JPH05220304A - Antifoaming agent - Google Patents

Antifoaming agent

Info

Publication number
JPH05220304A
JPH05220304A JP2647992A JP2647992A JPH05220304A JP H05220304 A JPH05220304 A JP H05220304A JP 2647992 A JP2647992 A JP 2647992A JP 2647992 A JP2647992 A JP 2647992A JP H05220304 A JPH05220304 A JP H05220304A
Authority
JP
Japan
Prior art keywords
chemical
organosilicon compound
fluoroalkyl group
formula
chemical formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2647992A
Other languages
Japanese (ja)
Inventor
Hideo Sawada
英夫 沢田
Takeo Matsumoto
竹男 松本
Keizo Ogino
圭三 荻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Priority to JP2647992A priority Critical patent/JPH05220304A/en
Publication of JPH05220304A publication Critical patent/JPH05220304A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To provide an extremely high antiforming property by incorporating a fluoroalkyl group-contg. organosilicon compd. shown by the specified general formula as an effective component. CONSTITUTION:This antifoaming agent contains a fluoroalkyl group-contg. organosilicon compd. shown by formula I as the effective component. In formula I, R is a 1-10C alkyl, alkoxy or alkoxycarbonyloxy group, RF is (CF2)n1 or shown by formula II, wherein X is hydrogen, fluorine or chlorine atom, n1 is an integer of 1 to 10, n2 is an integer of 0 to 8, (a) and (b) are 0 or 1 and a+bnot equal to 0. The organosilicon compd. is produced by allowing a specified difluoroalkanoyl peroxide to reach with a specified phenyl group-contg. organosilicon compd.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、新規なフルオロアルキ
ル基含有有機ケイ素化合物を有効成分として含有する消
泡剤に関する。
FIELD OF THE INVENTION The present invention relates to a defoaming agent containing a novel fluoroalkyl group-containing organosilicon compound as an active ingredient.

【0002】[0002]

【従来の技術】有機化合物中にフルオロアルキル基を含
有する化合物は、耐光性、撥水撥油性、更には生理活性
等の有用な性質を示す化合物として注目を集めている。
特に、有機ケイ素化合物中にフルオロアルキル基が導入
されたフルオロアルキル基含有有機ケイ素化合物は、低
表面張力性、低屈折性、耐熱性、耐寒性、耐油性、電気
絶縁性、撥水性、離型性、消泡性、耐薬品性等の優れた
特性を有するため種々の分野において、例えば、医薬、
農薬等の合成中間体、半導体デバイスの生産工程におけ
るレジスト等の密着性向上剤、光学レンズ、眼鏡用レン
ズ、ガラス器具等の表面における撥水撥油性及び防汚染
性等の付与のための表面処理剤、更には離型性を付与す
る材料等の分野において広く利用されている。前記フル
オロアルキル基含有有機ケイ素化合物としては、特開平
2−219829号及び特開平2−219830号公報
において、ポリシロキサン中にフルオロアルキル基が導
入された化合物がそれぞれ開示されている。一方、この
ようなシリコン系化合物を有効成分とする消泡剤も知ら
れている。しかしながら、従来消泡剤として使用されて
いるシリコン系化合物よりも微量の添加により優れた消
泡性を示す有効成分の開発が望まれているのが実状であ
る。また本発明に示されるような有機ケイ素化合物にフ
ルオロアルキル基が導入されたフルオロアルキル基含有
有機ケイ素化合物自体も知られていない。
2. Description of the Related Art Organic compounds containing a fluoroalkyl group have been attracting attention as compounds having useful properties such as light resistance, water and oil repellency, and physiological activity.
In particular, a fluoroalkyl group-containing organosilicon compound in which a fluoroalkyl group is introduced into an organosilicon compound has low surface tension, low refractivity, heat resistance, cold resistance, oil resistance, electrical insulation, water repellency, and mold release. In various fields, for example, pharmaceuticals, because of its excellent properties such as anti-foaming property, defoaming property and chemical resistance.
Surface treatment for imparting water and oil repellency and stain resistance to the surface of synthetic intermediates such as pesticides, adhesion improvers such as resists in the production process of semiconductor devices, optical lenses, eyeglass lenses, glassware, etc. It is widely used in the field of agents, and materials that impart releasability. As the above-mentioned fluoroalkyl group-containing organosilicon compound, JP-A-2-219829 and JP-A-2-219830 each disclose a compound in which a fluoroalkyl group is introduced into polysiloxane. On the other hand, an antifoaming agent containing such a silicon compound as an active ingredient is also known. However, in reality, it is desired to develop an active ingredient exhibiting excellent defoaming property by adding a small amount of the compound as compared with a silicon compound conventionally used as a defoaming agent. Further, a fluoroalkyl group-containing organosilicon compound itself obtained by introducing a fluoroalkyl group into the organosilicon compound as shown in the present invention is not known.

