JPH05253797A - Judging system for abnormality on line - Google Patents

Judging system for abnormality on line

Info

Publication number
JPH05253797A
JPH05253797A JP5222792A JP5222792A JPH05253797A JP H05253797 A JPH05253797 A JP H05253797A JP 5222792 A JP5222792 A JP 5222792A JP 5222792 A JP5222792 A JP 5222792A JP H05253797 A JPH05253797 A JP H05253797A
Authority
JP
Japan
Prior art keywords
value
equipment
product
machining
predicted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5222792A
Other languages
Japanese (ja)
Inventor
Tsutomu Sakamoto
勉 坂本
Sadao Shimosha
貞夫 下社
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5222792A priority Critical patent/JPH05253797A/en
Publication of JPH05253797A publication Critical patent/JPH05253797A/en
Pending legal-status Critical Current

Links

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/30Computing systems specially adapted for manufacturing

Abstract

PURPOSE:To immediately judge abnormality of equipment concerning manufacture of a thin film product by three algorism, namely, by comparing the specification value with the working value of a product, by computing the estimated working value from the setting values of respective equipments parameters and comparing it with the working measured value, or by judging the working value to repeat increase and decrease over a certain number of times. CONSTITUTION:This line abnormality judging system is constituted of a computer for judgement 1, a past recorded data base 6 for equipments parameters, and a size measured value data base 7, an estimated working value computing formula is prepared, an estimated working value is computed from the setting value of equipments by the use of the formula, and if there is difference over a certain quantity at comparing the estimated value with the working measured value of the product, abnormality of the equipments is judged.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ラインの異常判定方式
に係り、特に半導体設備などの薄膜製品製造に於ける製
造設備の異常を、(1)規格値と加工値の差、(2)予
測値と加工値の差、(3)加工値の傾向、の3つのアル
ゴリズムを用いてラインの異常をリアルタイムに監視し
て、設備異常の早期発見、または異常を事前に予測して
不良発生を低減する技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a line abnormality judging method, and in particular, an abnormality of a manufacturing facility in manufacturing a thin film product such as a semiconductor facility is determined by (1) a difference between a standard value and a processed value, (2) Using three algorithms, the difference between the predicted value and the processed value, and (3) the tendency of the processed value, line abnormalities are monitored in real time to detect equipment abnormalities at an early stage or predict abnormalities in advance to detect defects. The present invention relates to a technique for reducing the amount.

【0002】[0002]

【従来の技術】製造設備の異常や故障に関する量を測定
し、それらの値から異常,故障などの指標となる量を得
てこれにより設備の状態を判定する方式があり、”計測
と制御”Vol.25,No.10(昭和61年10月)の3ページ
から10ページの「設備診断技術の現状と将来」に於て
佐田登志夫、高田祥三らにより論じられている。
2. Description of the Related Art There is a method of measuring the quantity related to abnormality or failure of manufacturing equipment, obtaining the quantity as an index of abnormality or failure from those values, and judging the state of equipment by this, "measurement and control" Vol.25, No.10 (October 1986), pages 3-10, "Current Status and Future of Equipment Diagnosis Technology," discusses by Toshio Sada and Shozo Takada.

【0003】この方式による場合、個々の設備の異常,
故障と明確に関連づけられる設備の値を事前に知る必要
がある。さらに、その設備の値を検知する手段として設
備の動作には直接関係ないセンサなどを取り付ける必要
がある。しかしながら半導体製品など微細加工を行う製
造設備ではそれらのセンサ自体が設備の正常な動作を妨
げ、不良を発生させる原因となる恐れがある。
In the case of this method, an abnormality of individual equipment,
It is necessary to know in advance the value of equipment that is clearly associated with a failure. Furthermore, it is necessary to attach a sensor or the like that is not directly related to the operation of the equipment as a means for detecting the value of the equipment. However, in a manufacturing facility that performs fine processing such as semiconductor products, the sensors themselves may interfere with the normal operation of the facility and cause defects.

