JPH05214596A - Structure of cathode part of electroplating device - Google Patents

Structure of cathode part of electroplating device

Info

Publication number
JPH05214596A
JPH05214596A JP5423692A JP5423692A JPH05214596A JP H05214596 A JPH05214596 A JP H05214596A JP 5423692 A JP5423692 A JP 5423692A JP 5423692 A JP5423692 A JP 5423692A JP H05214596 A JPH05214596 A JP H05214596A
Authority
JP
Japan
Prior art keywords
plated
idle
cathode
plating
annular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5423692A
Other languages
Japanese (ja)
Other versions
JP2840994B2 (en
Inventor
Akira Harayama
章 原山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Teikoku Piston Ring Co Ltd
Original Assignee
Teikoku Piston Ring Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Teikoku Piston Ring Co Ltd filed Critical Teikoku Piston Ring Co Ltd
Priority to JP5423692A priority Critical patent/JP2840994B2/en
Publication of JPH05214596A publication Critical patent/JPH05214596A/en
Application granted granted Critical
Publication of JP2840994B2 publication Critical patent/JP2840994B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE:To enable the application of full-surface plating at a uniform thickness to annular bodies to be plated, such as piston rings. CONSTITUTION:A cathode revolving shaft 1 has plural pieces of annular grooves 3 apart equally spaced intervals in the longitudinal direction of an outer peripheral surface 2. The annular grooves 3 are formed to the depth shallower than the thickness in the diametral direction of the annular bodies 10 to be plated. The cathode revolving shaft 1 is held horizontally rotatably and is rotated at the time of plating. An idle static shaft 7 is disposed in parallel above the cathode revolving shaft 1. Plural pieces of idle annular bodies 9 which have the bore larger than the outside diameter of the shaft 7 and are formed of nonconductive elastic materials on at least the outer peripheral surfaces are inserted via spacers 8 onto the above-mentioned shaft. The annular bodies 10 inserted into the annular grooves 3 of the cathode revolving shaft 1 are pressed by the own-weights of the idle annular bodies 9 and are pressed to come into contact with the cathode revolving shaft 1 at the time of plating. The annular bodies to be plated are thus plated between the idle annular bodies and anodes 6 while rotating together with the idle annular bodies 6 according to the rotation of the cathode revolving shaft 1.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、環状体例えば内燃機関
用のピストンリング(組合せオイルリングのサイドレー
ルやコイルエキスパンダ等も含む。)の全面めっき等に
使用して有効な電気めっき装置の陰極部構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electroplating apparatus which is effective for use in the whole surface plating of an annular body such as a piston ring for an internal combustion engine (including a side rail of a combined oil ring and a coil expander). The structure of the cathode part.

【0002】[0002]

【従来の技術】陰極軸の外周面に長手方向に等間隔を置
いて複数個の環状溝を形成し、これらの溝部に被めっき
環状体を挿入し、この溝付陰極軸を回転させて被めっき
環状体の全面をめっきする考えはあったが、被めっき環
状体の自重に電気容量を依存しているため、ピストンリ
ングのような軽量で且つめっき電流の大きいクロムめっ
きを施すような場合には、接点部が不安定で、電気容量
が不足し採用できなかった。
2. Description of the Related Art A plurality of annular grooves are formed at equal intervals in the longitudinal direction on the outer peripheral surface of a cathode shaft, and an annular body to be plated is inserted into these grooves. There was an idea to plate the entire surface of the plated annular body, but because the capacitance depends on the weight of the plated annular body itself, when performing light weight chromium plating with a large plating current such as a piston ring. Was not able to be adopted because the contact part was unstable and the electric capacity was insufficient.

【0003】したがって、通常は、弾性接点による通電
方法が採用されている。この弾性接点による方法は、図
7に示されている陰極治具20を使用して行われる。陰
極治具20はU字形状の陰極部21を有しており、この
U字形状の陰極部21の対向する直線部にそれぞれ複数
組の弾性接点部材が設けられている。一組の弾性接点部
材は上側に位置する弾性接点部材22と下側に位置する
弾性接点部材23とからなっている。上側に位置する弾
性接点部材22は銅線材で形成され、陰極部21から側
方に突出して二股状に分かれ、各先端部が2つの弾性接
点を構成して真上を向いており、下側の弾性接点部材2
3も銅線材で形成され、陰極部21から側方に突出し
て、先端部が弾性接点を構成して真下を向いているもの
である。
Therefore, an energization method using elastic contacts is usually adopted. This elastic contact method is performed using the cathode jig 20 shown in FIG. The cathode jig 20 has a U-shaped cathode portion 21, and a plurality of sets of elastic contact members are provided on the opposing linear portions of the U-shaped cathode portion 21, respectively. The set of elastic contact members includes an elastic contact member 22 located on the upper side and an elastic contact member 23 located on the lower side. The elastic contact member 22 located on the upper side is formed of a copper wire material, and projects laterally from the cathode portion 21 and is divided into two forks. Elastic contact member 2
3 is also formed of a copper wire rod, projects laterally from the cathode portion 21, and has a tip portion which constitutes an elastic contact and faces downward.