【0003】[0003]

【発明が解決しようとする課題】本発明の目的は、低表
面張力性を有し、優れた消泡性を示す新規なフルオロア
ルキル基含有有機ケイ素化合物を有効成分として含有す
る消泡剤を提供することにある。
The object of the present invention is to provide an antifoaming agent containing a novel fluoroalkyl group-containing organosilicon compound as an active ingredient, which has a low surface tension property and exhibits an excellent defoaming property. To do.

【0004】[0004]

【課題を解決するための手段】本発明によれば、下記一
般式化2で表わされるフルオロアルキル基含有有機ケイ
素化合物(以下有機ケイ素化合物1と称す)を有効成分
として含有する消泡剤が提供される。
According to the present invention, there is provided an antifoaming agent containing a fluoroalkyl group-containing organosilicon compound represented by the following general formula 2 (hereinafter referred to as organosilicon compound 1) as an active ingredient. To be done.

【0005】[0005]

【化2】 [Chemical 2]

【0006】以下本発明を更に詳細に説明する。The present invention will be described in more detail below.

【0007】本発明の消泡剤は、前記一般式化2で表わ
される有機ケイ素化合物1を有効成分として含有する。
また前記有機ケイ素化合物1において、Rが炭素数11
以上のアルキル基、アルコキシ基若しくはアルキルカル
ボニルオキシ基の場合には、製造が困難であり、またn
1が10を超える場合又はn2が8を超える場合には、溶
媒に対する溶解性が低下するので使用できない。
The defoaming agent of the present invention contains the organosilicon compound 1 represented by the general formula 2 as an active ingredient.
In the organosilicon compound 1, R has 11 carbon atoms.
In the case of the above alkyl group, alkoxy group or alkylcarbonyloxy group, it is difficult to produce, and n
When 1 exceeds 10, or n 2 exceeds 8, the solubility in a solvent decreases, and therefore it cannot be used.

【0008】また前記有機ケイ素化合物1において、適
用可能なRF、すなわち −(CF2)n1Xまたは下記一般式化3を具体的に列挙す
ると、F3C−,F(CF22−,F(CF23−,F
(CF24−,F(CF25−,F(CF26−,F
(CF27−,F(CF28−,F(CF29−,F
(CF210−,HCF2−,H(CF22−,H(CF
23−,H(CF24−,H(CF25−,H(C
26−,H(CF27−,H(CF28−,H(CF
29−,H(CF210−,ClCF2−,Cl(C
22−,Cl(CF23−,Cl(CF24−,Cl
(CF25−,Cl(CF26−,Cl(CF27−,
Cl(CF28−,Cl(CF29−,Cl(CF2
10−,下記化学式化4、化5、化6、化7、化8、化
9、化10、化11、化12である。
In the organosilicon compound 1, the applicable RF, namely,-(CF 2 ) n 1 X or the following general formula 3 is specifically listed. F 3 C--, F (CF 2 ) 2- , F (CF 2 ) 3 −, F
(CF 2 ) 4 −, F (CF 2 ) 5 −, F (CF 2 ) 6 −, F
(CF 2 ) 7 −, F (CF 2 ) 8 −, F (CF 2 ) 9 −, F
(CF 2 ) 10 −, HCF 2 −, H (CF 2 ) 2 −, H (CF
2) 3 -, H (CF 2) 4 -, H (CF 2) 5 -, H (C
F 2 ) 6 −, H (CF 2 ) 7 −, H (CF 2 ) 8 −, H (CF
2) 9 -, H (CF 2) 10 -, ClCF 2 -, Cl (C
F 2) 2 -, Cl ( CF 2) 3 -, Cl (CF 2) 4 -, Cl
(CF 2 ) 5 −, Cl (CF 2 ) 6 −, Cl (CF 2 ) 7 −,
Cl (CF 2) 8 -, Cl (CF 2) 9 -, Cl (CF 2)
10- , the following chemical formulas are chemical formula 4, chemical formula 5, chemical formula 6, chemical formula 7, chemical formula 8, chemical formula 9, chemical formula 10 , chemical formula 11, and chemical formula 12.