【0004】[0004]

【発明が解決しようとする課題】半導体製品は年々微細
化が進み、それに伴い製造設備の精度自体に余裕がなく
なってきている。つまり加工寸法が1ミクロン(0.0
01mm)以下の半導体製品製造においては、設備のパ
ラメータが僅かに設定値からずれただけで製品は加工値
が規格を満たせず不良となってしまうことがしばしばあ
る。そのため上記の従来技術では半導体設備の異常の検
出は難しく、設備のわずかな異常を検出することができ
ない。そのため、この方式で異常が検出されたときには
既にかなりの故障が発生しており、その結果、大量不良
が発生してしまい、損害が多大となってしまう。またそ
の修理のために長時間に渡り設備を停止させねばなら
ず、生産を大きく阻害していた。
The miniaturization of semiconductor products has been advancing year by year, and as a result, the precision of manufacturing equipment itself has become insufficient. In other words, the processing size is 1 micron (0.0
In the manufacture of semiconductor products having a size of 01 mm or less, the processing values of the products often fail because the processing values do not meet the standard even if the equipment parameters slightly deviate from the set values. Therefore, it is difficult for the above-mentioned conventional technique to detect an abnormality in the semiconductor equipment, and it is impossible to detect a slight abnormality in the equipment. Therefore, when an abnormality is detected by this method, a considerable failure has already occurred, and as a result, a large number of defects occur and the damage becomes great. Moreover, the equipment had to be stopped for a long time for the repair, which greatly hindered the production.

【0005】本発明の目的は、このような微細加工を行
う設備の状態を監視するために、複数の異常判定方式を
組み合わせてライン及び設備の異常を迅速に検出し、不
良を低減することにある。
An object of the present invention is to detect abnormalities in a line and equipment quickly by combining a plurality of abnormality determination methods in order to monitor the state of equipment for performing such fine processing, and reduce defects. is there.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するた
め、製品ワークの規格値のデータベース、設備の設定値
を収集するデータベース及びその設定値のもとで加工さ
れた製品の加工実測値を収集するデータベースを有し、
それらのデータの解析を行い、設備の設定値から製品の
加工値を予測する予測アルゴリズムを算出する手段を設
ける。そして、(1)加工実測値が製品の規格値を越え
たと判定する手段、(2)設備の設定値を入力すると予
測アルゴリズムからその製品の予測加工値を算出し、そ
の後製品の加工実測値を測定してそれらのデータの比較
を行う手段、(3)加工値が一定回数続けて増加あるい
は減少したか判定する手段を設ける。
[Means for Solving the Problems] In order to achieve the above object, a database of standard values of product works, a database for collecting set values of equipment, and actual measured values of products processed under the set values are provided. Have a database to collect,
A means for analyzing those data and calculating a prediction algorithm for predicting the processed value of the product from the set value of the equipment is provided. Then, (1) a means for determining that the actually measured value exceeds the standard value of the product, (2) when the set value of the equipment is input, the predicted processed value of the product is calculated from the prediction algorithm, and then the actually measured value of the product is calculated. Means for measuring and comparing the data, and (3) means for determining whether the processed value has continuously increased or decreased a fixed number of times are provided.

【0007】[0007]

【作用】本発明は設備の異常に関する情報を取得するに
際し、製品の規格値を記憶し、また設備の各設定パラメ
ータの入力値を記憶して予め一定量のデータから求めら
れた複数種のパラメータと加工実測データから製品ワー
クの加工実測値の予測アルゴリズムを算出し、設備パラ
メータの設定値から該アルゴリズムを用いて該製品の予
測加工値を算出する。その後、製品の加工実測値と算出
された予測加工値を比較し、両者に一定量以上の差が発
生した場合に設備の異常を判定する。また加工実測値
が、規格値を越えた場合にも設備の異常を判定する。さ
らに加工実測値が一定回数続けて増加あるいは減少した
場合にも異常を判定する。
According to the present invention, when acquiring the information about the abnormality of the equipment, the standard value of the product is stored, and the input value of each setting parameter of the equipment is stored, and a plurality of types of parameters obtained from a fixed amount of data in advance are stored. A predicted algorithm for the actual measured value of the product work is calculated from the measured actual processing data, and the predicted processed value of the product is calculated using the algorithm from the set value of the equipment parameter. After that, the actual measurement value of the product is compared with the calculated predicted processing value, and if a difference of a certain amount or more occurs between the two, an abnormality of the equipment is determined. Also, if the actual measurement value exceeds the standard value, the equipment abnormality is determined. Further, the abnormality is determined even when the actual measurement value increases or decreases a certain number of times in a row.

【0008】[0008]

【実施例】以下、本発明の実施例について説明する。図
1に本発明の判定方式の一実施例の処理フローを示す。
本実施例では予測アルゴリズムの一例としていくつかの
パラメータから予測値を算出する重回帰分析などの統計
手法を取り上げ、その予測式について説明する。
EXAMPLES Examples of the present invention will be described below. FIG. 1 shows a processing flow of an embodiment of the determination method of the present invention.
In this embodiment, as an example of a prediction algorithm, a statistical method such as multiple regression analysis for calculating a prediction value from some parameters will be taken up and a prediction formula thereof will be described.

