JPH05279281A - Production of intermediate for synthesis of @(3754/24)+)-grandisol - Google Patents

Production of intermediate for synthesis of @(3754/24)+)-grandisol

Info

Publication number
JPH05279281A
JPH05279281A JP4080002A JP8000292A JPH05279281A JP H05279281 A JPH05279281 A JP H05279281A JP 4080002 A JP4080002 A JP 4080002A JP 8000292 A JP8000292 A JP 8000292A JP H05279281 A JPH05279281 A JP H05279281A
Authority
JP
Japan
Prior art keywords
formula
compound represented
compound
group
above formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP4080002A
Other languages
Japanese (ja)
Inventor
Koji Okano
耕二 岡野
Takashi Ebata
隆 恵畑
Yukifumi Koseki
幸史 古関
Hiroshi Kawakami
浩 川上
Katsuya Matsumoto
克也 松本
Hajime Matsushita
肇 松下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Tobacco Inc
Original Assignee
Japan Tobacco Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Tobacco Inc filed Critical Japan Tobacco Inc
Priority to JP4080002A priority Critical patent/JPH05279281A/en
Publication of JPH05279281A publication Critical patent/JPH05279281A/en
Withdrawn legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/55Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

Landscapes

  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Agricultural Chemicals And Associated Chemicals (AREA)
  • Furan Compounds (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)

Abstract

PURPOSE:To readily produce the subject intermediate for synthesis of (+)-grandisol in a high yield by introducing a substituent group into 4 position of levoglucosenone and further modifying the side chain of the resultant alkylated four-membered ring. CONSTITUTION:A compound of the formula is reacted with an aromatic thiol, etc., in the presence of a base and an organothio group is introduced into 4 position thereof to obtain a compound of formula II (R1 is an alkyl or an aryl). A chlorination agent is reacted therewith so as to form a double bond between 3 and 4 positions and the organothio group is then substituted with methyl. Further, conjugate addition of a vinyl group is stereoselectively carried out at 4 position to obtain a compound of formula III. Carbonyl of the compound of formula III is reduced and, after protecting OH at 2 position, the double bond is hydroborated to give a compound of formula IV (R<2> is an OH-protecting group). After converting OH into an eliminable group and eliminating the OH-protecting group, OH is oxidized and treated with a base to obtain a compound of formula V. The resultant compound of formula V is subjected to Bayer-villiger reaction so as to give compound of formula VI and, after protection of OH, the resultant compound is methylated to provide a compound of formula VII (R<3> is an OH-protecting group). Removal of OH and deprotection of OH are carried out, thus producing the objective compound of formula VIII.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は(+)−グランディソ
ル合成用の中間体化合物を製造する方法に関する。
FIELD OF THE INVENTION The present invention relates to a method for producing an intermediate compound for the synthesis of (+)-grandisol.

【0002】[0002]

【従来の技術】ゾウムシの一種であるワタミゾウムシ
(学名Anthonomus Grandis Boheman)は広く北米に分布
するワタの害虫であり、綿花に対して大きな被害を与え
ている。こうした害虫の駆除に用いる農薬は環境に対す
る影響を十分に考慮したものである必要があり、フェロ
モンが用いられることが多くなっている。フェロモンは
極めて特異的に作用し、一般に極く微量でその効果が現
われる。しかしながらこれを入手しようとすると、天然
にはあまりに微量しか存在していないので、化学的に合
成することが必要となってくる。
2. Description of the Related Art Weevil Weevil (Anthonomus Grandis Boheman), which is a kind of weevils, is a cotton pest widely distributed in North America and causes great damage to cotton. The pesticides used for exterminating such pests need to take the environmental impact into consideration, and pheromones are often used. Pheromones act very specifically, and their effects generally appear in very small amounts. However, if it is to be obtained, it is necessary to chemically synthesize it because it exists in a very small amount in nature.

【0003】ところでワタミゾウムシの雄の出す性フェ
ロモンは数種の化合物の混合物であるが、その中で最も
重要な成分とされているのは(+)−グランディソルで
あって、下記の式〔18〕で表される構造を有する化合
物である。そのため(+)−グランディソルを農薬とし
て利用することを目的として、これまでにラセミ体、及
び光学活性体として数多くの合成法が報告されている。
By the way, the sex pheromone produced by male weevils is a mixture of several kinds of compounds, and the most important component among them is (+)-grandisol, which has the following formula [ 18] is a compound having a structure represented by Therefore, for the purpose of using (+)-grandisol as a pesticide, many synthetic methods have been reported so far as a racemate and an optically active substance.

【化18】 [Chemical 18]

【0004】光学活性体の合成例としては、光学分割を
併用する方法 (K.Mori, E. Nagano,Liebigs Ann. Chem.
1991, 341.) と不斉配位子を用いた触媒的不斉合成法
(K.Narasaka, H. Kusama, Y. Hayashi, Bull. Chem, S
oc. Jpn., 64, 1471(1991)) を挙げることができる。
前者の方法においては、オレフィンとジクロロケテンと
の反応により得たシクロブタン誘導体から数工程で誘導
した中間体を光学分割することにより光学活性体を得、
更に数工程でグランディソルへと導いている。後者で
は、キラルなチタン試薬を用いた[2+2]の環状付加
を鍵段階とし、多段階を経て目的化合物を得ている。
As a synthesis example of an optically active substance, a method using optical resolution in combination (K. Mori, E. Nagano, Liebigs Ann. Chem.
1991, 341.) and a chiral ligand (K. Narasaka, H. Kusama, Y. Hayashi, Bull. Chem, S.
oc. Jpn., 64, 1471 (1991)).
In the former method, an optically active substance is obtained by optically resolving an intermediate derived from a cyclobutane derivative obtained by the reaction of an olefin and dichloroketene in several steps,
He is leading to Grandisol in a few more steps. In the latter, [2 + 2] cycloaddition using a chiral titanium reagent is a key step, and the target compound is obtained through multiple steps.

【0005】[0005]

【発明が解決しようとする課題】しかしながら前者の合
成経路では、光学分割を行うことにより光学活性体を得
ているために原料の50% は無駄になってしまうという欠
点がある。後者の場合、特殊な不斉配位子を用い、不斉
収率は88% eeと高くなく、光学的に純粋な化合物を得る
には再結晶を繰り返さなければならないという不利があ
り、更に有利な合成方法が求められていた。
However, in the former synthetic route, 50% of the raw material is wasted because the optically active substance is obtained by performing optical resolution. In the latter case, a special asymmetric ligand is used, the asymmetric yield is not as high as 88% ee, and recrystallization must be repeated to obtain an optically pure compound. There has been a demand for various synthetic methods.

【0006】[0006]

【課題を解決するための手段】そこで本発明者らは、上
記目的を達成するため鋭意研究を重ねた結果、レボグル
コセノンを出発物質とし、分子内でのアルキル化により
四員環を形成し、文献既知のグランディソル合成中間体
を得ることに成功した(J. B. Jones, M. A. Finch, I.
J. Jakovac, Can. J. Chem., 60, 2007(1982))。
The inventors of the present invention have conducted extensive studies to achieve the above object. As a result, levoglucosenone is used as a starting material to form a four-membered ring by intramolecular alkylation, We succeeded in obtaining a known grandisol synthetic intermediate (JB Jones, MA Finch, I.
J. Jakovac, Can. J. Chem., 60, 2007 (1982)).

【0007】すなわち本発明の(+)−グランディソル
合成中間体の製造法は、式〔1〕で表わされるレボグル
コセノンの4位に有機チオールを付加させて式〔2〕
(式中、R1はアルキル、又はアリール基を表わす)で表
わされる化合物を得る工程(a)と、
That is, the process for producing the (+)-grandisol synthetic intermediate of the present invention is carried out by adding an organic thiol to the 4-position of levoglucosenone represented by the formula [1] to obtain the formula [2].
A step (a) for obtaining a compound represented by the formula: wherein R 1 represents an alkyl or aryl group;

【化19】 [Chemical 19]

【化20】 上記式〔2〕で表わされる化合物の3位と4位とにわた
る二重結合を形成して式〔3〕(式中、R1はアルキル、
又はアリール基を表わす)で表わされる化合物を得る工
程(b)と、
[Chemical 20] The compound represented by the above formula [2] forms a double bond at the 3rd and 4th positions to form the formula [3] (wherein R 1 is alkyl,
Or (representing an aryl group) to obtain a compound (b),

【化21】 上記式〔3〕で表わされる化合物の有機チオ基をメチル
基に置換して式〔4〕で表わされる化合物を得る工程
(c)と、
[Chemical 21] A step (c) of substituting an organic thio group of the compound represented by the above formula [3] with a methyl group to obtain a compound represented by the formula [4],

【化22】 上記式〔4〕で表わされる化合物の4位にビニル基を立
体選択的に共役付加させて式〔5〕で表わされる化合物
を得る工程(d)と、
[Chemical formula 22] A step (d) of stereoselectively conjugately adding a vinyl group to the 4-position of the compound represented by the above formula [4] to obtain a compound represented by the formula [5],

【化23】 上記式〔5〕で表わされる化合物のカルボニル基を還元
して式〔6〕で表わされる化合物を得る工程(e)と、
[Chemical formula 23] A step (e) of reducing the carbonyl group of the compound represented by the above formula [5] to obtain the compound represented by the formula [6],

【化24】 上記式〔6〕で表わされる化合物の2位の水酸基を保護
して式〔7〕(式中、R2は水酸基の保護基を表わす)で
表わされる化合物を得る工程(f)と、
[Chemical formula 24] A step (f) of protecting the 2- hydroxyl group of the compound represented by the above formula [6] to obtain a compound represented by the formula [7] (in the formula, R 2 represents a protective group for the hydroxyl group),

【化25】 上記式〔7〕で表わされる化合物の二重結合を水ホウ素
化して式〔8〕で表わされる化合物を得る工程(g)
と、
[Chemical 25] Step (g) of hydroborating the double bond of the compound represented by the above formula [7] to obtain the compound represented by the formula [8]
When,

【化26】 上記式〔8〕で表わされる化合物の水酸基を脱離基に変
換して式
[Chemical formula 26] By converting the hydroxyl group of the compound represented by the above formula [8] into a leaving group, the formula

