JPH0522968B2 - - Google Patents
Info
- Publication number
- JPH0522968B2 JPH0522968B2 JP59106419A JP10641984A JPH0522968B2 JP H0522968 B2 JPH0522968 B2 JP H0522968B2 JP 59106419 A JP59106419 A JP 59106419A JP 10641984 A JP10641984 A JP 10641984A JP H0522968 B2 JPH0522968 B2 JP H0522968B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- fine particles
- film
- surface roughness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005291 magnetic effect Effects 0.000 claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 15
- 239000010419 fine particle Substances 0.000 claims description 13
- 230000003746 surface roughness Effects 0.000 claims description 13
- 230000005855 radiation Effects 0.000 claims description 8
- 238000000034 method Methods 0.000 description 20
- -1 vinyl heterocyclic compounds Chemical class 0.000 description 13
- 239000010408 film Substances 0.000 description 12
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 230000005294 ferromagnetic effect Effects 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 150000008365 aromatic ketones Chemical class 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 231100000987 absorbed dose Toxicity 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 230000037303 wrinkles Effects 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 150000001336 alkenes Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- RXOZTUMCVTYUNS-UHFFFAOYSA-N 2,6-dimethylheptan-4-one;2-hydroxy-1,2-diphenylethanone Chemical compound CC(C)CC(=O)CC(C)C.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 RXOZTUMCVTYUNS-UHFFFAOYSA-N 0.000 description 1
- XXGPFLQHCPMRDW-UHFFFAOYSA-N 2-[2-(2-hydroxyethoxy)ethoxy]ethanol 2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.CC(=C)C(O)=O.CC(=C)C(O)=O.OCCOCCOCCO XXGPFLQHCPMRDW-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000005997 Calcium carbide Substances 0.000 description 1
- 229920008347 Cellulose acetate propionate Polymers 0.000 description 1
- 229920001747 Cellulose diacetate Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 229910020632 Co Mn Inorganic materials 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- 229910020674 Co—B Inorganic materials 0.000 description 1
- 229910020678 Co—Mn Inorganic materials 0.000 description 1
- 229910020707 Co—Pt Inorganic materials 0.000 description 1
- 229910020710 Co—Sm Inorganic materials 0.000 description 1
- 229910020516 Co—V Inorganic materials 0.000 description 1
- 229910020514 Co—Y Inorganic materials 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910017061 Fe Co Inorganic materials 0.000 description 1
- 229910017082 Fe-Si Inorganic materials 0.000 description 1
- 229910017133 Fe—Si Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 229910018054 Ni-Cu Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018481 Ni—Cu Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910018605 Ni—Zn Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- NTXGQCSETZTARF-UHFFFAOYSA-N buta-1,3-diene;prop-2-enenitrile Chemical compound C=CC=C.C=CC#N NTXGQCSETZTARF-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- QXDMQSPYEZFLGF-UHFFFAOYSA-L calcium oxalate Chemical compound [Ca+2].