduced, and its excellent characteristics for a longer period of time. In addition to being maintainable, it can be obtained efficiently at low cost without the need for a highly safe and troublesome process. It will be.

【0023】[0023]

【実施例】以下、実施例により本発明を具体的に説明す
る。ただし本発明は係る実施例に限定されるものではな
い。
EXAMPLES The present invention will be specifically described below with reference to examples. However, the present invention is not limited to the embodiment.

【0024】実施例1 大きさ約300mm x300mm 、厚さ約3mmのフロートガラス
基板を中性洗剤、水すすぎ、アルコール、アセトン等で
順次洗浄し、乾燥した後、該ガラス基板を、Siのアルコ
キシドとTiのアルコキシドとを酸化物換算のモル比で約
35:65 になるように混合し、イソプロピルアルコール等
の溶媒を加えて溶質濃度約0.4mol/l で粘度が約2cps
となるように調整したアルコキシド溶液中に浸漬し、約
4.3mm /秒の一定速度で上方にゆっくり引き上げ、ガラ
ス基板上にゲル膜を形成し、さらに約300 ℃に設定した
電気炉中に約10分間入れ加熱し、第1層目のSiO2・TiO2
系酸化物薄膜を得た。
Example 1 A float glass substrate having a size of about 300 mm × 300 mm and a thickness of about 3 mm was sequentially washed with a neutral detergent, water rinse, alcohol, acetone, etc. and dried, and then the glass substrate was treated with Si alkoxide. Approximate molar ratio of Ti alkoxide to oxide
Mix so that the ratio becomes 35:65, add a solvent such as isopropyl alcohol, and solute concentration is about 0.4 mol / l, and the viscosity is about 2 cps.
Dip it in an alkoxide solution adjusted to
Slowly pull it upwards at a constant rate of 4.3 mm / sec to form a gel film on the glass substrate, then put it in an electric furnace set at about 300 ° C for about 10 minutes and heat it to make the first layer of SiO 2 · TiO 2. 2
A system oxide thin film was obtained.

【0025】つぎに、Tiのアルコキシドとエタノールを
主成分とする溶媒を混合し、溶質濃度約0.35mol /l と
なるよう調整したアルコキシド溶液中に、上述したSiO2
・TiO2系酸化物薄膜付きガラス基板を浸漬し、約3.5mm
/秒の一定速度で上方にゆっくり引き上げ、第1層目と
同様に約300 ℃で約10分間加熱し、第2層目のTiO2の酸
化物薄膜を得た。
Next, the alkoxide of Ti and a solvent containing ethanol as a main component are mixed to prepare a solute concentration of about 0.35 mol / l in an alkoxide solution adjusted to the above-mentioned SiO 2 content.
・ Immerse the glass substrate with TiO 2 -based oxide thin film to about 3.5 mm
It was slowly pulled up at a constant rate of / sec and heated at about 300 ° C. for about 10 minutes in the same manner as the first layer to obtain a second layer of TiO 2 oxide thin film.

【0026】さらに次いで、テトラエトキシシラン〔Si
(OC2H5)4〕を出発原料とし、これを加水分解・重縮合さ
せた重量平均分子量が約126,000 のシリカゾル(a) と、
モノメチルトリエトキシシラン〔CH3Si(C2H5)3〕を出発
原料とし、これを加水分解・重縮合させた重量平均分子
量が約3,200 のシリカゾル(b) とを、酸化物換算のモル
比が約1:3.5 となるように混合した溶質濃度約0.4mol
/l の均一なシリカゾル溶液中に、上述した第1および
2層酸化物薄膜付きのガラス基板を浸漬し、上方に約3.
7 mm/秒の一定速度でゆっくり引き上げ、第1層目と同
様に約300 ℃で約10分間加熱し、第3層目のSiO2の酸化
物薄膜を得た。
Next, tetraethoxysilane [Si
(OC 2 H 5 ) 4 ] as a starting material, and hydrolyzed / polycondensed of the starting material to give a silica sol (a) having a weight average molecular weight of about 126,000,
Monomethyltriethoxysilane [CH 3 Si (C 2 H 5 ) 3 ] was used as the starting material and was hydrolyzed and polycondensed to obtain a silica sol (b) with a weight average molecular weight of about 3,200, which was converted to an oxide-based molar ratio. Solute concentration of about 0.4 mol
The above-mentioned glass substrate with the first and second layer oxide thin films was dipped in a uniform silica sol solution of 1 / l, and about 3.
It was slowly pulled up at a constant rate of 7 mm / sec and heated at about 300 ° C. for about 10 minutes in the same manner as the first layer to obtain a third layer of SiO 2 oxide thin film.