〔9〕(式中、X は脱離基を表わす)で表わさ
れる化合物を得る工程(h)と、
[9] a step (h) of obtaining a compound represented by the formula (wherein X represents a leaving group),

【化27】 上記式[Chemical 27] The above formula

〔9〕で表わされる化合物の水酸基の脱保護を行
って式〔10〕(式中、X は脱離基を表わす)で表わさ
れる化合物を得る工程(i)と、
Deprotecting the hydroxyl group of the compound represented by [9] to obtain a compound represented by formula [10] (in the formula, X represents a leaving group);

【化28】 上記式〔10〕で表わされる化合物の水酸基を酸化して
式〔11〕(式中、X は脱離基を表わす)で表わされる
化合物を得る工程(j)と、
[Chemical 28] A step (j) of oxidizing the hydroxyl group of the compound represented by the above formula [10] to obtain a compound represented by the formula [11] (in the formula, X represents a leaving group);

【化29】 上記式〔11〕で表わされる化合物を塩基で処理して式
〔12〕で表わされる化合物を得る工程(k)と、
[Chemical 29] A step (k) of treating the compound represented by the above formula [11] with a base to obtain a compound represented by the formula [12],

【化30】 上記式〔12〕で表わされる化合物にバイヤービリガー
反応を行って式〔13〕で表わされる化合物を得る工程
(l)と、
[Chemical 30] A step (1) of performing a Bayer-Villiger reaction on the compound represented by the above formula [12] to obtain a compound represented by the formula [13];

【化31】 上記式〔13〕で表わされる化合物の水酸基を保護して
式〔14〕(式中、R3は水酸基の保護基を表わす)で表
わされる化合物を得る工程(m)と、
[Chemical 31] A step (m) of protecting the hydroxyl group of the compound represented by the above formula [13] to obtain a compound represented by the formula [14] (in the formula, R 3 represents a hydroxyl protecting group);

【化32】 上記式〔14〕で表わされる化合物をメチル化して式
〔15〕(式中、R3は水酸基の保護基を表わす)で表わ
される化合物を得る工程(n)と、
[Chemical 32] Methylating the compound represented by the above formula [14] to obtain a compound represented by the formula [15] (in the formula, R 3 represents a hydroxyl-protecting group);

【化33】 上記式〔15〕で表わされる化合物の水酸基を除去して
式〔16〕(式中、R3は水酸基の保護基を表わす)で表
わされる化合物を得る工程(o)と、
[Chemical 33] Removing the hydroxyl group of the compound represented by the above formula [15] to obtain a compound represented by the formula [16] (in the formula, R 3 represents a protective group for the hydroxyl group) (o),

【化34】 上記式〔16〕で表わされる化合物の水酸基の脱保護を
行って式〔17〕で表わされるグランディソル合成用の
中間体化合物を得る工程(p)と、
[Chemical 34] Deprotecting the hydroxyl group of the compound represented by the above formula [16] to obtain an intermediate compound for synthesizing grandisol represented by the formula [17] (p),

【化35】 を含むものである。[Chemical 35] Is included.

【0008】以下、本発明の(+)−グランディソル合
成中間体の製造法を、各工程を追って具体的に説明す
る。まず工程(a)において、前記式〔1〕で表わされ
るレボグルコセノンを塩基存在下、脂肪族、或いは芳香
族チオールと反応させ、4位に有機チオ基を導入する。
芳香族チオールの芳香環上にはメチル基などの置換基が
有ってもよく、特に限定されるものではない。塩基とし
てはトリエチルアミン、ピリジン等の3級アミン、水酸
化ナトリウム、水素化ナトリウムなどを好適に用いるこ
とができる。この際に使用される溶媒も一般に用いられ
る有機溶媒、例えばベンゼン、エーテル、塩化メチレン
などを用いることができ、特に限定されるものではな
い。
The method for producing the (+)-Grandisol synthetic intermediate of the present invention will be specifically described below by following each step. First, in step (a), the levoglucosenone represented by the above formula [1] is reacted with an aliphatic or aromatic thiol in the presence of a base to introduce an organic thio group at the 4-position.
A substituent such as a methyl group may be present on the aromatic ring of the aromatic thiol and is not particularly limited. As the base, tertiary amines such as triethylamine and pyridine, sodium hydroxide, sodium hydride and the like can be preferably used. The solvent used at this time may be a commonly used organic solvent such as benzene, ether, methylene chloride, and is not particularly limited.

【0009】続く工程(b)においては、工程(a)で
得られた前記式〔2〕で表わされる化合物の4位をクロ
ル化し、塩化水素として脱離(β−脱離)させて3位と
4位とにわたる二重結合を形成させるが、このクロル化
反応とβ−脱離は一挙に進行する。クロル化剤としては
N−クロロコハク酸イミドや塩化シアヌリルなどを用い
ることができ、特に限定されるものではない。またここ
で用いられる溶媒としては、ベンゼンや四塩化炭素等の
一般に用いられる炭化水素系、及びハロゲン系有機溶媒
などを用いることができ、特に限定されるものではな
い。
In the subsequent step (b), the 4-position of the compound represented by the above formula [2] obtained in the step (a) is chlorinated and eliminated as hydrogen chloride (β-elimination) to give the 3-position. And a double bond extending to the 4-position is formed, but this chlorination reaction and β-elimination proceed all at once. As the chlorinating agent, N-chlorosuccinimide, cyanuryl chloride or the like can be used and is not particularly limited. The solvent used here may be a commonly used hydrocarbon-based organic solvent such as benzene or carbon tetrachloride, or a halogen-based organic solvent, and is not particularly limited.

【0010】工程(c)においては、前記式〔3〕で表
わされる化合物にジメチル銅酸リチウムを、テトラヒド
ロフランを溶媒として低温で反応させる。メチル基を導
入するには各種の有機金属試薬を用いることができ、そ
の使用量は1〜3当量である。反応温度は−100〜−
30℃、反応時間は0.1〜10時間が好ましい。この
際用いられる溶媒としてはテトラヒドロフラン、ジエチ
ルエーテル、ベンゼン等の一般に用いられる有機溶媒を
用いることができ、特に限定されるものではない。
In step (c), the compound represented by the above formula [3] is reacted with lithium dimethylcuprate at a low temperature using tetrahydrofuran as a solvent. Various organometallic reagents can be used to introduce a methyl group, and the amount used is 1 to 3 equivalents. The reaction temperature is -100 to-
The reaction time at 30 ° C. is preferably 0.1 to 10 hours. As the solvent used at this time, a commonly used organic solvent such as tetrahydrofuran, diethyl ether, benzene or the like can be used and is not particularly limited.

【0011】工程(d)において、前記式〔4〕で表わ
される化合物にビニル基を共役付加させて前記式〔5〕
で表わされる化合物を得るが、化合物〔4〕に対して例
えばビニルマグネシウムブロミドとヨウ化銅及びヘキサ
メチルホスホリックトリアミドを反応させることにより
行うことができる。ここで用いるビニル金属試薬はグリ
ニヤル試薬に限らず、各種有機金属YCH=CH2 (YはLi、N
a、Ce等)を用いることもできる。添加物として各種銅
塩、例えばヨウ化銅、シアン化銅、臭化銅等とメチルス
ルフィドとの複合体を0〜10当量、ヘキサメチルホス
ホリックトリアミドやトリエチレンジアミンなどのアミ
ン、クロロトリメチルシラン等を0〜10当量用いるこ
とができる。反応温度は−100〜0℃、反応時間は
0.5〜10時間である。
In the step (d), a vinyl group is conjugated and added to the compound represented by the above formula [4] to obtain the above formula [5].
The compound [4] can be obtained by reacting the compound [4] with, for example, vinylmagnesium bromide, copper iodide and hexamethylphosphoric triamide. The vinyl metal reagent used here is not limited to the Grignard reagent, but various organic metals YCH = CH 2 (Y is Li, N
a, Ce, etc.) can also be used. As an additive, 0 to 10 equivalents of a complex of various copper salts, for example, copper iodide, copper cyanide, copper bromide and the like and methyl sulfide, amines such as hexamethylphosphoric triamide and triethylenediamine, chlorotrimethylsilane, etc. Can be used in an amount of 0 to 10 equivalents. The reaction temperature is −100 to 0 ° C., and the reaction time is 0.5 to 10 hours.

【0012】工程(e)において、前記式〔5〕で表わ
される化合物のカルボニル基を還元して前記式〔6〕で
表わされる化合物を得る。この際の還元剤としては、水
素化ホウ素ナトリウム、水素化アルミニウムリチウム、
L−セレクトリド等の一般にカルボニル基の還元に用い
られるヒドリド転移試薬や、接触還元試薬を用いること
ができ、特に限定されるものではない。また溶媒として
は、テトラヒドロフラン、ジエチルエーテル、ベンゼン
等の一般に用いられる有機溶媒を用いることができ、特
に限定されるものではない。
In step (e), the carbonyl group of the compound represented by the above formula [5] is reduced to obtain the compound represented by the above formula [6]. As the reducing agent at this time, sodium borohydride, lithium aluminum hydride,
A hydride transfer reagent generally used for reduction of a carbonyl group such as L-selectride and a catalytic reduction reagent can be used, and there is no particular limitation. As the solvent, a commonly used organic solvent such as tetrahydrofuran, diethyl ether, benzene can be used and is not particularly limited.

【0013】工程(f)において、前記式〔6〕で表わ
される化合物の水酸基に保護基R2を導入する。保護基R2
としては通常水酸基の保護に用いられる基であればどの
ようなものでもよく、例えばテトラヒドロフラニル、メ
トキシメチル、ベンジル、tert−ブチルジメチルシリル
を好適に用いることができる。またR2を導入する際に使
用する溶媒も、一般に用いられる有機溶媒を用いること
ができ、特に限定されるものではない。
In step (f), a protecting group R 2 is introduced into the hydroxyl group of the compound represented by the above formula [6]. Protecting group R 2
Any group can be used as long as it is usually used for protecting a hydroxyl group, and for example, tetrahydrofuranyl, methoxymethyl, benzyl, and tert-butyldimethylsilyl can be preferably used. Further, the solvent used when introducing R 2 may be a commonly used organic solvent and is not particularly limited.

