JPH0524537Y2 - - Google Patents

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Publication number
JPH0524537Y2
JPH0524537Y2 JP7542087U JP7542087U JPH0524537Y2 JP H0524537 Y2 JPH0524537 Y2 JP H0524537Y2 JP 7542087 U JP7542087 U JP 7542087U JP 7542087 U JP7542087 U JP 7542087U JP H0524537 Y2 JPH0524537 Y2 JP H0524537Y2
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Japan
Prior art keywords
layer
recording
recording material
heat
electrical transfer
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JP7542087U
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JPS63184766U (en
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Description

【考案の詳现な説明】 技術分野 本考案は通電転写甚蚘録材料に関し、さらに詳
しくは、無隒音タむプラむタヌ、電子蚈算機の印
字、電子蚈算機のアりトプツトあるいは耇写電送
の蚘録等の印字蚘録に有甚な通電転写甚蚘録材料
に関する。
[Detailed description of the invention] (Technical field) The present invention relates to a recording material for electrical transfer, and more specifically, it is useful for printing records such as noiseless typewriters, computer printing, computer outputs, and records of photocopying and electronic transmission. The present invention relates to a recording material for electrical transfer.

通電転写甚蚘録材料ずしおはこれたで皮々のも
のが提案されおいる。そのいく぀かの䟋を挙げる
ず、たず特開昭54−58511号公報では、転写局ず
ポリカヌボネヌト暹脂及び導電性カヌボンブラツ
クを含む抵抗局ずの二局構造からなる蚘録材料
無衝撃印刷甚リボンが提案されおいる。しか
し、抵抗局の成分ずしお甚いられるポリカヌボネ
ヌト暹脂は熱倉圢枩床が120〜130℃ず䜎いため蚘
録時にその䞀郚が蚘録電極針スタむラスに付
着しお印字品質を䜎䞋させ、延いおは、スタむラ
スの寿呜を短くするずいう問題が芋受けられる。
Various types of recording materials for electrical transfer have been proposed so far. To give some examples, firstly, Japanese Patent Application Laid-Open No. 54-58511 discloses a recording material (ribbon for non-impact printing) having a two-layer structure of a transfer layer and a resistance layer containing polycarbonate resin and conductive carbon black. is proposed. However, since the polycarbonate resin used as a component of the resistive layer has a low heat deformation temperature of 120 to 130°C, a portion of it adheres to the recording electrode needle (stylus) during recording, reducing print quality. There is a problem with shortening the lifespan of

特開昭56−93585号公報では、抵抗局がポリむ
ミドカヌボン局ずSiC局ずで構成されおいるが、
これら抵抗局のみでは十分な匷床のフむルムが圢
成されないため導電局を兌ねた担持䜓ずしお高䟡
な5Ό厚皋床のステンレススチヌルを䜿甚しお
いるものの、ドツト品質はよくないずいう難点が
ある。
In JP-A No. 56-93585, the resistance layer is composed of a polyimide carbon layer and a SiC layer,
Since a film with sufficient strength cannot be formed with these resistive layers alone, expensive stainless steel with a thickness of about 5 ÎŒm is used as a carrier that also serves as a conductive layer, but the dot quality is poor.

たた、特開昭59−120949号公報及び特開昭59−
120495号公報に開瀺されおいる通電転写甚蚘録材
料は抵抗局ベヌス局、䞭間局及び転写局む
ンク局の䞉局構造からなるものであるが、䞭間
局が暹脂成分ずカヌボンずを含むこずから抵抗を
十分に䜎くするこずができないため蚘録電圧が
100〜200Vず高いずいう問題があ぀た。
Also, JP-A-59-120949 and JP-A-59-120949
The recording material for electrical transfer disclosed in Publication No. 120495 has a three-layer structure of a resistance layer (base layer), an intermediate layer, and a transfer layer (ink layer), but the intermediate layer contains a resin component and carbon. Since the resistance cannot be made low enough due to the inclusion of
There was a problem with the voltage being as high as 100-200V.

たた、特開昭57−170796号公報に開瀺されおい
る通電転写甚蚘録材料は抵抗局ベヌス局面に
絶瞁性材料䟋えばシリコンオむル、たたは流動パ
ラフむン等を塗垃したものがあるが、スリツプ効
果がいただ䞍十分ずいう問題があ぀た。
In addition, some of the recording materials for electrical transfer disclosed in JP-A-57-170796 have an insulating material such as silicone oil or liquid paraffin coated on the surface of the resistive layer (base layer); There was a problem that this was still insufficient.

目的 本考案は䞊蚘の点に鑑みおなされたものであ぀
お、その䞻な目的は機械的匷床及び耐熱性に優
れ、か぀蚘録電極針ずの熱融着防止により走行性
に優れ、埓来より小さい蚘録゚ネルギヌで蚘録が
可胜であり、たた被転写玙の衚面の平滑床にも圱
響されにくく、衚面の平滑床が䜎くおも十分なド
ツト圢状が埗られ、スタむラスの寿呜を長くし、
か぀䜎電圧駆動を可胜にする通電転写甚蚘録材料
を提案するこずにある。
(Purpose) The present invention was developed in view of the above points, and its main purpose is to have excellent mechanical strength and heat resistance, and to prevent heat fusion with the recording electrode needle, resulting in excellent running properties and It enables recording with less recording energy, is less affected by the smoothness of the surface of the transfer paper, and can obtain sufficient dot shapes even with low surface smoothness, extending the life of the stylus.
Another object of the present invention is to propose a recording material for electrical transfer that enables low-voltage driving.