【0027】つぎにさらに、上述した3層薄膜積層ガラ
ス基板を、充分焼結して高密度で完全な酸化物積層薄膜
になるようにするため、約550 ℃の熱風循環炉に入れ、
約30分間加熱した。
Next, the above-mentioned three-layer thin-film laminated glass substrate was placed in a hot-air circulation furnace at about 550 ° C. in order to sufficiently sinter it into a high-density and complete oxide laminated thin film.
Heated for about 30 minutes.

【0028】得られた両面付き3層薄膜積層ガラス基板
は、該積層薄膜は第1層目が屈折率n1= 約1.90、膜厚d1
= 約75nm、第2層目が屈折率n2= 約2.15、膜厚d2= 約64
nm、第3層目が屈折率n3= 約1.45、膜厚d3= 約95nmであ
り、分光光度計で測定した可視光反射率が約0.7 %(薄
膜未処理のガラス基板が約8〜9%)の低反射ガラスで
充分優れたものであった。また、最上層の第3層目SiO2
の酸化物薄膜の表面層を電子顕微鏡により観察したとこ
ろ、直径が約40〜70nm程度のマイクロピット状の細孔が
多数認められ、所期の表面層となった。
In the obtained three-layer thin film laminated glass substrate with double-sided, the first layer of the laminated thin film has a refractive index n 1 = about 1.90 and a film thickness d 1
= About 75 nm, the second layer has a refractive index n 2 = about 2.15, the film thickness d 2 = about 64
nm, the third layer has a refractive index n 3 = about 1.45 and a film thickness d 3 = about 95 nm, and the visible light reflectance measured by a spectrophotometer is about 0.7% (about 8 to 8 9%) of low reflection glass, which was sufficiently excellent. Also, the uppermost third layer SiO 2
When the surface layer of the oxide thin film was observed with an electron microscope, a large number of micropit-like pores with a diameter of about 40 to 70 nm were observed, and it became the desired surface layer.

【0029】ついで、上記の3層薄膜積層ガラス基板上
に、トリクロロフルオロアルキルシラン〔CF3(CF2)7(CH
2)2SiCl3:東芝シリコーン製〕をスポイドで数滴滴下
し、ネル布でガラス基板全体に均一に塗り拡げた後、ア
セトンを染み込ませたネル布でむらがなくなるよう払拭
した。その後、約130 ℃で約10分間乾燥させた。
Then, a trichlorofluoroalkylsilane [CF 3 (CF 2 ) 7 (CH 2
2 ) 2 SiCl 3 : made by TOSHIBA Silicone] was dropped using a spoid, and spread evenly over the glass substrate with a flannel cloth, and then wiped off with a flannel cloth soaked with acetone to eliminate unevenness. Then, it was dried at about 130 ° C. for about 10 minutes.

【0030】該処理によっても、処理前に発現していた
低反射特性は変化しておらず、エリプソメーターで測定
すると、第3層目のSiO2の酸化物薄膜の屈折率n3= 約1.
45でほぼ不変であった。
The low reflection property developed before the treatment did not change even after the treatment, and when measured by an ellipsometer, the refractive index n 3 of the third layer of SiO 2 oxide thin film was about 1 .
It was almost unchanged at 45.

【0031】このようにして得られた低反射ガラスにつ
いて、大気中での水に対する接触角を、協和界面科学製
CAーA 型を用いて測定したところ、接触角が約112 °で
あり、高い撥水性を示し、また油脂等の汚れの付着の際
も、アルコール等で極めて簡単に払拭が可能であり、ア
ルコールの払拭跡も残らない、優れた低反射ガラスであ
った。
The contact angle of the low reflection glass thus obtained with water in the atmosphere was measured by Kyowa Interface Science Co., Ltd.
The contact angle is about 112 ° when measured with CA-A type, and it shows high water repellency.Also, even when dirt such as oil and fat is attached, it can be wiped off very easily with alcohol. It was an excellent low-reflection glass with no trace of wiping.

