JPH0523530A - Gas absorbing method and apparatus - Google Patents
Gas absorbing method and apparatusInfo
- Publication number
- JPH0523530A JPH0523530A JP3201050A JP20105091A JPH0523530A JP H0523530 A JPH0523530 A JP H0523530A JP 3201050 A JP3201050 A JP 3201050A JP 20105091 A JP20105091 A JP 20105091A JP H0523530 A JPH0523530 A JP H0523530A
- Authority
- JP
- Japan
- Prior art keywords
- absorbent
- gas
- differential pressure
- filter cloth
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Treating Waste Gases (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、都市ゴミの焼却炉から
排出される排ガスや、石炭焚ボイラから排出される排ガ
スの中に含まれる塩化水素や硫黄酸化物等の有害ガスを
吸収するガス吸収方法および装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas that absorbs harmful gases such as hydrogen chloride and sulfur oxides contained in exhaust gas discharged from an incinerator for municipal waste and exhaust gas discharged from a coal-fired boiler. An absorption method and apparatus.
【０００２】[0002]
【従来の技術】従来、この種のガス吸収装置としては、
吸収剤の供給部と前段吸収反応部、および後段吸収反応
部と除塵部とを兼ねたバグフィルタ、の組合せによるも
のが広く使用されている。2. Description of the Related Art Conventionally, as this type of gas absorbing device,
A combination of an absorbent supply section and a front-stage absorption reaction section, and a combination of a back-stage absorption reaction section and a bag filter also serving as a dust removal section is widely used.
【０００３】図３は、従来のガス吸収装置の代表例とし
て、都市ゴミの焼却炉から排出される排ガス中の有害ガ
スを吸収処理する装置を示す。図３に於いて、焼却炉１
から排出される排ガスは、冷却塔２によって冷却されて
から前段吸収反応部３に入る。この前段吸収反応部３の
内部には吸収剤を供給する供給部４が設置されている。
この吸収剤は、吸収剤サイロ５内に貯蔵されており、こ
の吸収剤サイロ５の下部からロータリバルブやテーブル
フィーダ等の定量供給装置６によって切り出され、吹き
込みブロワー７によって上記供給部４へ空気輸送され
る。上記前段吸収反応部３の内部では、供給部４から供
給された吸収剤と、上記排ガス中の有害ガスとが、ある
程度反応する、いわゆる前段吸収反応が行われる。この
前段吸収反応部３から送り出される排ガス中には、前記
焼却炉１で発生したダスト、前段吸収反応部３で発生し
た反応生成物および未反応の吸収剤が含まれている。こ
の排ガスはバグフィルタ８に入り、その中に設置されて
いる濾布９を通過する際に除塵される。濾布９では、前
記除塵とともに未反応の吸収剤と排ガス中の有害ガスと
が反応する、いわゆる後段吸収反応が行われる。ガス吸
収と除塵処理された排ガスは、バグフィルタ８から送り
出された後、誘引送風機１０を経て煙突１１から大気中
に排出される。FIG. 3 shows, as a typical example of a conventional gas absorption device, a device for absorbing and treating harmful gas in exhaust gas discharged from an incinerator for municipal waste. In Figure 3, incinerator 1
The exhaust gas discharged from the cooling tower 2 is cooled by the cooling tower 2 and then enters the pre-stage absorption reaction section 3. Inside the pre-stage absorption reaction section 3, a supply section 4 for supplying an absorbent is installed.