【0009】初めに測定データとして設備のいくつかの
パラメータの設定値を収集する。次いで各パラメータを
予測加工値算出式13に代入し、パラメータの設定値か
ら予測される製品の加工値を算出する。そして製品の加
工が終了するとすぐにその製品の加工実測値を測定し、
まずその実測値が製品の規格値を越えているかどうか判
定する。次に製品の実測値と前述の予測値を比較し、両
者の差が一定量以上であれば設定値どおりに加工されな
かったと判定し、設備の異常を警告する。このようにし
て加工が終了するとすぐに設備の異常を判定し、また規
格値内であっても予測値と実測値の差が一定量以上で異
常と判定するため、迅速に異常を検出でき、不良の作り
こみを防止できる。
First, set values of some parameters of the equipment are collected as measurement data. Next, each parameter is substituted into the predicted processing value calculation formula 13, and the processing value of the product predicted from the set value of the parameter is calculated. And as soon as the processing of the product is completed, the actual measurement value of the product is measured,
First, it is determined whether the measured value exceeds the standard value of the product. Next, the actual measurement value of the product is compared with the above-mentioned predicted value, and if the difference between the two is a certain amount or more, it is determined that the processing was not performed according to the set value, and the equipment is warned. In this way, as soon as the processing is completed, the equipment is judged to be abnormal, and even if it is within the standard value, the difference between the predicted value and the measured value is judged to be abnormal if it exceeds a certain amount, so it is possible to detect the abnormality quickly. It is possible to prevent the creation of defects.

【0010】図2に実施例として本方式を半導体製造設
備のホトレジ工程の設備に適用したときのハードウェア
構成を示す。本実施例のシステムは、異常判定を行う判
定用計算機1とホトレジ工程の露光設備8と該設備の設
定パラメータ値を収集する計算機2と現像設備9と該設
備の設定パラメータ値を収集する計算機3及び加工後の
製品の加工実測値を測定する検査設備11と該測定値を
収集する計算機12を備えており、これらは通信回線1
0を介して接続され、キーボード4を操作することによ
りその結果はCRT5に画面表示される。
FIG. 2 shows, as an embodiment, a hardware configuration when this system is applied to equipment for a photolithography process of semiconductor manufacturing equipment. The system of this embodiment comprises a judgment computer 1 for making an abnormality judgment, a photolithography process exposure equipment 8, a computer 2 for collecting setting parameter values of the equipment, a developing equipment 9 and a computer 3 for collecting setting parameter values of the equipment. Also, the inspection equipment 11 for measuring the actual measurement value of the processed product and the computer 12 for collecting the measurement value are provided.
0 is connected, and the result is displayed on the CRT 5 by operating the keyboard 4.

【0011】判定用計算機1は設備パラメータ実績デー
タベース6と寸法実測値データベース7を有し、キーボ
ード4より品名,ロット数,工程名,各設備パラメータ
実績値及び期間を入力することにより、該データベース
のデータ同士を解析して製品の予測寸法値を算出する式
13を作成する。図3に予測加工値算出式13の算出フ
ローを示す。このようにして設備異常を判定するための
基準となる予測加工値算出式13が作成される。
The judgment computer 1 has an equipment parameter actual result database 6 and a dimension actual measurement value database 7. By inputting a product name, the number of lots, a process name, each equipment parameter actual value and a period from the keyboard 4, the judgment computer 1 Formula 13 for calculating the predicted dimension value of the product by analyzing the data is created. FIG. 3 shows a calculation flow of the predicted processing value calculation formula 13. In this way, the predicted machining value calculation formula 13 serving as a reference for determining the equipment abnormality is created.

【0012】設備パラメータとしては例えば露光設備8
について説明すると、露光エネルギー(x1),露光時
間(x2),レジスト膜厚(x3),レジスト温度(x
4)などが挙げられる。また現像設備9については現像
時間(z1),レジスト膜厚(z2),レジスト温度
(z3)等がある。図4にこれらのパラメータから例え
ば重回帰分析などの統計手法を用いて算出される予測加
工値算出式13を示す。このような算出式を用いること
により、製品を設備に投入して設備パラメータを設定す
るとその値から予測される寸法値が算出されCRT5に
表示される。
As the equipment parameter, for example, the exposure equipment 8
The exposure energy (x1), exposure time (x2), resist film thickness (x3), resist temperature (x
4) etc. are mentioned. Further, regarding the developing equipment 9, there are a developing time (z1), a resist film thickness (z2), a resist temperature (z3) and the like. FIG. 4 shows a predicted processed value calculation formula 13 calculated from these parameters using a statistical method such as multiple regression analysis. By using such a calculation formula, when the product is put into the equipment and the equipment parameters are set, the dimension value predicted from the value is calculated and displayed on the CRT 5.