【0009】[0009]

【化3】 [Chemical 3]

【0010】[0010]

【化4】 [Chemical 4]

【0011】[0011]

【化5】 [Chemical 5]

【0012】[0012]

【化6】 [Chemical 6]

【0013】[0013]

【化7】 [Chemical 7]

【0014】[0014]

【化8】 [Chemical 8]

【0015】[0015]

【化9】 [Chemical 9]

【0016】[0016]

【化10】 [Chemical 10]

【0017】[0017]

【化11】 [Chemical 11]

【0018】[0018]

【化12】 [Chemical 12]

【0019】更に前記有機ケイ素化合物1としては、具
体的には例えば、下記一般式化13、化14、化15、
化16、化17、化18、化19、化20、化21、化
22、化23、化24、化25、化26、化27、化2
8、化29、化30、化31、化32、化33、化3
4、化35、化36、化37、化38、化39、化4
0、化41、化42等を好ましく挙げることができる
(尚、式中ベンゼン環に結合するRF基の位置は、オル
ト、メタ、パラのいずれか任意である)。
Further, as the organosilicon compound 1, specifically, for example, the following general formulas 13, 14, and 15
Chemical formula 16, Chemical formula 17, Chemical formula 18, Chemical formula 19, Chemical formula 20, Chemical formula 21, Chemical formula 22, Chemical formula 23, Chemical formula 24, Chemical formula 25, Chemical formula 26, Chemical formula 27, Chemical formula 2
8, Chemical 29, Chemical 30, Chemical 31, Chemical 32, Chemical 33, Chemical 3
4, Chemical 35, Chemical 36, Chemical 37, Chemical 38, Chemical 39, Chemical 4
0, Chemical formula 41, Chemical formula 42 and the like can be mentioned (wherein, the position of the RF group bonded to the benzene ring is any of ortho, meta and para).

【0020】[0020]

【化13】 [Chemical 13]

【0021】[0021]

【化14】 [Chemical 14]

【0022】[0022]

【化15】 [Chemical 15]

【0023】[0023]

【化16】 [Chemical 16]

【0024】[0024]

【化17】 [Chemical 17]

【0025】[0025]

【化18】 [Chemical 18]

【0026】[0026]

【化19】 [Chemical 19]

【0027】[0027]

【化20】 [Chemical 20]

【0028】[0028]

【化21】 [Chemical 21]

【0029】[0029]

【化22】 [Chemical formula 22]

【0030】[0030]

【化23】 [Chemical formula 23]

【0031】[0031]

【化24】 [Chemical formula 24]

【0032】[0032]

【化25】 [Chemical 25]

【0033】[0033]

【化26】 [Chemical formula 26]

【0034】[0034]

【化27】 [Chemical 27]

【0035】[0035]

【化28】 [Chemical 28]

【0036】[0036]

【化29】 [Chemical 29]

【0037】[0037]

【化30】 [Chemical 30]

【0038】[0038]

【化31】 [Chemical 31]

【0039】[0039]

【化32】 [Chemical 32]

【0040】[0040]

【化33】 [Chemical 33]

【0041】[0041]

【化34】 [Chemical 34]

【0042】[0042]

【化35】 [Chemical 35]

【0043】[0043]

【化36】 [Chemical 36]

【0044】[0044]

【化37】 [Chemical 37]

【0045】[0045]

【化38】 [Chemical 38]

【0046】[0046]

【化39】 [Chemical Formula 39]

【0047】[0047]

【化40】 [Chemical 40]

【0048】[0048]

【化41】 [Chemical 41]

【0049】[0049]

【化42】 [Chemical 42]

【0050】前記有機ケイ素化合物1は、特定の過酸化
ジフルオロアルカノイルと特定のフェニル基含有有機ケ
イ素化合物とを反応させることにより製造することがで
きる。
The organosilicon compound 1 can be produced by reacting a specific difluoroalkanoyl peroxide with a specific phenyl group-containing organosilicon compound.

【0051】前記特定の過酸化ジフルオロアルカノイル
としては、下記一般式化43で表わされる過酸化ジフル
オロアルカノイル(以下ジフルオロアルカノイル2と称
す)を好ましく挙げることができる。前記ジフルオロア
ルカノイル2において、n1が11以上の場合又はn2
9以上の場合には、溶媒の存在下において反応させる際
に前記ジフルオロアルカノイル2の溶解性が低下するの
で好ましくない。
The specific difluoroalkanoyl peroxide preferably includes difluoroalkanoyl peroxide represented by the following general formula 43 (hereinafter referred to as difluoroalkanoyl 2). In the above difluoroalkanoyl 2, when n 1 is 11 or more or n 2 is 9 or more, the solubility of the difluoroalkanoyl 2 is lowered when the reaction is performed in the presence of a solvent, which is not preferable.