【0032】さらに、該撥水・撥油特性は長期に亘り劣
化するようなことが少なく、例えば促進耐候試験機(デ
ューパネルウエザーメーター)による耐候製試験では、
約2000時間後も水に対する接触角が約91°を示し、また
#40のブロード布による摩耗試験(トラバース試験)で
は、約100g/cm2 荷重による1000回程度往復摺動テスト
後も、水に対する接触角が約85°程度である低反射ガラ
スであった。
Further, the water / oil repellency is less likely to deteriorate over a long period of time. For example, in a weather resistance test using an accelerated weather resistance tester (due panel weather meter),
The contact angle with water is about 91 ° even after about 2000 hours, and in the abrasion test (traverse test) with # 40 broad cloth, even after about 1000 reciprocating sliding tests under a load of about 100 g / cm 2 against water, It was a low reflection glass with a contact angle of about 85 °.

【0033】なお、清浄なガラス基板の一方の片面をマ
スキングテープで被覆し、他方の片面のみに、上述した
3層薄膜積層膜を成膜した場合の低反射ガラスは、上述
の分光光度計で測定した可視光反射率が約4.5 %とな
り、薄膜未処理で膜なしのガラス面の可視光反射率に比
し、同様に優れた低反射ガラスであった。
The low-reflection glass in the case where one surface of a clean glass substrate is covered with a masking tape and the above-mentioned three-layer thin film laminated film is formed only on the other surface of the glass substrate is measured by the spectrophotometer described above. The measured visible light reflectance was about 4.5%, which was similarly excellent low reflection glass as compared with the visible light reflectance of the glass surface without the thin film and without the film.

【0034】実施例2 実施例1と同様に、清浄なガラス基板上に、各種のアル
コキシド溶液を用い、第1層目がSiO2・TiO2系酸化物薄
膜、第2層目がTiO2の酸化物薄膜、および最上層の第3
層目がSiO2・ZrO2系酸化物薄膜であって、酸化物換算の
SiO2とZrO2のモル比が約78:22の混合酸化物薄膜となる
ようにした、両面膜付き3層薄膜積層ガラス基板を得
た。なお、該第3層目のSiO2・ZrO2系酸化物薄膜は、実
施例1と同様のシリカゾル(a) とシリカゾル(b) とを酸
化物換算のモル比が約1:3.5 になるよう混合したシリ
カゾル溶液中に、Zrの金属アルコキシドのテトラブトキ
シジルコニウム〔Zr(OC4H9)4〕をエタノールで希釈した
溶液を加え充分に攪拌した溶液を用いた。
Example 2 As in Example 1, various alkoxide solutions were used on a clean glass substrate. The first layer was a SiO 2 TiO 2 -based oxide thin film and the second layer was TiO 2 . Oxide thin film, and the third top layer
The second layer is a SiO 2・ ZrO 2 -based oxide thin film,
A three-layer thin film laminated glass substrate with a double-sided film was obtained, which was a mixed oxide thin film having a molar ratio of SiO 2 and ZrO 2 of about 78:22. The SiO 2 .ZrO 2 -based oxide thin film of the third layer had the same molar ratio of the silica sol (a) and the silica sol (b) as in Example 1 in terms of oxides of about 1: 3.5. A solution prepared by diluting Zr metal alkoxide tetrabutoxyzirconium [Zr (OC 4 H 9 ) 4 ] with ethanol was added to the mixed silica sol solution, and the resulting mixture was sufficiently stirred.

【0035】上述の該3層薄膜積層ガラス基板は、約59
0 ℃で約30分間加熱した。その結果3層薄膜は、第1層
目が屈折率n1= 約1.91、膜厚d1= 約55nm、第2層目が屈
折率n2= 約2.20、膜厚d2= 約60nm、第3層目が屈折率n3
= 約1.55、膜厚d3= 約80nmであり、実施例1と同様、分
光光度計で測定した可視光反射率が約0.7 %の低反射ガ
ラスであった。
The above-mentioned three-layer thin film laminated glass substrate is approximately 59
Heat at 0 ° C. for about 30 minutes. As a result, in the three-layer thin film, the first layer has a refractive index n 1 = about 1.91, the film thickness d 1 = about 55 nm, the second layer has a refractive index n 2 = about 2.20, the film thickness d 2 = about 60 nm, The third layer has a refractive index n 3
= About 1.55, film thickness d 3 = about 80 nm, and was a low reflection glass with a visible light reflectance of about 0.7% measured by a spectrophotometer as in Example 1.

