JPH05223855A - Micro-wiring current waveform measuring device - Google Patents
Micro-wiring current waveform measuring deviceInfo
- Publication number
- JPH05223855A JPH05223855A JP2694892A JP2694892A JPH05223855A JP H05223855 A JPH05223855 A JP H05223855A JP 2694892 A JP2694892 A JP 2694892A JP 2694892 A JP2694892 A JP 2694892A JP H05223855 A JPH05223855 A JP H05223855A
- Authority
- JP
- Japan
- Prior art keywords
- wiring
- sample
- probe
- current
- fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Measurement Of Current Or Voltage (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体チップ上等の微
細配線に流れる電流の波形を計測する微細配線電流波形
計測装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a fine wiring current waveform measuring device for measuring the waveform of a current flowing through a fine wiring on a semiconductor chip or the like.
【０００２】[0002]
【従来の技術】半導体チップ上の微細配線の信号波形計
測手段としては、電子ビームテスタやレーザビームテス
タが開発されている。これら計測手段は、配線の電圧波
形を計測することができるが、電流波形を計測すること
ができない。2. Description of the Related Art Electron beam testers and laser beam testers have been developed as means for measuring signal waveforms of fine wiring on a semiconductor chip. These measuring means can measure the voltage waveform of the wiring, but cannot measure the current waveform.
【０００３】[0003]
【発明が解決しようとする課題】本発明の目的は、微細
配線に流れる電流の波形を計測することが可能な微細配
線電流波形計測装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a fine wiring current waveform measuring device capable of measuring the waveform of a current flowing through a fine wiring.
【０００４】[0004]
【課題を解決するための手段及びその作用】本発明に係
る微細配線電流波形計測装置を、実施例図中の対応する
構成要素の符号を引用して説明する。A fine wiring current waveform measuring apparatus according to the present invention will be described with reference to the reference numerals of corresponding constituent elements in the drawings of the embodiments.
【０００５】この微細配線電流波形計測装置は、例えば
図１及び図２に示す如く、一端が固定され他端が自由端
とされリード線２６Ａ、２６Ｂが形成されたカンチレバ
ー２２と、カンチレバー２２の自由端に設けられ、端部
がリード線２６Ａ、２６Ｂと導通した配線ループ２８が
形成された探針２４と、カンチレバー２２の自由端部の
高さ変位を非接触で検出する変位検出器３８と、探針２
４に試料１６表面を対向させた状態で試料１６を３次元
的に微動させる微動ステージ１２、１４と、試料１６に
形成された配線１６ａに探針２４を接近させ、該高さ変
位が所定値になるように微動ステージ１２、１４を駆動
する走査回路１８、２０と、試料１６に形成された配線
１６ａに探針２４を接近させた状態で配線ループ２８に
生じた誘導起電力Ｅをリード線２６Ａ、２６Ｂを介して
検出する起電力検出回路３０と、検出された誘導起電力
Ｅを時間積分して、試料１６に形成された配線１６ａに
流れる電流Ｉを求める起電力／電流変換手段３４とを備
えている。In this fine wiring current waveform measuring apparatus, as shown in FIGS. 1 and 2, for example, a cantilever 22 having one end fixed and the other end free and having lead wires 26A and 26B formed, and a free cantilever 22. A probe 24 provided at an end and having a wiring loop 28 whose end is electrically connected to the lead wires 26A and 26B, and a displacement detector 38 for detecting the height displacement of the free end of the cantilever 22 in a non-contact manner, Probe 2
4, the fine movement stages 12 and 14 for finely moving the sample 16 three-dimensionally with the surface of the sample 16 facing each other and the wiring 16a formed on the sample 16 are brought close to the probe 24, and the height displacement is a predetermined value. And the scanning circuits 18 and 20 for driving the fine movement stages 12 and 14, and the induced electromotive force E generated in the wiring loop 28 with the probe 24 brought close to the wiring 16a formed on the sample 16. Electromotive force detection circuit 30 for detecting via electromotive force 26A and 26B, and electromotive force / current conversion means 34 for time-integrating the detected induced electromotive force E to obtain a current I flowing through wiring 16a formed on sample 16. Is equipped with.
