JPH0522998B2 - - Google Patents

Info

Publication number
JPH0522998B2
JPH0522998B2 JP59070374A JP7037484A JPH0522998B2 JP H0522998 B2 JPH0522998 B2 JP H0522998B2 JP 59070374 A JP59070374 A JP 59070374A JP 7037484 A JP7037484 A JP 7037484A JP H0522998 B2 JPH0522998 B2 JP H0522998B2
Authority
JP
Japan
Prior art keywords
word selection
selection line
drive
circuit
drive circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59070374A
Other languages
Japanese (ja)
Other versions
JPS60212893A (en
Inventor
Naoki Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59070374A priority Critical patent/JPS60212893A/en
Publication of JPS60212893A publication Critical patent/JPS60212893A/en
Publication of JPH0522998B2 publication Critical patent/JPH0522998B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/34Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using semiconductor devices

Description

【発明の詳細な説明】 (a) 発明の技術分野 本発明は半導体記憶装置等の語選択線駆動回路
にかかり、特にその消費電力を減少しかつ動作を
高速化する構成の改善に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to a word selection line drive circuit for a semiconductor memory device, etc., and particularly relates to an improvement in the structure of the word selection line drive circuit for reducing power consumption and speeding up the operation.

(b) 技術の背景 半導体集積回路装置の集積規模の拡大が急速に
進められているが特に記憶装置はその代表と目さ
れており、電子計算機の主記憶装置をはじめとし
て多くのシステムに広く用いられてその進歩に寄
与している。
(b) Background of the technology The scale of integration of semiconductor integrated circuit devices is rapidly expanding, and storage devices in particular are seen as a representative example of this, and are widely used in many systems, including the main storage devices of electronic computers. and contribute to its progress.

更にシリコン(Si)を半導体材料とする半導体
集積回路装置の進歩と併行して、電子移動度など
の特性がSiより遥に優れる砒化ガリウム
(GaAs)などの化合物半導体を用いて、Siの物
性による限界をこえる集積回路装置の開発が進め
られており、記憶装置についてもシヨツトキバリ
ア形電界効果トランジスタ、変調ドーピングを行
なつたヘテロ接合形電界効果トランジスタ等を素
子としてその開発が行なわれている。
Furthermore, along with advances in semiconductor integrated circuit devices that use silicon (Si) as a semiconductor material, compound semiconductors such as gallium arsenide (GaAs), which have properties such as electron mobility that are far superior to Si, are being used to improve the physical properties of Si. The development of integrated circuit devices that go beyond their limits is progressing, and storage devices are also being developed using shot-barrier field effect transistors, modulation-doped heterojunction field effect transistors, and the like as elements.

(c) 従来の技術と問題点 電界効果トランジスタ(以下FETと略称する)
を素子とする半導体記憶セルの1例を第1図に示
す。図においてT1乃至T6はエンハンスメントモ
ードのFETであり、FET T1及びT2は負荷素子
T3及びT4と共に2安定フリツプフロツプ回路を
構成して、T1又はT2のいずれか一方が導通状態
であることによつて2値情報“1”,“0”を記憶
する。またT5及びT6は記憶セルに記憶されてい
る情報を読出し、或いは新しい情報を記憶させる
ために、セルと外部回路とを電気的に接続するた
めのゲートトランジスタであり、そのゲート電極
に接続された語選択線Wによつて前記フリツプフ
ロツプ回路と桁信号線D,とをオン,オフす
る。
(c) Conventional technology and problems Field effect transistor (hereinafter abbreviated as FET)
FIG. 1 shows an example of a semiconductor memory cell having a semiconductor memory cell as an element. In the figure, T 1 to T 6 are enhancement mode FETs, and FETs T 1 and T 2 are load elements.
A bistable flip-flop circuit is formed together with T3 and T4 , and binary information " 1 " or "0" is stored when either T1 or T2 is in a conductive state. Further, T5 and T6 are gate transistors for electrically connecting the cell and an external circuit in order to read information stored in the memory cell or to store new information, and are connected to the gate electrode. The flip-flop circuit and the digit signal line D are turned on and off by the selected word selection line W.

前記記憶セルはマトリクス状に配設されてお
り、語選択線はデコーダによつて選択されて通常
バツフア増幅器によつて駆動される。第2図は従
来行なわれている語選択線駆動回路の例を示し、
T11はインバータ回路の駆動FET,T12はその負
荷FETである。駆動回路は選択された語選択線
を高レベルHとしてその記憶セルのゲートFET
T5及びT6をオンとし、非選択の語選択線を低レ
ベルLとしてその記憶セルのゲートFET T5及び
T6をオフに保つが、このためにはただ一つの選
択された語選択線を除いて、多数の非選択の語選
択線の前記駆動回路の駆動トランジスタT11がオ
ンとならなければならない。すなわち前記例の如
き駆動回路は選択動作のために多大の電流を必要
とする。
The memory cells are arranged in a matrix, the word selection lines being selected by a decoder and usually driven by a buffer amplifier. FIG. 2 shows an example of a conventional word selection line drive circuit.
T11 is the drive FET of the inverter circuit, and T12 is its load FET. The drive circuit sets the selected word selection line to a high level H to drive the gate FET of the memory cell.
T 5 and T 6 are turned on, and the unselected word selection line is set to low level L, and the gate FET T 5 and T 6 of the memory cell are turned on.
T 6 is kept off, but for this purpose the drive transistor T 11 of the drive circuit of a number of unselected word selection lines must be turned on, except for only one selected word selection line. That is, the drive circuit as in the above example requires a large amount of current for the selection operation.