【0004】この陰極治具20に被めっき環状体10と
してピストンリングを装着する場合は、ピストンリング
の合口部を若干開いて上記3つの弾性接点に嵌めれば、
ピストンリングの弾力によりピストンリングは3つの弾
性接点に係止される。このようにして、陰極治具20の
対向する直線部に設けられている複数組の弾性接点部材
22,23に、それぞれピストンリングを装着して、こ
の陰極治具20をめっき槽内の陽極間に配置して通電す
ることにより、各ピストンリングの全面に例えばクロム
めっきが施される。
When a piston ring is attached to the cathode jig 20 as the to-be-plated annular body 10, the abutment portion of the piston ring is slightly opened and fitted into the above three elastic contacts.
The elastic force of the piston ring locks the piston ring on the three elastic contacts. In this way, piston rings are attached to a plurality of sets of elastic contact members 22 and 23 provided on the opposite straight portions of the cathode jig 20, and the cathode jig 20 is mounted between the anodes in the plating tank. By arranging and energizing, the entire surface of each piston ring is plated with chromium, for example.

【0005】[0005]

【発明が解決しようとする課題】この弾性接点によるめ
っき方法の欠点としては次の点が挙げられる。 弾性接点への被めっき環状体のセッティング作業が面
倒であり、作業性が悪い。 弾性接点に対して被めっき環状体は静止しているた
め、接点部と他の部分とでめっき厚さの不同を生じる。 陰極治具の対向する直線部に複数個の被めっき環状体
が配列するので、隣接する被めっき環状体間の間隔が被
めっき環状体の円周の各部位に対して一定にならない。
その結果、めっき厚さの不同を生じる。 陽極との距離バランスの不均一により、被めっき環状
体同士でめっき厚さの不同を生じる。
The drawbacks of the plating method using the elastic contacts are as follows. The work of setting the to-be-plated annular body on the elastic contact is troublesome and the workability is poor. Since the to-be-plated annular body is stationary with respect to the elastic contact, the contact portion and other portions have different plating thicknesses. Since the plurality of to-be-plated annular bodies are arranged in the straight line portions of the cathode jig facing each other, the interval between the adjacent to-be-plated annular bodies is not constant with respect to each part of the circumference of the to-be-plated annular body.
As a result, the plating thickness becomes different. Due to the non-uniformity of the distance balance with the anode, the ring-shaped objects to be plated have different plating thicknesses.

【0006】本発明の目的は、被めっき環状体を陰極部
に簡単に装着でき、かつ被めっき環状体の全面等のめっ
きを行え、被めっき環状体自身のめっき厚さおよび複数
個の被めっき環状体同士のめっき厚さの不同を低減でき
る電気めっき装置の陰極部構造を提供することにある。
An object of the present invention is to easily mount a to-be-plated annular body on a cathode portion, to plate the entire surface of the to-be-plated annular body, and to determine the plating thickness of the to-be-plated annular body itself and a plurality of to-be-plated bodies. An object of the present invention is to provide a cathode part structure of an electroplating apparatus capable of reducing the difference in plating thickness between annular bodies.

【0007】[0007]

【課題を解決するための手段】本発明の電気めっき装置
の陰極部構造は、外周面に長手方向に等間隔を置いて複
数個の環状溝を有しており、前記環状溝が被めっき環状
体の径方向厚さよりも浅い深さをなしている水平な陰極
回転軸と、この陰極回転軸の上方に平行をなして配置す
るアイドル静止軸と、前記アイドル静止軸に遊動可能に
挿入されており、少なくとも外周面が非導電材より形成
されている複数個のアイドル環状体とを備えていること
を特徴とする。
The cathode part structure of the electroplating apparatus of the present invention has a plurality of annular grooves on the outer peripheral surface at equal intervals in the longitudinal direction, and the annular grooves are the annular plates to be plated. A horizontal cathode rotating shaft having a depth shallower than the radial thickness of the body, an idle stationary shaft arranged in parallel above the cathode rotating shaft, and an idle stationary shaft movably inserted into the idle stationary shaft. And a plurality of idle annular bodies each having at least an outer peripheral surface formed of a non-conductive material.