【0052】[0052]

【化43】 [Chemical 43]

【0053】また前記ジフルオロアルカノイル2中のR
Fは、前記有機ケイ素化合物1において具体的に列挙し
たRFと同様であり、前記ジフルオロアルカノイル2と
しては、具体的には例えば過酸化ジペルフルオロ−2−
メチル−3−オキサヘキサノイル、過酸化ジペルフルオ
ロ−2,5−ジメチル−3,6−ジオキサノナノイル、
過酸化ジペルフルオロブチリル、過酸化ジペルフルオロ
ヘプタノイル等を好ましく挙げることができる。
In addition, R in the difluoroalkanoyl 2 is
F is the same as RF specifically listed in the organosilicon compound 1, and the difluoroalkanoyl 2 is specifically, for example, diperfluoro-2-peroxide.
Methyl-3-oxahexanoyl, diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide,
Preferable examples include diperfluorobutyryl peroxide and diperfluoroheptanoyl peroxide.

【0054】また前記特定のフェニル基含有有機ケイ素
化合物としては、下記一般式化44で表わされるフェニ
ル基含有有機ケイ素化合物(以下有機ケイ素化合物3と
称す)を好ましく挙げることができる。前記有機ケイ素
化合物3において、Rが炭素数11以上のアルキル基、
アルコキシ基若しくはアルキルカルボニルオキシ基の場
合には、製造が困難であり好ましくない。
As the specific phenyl group-containing organosilicon compound, a phenyl group-containing organosilicon compound represented by the following general formula 44 (hereinafter referred to as organosilicon compound 3) can be preferably mentioned. In the organosilicon compound 3, R is an alkyl group having 11 or more carbon atoms,
In the case of an alkoxy group or an alkylcarbonyloxy group, it is difficult to manufacture and it is not preferable.

【0055】[0055]

【化44】 [Chemical 44]

【0056】前記有機ケイ素化合物3としては、具体的
には例えば、3,3−ジフェニルヘキサメチルトリシロ
キサン、3,3−ジフェニルヘキサエチルトリシロキサ
ン、3,3−ジフェニルヘキサプロピルトリシロキサ
ン、3,3−ジフェニルヘキサブチルトリシロキサン、
3,3−ジフェニルヘキサメトキシトリシロキサン、
3,3−ジフェニルヘキサエトキシトリシロキサン、
3,3−ジフェニルヘキサプロポキシトリシロキサン、
3,3−ジフェニルヘキサブトキシトリシロキサン等を
好ましく挙げることができる。
Specific examples of the organosilicon compound 3 include 3,3-diphenylhexamethyltrisiloxane, 3,3-diphenylhexaethyltrisiloxane, 3,3-diphenylhexapropyltrisiloxane and 3,3. -Diphenylhexabutyltrisiloxane,
3,3-diphenylhexamethoxytrisiloxane,
3,3-diphenylhexaethoxytrisiloxane,
3,3-diphenylhexapropoxytrisiloxane,
Preferred examples include 3,3-diphenylhexabutoxytrisiloxane and the like.

【0057】更に、前記ジフルオロアルカノイル2と前
記有機ケイ素化合物3とを反応させる際における、仕込
みモル比は、1:0.1〜10.0の範囲であるのが好
ましく、特に、1:0.3〜5.0の範囲とするのが好
ましい。前記有機ケイ素化合物3の仕込みモル比が0.
1未満の場合には、過酸化物の自己分解に起因する生成
物が多量に生成し、また10を超える場合には、目的と
するフルオロアルキル基含有有機ケイ素化合物の収率が
低下するので好ましくない。また前記有機ケイ素化合物
1のa、bともに1とする場合には、前記ジフルオロア
ルカノイル2に対する有機ケイ素化合物3の仕込みモル
比を2以上とするのが好ましい。更に前記反応は常圧で
行なうことが可能であり、且つ反応温度は好ましくは−
20〜+150℃、特に好ましくは0〜100℃の範囲
である。前記反応温度が−20℃未満の場合には反応に
長時間を要し、+150℃を超える場合には反応時の圧
力が高くなり、反応操作が困難となるので好ましくな
い。更にまた反応時間は30分〜20時間の範囲が好ま
しく、工業的には1〜10時間の範囲にて行なうことが
特に好ましい。
Further, when the difluoroalkanoyl 2 and the organosilicon compound 3 are reacted, the charge molar ratio is preferably in the range of 1: 0.1 to 10.0, and particularly 1: 0. It is preferably in the range of 3 to 5.0. The molar ratio of the organosilicon compound 3 charged was 0.
When it is less than 1, a large amount of a product resulting from the self-decomposition of peroxide is produced, and when it is more than 10, the yield of the target fluoroalkyl group-containing organosilicon compound is lowered, which is preferable. Absent. When both a and b of the organosilicon compound 1 are set to 1, it is preferable that the charged molar ratio of the organosilicon compound 3 to the difluoroalkanoyl 2 is 2 or more. Furthermore, the reaction can be carried out at normal pressure, and the reaction temperature is preferably-
20 to + 150 ° C, particularly preferably 0 to 100 ° C. When the reaction temperature is lower than -20 ° C, the reaction takes a long time, and when it is higher than + 150 ° C, the pressure during the reaction becomes high and the reaction operation becomes difficult, which is not preferable. Furthermore, the reaction time is preferably in the range of 30 minutes to 20 hours, and industrially particularly preferably in the range of 1 to 10 hours.