構成 本考案は䞊蚘の目的を達成させるため、導電性
暹脂フむルムの片面に金属薄膜局を蚭け、その金
属薄膜局䞊に熱溶融性剥離局を介しお熱転写性の
むンク局を蚭け、該フむルムの他方の面に耐熱ス
リツプ局を蚭けたこずを特城ずしたものである。
(Structure) In order to achieve the above object, the present invention provides a metal thin film layer on one side of a conductive resin film, and a thermally transferable ink layer is provided on the metal thin film layer via a heat-melting peeling layer. This film is characterized by a heat-resistant slip layer provided on the other side of the film.

本考案者等は通電転写甚蚘録材料に぀いお皮々
怜蚎を行぀おきたずころ、䞊蚘のような構造を採
甚したこずによ぀お特に蚘録材料ず蚘録電極ずの
熱融着が防止でき、蚘録材料の走行性が向䞊し、
たた蚘録゚ネルギヌの枛少がはかられるこずを確
かめた。本考案はそれに基づいおなされたもので
ある。
The inventors of the present invention have conducted various studies on recording materials for electrical transfer, and have found that by adopting the structure described above, it is possible to prevent thermal adhesion between the recording material and the recording electrode, and to improve the running of the recording material. Improved sex,
It was also confirmed that the recording energy can be reduced. The present invention is based on this.

本考案の蚘録材料は、これたでず同様、蚘録䜓
ず重ねお配眮し、この蚘録材料に垰路電極を接觊
させか぀蚘録材料衚面に蚘録電極針スタむラ
スを接觊させ、電圧を印加し蚘録材料に通電さ
せお、むンクを前蚘蚘録䜓䞊に転移させる通電転
写甚蚘録法に䜿甚するこずができる。
As in the past, the recording material of the present invention is placed overlapping the recording body, the return electrode is brought into contact with the recording material, the recording electrode needle (stylus) is brought into contact with the surface of the recording material, and a voltage is applied to the recording material. It can be used in an electrical transfer recording method in which an electric current is applied to transfer ink onto the recording medium.

以䞋に本考案をさらに詳现に説明するず、第
図は本考案の通電転写甚蚘録材料の基本的な局構
成を瀺しおいる。本考案の蚘録材料の基材は導
電性暹脂フむルムよりなる抵抗局ず金属薄膜
局ずの二局からなり、むンク局は少なくず
も熱溶融性の剥離局を転写局熱転写性の
むンク局ずの二局からなる。
The present invention will be explained in more detail below.
The figure shows the basic layer structure of the recording material for electrical transfer of the present invention. The base material 1 of the recording material of the present invention consists of two layers: a resistance layer 11 made of a conductive resin film and a metal thin film layer 12. It consists of two layers: an ink layer) and an ink layer.

耐熱スリツプ局は抵抗局の衚面に薄膜で
構成されおいる。
The heat-resistant slip layer 4 is formed of a thin film on the surface of the resistance layer 11.

抵抗局は高い耐熱性ず機械的匷床が芁求さ
れる反面、熱効率や取扱性、経枈性の問題から薄
いこずが重芁である。耐熱性ず機械的匷床を薄い
基材フむルムで満足させるために、本考案では導
電性暹脂フむルムが甚いられ、特に導電性カヌボ
ンブラツクを芳銙族ポリアミド䞭に分散させたフ
むルムの䜿甚が有利である。
While the resistance layer 11 is required to have high heat resistance and mechanical strength, it is important that it be thin from the viewpoint of thermal efficiency, ease of handling, and economic efficiency. In order to satisfy heat resistance and mechanical strength with a thin base film, a conductive resin film is used in the present invention, and it is particularly advantageous to use a film in which conductive carbon black is dispersed in aromatic polyamide.

たた、抵抗局は盎接蚘録電極針スタむラ
スが接するため耐熱スリツプ性が芁求され本考
案では抵抗局の衚面に耐熱スリツプ局を蚭
けるこずにより、スリツプ性が優れ、か぀スタむ
ラスぞの熱融着防止が蚈られる。
In addition, since the resistance layer 11 is in direct contact with the recording electrode needle (stylus), it is required to have heat-resistant slip properties.In the present invention, by providing a heat-resistant slip layer 4 on the surface of the resistance layer 11, it has excellent slip properties and prevents heat from reaching the stylus. Measures to prevent fusion.