【０００６】本発明によれば、従来計測できなかった微
細配線に流れる電流の波形を計測することが可能とな
る。According to the present invention, it becomes possible to measure the waveform of the current flowing through the fine wiring, which could not be measured conventionally.
【０００７】配線１６ａが作る電場により配線ループ２
８に誘導電荷が生じ、この誘導電荷が電場から力を受け
て、配線ループ２８と配線１６ａとの間に静電気力が働
く。The wiring loop 2 is formed by the electric field created by the wiring 16a.
Induced charges are generated in 8, and the induced charges receive a force from the electric field, and an electrostatic force acts between the wiring loop 28 and the wiring 16a.
【０００８】そこで、本発明の第１態様では、試料１６
に形成された配線１６ａと探針２４との間に働く静電気
力を、上記高さ変位と微動ステージ１４の高さ位置とに
基づいて検出し、該静電気力に基づいて配線１６ａの電
圧を検出する配線電圧検出手段３４を備えている。Therefore, in the first embodiment of the present invention, sample 16
The electrostatic force acting between the wiring 16a formed on the upper surface and the probe 24 is detected based on the height displacement and the height position of the fine movement stage 14, and the voltage of the wiring 16a is detected based on the electrostatic force. The wiring voltage detecting means 34 is provided.
【０００９】正確には、配線ループ２８に流れる誘導電
流が、配線１６ａに流れる電流で形成される磁界からロ
ーレンツ力を受ける。To be precise, the induced current flowing in the wiring loop 28 receives the Lorentz force from the magnetic field formed by the current flowing in the wiring 16a.
【００１０】そこで、静電気力に基づいて微細配線の電
圧をより正確に計測するために、本発明の第２態様で
は、配線電圧検出手段３４は、試料１６に形成された配
線１６ａに流れる電流が作る磁界と探針２４に形成され
た配線ループ２８に流れる誘導電流との間に働くローレ
ンツ力を、上記求められた電流Ｉに基づいて算出し、試
料１６に形成された配線１６ａと探針２４との間に働く
力から該ローレンツ力を差し引いて上記静電気力を求め
る。Therefore, in order to more accurately measure the voltage of the fine wiring based on the electrostatic force, in the second aspect of the present invention, the wiring voltage detecting means 34 causes the current flowing in the wiring 16a formed on the sample 16 to be The Lorentz force acting between the magnetic field created and the induced current flowing in the wiring loop 28 formed in the probe 24 is calculated based on the obtained current I, and the wiring 16a formed in the sample 16 and the probe 24 are calculated. The Lorentz force is subtracted from the force acting between and to obtain the electrostatic force.
【００１１】[0011]
【実施例】以下、図面に基づいて本発明の実施例を説明
する。Embodiments of the present invention will be described below with reference to the drawings.
【００１２】図１は、原子間力顕微鏡（Atomic Force M
icroscope :AFM）に適用された微細配線電流波形計測装
置を示す。FIG. 1 shows an atomic force microscope (Atomic Force M).
icroscope: AFM) shows a fine wiring current waveform measuring device.
【００１３】ベース１０の下部上にはＸ−Ｙ圧電ステー
ジ１２が配置され、Ｘ−Ｙ圧電ステージ１２上にはＺ圧
電ステージ１４が配置され、Ｚ圧電ステージ１４上には
試料１６が載置されている。Ｘ−Ｙ圧電ステージ１２及
びＺ圧電ステージ１４は、圧電素子の対向面に電極膜が
被着されて構成されている。Ｘ−Ｙ圧電ステージ１２
は、Ｘ−Ｙ走査回路１８からの駆動電圧に応じて図１の
紙面に垂直なＸ−Ｙ面内で試料１６を微動させる。Ｚ圧
電ステージ１４は、Ｚ走査回路２０からの駆動電圧に応
じてＸ−Ｙ面に垂直なＺ方向に試料１６を微動させる。
試料１６は、表面に集積回路が形成された半導体チップ
であり、その表面形状、微細配線の電圧波形及び電流波
形が計測対象となっている。An XY piezoelectric stage 12 is arranged on the lower portion of the base 10, a Z piezoelectric stage 14 is arranged on the XY piezoelectric stage 12, and a sample 16 is mounted on the Z piezoelectric stage 14. ing. Each of the XY piezoelectric stage 12 and the Z piezoelectric stage 14 is configured by depositing an electrode film on the facing surface of the piezoelectric element. XY piezoelectric stage 12
Causes the sample 16 to finely move in the XY plane perpendicular to the paper surface of FIG. 1 according to the drive voltage from the XY scanning circuit 18. The Z piezoelectric stage 14 finely moves the sample 16 in the Z direction perpendicular to the XY plane according to the drive voltage from the Z scanning circuit 20.