[O-]C(=O)C([O-])=O QXDMQSPYEZFLGF-UHFFFAOYSA-L 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- DHZSIQDUYCWNSB-UHFFFAOYSA-N chloroethene;1,1-dichloroethene Chemical compound ClC=C.ClC(Cl)=C DHZSIQDUYCWNSB-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical class C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- MSYLJRIXVZCQHW-UHFFFAOYSA-N formaldehyde;6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound O=C.NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 MSYLJRIXVZCQHW-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- DLINORNFHVEIFE-UHFFFAOYSA-N hydrogen peroxide;zinc Chemical compound [Zn].OO DLINORNFHVEIFE-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000010954 inorganic particle Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 1
- VAKIVKMUBMZANL-UHFFFAOYSA-N iron phosphide Chemical compound P.[Fe].[Fe].[Fe] VAKIVKMUBMZANL-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical class OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 239000006249 magnetic particle Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- FPVKHBSQESCIEP-JQCXWYLXSA-N pentostatin Chemical compound C1[C@H](O)[C@@H](CO)O[C@H]1N1C(N=CNC[C@H]2O)=C2N=C1 FPVKHBSQESCIEP-JQCXWYLXSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000011269 tar Substances 0.000 description 1
- CLZWAWBPWVRRGI-UHFFFAOYSA-N tert-butyl 2-[2-[2-[2-[bis[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]amino]-5-bromophenoxy]ethoxy]-4-methyl-n-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]anilino]acetate Chemical compound CC1=CC=C(N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)C(OCCOC=2C(=CC=C(Br)C=2)N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)=C1 CLZWAWBPWVRRGI-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁気記録媒体に関し、さらに詳しく
は高密度記録に適した磁気記録媒体に関する。
〔従来技術〕
近年、開発が進められてきている高密度記録用
磁気記録媒体においては磁気ヘツドと磁気テープ
との間のいわゆる間隙損失を軽減させるため、磁
性層の表面性をより高度なものとすることが要求
される。この目的のためには、磁性層の製造技
術、すなわち磁性粒子の分散、塗布、表面成形技
術などの改良により磁性層の表面性を向上させる
ことが必要であると同時に、支持体の表面性を向
上させることもまた必要となる。とくに、記録密
度が高くなるにともない記録波長が小となること
により、厚み損失を逃がれるために磁性層を薄く
する試みがなされてきている。それにより、支持
体の表面性が磁性層の表面性に与える影響はます
ます大となつてきている。
〔発明が解決しようとする問題点〕
しかしながら磁気記録媒体に使用される支持体
の表面性を向上させることは下記の理由から限界
がある。つまり、製膜して巻き取る工程におい
て、フイルムの表面性が良いと搬送ローラーに対
する摩擦抵抗が大となり、しばしば蛇行を起こし
たり、シワが生じたりする。またフイルム間の摩
擦抵抗が増大し巻き取りロールの形状にユガミが
生じたりもする。
前記の背反する問題点の解決のために、これま
でに種々の試みがなされてきている。たとえば特
開昭53−109605には、支持体上に熱可塑性樹脂の
微粒子を突出させ、その后溶剤にて溶解除去しそ
の表面に磁性層を形成する方法が記載されてい
る。
また、特公昭46−14555には、支持体上にポリ
アミド、ポリエステル等のポリマー溶液を塗布、
乾燥させて、微小しわを形成し、その表面に磁性
層を形成する方法が記載されている。特公昭47−
6117には、支持体上に塗布するポリマーとしてコ
ポリエステル等を使つて、また特公昭50−38001
には、熱可塑性ポリエステル等を使つて、特公昭
46−14555と同じように表面に微小しわを形成し、
その表面に磁性層を形成する方法が記載されてい
る。
しかし、上述の4つの方法のいずれも、高密度
記録用磁気記録媒体としての満足すべき特性を安
定的に賦与しうるにはいたつていない。
本発明の目的は、高密度磁気記録用非磁性支持
体表面に、要求された表面粗さを有する層を安定
的に形成することにより、該非磁性支持体の表面
粗さをコントロールするにある。上記において言
う表面粗さは、通常の触針型粗さ計で測定できる
範囲から、触針では測れない微小な構造の粗さま
でをさす。
〔問題点を解決するための手段〕
すなわち、本発明は、1) 非磁性支持体と磁
性層との中間に、放射線照射により重合可能な化
合物と微粒子とを含有する非磁性層を設け、該層
が放射線照射されており、かつ、該層の表面あら
さが0.001〜0.01μmである。
なお、本発明における表面あらさとは、JIS−
B0601の5項で定義される中心線平均あらさをさ
し、カツトオフ値は0.25mmである。
以下、本発明について詳細に説明する。
本発明の中間層に使用される放射線照射により
重合可能な化合物は炭素−炭素不飽和結合を分子
中に1個以上有する化合物でありアクリル酸エス
テル類、アクリルアミド類、メタクリル酸エステ
ル類、メタクリルアミド類、アリル化合物、ビニ
ルエーテル類、ビニルエステル類、ビニル異節環
化合物、N−ビニル化合物、スチレン類、クロト
ン酸類、イタコン酸類、オレフイン類、オレフイ