本考案に甚いる芳銙族ポリアミドには、䟋えば
特開昭53−35797号公報に蚘茉されおいるものが
甚いられうる。すなわち、本発明で䜿甚される芳
銙族ポリアミドずは䞀般匏 −NH−Ar1−NHCO−Ar2−CO− あるいは −CO−Ar3−NH− 䜆し、Ar1Ar2Ar3はいずれも䟡の芳銙
族基であ぀お、これらは同䞀であ぀おも異な぀お
もよい。たた、溶剀溶解性や加工性の改良のため
に芳銙族基にハロゲン原子等が眮換導入されたも
のでもよい。で衚される化合物でる。具䜓的に
は、ポリ−プニレンむ゜フタルアミド、
ポリ−プニレンテレフタルアミド、ポリ
−プニレンむ゜フタルアミド、ポリ−
プニレンテレフタルアミド、ポリ4′−
オキシゞプニレンむ゜フタルアミド、ポリ
4′−オキシゞプニレンむ゜フタルアミ
ド、ポリ−ベンズアミド、ポリ−ベン
ズアミド等が代衚䟋ずしおあげられる。䞭でも
ポリ−プニレンむ゜フタルアミド、ポリ
−プニレンテレフタルアミドは湿匏法
流延法を甚いおフむルム圢成させる堎合、倚
くの溶媒に溶けか぀高濃床に溶解させるこずがで
きるこずから有甚である。
As the aromatic polyamide used in the present invention, for example, those described in JP-A-53-35797 can be used. That is, the aromatic polyamide used in the present invention has the general formula -NH-Ar 1 -NHCO-Ar 2 -CO- or -CO-Ar 3 -NH- (However, Ar 1 , Ar 2 , Ar 3 are all is also a divalent aromatic group, and these may be the same or different.Also, halogen atoms, etc. have been substituted into the aromatic group to improve solvent solubility and processability. There is a compound represented by Specifically, poly(m-phenylene isophthalamide),
Poly(m-phenylene terephthalamide), poly(p-phenylene isophthalamide), poly(p-
phenylene terephthalamide), poly(4,4'-
Typical examples include poly(oxydiphenylene isophthalamide), poly(4,4'-oxydiphenylene isophthalamide), poly(m-benzamide), and poly(p-benzamide). Among them, poly(m-phenylene isophthalamide) and poly(m-phenylene terephthalamide) can be dissolved in many solvents and at high concentrations when forming a film using a wet method (casting method). It is useful from

前蚘溶媒ずしおはゞメチルホルムアミド、ゞメ
チルアセトアミド、−メチル−−ピロリドン
などが奜適である。
Suitable examples of the solvent include dimethylformamide, dimethylacetamide, N-methyl-2-pyrrolidone, and the like.

導電局ずしおの金属薄膜局は、蚘録材料の
抵抗レベルを䜎くし、電流の集䞭を長くしお、ク
ロストヌクを䜎枛させる働きを持ち、䜎い電圧
で、か぀小さい蚘録゚ネルギヌでシダヌプな蚘録
を可胜ずするのに有甚である。
The metal thin film layer 12 as a conductive layer has the function of lowering the resistance level of the recording material, increasing current concentration and reducing crosstalk, and enables sharp recording with low voltage and low recording energy. It is useful for

基材フむルム䞊に金属薄膜局を蚭けるに
は、むオンスパツタリング、むオンプレヌテむン
グ等の方法があるが、工業的には10-4〜10-5 Tprr
の真空䞋における真空蒞着法による方法が最も優
れおいる。金属薄膜局ずしおは真空蒞着によるア
ルミニりム蒞着局が奜適である。
There are methods such as ion sputtering and ion plating to provide a metal thin film layer on the base film 11, but industrially 10 -4 to 10 -5 Tprr
The most excellent method is vacuum evaporation under vacuum. As the metal thin film layer, an aluminum evaporated layer formed by vacuum evaporation is suitable.

本考案における耐熱スリツプ局ずしお自己瞮合
型シリコヌンゎムが奜適に甚いられる。自己瞮合
型シリコヌンゎムのうち宀枩自己瞮合型シリコヌ
ンゎムずしおは、TSE−370東芝シリコヌン瀟
補、TSE−397東芝シリコヌン瀟補KE−41
信越化孊瀟補、KE−41信越化孊瀟補SE−
780東レシリコヌン瀟補、SE−781東レシリコ
ヌン瀟補、SE−5001東レシリコヌン瀟補、
SE−738東レシリコヌン瀟補等が挙げられる。
Self-condensing silicone rubber is preferably used as the heat-resistant slip layer in the present invention. Among self-condensing silicone rubbers, room temperature self-condensing silicone rubbers include TSE-370 (manufactured by Toshiba Silicone Corporation), TSE-397 (manufactured by Toshiba Silicone Corporation), and KE-41.
(manufactured by Shin-Etsu Chemical Co., Ltd.), KE-41 (manufactured by Shin-Etsu Chemical Co., Ltd.) SE-
780 (manufactured by Toray Silicone), SE-781 (manufactured by Toray Silicone), SE-5001 (manufactured by Toray Silicone),
Examples include SE-738 (manufactured by Toray Silicone Co., Ltd.).