【0008】前記アイドル環状体は1つの被めっき環状
体または隣接する2つの被めっき環状体を押接する幅を
備えているのが好ましい。
It is preferable that the idle annular body has a width for pressing one plated annular body or two adjacent annular bodies to be plated.

【0009】また、前記アイドル環状体の少なくとも外
周面が非導電弾性材より形成されているのが好ましい。
At least the outer peripheral surface of the idle annular body is preferably made of a non-conductive elastic material.

【0010】[0010]

【作用】陰極回転軸の環状溝に装着されて陰極回転軸に
等間隔に配列されている複数個の被めっき環状体は、陰
極回転軸の上方に配置するアイドル静止軸に挿入されて
いるアイドル環状体の自重によって押圧され、被めっき
環状体の内周面が陰極回転軸の外周面に押接される。
A plurality of annular bodies to be plated, which are mounted in the annular groove of the cathode rotating shaft and arranged at equal intervals on the cathode rotating shaft, are idle inserted in the idle stationary shaft arranged above the cathode rotating shaft. The annular body is pressed by its own weight, and the inner peripheral surface of the plated annular body is pressed against the outer peripheral surface of the cathode rotating shaft.

【0011】このように、被めっき環状体が陰極回転軸
に押接されるために、接点部が安定する。そして、アイ
ドル環状体の自重によって押圧される構成のため、各被
めっき環状体の径方向の厚さにバラツキがあっても、そ
の厚さのバラツキを吸収でき、各被めっき環状体の陰極
回転軸への押接力を均一化できる。
As described above, since the to-be-plated annular body is pressed against the cathode rotating shaft, the contact portion becomes stable. And, since the idle annular body is pressed by its own weight, even if there is a variation in the radial thickness of each plated annular body, the variation in the thickness can be absorbed, and the cathode rotation of each plated annular body The pressing force on the shaft can be made uniform.

【0012】そして、陰極回転軸が回転すると、被めっ
き環状体が回転させられると同時に、アイドル環状体も
回転され、陰極回転軸と被めっき環状体との接点部は常
時移動する。
When the cathode rotating shaft rotates, the plated annular body is rotated, and at the same time, the idle annular body is also rotated and the contact portion between the cathode rotating shaft and the plated annular body always moves.

【0013】以上のように、各被めっき環状体は陰極回
転軸に等間隔をおいて配列し、均一な力で陰極回転軸に
押接できるとともに、陰極回転軸の回転により回転され
て接点が常に移動するので、被めっき環状体自身のめっ
き厚さおよび複数個の被めっき環状体同士のめっき厚さ
の不同を低減できる。
As described above, the annular members to be plated are arranged at equal intervals on the cathode rotating shaft so that they can be pressed against the cathode rotating shaft with a uniform force, and the contacts are rotated by the rotation of the cathode rotating shaft. Since it constantly moves, it is possible to reduce inconsistency in the plating thickness of the to-be-plated annular body itself and the plating thickness of a plurality of to-be-plated annular bodies.

【0014】[0014]

【実施例】以下、本発明の一実施例を図面に基づいて説
明する。図1および図2において、陰極回転軸1は銅や
銅合金で形成されており、外周面2には長手方向に等間
隔を置いて複数個の環状溝3が形成されている。環状溝
3の深さはピストンリング等の被めっき環状体の径方向
の厚さよりも浅く形成されており、環状溝3以外の外周
面は絶縁皮膜で覆われている。環状溝3の断面形状はU
字状、V字状、あるいは矩形形状等、その形状は問わな
いが、被めっき物の断面形状に対応した形状を採用する
のがよい。例えば、被めっき物の断面形状が円形の場合
はU字状またはV字状にし(例えば被めっき物がコイル
エキスパンダ等の場合)、被めっき物の断面形状が矩形
の場合は矩形形状にすればよい(例えば被めっき物が断
面矩形のコンプレッションリング等の場合)。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. 1 and 2, the cathode rotating shaft 1 is made of copper or a copper alloy, and a plurality of annular grooves 3 are formed on the outer peripheral surface 2 at equal intervals in the longitudinal direction. The depth of the annular groove 3 is formed to be shallower than the radial thickness of an annular body to be plated such as a piston ring, and the outer peripheral surface other than the annular groove 3 is covered with an insulating film. The sectional shape of the annular groove 3 is U
The shape is not limited to a V shape, a V shape, or a rectangular shape, but it is preferable to adopt a shape corresponding to the cross-sectional shape of the object to be plated. For example, if the cross-sectional shape of the object to be plated is circular, it should be U-shaped or V-shaped (for example, if the object to be plated is a coil expander, etc.), and if the cross-sectional shape of the object to be plated is rectangular, it should be rectangular. It suffices (for example, when the object to be plated is a compression ring with a rectangular cross section).