The sample 16 is a semiconductor chip having an integrated circuit formed on its surface, and its surface shape, voltage waveforms and current waveforms of fine wiring are measured.
【００１４】ベース１０の柱部にはカンチレバー２２の
一端が固定され、カンチレバー２２の自由端にはＺ方向
に延びた探針２４が形成されている。図２に示す如く、
カンチレバー２２上には互いに平行な一対のリード線２
６Ａ及び２６Ｂが形成され、探針２４上には三角形状の
配線ループ２８が形成され、配線ループ２８の一端がリ
ード線２６Ａと導通し、配線ループ２８の他端がリード
線２６Ｂと導通している。カンチレバー２２及び探針２
４は、例えば通常のＡＦＭと同様に、ＳｉＯ2膜やＳｉ
3 Ｎ4 膜等で形成される。また、リード線２６Ａ、２６
Ｂ及び配線ループ２８は、リゾグラフィー技術を用いて
形成される。図中の配線１６ａは、試料１６の表面に形
成された配線を示す。One end of the cantilever 22 is fixed to the pillar portion of the base 10, and a probe 24 extending in the Z direction is formed at the free end of the cantilever 22. As shown in Figure 2,
On the cantilever 22, a pair of lead wires 2 parallel to each other
6A and 26B are formed, a triangular wiring loop 28 is formed on the probe 24, one end of the wiring loop 28 is electrically connected to the lead wire 26A, and the other end of the wiring loop 28 is electrically connected to the lead wire 26B. There is. Cantilever 22 and probe 2
4 is a SiO 2 film or Si, similar to a normal AFM, for example.
It is formed of a 3 N 4 film or the like. Also, the lead wires 26A, 26
The B and the wiring loop 28 are formed by using a lithography technique. The wiring 16 a in the figure shows the wiring formed on the surface of the sample 16.
【００１５】カンチレバー２２の固定端側では、リード
線２６Ａ及び２６Ｂが図１に示す起電力検出回路３０の
入力端子に接続されている。起電力検出回路３０は、配
線ループ２８に生じた誘導起電力を、リード線２６Ａ、
２６Ｂを介して検出し、これを出力する。この出力は、
Ａ／Ｄ変換器３２でデジタル化され、信号処理回路３４
に供給されて、後述の如く配線１６ａに流れる電流の波
形及び電圧波形が算出され、その結果がレコーダ３６に
供給されて記録される。On the fixed end side of the cantilever 22, lead wires 26A and 26B are connected to the input terminal of the electromotive force detection circuit 30 shown in FIG. The electromotive force detection circuit 30 outputs the induced electromotive force generated in the wiring loop 28 to the lead wire 26A,
It is detected via 26B and is output. This output is
The signal processing circuit 34 is digitized by the A / D converter 32.
And the waveform of the current and the voltage waveform flowing through the wiring 16a are calculated as described later, and the results are supplied to the recorder 36 and recorded.
【００１６】ベース１０の上部には、カンチレバー２２
の自由端部上面に対向して変位検出器３８が配置されて
いる。この変位検出器３８は、カンチレバー２２の自由
端部の高さ（Ｚ方向）変位を非接触で検出するものであ
り、公知のＡＦＭと同様に、トンネル電流検出法、光波
干渉法又は光てこ法を用いた構成となっている。A cantilever 22 is provided on the upper portion of the base 10.
The displacement detector 38 is arranged so as to face the upper surface of the free end of the. The displacement detector 38 detects the height (Z direction) displacement of the free end of the cantilever 22 in a non-contact manner, and like the known AFM, the tunnel current detection method, the light wave interference method, or the optical lever method. It is configured using.