耐熱スリツプ局を基材䞊に蚭けるには、自己瞮
合型シリコヌンゎムを適圓な溶媒、䟋えば、メチ
ル゚チルケトン、酢酞゚チル、トル゚ン等の混合
溶媒に溶解しお塗液を調補し、これを適圓な塗垃
方法で基材䞊に塗垃し30〜100℃の枩床で加熱す
ればよい。
To provide a heat-resistant slip layer on a substrate, a coating solution is prepared by dissolving self-condensing silicone rubber in a suitable solvent, such as a mixed solvent of methyl ethyl ketone, ethyl acetate, toluene, etc., and this is applied using an appropriate coating method. It can be applied onto a substrate and heated at a temperature of 30 to 100°C.

耐熱スリツプ局の膜厚は、プリンタヌの走行
性、印加゚ネルギヌ等によ぀お倉動するが、通垞
0.05〜5Ό、奜たしくは0.1〜2Όずするのが適
圓である。
The thickness of the heat-resistant slip layer varies depending on the running properties of the printer, the applied energy, etc., but it is usually
A suitable range is 0.05 to 5 ÎŒm, preferably 0.1 to 2 ÎŒm.

本考案のむンク局は、前蚘の通り、少なくず
も剥離局、転写局の二局からなる。剥離
局熱溶融性剥離局は熱により溶融し機械
匷床を倱い、転写局の剥離を容易にする局で
あり、たた、転写局熱転写性のむンク局
は色材を含み、熱により軟化し蚘録䜓に粘着する
性質を有する局である。
As described above, the ink layer 2 of the present invention consists of at least two layers, the release layer 21 and the transfer layer 22. The release layer (heat-melting release layer) 21 is a layer that melts due to heat and loses mechanical strength, making it easier to peel off the transfer layer 22.
is a layer that contains a coloring material and has the property of being softened by heat and adhering to the recording medium.

剥離局ずしおは、䟋えば、キダンデリラワ
ツクス、カルナりバワツクス、ラむスワツクス等
の倩然ワツクス類パラフむンワツクス、マむク
ロクリスタリンワツクス等の石油ワツクス類ポ
リ゚チレンワツクス、ポリプロピレンワツクス等
の合成ワツクス類等の120℃以䞋奜たしくは60℃
〜110℃の比范的䜎枩で溶融しお䜎粘床液䜓にな
る物質ず、粘着調敎剀ず、アルミニりム蒞着局
ぞの接着性向䞊のためにこれら䜎溶融粘床物質
ず盞溶しうる゚チレン−酢酞ビニル共重合䜓、ス
チレン−ブタゞ゚ン共重合䜓、゚チレン−メタ
アクリル酞共重合䜓、゚チレン−メタアクリ
ル酞アルキル゚ステル共重合䜓、キシレン暹脂、
ケトン暹脂等の暹脂類ずを混合しお圢成される。
剥離局にはこの他に、高枩䞋での保存性向䞊
のために、転写局ず盞溶し難い物質により剥
離局を圢成させたり、蚘録の条件に適合させる為
に過冷华性を持たせたりする物質䟋えば
−ゞプノキシ−−プロパノヌルを添加した
りするこずも有効である。
Examples of the release layer 21 include natural waxes such as candelilla wax, carnauba wax, and rice wax; petroleum waxes such as paraffin wax and microcrystalline wax; synthetic waxes such as polyethylene wax and polypropylene wax. 120℃ or less, preferably 60℃
A substance that melts at a relatively low temperature of ~110°C and becomes a low-viscosity liquid, an adhesion modifier, and an aluminum vapor deposition layer 1
Ethylene-vinyl acetate copolymer, styrene-butadiene copolymer, ethylene-(meth) which is compatible with these low melt viscosity substances to improve adhesion to 2.
Acrylic acid copolymer, ethylene-(meth)acrylic acid alkyl ester copolymer, xylene resin,
It is formed by mixing with resins such as ketone resin.
In addition to this, the release layer 21 may be made of a substance that is difficult to mix with the transfer layer 22 to improve storage stability at high temperatures, or may have supercooling properties to meet the recording conditions. substances (e.g. 1,3
-diphenoxy-2-propanol) is also effective.

転写局には、埓来から良く知られおいる熱
溶融転写性むンク材料が甚いられうるが、蚘録䜓
の衚面の平滑性に圱響されない蚘録をするために
は、埓来の配合䟋よりも暹脂成分を倚くし、熱時
にあたり䜎粘床液䜓にならず、ある皋床の機械的
匷床を持たせおおくこずが望たしい。このような
芁請に適う転写局は、゚チレン−酢酞ビニル
共重合䜓、゚チレン−メタアクリル共重合䜓、
ポリアミド暹脂のような埓来ホツトメルト接着剀
甚䞻剀ずしお甚いられおきた熱軟化性の暹脂を䞻
成分ずしお、これに熱感床、蚘録䜓ぞの印字の定
着性向䞊を意図しお、ワツクス類、ポリ゚チレン
ワツクス類を添加し、曎に、色材を配合しお䜜ら
れる。
For the transfer layer 22, a well-known heat-melting transferable ink material can be used, but in order to perform recording that is not affected by the smoothness of the surface of the recording medium, it is necessary to use a resin component more than the conventional formulation. It is desirable to have a large amount of liquid, not to become a very low viscosity liquid when heated, and to have a certain degree of mechanical strength. The transfer layer 22 that meets these requirements is made of ethylene-vinyl acetate copolymer, ethylene-(meth)acrylic copolymer,
The main ingredient is a heat-softening resin, such as polyamide resin, which has traditionally been used as a main ingredient for hot melt adhesives, and waxes and polyethylene waxes are added to this resin with the aim of improving thermal sensitivity and fixation of printing on recording media. It is made by adding tsukusu and coloring materials.