This absorbent is stored in the absorbent silo 5, is cut out from the lower portion of the absorbent silo 5 by a fixed quantity supply device 6 such as a rotary valve or a table feeder, and is pneumatically transported to the supply section 4 by a blower blower 7. To be done. Inside the pre-stage absorption reaction section 3, a so-called pre-stage absorption reaction is performed in which the absorbent supplied from the supply section 4 and the harmful gas in the exhaust gas react to some extent. The exhaust gas sent from the pre-stage absorption reaction section 3 contains the dust generated in the incinerator 1, the reaction product generated in the pre-stage absorption reaction section 3 and the unreacted absorbent. The exhaust gas enters the bag filter 8 and is dust-removed when passing through the filter cloth 9 installed therein. In the filter cloth 9, a so-called second-stage absorption reaction is performed in which the unreacted absorbent and the harmful gas in the exhaust gas react with the dust removal. The exhaust gas, which has undergone gas absorption and dust removal processing, is sent out from the bag filter 8 and then discharged from the chimney 11 into the atmosphere via the induction blower 10.
【０００４】図３に示す処理工程でのガス吸収には、一
般的な吸収剤として消石灰が使用され、主に次の吸収反
応が行われる。
２ＨＣｌ＋Ｃａ（ＯＨ）2 → ＣａＣｌ2＋２Ｈ2Ｏ
ＳＯ3＋Ｃａ（ＯＨ）2 → ＣａＳＯ4＋Ｈ2Ｏ
ＳＯ2＋Ｃａ（ＯＨ）2 → ＣａＳＯ3＋Ｈ2Ｏ
これらの反応は、上述のように前段吸収反応部および後
段吸収反応部で行われるが、前段吸収反応部で十分な反
応時間がとれない場合には、主に後段吸収反応部で行わ
れる。For gas absorption in the treatment process shown in FIG. 3, slaked lime is used as a general absorbent, and the following absorption reaction is mainly carried out. 2HCl + Ca (OH) 2 → CaCl 2 + 2H 2 O SO 3 + Ca (OH) 2 → CaSO 4 + H 2 O SO 2 + Ca (OH) 2 → CaSO 3 + H 2 O These reactions are as described above in the previous stage absorption reaction part. And the latter stage absorption reaction part, but when the sufficient reaction time cannot be taken in the first stage absorption reaction part, it is mainly carried out in the second stage absorption reaction part.
【０００５】また、図４のように前段吸収反応部を設け
ず、ダクト３′に吸収剤を直接供給する場合は、ほとん
どの反応は後段吸収反応部で行われる。この後段吸収反
応は図５に示すように、主に濾布９の表面に形成される
粉体層１２で行われる。この粉体層１２は、ダストや反
応生成物や未反応吸収剤で構成される粉体層１２ａと、
未反応吸収剤をほとんど含まない粉体層１２ｂとに分け
られる。粉体層１２ｂは、濾布９の表面に複雑に絡み合
った粉体層であり、バグフィルタのエアーパルスや逆洗
による払い落とし操作では払い落としされずに常に濾布
９の表面に付着している。そのため、この粉体層１２ｂ
中に当初含まれていた未反応吸収剤は、運転経過ととも
に排ガスと反応して反応生成物を生ずるので、未反応の
吸収剤は含まれなくなる。When the absorbent is directly supplied to the duct 3'without providing the front absorption reaction section as shown in FIG. 4, most of the reaction is carried out in the second absorption reaction section. As shown in FIG. 5, this post-stage absorption reaction is mainly performed in the powder layer 12 formed on the surface of the filter cloth 9. The powder layer 12 includes a powder layer 12a composed of dust, a reaction product, and an unreacted absorbent,
It is divided into a powder layer 12b containing almost no unreacted absorbent. The powder layer 12b is a powder layer that is intricately entangled with the surface of the filter cloth 9, and is not adhered to the surface of the filter cloth 9 without being wiped off by an air pulse of the bag filter or a backwashing operation. There is. Therefore, this powder layer 12b
The unreacted absorbent originally contained therein reacts with the exhaust gas with the progress of operation to generate a reaction product, so that the unreacted absorbent is not included.