ン類などが例としてあげられる。これらのうち好
ましいものとしてアクリロイル基またはメタクリ
ロイル基を2個以上含む下記の化合物があげられ
る。ジエチレングリコールジアクリレート、トリ
エチレングリコールジアクリレート、テトラエチ
レングリコールジアクリレート、トリメチロール
プロパントリアクリレート、ペンタエリスリトー
ルテトラアクリレート、などのアクリレート類、
ジエチレングリコールジメタクリレート、トリエ
チレングリコールトリメタクリレート、テトラエ
チレングリコールジメタクリレート、トリメチロ
ールプロパントリメタクリレート、ペンタエリス
リトールテトラメタクリレート、などのメタクリ
レート類あるいはその他の2官能以上のポリオー
ルとアクリル酸メタクリル酸とのエステル類、な
ど。
また、これらの化合物は高分子量体のものであ
つてもよい。好ましくは高分子の主鎖末端あるい
は側鎖にアクリル酸またはメタクリル酸とのエス
テル結合を有する化合物であり、これらは
A.Vranckem“Fatipec Congress”11 19(1972)
に引用されている。たとえば以下に示す化合物
であり、例示した化合物のポリエステル骨格がポ
リウレタン骨格、エポキシ樹脂の骨格、ポリエー
テル骨格、ポリカーボネート骨格であつてもある
いはこれらの混合された骨格でもよい。分子量は
1000〜20000が好ましいが、とくに限定されるも
のではない。
上記の放射線照射により重合可能な化合物は単
独に、また任意の割合で混合して使用することが
できる。
さらに塩ビ酢ビ系共重合体、繊維素系樹脂、ア
セタール系樹脂、塩ビ−塩化ビニリデン系樹脂、
ウレタン樹脂、アクリロニトリルブタジエン樹脂
等の熱可塑性樹脂を必要により前記放射線照射に
より重合可能な化合物と混合使用することができ
る。
本発明において使用される放射線は電子線およ
び紫外線である。紫外線を使用する場合には前記
の化合物に光重合開始剤を添加することが必要と
なる。
光重合開始剤としては芳香族ケトンが使用され
る。
芳香族ケトンは、特に限定されないが、紫外線
照射光源として通常使用される水銀灯の輝線スペ
クトルを生ずる254,313,365nmの波長において
吸光係数の比較的大なるものが好ましい。その代
表例としては、アセトフエノン、ベンゾフエノ
ン、ベンゾインエチルエーテル、ベンジルメチル
ケタール、ベンジルエチルケタール、ベンゾイン
イソブチルケトン、ヒドロキシジメチルフエニル
ケトン、1−ヒドロキシシクロヘキシルフエニル
ケトン、2−2ジエトキシアセトフエノン、
Michler′sケトンなどがあり、種々の芳香族ケト
ンが使用できる。
芳香族ケトンの混合比率は、化合物(a)100重量
部に対し0.5〜20重量部、好ましくは2〜15重量
部、さらに好ましくは3〜10重量部である。
本発明の中間層に混合される微粒子は、径にし
て100〜5000Åの大きさの球状もしくはフレーク
状のものである。該微粒子の該中間層表面上の露
出部は、高さ50〜2000Åで、露出個数は106〜109
個/mm2の範囲に設定される。上記の微粒子の径、
および露出粒子密度は、磁気記録媒体の用途に応
じて、より狭い範囲に調製される。微粒子の素材
としては、様々なものがあるが、大きく分けて、
有機微粒子と無機微粒子に分けられる。有機微粒
子としては、ベンゾグアナミンホルムアルデヒ
ド、ポリテトラフルオロエチレンのように有機マ
ツト材として市販されているものが使用できる。
無機粒子としては、無機粉体、もしくは研磨剤と
称されるもので、成分を上げると、α−アルミ
ナ、γ−アルミナ、炭化ケイ素、酸化チタン、酸
化マグネシウム、リン化鉄、炭化チタン、窒化チ
タン、α−およびβ−酸化ケイ素、アルミニウ
ム、修酸カルシウム、鉄、α−酸化第1鉄、亜
鉛、二酸化亜鉛、酸化第2ニツケル、ニツケル
銅、クロミア、水酸化マグネシウム、ジルコニ
ア、イツトリア、セリア、ジルコン、酸化アンチ
モンなどがある。
上記非磁性層の表面あらさは、0.001〜0.01μm
であり、好ましくは0.002〜0.007μmである。
前記放射線照射により重合可能な化合および有
機あるいは無機微粒子を、また芳香族ケトンとの
混合物を支持体上に塗設する場合、種々の有機溶
媒が必要に応じ使用できる。この溶媒の添加量に
よつて微粒子の表面露出量を調節でき、したがつ
て表面あらさを調節できる。使用できる有機溶媒
としてはアセトン、メチルエチルケトン、メチル
イソブチルケトン、シクロヘキサノン等のケトン
系;メタノール、エタノール、プロパノール、ブ
タノール等のアルコール系;酢酸メチル、酢酸エ
チル、酢酸ブチル、乳酸エチル、酢酸グリコール
モノエチルエーテル等のエステル系;エーテル、
グリコールジメチルエーテル、グリコールモノエ
チルエーテル、ジオキサン等のグリコールエーテ
ル系;ベンゼン、トルエン、キシレン等のタール
系(芳香族炭化水素);メチレンクロライド、エ
チレンクロライド、四塩化炭素、クロロホルム、
エチレンクロルヒドリン、ジクロルベンゼン等が
あげられる。
電子線加速器としてはバンデグラーフ型のスキ
ヤニング方式、ダブルスキヤニング方式あるいは
カーテンビーム方式が採用できるが、好ましいの
は比較的安価で大出力が得られるカーテンビーム
方式である。電子線特性としては、加速電圧が10
〜1000kV、好ましくは50〜300kVであり、吸収
線量として0.5〜20メガラツド、好ましくは1〜
10メガラツドである。加速電圧が10kV以下の場
合は、エネルギーの透過量が不足し1000kVを超
えると重合に使われるエネルギー効率が低下し経
済的でない。
吸収線量が0.5メガラツド以下では硬化反応が
不充分で磁性層強度が得られず、20メガラツド以
上になると、硬化に使用されるエネルギー効率が
低下したり、被照射体が発熱し、特にプラステイ
ツク支持体が変形するので好ましくない。
本発明に使用される支持体はポリエチレンテレ
フタレート、ポリエチレン−2,6−ナフタレー
ト等のポリエステル類;ポリエチレン、ポリプロ
ピレン等のポリオレフイン類;セルローストリア
セテート、セルロースダイアセテート、セルロー
スアセテートブチレート、セルロースアセテート
プロピオネート等のセルロース誘導体;ポリ塩化
ビニル、ポリ塩化ビニリデン等のビニル系樹脂;
ポリカーボネート、ポリイミド、ポリアミドイミ
ド等のプラスチツクの他に用途に応じてアルミニ
ウム、銅、スズ、亜鉛またはこれらを含む非磁性
合金、不銹銅などの非磁性金属類;紙、パライタ
またはポリエチレン、ポリプロピレン、エチレン
−ブテン共重合体などの炭素数2〜10のα−ポリ
オレフイン類を塗布またはラミネートした紙など
である。
本発明に使用される非磁性支持体の表面あらさ
は、前記中間層の表面あらさと同等以上であるこ
とが好ましい。
支持体の裏面には走行性などの改良を目的とし
ていわゆるバツク層を設けることができる。この
場合、バツク層の表面あらさを0.010μm以上、好
ましくは0.015μm以上とすることにより本発明の
効果は同様に発揮される。
本発明の重合硬化層の上に設けられる磁性層は
強磁性粉末と結合剤とを主成分とするものであつ
ても、磁性金属薄膜であつてもよい。
本発明に適用される磁性金属薄膜の形成法は真
空槽内で膜を形成する方法あるいはメツキ法によ
ればよく、金属薄膜の形成速度の速いこと、製造
工程が簡単であること、あるいは排液処理等の必