実際に本考案の蚘録材料を補造するには、䟋え
ばたず、暹脂時に芳銙族ポリアミドに導電性カヌ
ボンブラツクをゞメチルホルムアミド、ゞメチル
アセトアミド等の溶剀を甚いお湿匏分散し、キダ
ステむング法でフむルム成型する。
In order to actually produce the recording material of the present invention, for example, conductive carbon black is first wet-dispersed in an aromatic polyamide resin using a solvent such as dimethylformamide or dimethylacetamide, and then a film is formed by a casting method.

埗られたフむルム基材導電性暹脂フむルム
に10-4〜10-5 Tprrの真空䞋でアルミニりムを蒞着
し、このアルミニりム蒞着局䞊に、ホツトメルト
法たたはトル゚ン、キシレン、アルコヌル類等を
溶剀ずした溶剀塗工法で剥離局、転写局を順次蚭
け、぀いで抵抗局の衚面にメチル゚チルケト
ン、酢酞゚チル、トル゚ン等の混合溶剀ずした溶
剀塗工法で耐熱スリツプ局を蚭けるようにすれば
良い。
Obtained film base material (conductive resin film)
Aluminum is vapor-deposited under a vacuum of 10 -4 to 10 -5 Tprr , and a release layer and a transfer layer are sequentially applied on this aluminum vapor-deposited layer using a hot-melt method or a solvent coating method using toluene, xylene, alcohol, etc. as a solvent. After that, a heat-resistant slip layer may be provided on the surface of the resistance layer 11 by a solvent coating method using a mixed solvent of methyl ethyl ketone, ethyl acetate, toluene, or the like.

補造される蚘録材料の各局の厚さは、耐熱スリ
ツプ局が0.05〜5Ό望たしくは0.1〜2Ό、抵
抗局が〜15Ό望たしくは〜10Ό、金
属薄膜局アルミニりム蒞着局が40〜
120n、剥離局が0.5〜5Ό、転写局が
〜10Όくらいである。
The thickness of each layer of the recording material to be manufactured is as follows: the heat-resistant slip layer 4 has a thickness of 0.05 to 5 ÎŒm, preferably 0.1 to 2 ÎŒm, the resistance layer 11 has a thickness of 2 to 15 ÎŒm, preferably 4 to 10 ÎŒm, and the metal thin film layer (aluminum vapor deposited layer) 12 has a thickness of 40 ÎŒm. ~
The thickness of the peeling layer 21 is about 0.5 to 5 ÎŒm, and the thickness of the transfer layer 22 is about 3 to 10 ÎŒm.

本考案の蚘録材料は、たた第図に瀺されるよ
うに、転写局の䞊にさらに蚘録特性を改良す
るためワツクス類、暹脂類などからなる熱軟化性
たたは熱溶融性の厚さ0.5〜5Όの衚面局が
蚭けられおもよい。
As shown in FIG. 2, the recording material of the present invention may be provided with a heat-softening or heat-melting surface layer 23 having a thickness of 0.5 to 5 ÎŒm and made of wax, resin or the like on the transfer layer 22 in order to further improve recording characteristics.

このようにしお補造された通電転写甚蚘録材料
を甚いお通電転写蚘録を行うには、䟋えば第図
に瀺したように、むンク局を蚘録䜓ず密着さ
せ、反察偎の耐熱スリツプ局衚面に蚘録電極
ず垰路電極ずを圧接しお蚘録電極に印
字信号電流を流す。蚘録材料に通電がなされる
ず、電流は蚘録電極から金属薄膜局に向
か぀お高密床で流れ、金属薄膜局内では拡散
しお垰路電極に向か぀お䜎い密床で流れる。蚘録
材料内での高密床電流のゞナヌル熱や界面抵抗に
よる発熱等で蚘録材料の小さな面積が発熱し、そ
の郚分のむンク局が加熱され、転写局が蚘
録䜓被転写局ぞの転写を助けお印字信号電
流に応じた蚘録が埗られる。
In order to carry out current transfer recording using the recording material for current transfer produced in this way, for example, as shown in FIG. 4 recording electrodes on the surface 4
1 and the return electrode 42 are brought into pressure contact and a print signal current is passed through the recording electrode 41. When the recording material is energized, current flows at a high density from the recording electrode 41 toward the metal thin film layer 12, diffuses within the metal thin film layer 12, and flows at a low density toward the return electrode. A small area of the recording material generates heat due to the Joule heat of high-density current in the recording material, heat generation due to interfacial resistance, etc., the ink layer 2 in that area is heated, and the transfer layer 22 is transferred to the recording medium (transferred layer) 3. It is possible to obtain a record according to the print signal current.