【0014】工程(g)において、前記式〔7〕で表わ
される化合物のビニル基をヒドロキシエチル基に変換す
る反応は、例えば水ホウ素化反応を利用することができ
る。すなわちジボラン、ボランメチルスルフィド複合
体、9−ボラビシクロ〔3,3,1〕ノナンなどの水ホ
ウ素化反応剤が好適に用いられ、使用量は1〜10当量
である。反応温度は−78〜80℃、好ましくは室温で
あり、反応時間は0.5〜30時間である。この際用い
られる溶媒としては、テトラヒドロフラン、ジエチルエ
ーテル、ベンゼン等の一般に用いられる有機溶媒であっ
てよく、特に限定されるものではない。
In the step (g), the reaction of converting the vinyl group of the compound represented by the above formula [7] into a hydroxyethyl group can utilize, for example, a hydroboration reaction. That is, a hydroboration reagent such as diborane, borane methyl sulfide complex and 9-borabicyclo [3,3,1] nonane is preferably used, and the amount used is 1 to 10 equivalents. The reaction temperature is −78 to 80 ° C., preferably room temperature, and the reaction time is 0.5 to 30 hours. The solvent used at this time may be a commonly used organic solvent such as tetrahydrofuran, diethyl ether, benzene, etc., and is not particularly limited.

【0015】工程(h)において、前記式〔8〕で表わ
される化合物の水酸基を脱離基X に変換する。ここで言
う脱離基は、メシル基やトシル基、ハロゲン、アシル基
等通常脱離基として用いられるものであればどのような
ものでもよい。例えばメシル基やトシル基等に変換する
には、有機スルホニルクロリドや有機スルホン酸無水物
等を1〜5当量、溶媒としてピリジンやトリエチルアミ
ン等の3級アミン系液体化合物、或いはジメチルアミノ
ピリジン等の塩基性化合物を含んだ一般の有機溶媒を用
いることができる。反応温度は0〜40℃で、反応時間
は0.5〜30時間である。
In step (h), the hydroxyl group of the compound represented by the above formula [8] is converted into a leaving group X 1. The leaving group referred to herein may be any leaving group such as a mesyl group, a tosyl group, a halogen, an acyl group or the like which is usually used as a leaving group. For example, in order to convert it into a mesyl group or a tosyl group, 1 to 5 equivalents of an organic sulfonyl chloride or an organic sulfonic acid anhydride, a tertiary amine liquid compound such as pyridine or triethylamine as a solvent, or a base such as dimethylaminopyridine is used. A general organic solvent containing a polar compound can be used. The reaction temperature is 0 to 40 ° C., and the reaction time is 0.5 to 30 hours.

【0016】工程(i)において、前記式In step (i), the above formula

〔9〕で表わ
される化合物の水酸基の保護基R2を除去する。脱保護の
条件としてはそれぞれ用いた保護基に対応する一般的な
条件を用いることができ、特に限定されるものではな
い。例えば保護基R2がtert−ブチルジメチルシリル基の
場合、テトラブチルアンモニウムフロリドやフッ化水素
−ピリジン複合体等のフッ素試薬や、塩酸や酢酸等の酸
性化合物などを用いることができる。
The hydroxyl-protecting group R 2 of the compound represented by [9] is removed. As the deprotection conditions, general conditions corresponding to the used protecting groups can be used and are not particularly limited. For example, when the protecting group R 2 is a tert-butyldimethylsilyl group, a fluorine reagent such as tetrabutylammonium fluoride or hydrogen fluoride-pyridine complex or an acidic compound such as hydrochloric acid or acetic acid can be used.

【0017】工程(j)において、前記式〔10〕で表
わされる化合物の水酸基を酸化して前記式〔11〕で表
わされる化合物を得るには、通常の酸化反応であればど
のような反応でも利用することができ、特に限定される
ものではない。かかる酸化反応に用いられる酸化試薬と
しては、例えば三酸化クロム、過マンガン酸カリウム、
ジメチルスルホキシド/塩化オキザリルなどを挙げるこ
とができる。
In the step (j), in order to obtain the compound represented by the above formula [11] by oxidizing the hydroxyl group of the compound represented by the above formula [10], any ordinary oxidation reaction can be used. It can be used and is not particularly limited. Examples of the oxidizing reagent used in such an oxidation reaction include chromium trioxide, potassium permanganate,
Examples thereof include dimethyl sulfoxide / oxalyl chloride.

【0018】工程(k)において、前記式〔11〕で表
わされる化合物を塩基で処理して分子内で四員環を形成
するための試薬としては、水素化ナトリウム、リチウム
ジイソプロピルアミド、カリウムヘサメチルジシラザン
等の強塩基性物質であればどのようなものでもよく、か
かる塩基の使用量は、1〜10当量がよい。反応に用い
る溶媒は一般の有機溶媒であってよく、例えばジメチル
スルホキシド、ヘキサメチルホスホリックトリアミド、
テトラメチルエチレンジアミンなどが好適に用いられ
る。反応温度は−100〜100℃、反応時間は0.5
〜30時間程度である。
In the step (k), as a reagent for treating the compound represented by the above formula [11] with a base to form a four-membered ring in the molecule, sodium hydride, lithium diisopropylamide, potassium hesamethyl Any strongly basic substance such as disilazane may be used, and the amount of the base used is preferably 1 to 10 equivalents. The solvent used in the reaction may be a general organic solvent, for example, dimethyl sulfoxide, hexamethylphosphoric triamide,
Tetramethylethylenediamine and the like are preferably used. The reaction temperature is -100 to 100 ° C, and the reaction time is 0.5.
It is about 30 hours.

【0019】工程(l)において、前記式〔12〕で表
わされる化合物にバイヤー・ビリガー反応を行うための
酸化剤としては、トリフルオロ過酢酸等の有機過酸化物
や過酸化水素水などが好適に用いられる。酸化剤の使用
量は、1〜10当量である。反応に用いる溶媒は一般の
有機溶媒であってよく、例えば塩化メチレン、酢酸など
が好適に用いられる。反応温度は−40〜50℃で、反
応時間は0.5〜48時間である。反応終了後、生成物
がアルコールとホルメートとの混合物になる場合には、
必要に応じて反応溶媒をメタノールやジオキサン、テト
ラヒドロフラン等の有機溶媒、又は水に変えて塩酸や酢
酸などの酸性化合物で処理することによって、アルコー
ル体のみを得ることができる。
In step (l), as an oxidizing agent for carrying out the Bayer-Villiger reaction on the compound represented by the above formula [12], organic peroxides such as trifluoroperacetic acid and hydrogen peroxide solution are suitable. Used for. The amount of the oxidizing agent used is 1 to 10 equivalents. The solvent used in the reaction may be a general organic solvent, and for example, methylene chloride, acetic acid and the like are preferably used. The reaction temperature is −40 to 50 ° C., and the reaction time is 0.5 to 48 hours. After the reaction, if the product is a mixture of alcohol and formate,
If necessary, the alcohol solvent alone can be obtained by changing the reaction solvent to an organic solvent such as methanol, dioxane, or tetrahydrofuran, or treating with an acidic compound such as hydrochloric acid or acetic acid instead of water.

【0020】工程(m)において、前記式〔13〕で表
わされる化合物の水酸基に保護基R3を導入する。保護基
R3としては、通常水酸基の保護に用いられる基であれば
どのようなものでもよく、例えばテトラヒドロピラニ
ル、メトキシメチル、ベンジル、tert−ブチルジメチル
シリルなどの基を好適に利用することができる。また、
R3を導入する際に使用する溶媒も一般に用いられる有機
溶媒を利用することができ、特に限定されるものではな
い。例えばtert−ブチルジメチルシリル基を用いる場
合、tert−ブチルジメチルシリルクロリドや対応するト
リフレート、酸無水物等を1〜5当量用い、ジメチルホ
ルムアミドやピリジン等の一般に用いられる有機溶媒中
で反応させることができる。反応温度は−30〜80
℃、反応時間は0.1〜40時間である。
In step (m), a protecting group R 3 is introduced into the hydroxyl group of the compound represented by the above formula [13]. Protecting group
As R 3 , any group may be used as long as it is usually used for protecting a hydroxyl group, and for example, groups such as tetrahydropyranyl, methoxymethyl, benzyl and tert-butyldimethylsilyl can be preferably used. Also,
The solvent used when introducing R 3 can also be a commonly used organic solvent and is not particularly limited. For example, when a tert-butyldimethylsilyl group is used, 1 to 5 equivalents of tert-butyldimethylsilyl chloride, corresponding triflate, acid anhydride, etc. should be used and reacted in a commonly used organic solvent such as dimethylformamide or pyridine. You can Reaction temperature is -30 to 80
C, reaction time is 0.1 to 40 hours.

【0021】工程(n)において、前記式〔14〕で表
わされる化合物から前記式〔15〕で表わされる化合物
を得るには、例えばメチルリチウムやメチルマグネシウ
ムブロミド等の有機金属試薬を反応させる方法を利用す
ることができ、その使用量は2〜10当量である。この
際用いられる溶媒としてはテトラヒドロフラン、ジエチ
ルエーテル、ベンゼン等の一般に用いられる有機溶媒で
あってよく、特に限定されるものではない。反応温度は
−78〜80℃で、反応時間は0.1〜10時間であ
る。
In step (n), a compound represented by the above formula [14] can be obtained from the compound represented by the above formula [14] by reacting with an organometallic reagent such as methyllithium or methylmagnesium bromide. It can be used, and the amount used is 2 to 10 equivalents. The solvent used at this time may be a commonly used organic solvent such as tetrahydrofuran, diethyl ether, benzene, etc., and is not particularly limited. The reaction temperature is -78 to 80 ° C, and the reaction time is 0.1 to 10 hours.