【0015】この陰極回転軸1はめっき槽5内に水平に
保持されて、図示外の回転駆動手段によって回転される
ように構成され、且つ回転時は図示外の通電手段によっ
て常時通電できるように構成されている。そしてめっき
槽5内には、陰極回転軸1の両側に複数本の陽極6が配
設されている。陽極6は陰極回転軸1の長手方向に等間
隔を置いて垂直に設けられている。
The cathode rotating shaft 1 is horizontally held in the plating tank 5 and is configured to be rotated by a rotation driving means (not shown), and at the time of rotation, it can be constantly energized by an energizing means (not shown). It is configured. In the plating tank 5, a plurality of anodes 6 are arranged on both sides of the cathode rotating shaft 1. The anodes 6 are vertically provided at equal intervals in the longitudinal direction of the cathode rotating shaft 1.

【0016】陰極回転軸1の上方位置には、アイドル静
止軸7が陰極回転軸1と平行に設けられている。このア
イドル静止軸7には、等間隔を置いて同一の大きさのス
ペーサ8が多数嵌められており、アイドル静止軸7のス
ペーサ8間にそれぞれアイドル環状体9が挿入されてい
る。これらのアイドル環状体9は全て同一の形状、材
質、重量を備えている。
An idle stationary shaft 7 is provided above the cathode rotating shaft 1 in parallel with the cathode rotating shaft 1. A large number of spacers 8 of the same size are fitted on the idle stationary shaft 7 at equal intervals, and idle annular bodies 9 are inserted between the spacers 8 of the idle stationary shaft 7. All of these idle annular bodies 9 have the same shape, material and weight.

【0017】アイドル環状体9は少なくとも外周面が非
導電弾性材で形成されている。例えば、金属環の外周を
樹脂(弗素樹脂等)で被覆したものや、環状体全部を樹
脂(弗素樹脂等)で形成したものなどで構成されてい
る。そしてアイドル環状体9は、その内径がアイドル静
止軸7の外径よりも大きく、アイドル静止軸7に対して
遊動できるように構成されており、非めっき時は図3に
示されているように、アイドル静止軸7にぶら下がる状
態にあり、めっき時はアイドル静止軸7から浮き上が
り、陰極回転軸1の環状溝3に挿入されている被めっき
環状体10を自重によって押圧して、被めっき環状体1
0の内周面が陰極回転軸1の環状溝3の外周面に押接さ
れるように作用する。この場合、各被めっき環状体10
が陰極回転軸1の環状溝3の外周面に均等に押接される
ようにするために、アイドル環状体9の軸方向長は隣接
する2本の被めっき環状体10に当接する長さ(図1参
照)、あるいは1本の被めっき環状体10に当接する長
さ(図4参照)とするのがよい。
At least the outer peripheral surface of the idle annular body 9 is formed of a non-conductive elastic material. For example, the metal ring is formed by coating the outer periphery of the metal ring with a resin (fluorine resin or the like), or by forming the entire annular body with a resin (fluorine resin or the like). The idle annular body 9 has an inner diameter larger than the outer diameter of the idle stationary shaft 7, and is configured to be able to move freely with respect to the idle stationary shaft 7. As shown in FIG. , Which is in a state of hanging from the idle stationary shaft 7, floats from the idle stationary shaft 7 during plating, presses the plated annular body 10 inserted into the annular groove 3 of the cathode rotating shaft 1 by its own weight, and 1
The inner peripheral surface of 0 acts so as to be pressed against the outer peripheral surface of the annular groove 3 of the cathode rotating shaft 1. In this case, each plated annular body 10
In order to be uniformly pressed against the outer peripheral surface of the annular groove 3 of the cathode rotation shaft 1, the axial length of the idle annular body 9 is such that the two adjacent annular bodies 10 to be plated are in contact with each other ( (See FIG. 1) or a length (see FIG. 4) that abuts against one annular member 10 to be plated.