【００１７】変位検出器３８で検出された変位はＺ走査
回路２０に供給され、Ｚ走査回路２０はこの変位が設定
値になるようにＺ圧電ステージ１４に駆動電圧を供給す
る。The displacement detected by the displacement detector 38 is supplied to the Z scanning circuit 20, and the Z scanning circuit 20 supplies a drive voltage to the Z piezoelectric stage 14 so that the displacement becomes a set value.
【００１８】次に、上記の如く構成された本実施例の動
作を説明する。Next, the operation of this embodiment constructed as described above will be explained.
【００１９】Ｘ−Ｙ走査回路１８によりＸ−Ｙ圧電ステ
ージ１２を駆動して試料１６の表面を探針２４で走査し
ながら、変位検出器３８の出力が一定値になるようＺ圧
電ステージ１４を駆動する。Ｘ−Ｙ走査回路１８及びＺ
走査回路２０への駆動電圧に比例した電圧がレコーダ３
６に供給されて、試料１６の表面形状がレコーダ３６に
記録される。While driving the XY piezoelectric stage 12 by the XY scanning circuit 18 to scan the surface of the sample 16 with the probe 24, the Z piezoelectric stage 14 is moved so that the output of the displacement detector 38 becomes a constant value. To drive. XY scanning circuit 18 and Z
The voltage proportional to the driving voltage to the scanning circuit 20 is recorded by the recorder 3.
6, the surface shape of the sample 16 is recorded on the recorder 36.
【００２０】レコーダ３６に記録された試料１６の表面
形状から、計測対象の配線１６ａの幅方向中点位置を求
め、この位置を目標位置としてＸ−Ｙ走査回路１８に供
給する。Ｘ−Ｙ走査回路１８はこれに応答して、探針２
４を配線１６ａの幅方向中点位置上に位置させる。試料
１６にテスト信号を供給する前において、Ｚ走査回路２
０は、試料１６の表面形状計測時と同様に、変位検出器
３８の出力が設定値になるようにＺ圧電ステージ１４に
駆動電圧を印加し、安定したところでこの駆動電圧を固
定する。From the surface shape of the sample 16 recorded on the recorder 36, the width-direction midpoint position of the wiring 16a to be measured is determined, and this position is supplied to the XY scanning circuit 18 as a target position. In response to this, the XY scanning circuit 18 responds to the probe 2
4 is located on the middle position of the wiring 16a in the width direction. Before the test signal is supplied to the sample 16, the Z scanning circuit 2
In the case of 0, as in the case of measuring the surface shape of the sample 16, a drive voltage is applied to the Z piezoelectric stage 14 so that the output of the displacement detector 38 becomes a set value, and this drive voltage is fixed when stable.
【００２１】試料１６にテスト信号を供給して、配線１
６ａに電流を流す。これにより、配線１６ａの回りに磁
場が形成され、配線ループ２８に磁束が鎖交する。磁束
鎖交数の変化により配線ループ２８に誘導起電力Ｅが生
じ、この誘導起電力Ｅが起電力検出回路３０で検出され
る。誘導起電力Ｅは、配線１６ａに流れている電流Ｉの
時間微分値に比例する。そこで、信号処理回路３４はこ
の起電力を時間積分することにより、配線１６ａに流れ
る電流波形を求め、これをレコーダ３６に供給して記録
させる。A test signal is supplied to the sample 16 so that the wiring 1
A current is passed through 6a. As a result, a magnetic field is formed around the wiring 16a, and the magnetic flux is linked to the wiring loop 28. An induced electromotive force E is generated in the wiring loop 28 due to the change in the number of magnetic flux linkages, and the induced electromotive force E is detected by the electromotive force detection circuit 30. The induced electromotive force E is proportional to the time differential value of the current I flowing through the wiring 16a. Therefore, the signal processing circuit 34 obtains the waveform of the current flowing through the wiring 16a by integrating this electromotive force over time, and supplies this to the recorder 36 for recording.