【0022】工程(o)において、前記式〔15〕で表
わされる化合物の2級水酸基を除去してメチレン基とす
るには、化合物〔15〕を例えば水素化ナトリウムやブ
チルリチウム等の一般に用いられる塩基と処理したの
ち、これに二硫化炭素とヨウ化メチル、或いはチオカル
ボジイミダゾールなどを作用させてチオカルバメートと
し、これを有機錫ヒドリドを用いて還元することにより
化合物〔16〕を得ることができる。或いはまた前記の
方法以外にも、化合物〔15〕をリン酸エステル等に変
換し、液体アンモニア中でリチウムなどを用いて還元す
ることによっても行うことができる。
In the step (o), in order to remove the secondary hydroxyl group of the compound represented by the above formula [15] to form a methylene group, the compound [15] is generally used such as sodium hydride and butyl lithium. After treatment with a base, carbon disulfide and methyl iodide or thiocarbodiimidazole are allowed to act on this to give a thiocarbamate, which is reduced with an organotin hydride to give compound [16]. it can. Alternatively, in addition to the above-mentioned method, the compound [15] can be converted into a phosphoric acid ester or the like and reduced by using lithium or the like in liquid ammonia.

【0023】工程(p)において、前記式〔16〕で表
わされる化合物の保護基R3を除去するには、通常それぞ
れの保護基を脱保護するのに使用される方法を利用する
ことができ、特に限定されるものではない。例えば、R3
としてtert−ブチルジメチルシリル基を用いた場合、テ
トラブチルアンモニウムフロリドやフッ化水素−ピリジ
ン複合体等のフッ素試薬や、塩酸や酢酸などの酸性化合
物を用いることができる。
In step (p), in order to remove the protecting group R 3 of the compound represented by the above formula [16], a method usually used for deprotecting each protecting group can be used. It is not particularly limited. For example, R 3
When a tert-butyldimethylsilyl group is used as the compound, a fluorine reagent such as tetrabutylammonium fluoride or hydrogen fluoride-pyridine complex, or an acidic compound such as hydrochloric acid or acetic acid can be used.

【0024】こうして得られた生成物は前記式〔17〕
で表わされる化合物であって、その旋光度、 1H−及
び、13C−NMRスペクトル等の機器データを比較する
ことにより、文献既知の(+)−グランディソル合成用
の中間体化合物であることを確認することができる。
The product thus obtained has the above formula [17]
Is an intermediate compound for synthesis of (+)-Grandisol known from literature by comparing instrumental data such as optical rotation, 1 H- and 13 C-NMR spectra. Can be confirmed.

【0025】前記式〔17〕で表わされる中間体化合物
を、例えば前記の文献 (J. B. Jones, M. A. Finch, I.
J. Jakovac, Can. J. Chem., 60, 2007(1982)) に記載
されたように、無水酢酸中で熱処理して酢酸エステルと
した後水素化リチウムアルミニウムで還元することによ
り、(+)−グランディソルとそのイソプロピリデン型
異性体との2:1の混合物が得られる。そしてこの混合
物を更にガスクロマトグラフによって精製して、前記式
〔18〕で表わされる(+)−グランディソルを容易に
回収することができる。
The intermediate compound represented by the above formula [17] can be prepared, for example, from the above-mentioned literature (JB Jones, MA Finch, I.
J. Jakovac, Can. J. Chem., 60, 2007 (1982)), heat treatment in acetic anhydride to form an acetic acid ester, followed by reduction with lithium aluminum hydride (+) A 2: 1 mixture of grandisol and its isopropylidene-type isomer is obtained. Then, this mixture can be further purified by a gas chromatograph to easily recover (+)-grandisol represented by the above formula [18].

【0026】[0026]

【実施例】以下、実施例によりこの発明をさらに詳細に
説明するが、この実施例においては有機チオールとして
チオフェノールを、水酸基の保護基としてtert−ブチル
ジメチルシリル基を、脱離基としてトシル基をそれぞれ
利用した場合を示す。
EXAMPLES Hereinafter, the present invention will be described in more detail by way of examples. In this example, thiophenol is used as an organic thiol, tert-butyldimethylsilyl group is used as a hydroxyl protecting group, and tosyl group is used as a leaving group. The following shows the case where each is used.

【0027】工程(a) レボグルコセノン(前記の式〔1〕で表わされる化合
物)25.2g(0.2mol)のベンゼン溶液(400ml) にチオフェ
ノール22.0g(0.2mol)とトリエチルアミン20.2g(0.2mo
l)を加え、室温で30分間攪拌した。減圧下に濃縮して
得た残渣をシリカゲル 150gを用いたカラムクロマトグ
ラフィーに付し、20% 酢酸エチル/ヘキサン(v/v)流出
部分より式〔2〕で表わされる化合物44.6g(収率95%)
を無色の油状物として得た。
Step (a) 22.0 g (0.2 mol) of thiophenol and 20.2 g (0.2 mo
l) was added, and the mixture was stirred at room temperature for 30 minutes. The residue obtained by concentration under reduced pressure was subjected to column chromatography using 150 g of silica gel, and 44.6 g of the compound represented by the formula [2] (yield 95% was obtained from the 20% ethyl acetate / hexane (v / v) outflow portion). %)
Was obtained as a colorless oil.

【0028】上記式〔2〕で表わされる化合物の性質を
次に示す。 [α]D 26: −177.1 ° (c 0.76 CHCl3) IR(neat): 3060, 2976, 2908, 1734, 1584, 1483,
1439, 1412, 1307,1272, 1214, 1112, 1091, 1025, 99
6, 959, 911, 876, 752,692.
The properties of the compound represented by the above formula [2] are shown below. [Α] D 26 : −177.1 ° (c 0.76 CHCl 3 ) IR (neat): 3060, 2976, 2908, 1734, 1584, 1483,
1439, 1412, 1307,1272, 1214, 1112, 1091, 1025, 99
6, 959, 911, 876, 752,692.

【0029】工程(b) 式〔2〕で表わされる化合物44.6g(0.189mol)の四塩化
炭素溶液(500ml) に氷冷下でN−クロロコハク酸イミド
27.76g(0.20mol) を加え、同温度で2.5時間攪拌し
た。反応液を濾過し、濾液を飽和炭酸水素ナトリウム水
溶液及び飽和食塩水で順次洗浄し、硫酸ナトリウム上で
乾燥した。減圧下に溶媒を留去して得られた残渣をシリ
カゲル 500gを用いたカラムクロマトグラフィーに付
し、20〜30% 酢酸エチル/ヘキサン(v/v) 流出部分より
式〔3〕で表わされる化合物42.0g(収率95%)を黄色の
油状物として得た。
Step (b) N-chlorosuccinimide was added to a solution of 44.6 g (0.189 mol) of the compound of the formula [2] in carbon tetrachloride (500 ml) under ice cooling.
27.76 g (0.20 mol) was added, and the mixture was stirred at the same temperature for 2.5 hours. The reaction solution was filtered, and the filtrate was washed successively with saturated aqueous sodium hydrogen carbonate solution and saturated brine, and dried over sodium sulfate. The residue obtained by evaporating the solvent under reduced pressure was subjected to column chromatography using 500 g of silica gel, and 20 to 30% ethyl acetate / hexane (v / v) was extracted from the compound represented by the formula [3]. 42.0 g (95% yield) was obtained as a yellow oil.

【0030】上記式〔3〕で表わされる化合物の性質を
次に示す。 [α]D 23: −395.3 ° (c 0.63 CHCl3) IR(neat): 3060, 2974, 2900, 1684, 1566, 1479,
1441, 1294, 1108,992, 969, 932, 901, 864, 750, 69
0.
The properties of the compound represented by the above formula [3] are shown below. [Α] D 23 : −395.3 ° (c 0.63 CHCl 3 ) IR (neat): 3060, 2974, 2900, 1684, 1566, 1479,
1441, 1294, 1108,992, 969, 932, 901, 864, 750, 69
0.

【0031】工程(c) アルゴン雰囲気下、ヨウ化銅 146mg(0.77mmol)のテトラ
ヒドロフラン懸濁液 (2ml) に、0℃でメチルリチウム
1.02ml(1.54mmol)の1.5Mエーテル溶液をゆっくりと滴下
した。同温度で15分間攪拌したのち、−78℃に冷却し
た。この溶液に式〔3〕で表わされる化合物 180mg(0.7
7mmol)のテトラヒドロフラン溶液 (1ml) を加え、10
分間攪拌した。反応液に飽和塩化アンモニウム水溶液を
加えた後沈殿物を濾別し、有機層を分離し、更に水層を
エーテルで抽出した。合わせた有機層を飽和食塩水で洗
浄し、硫酸ナトリウム上で乾燥した。減圧下に溶媒を留
去して得られた残渣をシリカゲルカラムクロマトグラフ
ィーに付し、20〜40% 酢酸エチル/ヘキサン(v/v) 流出
部分より式〔4〕で表わされる化合物67mg(収率62%)を
淡黄色の油状物として得た。
Step (c) Methyllithium was added to a suspension of copper iodide (146 mg, 0.77 mmol) in tetrahydrofuran (2 ml) at 0 ° C. under an argon atmosphere.
1.02 ml (1.54 mmol) of 1.5 M ether solution was slowly added dropwise. After stirring for 15 minutes at the same temperature, the mixture was cooled to -78 ° C. 180 mg (0.7) of the compound represented by the formula [3] was added to this solution.
7 mmol of tetrahydrofuran solution (1 ml) was added, and 10
Stir for minutes. A saturated aqueous ammonium chloride solution was added to the reaction solution, the precipitate was filtered off, the organic layer was separated, and the aqueous layer was extracted with ether. The combined organic layers were washed with saturated brine and dried over sodium sulfate. The solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 67 mg of a compound represented by the formula [4] (yield: 20-40% ethyl acetate / hexane (v / v)). 62%) as a pale yellow oil.

【0032】上記式〔4〕で表わされる化合物の性質を
次に示す。 [α]D 26: −467 ° (c 1.95 CHCl3) IR(neat): 2978, 2902, 1690, 1630, 1437, 1381,
1315, 1296, 1257,1108, 990, 963, 899, 870, 833, 77
4, 735.
The properties of the compound represented by the above formula [4] are shown below. [Α] D 26 : −467 ° (c 1.95 CHCl 3 ) IR (neat): 2978, 2902, 1690, 1630, 1437, 1381,
1315, 1296, 1257, 1108, 990, 963, 899, 870, 833, 77
4, 735.