【0036】さらに、最上層の第3層目SiO2・ZrO2系酸
化物薄膜の表面層を電子顕微鏡により観察したところ、
実施例1 と同様に、直径が約数10nm程度のマイクロピッ
ト状の細孔が多数認められ、所期の表面層となった。
Furthermore, when the surface layer of the uppermost third SiO 2 .ZrO 2 type oxide thin film was observed with an electron microscope,
Similar to Example 1, a large number of micropit-shaped pores having a diameter of about several tens nm were recognized, and the surface layer was a desired layer.

【0037】ついで、上記の3層薄膜積層ガラス基板上
に、トリメチルフルオロアルキルシラン〔CF3(CF2)7(CH
2)2Si(CH3)3 〕を実施例1と同様の操作で塗布し、撥水
・撥油処理を行った。実施例1と同様に、該低反射ガラ
スについて、表面の水に対する接触角を測定したとこ
ろ、約110 °を発現しており、実施例1と同様、撥水・
撥油性に対し高い耐候性、耐摺動性を備える、優れた低
反射ガラスであった。
Then, trimethylfluoroalkylsilane [CF 3 (CF 2 ) 7 (CH
2 ) 2 Si (CH 3 ) 3 ] was applied in the same manner as in Example 1 to perform water and oil repellency treatment. When the contact angle of the low reflection glass with water was measured in the same manner as in Example 1, it was found to be about 110 °.
It was an excellent low-reflection glass with high weather resistance and sliding resistance against oil repellency.

【0038】実施例3 実施例1と同様の方法で、第1層目がSiO2・TiO2系酸化
物薄膜であって 酸化物換算のSiO2とTiO2のモル比が約
52:48の混合酸化物薄膜となるようにし、第2層目がTi
O2の酸化物薄膜、および最上層の第3層目がSiO2の酸化
物薄膜を、清浄なガラス基板の一方の片面をマスキング
テープで被覆し、他方の片面のみに3層薄膜積層膜とし
て成膜した。
Example 3 In the same manner as in Example 1, the first layer was a SiO 2 TiO 2 type oxide thin film, and the molar ratio of SiO 2 to TiO 2 in terms of oxide was about.
52:48 mixed oxide thin film, the second layer is Ti
O 2 oxide thin film, and the third uppermost layer of SiO 2 oxide thin film are coated on one side of a clean glass substrate with a masking tape, and the other side is formed as a three-layer thin film laminated film. A film was formed.

【0039】さらに、該3層薄膜積層ガラス基板を、実
施例1と同様に、約620 ℃で約10分間加熱処理した後、
撥水・撥油処理を行った。該片面のみに形成した3層薄
膜積層ガラス基板の積層薄膜は、第1層目が屈折率n1=
約1.85、膜厚d1= 約90nm、第2層目が屈折率n2= 約2.2
0、膜厚d2= 約160nm 、第3層目が屈折率n3= 約1.45、
膜厚d3= 約120nm であり、膜面側への入射角60°の斜入
射光に対する可視光反射率が約9.8 %であり、未処理の
膜がない場合に比し、反射率が約4.8 %低減するもので
あった。
Further, the three-layer thin film laminated glass substrate was heat-treated at about 620 ° C. for about 10 minutes in the same manner as in Example 1, and then,
Water and oil repellent treatment was applied. In the laminated thin film of the three-layer thin film laminated glass substrate formed only on one side, the first layer has a refractive index n 1 =
About 1.85, film thickness d 1 = about 90 nm, second layer has refractive index n 2 = about 2.2
0, film thickness d 2 = about 160 nm, the third layer has a refractive index n 3 = about 1.45,
The film thickness d 3 = about 120 nm, the visible light reflectance for oblique incident light with an incident angle of 60 ° on the film surface side is about 9.8%, which is about the same as when there is no untreated film. It was a 4.8% reduction.