【０００６】一方、粉体層１２ａはバグフィルタの上記
払い落とし操作により払い落とされる粉体層である。従
って、図６に示すように、未反応の吸収剤を含む粉体層
１２ａは、払い落とし直後は、濾布９の表面には存在し
ない。このため、払い落とし直後は、吸収反応に寄与す
る粉体層１２ａが形成されるまで吸収効率が低下すると
いう問題点があった。On the other hand, the powder layer 12a is a powder layer which is brushed off by the above brushing operation of the bag filter. Therefore, as shown in FIG. 6, the powder layer 12a containing the unreacted absorbent does not exist on the surface of the filter cloth 9 immediately after being removed. Therefore, there is a problem that the absorption efficiency is lowered immediately after the powder is removed until the powder layer 12a that contributes to the absorption reaction is formed.
【０００７】さらに、表面に微細な多孔質体のポリ四フ
ッ化エチレンをラミネートした濾布９を使用した場合、
このラミネートにより粉体の濾布への付着性は著しく低
減され、払い落とし直後は、すべての粉体層１２が濾布
９の表面から無くなることになる。この場合も、払い落
とし直後は、吸収反応に寄与する粉体層１２ａが形成さ
れるまで、吸収効率が低下するという問題点があった。Further, when a filter cloth 9 having a fine porous polytetrafluoroethylene laminated on the surface is used,
By this lamination, the adhesion of the powder to the filter cloth is significantly reduced, and immediately after the powder is wiped off, all the powder layers 12 are removed from the surface of the filter cloth 9. Also in this case, there is a problem that the absorption efficiency is lowered immediately after the removal, until the powder layer 12a that contributes to the absorption reaction is formed.
【０００８】[0008]
【発明が解決しようとする課題】本発明は、上記従来の
問題点を解決するためになされたもので、その目的とす
るところは、吸収剤による排ガス中の有害ガスの吸収反
応を総合的に且つ安定的に持続させ、吸収効率の低下を
防止することが可能なガス吸収方法および装置を提供す
ることにある。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art, and its purpose is to comprehensively analyze the absorption reaction of harmful gas in exhaust gas by the absorbent. It is another object of the present invention to provide a gas absorption method and device capable of stably maintaining and preventing a decrease in absorption efficiency.
【０００９】[0009]
【課題を解決するための手段】本発明のガス吸収方法
は、吸収剤を供給して排ガス中の有害ガスと吸収反応せ
しめ、その後、該排ガスをバグフィルタの濾布により除
塵処理するとともに、該濾布表面の粉体層で未反応の吸
収剤と有害ガスとを吸収反応せしめるガス吸収方法にお
いて、上記濾布の差圧を検出し、その検出値に基づいて
吸収剤の供給量を増加させことを特徴とする。上記吸収
剤の供給は、払い落とし直前に増加させることを特徴と
する。また、上記吸収剤の増加供給を払い落とし後に元
の供給量に戻すことを特徴とする。The gas absorption method of the present invention comprises supplying an absorbent to cause an absorption reaction with harmful gas in the exhaust gas, and then subjecting the exhaust gas to dust removal with a filter cloth of a bag filter, In the gas absorption method in which the unreacted absorbent and the harmful gas are absorbed and reacted in the powder layer on the surface of the filter cloth, the differential pressure of the filter cloth is detected, and the supply amount of the absorbent is increased based on the detected value. It is characterized by The supply of the absorbent is characterized in that it is increased immediately before the removal. Further, it is characterized in that the increased supply of the absorbent is returned to the original supply amount after being eliminated.