半導体記憶装置において、消費電力の削減はそ
の集積度の増大,特性の向上のために極めて重要
であつて、前記の語選択線駆動回路についても改
善が必要である。
In semiconductor memory devices, reducing power consumption is extremely important for increasing the degree of integration and improving characteristics, and the word selection line drive circuit described above also needs to be improved.

(d) 発明の目的 本発明は前記問題点に対処して、非選択の語選
択線駆動回路の消費電力を減少させ、低消費電力
で高速の語選択線駆動回路を提供することを目的
とする。
(d) Purpose of the Invention The present invention addresses the above-mentioned problems and aims to reduce the power consumption of a non-selected word selection line drive circuit, thereby providing a low power consumption and high speed word selection line drive circuit. do.

(e) 発明の構成 本発明の前記目的は、駆動トランジスタ素子と
該駆動トランジスタ素子の負荷素子とを備えて、
該負荷素子が該駆動トランジスタ素子と接地線と
に接続され、かつ該駆動トランジスタ素子と該負
荷素子との接続点から語選択線に出力が供給され
る語選択線駆動回路により達成される。
(e) Structure of the Invention The object of the present invention is to provide a drive transistor element and a load element of the drive transistor element,
This is achieved by a word selection line drive circuit in which the load element is connected to the drive transistor element and a ground line, and an output is supplied to the word selection line from a connection point between the drive transistor element and the load element.

すなわち本発明においては、前記従来例とは逆
に負荷素子を接地線側,駆動トランジスタを非接
地電源側に接続することによつて、非選択の語選
択線の接地を駆動トランジスタがオフの状態、選
択された語選択線の高レベルHを駆動トランジス
タのオン状態によつて形成する。
That is, in the present invention, contrary to the conventional example, by connecting the load element to the ground line side and the drive transistor to the ungrounded power supply side, the ground of the unselected word selection line is connected to the state where the drive transistor is off. , a high level H of the selected word selection line is formed by the ON state of the drive transistor.

この回路構成の結果として、選択された語選択
線の駆動には充分な駆動電流を供給することがで
きて動作速度が向上し、多数の非選択の語選択線
駆動回路は電力を消費せず駆動回路全体として消
費電力が大幅に減少する。
As a result of this circuit configuration, sufficient drive current can be supplied to drive the selected word selection line, increasing operating speed, while many unselected word selection line driving circuits do not consume power. The power consumption of the entire drive circuit is significantly reduced.

(f) 発明の実施例 以下本発明を実施例により図面を参照して具体
的に説明する。
(f) Embodiments of the Invention The present invention will be specifically described below using embodiments with reference to the drawings.

第3図a及びbは本発明の実施例を示す回路図
である。図において、T21はnチヤンネルエンハ
ンスメントモードの駆動FET,T22はnチヤンネ
ルデイプリーシヨンモードの負荷FET,Rは負
荷抵抗体,Wは語選択線,Vssは接地線、VDD
非接地電源母線,Inは入力端を示す。
Figures 3a and 3b are circuit diagrams showing an embodiment of the invention. In the figure, T 21 is the drive FET in n-channel enhancement mode, T 22 is the load FET in n-channel depletion mode, R is the load resistor, W is the word selection line, V ss is the ground line, and V DD is ungrounded. Power bus, In indicates the input end.

すなわち駆動FET T21のドレインは電源母線
VDDに接続し、そのソースは負荷T22又はRに接
続する。負荷T22又はRの反対端は接地線VSS
接続し、語選択線Wへの出力は駆動FET T21
負荷T22又はRとの接続点から取出される。
In other words, the drain of drive FET T 21 is the power bus
V DD and its source is connected to load T 22 or R. The opposite end of the load T 22 or R is connected to the ground line V SS and the output to the word selection line W is taken from the connection point between the drive FET T 21 and the load T 22 or R.

本発明の駆動回路の動作は次のとおりである。
すなわち、選択される語選択線の駆動回路の入力
Inを高レベル,非選択の駆動回路の入力Inを低レ
ベルとする。選択された回路の駆動FET T21
オンとなり負荷T22又はRに電流が流れて語選択
線Wは高レベルHとなる。また非選択の回路の駆
動FET T21はオフであつて語線択線Wは低レベ
ルLに保たれる。本発明の駆動回路は上述の如く
動作するために、選択された駆動回路には充分な
駆動電流を与えて高速な動作を行わせることがで
き、非選択駆動回路は電力をほとんど消費しな
い。
The operation of the drive circuit of the present invention is as follows.
In other words, the input of the drive circuit of the selected word selection line
In is set to high level, and the input In of the unselected drive circuit is set to low level. The drive FET T 21 of the selected circuit is turned on, current flows through the load T 22 or R, and the word selection line W becomes high level H. Further, the drive FET T 21 of the non-selected circuit is off, and the word line selection line W is kept at a low level L. Since the drive circuit of the present invention operates as described above, sufficient drive current can be applied to the selected drive circuit to allow it to operate at high speed, while unselected drive circuits consume almost no power.