【００２２】例えば図３（Ａ）に示すような電流が配線
１６ａに流れた場合、図３（Ｂ）に示すような誘導起電
力が起電力検出回路３０で検出される。なお、誘導起電
力Ｅと電流Ｉの時間微分値との間の比例定数は、標準試
料に対し既知の電流を流してこれを計測することによ
り、予め求めておく。For example, when a current as shown in FIG. 3A flows through the wiring 16a, an induced electromotive force as shown in FIG. 3B is detected by the electromotive force detection circuit 30. The constant of proportionality between the induced electromotive force E and the time derivative of the current I is obtained in advance by flowing a known current to the standard sample and measuring it.
【００２３】配線ループ２８の形状が、一辺が２０μｍ
の正三角形で、この正三角形の重心と配線１６ａとの間
隔が８．７μｍで、図３（Ａ）に示すような波形の電流
を配線１６ａに流した場合、誘導起電力Ｅは２．１ｐＶ
となる。The shape of the wiring loop 28 is 20 μm on each side.
If the distance between the center of gravity of the equilateral triangle and the wiring 16a is 8.7 μm and a current having a waveform as shown in FIG. 3A is applied to the wiring 16a, the induced electromotive force E is 2.1 pV.
Becomes
【００２４】電流検出能を高める必要がある場合には、
配線ループ２８の巻き数を増やし又は配線ループ２８の
内側に高透磁率の薄膜を被着する。配線ループ２８の巻
き数は、多層配線構造とし又は探針２４の両面に配線ル
ープ２８を形成することによって増やすことができる。When it is necessary to enhance the current detection capability,
The number of windings of the wiring loop 28 is increased or a thin film having a high magnetic permeability is applied to the inside of the wiring loop 28. The number of turns of the wiring loop 28 can be increased by forming a multilayer wiring structure or by forming the wiring loop 28 on both surfaces of the probe 24.
【００２５】配線１６ａが作る電場により配線ループ２
８に誘導電荷が生じ、この誘導電荷が電場から力を受け
て、配線ループ２８と配線１６ａとの間に静電気力が働
く。そこで、試料１６にテスト信号を供給する前の上記
安定した平衡状態からの変位を変位検出器３８で検出
し、この変位に基づいて、静電気力と原子間力との和を
求め、この和から原子間力を差し引いて静電気力を求
め、この静電気力から配線１６ａの電圧を求め、これを
レコーダ３６に供給する。この原子間力は、予め求めて
おいた原子間力と原子間距離との関係から算出する。The wiring loop 2 is formed by the electric field created by the wiring 16a.
Induced charges are generated in 8, and the induced charges receive a force from the electric field, and an electrostatic force acts between the wiring loop 28 and the wiring 16a. Therefore, the displacement from the stable equilibrium state before the test signal is supplied to the sample 16 is detected by the displacement detector 38, the sum of the electrostatic force and the atomic force is obtained based on this displacement, and from this sum The atomic force is subtracted to obtain the electrostatic force, the voltage of the wiring 16a is obtained from this electrostatic force, and this is supplied to the recorder 36. This interatomic force is calculated from the relationship between the interatomic force and the interatomic distance that has been obtained in advance.
【００２６】正確には、配線ループ２８に流れる誘導電
流が、配線１６ａに流れる電流で形成される磁界からロ
ーレンツ力を受けるので、静電気力に基づいて配線１６
ａの電圧をより正確に計測するには、カンチレバー２２
が追従して動く程度に配線１６ａに流れる電流の変化が
遅い場合、このローレンツ力を上記計測電流Ｉに基づい
て算出し、カンチレバー２２の受ける力から、このロー
レンツ力を上記原子間力と共に差し引く。To be precise, since the induced current flowing in the wiring loop 28 receives the Lorentz force from the magnetic field formed by the current flowing in the wiring 16a, the wiring 16 is based on the electrostatic force.
To measure the voltage of a more accurately, the cantilever 22
When the change in the current flowing through the wiring 16a is slow enough to move in accordance with, the Lorentz force is calculated based on the measured current I, and the Lorentz force is subtracted from the force received by the cantilever 22 together with the atomic force.
