JPH05255889A - Electrolytic treatment of cold rolled steel strip - Google Patents
Electrolytic treatment of cold rolled steel stripInfo
- Publication number
- JPH05255889A JPH05255889A JP5363392A JP5363392A JPH05255889A JP H05255889 A JPH05255889 A JP H05255889A JP 5363392 A JP5363392 A JP 5363392A JP 5363392 A JP5363392 A JP 5363392A JP H05255889 A JPH05255889 A JP H05255889A
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- Prior art keywords
- potential
- steel strip
- compound
- electrolytic treatment
- aqueous solution
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Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、冷間圧延後の鋼帯の
電解処理、とくに冷延鋼帯の表面にSi化合物を適正量電
着する方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrolytic treatment of a steel strip after cold rolling, and more particularly to a method for electrodepositing an appropriate amount of a Si compound on the surface of a cold rolled steel strip.
【0002】[0002]
【従来の技術】冷間圧延後にコイルとして巻き取った鋼
帯は、通常、圧延油等の汚れが付着している。このよう
な汚れのある鋼帯をそのまま焼鈍すると、焼鈍時の加熱
により、それら付着物が鋼板表面に焼付いたり、鋼板面
同士が焼付きを起こすため、次工程で巻戻すときに疵と
なり、鋼板表面の外観を損ね、さらに欠陥となって製品
価値を著しく低下することもある。これらの問題に対し
ては、箱焼鈍前にけい酸塩を主成分とする水溶液中での
電解処理を行うことによって、鋼帯表面を清浄にすると
ともに、その表面にSi化合物を電着して焼付きを防止す
る手法が有効であることが知られている。2. Description of the Related Art A steel strip wound as a coil after cold rolling is usually contaminated with rolling oil or the like. If such a soiled steel strip is annealed as it is, these deposits will seize on the surface of the steel sheet due to heating during annealing, or the steel sheet surfaces will seize, resulting in flaws when rewinding in the next step, and The appearance of the surface may be impaired, and defects may be further generated, which significantly reduces the product value. To solve these problems, the surface of the steel strip was cleaned by performing electrolytic treatment in an aqueous solution containing silicate as a main component before box annealing, and at the same time, a Si compound was electrodeposited on the surface. It is known that a technique for preventing image sticking is effective.
【0003】しかし、この焼付き防止方法においては、
鋼帯表面へ電着したSi化合物が多くなり過ぎると、焼鈍
時に乳白色のテンパーカラーを生じ、一方Si化合物の電
着量が少な過ぎると焼付き防止効果は期待できない。し
たがって、焼付き並びにテンパーカラー両者の発生を同
時に防止するには、Si化合物電着量を所定の適正範囲に
制御することが必要である。However, in this method for preventing seizure,
If too much Si compound is electrodeposited on the surface of the steel strip, a milky white temper color is produced during annealing, while if the amount of electrodeposited Si compound is too small, the effect of preventing seizure cannot be expected. Therefore, in order to prevent both the seizure and the temper color from occurring at the same time, it is necessary to control the electrodeposition amount of the Si compound within a predetermined appropriate range.
【0004】Si化合物の電着量を制御する方法として、
特公昭62−21078 号公報に示される、鋼帯の極性を切り
替える方法、特開昭62−235500号公報に示される、電流
量や通板速度を変化する方法が提案されている。しか
し、Si化合物電着量の適正範囲は狭いため、これらの方
法をもってしても、安定して適正量のSi化合物を電着さ
せることは難しい。As a method of controlling the electrodeposition amount of Si compound,
Japanese Patent Publication No. 62-21078 proposes a method for switching the polarity of a steel strip, and Japanese Patent Application Laid-Open No. 62-235500 proposes a method for varying the amount of current or the strip running speed. However, since the appropriate range of the electrodeposition amount of the Si compound is narrow, it is difficult to stably electrodeposit the appropriate amount of the Si compound even by these methods.