【0033】工程(d) アルゴン雰囲気下、ヨウ化銅 381mg (2.0mmol)のテトラ
ヒドロフラン懸濁液 (3ml) に、−30〜−20℃でビ
ニルマグネシウムブロミド 4.3ml(4.0mmol) の0.93M テ
トラヒドロフラン溶液をゆっくりと滴下した。同温度で
15分間攪拌したのち、−78℃に冷却した。この溶液
に式〔4〕で表わされる化合物 140mg(1.0mmol) のテト
ラヒドロフラン溶液 (1ml) を加え、15分間攪拌し
た。反応液に飽和塩化アンモニウム水溶液を加えた後沈
殿物を濾去し、有機層を分離し、更に水層を酢酸エチル
で抽出した。合わせた有機層を飽和食塩水で洗浄し、硫
酸ナトリウム上で乾燥した。減圧下に溶媒を留去して得
られた残渣をシリカゲルカラムクロマトグラフィーに付
し、15% 酢酸エチル/ヘキサン(v/v) 流出部分より式
〔5〕で表わされる化合物 103mg (収率61%)を無色の油
状物として得た。
Step (d) Under an argon atmosphere, a suspension of copper iodide (381 mg, 2.0 mmol) in tetrahydrofuran (3 ml) was added to a solution of vinylmagnesium bromide (4.3 ml, 4.0 mmol) in 0.93M tetrahydrofuran at -30 to -20 ° C. Was slowly added dropwise. After stirring for 15 minutes at the same temperature, the mixture was cooled to -78 ° C. To this solution was added a tetrahydrofuran solution (1 ml) containing 140 mg (1.0 mmol) of the compound represented by the formula [4], and the mixture was stirred for 15 minutes. A saturated aqueous ammonium chloride solution was added to the reaction solution, the precipitate was filtered off, the organic layer was separated, and the aqueous layer was extracted with ethyl acetate. The combined organic layers were washed with saturated brine and dried over sodium sulfate. The residue obtained by evaporating the solvent under reduced pressure was subjected to silica gel column chromatography to obtain 103 mg of the compound represented by the formula [5] from the 15% ethyl acetate / hexane (v / v) outflow portion (yield 61% ) Was obtained as a colorless oil.

【0034】上記式〔5〕で表わされる化合物の性質を
次に示す。 [α]D 24: −314.9 ° (c 0.43 CHCl3) IR(neat): 3088, 3974, 2936, 2912, 1742, 1642,
1120, 1015, 977,911, 874, 851.
The properties of the compound represented by the above formula [5] are shown below. [Α] D 24 : −314.9 ° (c 0.43 CHCl 3 ) IR (neat): 3088, 3974, 2936, 2912, 1742, 1642,
1120, 1015, 977,911, 874, 851.

【0035】工程(e) アルゴン雰囲気下、式〔5〕で表わされる化合物84mg
(0.5mmol)のテトラヒドロフラン溶液 (1ml) に、−7
8℃でL−セレクトリド1ml (1.0mmol)の1M テトラヒ
ドロフラン溶液を滴下した。反応液を1.5時間攪拌し
た後これに水を加え、酢酸エチルで抽出し、更に飽和食
塩水で洗浄し、硫酸ナトリウム上で乾燥した。減圧下に
溶媒を留去して得られた残渣をシリカゲルカラムクロマ
トグラフィーに付し、20% 酢酸エチル/ヘキサン(v/v)
流出部分より式〔6〕で表わされる化合物84mg(収率99
%)を得た。エーテル/ヘキサンから再結晶して、無色針
状晶を得た。
Step (e) 84 mg of a compound represented by the formula [5] under an argon atmosphere
In a tetrahydrofuran solution (1 ml) of (0.5 mmol), -7
A solution of 1 ml (1.0 mmol) of L-selectride in 1M tetrahydrofuran was added dropwise at 8 ° C. The reaction solution was stirred for 1.5 hours, water was added thereto, and the mixture was extracted with ethyl acetate, washed with saturated brine, and dried over sodium sulfate. The residue obtained by evaporating the solvent under reduced pressure was subjected to silica gel column chromatography, and 20% ethyl acetate / hexane (v / v)
84 mg of the compound represented by the formula [6] (yield 99
%). Recrystallization from ether / hexane gave colorless needle crystals.

【0036】上記式〔6〕で表わされる化合物の性質を
次に示す。 融点 : 161 〜161.5 ℃ [α]D 26: −38.8° (c 0.425 CHCl3) IR(KBr) : 3414(br), 2966, 1638, 1390, 1325, 11
56, 1120, 1029, 928,913, 864.
The properties of the compound represented by the above formula [6] are shown below. Melting point: 161 to 161.5 ° C [α] D 26 : −38.8 ° (c 0.425 CHCl 3 ) IR (KBr): 3414 (br), 2966, 1638, 1390, 1325, 11
56, 1120, 1029, 928, 913, 864.

【0037】工程(f) アルゴン雰囲気下、式〔6〕で表わされる化合物87mg
(0.51mmol)のジメチルホルムアミド溶液 (2ml) に、室
温でイミダゾール139mg(2.05mmol) とtert−ブチルジメ
チルシリルクロリド 154mg (1.02mmol) を加え、一晩攪
拌した。反応液に水を加えてエーテルで抽出し、飽和食
塩水で洗浄したのち硫酸ナトリウム上で乾燥した。減圧
下に溶媒を留去して得られた残渣をシリカゲルカラムク
ロマトグラフィーに付し、10% 酢酸エチル/ヘキサン(v
/v) 流出部分より式〔7〕で表わされる化合物 140mg
(収率96%)を無色油状物として得た。
Step (f) 87 mg of a compound represented by the formula [6] under an argon atmosphere
To a dimethylformamide solution (2 ml) containing (0.51 mmol), imidazole (139 mg, 2.05 mmol) and tert-butyldimethylsilyl chloride (154 mg, 1.02 mmol) were added at room temperature, and the mixture was stirred overnight. Water was added to the reaction solution, which was extracted with ether, washed with saturated saline, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 10% ethyl acetate / hexane (v
/ v) 140 mg of the compound represented by the formula [7] from the outflow part
(Yield 96%) was obtained as a colorless oil.

【0038】上記式〔7〕で表わされる化合物の性質を
次に示す。 [α]D 26: −54.5° (c 0.945 CHCl3) IR(neat): 2960, 2896, 2862, 1638, 1257, 1122,
1085, 1064.
The properties of the compound represented by the above formula [7] are shown below. [Α] D 26 : −54.5 ° (c 0.945 CHCl 3 ) IR (neat): 2960, 2896, 2862, 1638, 1257, 1122,
1085, 1064.

【0039】工程(g) アルゴン雰囲気下、式〔7〕で表わされる化合物 298mg
(1.05mmol) のテトラヒドロフラン溶液 (5ml) に、室
温で9−ボラビシクロ〔3,3,1〕ノナンの0.5M テ
トラヒドロフラン溶液 2.1ml (1.05mmol) を加えて1時
間攪拌した後、更に 3.1mlの9−ボラビシクロ〔3,
3,1〕ノナン溶液を加えて1時間攪拌した。反応液に
水、3M 水酸化ナトリウム水溶液、30% 過酸化水素水
(各2ml) を順次加え、40〜45℃で1時間攪拌し
た。反応液を酢酸エチルで抽出し、飽和食塩水で洗浄し
た後硫酸ナトリウム上で乾燥した。減圧下に溶媒を留去
して得られた残渣をシリカゲルカラムクロマトグラフィ
ーに付し、20% 酢酸エチル/ヘキサン(v/v) 流出部分よ
り式〔8〕で表わされる化合物 316mg (収率100%) を無
色油状物として得た。
Step (g) 298 mg of the compound represented by the formula [7] under an argon atmosphere.
To a tetrahydrofuran solution (5 ml) of (1.05 mmol) was added 2.1 ml (1.05 mmol) of 0.5M tetrahydrofuran solution of 9-borabicyclo [3,3,1] nonane at room temperature, and the mixture was stirred for 1 hour, and then 3.1 ml of 9 ml was added. -Borabicyclo [3,3
[3,1] Nonane solution was added and stirred for 1 hour. Water, 3M aqueous sodium hydroxide solution and 30% aqueous hydrogen peroxide solution (2 ml each) were sequentially added to the reaction solution, and the mixture was stirred at 40 to 45 ° C for 1 hr. The reaction solution was extracted with ethyl acetate, washed with saturated saline, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 316 mg of the compound represented by the formula [8] from the 20% ethyl acetate / hexane (v / v) outflow portion (yield 100% ) Was obtained as a colorless oil.

【0040】上記式〔8〕で表わされる化合物の性質を
次に示す。 [α]D 25: −30.0° (c 0.585 CHCl3) IR(neat): 3405(br), 2958, 2932, 2896, 2862, 14
73, 1462, 1386,1363, 1257, 1170, 1127, 1089, 1064,
1035, 944, 926,878, 857, 777.
The properties of the compound represented by the above formula [8] are shown below. [Α] D 25 : −30.0 ° (c 0.585 CHCl 3 ) IR (neat): 3405 (br), 2958, 2932, 2896, 2862, 14
73, 1462, 1386,1363, 1257, 1170, 1127, 1089, 1064,
1035, 944, 926,878, 857, 777.

【0041】工程(h) アルゴン雰囲気下、式〔8〕で表わされる化合物 5.315
g (17.6mmol) のピリジン溶液 (60ml) に、室温でトシ
ルクロリド3.69g (19mmol) とジメチルアミノピリジン
(触媒量)を加え、一晩攪拌した。反応液に水を加えて
エーテルで抽出し、飽和食塩水で洗浄した後硫酸ナトリ
ウム上で乾燥した。減圧下に溶媒を留去して得られた残
渣をシリカゲルカラムクロマトグラフィーに付し、20%
酢酸エチル/ヘキサン(v/v) 流出部分より式
Step (h) A compound 5.315 represented by the formula [8] under an argon atmosphere.
To a pyridine solution (60 ml) of g (17.6 mmol), 3.69 g (19 mmol) of tosyl chloride and dimethylaminopyridine (catalytic amount) were added at room temperature, and the mixture was stirred overnight. Water was added to the reaction solution, which was extracted with ether, washed with saturated saline and then dried over sodium sulfate. The solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to give 20%.
Ethyl acetate / hexane (v / v) Formula from the outflow part

〔9〕で表
わされる化合物 7.427g (収率93%)を得ると共に、未反
応の原料を 248mg回収した。
In addition to obtaining 7.427 g (yield 93%) of the compound represented by [9], 248 mg of unreacted raw material was recovered.

