JPH05293733A - Vacuum chuck device - Google Patents
Vacuum chuck deviceInfo
- Publication number
- JPH05293733A JPH05293733A JP10332392A JP10332392A JPH05293733A JP H05293733 A JPH05293733 A JP H05293733A JP 10332392 A JP10332392 A JP 10332392A JP 10332392 A JP10332392 A JP 10332392A JP H05293733 A JPH05293733 A JP H05293733A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum chuck
- vacuum
- workpiece
- structural member
- chuck device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、被加工物等の物体を保
持する真空チヤック装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum chuck device for holding an object such as a work piece.
【０００２】[0002]
【従来の技術】従来、ウレタン樹脂に同心円状の溝付き
真空チヤック部を設け、この真空チヤック部に磁気ディ
スク基板を保持し、この基板の切削加工を行う、真空チ
ヤック装置がある。この真空チヤック部に用いられるウ
レタン樹脂は、切削油として使用される白灯油等により
膨潤する性質があり、それが被加工物の被加工面のうね
りや真直度等の形状寸法精度の劣化の原因となるため問
題となっている。2. Description of the Related Art Conventionally, there is a vacuum chuck device in which a urethane resin is provided with a vacuum chuck portion having concentric grooves, a magnetic disk substrate is held in the vacuum chuck portion, and the substrate is cut. The urethane resin used for this vacuum chuck part has the property of swelling with white kerosene used as cutting oil, which causes deterioration of shape and dimension accuracy such as waviness and straightness of the work surface of the work piece. Therefore, it is a problem.
【０００３】また、ウレタン樹脂は、ヤング率が小さく
切削加工時に真空圧力の変動に対して実切り込み量に誤
差を生じ、形状寸法精度に影響する。それから、溝によ
る吸着は、支持剛性の不均一につながり、被加工物の被
加工面のうねりの原因となるため問題となっている。Further, the urethane resin has a small Young's modulus and causes an error in the actual cutting amount with respect to the fluctuation of the vacuum pressure during cutting, which affects the accuracy of the shape and dimension. Then, the suction by the groove leads to non-uniformity of support rigidity and causes undulation of the surface to be processed of the workpiece, which is a problem.
【０００４】そのために２．５インチ、１．８インチ等
の小径のディスク直径で約０．９ｍｍの薄肉の磁気ディ
スク基板の市場が５．２５インチ、３．５インチ磁気デ
ィスク基板の市場より拡大が予想される昨今では、この
吸着溝による被加工物の被加工面の表面構造（表面粗
さ、うねり、寸法精度）、表面性状（加工歪層、クラッ
ク層等）の劣化の原因を無視できない。For this reason, the market of thin magnetic disk substrates having a small disk diameter of 2.5 inches, 1.8 inches, etc., of about 0.9 mm has expanded from the market of 5.25 inch and 3.5 inch magnetic disk substrates. In recent years, it is not possible to ignore the cause of deterioration of the surface structure (surface roughness, waviness, dimensional accuracy) and surface properties (working strain layer, crack layer, etc.) of the work surface of the work piece due to this suction groove. ..
【０００５】また、支持剛性を均一化するためには、ナ
イロン樹脂の多孔質真空チヤックがあるが、切削加工時
に真空減圧により真空チヤックの変形量が大きくなり、
被加工物の形状寸法精度の劣化の原因となるため問題と
なっている。Further, in order to make the supporting rigidity uniform, there is a porous vacuum chuck made of nylon resin, but the amount of deformation of the vacuum chuck becomes large due to vacuum pressure reduction during cutting.
This is a problem because it causes deterioration of the shape and dimension accuracy of the workpiece.
【０００６】[0006]
【発明が解決しようとする課題】本発明は、このような
従来の問題点を解消するためになされたものであって、
被加工物等の物体の表面構造、表面性状を均一かつ良好
に加工をすることのできる物体を保持する真空チヤック
装置を提供することを課題とする。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned conventional problems.