【0040】またさらに、上記低反射ガラスは、実施例
1と同様、高い撥水・撥油性を呈しており、手垢などの
汚れが付着しにくく、また付着した際も、アルコールを
用いて簡単に払拭することができ、該撥水・撥油性に対
しても高い耐候性、耐摺動性を有する、優れた低反射ガ
ラスであった。
Further, the low reflection glass exhibits high water and oil repellency as in the case of Example 1, so that dirt such as hand grime hardly adheres, and when adhered, alcohol can be used easily. It was an excellent low reflection glass that can be wiped off and has high weather resistance and sliding resistance with respect to the water and oil repellency.

【0041】実施例4 清浄なガラス基板の一方の片面に、第1層目として、酸
化物換算でモル比がSiO2とTiO2が約45:55 となるように
SiとTiの金属アルコキシドを混合し、溶質濃度が約0.5m
ol/l となるようイソプロピルアルコールで希釈してア
ルコキシド溶液を調製し、該溶液を用い、実施例1と同
様な操作を行い、SiO2・TiO2系酸化物薄膜を形成した。
Example 4 On one surface of a clean glass substrate, as a first layer, the molar ratio of SiO 2 and TiO 2 in terms of oxide was about 45:55.
Mixing metal alkoxide of Si and Ti, solute concentration is about 0.5m
An alkoxide solution was prepared by diluting it with isopropyl alcohol so as to be ol / l, and using this solution, the same operation as in Example 1 was performed to form a SiO 2 TiO 2 based oxide thin film.

【0042】さらに、その上に、実施例1において最上
層のSiO2薄膜に用いた混合シリカゾルを用い、SiO2薄膜
を形成した。さらにまた、該2層薄膜積層ガラス基板
を、実施例3と同様に、約620 ℃で約10分間加熱処理を
行った後、実施例1と同様の撥水・撥油処理を行った。
Furthermore, a SiO 2 thin film was formed thereon by using the mixed silica sol used for the uppermost SiO 2 thin film in Example 1. Further, the two-layer thin film laminated glass substrate was heat-treated at about 620 ° C. for about 10 minutes as in Example 3, and then subjected to the same water / oil repellency treatment as in Example 1.

【0043】該片面のみに形成した2層薄膜積層ガラス
基板の積層薄膜は、第1層目が屈折率n1= 約1.87、膜厚
d1= 約78nm、第2層目が屈折率n2= 約1.45、膜厚d2= 約
120nm であり、得られた2層薄膜積層ガラス基板は、入
射角65°の斜入射光に対する可視光反射率が約9.9 %で
あり、膜がない場合には反射率が約15.3%であるのに対
し、斜入射光線に対する反射率が約5.4 %程度低減でき
る、優れた低反射ガラスであった。
In the laminated thin film of the two-layer thin film laminated glass substrate formed only on one side, the first layer has a refractive index n 1 = about 1.87 and a film thickness.
d 1 = about 78 nm, second layer has refractive index n 2 = about 1.45, film thickness d 2 = about
The obtained double-layer thin film laminated glass substrate has a visible light reflectance of about 9.9% for obliquely incident light with an incident angle of 65 °, and the reflectance is about 15.3% without a film. On the other hand, it was an excellent low-reflection glass that can reduce the reflectance for obliquely incident light rays by about 5.4%.

【0044】[0044]

【発明の効果】以上前述したように、本発明の低反射ガ
ラスによれば、手軽に容易な膜形成手段でもって低反射
性能と撥水・撥油性および耐汚れ性を有する被膜を安価
に効率よく得られ、該被膜において特異な形状を有する
頑固な特定した凹凸もしくは細孔状表面層を有する特定
酸化物薄膜を得て最上層膜とし、該最上層膜上に特定の
撥水性酸化物薄膜を含浸被覆塗布したことにより、格段
にその性能を発揮して、光学特性を損なうことなく、撥
水撥油性、耐汚れ性、密着性、耐擦傷性ならびに耐候性
等に優れ、長期に亘りその性能を保持し、水分や汚れが
付着したとしても簡単な払拭で充分対処できるものとな
る等、建築用もしくは自動車用窓材をはじめ、各種ガラ
ス物品、ことに自動車等の窓材において好適に採用でき
る。
As described above, according to the low reflection glass of the present invention, a film having low reflection performance, water repellency, oil repellency and stain resistance can be produced at low cost and with a simple and easy film forming means. A specific oxide thin film that is well obtained and has a stubbornly specified unevenness or pore-like surface layer having a unique shape in the film is obtained as the uppermost layer film, and the specific water-repellent oxide thin film is formed on the uppermost layer film. By applying the impregnated coating, it exerts its performance remarkably, does not impair the optical characteristics, is excellent in water and oil repellency, stain resistance, adhesion, scratch resistance, weather resistance, etc. Suitable for use in architectural or automotive window materials, various glass articles, especially automotive window materials, as it retains its performance and can be easily wiped off even if moisture or dirt adheres. it can.