【0013】図5に設備パラメータ実績データベース6
のデータテーブル及び寸法実測値データベース7のデー
タテーブルを示す。これらのデータテーブルは判定用計
算機1のキーボード4を操作することによりCRT5上
に表示させることができる。
FIG. 5 shows the equipment parameter result database 6
2 shows a data table and a data table of the dimension measurement value database 7. These data tables can be displayed on the CRT 5 by operating the keyboard 4 of the judgment computer 1.

【0014】次に異常判定の方法について説明する。ま
ず、半導体ウェハを露光設備8に投入し、各設備パラメ
ータを設定する。設定された各パラメータは計算機2で
まず正しいかどうかチェックされ、正しければ通信回線
10を経由して判定用計算機1に送られる。そこで算出
式に各設定値は代入され、予測寸法値(L2)が算出さ
れてCRT5に表示される。その後、製品の加工が終了
すると、製品の実際の加工寸法(L1)が寸法検査設備
11により測定される。そして実測値(L1)はまずそ
れ自体が寸法の規格値内かどうか判定される。規格値外
であればこの時点で設備の異常を警告する。規格値内で
あれば、次に実測値(L1)と予測値(L2)を比較し
て両者の差が一定量以内であれば正常、そして一定量以
上になるとその設定値から予測される寸法値どおり加工
されなかったと判断し、設備になんらかのトラブルが発
生したと警告する。これを式で表すと、|L2−L1|
≧aならば異常と判定となる。(ただしaは一定量。) すなわち、この方法によれば加工された製品の実測値が
規格値内にあっても予測値と実測値に一定量以上の差が
あれば設備異常と判定するため、製品は良品でもそれを
加工した設備の異常を早期に発見することができ、迅速
に設備のメンテナンスをすることにより設備異常による
大量不良の発生を早期に防止することができる。
Next, a method of determining abnormality will be described. First, a semiconductor wafer is put into the exposure equipment 8 and each equipment parameter is set. The computer 2 first checks whether the set parameters are correct, and if they are correct, they are sent to the judgment computer 1 via the communication line 10. Therefore, each set value is substituted into the calculation formula, and the predicted dimension value (L2) is calculated and displayed on the CRT 5. After that, when the processing of the product is completed, the actual processing dimension (L1) of the product is measured by the dimension inspection equipment 11. Then, the measured value (L1) is first judged whether or not it is within the standard value of the dimension. If it is out of the standard value, a warning is given at this point that the equipment is abnormal. If it is within the standard value, then the measured value (L1) and the predicted value (L2) are compared, and if the difference between them is within a certain amount, it is normal, and if it exceeds a certain amount, the dimension predicted from the set value. It is judged that it was not processed according to the value and warns that some trouble has occurred in the equipment. If this is expressed by an equation, | L2-L1 |
If ≧ a, it is determined to be abnormal. (However, a is a fixed amount.) That is, according to this method, if there is a difference of a fixed amount or more between the predicted value and the measured value even if the measured value of the processed product is within the standard value, it is determined that the equipment is abnormal. Even if the product is a non-defective product, it is possible to detect abnormalities in the equipment that processed it at an early stage, and it is possible to prevent the occurrence of a large number of defects due to the abnormality in the equipment at an early stage by quickly performing maintenance on the equipment.

【0015】図6に寸法の測定結果のグラフを示す。横
軸は時間、縦軸は寸法加工値である。寸法規格値17に
対して加工実測値16をプロットし、該規格値17を越
えていれば異常と判定する。
FIG. 6 shows a graph of measurement results of dimensions. The horizontal axis represents time and the vertical axis represents the dimension processing value. The actual measurement value 16 is plotted against the dimension standard value 17, and if the standard value 17 is exceeded, it is determined to be abnormal.

【0016】次に図7に寸法の予測値と実測値を比較し
たグラフを示す。寸法規格値17内であっても算出式1
3から算出される予測値18と実測値16の差19が一
定量以上であると、通常の設定値どおり加工されなかっ
たと判断して異常と判定する。これらの画面は判定用計
算機1により、CRT5上に表示させることができる。
また、異常と判定した場合、判定用計算機1により、ブ
ザーを鳴らす、あるいはCRT5上の色表示を変える等
して、その異常を作業者に知らせることができる。
Next, FIG. 7 shows a graph comparing the predicted value and the measured value of the dimension. Calculation formula 1 even within the dimension standard value 17
If the difference 19 between the predicted value 18 and the measured value 16 calculated from 3 is a certain amount or more, it is determined that the machining has not been performed according to the normal set value, and it is determined as abnormal. These screens can be displayed on the CRT 5 by the judgment computer 1.
Further, when it is determined that there is an abnormality, the determination computer 1 can inform the operator of the abnormality by sounding a buzzer or changing the color display on the CRT 5.