It is an object of the present invention to provide a vacuum chuck device for holding an object such as a work piece, which can uniformly and satisfactorily process the surface structure and surface properties of the object.
【０００７】[0007]
【課題を解決するための手段】本発明は、被加工物等の
物体を真空チヤック部にて保持する真空チヤック装置に
おいて、前記真空チヤック部の表面又はその近傍に、合
成ゴム又は合成樹脂から成る構造部材を設け、前記物体
を前記真空チヤック部上に保持した場合に、前記物体と
前記構造部材との対接面を密着させることにより、前記
真空チヤック部を密閉するように構成したことを特徴と
する。DISCLOSURE OF THE INVENTION The present invention is a vacuum chuck device for holding an object such as a work piece in a vacuum chuck portion. The vacuum chuck portion is made of synthetic rubber or synthetic resin on or near the surface thereof. When the structural member is provided and the object is held on the vacuum chuck portion, the vacuum chuck portion is configured to be sealed by closely contacting the contact surface between the object and the structural member. And
【０００８】及び、前記真空チヤック装置において、前
記真空チヤック部を回動自在に支持するように成し、前
記真空チヤック部の回転位相周波数を電気的或いは光学
的に検出する真空チヤック回転位相周波数検出器を設け
たことを特徴とする。及び、前記真空チヤック装置にお
いて、真空圧力スタビライザーを設けたことを特徴とす
る。Further, in the vacuum chuck device, the vacuum chuck rotational phase frequency is detected so as to rotatably support the vacuum chuck section and electrically or optically detect the rotational phase frequency of the vacuum chuck section. It is characterized by the provision of a container. Also, in the above-mentioned vacuum chuck device, a vacuum pressure stabilizer is provided.
【０００９】[0009]
【作用】本発明は、このように構造部材を設け、この構
造部材と被加工部等の物体との対接面で、真空チヤック
部を外気から密閉するように構成したので、切削加工時
の切削油の影響や、超微粒子噴射加工時の超微粒子の影
響で、真空チヤック部の性能を劣化させることがない。
加えて、切削油等の影響で真空チヤック部の材料の膨潤
が生じないため、その材料の選択に自由度が出る。According to the present invention, the structural member is provided in this manner, and the vacuum chuck portion is sealed from the outside air at the contact surface between the structural member and an object such as the processed portion. The performance of the vacuum chuck does not deteriorate due to the influence of cutting oil and the influence of ultrafine particles during ultrafine particle injection processing.
In addition, since the material of the vacuum chuck portion does not swell due to the influence of cutting oil or the like, the degree of freedom in selecting the material is increased.
【００１０】[0010]
【実施例】以下、本発明の真空チヤック装置の一実施例
を図面を参照して説明する。図１は、本発明の真空チヤ
ック装置を示す平面図であって、図２は、図１のＸＯＸ
線上における正面断面図である。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the vacuum chuck device of the present invention will be described below with reference to the drawings. 1 is a plan view showing a vacuum chuck device of the present invention, and FIG. 2 is a view showing the XOX of FIG.
It is a front sectional view on a line.
【００１１】図１及び図２において、本発明の真空チヤ
ック装置は、被加工物１を保持する真空チヤック部２
と、真空チヤック部２を密閉する構造部材３と、真空吸
引装置４及びこれらを回転駆動する回転駆動装置５とか
ら成る。被加工物１はアルミニウム材料を用いた２．５
インチ磁気ディスク基板、Ａｌ2 Ｏ3 ・ＴｉＣ材料を用
いた磁気ヘッドスライダ基板又は光磁気ヘッドスライダ
基板等のエレクトロメカニックス、オプトメカトロニッ
クス及びマイクロマシン等の微細加工部品である。Referring to FIGS. 1 and 2, the vacuum chuck device of the present invention includes a vacuum chuck portion 2 for holding a workpiece 1.