【0005】とくに適正量のSi化合物を安定して電着す
る必要性が高い例として、方向性けい素鋼板の絶縁被膜
を挙げることができる。すなわち方向性けい素鋼板は表
面に絶縁性被膜を有しているが、この被膜を形成するた
めには一般に次のような方法が採用されている。まず、
冷間圧延によって所定の最終厚みとしたけい素鋼帯に、
700 〜900 ℃の温度範囲の水素雰囲気中で、連続脱炭焼
鈍を施すと同時に、鋼帯表面に主としてSiO2から成るサ
ブスケールを形成させる。次に、この酸化膜上にMgO を
主成分とする焼鈍分離剤を塗布して、乾燥後、鋼帯をコ
イル上に巻取り水素中で再び1100〜1250℃の温度範囲内
で高温の仕上焼鈍を行う。このときMgOおよびSiO2とを
反応させてフォルステライト被膜を鋼板表面に生成させ
る。As an example in which it is particularly necessary to stably electrodeposit a proper amount of Si compound, an insulating coating of grain-oriented silicon steel sheet can be cited. That is, the grain-oriented silicon steel sheet has an insulating coating on the surface, and the following method is generally employed to form this coating. First,
To a silicon steel strip with a predetermined final thickness by cold rolling,
Continuous decarburization annealing is performed in a hydrogen atmosphere in the temperature range of 700 to 900 ° C, and at the same time, a subscale mainly composed of SiO 2 is formed on the surface of the steel strip. Next, apply an annealing separator containing MgO as a main component on the oxide film, dry it, wind the steel strip on a coil, and anneal it again at a high temperature within a temperature range of 1100 to 1250 ° C in hydrogen. I do. At this time, MgO and SiO 2 are reacted with each other to form a forsterite coating on the surface of the steel sheet.
【0006】ここで、脱炭焼鈍前にSi、OおよびHから
成る化合物をSi重量で鋼板片面1m2あたり0.5 〜7.0mg
付着させると、均一で良好なフォルステライト被膜が得
られることが知られている(特公昭58−46547 号公報参
照) 。そして、このSi化合物を付着せしめる方法とし
て、けい酸塩を主成分とする水溶液中での電解処理が行
われているが、電解処理工程でのSi化合物の電着量の制
御は難しく、従来はこれが少ないことによるフォルステ
ライト被膜の不良が発生することが多かったのである。Here, before decarburization annealing, a compound of Si, O and H is added in an amount of 0.5 to 7.0 mg by weight of Si per 1 m 2 of one side of the steel sheet.
It is known that a uniform and good forsterite coating can be obtained by making it adhere (see Japanese Patent Publication No. 58-46547). And, as a method of attaching this Si compound, electrolytic treatment in an aqueous solution containing silicate as a main component is performed, but it is difficult to control the electrodeposition amount of the Si compound in the electrolytic treatment step, and conventionally Due to the small amount of this, defects in the forsterite coating often occurred.
【0007】[0007]
【発明が解決しようとする課題】この発明の目的は、従
来は困難であった、電解処理工程におけるSi化合物付着
量の制御を、有利に実現し得る方法について提案するこ
とにある。SUMMARY OF THE INVENTION An object of the present invention is to propose a method capable of advantageously realizing the control of the amount of Si compound deposition in the electrolytic treatment step, which was difficult in the past.
【0008】[0008]
【課題を解決するための手段】発明者らは、Si化合物の
電着量に及ぼす電解処理における電解条件の影響につい
て種々検討した。その結果、電解電位を制御することに
よりSi化合物の電着量を広い範囲で制御できることを知
見し、この発明を完成するに至った。[Means for Solving the Problems] The inventors have conducted various studies on the influence of electrolysis conditions in electrolysis on the electrodeposition amount of Si compounds. As a result, they have found that the electrodeposition amount of the Si compound can be controlled in a wide range by controlling the electrolytic potential, and completed the present invention.
【0009】すなわちこの発明は、冷間圧延を経た鋼帯
に、けい酸塩を主成分とする水溶液中にて電解処理を施
すに当たり、該鋼帯の水溶液に対する電位が、水素発生
の起こる電位より高く、かつけい酸塩の還元反応が起こ
る電位より低い範囲で電解を行うことを特徴とする、冷
延鋼帯の電解処理方法である。That is, according to the present invention, when a steel strip subjected to cold rolling is subjected to electrolytic treatment in an aqueous solution containing silicate as a main component, the potential of the steel strip with respect to the aqueous solution is higher than the potential at which hydrogen generation occurs. It is an electrolytic treatment method for a cold-rolled steel strip, which is characterized in that electrolysis is performed at a high temperature and lower than a potential at which a reduction reaction of caustic acid salt occurs.