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 ガラス基板表面に屈折率の異なる酸化物
薄膜を積層してなる低反射ガラスにおいて、空気側の最
上層が、表面に数10〜数100nm の微小な凹凸もしくは径
が数10〜数100nm の細孔を有し、かつ屈折率が1.40〜1.
60、膜厚が70〜130nm の範囲に制御したSiO2もしくはSi
O2と他の酸化物との混合酸化物であり、さらに該最上層
の表面にポリフルオロアルキル基を含有するシラン化合
物を被膜してなることを特徴とする低反射ガラス。
1. A low reflection glass comprising a glass substrate and a thin oxide film having a different refractive index laminated on the surface of the glass substrate. The uppermost layer on the air side has tens to hundreds of nanometers of minute unevenness or a diameter of tens to ten. It has pores with a diameter of several 100 nm and a refractive index of 1.40 to 1.
60, SiO 2 or Si with film thickness controlled in the range of 70 to 130 nm
A low reflection glass, which is a mixed oxide of O 2 and another oxide, and further has a surface of the uppermost layer coated with a silane compound containing a polyfluoroalkyl group.
【請求項2】 前記低反射ガラスが、前記ガラス基板の
両面に形成してなる前記積層膜であって、膜面側への入
射光に対する可視光反射率を1%以下に低減せしめるこ
とを特徴とする請求項1記載の低反射ガラス。
2. The low reflection glass is the laminated film formed on both surfaces of the glass substrate, and reduces the visible light reflectance with respect to incident light on the film surface side to 1% or less. The low reflection glass according to claim 1.
【請求項3】 前記低反射ガラスが、前記ガラス基板の
片側表面のみに形成してなる前記積層膜であって、膜面
側への入射光に対する可視光反射率を3〜5%にせしめ
ることを特徴とする請求項1記載の低反射ガラス。
3. The low-reflection glass is the laminated film formed on only one surface of the glass substrate, and the visible light reflectance for incident light on the film surface side is 3 to 5%. The low reflection glass according to claim 1, characterized in that:
【請求項4】 前記低反射ガラスが、前記ガラス基板の
片側表面のみに形成してなる前記積層膜であって、膜面
側への40〜80°の入射光に対する可視光反射率を4〜6
%低減せしめることを特徴とする請求項1記載の低反射
ガラス。
4. The low reflection glass is the laminated film formed on only one surface of the glass substrate, and has a visible light reflectance of 4 to 40 with respect to incident light of 40 to 80 ° on the film surface side. 6
%. The low reflection glass according to claim 1, wherein the low reflection glass is reduced.
【請求項5】 前記空気側の最上層の酸化物薄膜が、少
なくとも金属アルコキシドを出発原料とするゾルゲル法
で形成することを特徴とする請求項1乃至4記載の低反
射ガラス。
5. The low reflection glass according to claim 1, wherein the oxide thin film of the uppermost layer on the air side is formed by a sol-gel method using at least a metal alkoxide as a starting material.
【請求項6】 前記空気側の最上層の酸化物薄膜が、40
0 °C 以上の処理温度で行い、その後該酸化物薄膜表面
にポリフルオロアルキル基を含有するシラン化合物を塗
布してなることを特徴とする請求項1乃至5記載の低反
射ガラス。
6. The uppermost oxide thin film on the air side is 40
6. The low reflection glass according to claim 1, wherein the treatment is performed at a treatment temperature of 0 ° C. or higher, and then the surface of the oxide thin film is coated with a silane compound containing a polyfluoroalkyl group.
【請求項7】 前記SiO2と混合する酸化物が、TiO2、Zr
O2、Al2O3 、B2O3、SnO2、In2O3 、Ta2O3 のいずれかも
しくはそれらの混合物であることを特徴とする請求項1
乃至6記載の低反射ガラス。
7. The oxide mixed with SiO 2 is TiO 2 , Zr
2. Any one of O 2 , Al 2 O 3 , B 2 O 3 , SnO 2 , In 2 O 3 and Ta 2 O 3 or a mixture thereof.
The low reflection glass according to any one of 1 to 6.
JP4140796A 1992-06-01 1992-06-01 Low reflection glass Expired - Fee Related JP2716315B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4140796A JP2716315B2 (en) 1992-06-01 1992-06-01 Low reflection glass