A structural member 3 for sealing the vacuum chuck portion 2, a vacuum suction device 4 and a rotary drive device 5 for rotationally driving these. Workpiece 1 is made of aluminum material 2.5
Inch magnetic disk substrates, magnetic head slider substrates using Al 2 O 3 .TiC materials, magneto-optical head slider substrates, and other electromechanics, optomechatronics, and micromachined parts.
【００１２】なお、被加工物１は、被加工物に限定され
ず、被測定物、被搬送物等の物体にも用いることがで
き、これらの態様に限られるものでない。それから真空
チヤック部２は、６５ｍｍ程度の直径の円板形状をして
おり、その材料としては、多孔質体を用い、例えばセラ
ミックス焼結体、焼結金属、プラスチック多孔質体等が
あるが、被加工物１への押し傷等のダメージを与えない
ことから、プラスチック多孔質体が望ましく、ここでは
ナイロン、ウレタン、弗素樹脂等を用いた。The object 1 to be processed is not limited to the object to be processed, but can be used for objects such as an object to be measured and an object to be conveyed, and is not limited to these modes. Then, the vacuum chuck portion 2 has a disk shape with a diameter of about 65 mm, and the material thereof is a porous body, such as a ceramics sintered body, a sintered metal, or a plastic porous body. A plastic porous body is preferable because it does not damage the work piece 1 such as a scratch, and nylon, urethane, fluororesin, or the like is used here.
【００１３】次に、構造部材３は、フランジ部３ａを有
するリング形状をなしており、材料としては、シリコー
ン、ウレタン等の合成ゴム、合成樹脂を用いた。そし
て、真空吸着装置４は、真空チヤック固着部６と真空チ
ヤック回転部６ａとから構成され、これらを同一なる軸
線７上で嵌合せることにより一体化されている。これら
の材料としては、Ａｌ2 Ｏ3 、ＳｉＣ等のセラミックス
材料、ステンレス鋼等の金属材料を用いた。Next, the structural member 3 has a ring shape having a flange portion 3a, and the material used is synthetic rubber such as silicone or urethane, or synthetic resin. The vacuum suction device 4 is composed of a vacuum chuck fixing portion 6 and a vacuum chuck rotating portion 6a, which are integrated by fitting them on the same axis line 7. As these materials, ceramic materials such as Al 2 O 3 and SiC, and metal materials such as stainless steel were used.
【００１４】この真空チヤック固着部６の真空チヤック
部２側には、真空吸引室８が設けられ、また、真空チヤ
ック回転部６ａの内部には、真空圧力スタビライザー９
と真空吸引管１０とが設けられている。そこで、真空吸
引室８は、複数列の同心円状の溝１１と、これらの溝１
１に放射状に交叉する複数の溝１２から成る。同心円状
の溝１１の深さを２０ｍｍ程度、溝幅４ｍｍ程度、溝ピ
ッチ８ｍｍ程度とした。また放射状の溝１２も同様の深
さ、溝幅とした。A vacuum suction chamber 8 is provided on the vacuum chuck portion 2 side of the vacuum chuck fixing portion 6, and a vacuum pressure stabilizer 9 is provided inside the vacuum chuck rotating portion 6a.
And a vacuum suction tube 10 are provided. Therefore, the vacuum suction chamber 8 includes a plurality of rows of concentric grooves 11 and the grooves 1
1 has a plurality of grooves 12 which intersect each other radially. The concentric grooves 11 had a depth of about 20 mm, a groove width of about 4 mm, and a groove pitch of about 8 mm. Further, the radial grooves 12 have the same depth and groove width.