【0018】以上のアイドル静止軸7は上下に移動でき
るように構成されており、めっき時に所定位置まで下降
して、上記の如くアイドル環状体9が陰極回転軸1の環
状溝3に挿入されている被めっき環状体10を自重によ
って押圧するように構成されている。
The idle stationary shaft 7 is constructed so that it can move up and down, and it descends to a predetermined position during plating, and the idle annular body 9 is inserted into the annular groove 3 of the cathode rotating shaft 1 as described above. The annular body 10 to be plated is configured to be pressed by its own weight.

【0019】以下、上記装置を使用して、コンプレッシ
ョンリングの全面にクロムめっき等のめっきを施す場合
を説明する。
A case will be described below in which the compression ring is plated on the entire surface of the compression ring using the above apparatus.

【0020】まず、陰極回転軸1の各環状溝3にコンプ
レッションリング10を挿入する。コンプレッションリ
ング10を装着した陰極回転軸1をめっき槽5内にセッ
トする。次にアイドル静止軸7を所定位置まで下降させ
ると、アイドル環状体9がコンプレッションリング10
の外周面に当接されてアイドル静止軸7から浮き上が
り、コンプレッションリング10がアイドル環状体9の
自重によって押圧されて、コンプレッションリング10
の内周面が陰極回転軸1の環状溝3の外周面に押接され
る。
First, the compression ring 10 is inserted into each annular groove 3 of the cathode rotating shaft 1. The cathode rotating shaft 1 equipped with the compression ring 10 is set in the plating tank 5. Next, when the idle stationary shaft 7 is lowered to a predetermined position, the idle annular body 9 moves to the compression ring 10.
Is pressed against the outer peripheral surface of the idle floating shaft 7 and floats from the idle stationary shaft 7, and the compression ring 10 is pressed by the dead weight of the idle annular body 9 to
The inner peripheral surface of is pressed against the outer peripheral surface of the annular groove 3 of the cathode rotating shaft 1.

【0021】そして、図示外の回転駆動手段により陰極
回転軸1が回転させられるとともに、陽極6と陰極回転
軸1との間に図示外の通電手段により通電される。これ
により、コンプレッションリング10の外周面と上下面
とにめっきが施される。この場合、陰極回転軸1が回転
されると、アイドル環状体9によって陰極回転軸1に押
圧されているコンプレッションリング10も回転すると
ともに、アイドル環状体9も回転する。
Then, the cathode rotating shaft 1 is rotated by a rotation driving means (not shown), and the anode 6 and the cathode rotating shaft 1 are energized by energizing means (not shown). As a result, the outer peripheral surface and the upper and lower surfaces of the compression ring 10 are plated. In this case, when the cathode rotating shaft 1 is rotated, the compression ring 10 pressed against the cathode rotating shaft 1 by the idle annular body 9 also rotates and the idle annular body 9 also rotates.

【0022】したがって、めっき時に、コンプレッショ
ンリング10が回転するので、陰極回転軸1との接点が
常時移動する。そのため、コンプレッションリング10
自身のめっき厚さの不同を減少できる。
Therefore, since the compression ring 10 rotates during plating, the contact point with the cathode rotating shaft 1 always moves. Therefore, the compression ring 10
It is possible to reduce the disparity in the plating thickness of oneself.

【0023】また、めっき時、複数個のコンプレッショ
ンリング10は陰極回転軸1に沿って等間隔に配列され
ているので、隣接するコンプレッションリング10間の
間隔が一定で、めっき厚さの不同を減少できる。
In addition, during plating, the plurality of compression rings 10 are arranged at equal intervals along the cathode rotating shaft 1, so that the intervals between the adjacent compression rings 10 are constant and uneven plating thickness is reduced. it can.