【0017】図8に寸法の予測値と実測値のデータをC
RT画面に表示させたテーブルを示す。図より品名HD
4010のロットNo.K102が予測値1.132に対
し、実測値は1.102と実測値の管理基準内に入ってはい
るが、一定量a=0.025とした場合、予測値との差が0.0
30と一定量以上であるので、設定値どおりに加工されな
かったと判断し露光設備1号機の異常を警告して次の製
品投入をストップさせる。これにより、設備異常による
不良発生を最低限に抑え、即時に設備の対策を行い不稼
動時間を低減することができる。
FIG. 8 shows the data of the predicted value and the measured value of the dimension C.
The table displayed on the RT screen is shown. Product name HD from the figure
4010 lot no. The measured value is 1.102, which is within the management standard of the measured value with respect to the predicted value of 1.132, but the difference from the predicted value is 0.0 when the fixed amount a = 0.025.
Since it is 30 or more than a certain amount, it is judged that the processing was not performed according to the set value, and the abnormality of the first exposure equipment is warned and the next product introduction is stopped. As a result, it is possible to minimize the occurrence of defects due to equipment abnormalities, take immediate countermeasures for equipment, and reduce downtime.

【0018】次に予測式の書換えについて説明する。本
方式により設備の異常を的確に検出するためには予測式
自体の精度が重要である。すなわち予測式の信頼性が低
ければ、それに基づき警告した設備の異常も信用でき
ず、極端な例を挙げれば誤った警告により正常な設備を
いじってしまいかえって異常な状態にしてしまう恐れも
ある。そこで予測式自体の正当性の判定を行う必要があ
る。図9に予測式の精度の判定処理フローを示す。
Next, the rewriting of the prediction formula will be described. The accuracy of the prediction formula itself is important for the accurate detection of equipment anomalies by this method. That is, if the reliability of the prediction formula is low, the abnormality of the equipment warned based on it cannot be trusted, and in an extreme example, there is a possibility that a false warning may be tampered with and the normal equipment may be changed into an abnormal state. Therefore, it is necessary to judge the validity of the prediction formula itself. FIG. 9 shows a flow chart for determining the accuracy of the prediction formula.

【0019】次に図9に基づき予測式の正当性の判定方
法の一例を述べる。まず、製品を投入して設備を設定
し、各設定パラメータからの予測値(L2)と実測値
(L1)の差が一定量以上になると設備の異常を警告す
るが、その時判定用計算機1は予測式を作成したデータ
ベースを参照する。そして予測式を作成するために使用
したデータが3ヶ月以上以前のものであれば予測式自体
のアラームを警告する。続いて測定を行い、例えば3回
続けて予測値と実測値が大きく異なっていたら予測式の
校正を指示する。そして、最近1ヶ月程度の各パラメー
タ設定値及び測定データを各データベースから検索し、
新しく予測式を算出し直す。このようにして予測式自体
の判定及び精度向上が図られ、設備の異常を的確に警告
することができる。
Next, an example of a method for determining the validity of the prediction formula will be described with reference to FIG. First, the product is thrown in to set the equipment, and when the difference between the predicted value (L2) and the actually measured value (L1) from each setting parameter becomes a certain amount or more, the equipment warning is given. At that time, the judgment computer 1 Refer to the database that created the prediction formula. If the data used to create the prediction formula is older than 3 months, the warning of the prediction formula itself is warned. Then, measurement is performed, and if the predicted value and the measured value are greatly different from each other three times in a row, the calibration of the prediction formula is instructed. Then, search each database for each parameter setting value and measurement data for the last one month,
Recalculate a new prediction formula. In this way, the prediction formula itself can be determined and the accuracy can be improved, and an abnormality in the equipment can be accurately warned.

【0020】異常の判定についてもう一例説明する。図
10に寸法の測定結果のグラフを示す。判定用計算機1
は寸法の加工実測値16について、あらかじめ一定量の
数だけ続けて増加あるいは減少を続けると異常と判定す
るアルゴリズムを有する。
Another example of determination of abnormality will be described. FIG. 10 shows a graph of measurement results of dimensions. Judgment computer 1
Has an algorithm for determining that the measured value 16 of the dimension is abnormal if it is continuously increased or decreased by a predetermined number.