【００１５】それから真空圧力スタビライザー９は、中
空円筒状の密閉構造を成しており、直径６５ｍｍ程度、
長さ寸法４０ｍｍ程度であるが、このスタビライザー９
の容積は、被加工物１の形状寸法に適したように決定す
ることが望ましい。また、真空吸引室８（同心円状の溝
１１と放射状の溝12) と真空圧力スタビライザー９と
は、複数の通気穴１３でつながっており、通気穴１３
は、同心円状の溝１１上に等間隔で配設されている。ま
た、真空圧力スタビライザー９の下部には、真空吸引管
１０が軸線７上に配設されている。The vacuum pressure stabilizer 9 has a hollow cylindrical hermetically sealed structure, and has a diameter of about 65 mm.
This stabilizer 9 has a length of about 40 mm.
It is desirable to determine the volume of the so as to be suitable for the shape and size of the workpiece 1. The vacuum suction chamber 8 (concentric circular groove 11 and radial groove 12) and the vacuum pressure stabilizer 9 are connected by a plurality of ventilation holes 13.
Are arranged at equal intervals on the concentric grooves 11. A vacuum suction tube 10 is arranged on the axis 7 below the vacuum pressure stabilizer 9.
【００１６】次に、回転駆動装置５は、その真空チヤッ
ク回転部６ａを軸受１４により回動自在に軸支してい
る。そして、軸受１４は、軸受ハウジング１５の両端部
にその外輪が固定され、これらの軸受１４の予圧を最適
に掛けるために，これらの軸受１４間に、内輪間隔筒１
６と外輪間隔筒１７が設けられている。Next, the rotary drive device 5 has its vacuum chuck rotating portion 6a rotatably supported by a bearing 14. The outer ring of the bearing 14 is fixed to both ends of the bearing housing 15. In order to optimally apply a preload to these bearings 14, the inner ring spacing cylinder 1 is provided between these bearings 14.
6 and an outer ring spacing cylinder 17 are provided.
【００１７】また、真空チヤック回転部６ａの下部に
は、真空チヤック装置の回転位相周波数検出器１８が設
けられ、これは多磁極に着磁されたマグネットロータ１
８ａと磁気抵抗効果素子（ＭＲ素子）１８ｂが一対を成
して配されたものである。そして、マグネットロータ１
８ａは、真空チヤック回転部６ａの下部周面に、ねじ１
９により締結されている。また、磁気抵抗効果素子１８
ｂは、軸受ハウジング１５の下部周面に、ねじ２０によ
り締結されている。そして、軸受ハウジング１５のフラ
ンジ部を基台２１に締結する。Further, a rotary phase frequency detector 18 of a vacuum chuck device is provided below the vacuum chuck rotating portion 6a, which is a magnet rotor 1 magnetized with multiple magnetic poles.
8a and a magnetoresistive effect element (MR element) 18b are arranged in a pair. And the magnet rotor 1
8a is a screw 1 on the lower peripheral surface of the vacuum chuck rotating part 6a
It is concluded by 9. In addition, the magnetoresistive effect element 18
b is fastened to the lower peripheral surface of the bearing housing 15 with a screw 20. Then, the flange portion of the bearing housing 15 is fastened to the base 21.
【００１８】図面には詳細に示さなかったが、基台２１
はＸ、Ｙ、Ｚ軸に移動自在であり、また、回動傾斜もで
きる。また、ここでは図示していないが、真空チヤック
回転部６ａの真空吸引管下部１０ａには、流体カップリ
ングが接続され、これを介して真空吸引管１０は真空ポ
ンプに配設される。Although not shown in detail in the drawings, the base 21
Is movable in X, Y, and Z axes, and can also be tilted by turning. Further, although not shown here, a fluid coupling is connected to the lower portion of the vacuum suction pipe 10a of the vacuum chuck rotating portion 6a, and the vacuum suction pipe 10 is arranged in a vacuum pump via this.