【0042】上記式The above formula

〔9〕で表わされる化合物の性質を
次に示す。 [α]D 20: −23.0° (c 0.225 CHCl3) IR(neat): 2932, 2860, 1601, 1464, 1363, 1257,
1178, 1125, 1058,944, 878, 814, 777, 662, 555.
The properties of the compound represented by [9] are shown below. [Α] D 20 : −23.0 ° (c 0.225 CHCl 3 ) IR (neat): 2932, 2860, 1601, 1464, 1363, 1257,
1178, 1125, 1058,944, 878, 814, 777, 662, 555.

【0043】工程(i) プラスチックの反応容器で、式Step (i) In a plastic reaction vessel, the formula

〔9〕で表わされる化合
物 187mg (0.41mmol)のエーテル溶液(4ml) に、氷冷
下にフッ化水素−ピリジン複合体1mlを加え、室温で2
時間攪拌した後、更にフッ化水素−ピリジン複合体 0.2
mlを加え、同温度で2時間攪拌した。反応液をエーテル
で希釈し、飽和炭酸水素ナトリウム水溶液を注意深く加
えて酢酸エチルで抽出し、飽和食塩水で洗浄した後硫酸
ナトリウム上で乾燥した。減圧下に溶媒を留去して得ら
れた残渣をシリカゲルカラムクロマトグラフィーに付
し、50% 酢酸エチル/ヘキサン(v/v) 流出部分より式
〔10〕で表わされる化合物 138mg (収率96%)を無色針
状晶として得た。
To an ether solution (4 ml) of 187 mg (0.41 mmol) of the compound represented by [9], 1 ml of hydrogen fluoride-pyridine complex was added under ice cooling, and the mixture was allowed to stand at room temperature for 2 hours.
After stirring for an additional time, hydrogen fluoride-pyridine complex 0.2
ml was added, and the mixture was stirred at the same temperature for 2 hours. The reaction mixture was diluted with ether, saturated aqueous sodium hydrogencarbonate solution was carefully added, extracted with ethyl acetate, washed with saturated brine and dried over sodium sulfate. The residue obtained by distilling off the solvent under reduced pressure was subjected to silica gel column chromatography, and 138 mg of the compound represented by the formula [10] (yield 96% was obtained from the 50% ethyl acetate / hexane (v / v) outflow portion. ) Was obtained as colorless needle crystals.

【0044】上記式〔10〕で表わされる化合物の性質
を次に示す。 融点 : 104.5 〜105.5 ℃ [α]D 22: −27.3° (c 0.40 CHCl3) IR(KBr) : 3482(br), 2950, 1332, 1189, 1176, 11
23, 1040, 1021, 926.
The properties of the compound represented by the above formula [10] are shown below. Melting point: 104.5 to 105.5 ° C. [α] D 22 : −27.3 ° (c 0.40 CHCl 3 ) IR (KBr): 3482 (br), 2950, 1332, 1189, 1176, 11
23, 1040, 1021, 926.

【0045】工程(j) アルゴン雰囲気下、式〔10〕で表わされる化合物 782
mg (2.3mmol)の塩化メチレン溶液 (25ml) に、室温で活
性化した粉末モレキュラーシーブス4A 2.3gとピリジニ
ウムジクロメート1.29g(3.4mmol) を加え、2.5時間
攪拌した。反応液をエーテルで希釈した後セライトを用
いて濾過し、エーテルで十分洗浄した。合わせた洗液は
減圧下に溶媒を留去し、得られた残渣をシリカゲルカラ
ムクロマトグラフィーに付し、エーテル:塩化メチレ
ン:ヘキサン=1:1:3(v/v) 流出部分より式〔1
1〕で表わされる化合物 718mg (収率92%)を得た。酢酸
エチル−ヘキサン系で再結晶したものは、無色板状晶で
あった。
Step (j) A compound of the formula [10] 782 under an argon atmosphere.
To a solution of methylene chloride (25 ml) in mg (2.3 mmol), 2.3 g of powdered molecular sieves 4A activated at room temperature and 1.29 g (3.4 mmol) of pyridinium dichromate were added and stirred for 2.5 hours. The reaction solution was diluted with ether, filtered through Celite, and thoroughly washed with ether. The combined washings were evaporated under reduced pressure to remove the solvent, and the resulting residue was subjected to silica gel column chromatography. Ether: methylene chloride: hexane = 1: 1: 3 (v / v)
718 mg (yield 92%) of the compound represented by 1] was obtained. The product recrystallized with an ethyl acetate-hexane system was a colorless plate crystal.

【0046】上記式〔11〕で表わされる化合物の性質
を次に示す。 融点 : 70.5〜71℃ [α]D 23: −132.6 ° (c 0.675 CHCl3) IR(KBr) : 2972, 2918, 1736, 1599, 1359, 1174,
1108, 909, 888, 772,665, 555.
The properties of the compound represented by the above formula [11] are shown below. Melting point: 70.5 to 71 ° C. [α] D 23 : −132.6 ° (c 0.675 CHCl 3 ) IR (KBr): 2972, 2918, 1736, 1599, 1359, 1174,
1108, 909, 888, 772,665, 555.

【0047】工程(k) アルゴン雰囲気下、ヘキサンで洗浄した水素化ナトリウ
ム85mg(鉱油中50%, 1.76mmol)にジメチルスルホキシド
5mlを加え、50〜60℃で1時間攪拌した。反応液を
室温に戻した後、式〔11〕で表わされる化合物 500mg
(1.47mmol) のジメチルスルホキシド溶液 (1ml) を加
え、10分間攪拌した。反応液に水を加えて酢酸エチル
で抽出し、飽和食塩水で洗浄した後、硫酸ナトリウム上
で乾燥した。更に減圧下に溶媒を留去して得られた残渣
をシリカゲルカラムクロマトグラフィーに付し、20% 酢
酸エチル/ヘキサン(v/v) 流出部分より式〔12〕で表
わされる化合物 198mg (収率80%)を得た。
Step (k) 5 mg of dimethyl sulfoxide was added to 85 mg of sodium hydride (50% in mineral oil, 1.76 mmol) washed with hexane under an argon atmosphere, and the mixture was stirred at 50 to 60 ° C. for 1 hour. After returning the reaction solution to room temperature, the compound of the formula [11] 500 mg
A solution of (1.47 mmol) in dimethyl sulfoxide (1 ml) was added, and the mixture was stirred for 10 minutes. Water was added to the reaction solution, which was extracted with ethyl acetate, washed with saturated saline, and then dried over sodium sulfate. Further, the solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 198 mg of a compound represented by the formula [12] (yield 80 %).

【0048】上記式〔12〕で表わされる化合物の性質
を次に示す。 [α]D 24: −193 ° (c 0.35 CHCl3) IR(neat): 2962, 1734, 1458, 1383, 1290, 1234,
1114, 1038, 1013,967, 899, 835.
The properties of the compound represented by the above formula [12] are shown below. [Α] D 24 : −193 ° (c 0.35 CHCl 3 ) IR (neat): 2962, 1734, 1458, 1383, 1290, 1234,
1114, 1038, 1013,967, 899, 835.

【0049】工程(l) アルゴン雰囲気下、室温で、式〔12〕で表わされる化
合物42mg (0.25mmol)の酢酸溶液 (1ml) に、室温で40%
過酢酸 0.2mlを加え、4時間攪拌した。過剰の過酢酸
を分解するためにジメチルスルフィドを数滴加え、更に
30分間攪拌した。減圧下に溶媒を留去し、残渣にメタ
ノール2mlと塩酸1滴を加え、室温で一晩攪拌した。減
圧下に溶媒を留去して得られた残渣をシリカゲルカラム
クロマトグラフィーに付し、60% 酢酸エチル/ヘキサン
(v/v) 流出部分より式〔13〕で表わされる化合物とジ
メチルスルホンの混合物50mgを得た。これは、これ以上
単離精製することなく、次の反応に用いることができ
る。
Step (l) At room temperature under an argon atmosphere, a solution of the compound of the formula [12] 42 mg (0.25 mmol) in acetic acid (1 ml) was added with 40% at room temperature.
0.2 ml of peracetic acid was added and stirred for 4 hours. A few drops of dimethyl sulfide were added to decompose excess peracetic acid, and the mixture was further stirred for 30 minutes. The solvent was distilled off under reduced pressure, 2 ml of methanol and 1 drop of hydrochloric acid were added to the residue, and the mixture was stirred overnight at room temperature. The residue obtained by evaporating the solvent under reduced pressure was subjected to silica gel column chromatography, 60% ethyl acetate / hexane
(v / v) 50 mg of a mixture of the compound represented by the formula [13] and dimethyl sulfone was obtained from the outflow portion. This can be used for the next reaction without further isolation and purification.