【0021】ここでは、3回以上続けて増加すると異常
と判定する例を示す。加工実測値16が寸法規格値17
内であっても、3回続けて加工値が増加しているため、
このまま加工を続けると規格値17を越えてしまうと判
断し、異常を判定して、設備のメンテナンスを行うよう
指示する。
Here, an example in which it is determined to be abnormal if the number of times of increase increases three times or more is shown. Machining actual value 16 is dimension standard value 17
Even within the range, since the processing value has increased three times in a row,
It is judged that if the machining is continued as it is, the standard value 17 will be exceeded, an abnormality is judged, and an instruction is given to perform maintenance of the equipment.

【0022】また、判定用計算機1は、その機能を計算
機2あるいは計算機3に搭載することが出来、それによ
り判定用計算機1を省略することも可能である。
Further, the function of the judgment computer 1 can be installed in the calculator 2 or the calculator 3, so that the judgment computer 1 can be omitted.

【0023】また、上記した本発明の各実施例は一例に
過ぎず、半導体の他の設備、例えばCVD等の成膜設
備,インプラ設備についても利用できる。その他にもT
FT(薄膜トランジスタ設備)等薄膜製品の量産設備に
も応用できる。
The above-described embodiments of the present invention are merely examples, and other equipment for semiconductors, for example, film forming equipment such as CVD, and implantation equipment can also be used. Other T
It can also be applied to mass production equipment for thin film products such as FT (thin film transistor equipment).

【0024】[0024]

【発明の効果】以上説明したように、本実施例では設備
の異常を (1)製品の寸法加工値が規格値を越えたかどうか (2)設備の設定パラメータから予測される予測値と寸
法加工値の差 (3)製品の寸法加工値が一定回数続けて増加または減
少したかどうか の3つのアルゴリズムで判定する。
As described above, in the present embodiment, the abnormality of the equipment is (1) Whether the dimensional machining value of the product exceeds the standard value. (2) The predicted value and the dimensional machining predicted from the setting parameters of the equipment. Difference in value (3) Judgment is made by three algorithms of whether or not the dimension processing value of the product has continuously increased or decreased a certain number of times.

【0025】これにより、通常の(1)だけのアルゴリ
ズムでは検出できなかった設備の異常を早期に検出し、
メンテナンスを迅速に行うことで設備の異常に起因する
製品不良の発生を最小限にすることができ、材料費低
減,設備修理のための不稼働時間短縮等により生産性の
向上に寄与することができる。
As a result, the abnormality of the equipment which cannot be detected by the usual algorithm (1) is detected at an early stage,
By performing maintenance quickly, it is possible to minimize the occurrence of product defects due to equipment abnormalities, which contributes to improved productivity by reducing material costs and downtime for equipment repairs. it can.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の異常判定方式の処理フロー図である。FIG. 1 is a process flow diagram of an abnormality determination method of the present invention.

【図2】本発明を半導体製品の製造工程の一つであるホ
トレジ工程に適用したときのハードウェア構成図であ
る。
FIG. 2 is a hardware configuration diagram when the present invention is applied to a photolithography process which is one of manufacturing processes of semiconductor products.

【図3】異常を判定するために必要な加工値予測式を算
出するフロー図である。
FIG. 3 is a flowchart for calculating a processing value prediction formula necessary for determining an abnormality.

【図4】ホトレジ設備の各設備パラメータから作成され
た寸法の予測加工値算出式の一例を示した図である。
FIG. 4 is a diagram showing an example of a predictive machining value calculation formula of a dimension created from each equipment parameter of hot storage equipment.

【図5】設備パラメータ実績データベース6及び寸法実
測値データベース7に登録されているデータのデータテ
ーブルを示した図である。
FIG. 5 is a diagram showing a data table of data registered in the equipment parameter actual result database 6 and the measured dimension value database 7.

【図6】寸法加工値の時系列プロットとして、加工値と
規格値の比較による異常の判定例を示した図である。
FIG. 6 is a diagram showing an example of determination of abnormality by comparing a machining value and a standard value as a time series plot of dimension machining values.

【図7】寸法加工値の時系列プロットとして、加工値と
予測値の差の比較による異常の判定例を示した図であ
る。
FIG. 7 is a diagram showing an example of determination of abnormality by comparing a difference between a processed value and a predicted value as a time series plot of dimension processed values.

【図8】寸法予測値と実測値データの比較により設備異
常を判定する画面の表示例を示した図である。
FIG. 8 is a diagram showing a display example of a screen for determining a facility abnormality by comparing the dimension prediction value and the actual measurement value data.