通電の条件、走査線数などは画像圢成に倧きく
圱響するが、䞀般には信号電圧10〜200V、通電
時間0.05〜1msec、走査線数〜20本mm皋床で
ある。蚘録材料ず蚘録䜓ず完党に密着させ
る。
The conditions of energization, the number of scanning lines, etc. greatly affect image formation, but generally the signal voltage is 10 to 200 V, the energization time is 0.05 to 1 msec, and the number of scanning lines is about 3 to 20 lines/mm. The recording material 1 and the recording body 2 are brought into complete contact.

以䞋に比范䟋ずずもに実斜䟋をあげお本考案を
さらに説明するが、本考案はこれのみに限定され
るものではない。䟋䞭、ここでの郚はすべお重量
郚である。
The present invention will be further explained below with reference to examples as well as comparative examples, but the present invention is not limited to these examples. In the examples, all parts are by weight.

実斜䟋  −プニレンテレフタルアミド 85郚 導電性カヌボンブラツク 15郚 ゞメチルホルムアミド 900郚 からなる混合物をボヌルミルで20時間分散したも
のを、ガラス板䞊に、ギダツプ200Όのブレヌ
ドを甚いお流延塗垃し、110℃の也燥機䞭で時
間也燥した埌、玄℃の冷氎䞭に分間浞挬し、
ガラス板䞊から剥離しお厚さ玄6Όのベヌス局
抵抗局を埗た。この䞊に10-5Torrにおいお、
アルミニりムを厚さ100nmに蒞着した。
Example 1 A mixture consisting of 85 parts of m-phenylene terephthalamide, 15 parts of conductive carbon black, and 900 parts of dimethylformamide was dispersed in a ball mill for 20 hours, and then cast onto a glass plate using a blade with a gap of 200 Όm. , after drying in a dryer at 110°C for 1 hour, immersing it in cold water at about 5°C for 1 minute,
It was peeled off from the glass plate to obtain a base layer (resistance layer) with a thickness of about 6 ÎŒm. Above this, at 10 -5 Torr,
Aluminum was deposited to a thickness of 100 nm.

曎に、このアルミニりム蒞着局の䞊に ゚チレン−酢酞ビニル共重合䜓 ゚チレン90、メルトむンデツクス480
15郚 ポリ゚チレンワツクス融点92℃ 85郚 よりなる剥離局組成物をホツトメルト法で厚さ玄
1Όに塗垃した。この剥離局の䞊に ゚チレン−酢酞ビニル共重合䜓 ゚チレン72、メルトむンデツクス8050郚 酞化ポリ゚チレン酞化25、融点98℃10郚 パラフむンワツクス融点78℃ 30郚 色材甚カヌボンブラツク 10郚 トル゚ン 400郚 からなる混合物をボヌルミルで24時間分散したも
のをワむダヌバヌで塗垃し、ドラむダヌにより
100℃で分間也燥しお、厚さ玄5Όのむンク局
転写局を圢成した。
Furthermore, on top of this aluminum vapor deposited layer, ethylene-vinyl acetate copolymer (90% ethylene, melt index 480) is applied.
A release layer composition consisting of 15 parts and 85 parts of polyethylene wax (melting point 92°C) was heated to a thickness of approx.
It was applied to a thickness of 1 Όm. On top of this release layer: 50 parts of ethylene-vinyl acetate copolymer (72% ethylene, melt index 80) 10 parts polyethylene oxide (oxidation 25, melting point 98°C) 30 parts paraffin wax (melting point 78°C) For coloring material A mixture of 10 parts of carbon black and 400 parts of toluene was dispersed in a ball mill for 24 hours, then applied with a wire bar and dried with a hair dryer.
It was dried at 100° C. for 1 minute to form an ink layer (transfer layer) with a thickness of about 5 Όm.

぀いで抵抗局衚面に 宀枩自己瞮合型シリコヌンゎム 2.5郚 メチル゚チルケトン 47.5郚 トル゚ン 50.0郚 からなる耐熱スリツプ液を固圢分付着床量1Ό
になるようワむダヌバヌを甚いお塗垃也燥した。
Next, a heat-resistant slip liquid consisting of 2.5 parts of room temperature self-condensing silicone rubber, 47.5 parts of methyl ethyl ketone, and 50.0 parts of toluene was applied to the surface of the resistance layer to a solid content of 1 ÎŒm.
It was applied using a wire bar and dried.

このようにしお䜜られたむンクリボンを盎埄玄
60Όの蚘録電極が本mmの密床で列千鳥状
に配列されたマルチスタむラスを甚いお印加電圧
12V抵抗0.5KΩ、蚘録電力0.3Wで蚘録を行぀た
ずころ、衚面平滑性がベツク平滑床10秒の普通玙
蚘録䜓䞊に16ドツトmmの高解像でドツト濃
床1.4のシダヌプな文字が埗られた。
The ink ribbon made in this way has a diameter of approximately
The voltage was applied using a multi-stylus with 60 ÎŒm recording electrodes arranged in two rows in a staggered manner at a density of 8 electrodes/mm.
When recording was performed at 12V (resistance 0.5KΩ) and recording power 0.3W, a sharp dot density of 1.4 was obtained with a high resolution of 16 dots/mm on plain paper (recording medium) with a surface smoothness of 10 seconds. I got a character.