【0024】また、アイドル環状体9の自重によって、
コンプレッションリング10を押圧するので、複数個の
コンプレッションリング10の径方向の厚さにバラツキ
があっても、その厚さのバラツキを吸収でき、各コンプ
レッションリング10が陰極回転軸1に均一な力で押接
される。このため、複数個のコンプレッションリング1
0同士のめっき厚さの不同を減少できる。
Further, due to the weight of the idle annular body 9,
Since the compression rings 10 are pressed, even if there are variations in the radial thickness of the plurality of compression rings 10, the variations in the thickness can be absorbed, and each compression ring 10 exerts a uniform force on the cathode rotating shaft 1. It is pressed. Therefore, a plurality of compression rings 1
It is possible to reduce the difference in plating thickness between 0s.

【0025】なお、上記実施例では、アイドル静止軸7
にスペーサ8を介してアイドル環状体9を配列したが、
アイドル静止軸に長手方向に等間隔を置いて複数個の環
状溝を形成し、これらの環状溝にそれぞれアイドル環状
体を遊動可能に挿入するように構成してもよい。
In the above embodiment, the idle stationary shaft 7 is used.
The idle ring members 9 are arranged on the
A plurality of annular grooves may be formed at equal intervals in the longitudinal direction on the idle stationary shaft, and the idle annular body may be movably inserted into each of these annular grooves.

【0026】また、上記実施例では、コンプレッション
リング10の全面をめっきするものとしたが、一部の面
をめっきする場合には、非めっき部分をマスキングして
おけばよい。例えば上下面をめっきする場合には、外周
面をマスキングしておけばよい。
Further, in the above embodiment, the entire surface of the compression ring 10 is plated, but when plating a part of the surface, the non-plated portion may be masked. For example, when plating the upper and lower surfaces, the outer peripheral surface may be masked.

【0027】また、本装置は、コンプレッションリング
に適用した例を示したが、この他のピストンリング(組
合せオイルリングのサイドレールやコイルエキスパンダ
等も含む。)など、被めっき物が環状体であれば適用で
きる。
Further, although this device has been shown as an example applied to a compression ring, other objects such as piston rings (including side rails of combined oil rings, coil expanders, etc.) are to be plated and are annular bodies. If applicable, it can be applied.

【0028】以下、組合せオイルリングのコイルエキス
パンダについて、比較例および本発明に係るめっき装置
を使用して、全面にクロムめっきを施した例を説明す
る。
Hereinafter, a description will be given of a coil expander of a combined oil ring, in which the entire surface is plated with chromium by using the comparative example and the plating apparatus according to the present invention.

【0029】コイルエキスパンダの内容は次の通りであ
る。 線径 :1φmm コイル外径:3φmm(ピッチ1.5mm) 全長 :345.4mm 材質 :炭素鋼
The contents of the coil expander are as follows. Wire diameter: 1φmm Coil outer diameter: 3φmm (pitch 1.5mm) Overall length: 345.4mm Material: Carbon steel

【0030】このコイルエキスパンダに下記のようにし
てクロムめっきを施した。 (比較例)直線状コイルの一端を保持し、陽極間に吊
るし、通電し、常法でクロムめっきした。めっき条件は
被めっき物間を20mm、30本を同時めっきし、めっ
き電流500A、めっき時間25分とした。 (比較例)コイルの両端を使用時状態のようにジョイ
ントして110φmmの環状に形成し、図7により説明
した弾性接点方式の陰極治具に保持してめっきを行っ
た。めっき条件は1ラック当たり、横2列、縦5列で1
ラック当たり10個とし、3ラック同時に陽極間に吊る
し、めっき電流500A、めっき時間25分とした。被
めっき物間は1ラック内20mm、ラック間50mmと
した。 (実施例)コイルの両端を使用時状態のようにジョイン
トして110φmmの環状に形成し、本発明に係るめっ
き装置に供した。被めっき物間を15〜20mm、30
本を同時めっきし、陰極回転軸の回転速度は1mm/秒
の移動量で、めっき電流500A、めっき時間25分と
した。
This coil expander was plated with chromium as follows. (Comparative Example) One end of a linear coil was held, suspended between anodes, energized, and chromium-plated by a conventional method. The plating conditions were such that the distance between the objects to be plated was 20 mm, 30 pieces were simultaneously plated, and the plating current was 500 A and the plating time was 25 minutes. (Comparative Example) Both ends of the coil were jointed as in a state of use to form a ring having a diameter of 110 mm, and the coil was held in the cathode jig of the elastic contact method described with reference to FIG. 7 for plating. Plating conditions are 1 row for 2 rows and 5 rows for each rack.
There were 10 racks, and 3 racks were hung simultaneously between the anodes, and the plating current was 500 A and the plating time was 25 minutes. The distance between the objects to be plated was 20 mm in one rack and the distance between the racks was 50 mm. (Example) Both ends of the coil were jointed as in a state of use to form an annular shape of 110 mm, and the coil was applied to the plating apparatus according to the present invention. 15 to 20 mm between plated objects, 30
The books were simultaneously plated, the rotation speed of the cathode rotating shaft was 1 mm / sec, the plating current was 500 A, and the plating time was 25 minutes.