【図9】予測加工値算出式の精度を判定するための処理
フロー図である。
FIG. 9 is a processing flow chart for determining the accuracy of a predicted machining value calculation formula.

【図10】寸法加工値の時系列プロットとして、加工値
が一定回数続けて増加することで異常を判定する例を示
した図である。
FIG. 10 is a diagram showing, as a time-series plot of dimension processing values, an example of determining an abnormality by continuously increasing the processing values a fixed number of times.

【符号の説明】[Explanation of symbols]

1…判定用計算機、2…データ収集用計算機、3…デー
タ収集用計算機、4…キーボード、5…CRT、6…設
備パラメータ実績データベース、7…寸法実測値データ
ベース、8…露光設備、9…現像設備、10…通信回
線、11…寸法検査設備、12…データ収集用計算機、
13…予測加工値算出式、14…設備パラメータデータ
テーブル、15…寸法実測値データテーブル、16…加
工実測値、17…寸法規格値、18…寸法予測値、19
…予測値と実測値の差、20…異常判定用データテーブ
ル、21…3回続けて増加している加工実測値。
1 ... Judgment computer, 2 ... Data collection computer, 3 ... Data collection computer, 4 ... Keyboard, 5 ... CRT, 6 ... Facility parameter record database, 7 ... Actual dimension database, 8 ... Exposure facility, 9 ... Development Equipment, 10 ... communication line, 11 ... dimension inspection equipment, 12 ... data collection computer,
13 ... Predicted machining value calculation formula, 14 ... Equipment parameter data table, 15 ... Dimension measured value data table, 16 ... Machining measured value, 17 ... Dimension standard value, 18 ... Dimension predicted value, 19
... difference between predicted value and actual measurement value, 20 ... abnormality determination data table, 21 ... actual measurement value that has been increased three times in a row.

Claims (9)

【特許請求の範囲】[Claims] 【請求項1】製品ワークの規格値と加工実測値の差と設
備の設定値から予測される予測加工値と加工後の加工実
測値の差及び加工実測値の増減傾向の3つの判定アルゴ
リズムに基づき、設備の異常を判定することを特徴とす
るライン異常判定方式。
Claims: 1. Three determination algorithms for the difference between the standard value of a product work and the actual measurement value of machining and the predicted machining value predicted from the set value of equipment and the difference between the actual machining value after machining and the increase / decrease tendency of the actual machining value. Based on this, a line abnormality determination method characterized by determining equipment abnormality.
【請求項2】請求項1の判定方式において、3つの判定
アルゴリズムのうち任意の1つまたは2つの判定アルゴ
リズムの組合せによりラインの異常を判定することを特
徴とするライン異常判定方式。
2. The line abnormality determination method according to claim 1, wherein an abnormality of the line is determined by an arbitrary one of the three determination algorithms or a combination of two determination algorithms.
【請求項3】請求項1の判定方式において、あらかじめ
設定した規格値と製品ワークの加工実測値を比較し、加
工実測値が規格値を越えた場合異常と判定することを特
徴とするライン異常判定方式。
3. A line abnormality characterized in that in the judgment method according to claim 1, a preset standard value is compared with an actual machining value of a product work, and if the actual machining value exceeds the standard value, it is determined to be abnormal. Judgment method.
【請求項4】請求項1の判定方式において、設備の設定
値から予測される製品の予測加工値と加工後の実測値を
比較し、一定量以上の差が発生した場合、異常と判定す
ることを特徴とするライン異常判定方式。
4. The judgment method according to claim 1, wherein the predicted machining value of the product predicted from the set value of the equipment is compared with the actual measurement value after machining, and if a difference of a certain amount or more occurs, it is judged as abnormal. A line abnormality determination method characterized in that
【請求項5】請求項1の判定方式において、あらかじめ
設定した数だけ続けて製品ワークの加工実測値が増加ま
たは減少を続けた場合、異常と判定することを特徴とす
るライン異常判定方式。
5. The line abnormality determination method according to claim 1, wherein when the actual measurement value of the product workpiece continues to increase or decrease by a preset number, it is determined to be abnormal.
【請求項6】設備の設定値を記憶するデータベースと製
品の加工値のデータベースとそれらのデータを解析し、
設備異常を判定する判定設備から構成されることを特徴
とするライン異常判定方式。
6. A database for storing set values for equipment, a database for processed values for products, and those data are analyzed,
A line anomaly judgment method characterized by being composed of a judgment equipment for judging equipment abnormalities.
【請求項7】請求項6において、一定量の設備の設定値
と製品の加工値から製品の加工値を予測する予測アルコ
リズムを作成することを特徴とするライン異常判定方
式。
7. The line abnormality determination method according to claim 6, wherein a predictive algorithm for predicting a processed value of a product is created from a set value of a fixed amount of equipment and a processed value of a product.
【請求項8】請求項7で求められた予測アルゴリズムを
利用し、設定値から予測される予測加工値と実際の製品
の加工値を比較して一定量以上の差が発生すると設備異
常と判定することを特徴とするライン異常判定方式。
8. Using the prediction algorithm obtained in claim 7, the predicted machining value predicted from the set value is compared with the actual machining value of the product, and if a difference of a certain amount or more occurs, it is determined that the equipment is abnormal. A line abnormality determination method characterized by:
【請求項9】請求項7で求められた予測アルゴリズムに
関し、設定値と加工実測値のデータが一定量蓄積される
と予測アルゴリズム自体の精度を判定し、必要に応じて
予測アルゴリズムの校正を行うことを特徴とするライン
異常判定方式。
9. With respect to the prediction algorithm obtained in claim 7, the accuracy of the prediction algorithm itself is determined when a fixed amount of set value and actual machining value data is accumulated, and the prediction algorithm is calibrated if necessary. A line abnormality determination method characterized in that
JP5222792A 1992-03-11 1992-03-11 Judging system for abnormality on line Pending JPH05253797A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5222792A JPH05253797A (en) 1992-03-11 1992-03-11 Judging system for abnormality on line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5222792A JPH05253797A (en) 1992-03-11 1992-03-11 Judging system for abnormality on line