【0058】本発明の消泡剤において、前記有機ケイ素
化合物1の含有割合は、対象物により種々選択すること
ができるが、好ましくは0.01〜100重量%、特に
好ましくは0.1〜50重量%とするのが好ましい。
In the defoaming agent of the present invention, the content ratio of the organosilicon compound 1 can be variously selected according to the object, but is preferably 0.01 to 100% by weight, particularly preferably 0.1 to 50%. It is preferably set to wt%.

【0059】本発明の消泡剤は、前記有機ケイ素化合物
1をそのまま消泡剤として用いることができる他、例え
ば非水溶液へ添加する場合には、メチルエチルケトン、
メチルイソブチルケトン等のケトン系溶媒又は1,1,
2−トリクロロトリフルオロエタン等のハロゲン系有機
溶剤等に有機ケイ素化合物1を溶解させて調製すること
もでき、更には水溶液に有機ケイ素化合物1を例えばホ
モミキサー等により乳化し、エマルジョン化して調製す
ることもできる。該エマルジョン粒径は0.1〜100
μmの範囲が好ましく、特に1〜10μmが好ましい。
また該エマルジョンを安定化させるために、例えばポリ
ビニルアルコール等の公知の増粘剤等を含有させること
もできる。更にまた本発明の消泡剤には、泡膜への侵入
を容易にし、より強い消泡効果を発揮する等のために、
必要に応じて公知の酸化防止剤、シリカ、アルミナ、二
酸化チタン等の充填剤等を含有させることもできる。
In the defoaming agent of the present invention, the organosilicon compound 1 can be used as it is as a defoaming agent. For example, when it is added to a non-aqueous solution, methyl ethyl ketone,
Ketone-based solvent such as methyl isobutyl ketone or 1,1,
It can also be prepared by dissolving the organosilicon compound 1 in a halogen-based organic solvent such as 2-trichlorotrifluoroethane. Further, the organosilicon compound 1 is emulsified in an aqueous solution by, for example, a homomixer or the like to prepare an emulsion. You can also The emulsion particle size is 0.1-100
The range of μm is preferable, and 1 to 10 μm is particularly preferable.
Further, in order to stabilize the emulsion, a known thickener such as polyvinyl alcohol may be contained. Furthermore, in the defoaming agent of the present invention, in order to facilitate entry into the foam film and exert a stronger defoaming effect,
If necessary, known antioxidants, fillers such as silica, alumina, titanium dioxide and the like can be contained.

【0060】本発明の消泡剤を使用するには、例えば発
泡性の水溶液又は非水溶液に添加することにより優れた
効果を得ることができる。この際、水溶液又は非水溶液
に対する本発明の消泡剤の添加量は、有機ケイ素化合物
1の量を基準として重量比で好ましくは0.01ppm〜
1000ppm、特に好ましくは0.1ppm〜100ppmの
範囲となるように添加すればよい。添加量が0.01pp
m未満の場合には前記有機ケイ素化合物1に起因する表
面張力の低下が十分でなく、水溶液又は非水溶液への溶
解性が大きくなり、抑泡効果が不十分となり、添加量が
1000ppmを超えると、水溶液又は非水溶液への分散
性、泡への拡張性が低下し、消泡効果、特に破泡性、速
効性が不十分となるので好ましくない。
When the defoaming agent of the present invention is used, an excellent effect can be obtained by adding it to a foaming aqueous solution or a non-aqueous solution. At this time, the addition amount of the defoaming agent of the present invention to the aqueous solution or the non-aqueous solution is preferably 0.01 ppm by weight based on the amount of the organosilicon compound 1.
It may be added in an amount of 1000 ppm, particularly preferably 0.1 ppm to 100 ppm. Addition amount is 0.01pp
When it is less than m, the decrease in the surface tension due to the organosilicon compound 1 is not sufficient, the solubility in an aqueous solution or a non-aqueous solution becomes large, the foam suppressing effect becomes insufficient, and the addition amount exceeds 1000 ppm. However, the dispersibility in an aqueous solution or a non-aqueous solution and the expandability to foams are lowered, and the defoaming effect, especially the defoaming property and the quick-acting property become insufficient, which is not preferable.