【００２７】なお、上記実施例では探針２４のある平衡
状態からの自由端部変位に基づいて静電気力を求める場
合を説明したが、この変位が設定値になるようにＺ走査
回路２０からＺ圧電ステージ１４に駆動電圧を供給し、
この駆動電圧に基づいて静電気力を求めてもよいことは
勿論である。In the above embodiment, the electrostatic force is calculated based on the displacement of the free end portion of the probe 24 from a certain equilibrium state. However, the Z scanning circuit 20 outputs the Z force so that the displacement becomes a set value. The drive voltage is supplied to the piezoelectric stage 14,
Of course, the electrostatic force may be obtained based on this drive voltage.
【００２８】[0028]
【発明の効果】以上説明した如く、本発明に係る微細配
線電流波形計測装置によれば、従来計測できなかった微
細配線に流れる電流の波形を計測することが可能となる
という優れた効果を奏する。As described above, according to the fine wiring current waveform measuring apparatus of the present invention, it is possible to measure the waveform of the current flowing through the fine wiring which could not be measured by the conventional technique. ..
【００２９】本発明の上記第１態様によれば、微細配線
に流れる電流の波形のみならず、微細配線の電圧波形を
も計測することが可能となるという効果を奏する。According to the first aspect of the present invention, not only the waveform of the current flowing through the fine wiring but also the voltage waveform of the fine wiring can be measured.
【００３０】本発明の上記第２態様によれば、微細配線
の電圧波形をより正確に計測することが可能となるとい
う効果を奏する。According to the second aspect of the present invention, it is possible to measure the voltage waveform of the fine wiring more accurately.
【図１】原子間力顕微鏡に適用された微細配線電流波形
計測装置の構成図である。FIG. 1 is a configuration diagram of a fine wiring current waveform measuring apparatus applied to an atomic force microscope.
【図２】カンチレバー及び探針に形成された配線パター
ンを示す斜視図である。FIG. 2 is a perspective view showing a wiring pattern formed on a cantilever and a probe.
【図３】試料の配線に流す電流と検出用配線ループに生
ずる誘導起電力との関係を示す線図である。FIG. 3 is a diagram showing the relationship between the current flowing in the sample wiring and the induced electromotive force generated in the detection wiring loop.
１０ ベース １６ 試料 １６ａ 配線 ２２ カンチレバー ２４ 探針 ２６Ａ、２６Ｂ リード線 ２８ 配線ループ 10 base 16 sample 16a wiring 22 cantilever 24 probe 26A, 26B lead wire 28 wiring loop
Claims (3)
ド線（２６Ａ、２６Ｂ）が形成されたカンチレバー（２
２）と、 該カンチレバーの該自由端に設けられ、端部が該リード
線と導通した配線ループ（２８）が形成された探針（２
４）と、 該カンチレバーの自由端部の高さ変位を非接触で検出す
る変位検出器（３８）と、 該探針に試料（１６）の表面を対向させた状態で該試料
を３次元的に微動させる微動ステージ（１２、１４）
と、 該試料に形成された配線に該探針を接近させ、該高さ変
位が所定値になるように該微動ステージを駆動する走査
回路（１８、２０）と、 該試料に形成された配線に該探針を接近させた状態で該
配線ループに生じた誘導起電力を該リード線を介して検
出する起電力検出回路（３０）と、 検出された該誘導起電力を時間積分して、該試料に形成
された該配線に流れる電流を求める起電力／電流変換手
段（３４）と、 を有することを特徴とする微細配線電流波形計測装置。1. A cantilever (2) having one end fixed and the other free end formed with lead wires (26A, 26B).
2) and a probe (2) which is provided at the free end of the cantilever and has a wiring loop (28) whose end is electrically connected to the lead wire.
4), a displacement detector (38) for detecting the height displacement of the free end of the cantilever in a non-contact manner, and the sample (16) in a three-dimensional manner with the surface of the sample (16) facing the probe. Fine movement stage (12, 14)
A scanning circuit (18, 20) for driving the fine movement stage so that the probe is brought close to the wiring formed on the sample and the height displacement becomes a predetermined value, and the wiring formed on the sample An electromotive force detection circuit (30) for detecting an induced electromotive force generated in the wiring loop via the lead wire in a state where the probe is brought close to A fine wiring current waveform measuring device comprising: an electromotive force / current converting means (34) for obtaining a current flowing through the wiring formed on the sample.