要のないこと等の利点を有する真空槽内で膜を形
成する方法が好ましい。真空槽内で膜を形成する
方法とは希薄な気体あるいは真空空間中において
析出させようという物質またはその化合物を蒸気
あるいはイオン化した蒸気として基体となる支持
体上に析出させる方法で真空蒸着法、スパツタリ
ング法、イオンプレーテイング法、化学気相メツ
キ法等がこれに相当する。
さらに本発明において磁気記録層となるべき強
磁性金属層としては鉄、コバルト、ニツケルその
他の強磁性金属あるいはFe−Co、Fe−Ni、Co
−Ni、Fe−Si、Fe−Rh、Co−P、Co−B、Co
−Si、Co−V、Co−Y、Co−La、Co−Ce、Co
−Pr、Co−Sm、Co−Pt、Co−Mn、Fe−Co−
Ni、Co−Ni−P、Co−Ni−B、Co−Ni−Ag、
Co−Ni−Na、Co−Ni−Ce、Co−Ni−Zn、Co
−Ni−Cu、Co−Ni−W、Co−Ni−Re、Co−
Sm−Cu等の強磁性合金を真空槽内で膜を形成す
る方法あるいはメツキ法によつて薄膜状に形成せ
しめたもので、その膜厚は磁気記録媒体として使
用する場合0.05μm〜2μmの範囲であり特に0.1μ
m〜0.4μmが好ましい。
〔実施例〕
以下に本発明を実施例によりさらに具体的に説
明する。
実施例 1
14.5μ厚のポリエチレンテレフタレート支持体
上に、ボールミルで10時間混練分散した下記組成
の塗液を0.5μ厚で塗設し、加速電圧160kV、ビー
ム電流5mAで吸収線量5Mradの電子線照射を行
なつた。上記により形成された非磁性層の表面粗
さは0.004〔μ〕である。
Γ塗液:下記の組成の溶液をボールミルで5時
間、混練した。
ジエチレングリコールジアクリレート 250部
4フツ化エチレン樹脂粉末(粒子径約2000Å)
10部
トルエン 100部
アセトン 100部
上記溶液塗設側に、コバルトニツケル(Ni;
20wt%)を連続蒸着機により蒸着(いわゆる斜
蒸着)し強磁性薄膜(膜厚2000Å)を形成せし
め、1/2インチ巾にスリツトしてビデオ用の磁気
テープサンプルNo.1を得た。
比較例 1
実施例1において、塗液をジエチレングリコー
ルジアクリレートのみにし、他は実施例1と同様
に磁気テープサンプルNo.2を得た。
比較例 2
実施例1において塗液の成分の4フツ化エチレ
ン樹脂10部のかわりに炭化カルシウム(粒子径
8000Å)10部を加え、他は実施例1と同様にして
サンプルNo.3をえた。
比較例 3
実施例1に使つたベースフイルムを、そのま
ま、重合層を設けずに使い、他は実施例1と同じ
ように蒸着層を設けてサンプルNo.4を得た。
以上のサンプルについてビデオ感度、C/N、
および走行耐久性について調べた。(使用VTR:
松下電産製造、商品名「NV−8800」)
ビデオ感度:4MHzにおける再生出力を比較例
1を基準に(±0dB)測定した。
C/N:3MHz及び3.5MHzの搬送波(キヤリア
ー)を記録し、再生したときのキヤリアー
とノイズの比を比較例1を基準に(±
0dB)測定した。
走行耐久性:100回走行の後に、出力低下を測定
した。
結果を表に示す。
〔発明の効果〕
表より明らかなごとく、非磁性支持体表面に放
射線照射重合膜を設け、その膜内に微粒子を含有
させ、該重合膜の表面粗さを0.001〜0.01μmの範
囲内に調製し、該重合膜の上に強磁性層の設けら
れた磁気記録媒体は、著しいビデオS/N向上と
耐久性改善がなされていることがわかる。
【表】DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a magnetic recording medium, and more particularly to a magnetic recording medium suitable for high-density recording. [Prior Art] In recent years, magnetic recording media for high-density recording have been developed, and in order to reduce the so-called gap loss between the magnetic head and the magnetic tape, the surface properties of the magnetic layer have been improved. required to do so. For this purpose, it is necessary to improve the surface properties of the magnetic layer by improving the manufacturing technology of the magnetic layer, that is, the dispersion of magnetic particles, coating, surface forming technology, etc. At the same time, it is necessary to improve the surface properties of the support. It is also necessary to improve. In particular, as the recording density increases and the recording wavelength decreases, attempts have been made to make the magnetic layer thinner in order to avoid thickness loss. As a result, the influence of the surface properties of the support on the surface properties of the magnetic layer is becoming more and more significant. [Problems to be Solved by the Invention] However, there are limits to improving the surface properties of supports used in magnetic recording media for the following reasons. That is, in the process of forming and winding a film, if the film has good surface properties, the frictional resistance against the conveying roller will be large, often causing meandering or wrinkles. Furthermore, the frictional resistance between the films increases and the shape of the take-up roll may become distorted. Various attempts have been made to solve the above-mentioned contradictory problems. For example, JP-A-53-109605 describes a method in which fine particles of thermoplastic resin are made to protrude on a support, and then dissolved and removed with a solvent to form a magnetic layer on the surface. In addition, in Japanese Patent Publication No. 46-14555, a solution of polymers such as polyamide and polyester was coated on a support.