【0061】[0061]

【発明の効果】本発明の消泡剤は、低表面張力性、低屈
折性、耐熱性、耐寒性、耐油性、電気絶縁性、撥水性、
離型性、消泡性、耐薬品性等の特性を有する新規な化合
物であるフルオロアルキル基含有有機ケイ素化合物を有
効成分とするため、化学的に不活性であり、種々の悪条
件下においても発泡物質と反応せず安定である。故に、
食品の製造工程あるいは食器洗浄工程、更には排水処理
等に利用することができる。また繊維の高温染色工程や
炭化水素の分解ガス脱硫工程及び接着性、ペインタブル
性(塗装性)、はじき等の問題により公知の消泡剤の使
用が不可能であった塗料、インキ、ラテックス等への使
用が可能となり、発泡を伴う各種産業工程に広く利用す
ることが可能である。
The antifoaming agent of the present invention has low surface tension, low refractive index, heat resistance, cold resistance, oil resistance, electrical insulation, water repellency,
A fluoroalkyl group-containing organosilicon compound, which is a novel compound having properties such as releasability, defoaming property, and chemical resistance, is used as an active ingredient, so it is chemically inert and can be used under various adverse conditions. Stable without reacting with foaming substances. Therefore,
It can be used in a food manufacturing process or a dishwashing process, and further in wastewater treatment. In addition, to paints, inks, latexes, etc. for which known defoaming agents could not be used due to problems such as high-temperature dyeing process of fibers and decomposition gas desulfurization process of hydrocarbons and adhesion, paintability (paintability), and cissing Can be used and can be widely used in various industrial processes involving foaming.

【0062】[0062]

【実施例】以下本発明を合成例、実施例及び比較例によ
り更に詳細に説明するが、本発明はこれらに限定される
ものではない。
EXAMPLES The present invention will be described in more detail with reference to Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited thereto.

【0063】[0063]

【合成例1】3,3−ジフェニルヘキサメチルトリシロ
キサン(10.9g,30mmol)に、過酸化ジペルフル
オロ−2,5−ジメチル−3,6−ジオキサノナノイル
(24.8g,25mmol)を含む1,1,2−トリクロ
ロトリフルオロエタン溶液300gを加え、窒素雰囲気
下、40℃にて5時間反応を行なった。反応終了後、反
応溶媒を除去し、次いで蒸留を行ない、下記化学式化4
5で表わされるフルオロアルキル基含有有機ケイ素化合
物を収率91%(収量22.8g)で得た。
Synthesis Example 1 3,3-Diphenylhexamethyltrisiloxane (10.9 g, 30 mmol) was added with diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide (24.8 g, 25 mmol). 300 g of a 1,1,2-trichlorotrifluoroethane solution containing it was added, and the reaction was carried out at 40 ° C. for 5 hours in a nitrogen atmosphere. After completion of the reaction, the reaction solvent is removed, and then distillation is carried out to obtain the following chemical formula 4
A fluoroalkyl group-containing organosilicon compound represented by 5 was obtained with a yield of 91% (yield 22.8 g).

【0064】[0064]

【化45】 [Chemical 45]

【0065】[0065]

【合成例2】3,3−ジフェニルヘキサメチルトリシロ
キサンの仕込み量を12.5mmol(4.5g)とした以
外は、合成例1と同様にして反応を行ない、下記化学式
化46で表わされるフルオロアルキル基含有有機ケイ素
化合物を収率63%(収量9.9g)で得た。
[Synthesis Example 2] The reaction was performed in the same manner as in Synthesis Example 1 except that the charged amount of 3,3-diphenylhexamethyltrisiloxane was 12.5 mmol (4.5 g). An alkyl group-containing organosilicon compound was obtained with a yield of 63% (yield 9.9 g).

【0066】[0066]

【化46】 [Chemical 46]

【0067】[0067]

【合成例3】過酸化ジペルフルオロ−2,5−ジメチル
−3,6−ジオキサノナノイルを、過酸化ジペルフルオ
ロ−2−メチル−3−オキサヘキサノイルに代えた以外
は合成例1と同様に反応を行ない、下記化学式化47で
表わされるフルオロアルキル基含有有機ケイ素化合物を
収率88%(収量17.0g)で得た。
Synthesis Example 3 Similar to Synthesis Example 1 except that diperfluoro-2-methyl-3-oxahexanoyl peroxide was used instead of diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide. To give a fluoroalkyl group-containing organosilicon compound represented by the following chemical formula 47 in a yield of 88% (yield 17.0 g).