（２４）との間に働く静電気力を、前記高さ変位と前記
微動ステージ（１２、１４）の高さ位置とに基づいて検
出し、該静電気力に基づいて該配線の電圧を検出する配
線電圧検出手段（３４）、 を有することを特徴とする請求項１記載の微細配線電流
波形計測装置。2. The electrostatic force acting between the wiring formed on the sample and the probe (24) is detected based on the height displacement and the height position of the fine movement stage (12, 14). The fine wiring current waveform measuring device according to claim 1, further comprising: a wiring voltage detecting means (34) for detecting a voltage of the wiring based on the electrostatic force.
試料（１６）に形成された配線に流れる電流が作る磁界
と前記探針（２４）に形成された配線ループ（２８）に
流れる誘導電流との間に働くローレンツ力を、前記求め
られた電流に基づいて算出し、該試料に形成された配線
と該探針との間に働く力から該ローレンツ力を差し引い
て前記静電気力を求めることを特徴とする請求項２記載
の微細配線電流波形計測装置。3. The wiring voltage detecting means (34) induces a magnetic field generated by an electric current flowing in a wiring formed in the sample (16) and an induction flowing in a wiring loop (28) formed in the probe (24). The Lorentz force acting between the current and the current is calculated based on the obtained current, and the Lorentz force is subtracted from the force acting between the wiring formed on the sample and the probe to obtain the electrostatic force. The fine wiring current waveform measuring device according to claim 2, wherein
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2694892A JPH05223855A (en) | 1992-02-13 | 1992-02-13 | Micro-wiring current waveform measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2694892A JPH05223855A (en) | 1992-02-13 | 1992-02-13 | Micro-wiring current waveform measuring device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05223855A true JPH05223855A (en) | 1993-09-03 |
Family
ID=12207381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2694892A Withdrawn JPH05223855A (en) | 1992-02-13 | 1992-02-13 | Micro-wiring current waveform measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05223855A (en) |
-
1992
- 1992-02-13 JP JP2694892A patent/JPH05223855A/en not_active Withdrawn
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6215318B1 (en) | Micromechanical magnetic field sensor | |
| US8278919B2 (en) | MEMS oscillating magnetic sensor and method of making | |
| JP2945090B2 (en) | Encoder | |
| JPH06281658A (en) | Integrated chip distortion sensor | |
| JPH06507718A (en) | How to assemble integrated and aligned tunnel chip pairs | |
| JP2006343213A (en) | Fine structural body, cantilever, scanning probe microscope, and method for measuring amount of deformation of the fine structural body | |
| JPH04337403A (en) | Photointegration type displacement sensor | |
| JP2001522045A (en) | Electrostatic force detector with cantilever for electrostatic force microscope | |
| US8869311B2 (en) | Displacement detection mechanism and scanning probe microscope using the same | |
| EP0745858B1 (en) | Acceleration sensor | |
| US4397033A (en) | Device for measuring characteristic parameters of the speed of handwriting | |
| JP2002156409A (en) | Measuring sonde for detecting electrical signal in integrated circuit, method for using the measuring sonde, method for manufacturing the measuring sonde and measuring system by the measuring sonde | |
| JPH05223855A (en) | Micro-wiring current waveform measuring device | |
| JP2000206026A (en) | Scanning probe microscope | |
| JP4327263B2 (en) | Multi-probe test head | |
| CN115856725A (en) | Magnetic sensor | |
| JPH0854403A (en) | Conductive cantilever structure of compound microscope | |
| JPH0412547A (en) | Film thickness distribution measuring device | |
| KR20030013235A (en) | Scanning Probe Microscope | |
| US6208151B1 (en) | Method and apparatus for measurement of microscopic electrical characteristics | |
| JP3276389B2 (en) | Voltage measuring device | |
| JP4050194B2 (en) | Magnetic field detection method, magnetic field detection device, and information storage | |
| JPH085642A (en) | Integrated multifunction spm sensor | |
| KR100408522B1 (en) | Vertical axis magnetometer | |
| JP2960592B2 (en) | Shape measuring probe and method of manufacturing the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19990518 |