【0010】[0010]
【作用】次にこの発明の基礎となった実験結果を説明す
る。冷延鋼板に、オルトけい酸ナトリウム水溶液中で電
解処理を、電解電位を−0.6 〜−2.0 V に変化して施し
たのち、鋼板表面の赤外吸収スペクトル分析を行った。
図1に、電解処理後の鋼板表面の反射赤外吸収スペクト
ルの一例を示すように、1040cm-1付近の吸収が、電着し
たSi化合物に対応するものである。Next, the experimental results which are the basis of the present invention will be described. The cold-rolled steel sheet was subjected to electrolytic treatment in an aqueous solution of sodium orthosilicate while changing the electrolytic potential to -0.6 to -2.0 V, and then infrared absorption spectrum analysis of the steel sheet surface was performed.
As shown in FIG. 1 as an example of the reflection infrared absorption spectrum of the surface of the steel sheet after electrolytic treatment, the absorption around 1040 cm −1 corresponds to the electrodeposited Si compound.
【0011】そこで、赤外吸収スペクトルの1040cm-1付
近の吸収における吸光度および電流密度と電解電位との
関係を、図2に示す。なお電解電位は飽和カロメル電極
に対する値である。図2から、電解電位が−0.9Vを越え
るとSi化合物の電着が起こらず、電解電位が−0.9 〜−
1.2 V の範囲まで低下すると吸光度は著しく増加し、さ
らに電解電位が−1.3 V 以下になると、水の電気分解が
起こり始めて電流密度が増大し、水素ガスが発生して吸
光度は減少することがわかる。同図においては、水素発
生が起こる電位域では、電解電位と吸光度の間に明確な
相関は見られず、Si化合物の電着量を制御することが難
しいことが判明した。したがって、Si化合物の電着量を
制御するためには、水素発生が起こる電位域で電解を行
うよりも、−1.3 V 以上の電位域、すなわち水素発生の
起こる電位より高く、かつけい酸塩の還元反応が起こる
電位より低い電位域で、電解処理を行うことが有利とな
る。Therefore, FIG. 2 shows the relationship between the absorbance and the current density at the absorption around 1040 cm -1 in the infrared absorption spectrum and the electrolytic potential. The electrolytic potential is a value for a saturated calomel electrode. From FIG. 2, when the electrolysis potential exceeds -0.9V, the electrodeposition of the Si compound does not occur, and the electrolysis potential is -0.9 to-.
It can be seen that the absorbance increases remarkably when it decreases to the range of 1.2 V, and when the electrolysis potential becomes −1.3 V or less, electrolysis of water begins to occur, the current density increases, hydrogen gas is generated, and the absorbance decreases. .. In the figure, no clear correlation was found between the electrolytic potential and the absorbance in the potential region where hydrogen generation occurred, and it was found that it was difficult to control the electrodeposition amount of the Si compound. Therefore, in order to control the electrodeposition amount of the Si compound, it is higher than the potential range of −1.3 V, that is, higher than the potential of hydrogen generation, rather than electrolysis in the potential range of hydrogen generation. It is advantageous to carry out the electrolytic treatment in a potential region lower than the potential at which the reduction reaction occurs.
【0012】また、この電位域での電解処理は、電着に
必要な電流密度も低くてよく、しかも電着量の増大が見
込めることもわかる。It can also be seen that the electrolytic treatment in this potential region requires a low current density required for electrodeposition, and that the amount of electrodeposition can be expected to increase.