【0031】上記によりめっきした各めっき物の1個内
9か所の外径を測定し、そのめっき厚さ分布を比較した
(n=30)。
Outer diameters at 9 locations in each plated product plated as described above were measured, and the plating thickness distributions were compared (n = 30).

【0032】[0032]

【表1】 [Table 1]

【0033】比較例は、中央部のめっき厚さが薄く、
下端部にはめっきのトビツキが発生し、めっき厚さの不
同が大きい。また、めっき速度のロスが大きい。通常実
施されている比較例の場合は、被めっき物の電気抵抗
が高く、一方向だけでの通電では電流分布が不均一で均
一めっきができない。したがって、常法通り、めっき途
中で出槽し、保持替え反転する必要があり、作業能率が
劣る。
In the comparative example, the plating thickness of the central portion is thin,
Plating pitting occurs at the lower end, and the difference in plating thickness is large. Also, the loss of plating speed is large. In the case of the comparative example which is usually carried out, the electric resistance of the object to be plated is high, and the current distribution is non-uniform when energized in only one direction, and uniform plating cannot be performed. Therefore, as in the conventional method, it is necessary to take out the tank during the plating, and to change the holding and reversing, and the work efficiency is poor.

【0034】比較例は、比較例よりも1個内のめっ
き厚さの不同は小さいが、接点が静止しており且つ被め
っき物間および陽極との間の距離の不同の影響により1
個内の局部的なめっき厚さの不同が大きく、めっき前外
径の不同(σ)に対する増加が約2倍あり不十分であ
る。
In the comparative example, the difference in the plating thickness within one piece is smaller than that in the comparative example, but it is 1 due to the influence of the difference in the distance between the object to be plated and the anode because the contact is stationary.
The local unevenness of the plating thickness is large, and the increase in the outside diameter before plating (σ) is about twice as large, which is insufficient.

【0035】実施例は、めっき厚さの不同が小さく、め
っき前外径の不同(σ)に対する増加が1.2倍と非常
に小さい。
In the examples, the difference in the plating thickness is small, and the increase in the outer diameter before plating (σ) is 1.2 times, which is very small.

【0036】次に、コンプレッションリングについて、
比較例および本発明に係るめっき装置を使用して、上下
面にクロムめっきを施した例を説明する。
Next, regarding the compression ring,
An example will be described in which the upper and lower surfaces are plated with chrome using the comparative example and the plating apparatus according to the present invention.

【0037】コンプレッションリングの内容は次の通り
である。 幅(B寸) :4.0mm 厚さ(T寸):5.0mm 外径 :110φmm 自由合い口隙間 :約10mm 材質 :球状黒鉛鋳鉄
The contents of the compression ring are as follows. Width (B dimension): 4.0 mm Thickness (T dimension): 5.0 mm Outer diameter: 110φ mm Free contact gap: Approx. 10 mm Material: Spheroidal graphite cast iron