Publications (1)

Publication Number Publication Date
JPH05253797A true JPH05253797A (en) 1993-10-05

Family

ID=12908859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5222792A Pending JPH05253797A (en) 1992-03-11 1992-03-11 Judging system for abnormality on line

Country Status (1)

Country Link
JP (1) JPH05253797A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996026539A1 (en) * 1995-02-24 1996-08-29 Hitachi, Ltd. Method and device for analyzing abnormality of production line and method and device for controlling production line
JP2006024195A (en) * 2004-06-03 2006-01-26 National Cheng Kung Univ System and method for predicting product quality during manufacturing processes
JP2009010370A (en) * 2008-06-11 2009-01-15 Hitachi Ltd Semiconductor processing apparatus
JP2010211670A (en) * 2009-03-12 2010-09-24 Fuji Electric Systems Co Ltd Method and device for quality control by spc
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JP2015210222A (en) * 2014-04-28 2015-11-24 株式会社東芝 Weather prediction correction device and weather prediction correction method
JP2018105893A (en) * 2018-04-09 2018-07-05 株式会社東芝 Weather prediction correction device, weather prediction correction method, and program
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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996026539A1 (en) * 1995-02-24 1996-08-29 Hitachi, Ltd. Method and device for analyzing abnormality of production line and method and device for controlling production line
JP2006024195A (en) * 2004-06-03 2006-01-26 National Cheng Kung Univ System and method for predicting product quality during manufacturing processes
US7493185B2 (en) 2004-06-03 2009-02-17 National Cheng Kung University Quality prognostics system and method for manufacturing processes
JP4601492B2 (en) * 2004-06-03 2010-12-22 国立成功大学 Quality prediction system and method for production process
JP2009010370A (en) * 2008-06-11 2009-01-15 Hitachi Ltd Semiconductor processing apparatus
JP2010211670A (en) * 2009-03-12 2010-09-24 Fuji Electric Systems Co Ltd Method and device for quality control by spc
JP2011014122A (en) * 2009-06-02 2011-01-20 Sharp Corp Workmanship prediction device, workmanship prediction method, workmanship prediction program, and program recording medium
JP2015210222A (en) * 2014-04-28 2015-11-24 株式会社東芝 Weather prediction correction device and weather prediction correction method
JP2018105893A (en) * 2018-04-09 2018-07-05 株式会社東芝 Weather prediction correction device, weather prediction correction method, and program
CN113031552A (en) * 2021-03-09 2021-06-25 浙江菲达环保科技股份有限公司 Cooperative control method and system for environment-friendly equipment behind furnace
CN113031552B (en) * 2021-03-09 2022-10-25 浙江菲达环保科技股份有限公司 Cooperative control method and system for environmental protection equipment behind furnace
CN114265390A (en) * 2021-12-22 2022-04-01 苏州华星光电技术有限公司 Equipment data acquisition diagnosis method and device, server and storage medium
CN114265390B (en) * 2021-12-22 2024-02-20 苏州华星光电技术有限公司 Equipment data acquisition diagnosis method, device, server and storage medium

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