【0050】工程(m) アルゴン雰囲気下、上記工程(l)で得られた混合物50
mg(粗生成物)のジメチルホルムアミド溶液 (1ml)
に、室温でイミダゾール44mg (0.64mmol) とtert−ブチ
ルジメチルシリルクロリド72mg (0.48mmol) を加え、
1.5時間攪拌した。反応液に水を加えてエーテルで抽
出し、飽和食塩水で洗浄した後硫酸ナトリウム上で乾燥
した。更に減圧下に溶媒を留去して得られた残渣をシリ
カゲルカラムクロマトグラフィーに付し、30% 酢酸エチ
ル/ヘキサン(v/v) 流出部分より式〔14〕で表わされ
る化合物75mg(工程(l)と工程(m)との2工程合計
の収率87% )を得た。更にこれをヘキサンから再結晶し
て、無色針状晶を得た。
Step (m) Under an argon atmosphere, the mixture 50 obtained in the above step (l) is used.
mg (crude product) in dimethylformamide (1 ml)
To the above, at room temperature, imidazole 44 mg (0.64 mmol) and tert-butyldimethylsilyl chloride 72 mg (0.48 mmol) were added,
Stir for 1.5 hours. Water was added to the reaction solution, which was extracted with ether, washed with saturated saline and then dried over sodium sulfate. Further, the solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 75 mg of the compound represented by the formula [14] from the 30% ethyl acetate / hexane (v / v) outflow portion (step (l ) And the step (m), a total yield of 87% was obtained. Further, this was recrystallized from hexane to obtain colorless needle crystals.

【0051】上記式〔14〕で表わされる化合物の性質
を次に示す。 融点 : 82〜82.5℃ [α]D 25: −13.5° (c 1.43 CHCl3) IR(KBr) : 3429(br), 2956, 2932, 2862, 1754, 14
64, 1381, 1348,1305, 1263, 1170, 1114, 1071, 1036,
1031, 961, 930, 839,777.
The properties of the compound represented by the above formula [14] are shown below. Melting point: 82-82.5 ° C [α] D 25 : -13.5 ° (c 1.43 CHCl 3 ) IR (KBr): 3429 (br), 2956, 2932, 2862, 1754, 14
64, 1381, 1348, 1305, 1263, 1170, 1114, 1071, 1036,
1031, 961, 930, 839,777.

【0052】ここで、式〔14〕で表わされる化合物 2
36mg (0.87mmol) のテトラヒドロフラン溶液 (3ml)
に、室温でテトラブチルアンモニウムフロリド1.05mlの
1M テトラヒドロフラン溶液を加えて30分間攪拌し
た。こうして上記の工程(m)で導入した保護基を脱離
させて得た反応液に水を加えて酢酸エチルで抽出し、飽
和食塩水で洗浄した後硫酸ナトリウム上で乾燥した。減
圧下に溶媒を留去して得られた残渣をシリカゲルカラム
クロマトグラフィーに付し、60% 酢酸エチル/ヘキサン
(v/v) 流出部分より式〔14〕で表わされる化合物の原
料である式〔13〕で表わされる化合物 107mg (収率78
%)を得た。これをエーテル−ヘキサンから再結晶したと
ころ、無色針状晶が得られた。
Here, the compound 2 represented by the formula [14]
A solution of 36mg (0.87mmol) in tetrahydrofuran (3ml)
At room temperature, 1.05 ml of tetrabutylammonium fluoride in 1M tetrahydrofuran solution was added and stirred for 30 minutes. Water was added to the reaction solution obtained by removing the protecting group introduced in the above step (m), extracted with ethyl acetate, washed with saturated saline and then dried over sodium sulfate. The residue obtained by evaporating the solvent under reduced pressure was subjected to silica gel column chromatography, 60% ethyl acetate / hexane
(v / v) 107 mg of the compound of the formula [13] (yield 78
%). When this was recrystallized from ether-hexane, colorless needle crystals were obtained.

【0053】上記式〔13〕で表わされる化合物の性質
を次に示す。 融点 : 48.5〜49℃ [α]D 25: +26.0° (c 0.43 CHCl3) IR(KBr) : 3400(br), 2952, 2878, 1758, 1441, 13
46, 1305, 1170,1145, 1073, 1031.
The properties of the compound represented by the above formula [13] are shown below. Melting point: 48.5 to 49 ° C [α] D 25 : + 26.0 ° (c 0.43 CHCl 3 ) IR (KBr): 3400 (br), 2952, 2878, 1758, 1441, 13
46, 1305, 1170, 1145, 1073, 1031.

【0054】工程(n) アルゴン雰囲気下、式〔14〕で表わされる化合物9mg
(33mmol) のテトラヒドロフラン溶液 (1ml) に、氷冷
下でメチルリチウム0.15ml(1.1M エーテル溶液) を加
え、10分間攪拌した。反応液に水を加えて酢酸エチル
で抽出し、飽和食塩水で洗浄した後硫酸ナトリウム上で
乾燥した。減圧下に溶媒を留去して得られた残渣をシリ
カゲルカラムクロマトグラフィーに付し、30% 酢酸エチ
ル/ヘキサン(v/v) 流出部分より式〔15〕で表わされ
る化合物10mg(収率100%) を得た。更にこれをエーテル
−ヘキサンから再結晶して、無色針状晶を得た。
Step (n) 9 mg of a compound represented by the formula [14] under an argon atmosphere
Methyllithium 0.15 ml (1.1 M ether solution) was added to a tetrahydrofuran solution (1 ml) of (33 mmol) under ice cooling, and the mixture was stirred for 10 minutes. Water was added to the reaction solution, which was extracted with ethyl acetate, washed with saturated saline, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure and the resulting residue was subjected to silica gel column chromatography to obtain 10 mg of the compound represented by the formula [15] (yield 100% from the 30% ethyl acetate / hexane (v / v) outflow portion). ) Got. Further, this was recrystallized from ether-hexane to give colorless needle crystals.

【0055】上記式〔15〕で表わされる化合物の性質
を次に示す。 融点 : 66.5〜67℃ [α]D 25: +14.9° (c 1.10 CHCl3) IR(KBr) : 3374(br), 2970, 2864, 1475, 1381, 12
47, 1195, 1108,1094, 1038, 1006, 942, 893, 837, 77
7, 665.
The properties of the compound represented by the above formula [15] are shown below. Melting point: 66.5 to 67 ° C [α] D 25 : + 14.9 ° (c 1.10 CHCl 3 ) IR (KBr): 3374 (br), 2970, 2864, 1475, 1381, 12
47, 1195, 1108, 1094, 1038, 1006, 942, 893, 837, 77
7, 665.

【0056】工程(o) アルゴン雰囲気下、ヘキサンで洗浄した水素化ナトリウ
ム17mg(鉱油中50%, 0.35mmol)のテトラヒドロフラン懸
濁液 (1ml) に、室温で式〔15〕で表わされる化合物
35mg (0.115mmol)とイミダゾール(一片)のテトラヒド
ロフラン溶液 (1ml) を加えて20分間攪拌した後、二
硫化炭素22ml (0.35mmol) を一気に加え、更に30分間
攪拌した。反応液にヨウ化メチル22ml (0.35mmol) を加
えて15分間攪拌した後、酢酸を数滴加え反応を終了さ
せ、減圧下に溶媒を留去した。残渣をベンゼン(0.5ml)
で希釈し、水素化トリブチル錫47ml (0.17mmol) とトリ
エチルボラン0.17ml(0.17mmol) の1M ヘキサン溶液を
加えて30分間攪拌し、更に同量の水素化トリブチル錫
とトリエチルボランを加えて更に1時間攪拌した。減圧
下に溶媒を留去して得られた残渣をシリカゲルカラムク
ロマトグラフィーに付し、5% 酢酸エチル/ヘキサン(v
/v) 流出部分より式〔16〕で表わされる化合物11mg
(収率33%)を得た。
Step (o) In a tetrahydrofuran suspension (1 ml) of 17 mg of sodium hydride (50% in mineral oil, 0.35 mmol) washed with hexane under an argon atmosphere, the compound of the formula [15] was added at room temperature.
A tetrahydrofuran solution (1 ml) of 35 mg (0.115 mmol) and imidazole (one piece) was added and stirred for 20 minutes, 22 ml (0.35 mmol) of carbon disulfide was added all at once, and the mixture was further stirred for 30 minutes. After adding 22 ml (0.35 mmol) of methyl iodide to the reaction solution and stirring for 15 minutes, a few drops of acetic acid was added to terminate the reaction, and the solvent was distilled off under reduced pressure. The residue is benzene (0.5 ml)
Dilute with tributyltin hydride (47 ml, 0.17 mmol) and triethylborane (0.17 ml, 0.17 mmol) in 1M hexane and stir for 30 minutes. Stir for hours. The solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 5% ethyl acetate / hexane (v
/ v) 11 mg of the compound represented by the formula [16] from the outflow portion
(Yield 33%) was obtained.

【0057】上記式〔16〕で表わされる化合物の性質
を次に示す。 [α]D 20: +12.6° (c 0.45 CHCl3) IR(neat): 3446(br), 2958, 2862, 1464, 1377, 12
57, 1093, 1031,1006, 940, 835, 775, 663.
The properties of the compound represented by the above formula [16] are shown below. [Α] D 20 : + 12.6 ° (c 0.45 CHCl 3 ) IR (neat): 3446 (br), 2958, 2862, 1464, 1377, 12
57, 1093, 1031, 1006, 940, 835, 775, 663.

【0058】工程(p) 式〔16〕で表わされる化合物9mg (32mmol) のテトラ
ヒドロフラン溶液(0.5ml) に、室温でテトラブチルアン
モニウムフロリド48ml(48mmol)の1M テトラヒドロフ
ラン溶液を加えて、30分間攪拌した。反応液に水を加
えて酢酸エチルで抽出し、飽和食塩水で洗浄した後硫酸
ナトリウム上で乾燥した。減圧下に溶媒を留去して得ら
れた残渣をシリカゲルカラムクロマトグラフィーに付
し、60% 酢酸エチル/ヘキサン(v/v) 流出部分より式
〔17〕で表わされる化合物4mg(収率73%)を得た。更
にこれをヘプタンから再結晶して、本発明の目的とする
中間体化合物の無色針状晶を得た。
Step (p) To a solution of 9 mg (32 mmol) of the compound of the formula [16] in tetrahydrofuran (0.5 ml) was added at room temperature 48 ml (48 mmol) of tetrabutylammonium fluoride in 1M tetrahydrofuran, and the mixture was stirred for 30 minutes. did. Water was added to the reaction solution, which was extracted with ethyl acetate, washed with saturated saline, and then dried over sodium sulfate. The solvent was distilled off under reduced pressure and the obtained residue was subjected to silica gel column chromatography to obtain 4 mg of the compound represented by the formula [17] from the 60% ethyl acetate / hexane (v / v) outflow portion (yield 73% ) Got. Further, this was recrystallized from heptane to obtain colorless needle crystals of the intermediate compound of the present invention.