【００１９】次に動作を説明する。被加工物１を構造部
材３の表面に摺接させながら真空チヤック部２上に載置
する。ここでは被加工物１と真空チヤック部２と構造部
材３とは同一なる軸線７になるように配設されている。
そして、被加工物１と構造部材３との対接面３ｂは、構
造部材３の弾性力により完全に密着させることができる
ので、これらに包囲された真空チヤック部２は、外気か
ら完全に密閉させることができる。Next, the operation will be described. The work piece 1 is placed on the vacuum chuck portion 2 while being in sliding contact with the surface of the structural member 3. Here, the workpiece 1, the vacuum chuck portion 2, and the structural member 3 are arranged so as to have the same axis 7.
Since the contact surface 3b between the workpiece 1 and the structural member 3 can be completely brought into close contact with the elastic force of the structural member 3, the vacuum chuck portion 2 surrounded by these is completely sealed from the outside air. Can be made
【００２０】次に、真空ポンプ（図示せず）を作動させ
ると、真空チヤック部２上に載置された被加工物１は、
真空チヤック部２に真空吸引され、瞬時に吸引保持され
る。即ち、前述のように真空チヤック部２は、外気から
密閉された状態になっているので、真空チヤック装置の
内部真空度は、所要の真空圧にすぐ達することができ
る。Next, when a vacuum pump (not shown) is operated, the work piece 1 placed on the vacuum chuck section 2 is
Vacuum suction is performed by the vacuum chuck portion 2, and suction suction is instantly held. That is, as described above, the vacuum chuck portion 2 is in a state of being sealed from the outside air, so that the internal vacuum degree of the vacuum chuck device can immediately reach the required vacuum pressure.
【００２１】次に、真空チヤック回転部６ａの真空吸引
管下部１０ａに接続された流体カップリング（図示せ
ず）を回転駆動させることにより、真空チヤック部２に
吸着保持された被加工物１は、所要の回転数で回転す
る。この場合、回転位相周波数検出器１８により、被加
工物１を吸引保持した真空チヤック２の回転位相周波数
を検出し、その検出出力を演算・表示する。Next, by rotating and driving a fluid coupling (not shown) connected to the lower portion of the vacuum suction pipe 10a of the vacuum chuck rotating portion 6a, the workpiece 1 sucked and held by the vacuum chuck portion 2 is removed. , Rotate at the required number of rotations. In this case, the rotational phase frequency detector 18 detects the rotational phase frequency of the vacuum chuck 2 that holds the workpiece 1 by suction, and the detected output is calculated and displayed.
【００２２】ここで、回転位相周波数検出器１８は、磁
気抵抗効果素子１８ｂを、真空チヤック回転部６ａに設
けたマグネットロータ１８ａの外周面に近接させること
により、多磁極に着磁されたマグネットロータ１８ａ上
の磁気の変化を磁気抵抗効果素子１８ｂの磁気抵抗膜の
抵抗変化に置き換え、これを電流の変化として取り出す
ことのできる検出器である。Here, the rotational phase frequency detector 18 is arranged such that the magnetoresistive effect element 18b is brought close to the outer peripheral surface of the magnet rotor 18a provided in the vacuum chuck rotating section 6a, so that the magnet rotor is magnetized into multiple magnetic poles. The detector is capable of replacing the change in magnetism on 18a with the change in resistance of the magnetoresistive film of the magnetoresistive effect element 18b and extracting this as a change in current.
【００２３】このようにして、例えば被加工物１の被加
工面に粒径１μｍ程度のＡｌ2 Ｏ3、ＳｉＣ、Ｓｉ
Ｏ2 、Ｃｒ2 Ｏ3 、Ｆｅ2 Ｏ3 等の超微粒子を高速噴射
させ、被加工面に鏡面加工を施すことができる。この場
合、超微粒子を高速噴射させる２相流の搬送流体として
は、空気、ドライ窒素等の気体でも、水、純水等の液体
でも用いることができる。In this way, for example, Al 2 O 3 , SiC, Si having a grain size of about 1 μm is formed on the surface of the workpiece 1 to be processed.