【0068】[0068]

【化47】 [Chemical 47]

【0069】[0069]

【合成例4】過酸化ジペルフルオロ−2,5−ジメチル
−3,6−ジオキサノナノイルを、過酸化ジペルフルオ
ロ−2−メチル−3−オキサヘキサノイルに、また3,
3−ジフェニルヘキサメチルトリシロキサンの仕込み量
を12.5mmol(4.5g)とした以外は合成例1と同
様に反応を行ない、下記化学式化48で表わされるフル
オロアルキル基含有有機ケイ素化合物を収率67%(収
量7.8g)で得た。
Synthesis Example 4 Diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide was converted to diperfluoro-2-methyl-3-oxahexanoyl peroxide, and 3,3
The reaction was performed in the same manner as in Synthesis Example 1 except that the charged amount of 3-diphenylhexamethyltrisiloxane was set to 12.5 mmol (4.5 g), and a fluoroalkyl group-containing organosilicon compound represented by the following chemical formula 48 was obtained. Obtained in 67% (yield 7.8 g).

【0070】[0070]

【化48】 [Chemical 48]

【0071】[0071]

【合成例5】過酸化ジペルフルオロ−2,5−ジメチル
−3,6−ジオキサノナノイルを、過酸化ジペルフルオ
ロヘプタノイルとした以外は合成例1と同様に反応を行
ない、下記化学式化49で表わされるフルオロアルキル
基含有有機ケイ素化合物を収率83%(収量16.9
g)で得た。
[Synthesis Example 5] The reaction was performed in the same manner as in Synthesis Example 1 except that diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide was replaced with diperfluoroheptanoyl peroxide. The yield of the fluoroalkyl group-containing organosilicon compound represented by is 83% (yield 16.9).
Obtained in g).

【0072】[0072]

【化49】 [Chemical 49]

【0073】[0073]

【合成例6】過酸化ジペルフルオロ−2,5−ジメチル
−3,6−ジオキサノナノイルを、過酸化ジペルフルオ
ロヘプタノイルに、また3,3−ジフェニルヘキサメチ
ルトリシロキサンの仕込み量を12.5mmol(4.5
g)とした以外は合成例1と同様に反応を行ない、下記
化学式化50で表わされるフルオロアルキル基含有有機
ケイ素化合物を収率60%(収量7.5g)で得た。
Synthesis Example 6 Diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide was added to diperfluoroheptanoyl peroxide, and the amount of 3,3-diphenylhexamethyltrisiloxane was 12. 5 mmol (4.5
The reaction was performed in the same manner as in Synthesis Example 1 except that g) was used, and a fluoroalkyl group-containing organosilicon compound represented by the following chemical formula 50 was obtained with a yield of 60% (yield 7.5 g).

【0074】[0074]

【化50】 [Chemical 50]

【0075】[0075]

【合成例7】過酸化ジペルフルオロ−2,5−ジメチル
−3,6−ジオキサノナノイルを、過酸化ジペルフルオ
ロブチリルとした以外は合成例1と同様に反応を行な
い、下記化学式化51で表わされるフルオロアルキル基
含有有機ケイ素化合物を収率79%(収量12.5g)
で得た。
[Synthesis Example 7] The reaction is performed in the same manner as in Synthesis Example 1 except that diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide is replaced with diperfluorobutyryl peroxide. The yield of the fluoroalkyl group-containing organosilicon compound represented by is 79% (yield 12.5 g).
Got with.

【0076】[0076]

【化51】 [Chemical 51]

【0077】[0077]

【合成例8】過酸化ジペルフルオロ−2,5−ジメチル
−3,6−ジオキサノナノイルを、過酸化ジペルフルオ
ロブチリルに、また3,3−ジフェニルヘキサメチルト
リシロキサンの仕込み量を12.5mmol(4.5g)と
した以外は合成例1と同様に反応を行ない、下記化学式
化52で表わされるフルオロアルキル基含有有機ケイ素
化合物を収率55%(収量4.8g)で得た。
Synthesis Example 8 Diperfluoro-2,5-dimethyl-3,6-dioxanonanoyl peroxide was added to diperfluorobutyryl peroxide, and the amount of 3,3-diphenylhexamethyltrisiloxane was 12. The reaction was performed in the same manner as in Synthesis Example 1 except that the amount was 5 mmol (4.5 g) to obtain a fluoroalkyl group-containing organosilicon compound represented by the following chemical formula 52 in a yield of 55% (amount of 4.8 g).