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4140796A JP2716315B2 (en) 1992-06-01 1992-06-01 Low reflection glass

Publications (2)

Publication Number Publication Date
JPH05330856A true JPH05330856A (en) 1993-12-14
JP2716315B2 JP2716315B2 (en) 1998-02-18

Family

ID=15276947

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2716315B2 (en)

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JP2006106195A (en) * 2004-10-01 2006-04-20 Nippon Electric Glass Co Ltd Display substrate
JP2008247739A (en) * 1996-05-14 2008-10-16 Saint-Gobain Glass France Glazing having antireflection coating
JP2009084143A (en) * 1995-02-23 2009-04-23 Saint-Gobain Glass France Transparent substrate with antireflection coating
JP2010037115A (en) * 2008-07-31 2010-02-18 Seiko Epson Corp Light-transmitting member, timepiece and method for producing the light-transmitting member
JP2011510904A (en) * 2008-02-05 2011-04-07 コーニング インコーポレイテッド Damage-resistant glass articles for use as cover plates for electronic devices
JP2012018409A (en) * 2011-08-24 2012-01-26 Nippon Electric Glass Co Ltd Display substrate
WO2012163946A1 (en) * 2011-05-31 2012-12-06 Schott Ag Substrate element for coating with an easy-to-clean coating
WO2012163947A1 (en) * 2011-05-31 2012-12-06 Schott Ag Substrate element for coating with an easy-to-clean coating
JP2013224964A (en) * 2013-07-23 2013-10-31 Seiko Epson Corp Timepiece cover glass and timepiece
US8789944B2 (en) 2010-08-02 2014-07-29 Hoya Lens Manufacturing Philippines Inc. Optical article and optical article production method
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JPS57124301A (en) * 1981-01-27 1982-08-03 Asahi Glass Co Ltd Highly durable multilayered film containing silicon oxide film
JPS58172243A (en) * 1982-04-02 1983-10-11 Asahi Glass Co Ltd Treating agent for glass surface
JPS615667A (en) * 1984-06-20 1986-01-11 Nec Corp Device receiving and displaying busy information
JPS63162549A (en) * 1986-12-26 1988-07-06 Central Glass Co Ltd Glass having optical thin film formed thereon
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JP2008247739A (en) * 1996-05-14 2008-10-16 Saint-Gobain Glass France Glazing having antireflection coating
JP2006106195A (en) * 2004-10-01 2006-04-20 Nippon Electric Glass Co Ltd Display substrate
JP2011510904A (en) * 2008-02-05 2011-04-07 コーニング インコーポレイテッド Damage-resistant glass articles for use as cover plates for electronic devices
JP2010037115A (en) * 2008-07-31 2010-02-18 Seiko Epson Corp Light-transmitting member, timepiece and method for producing the light-transmitting member
US8789944B2 (en) 2010-08-02 2014-07-29 Hoya Lens Manufacturing Philippines Inc. Optical article and optical article production method
JP2014522433A (en) * 2011-05-31 2014-09-04 ショット アクチエンゲゼルシャフト Substrate elements for coating with easy clean coating
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KR20140036250A (en) * 2011-05-31 2014-03-25 쇼오트 아게 Substrate element for coating with an easy-to-clean coating
WO2012163946A1 (en) * 2011-05-31 2012-12-06 Schott Ag Substrate element for coating with an easy-to-clean coating
JP2014522329A (en) * 2011-05-31 2014-09-04 ショット アクチエンゲゼルシャフト Substrate elements for coating with easy clean coating
JP2016183099A (en) * 2011-05-31 2016-10-20 ショット アクチエンゲゼルシャフトSchott AG Substrate element for coating with an easy-to-clean coating
JP2017074797A (en) * 2011-05-31 2017-04-20 ショット アクチエンゲゼルシャフトSchott AG Substrate element for coating with easy-to-clean coating
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