Ultrafine particles such as O 2 , Cr 2 O 3 and Fe 2 O 3 can be jetted at high speed to perform mirror finishing on the surface to be processed. In this case, a gas such as air or dry nitrogen, or a liquid such as water or pure water can be used as the two-phase flow carrier fluid for jetting ultrafine particles at high speed.
【００２４】即ち、真空チヤック部２の表面又はその近
傍に合成ゴム又は合成樹脂から成る弾性力を有する構造
部材３を設け、被加工物１を真空チヤック部２上に吸着
保持した場合に、前記被加工物１と前記構造部材３との
対接面３ｂが完全に密着し、真空チヤック部２は、密封
されるために、加工時の微粒子、空気、液体が真空チヤ
ック部２に付着することは皆無である。That is, when the structural member 3 made of synthetic rubber or synthetic resin and having an elastic force is provided on or near the surface of the vacuum chuck portion 2 and the workpiece 1 is sucked and held on the vacuum chuck portion 2, Since the contact surface 3b between the workpiece 1 and the structural member 3 is completely adhered and the vacuum chuck portion 2 is hermetically sealed, fine particles, air, and liquid during processing adhere to the vacuum chuck portion 2. Is none.
【００２５】また、真空チヤック部２は、外気から密閉
されるため、真空ポンプを作動させた場合、真空チヤッ
ク部２の吸着効果を瞬時に高効率で得ることができる。
また、低真空圧の真空度であっても、吸着効果が高いの
で、被加工物１の表面構造、表面性状の良好な加工を施
すことができる。また、切削加工の場合にも、前記同様
に切削油の影響は皆無である。Further, since the vacuum chuck section 2 is sealed from the outside air, when the vacuum pump is operated, the suction effect of the vacuum chuck section 2 can be instantaneously obtained with high efficiency.
Further, even if the degree of vacuum is a low vacuum pressure, the adsorption effect is high, so that it is possible to perform processing with a good surface structure and surface properties of the workpiece 1. Also in the case of cutting, there is no influence of cutting oil as described above.
【００２６】また、被加工物１の回転位相周波数を検出
・表示することができ、また、加工条件に適合した回転
位相周波数制御を行うこともできる。それから、真空圧
力スタビライザー９を設けることにより、真空ポンプか
らの脈流による真空圧力の変動を除去することができ、
このために真空吸引装置４の吸引真空圧力は一様であ
る。Further, the rotational phase frequency of the workpiece 1 can be detected and displayed, and the rotational phase frequency control suitable for the processing conditions can be performed. Then, by providing the vacuum pressure stabilizer 9, it is possible to eliminate the fluctuation of the vacuum pressure due to the pulsating flow from the vacuum pump,
Therefore, the suction vacuum pressure of the vacuum suction device 4 is uniform.
【００２７】また、真空チヤック部２の材料として、プ
ラスチック多孔質体を用いたために、真空圧力スタビラ
イザー９で真空圧力変動を除去された一様な圧力は、真
空吸引装置４を介してプラスチック多孔質体の無数の多
孔穴から一様に被加工物１の被加工面を真空吸着保持
し、支持剛性を均一化することができる。Further, since the plastic porous body is used as the material of the vacuum chuck section 2, the uniform pressure from which the vacuum pressure fluctuation has been removed by the vacuum pressure stabilizer 9 is transmitted through the vacuum suction device 4 to the plastic porous body. The workpiece surface of the workpiece 1 can be uniformly vacuum-sucked and held through the innumerable perforated holes of the body, and the supporting rigidity can be made uniform.
【００２８】このため被加工物１の形状寸法精度の良好
なる微細加工を行うことが可能となる。また、真空チヤ
ック部２は、密閉されているために、長寿命化すること
ができる。For this reason, it becomes possible to perform fine processing with a good shape and dimension accuracy of the workpiece 1. Further, since the vacuum chuck portion 2 is hermetically sealed, the life can be extended.