A method is described in which the material is dried to form fine wrinkles and a magnetic layer is formed on the surface thereof. Special Public Service 1977-
6117 uses copolyester etc. as a polymer to be coated on the support, and
For this purpose, we use thermoplastic polyester etc.
Forms minute wrinkles on the surface in the same way as 46-14555,
A method for forming a magnetic layer on the surface is described. However, none of the above four methods has reached the point where it is possible to stably impart satisfactory characteristics as a magnetic recording medium for high-density recording. An object of the present invention is to control the surface roughness of a nonmagnetic support for high-density magnetic recording by stably forming a layer having a required surface roughness on the surface of the support. The surface roughness referred to above refers to the range that can be measured with a normal stylus-type roughness meter to the roughness of minute structures that cannot be measured with a stylus. [Means for Solving the Problems] That is, the present invention provides: 1) A nonmagnetic layer containing a compound that can be polymerized by radiation irradiation and fine particles is provided between the nonmagnetic support and the magnetic layer; The layer is irradiated and has a surface roughness of 0.001 to 0.01 μm. In addition, the surface roughness in the present invention is defined as JIS-
It refers to the center line average roughness defined in Section 5 of B0601, and the cutoff value is 0.25 mm. The present invention will be explained in detail below. The compound polymerizable by radiation irradiation used in the intermediate layer of the present invention is a compound having one or more carbon-carbon unsaturated bonds in the molecule, and includes acrylic esters, acrylamides, methacrylic esters, and methacrylamide. Examples include allyl compounds, vinyl ethers, vinyl esters, vinyl heterocyclic compounds, N-vinyl compounds, styrenes, crotonic acids, itaconic acids, olefins, and olefins. Among these, preferred are the following compounds containing two or more acryloyl groups or methacryloyl groups. Acrylates such as diethylene glycol diacrylate, triethylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate,
Methacrylates such as diethylene glycol dimethacrylate, triethylene glycol trimethacrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol tetramethacrylate, or esters of acrylic acid and methacrylic acid with other bifunctional or higher functional polyols, etc. . Moreover, these compounds may be of high molecular weight. Preferably, it is a compound having an ester bond with acrylic acid or methacrylic acid at the end of the main chain or side chain of the polymer, and these are described in A. Vranckem "Fatipec Congress" 11 19 (1972).