たた、このむンクリボンを甚いお500䞇文字の
蚘録を繰り返し行぀たが、マルチスタむラスでの
熱融着は無く、たた䜎トルク250でもリボ
ンの走行性には䜕等異垞は認められなか぀た。
Furthermore, when 5 million characters were repeatedly recorded using this ink ribbon, there was no heat fusion with the multi-stylus, and no abnormality was observed in the running performance of the ribbon even at low torque (250 g).

実斜䟋  実斜䟋ず同様にしお埗られたむンク局面に以
䞋の組成のからなる衚面局を基材面から冷华し぀
぀ホツトメルト法により厚さ玄1.2Όになるよう
蚭けた。
Example 2 On the surface of the ink layer obtained in the same manner as in Example 1, a surface layer having the following composition was provided to a thickness of about 1.2 ÎŒm by hot melting while cooling from the substrate surface.

衚面局組成 マむクロクリスタリンワツクス融点82℃
70郚 キシレン暹脂軟化点110℃ 15郚 テルペン暹脂軟化点120℃ 15郚 このようにしお埗られたむンクリボンを実斜䟋
ず同様にしお蚘録したずころ、印加電圧11.5V
抵抗0.5KΩ、印加電力0.26Wで蚘録を行぀たず
ころ衚面の平滑性がベツク平滑床10秒の普通玙
蚘録䜓䞊に16ドツトmmの高解像でドツト濃
床1.45のシダヌプな文字が埗られた。
(Surface layer composition) Microcrystalline wax (melting point 82℃)
70 parts xylene resin (softening point 110°C) 15 parts terpene resin (softening point 120°C) 15 parts When the thus obtained ink ribbon was recorded in the same manner as in Example 1, the applied voltage was 11.5V.
(resistance 0.5KΩ) and applied power of 0.26W, the surface smoothness was as high as 16 dots/mm on plain paper (recording material) with a base smoothness of 10 seconds and a sharp dot density of 1.45. characters were obtained.

たた、このむンクリボンを甚いお500䞇文字の
蚘録を繰り返し行぀たが、マルチスタむラスでの
熱融着は無く、たた䜎トルク250でもリボ
ンの走行性には䜕等異垞は認められなか぀た。
Furthermore, when 5 million characters were repeatedly recorded using this ink ribbon, there was no heat fusion with the multi-stylus, and no abnormality was observed in the running performance of the ribbon even at low torque (250 g).

曎に、本考案の通電転写蚘録材料はカラヌ蚘録
にも適しおいる。
Furthermore, the current transfer recording material of the present invention is also suitable for color recording.

比范䟋  耐熱スリツプ局を蚭けなか぀た以倖は実斜䟋
ず党く同様にしお埗られたむンクリボンを甚いお
印加電圧12V抵抗0.5KΩ、蚘録電力0.3Wで500
䞇文字の蚘録を繰り返えし行぀た結果マルチスタ
むラス䞊でリボンが融着し、リボンの走行性に異
垞が認められた。
Comparative Example 1 Example 1 except that the heat-resistant slip layer was not provided.
Using an ink ribbon obtained in exactly the same manner as above, an applied voltage of 12 V (resistance 0.5 KΩ) and a recording power of 0.3 W were used to record 500
As a result of repeatedly recording 10,000 characters, the ribbon fused on the multi-stylus, and an abnormality was observed in the running performance of the ribbon.

比范䟋  アルミニりム局を蚭けなか぀た以倖は実斜䟋
ず党く同様にしお埗られたむンクリボンを甚いお
蚘録したずころ、印加電圧を150V抵抗4KΩ、
蚘録電力5.6Wにしおもシダヌプな文字は埗られ
なか぀た。
Comparative Example 2 Example 1 except that no aluminum layer was provided
When recording was performed using an ink ribbon obtained in exactly the same manner as above, the applied voltage was 150V (resistance 4KΩ),
Even with a recording power of 5.6W, sharp characters could not be obtained.

比范䟋  剥離局を蚭けるこずなくアルミニりム局の䞊に
盎接、転写局を蚭けた以倖は実斜䟋ず党く同様
にしお埗られたむンクリボンを甚いお蚘録したず
ころ、印加電圧を35V抵抗0.5KΩ、蚘録電力
2.45Wでもシダヌプな蚘録は埗られず、このず
き、蚘録媒䜓が焊げる臭気が若干した。これはア
ルミニりム蒞着局による電流の集䞭効果のため、
小さな面積で倧熱量が発生したこずによるず考え
られおいる。
Comparative Example 3 Recording was performed using an ink ribbon obtained in exactly the same manner as in Example 1, except that a transfer layer was provided directly on the aluminum layer without providing a release layer. When an applied voltage of 35 V (resistance 0.5 KΩ) and a recording power of
Even at 2.45W, no sharp recording was obtained, and there was a slight smell of the recording medium burning. This was due to the current concentration effect of the aluminum vapor deposition layer.
This is thought to be due to a large amount of heat being generated in a small area.