【００１０】また、本発明のガス吸収装置は、吸収剤を
供給して排ガス中の有害ガスと吸収反応せしめる前段吸
収反応部と、該反応部に吸収剤を供給する定量供給装置
と、吸収反応した排ガスを除塵処理するバグフィルタの
濾布と、該濾布表面の粉体層で未反応の吸収剤と有害ガ
スとを吸収反応せしめる後段吸収反応部からなるガス吸
収装置において、上記濾布の差圧を検出する差圧センサ
ーと、該差圧センサーの検出値が設定値に一致した時に
吸収剤の供給量の増加の指令信号を上記定量供給装置に
出力する制御装置から構成したことを特徴とする。上記
設定値は、払い落とし時の差圧より低い値に設定する吸
収剤供給量増加用差圧設定装置を設けたことを特徴とす
る。さらに、払い落としから元の供給量に戻すまでの時
間を設定するタイマーを設けたことを特徴とする。Further, the gas absorption device of the present invention comprises a pre-stage absorption reaction section for supplying an absorbent to cause an absorption reaction with a harmful gas in exhaust gas, a fixed quantity supply device for supplying the absorption agent to the reaction section, and an absorption reaction. A filter cloth of a bag filter for removing dust from the exhaust gas, and a gas absorbing device comprising a post-absorption reaction section for absorbing and reacting unreacted absorbent and harmful gas in the powder layer on the surface of the filter cloth, A differential pressure sensor for detecting a differential pressure, and a control device for outputting a command signal for increasing the supply amount of the absorbent to the quantitative supply device when the detected value of the differential pressure sensor matches a set value. And The above set value is characterized in that a differential pressure setting device for increasing the supply amount of the absorbent is provided, which is set to a value lower than the differential pressure at the time of cleaning. Furthermore, it is characterized in that a timer is provided for setting the time from the time when the amount of money is paid off to the time when the original amount of supply is restored.
【００１１】[0011]
【実施例】以下、本発明の一実施例について図面を参照
しながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【００１２】図１は本発明のガス吸収装置のフロー図で
あって、焼却炉１、冷却塔２、前段吸収反応部３、供給
部４、吸収剤サイロ５、定量供給装置６、吹き込みブロ
ワー７、バグフィルタ８、濾布９、誘引送風機１０およ
び煙突１１の構成および機能は、図３の従来例のものと
同じであるので、その詳細な説明は省略する。FIG. 1 is a flow chart of the gas absorption apparatus of the present invention, which comprises an incinerator 1, a cooling tower 2, a pre-stage absorption reaction section 3, a supply section 4, an absorbent silo 5, a fixed quantity supply apparatus 6, and a blower blower 7. Since the configurations and functions of the bag filter 8, the filter cloth 9, the induced air blower 10 and the chimney 11 are the same as those of the conventional example of FIG. 3, detailed description thereof will be omitted.
【００１３】図１において、１３は制御装置であって、
主として粉体払落し用差圧設定装置Ａ、吸収剤供給量増
加用差圧設定装置Ｂおよび吸収剤供給増加量・供給時間
設定装置Ｃから構成されている。これらの差圧設定装置
ＡおよびＢには、上記バグフィルタ８に設けられた差圧
センサー１４から差圧値の信号が入力される。差圧設定
装置Ａからは濾布９の粉体払い落とし装置１５に指令信
号が出力される。また、差圧設定装置Ｂからは装置Ｃを
介して定量供給装置６に吸収剤の供給増加の指令信号が
出力される。In FIG. 1, 13 is a control device,
It is mainly composed of a powder discharging differential pressure setting device A, an absorbent supply amount increasing differential pressure setting device B, and an absorbent supply increasing amount / supply time setting device C. A signal of a differential pressure value is input to the differential pressure setting devices A and B from the differential pressure sensor 14 provided in the bag filter 8. A command signal is output from the differential pressure setting device A to the powder removing device 15 of the filter cloth 9. Further, the differential pressure setting device B outputs a command signal for increasing the supply of the absorbent to the constant amount supply device 6 via the device C.