quoted in. For example, the following compounds The polyester skeleton of the exemplified compound may be a polyurethane skeleton, an epoxy resin skeleton, a polyether skeleton, a polycarbonate skeleton, or a mixture of these skeletons. The molecular weight is
It is preferably 1,000 to 20,000, but is not particularly limited. The above-mentioned compounds that can be polymerized by radiation irradiation can be used alone or in combination in any proportion. In addition, vinyl chloride-vinylidene chloride copolymers, cellulose resins, acetal resins, vinyl chloride-vinylidene chloride resins,
Thermoplastic resins such as urethane resins and acrylonitrile butadiene resins can be used in combination with the compound polymerizable by radiation irradiation, if necessary. The radiation used in the present invention is an electron beam and ultraviolet radiation. When using ultraviolet light, it is necessary to add a photopolymerization initiator to the above-mentioned compound. Aromatic ketones are used as photopolymerization initiators. The aromatic ketone is not particularly limited, but one preferably has a relatively large extinction coefficient at wavelengths of 254, 313, and 365 nm, which produce the bright line spectrum of a mercury lamp commonly used as an ultraviolet irradiation light source. Representative examples include acetophenone, benzophenone, benzoin ethyl ether, benzyl methyl ketal, benzyl ethyl ketal, benzoin isobutyl ketone, hydroxydimethyl phenyl ketone, 1-hydroxycyclohexyl phenyl ketone, 2-2 diethoxyacetophenone,
Various aromatic ketones can be used, including Michler's ketone. The mixing ratio of the aromatic ketone is 0.5 to 20 parts by weight, preferably 2 to 15 parts by weight, and more preferably 3 to 10 parts by weight per 100 parts by weight of compound (a). The fine particles mixed in the intermediate layer of the present invention are spherical or flake-like particles with a diameter of 100 to 5000 Å. The exposed part of the fine particles on the surface of the intermediate layer has a height of 50 to 2000 Å, and the number of exposed particles is 10 6 to 10 9
It is set in the range of pieces/ mm2 . The diameter of the above fine particles,
and the exposed particle density are adjusted to a narrower range depending on the application of the magnetic recording medium. There are various materials for fine particles, but they can be broadly divided into:
It can be divided into organic fine particles and inorganic fine particles. As the organic fine particles, those commercially available as organic mat materials such as benzoguanamine formaldehyde and polytetrafluoroethylene can be used.
Inorganic particles are called inorganic powders or abrasives, and the ingredients include α-alumina, γ-alumina, silicon carbide, titanium oxide, magnesium oxide, iron phosphide, titanium carbide, and titanium nitride. , α- and β-silicon oxides, aluminum, calcium oxalate, iron, α-ferrous oxide, zinc, zinc dioxide, nickel oxide, copper nickel, chromia, magnesium hydroxide, zirconia, ittria, ceria, zircon. , antimony oxide, etc. The surface roughness of the above non-magnetic layer is 0.001 to 0.01 μm
and preferably 0.002 to 0.007 μm. When coating a mixture of a compound polymerizable by radiation irradiation, organic or inorganic fine particles, or an aromatic ketone on a support, various organic solvents can be used as necessary. By adjusting the amount of this solvent added, the amount of surface exposure of the fine particles can be adjusted, and therefore the surface roughness can be adjusted. Organic solvents that can be used include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; alcohols such as methanol, ethanol, propanol, and butanol; methyl acetate, ethyl acetate, butyl acetate, ethyl lactate, acetic acid glycol monoethyl ether, etc. ester system; ether,
Glycol ethers such as glycol dimethyl ether, glycol monoethyl ether, and dioxane; Tars (aromatic hydrocarbons) such as benzene, toluene, and xylene; methylene chloride, ethylene chloride, carbon tetrachloride, chloroform,
Examples include ethylene chlorohydrin and dichlorobenzene. As the electron beam accelerator, a Vandegraaf scanning method, a double scanning method, or a curtain beam method can be employed, but the curtain beam method is preferable because it is relatively inexpensive and can provide a large output. As for the electron beam characteristics, the accelerating voltage is 10
~1000kV, preferably 50-300kV, and the absorbed dose is 0.5-20 megarads, preferably 1-300kV.