【0013】以下、この発明の各限定理由について述べ
る。この発明に従う、Si化合物を電着するための電解処
理は、まずけい酸塩を主成分とする水溶液中で行う。こ
の水溶液を用いることによって、Si化合物の付着と鋼板
表面の脱脂とを行うことが可能である。ここでけい酸塩
としては、オルトけい酸ナトリウム、メタけい酸ナトリ
ウム、二けい酸ナトリウム、ピロけい酸ナトリウム、水
ガラスなどが有利に適合する。また水溶液の濃度は特に
限定しないが、脱脂およびSiが目的量付着できる条件を
選べばよい。The reasons for limitation of the present invention will be described below. The electrolytic treatment for electrodepositing the Si compound according to the present invention is first performed in an aqueous solution containing silicate as a main component. By using this aqueous solution, it is possible to attach the Si compound and degrease the surface of the steel sheet. Here, as the silicate, sodium orthosilicate, sodium metasilicate, sodium disilicate, sodium pyrosilicate, water glass, etc. are advantageously suitable. Although the concentration of the aqueous solution is not particularly limited, it is sufficient to select the conditions under which degreasing and Si can adhere to a desired amount.
【0014】そして、電解電位は、上記のように、水素
発生が起こる電位より高くかつけい酸塩の還元反応が起
こり始める電位より低い電位域で行う。すなわち水素発
生が生じる電位域では、Si化合物の電着量を制御するこ
とが難しく、一方電解電位の上限は、Si化合物を電着さ
せるために、けい酸塩の還元反応が起こり始める電位と
した。As described above, the electrolysis potential is higher than the potential at which hydrogen is generated and lower than the potential at which the reduction reaction of oxalate starts to occur. That is, in the potential region where hydrogen generation occurs, it is difficult to control the electrodeposition amount of the Si compound, while the upper limit of the electrolysis potential is the potential at which the reduction reaction of the silicate starts in order to electrodeposit the Si compound. ..
【0015】実際には、上記水溶液中で脱脂処理をした
のち、複数電極を使用する場合は最終電極での電位を上
記の範囲とする電解処理を行って、Si化合物を電着す
る。すなわち、図3に示すように、鋼帯Sの入側の電極
1,2では水の電気分解が起こる電位で電解を施し、発
生した気泡によって脱脂処理を行う。次いで、電極3,
4では必要なSi化合物の電着量および通板速度に応じ
て、水素発生電位より高くかつけい酸塩の還元反応が生
じる電位より低い電位域における、任意の電解電位で電
解処理を行い、Si化合物を電着する。なお図中、5およ
び6は電源である。図3に示すような装置を用いれば、
鋼帯表面の脱脂とSi化合物の電着量制御を兼ね備えた電
解処理が可能である。In practice, after degreasing treatment in the above-mentioned aqueous solution, when using a plurality of electrodes, electrolytic treatment is carried out so that the potential at the final electrode falls within the above range, and the Si compound is electrodeposited. That is, as shown in FIG. 3, the electrodes 1 and 2 on the inlet side of the steel strip S are electrolyzed at a potential at which water is electrolyzed, and defoaming treatment is performed by the generated bubbles. Then the electrodes 3,
In No. 4, according to the required amount of electrodeposited Si compound and plate passing speed, electrolytic treatment was performed at an arbitrary electrolysis potential in a potential range higher than the hydrogen generation potential and lower than the potential at which the reduction reaction of the oxalic acid salt occurred. The compound is electrodeposited. In the figure, 5 and 6 are power supplies. With the device shown in FIG. 3,
It is possible to perform electrolytic treatment that combines degreasing of the steel strip surface and control of the electrodeposition amount of Si compound.
【0016】複数の電極を用いて電解処理する場合には
Si化合物を電着させるために、少なくとも最終電極での
電位をけい酸塩の還元反応が起こりはじめる電位と水素
発生の起こりはじめる電位との間の電位に保てばよく、
他の電極は、例えば水素発生する電位とすることにより
発生した気泡による脱脂効果が期待できる。When electrolytic treatment is performed using a plurality of electrodes,
In order to electrodeposit the Si compound, at least the potential at the final electrode may be kept at a potential between the potential at which the silicate reduction reaction begins and the potential at which hydrogen generation begins,
The other electrodes can be expected to have a degreasing effect due to bubbles generated by setting the potential to generate hydrogen, for example.
【0017】[0017]
実施例1 0.23mm厚に冷間圧延された方向性けい素鋼板を、オルト
けい酸ナトリウムを主成分とする水溶液中で2、5およ
び10秒間電解処理した。このとき、鋼板の水溶液に対す
る電位を飽和カロメル電極基準で、−0.9 V から−1.2
V まで変化したときのSi化合物の電着量を調査した。Example 1 A 0.23 mm thick grain-oriented silicon steel sheet was electrolyzed for 2, 5 and 10 seconds in an aqueous solution containing sodium orthosilicate as a main component. At this time, the electric potential of the steel sheet with respect to the aqueous solution is from -0.9 V to -1.2 V on the saturated calomel electrode basis.