【００１４】図２は濾布差圧と吸収剤供給との関係を示
すグラフであって、ａは粉体層１２を払い落とすための
差圧設定値であり、上記差圧設定装置Ａにより設定され
る。この値は、通常１００ｍｍＡｑ程度に設定する。ｂ
は定量供給装置６に吸収剤の供給増加の指令信号を出す
ための差圧設定値であって、上記設定装置Ｂにより設定
される。この値は、上記差圧設定値ａより数ｍｍＡｑ〜
１０ｍｍＡｑ程度低く設定される。また、この差圧設定
値ｂの値は、吸収剤の供給量変更との応答性によって決
定される。FIG. 2 is a graph showing the relationship between the filter cloth differential pressure and the absorbent supply, where a is a differential pressure set value for brushing off the powder layer 12, which is set by the differential pressure setting device A. To be done. This value is usually set to about 100 mmAq. b
Is a differential pressure set value for issuing a command signal for increasing the supply of the absorbent to the constant quantity supply device 6, and is set by the setting device B. This value is several mmAq to the above-mentioned differential pressure setting value a.
It is set lower by about 10 mmAq. The value of the differential pressure set value b is determined by the responsiveness to the change in the supply amount of the absorbent.
【００１５】ｃは、上記設定値ｂに基づく指令信号によ
り増加される吸収剤の供給量を示す。この供給量の増加
（ｃ−ｄ）は、上記設定値ｂに基づく指令信号を、図１
に示す吸収剤サイロ５の下部に設置された定量供給装置
６に与えて、そのモータ回転数を変える等の操作をする
ことにより行う。Ｔは吸収剤の増加供給時間であり、Ｔ
1は粉体払い落とし後の吸収剤の増加供給時間である。
これらの時間ＴおよびＴ1の設定は、上記設定装置Ｃの
タイマーにより行う。ｄは、吸収剤の通常の供給量を示
す。C indicates the supply amount of the absorbent which is increased by the command signal based on the set value b. The increase (cd) of the supply amount is based on the command signal based on the set value b shown in FIG.
It is carried out by applying it to the constant amount supply device 6 installed under the absorbent silo 5 shown in (1) and changing the motor speed. T is the increasing supply time of the absorbent, T
1 is the increased supply time of the absorbent after the powder has been removed.
These times T and T 1 are set by the timer of the setting device C. d indicates the usual supply amount of the absorbent.
【００１６】[0016]
１） 濾布の差圧の検出値に基づいて吸収剤の供給量を
増加せしめるようにしたので、吸収剤の供給量を迅速か
つ安定して制御することができる。
２） 濾布の粉体払い落とし直前に吸収剤の供給量を増
加せしめるようにしたので、吸収反応に寄与する粉体層
を速やかに形成せしめることができる。
３） 払い落とし後に元の供給量に戻すようにしたの
で、吸収剤の過剰供給を防止することができる。
４） 払い落とし直後の後段吸収反応の低下時に前段吸
収反応効率を上昇せしめ、総合的に吸収反応を維持せし
めることが可能である。1) Since the supply amount of the absorbent is increased based on the detected value of the differential pressure of the filter cloth, the supply amount of the absorbent can be controlled quickly and stably. 2) Since the supply amount of the absorbent is increased immediately before the powder is wiped off from the filter cloth, the powder layer that contributes to the absorption reaction can be quickly formed. 3) Since the original supply amount is restored after the removal, it is possible to prevent the excessive supply of the absorbent. 4) It is possible to increase the efficiency of the first-stage absorption reaction when the latter-stage absorption reaction decreases immediately after the removal, so that the overall absorption reaction can be maintained.
【図１】本発明のガス吸収方法を実施する排ガス処理フ
ロー図である。FIG. 1 is an exhaust gas treatment flow chart for carrying out the gas absorption method of the present invention.
【図２】本発明による濾布差圧と吸収剤供給との関係を
示すグラフである。FIG. 2 is a graph showing the relationship between the filter cloth differential pressure and the absorbent supply according to the present invention.
【図３】都市ゴミの焼却炉からの排ガスの処理フロー図
である。FIG. 3 is a process flow diagram of exhaust gas from an incinerator for municipal waste.
【図４】吸収剤をダクトに直接供給する場合の排ガス処
理フロー図である。FIG. 4 is a flow chart of exhaust gas treatment when the absorbent is directly supplied to the duct.