【0059】上記式〔17〕で表わされる中間体化合物
の性質を次に示す。 融点 : 61〜62℃ [α]D 24: +17.2° (c 0.38 CHCl3) IR(KBr) : 3374(br), 2970, 2868, 1464, 1379, 13
65, 1303, 1232,1172, 1133, 1064, 940, 832.1 H−NMR(CDCl3) :1.04(3H, s), 1.06(3H, s), 1.1
7(3H, s), 1.4〜2.1(9H, m),3.60(1H, ddd, J=5.3, 8.
7, 10.3 Hz), 3.67(1H, ddd, J=6.7,8.3, 10.3Hz).13 C−NMR(CDCl3) :17.90, 28.26, 28.92, 29.12,
30.53, 37.68, 41.73, 56.04,60.06,72.16.
The properties of the intermediate compound represented by the above formula [17] are shown below. Melting point: 61 to 62 ° C. [α] D 24 : + 17.2 ° (c 0.38 CHCl 3 ) IR (KBr): 3374 (br), 2970, 2868, 1464, 1379, 13
65, 1303, 1232,1172, 1133, 1064, 940, 832. 1 H-NMR (CDCl 3): 1.04 (3H, s), 1.06 (3H, s), 1.1
7 (3H, s), 1.4 ~ 2.1 (9H, m), 3.60 (1H, ddd, J = 5.3, 8.
7, 10.3 Hz), 3.67 (1H, ddd, J = 6.7, 8.3, 10.3 Hz). 13 C-NMR (CDCl 3 ): 17.90, 28.26, 28.92, 29.12,
30.53, 37.68, 41.73, 56.04,60.06,72.16.

【0060】[0060]

【発明の効果】以上のように、入手容易なレボグルコセ
ノンを原料として本発明に従って容易に合成できる中間
体を利用すれば、天然界からは大量に入手することが困
難な(+)−グランディソルを簡単に合成することがで
きるようになり、農薬として使用するに足る量のワタミ
ゾウムシのフェロモンを供給する途が開かれた。
INDUSTRIAL APPLICABILITY As described above, if an easily obtainable intermediate, which can be easily synthesized according to the present invention, is used as a raw material, (+)-grandisol, which is difficult to obtain from the natural world, can be obtained. It became possible to synthesize easily and opened the way to supply the weevil pheromone in an amount sufficient for use as a pesticide.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 C07D 493/08 B 9164−4C (72)発明者 川上 浩 神奈川県横浜市緑区梅が丘6番地2 日本 たばこ産業株式会社生命科学研究所内 (72)発明者 松本 克也 神奈川県横浜市緑区梅が丘6番地2 日本 たばこ産業株式会社生命科学研究所内 (72)発明者 松下 肇 神奈川県横浜市緑区梅が丘6番地2 日本 たばこ産業株式会社生命科学研究所内─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Reference number within the agency FI technical display location C07D 493/08 B 9164-4C (72) Inventor Hiroshi Kawakami 6-2 Umegaoka, Midori-ku, Yokohama-shi, Kanagawa Japan Tobacco Inc. Life Science Research Institute (72) Inventor Katsuya Matsumoto 2 6 Umegaoka, Midori-ku, Yokohama, Kanagawa Prefecture Japan Tobacco Inc. Life Science Institute (72) Inventor Hajime Matsushita 6 Umegaoka, Midori-ku, Yokohama, Kanagawa Prefecture Address 2 Japan Tobacco Inc. Life Science Institute

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】式〔1〕で表わされるレボグルコセノンの
4位に有機チオールを付加させて式〔2〕(式中、R1
アルキル、又はアリール基を表わす)で表わされる化合
物を得る工程(a)と、 【化1】 【化2】 上記式〔2〕で表わされる化合物の3位と4位とにわた
る二重結合を形成して式〔3〕(式中、R1はアルキル、
又はアリール基を表わす)で表わされる化合物を得る工
程(b)と、 【化3】 上記式〔3〕で表わされる化合物の有機チオ基をメチル
基に置換して式〔4〕で表わされる化合物を得る工程
(c)と、 【化4】 上記式〔4〕で表わされる化合物の4位にビニル基を立
体選択的に共役付加させて式〔5〕で表わされる化合物
を得る工程(d)と、 【化5】 上記式〔5〕で表わされる化合物のカルボニル基を還元
して式〔6〕で表わされる化合物を得る工程(e)と、 【化6】 上記式〔6〕で表わされる化合物の2位の水酸基を保護
して式〔7〕(式中、R2は水酸基の保護基を表わす)で
表わされる化合物を得る工程(f)と、 【化7】 上記式〔7〕で表わされる化合物の二重結合を水ホウ素
化して式〔8〕で表わされる化合物を得る工程(g)
と、 【化8】 上記式〔8〕で表わされる化合物の水酸基を脱離基に変
換して式〔9〕(式中、X は脱離基を表わす)で表わさ
れる化合物を得る工程(h)と、 【化9】 上記式〔9〕で表わされる化合物の水酸基の脱保護を行
って式〔10〕(式中、X は脱離基を表わす)で表わさ
れる化合物を得る工程(i)と、 【化10】 上記式〔10〕で表わされる化合物の水酸基を酸化して
式〔11〕(式中、X は脱離基を表わす)で表わされる
化合物を得る工程(j)と、 【化11】 上記式〔11〕で表わされる化合物を塩基で処理して式
〔12〕で表わされる化合物を得る工程(k)と、 【化12】 上記式〔12〕で表わされる化合物にバイヤービリガー
反応を行って式〔13〕で表わされる化合物を得る工程
(l)と、 【化13】 上記式〔13〕で表わされる化合物の水酸基を保護して
式〔14〕(式中、R3は水酸基の保護基を表わす)で表
わされる化合物を得る工程(m)と、 【化14】 上記式〔14〕で表わされる化合物をメチル化して式
〔15〕(式中、R3は水酸基の保護基を表わす)で表わ
される化合物を得る工程(n)と、 【化15】 上記式〔15〕で表わされる化合物の水酸基を除去して
式〔16〕(式中、R3は水酸基の保護基を表わす)で表
わされる化合物を得る工程(o)と、 【化16】 上記式〔16〕で表わされる化合物の水酸基の脱保護を
行って式〔17〕で表わされるグランディソル合成用の
中間体化合物を得る工程(p)と、 【化17】 を含むことを特徴とする(+)−グランディソル合成中
間体の製造法。
1. A step of adding an organic thiol to the 4-position of levoglucosenone represented by the formula [1] to obtain a compound represented by the formula [2] (in the formula, R 1 represents an alkyl or aryl group) ( a) and [Chemical 2] The compound represented by the above formula [2] forms a double bond extending to the 3rd and 4th positions to form the formula [3] (in the formula, R 1 is alkyl,
Or (representing an aryl group) to obtain a compound (b), A step (c) in which an organic thio group of the compound represented by the above formula [3] is substituted with a methyl group to obtain a compound represented by the formula [4]; A step (d) of stereoselectively conjugate-adding a vinyl group to the 4-position of the compound represented by the above formula [4] to obtain a compound represented by the formula [5]; A step (e) of reducing the carbonyl group of the compound represented by the above formula [5] to obtain a compound represented by the formula [6]; A step (f) of protecting the compound at the 2-position of the compound represented by the above formula [6] to obtain a compound represented by the formula [7] (in the formula, R 2 represents a protective group for the hydroxyl group); 7] Step (g) of hydroborating the double bond of the compound of the above formula [7] to obtain the compound of the formula [8]
And, Converting the hydroxyl group of the compound represented by the above formula [8] into a leaving group to obtain a compound represented by the formula [9] (in the formula, X represents a leaving group); ] Deprotecting the hydroxyl group of the compound represented by the above formula [9] to obtain a compound represented by the formula [10] (wherein X represents a leaving group); A step (j) of oxidizing the hydroxyl group of the compound represented by the above formula [10] to obtain a compound represented by the formula [11] (in the formula, X represents a leaving group); A step (k) of treating the compound represented by the above formula [11] with a base to obtain a compound represented by the formula [12]; A step (l) in which a compound represented by the above formula [12] is subjected to a Bayer-Villiger reaction to obtain a compound represented by the formula [13]; A step (m) of protecting the hydroxyl group of the compound represented by the above formula [13] to obtain a compound represented by the formula [14] (in the formula, R 3 represents a protective group for the hydroxyl group); A step (n) in which the compound represented by the above formula [14] is methylated to obtain a compound represented by the formula [15] (in the formula, R 3 represents a hydroxyl-protecting group); A step (o) of removing the hydroxyl group of the compound represented by the above formula [15] to obtain a compound represented by the formula [16] (in the formula, R 3 represents a protective group for the hydroxyl group); Deprotecting the hydroxyl group of the compound represented by the above formula [16] to obtain an intermediate compound for synthesizing grandisol represented by the formula [17] (p); The manufacturing method of the (+)-grandisol synthetic intermediate characterized by including.
JP4080002A 1992-04-01 1992-04-01 Production of intermediate for synthesis of @(3754/24)+)-grandisol Withdrawn JPH05279281A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4080002A JPH05279281A (en) 1992-04-01 1992-04-01 Production of intermediate for synthesis of @(3754/24)+)-grandisol

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4080002A JPH05279281A (en) 1992-04-01 1992-04-01 Production of intermediate for synthesis of @(3754/24)+)-grandisol

Publications (1)

Publication Number Publication Date
JPH05279281A true JPH05279281A (en) 1993-10-26

Family

ID=13706126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4080002A Withdrawn JPH05279281A (en) 1992-04-01 1992-04-01 Production of intermediate for synthesis of @(3754/24)+)-grandisol

Country Status (1)

Country Link
JP (1) JPH05279281A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11384094B2 (en) * 2017-09-26 2022-07-12 Ben Greatrex Chiral auxiliaries and uses thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11384094B2 (en) * 2017-09-26 2022-07-12 Ben Greatrex Chiral auxiliaries and uses thereof

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