The amount of electrodeposited Si compounds when changing to V was investigated.
【0018】その結果を図4に示すように、−0.9 V 〜
−1.2 V の範囲では、時間が増加するとともに、また電
位が低くなるとともにSi化合物の電着量が増加してい
る。すなわち、電位と時間を適当に選ぶことにより、Si
化合物の電着量を容易に制御できることがわかる。The result is shown in FIG.
In the range of −1.2 V, as time increased and the potential decreased, the amount of electrodeposited Si compounds increased. That is, by appropriately selecting the potential and time, Si
It is understood that the electrodeposition amount of the compound can be easily controlled.
【0019】またSi化合物電着量は、気泡を発生させて
行う、従来の電解処理での電着量よりも多いため、従来
よりも短い時間で必要量のSi化合物を電着させることが
可能であり、工業的に非常に有利である。Further, since the amount of electrodeposited Si compound is larger than that in the conventional electrolytic treatment in which bubbles are generated, the required amount of Si compound can be electrodeposited in a shorter time than in the conventional case. And is industrially very advantageous.
【0020】比較例1 実施例1と同一の方向性けい素鋼板を、オルトけい酸ナ
トリウムを主成分とする水溶液中で2、5および10秒間
電解処理した。このとき、鋼板の水溶液に対する電位を
飽和カロメル電極基準で、−1.3 V から−2.0 V まで変
えた。この電位域は鋼板表面から水素が発生する、従来
の電解処理条件に相当する。Comparative Example 1 The same grain-oriented silicon steel sheet as in Example 1 was electrolyzed for 2, 5 and 10 seconds in an aqueous solution containing sodium orthosilicate as a main component. At this time, the potential of the steel sheet with respect to the aqueous solution was changed from -1.3 V to -2.0 V based on the saturated calomel electrode. This potential region corresponds to the conventional electrolytic treatment condition where hydrogen is generated from the surface of the steel sheet.
【0021】その結果を図5に示すように、時間および
電位とSi化合物電着量との間には明確な相関が見られな
い。したがって、気泡を発生させて行う、従来の電解処
理では、Si化合物の電着量を制御することが非常に難し
くかつ電着量も少ない。As shown in the results of FIG. 5, there is no clear correlation between time and potential and the amount of Si compound electrodeposited. Therefore, in the conventional electrolytic treatment in which bubbles are generated, it is very difficult to control the electrodeposition amount of the Si compound, and the electrodeposition amount is small.
【0022】実施例2 0.30mmに冷間圧延された方向性けい素鋼板を、90℃の3
%オルトけい酸ナトリウム水溶液中で2秒間電解処理し
た後、脱炭焼鈍を施し、MgO を主体とする焼鈍分離剤を
塗布し、次いで高温仕上焼鈍することにより、フォルス
テライト被膜を形成させた。Example 2 A grain-oriented silicon steel sheet cold-rolled to 0.30 mm was subjected to 3 ° C. at 90 ° C.
% Electrolytic solution in sodium orthosilicate aqueous solution, followed by decarburizing annealing, applying an annealing separator mainly composed of MgO, and then performing high temperature finish annealing to form a forsterite coating.
【0023】このとき、水溶液に対する鋼板の電位を飽
和カロメル電極基準で、−1.0 V 、−1.1 V および−1.
2 V として、それぞれのフォルステライト被膜の外観均
一性、フォルステライトの密着性および鉄損について評
価した結果を、表1に示す。At this time, the potential of the steel sheet with respect to the aqueous solution was -1.0 V, -1.1 V and -1.
Table 1 shows the results of evaluating the appearance uniformity of each forsterite coating, the adhesion of forsterite, and the iron loss at 2 V.