It is 10 megarads. When the accelerating voltage is less than 10 kV, the amount of energy transmitted is insufficient, and when it exceeds 1000 kV, the energy efficiency used for polymerization decreases, making it uneconomical. If the absorbed dose is less than 0.5 megarads, the curing reaction will be insufficient and the strength of the magnetic layer will not be obtained.If the absorbed dose is more than 20 megarads, the energy efficiency used for curing will decrease and the irradiated object will generate heat, especially the plastic support. is undesirable because it deforms. Supports used in the present invention include polyesters such as polyethylene terephthalate and polyethylene-2,6-naphthalate; polyolefins such as polyethylene and polypropylene; cellulose triacetate, cellulose diacetate, cellulose acetate butyrate, cellulose acetate propionate, etc. Cellulose derivatives; vinyl resins such as polyvinyl chloride and polyvinylidene chloride;
In addition to plastics such as polycarbonate, polyimide, and polyamideimide, depending on the purpose, aluminum, copper, tin, zinc, non-magnetic alloys containing these, and non-magnetic metals such as non-rusting copper; paper, Paraita, or polyethylene, polypropylene, and ethylene. -Paper coated or laminated with α-polyolefins having 2 to 10 carbon atoms such as butene copolymers. The surface roughness of the nonmagnetic support used in the present invention is preferably equal to or higher than the surface roughness of the intermediate layer. A so-called back layer can be provided on the back surface of the support for the purpose of improving running properties and the like. In this case, the effects of the present invention can be similarly exhibited by setting the surface roughness of the back layer to 0.010 μm or more, preferably 0.015 μm or more. The magnetic layer provided on the polymerized hardened layer of the present invention may be mainly composed of ferromagnetic powder and a binder, or may be a magnetic metal thin film. The method of forming the magnetic metal thin film applied to the present invention may be a method of forming the film in a vacuum chamber or a plating method, and the following methods may be used: A method of forming a film in a vacuum chamber is preferred, since it has advantages such as not requiring any treatment. A method of forming a film in a vacuum chamber is a method in which the substance or its compound to be deposited is deposited as vapor or ionized vapor on a substrate as a base material in a dilute gas or vacuum space, such as vacuum evaporation method or sputtering. This corresponds to the method, ion plating method, chemical vapor plating method, etc. Further, in the present invention, the ferromagnetic metal layer to be the magnetic recording layer may be iron, cobalt, nickel or other ferromagnetic metals, or Fe-Co, Fe-Ni, Co.
-Ni, Fe-Si, Fe-Rh, Co-P, Co-B, Co
-Si, Co-V, Co-Y, Co-La, Co-Ce, Co
−Pr, Co−Sm, Co−Pt, Co−Mn, Fe−Co−
Ni, Co-Ni-P, Co-Ni-B, Co-Ni-Ag,
Co−Ni−Na, Co−Ni−Ce, Co−Ni−Zn, Co
−Ni−Cu, Co−Ni−W, Co−Ni−Re, Co−
A ferromagnetic alloy such as Sm-Cu is formed into a thin film by a method of forming a film in a vacuum chamber or a plating method, and the film thickness is in the range of 0.05 μm to 2 μm when used as a magnetic recording medium. and especially 0.1μ
m to 0.4 μm is preferable. [Example] The present invention will be explained in more detail below with reference to Examples. Example 1 On a 14.5μ thick polyethylene terephthalate support, a 0.5μ thick coating liquid of the following composition was kneaded and dispersed in a ball mill for 10 hours, and irradiated with an electron beam with an absorbed dose of 5 Mrad at an accelerating voltage of 160 kV and a beam current of 5 mA. I did this. The surface roughness of the nonmagnetic layer formed as described above was 0.004 [μ]. Γ Coating liquid: A solution having the following composition was kneaded in a ball mill for 5 hours. Diethylene glycol diacrylate 250 parts Tetrafluoroethylene resin powder (particle size approximately 2000Å)
10 parts toluene 100 parts acetone 100 parts Cobalt nickel (Ni;
A ferromagnetic thin film (film thickness 2000 Å) was formed by vapor deposition (so-called oblique vapor deposition) using a continuous vapor deposition machine, and the film was slit into 1/2 inch width to obtain video magnetic tape sample No. 1. Comparative Example 1 Magnetic tape sample No. 2 was obtained in the same manner as in Example 1 except that only diethylene glycol diacrylate was used as the coating liquid. Comparative Example 2 In Example 1, calcium carbide (particle size