【図５】集塵中の濾布および粉体層の断面図である。FIG. 5 is a cross-sectional view of a filter cloth and a powder layer during dust collection.
【図６】払い落とし直後の粉体層の断面図である。FIG. 6 is a cross-sectional view of a powder layer immediately after being removed.
１ 焼却炉 ２ 冷却塔 ３ 前段吸収反応部 ３′ダクト ４ 供給部 ５ 吸収剤サイロ ６ 定量供給装置 ７ 吹き込みブロワー ８ バグフィルタ ９ 濾布 １０ 誘引送風機 １１ 煙突 １２ 粉体層 １２ａ 粉体層 １２ｂ 粉体層 １３ 制御装置 １４ 差圧センサー １５ 粉体払い落とし装置 Ａ 粉体払落し用差圧設定装置 ａ 設定値 Ｂ 吸収剤供給量増加用差圧設定装置 ｂ 設定値 Ｃ 吸収剤供給増加量・供給時間設定装置 ｃ 増加時の吸収剤供給量 ｄ 通常の吸収剤供給量 Ｔ 供給量増加時間 Ｔ1 供給量増加時間1 incinerator 2 cooling tower 3 pre-stage absorption reaction part 3'duct 4 supply part 5 absorbent silo 6 quantitative supply device 7 blowing blower 8 bag filter 9 filter cloth 10 induced blower 11 chimney 12 powder layer 12a powder layer 12b powder Layer 13 Control device 14 Differential pressure sensor 15 Powder removal device A Powder removal differential pressure setting device a Set value B Absorbent supply amount increase differential pressure setting device b Set value C Absorbent supply increase amount / supply time Setting device c Absorbent supply amount when increasing d Normal absorbent supply amount T Supply amount increasing time T 1 Supply amount increasing time
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 ＦＩ 技術表示箇所 Ｂ０１Ｄ 53/34 １３４ Ａ 6953−4Ｄ ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification code Office reference number FI technical display location B01D 53/34 134 A 6953-4D
Claims (6)
吸収反応せしめ、その後、該排ガスをバグフィルタの濾
布により除塵処理するとともに、該濾布表面の粉体層で
未反応の吸収剤と有害ガスとを吸収反応せしめるガス吸
収方法において、上記濾布の差圧を検出し、その検出値
に基づいて吸収剤の供給量を増加させことを特徴とする
ガス吸収方法。1. An absorbent is supplied to cause an absorption reaction with harmful gas in exhaust gas, and then the exhaust gas is subjected to dust removal treatment with a filter cloth of a bag filter, and unreacted absorption is carried out in a powder layer on the surface of the filter cloth. A gas absorption method for absorbing and reacting an agent with a harmful gas, wherein the differential pressure of the filter cloth is detected, and the amount of the absorbent supplied is increased based on the detected value.
増加させることを特徴とする請求項１記載のガス吸収方
法。2. The gas absorption method according to claim 1, wherein the supply amount of the absorbent is increased immediately before it is removed.
元の供給量に戻すことを特徴とする請求項１または２記
載のガス吸収方法。3. The gas absorption method according to claim 1, wherein the increased supply of the absorbent is returned to the original supply amount after being eliminated.
吸収反応せしめる前段吸収反応部と、該反応部に吸収剤
を供給する定量供給装置と、吸収反応した排ガスを除塵
処理するバグフィルタの濾布と、該濾布表面の粉体層で
未反応の吸収剤と有害ガスとを吸収反応せしめる後段吸
収反応部からなるガス吸収装置において、上記濾布の差
圧を検出する差圧センサーと、該差圧センサーの検出値
が設定値に一致した時に吸収剤の供給量の増加の指令信
号を上記定量供給装置に出力する制御装置から構成した
ことを特徴とするガス吸収装置。4. A pre-stage absorption reaction section for supplying an absorbent to cause an absorption reaction with a harmful gas in the exhaust gas, a quantitative supply device for supplying the absorbent to the reaction section, and a bag filter for removing dust from the exhaust gas after the absorption reaction. Differential pressure sensor for detecting the differential pressure of the filter cloth in the gas absorbing device comprising the filter cloth and the second-stage absorption reaction section for absorbing and reacting unreacted absorbent and harmful gas in the powder layer on the surface of the filter cloth. And a control device which outputs a command signal for increasing the supply amount of the absorbent to the quantitative supply device when the detection value of the differential pressure sensor matches the set value.