【0024】比較例2 実施例2と同じ方向性けい素鋼板を、90℃の3%オルト
けい酸ナトリウム水溶液中で2秒間電解処理した後、脱
炭焼鈍を施し、MgO を主体とする焼鈍分離剤を塗布し、
高温仕上焼鈍することにより、フォルステライト被膜を
形成させた。Comparative Example 2 The same grain-oriented silicon steel sheet as in Example 2 was electrolytically treated in a 3% sodium orthosilicate aqueous solution at 90 ° C. for 2 seconds, then decarburized and annealed and separated mainly from MgO. Apply the agent,
A forsterite coating was formed by high temperature finish annealing.
【0025】このとき、水溶液に対する鋼板の電位を飽
和カロメル電極基準で、−1.5 V および−1.7 V とし
て、それぞれのフォルステライト被膜の外観均一性、フ
ォルステライトの密着性および鉄損について評価した結
果を、表1に併記する。At this time, the potential of the steel sheet with respect to the aqueous solution was set to -1.5 V and -1.7 V on the basis of saturated calomel electrode, and the results of evaluating the appearance uniformity of each forsterite coating, the adhesion of forsterite and the iron loss were shown. , Table 1 together.
【0026】[0026]
【表1】 [Table 1]
【0027】表1によると、実施例では被膜外観および
密着性ともに良好であり、鉄損も少ないことがわかる。
一方比較例では、被膜外観にむらが多く、密着性も実施
例に比べて劣っている。From Table 1, it can be seen that in the examples, the coating appearance and adhesion are good, and the iron loss is small.
On the other hand, in the comparative example, the outer appearance of the coating film has many irregularities, and the adhesiveness is inferior to the examples.
【0028】実施例3 オルトけい酸ナトリウムを主成分とする水溶液中で、普
通鋼の冷延鋼板を0.5、1、2および5秒間電解処理し
た。このとき鋼板の水溶液に対する電位を、飽和カロメ
ル電極基準で−1.2 V とした。電解処理後、箱焼鈍を行
ったときの焼付の発生状況を表2に示す。Example 3 A cold rolled steel plate of ordinary steel was electrolyzed for 0.5, 1, 2 and 5 seconds in an aqueous solution containing sodium orthosilicate as a main component. At this time, the potential of the steel sheet with respect to the aqueous solution was set to -1.2 V based on the saturated calomel electrode. Table 2 shows the occurrence of seizure when box annealing was performed after the electrolytic treatment.
【0029】比較例3 実施例3と同じ水溶液中で、普通鋼の冷延鋼板を0.5 、
1、2および5秒間電解処理した。このとき鋼板の水溶
液に対する電位を、飽和カロメル電極基準で−1.5 V と
した。電位域では鋼板表面から水素が発生するため、従
来の脱脂を兼ねた電解処理条件に相当する。電解処理
後、箱焼鈍を行ったときの焼付きの発生状況を、表2に
併記する。Comparative Example 3 In the same aqueous solution as in Example 3, 0.5% of cold rolled steel of ordinary steel was used,
It was electrolyzed for 1, 2 and 5 seconds. At this time, the potential of the steel sheet with respect to the aqueous solution was set to -1.5 V based on the saturated calomel electrode. Since hydrogen is generated from the surface of the steel sheet in the potential region, it corresponds to the conventional electrolytic treatment condition that also serves as degreasing. Table 2 shows the occurrence of seizure when box annealing was performed after the electrolytic treatment.
【0030】[0030]
【表2】 [Table 2]
【0031】表2によれば、実施例では0.5 秒以上の電
解処理で焼付防止効果が見られる。比較例では、焼付を
防止するためには、5秒以上の電解が必要である。した
がってこの発明によれば、電解処理ラインの高速化が可
能である。According to Table 2, in the examples, the seizure prevention effect can be seen by the electrolytic treatment for 0.5 seconds or more. In the comparative example, electrolysis for 5 seconds or more is required to prevent seizure. Therefore, according to the present invention, the speed of the electrolytic treatment line can be increased.