Sample No. 3 was obtained in the same manner as in Example 1 except that 10 parts of 8000 Å) were added. Comparative Example 3 Sample No. 4 was obtained by using the base film used in Example 1 as it was without providing a polymerized layer, except for providing a vapor deposited layer in the same manner as in Example 1. For the above samples, video sensitivity, C/N,
and running durability. (VTR used:
(Manufactured by Matsushita Electric, trade name: "NV-8800") Video sensitivity: Playback output at 4 MHz was measured (±0 dB) based on Comparative Example 1. C/N: 3MHz and 3.5MHz carrier waves (carriers) are recorded and the ratio of carrier to noise when played back is based on Comparative Example 1 (±
0dB) was measured. Running durability: After running 100 times, the decrease in output was measured. The results are shown in the table. [Effects of the invention] As is clear from the table, a radiation-irradiated polymer film is provided on the surface of a non-magnetic support, fine particles are contained in the film, and the surface roughness of the polymer film is adjusted within the range of 0.001 to 0.01 μm. However, it can be seen that the magnetic recording medium in which the ferromagnetic layer is provided on the polymer film has a significant improvement in video S/N and durability. 【table】
Claims (1)
より重合可能な化合物と微粒子とを含有する非磁
性層を設け、該層が放射線照射されており、か
つ、該層の表面あらさが0.001〜0.01μmの範囲に
あることを特徴とする磁気記録媒体。1. A nonmagnetic layer containing a radiation-polymerizable compound and fine particles is provided between the nonmagnetic support and the magnetic layer, the layer is irradiated with radiation, and the surface roughness of the layer is 0.001 to 0.001. A magnetic recording medium characterized by being in the range of 0.01 μm.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10641984A JPS60251510A (en) | 1984-05-28 | 1984-05-28 | Magnetic recording medium |
US06/737,968 US4619856A (en) | 1984-05-28 | 1985-05-28 | Magnetic recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10641984A JPS60251510A (en) | 1984-05-28 | 1984-05-28 | Magnetic recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60251510A JPS60251510A (en) | 1985-12-12 |
JPH0522968B2 true JPH0522968B2 (en) | 1993-03-31 |
Family
ID=14433143
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10641984A Granted JPS60251510A (en) | 1984-05-28 | 1984-05-28 | Magnetic recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60251510A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61284829A (en) * | 1985-06-10 | 1986-12-15 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
JPH02265011A (en) * | 1989-04-06 | 1990-10-29 | Sony Corp | Magnetic recording medium |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5740747A (en) * | 1980-08-25 | 1982-03-06 | Sony Corp | Magnetic recording medium |
JPS57208628A (en) * | 1981-06-16 | 1982-12-21 | Sony Corp | Production of magnetic recording medium |
JPS58111126A (en) * | 1981-12-24 | 1983-07-02 | Fuji Photo Film Co Ltd | Magnetic recording material |
JPS5948825A (en) * | 1982-09-14 | 1984-03-21 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
JPS59207027A (en) * | 1983-05-09 | 1984-11-24 | Konishiroku Photo Ind Co Ltd | Magnetic recording medium |
JPS6038723A (en) * | 1983-08-09 | 1985-02-28 | Tdk Corp | Magnetic recording medium |
-
1984
- 1984-05-28 JP JP10641984A patent/JPS60251510A/en active Granted
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5740747A (en) * | 1980-08-25 | 1982-03-06 | Sony Corp | Magnetic recording medium |
JPS57208628A (en) * | 1981-06-16 | 1982-12-21 | Sony Corp | Production of magnetic recording medium |
JPS58111126A (en) * | 1981-12-24 | 1983-07-02 | Fuji Photo Film Co Ltd | Magnetic recording material |
JPS5948825A (en) * | 1982-09-14 | 1984-03-21 | Matsushita Electric Ind Co Ltd | Magnetic recording medium |
JPS59207027A (en) * | 1983-05-09 | 1984-11-24 | Konishiroku Photo Ind Co Ltd | Magnetic recording medium |
JPS6038723A (en) * | 1983-08-09 | 1985-02-28 | Tdk Corp | Magnetic recording medium |
Also Published As
Publication number | Publication date |
---|---|
JPS60251510A (en) | 1985-12-12 |
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