【0078】[0078]

【化52】 [Chemical 52]

【0079】[0079]

【実施例1】0.01mol/lドデシル硫酸ナトリウム水
溶液を発泡液として、該水溶液100ml中に合成例1で
合成したフルオロアルキル基含有有機ケイ素化合物57
0ppmを加えた後、該混合物をガラス製発泡管に入れ、
25℃にて空気吹き込み速度300ml/分で通気した際
の発泡量を、表1に示すように5分後から40分後まで
5分ごとに測定した。結果を表1に示す。
Example 1 Using a 0.01 mol / l sodium dodecylsulfate aqueous solution as a foaming liquid, the fluoroalkyl group-containing organosilicon compound 57 synthesized in Synthesis Example 1 was added to 100 ml of the aqueous solution.
After adding 0 ppm, the mixture was placed in a glass foam tube,
The amount of foaming when aerated at 25 ° C. at an air blowing rate of 300 ml / min was measured every 5 minutes from 5 minutes to 40 minutes, as shown in Table 1. The results are shown in Table 1.

【0080】[0080]

【実施例2】フルオロアルキル基含有有機ケイ素化合物
を380ppmに代えた以外は実施例1と同様に行ない、
発泡量を測定した。結果を表1に示す。
Example 2 The same procedure as in Example 1 was repeated except that the fluoroalkyl group-containing organosilicon compound was changed to 380 ppm.
The amount of foaming was measured. The results are shown in Table 1.

【0081】[0081]

【実施例3〜9】フルオロアルキル基含有有機ケイ素化
合物を合成例2〜8で合成した化合物に代えた以外は実
施例1と同様に行ない、発泡量を測定した。結果を表1
に示す。
Examples 3 to 9 The amount of foaming was measured in the same manner as in Example 1 except that the fluoroalkyl group-containing organosilicon compound was replaced with the compounds synthesized in Synthesis Examples 2 to 8. The results are shown in Table 1.
Shown in.

【0082】[0082]

【比較例1】フルオロアルキル基含有有機ケイ素化合物
を3,3−ジフェニルヘキサメチルトリシロキサンに代
えた以外は実施例1と同様に行ない、発泡量を測定し
た。結果を表1に示す。
Comparative Example 1 The amount of foaming was measured in the same manner as in Example 1 except that the fluoroalkyl group-containing organosilicon compound was replaced with 3,3-diphenylhexamethyltrisiloxane. The results are shown in Table 1.

【0083】[0083]

【比較例2】フルオロアルキル基含有有機ケイ素化合物
を3,3−ジフェニルヘキサメチルトリシロキサン28
50ppmに代えた以外は実施例1と同様に行ない、発泡
量を測定した。結果を表1に示す。
[Comparative Example 2] Fluoroalkyl group-containing organosilicon compound was used as 3,3-diphenylhexamethyltrisiloxane 28
The amount of foaming was measured in the same manner as in Example 1 except that the amount was changed to 50 ppm. The results are shown in Table 1.

【0084】[0084]

【表1】 [Table 1]

【0085】以上実施例及び比較例に示すように、本発
明のフルオロアルキル基含有有機ケイ素化合物を有効成
分とする消泡剤は、通常のシリコン化合物に比較して抑
泡性が極めて高いことが明らかである。
As shown in the above Examples and Comparative Examples, the defoaming agent containing the fluoroalkyl group-containing organosilicon compound of the present invention as an active ingredient is extremely high in foam suppressing property as compared with ordinary silicon compounds. it is obvious.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式化1で表わされるフルオロア
ルキル基含有有機ケイ素化合物を有効成分として含有す
る消泡剤。 【化1】
1. An antifoaming agent containing a fluoroalkyl group-containing organosilicon compound represented by the following general formula 1 as an active ingredient. [Chemical 1]
JP2647992A 1992-02-13 1992-02-13 Antifoaming agent Pending JPH05220304A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2647992A JPH05220304A (en) 1992-02-13 1992-02-13 Antifoaming agent

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2647992A JPH05220304A (en) 1992-02-13 1992-02-13 Antifoaming agent

Publications (1)

Publication Number Publication Date
JPH05220304A true JPH05220304A (en) 1993-08-31

Family

ID=12194639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2647992A Pending JPH05220304A (en) 1992-02-13 1992-02-13 Antifoaming agent

Country Status (1)

Country Link
JP (1) JPH05220304A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011025235A (en) * 2009-07-02 2011-02-10 Shin-Etsu Chemical Co Ltd Defoaming agent

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011025235A (en) * 2009-07-02 2011-02-10 Shin-Etsu Chemical Co Ltd Defoaming agent

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