【0032】[0032]
【発明の効果】この発明によれば、Si化合物の電着量を
広い範囲で制御すること、および従来の電解処理よりも
多くのSi化合物を電着させることが可能であり、ライン
の高速化、Si化合物の電着量の増加を実現し得る。ま
た、Si化合物の電着に要する電流密度が小さいため、消
費電力を著しく低減させることも可能である。さらにSi
化合物の均一な付着が可能であり、鋼帯の箱焼鈍時の焼
付を防止できる。According to the present invention, it is possible to control the electrodeposition amount of Si compounds in a wide range and to electrodeposit more Si compounds than in the conventional electrolytic treatment. It is possible to increase the electrodeposition amount of Si compounds. Moreover, since the current density required for electrodeposition of the Si compound is small, it is possible to significantly reduce power consumption. Furthermore Si
The compound can be evenly attached, and seizure during steel box box annealing can be prevented.
【0033】とくに、この発明の方法で電着させたSi化
合物から形成される、方向性けい素鋼板のフォルステラ
イト被膜は、外観、密着性および鉄損がともに、従来方
法による被膜よりも優れている。In particular, the forsterite coating of grain-oriented silicon steel sheet formed from the Si compound electrodeposited by the method of the present invention is superior in appearance, adhesion and iron loss to the coating by the conventional method. There is.
【図1】電着Si化合物の赤外吸収スペクトルを示すグラ
フである。FIG. 1 is a graph showing an infrared absorption spectrum of an electrodeposited Si compound.
【図2】Si化合物の赤外吸収の吸光度および電流密度の
電解電位依存性を示すグラフである。FIG. 2 is a graph showing the absorbance of infrared absorption of Si compounds and the dependence of the current density on the electrolytic potential.
【図3】この発明を実施する場合の1例を示す模式図で
ある。FIG. 3 is a schematic diagram showing an example of implementing the present invention.
【図4】電解電位とSi化合物の電着量との関係を示すグ
ラフである。FIG. 4 is a graph showing a relationship between an electrolytic potential and an electrodeposition amount of a Si compound.
【図5】電解電位とSi化合物の電着量の関係を示すグラ
フである。FIG. 5 is a graph showing the relationship between the electrolytic potential and the electrodeposition amount of Si compound.
1 電極 2 電極 3 電極 4 電極 5 電源 6 電源 1 electrode 2 electrode 3 electrode 4 electrode 5 power supply 6 power supply
Claims (1)
分とする水溶液中にて電解処理を施すに当たり、該鋼帯
の水溶液に対する電位が、水素発生の起こる電位より高
く、かつけい酸塩の還元反応が起こる電位より低い範囲
で電解を行うことを特徴とする、冷延鋼帯の電解処理方
法。1. When subjecting a steel strip that has been cold-rolled to electrolytic treatment in an aqueous solution containing silicate as a main component, the potential of the steel strip with respect to the aqueous solution is higher than the potential at which hydrogen is generated, and A method for electrolytically treating a cold-rolled steel strip, which comprises performing electrolysis in a range lower than a potential at which a reduction reaction of silicate occurs.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5363392A JPH05255889A (en) | 1992-03-12 | 1992-03-12 | Electrolytic treatment of cold rolled steel strip |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5363392A JPH05255889A (en) | 1992-03-12 | 1992-03-12 | Electrolytic treatment of cold rolled steel strip |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05255889A true JPH05255889A (en) | 1993-10-05 |
Family
ID=12948311
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5363392A Pending JPH05255889A (en) | 1992-03-12 | 1992-03-12 | Electrolytic treatment of cold rolled steel strip |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05255889A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998033960A1 (en) * | 1997-01-31 | 1998-08-06 | Elisha Technologies Co. L.L.C. | An electrolytic process for forming a mineral containing coating |
US6153080A (en) * | 1997-01-31 | 2000-11-28 | Elisha Technologies Co Llc | Electrolytic process for forming a mineral |
-
1992
- 1992-03-12 JP JP5363392A patent/JPH05255889A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998033960A1 (en) * | 1997-01-31 | 1998-08-06 | Elisha Technologies Co. L.L.C. | An electrolytic process for forming a mineral containing coating |
US6149794A (en) * | 1997-01-31 | 2000-11-21 | Elisha Technologies Co Llc | Method for cathodically treating an electrically conductive zinc surface |
US6153080A (en) * | 1997-01-31 | 2000-11-28 | Elisha Technologies Co Llc | Electrolytic process for forming a mineral |
US6258243B1 (en) | 1997-01-31 | 2001-07-10 | Elisha Technologies Co Llc | Cathodic process for treating an electrically conductive surface |
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