【００２９】[0029]
【発明の効果】以上のように、本発明は、真空チヤック
部の表面又は近傍に、合成ゴム又は合成樹脂から成る構
造部材を設け、被加工物等の物体を真空チヤック部上に
保持した場合に、前記被加工物等の物体と前記構造部材
との対接面で前記真空チヤック部を外気から密閉するよ
うに構成したので、切削加工時の切削油の影響で真空チ
ヤック部の性能を劣化させることがなく、被加工物を良
好に保持することができ、被加工物の形状寸法精度の良
好な微細加工を行うことが可能となる。As described above, according to the present invention, when a structural member made of synthetic rubber or synthetic resin is provided on or near the surface of the vacuum chuck portion and an object such as a workpiece is held on the vacuum chuck portion. In addition, since the vacuum chuck portion is configured to be sealed from the outside air at the contact surface between the object such as the workpiece and the structural member, the performance of the vacuum chuck portion is deteriorated by the influence of cutting oil during cutting. It is possible to satisfactorily hold the object to be processed without performing it, and it becomes possible to perform fine processing with good shape dimension accuracy of the object to be processed.
【００３０】更に、超微粒子噴射加工時の超微粒子の影
響で真空チヤック部の性能を劣化させることがなく、真
空チヤック部の摩耗が生じないので、長寿命化が可能と
なる。また、切削油等の影響による真空チヤック部材料
の膨潤が生じないため、その素材にナイロン、ウレタ
ン、弗素樹脂等のプラスチック多孔質体を用いることが
可能となり、被加工物の被加工面に押し傷等のダメージ
を解消することができる。従って、真空チヤック装置と
しての吸着性能を大幅に向上することができる。Further, since the performance of the vacuum chuck portion is not deteriorated by the influence of the ultrafine particles during the ultrafine particle jetting process, and the vacuum chuck portion is not worn, the life can be extended. Also, since the vacuum chuck material does not swell due to the influence of cutting oil, it is possible to use a plastic porous body such as nylon, urethane, or fluororesin as the material, and press it against the work surface of the work piece. It is possible to eliminate damage such as scratches. Therefore, the suction performance of the vacuum chuck device can be significantly improved.
【図１】 本発明の真空チヤック装置を示す平面図であ
る。FIG. 1 is a plan view showing a vacuum chuck device of the present invention.
【図２】 図１のＸＯＸ線上における正面断面図であ
る。FIG. 2 is a front sectional view taken along line XOX in FIG.
１ 被加工物 ２ 真空チヤック部 ３ 構造部材 ３ａ フランジ部 ３ｂ 対接面 ４ 真空吸引装置 ５ 回転駆動装置 ６ 真空チヤック固着部 ６ａ 真空チヤック回転部 ７ 軸線 ８ 真空吸引室 ９ 真空圧力スタビライザー １０ 真空吸引管 １０ａ 真空吸引管下部 １１ 複数列の同心円状の溝 １２ 放射状に交叉する複数の溝 １３ 複数の通気穴 １４ 軸受 １５ 軸受ハウジング １６ 内輪間隔筒 １７ 外輪間隔筒 １８ 回転位相周波数検出器 １８ａ マグネットロータ １８ｂ 磁気抵抗効果素子（ＭＲ素子） １９、２０、２２ ねじ ２１ 基台 DESCRIPTION OF SYMBOLS 1 Workpiece 2 Vacuum chuck part 3 Structural member 3a Flange part 3b Contact surface 4 Vacuum suction device 5 Rotation drive device 6 Vacuum chuck fixing part 6a Vacuum chuck rotating part 7 Axis 8 Vacuum suction chamber 9 Vacuum pressure stabilizer 10 Vacuum suction pipe 10a Lower part of vacuum suction tube 11 Concentric grooves in plural rows 12 Plural grooves intersecting radially 13 Plural ventilation holes 14 Bearings 15 Bearing housing 16 Inner ring spacing tube 17 Outer ring spacing tube 18 Rotational phase frequency detector 18a Magnet rotor 18b Magnetic Resistance effect element (MR element) 19, 20, 22 Screw 21 Base
Claims (3)
保持する真空チヤック装置において、 前記真空チヤック部の表面又はその近傍に、合成ゴム又
は合成樹脂から成る構造部材を設け、前記物体を前記真
空チヤック部上に保持した場合に、前記物体と前記構造
部材との対接面を密着させることにより、前記真空チヤ
ック部を密閉するように構成したことを特徴とする真空
チヤック装置。1. A vacuum chuck device for holding an object such as a workpiece in a vacuum chuck section, wherein a structural member made of synthetic rubber or synthetic resin is provided on the surface of the vacuum chuck section or in the vicinity thereof, and the object is A vacuum chuck device, characterized in that, when the vacuum chuck part is held on the vacuum chuck part, the object and the structural member are brought into close contact with each other so as to seal the vacuum chuck part.