い値に設定する吸収剤供給量増加用差圧設定装置を設け
たことを特徴とする請求項４記載のガス吸収装置。5. The gas absorption device according to claim 4, further comprising a differential pressure setting device for increasing the supply amount of the absorbent for setting the set value to a value lower than the differential pressure at the time of cleaning.
時間を設定するタイマーを設けたことを特徴とする請求
項４または５記載のガス吸収装置。6. The gas absorption device according to claim 4, further comprising a timer for setting a time period from the time when the amount of money is paid off to the time when the amount of gas is returned to the original amount.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3201050A JPH0523530A (en) | 1991-07-17 | 1991-07-17 | Gas absorbing method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3201050A JPH0523530A (en) | 1991-07-17 | 1991-07-17 | Gas absorbing method and apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0523530A true JPH0523530A (en) | 1993-02-02 |
Family
ID=16434570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3201050A Pending JPH0523530A (en) | 1991-07-17 | 1991-07-17 | Gas absorbing method and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0523530A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05123515A (en) * | 1991-11-08 | 1993-05-21 | Plantec:Kk | Control of bag filter apparatus |
| JPH06154534A (en) * | 1992-09-22 | 1994-06-03 | Kazuo Mizutani | Cleaning controlling method for bag-type reactive dust collecting apparatus |
| US6964724B2 (en) | 1999-03-15 | 2005-11-15 | Nec Corporation | Etching and cleaning methods and etching and cleaning apparatuses used therefor |
| JP2008086844A (en) * | 2006-09-29 | 2008-04-17 | Dowa Holdings Co Ltd | Bag filter device and its controlling method |
| CN102679380A (en) * | 2011-03-01 | 2012-09-19 | 通用电气公司 | Methods and systems for removing pollutants from fluid stream |
| CN115382342A (en) * | 2022-08-25 | 2022-11-25 | 广东电网有限责任公司 | Adsorption device |
-
1991
- 1991-07-17 JP JP3201050A patent/JPH0523530A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05123515A (en) * | 1991-11-08 | 1993-05-21 | Plantec:Kk | Control of bag filter apparatus |
| JPH06154534A (en) * | 1992-09-22 | 1994-06-03 | Kazuo Mizutani | Cleaning controlling method for bag-type reactive dust collecting apparatus |
| US6964724B2 (en) | 1999-03-15 | 2005-11-15 | Nec Corporation | Etching and cleaning methods and etching and cleaning apparatuses used therefor |
| US7862658B2 (en) | 1999-03-15 | 2011-01-04 | Renesas Electronics Corporation | Etching and cleaning methods and etching and cleaning apparatuses used therefor |
| US8420549B2 (en) | 1999-03-15 | 2013-04-16 | Renesas Electronics Corporation | Etching and cleaning methods and etching and cleaning apparatuses used therefor |
| JP2008086844A (en) * | 2006-09-29 | 2008-04-17 | Dowa Holdings Co Ltd | Bag filter device and its controlling method |
| CN102679380A (en) * | 2011-03-01 | 2012-09-19 | 通用电气公司 | Methods and systems for removing pollutants from fluid stream |
| JP2012179593A (en) * | 2011-03-01 | 2012-09-20 | General Electric Co <Ge> | Method and system for removing pollutant from fluid stream |
| CN115382342A (en) * | 2022-08-25 | 2022-11-25 | 广东电网有限责任公司 | Adsorption device |
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