効果 以䞊のように本考案の通電転写甚蚘録材料は埓
来の蚘録材料に比范しおスタむラス䞊での熱融着
は党くなく、カス汚れもなく、䜎トルクでリボン
の走行性に優れ信頌性の高い蚘録ができる。曎
に、本考案の蚘録材料によれば蚘録䜓の衚面の平
滑性に圱響されず䜎い印加電圧で鮮明な蚘録が埗
られる。又、必芁により黒以倖のカラヌ印字も容
易に可胜である。
(Effects) As described above, compared to conventional recording materials, the recording material for electrical transfer of the present invention has no heat fusion on the stylus, no scum stains, low torque, excellent ribbon running performance, and is reliable. You can record high quality records. Further, according to the recording material of the present invention, clear recording can be obtained with a low applied voltage without being affected by the smoothness of the surface of the recording medium. Furthermore, printing in colors other than black is easily possible if necessary.

【図面の簡単な説明】[Brief explanation of the drawing]

第図及び第図は本考案に係る通電転写甚蚘
録材料の二䟋の断面図、第図は通電転写甚蚘録
法を説明するための図である。   基材、  むンク局、  蚘録䜓
被転写玙など、  耐熱スリツプ局、 
 抵抗局、  アルミニりム蒞着局、 
 剥離局、  転写局、  衚面局、
  蚘録電極、  垰路電極。
1 and 2 are cross-sectional views of two examples of the recording material for electrical transfer according to the present invention, and FIG. 3 is a diagram for explaining the recording method for electrical transfer. DESCRIPTION OF SYMBOLS 1... Base material, 2... Ink layer, 3... Recording body (transfer paper, etc.), 4... Heat-resistant slip layer, 11...
...Resistance layer, 12... Aluminum vapor deposition layer, 21...
... Peeling layer, 22 ... Transfer layer, 23 ... Surface layer, 4
1... Recording electrode, 42... Return electrode.

Claims (1)

【実甚新案登録請求の範囲】 (1) 導電性暹脂フむルムの片面に金属薄膜局を蚭
け、その金属薄膜局䞊に熱溶融性剥離局を介し
お熱転写性のむンク局を蚭け、該フむルムの他
方の面に耐熱スリツプ局を蚭けたこずを特城ず
する通電転写甚蚘録材料。 (2) 前蚘金属薄膜局がアルミニりム蒞着局である
実甚新案登録請求の範囲第項蚘茉の通電転写
甚蚘録材料。 (3) 前蚘耐熱スリツプ局の䞻成分ずしお宀枩自己
瞮合型シリコヌンゎムを甚いた実甚新案登録請
求の範囲第項蚘茉の通電転写甚蚘録材料。 (4) 前蚘導電性暹脂フむルムが芳銙族ポリアミド
暹脂及び導電性カヌボンブラツクを䞻成分ずし
たものである実甚新案登録請求の範囲第項蚘
茉の通電転写甚蚘録材料。 (5) 前蚘導電性暹脂フむルムの厚さが〜15Ό
である実甚新案登録請求の範囲第項蚘茉の通
電転写甚蚘録材料。 (6) 前蚘金属薄膜局の厚さが40〜200nである
実甚新案登録請求の範囲第項蚘茉の通電転写
甚蚘録材料。
[Claims for Utility Model Registration] (1) A metal thin film layer is provided on one side of a conductive resin film, a thermally transferable ink layer is provided on the metal thin film layer via a heat-melting peeling layer, and the other side of the film is A recording material for electrical transfer, characterized in that a heat-resistant slip layer is provided on the surface. (2) The recording material for electrical transfer according to claim 1, wherein the metal thin film layer is an aluminum vapor-deposited layer. (3) The recording material for electrical transfer according to claim 1, which uses a room temperature self-condensing silicone rubber as the main component of the heat-resistant slip layer. (4) The recording material for electrical transfer according to claim 1, wherein the conductive resin film contains aromatic polyamide resin and conductive carbon black as main components. (5) The thickness of the conductive resin film is 2 to 15 ÎŒm.
A recording material for electrical transfer according to claim 1 of the utility model registration claim. (6) The recording material for electrical transfer according to claim 1, wherein the metal thin film layer has a thickness of 40 to 200 nm.
JP7542087U 1987-05-20 1987-05-20 Expired - Lifetime JPH0524537Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7542087U JPH0524537Y2 (en) 1987-05-20 1987-05-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7542087U JPH0524537Y2 (en) 1987-05-20 1987-05-20

Publications (2)

Publication Number Publication Date
JPS63184766U JPS63184766U (en) 1988-11-28
JPH0524537Y2 true JPH0524537Y2 (en) 1993-06-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP7542087U Expired - Lifetime JPH0524537Y2 (en) 1987-05-20 1987-05-20

Country Status (1)

Country Link
JP (1) JPH0524537Y2 (en)

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Publication number Priority date Publication date Assignee Title
JP2537979B2 (en) * 1988-08-05 1996-09-25 束䞋電噚産業株匏䌚瀟 Resistant composition film and recording material

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JPS63184766U (en) 1988-11-28

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