て、前記真空チヤック部を回動自在に支持するように成
し、前記真空チヤック部の回転位相周波数を電気的或い
は光学的に検出する真空チヤック回転位相周波数検出器
を設けたことを特徴とする真空チヤック装置。2. The vacuum chuck device according to claim 1, wherein the vacuum chuck portion is rotatably supported, and the rotation phase frequency of the vacuum chuck portion is detected electrically or optically. A vacuum chuck device having a rotary phase frequency detector.
て、真空圧力スタビライザーを設けたことを特徴とする
真空チヤック装置。3. The vacuum chuck device according to claim 1, further comprising a vacuum pressure stabilizer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10332392A JPH05293733A (en) | 1992-04-23 | 1992-04-23 | Vacuum chuck device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10332392A JPH05293733A (en) | 1992-04-23 | 1992-04-23 | Vacuum chuck device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05293733A true JPH05293733A (en) | 1993-11-09 |
Family
ID=14350987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10332392A Pending JPH05293733A (en) | 1992-04-23 | 1992-04-23 | Vacuum chuck device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05293733A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07156035A (en) * | 1993-11-17 | 1995-06-20 | Ckd Corp | Adsorbing plate of vacuum chuck and manufacture thereof |
| JP2003086667A (en) * | 2001-09-12 | 2003-03-20 | Takatori Corp | Cassette for thin wafer and suction band |
| US20090127102A1 (en) * | 2007-11-15 | 2009-05-21 | Korea Institute Of Science And Technology | Plasma deposition apparatus and method |
| CN102581634A (en) * | 2012-03-02 | 2012-07-18 | 昌河飞机工业（集团）有限责任公司 | Clamping position system of parts like thin-wall frame beam |
| KR20160072259A (en) | 2014-03-10 | 2016-06-22 | 가부시키가이샤 스크린 홀딩스 | Imaging device, imaging system, and incubator |
-
1992
- 1992-04-23 JP JP10332392A patent/JPH05293733A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07156035A (en) * | 1993-11-17 | 1995-06-20 | Ckd Corp | Adsorbing plate of vacuum chuck and manufacture thereof |
| JP2003086667A (en) * | 2001-09-12 | 2003-03-20 | Takatori Corp | Cassette for thin wafer and suction band |
| US20090127102A1 (en) * | 2007-11-15 | 2009-05-21 | Korea Institute Of Science And Technology | Plasma deposition apparatus and method |
| US8973526B2 (en) * | 2007-11-15 | 2015-03-10 | Korea Institute Of Science And Technology | Plasma deposition apparatus and method |
| CN102581634A (en) * | 2012-03-02 | 2012-07-18 | 昌河飞机工业（集团）有限责任公司 | Clamping position system of parts like thin-wall frame beam |
| KR20160072259A (en) | 2014-03-10 | 2016-06-22 | 가부시키가이샤 스크린 홀딩스 | Imaging device, imaging system, and incubator |
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