(g) 発明の効果 以上説明した如く本発明によれば、語選択線駆
動回路が選択時には充分な駆動電流が与えられ、
かつ非選択時には電力を消費せず、半導体記憶装
置を高速かつ低消費電力化する効果を有する。
(g) Effects of the Invention As explained above, according to the present invention, a sufficient drive current is applied to the word selection line drive circuit when the word selection line drive circuit is selected;
Moreover, no power is consumed when it is not selected, which has the effect of making the semiconductor memory device faster and with lower power consumption.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は半導体記憶装置の記憶セルの例を示す
回路図、第2図は語選択線駆動回路の従来例を示
す回路図、第3図a及びbは本発明の実施例を示
す回路図である。 図において、T21は駆動FET、T22は負荷
FET、Rは負荷抵抗体、Wは語選択線、VSSは接
地線、VDDは非接地電源母線、Inは入力端を示
す。
FIG. 1 is a circuit diagram showing an example of a memory cell of a semiconductor memory device, FIG. 2 is a circuit diagram showing a conventional example of a word selection line drive circuit, and FIGS. 3 a and b are circuit diagrams showing an embodiment of the present invention. It is. In the figure, T 21 is the drive FET and T 22 is the load
FET, R is a load resistor, W is a word selection line, V SS is a ground line, V DD is an ungrounded power supply bus, and In is an input terminal.

Claims (1)

【特許請求の範囲】[Claims] 1 駆動トランジスタ素子と該駆動トランジスタ
素子の負荷素子とを備えて、該負荷素子が該駆動
トランジスタ素子と接地線とに接続され、かつ該
駆動トランジスタ素子と該負荷素子との接続点か
ら語選択線に出力が供給されることを特徴とする
語選択線駆動回路。
1 comprising a drive transistor element and a load element for the drive transistor element, the load element is connected to the drive transistor element and a ground line, and a word selection line is connected from a connection point between the drive transistor element and the load element; A word selection line drive circuit, characterized in that an output is supplied to the word selection line drive circuit.
JP59070374A 1984-04-09 1984-04-09 Driving circuit of word selecting line Granted JPS60212893A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59070374A JPS60212893A (en) 1984-04-09 1984-04-09 Driving circuit of word selecting line

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59070374A JPS60212893A (en) 1984-04-09 1984-04-09 Driving circuit of word selecting line

Publications (2)

Publication Number Publication Date
JPS60212893A JPS60212893A (en) 1985-10-25
JPH0522998B2 true JPH0522998B2 (en) 1993-03-31

Family

ID=13429599

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59070374A Granted JPS60212893A (en) 1984-04-09 1984-04-09 Driving circuit of word selecting line

Country Status (1)

Country Link
JP (1) JPS60212893A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2687829B2 (en) * 1992-12-21 1997-12-08 松下電器産業株式会社 Memory and memory creation method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5819791A (en) * 1981-07-27 1983-02-04 Seiko Epson Corp Semiconductor storage device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5819791A (en) * 1981-07-27 1983-02-04 Seiko Epson Corp Semiconductor storage device

Also Published As

Publication number Publication date
JPS60212893A (en) 1985-10-25

Similar Documents

Publication Publication Date Title
US3493786A (en) Unbalanced memory cell
US7633315B2 (en) Semiconductor integrated circuit device
US4096584A (en) Low power/high speed static ram
US3995172A (en) Enhancement-and depletion-type field effect transistors connected in parallel
JP2723278B2 (en) Decoder / driver circuit for high capacitance line programming
US4465945A (en) Tri-state CMOS driver having reduced gate delay
JPS631778B2 (en)
US4665508A (en) Gallium arsenide MESFET memory
JPS61246995A (en) Nonvolatile random access memory device
JPH0746506B2 (en) Semiconductor memory device
US4701883A (en) ECL/CMOS memory cell with separate read and write bit lines
JPS6271088A (en) Static type ram
JPS6325714B2 (en)
JP3196301B2 (en) Compound semiconductor integrated circuit device
US4707808A (en) Small size, high speed GaAs data latch
KR900008438B1 (en) 3-state logic circuitry using resonance tunnel transistor
JP2601202B2 (en) Semiconductor storage device
JPS6187361A (en) Cmosram having combined bipolar transistor
KR20010012678A (en) Semi-conductor device with a memory cell
JPH0522998B2 (en)
US4996447A (en) Field-effect transistor load circuit
JP2002100744A (en) Memory device
US4504746A (en) Semiconductor buffer circuit using enhancement-mode, depletion-mode and zero threshold mode transistors
JPH0783062B2 (en) Master-slice type semiconductor device
JPS626370B2 (en)