【0038】このコンプレッションリングに下記のよう
にしてクロムめっきを施した。 (比較例)図7により説明した弾性接点方式の陰極治具
に保持してめっきを行った。めっき条件は1ラック当た
り、横2列、縦5列で1ラック当たり10個とし、3ラ
ック同時に陽極間に吊るし、めっき電流500A、めっ
き時間60分とした。被めっき物間は1ラック内20m
m、ラック間50mmとした。 (実施例)本発明に係るめっき装置に供した。被めっ
き物間を15〜20mm、30本を同時めっきし、陰極
回転軸の回転速度は1mm/秒の移動量で、めっき電流
300A、めっき時間60分とした。 (実施例)図5に示されているように、被めっき環状
体10の幅寸法(B寸)と同寸法の閉じた環状体11の
内周に、被めっき環状体10を嵌めた後、実施例と同
様にしてめっきに供した。なお、閉じた環状体11に被
めっき環状体10を嵌めたときの被めっき環状体10の
合い口隙間は1〜2mmである。
This compression ring was plated with chrome as follows. (Comparative Example) The plating was carried out while holding the elastic contact type cathode jig described with reference to FIG. The plating conditions were two racks horizontally and five rows vertically, ten racks per rack, and three racks were simultaneously hung between the anodes, and the plating current was 500 A and the plating time was 60 minutes. 20m in one rack between plated objects
m and the distance between racks was 50 mm. (Example) The plating apparatus according to the present invention was used. Between the objects to be plated, 15 to 20 mm, 30 pieces were simultaneously plated, the rotation speed of the cathode rotating shaft was a moving amount of 1 mm / sec, the plating current was 300 A, and the plating time was 60 minutes. (Example) As shown in FIG. 5, after fitting the to-be-plated annular body 10 to the inner circumference of the closed toroidal body 11 having the same width dimension (B dimension) as the to-be-plated annular body 10, The plating was performed in the same manner as in the example. In addition, when the annular body 10 to be plated is fitted into the closed annular body 11, the gap between the annular bodies 10 to be plated is 1 to 2 mm.

【0039】上記によりめっきした各めっき物の1個内
9か所の幅寸法(B寸)を測定し、そのめっき厚さ分布
を比較した(n=30)。測定個所は図6(b)に示さ
れているように、両側の合口端部と、その他の周部を略
8等分した個所である。図6(a)に測定結果をグラフ
にしたものを示す。
The width dimension (B dimension) at 9 locations in each plated product plated as described above was measured, and the plating thickness distributions were compared (n = 30). As shown in FIG. 6 (b), the measurement point is a point where the abutting end portions on both sides and other peripheral portions are divided into approximately eight equal parts. FIG. 6A shows a graph of the measurement results.

【0040】[0040]

【表2】 [Table 2]

【0041】通常実施されている比較例と、実施例
は、めっきの特性である合口部の局部的なめっき厚さの
過大から、めっき厚さの不同(σ)が大きい。しかし、
合口部以外のめっき厚さの不同(σ)の増加が比較例が
2.6倍に対して、本発明の実施例では1.5倍に減
少しており、改善されていることがわかる。
In the comparative example and the example which are usually carried out, the difference in the plating thickness (σ) is large because of the local excessive plating thickness of the abutment portion which is the characteristic of the plating. But,
It can be seen that the increase in the non-uniformity (σ) of the plating thickness other than the abutment portion is 2.6 times in the comparative example and 1.5 times in the example of the present invention, which is an improvement.

【0042】実施例では、被めっき物が実質的に完全
な環体となることにより、合口部を含むめっき厚さの不
同(σ)は1.3倍に減少し、大幅に改善されている。
また、めっき厚さ分布が均一化し、全体のめっき速度の
向上効果も認められる。
In the example, the non-uniformity (σ) of the plating thickness including the abutting part is reduced by 1.3 times, which is a great improvement, because the object to be plated is a substantially complete ring. ..
Further, the distribution of the plating thickness is made uniform, and the effect of improving the overall plating speed is also recognized.

【0043】[0043]

【発明の効果】以上説明したように本発明によれば、外
周面に長手方向に等間隔を置いて複数個の環状溝を有し
ており、前記環状溝が被めっき環状体の径方向厚さより
も浅い深さをなしている水平な陰極回転軸と、この陰極
回転軸の上方に平行をなして配置するアイドル静止軸
と、前記アイドル静止軸に遊動可能に挿入されており、
少なくとも外周面が非導電材より形成されている複数個
のアイドル環状体とを備えていることにより、各被めっ
き環状体は陰極回転軸に等間隔をおいて配列し、均一な
力で陰極回転軸に押接できるとともに、陰極回転軸の回
転により回転されて接点が常に移動するので、被めっき
環状体自身のめっき厚さおよび複数個の被めっき環状体
同士のめっき厚さの不同を低減できる。
As described above, according to the present invention, the outer peripheral surface has a plurality of annular grooves at equal intervals in the longitudinal direction, and the annular grooves have a radial thickness of the to-be-plated annular body. A horizontal cathode rotating shaft having a shallower depth than that, an idle stationary shaft arranged in parallel above the cathode rotating shaft, and the idle stationary shaft is movably inserted into the idle stationary shaft,
Since at least the outer peripheral surface is provided with a plurality of idle annular bodies formed of a non-conductive material, each annular body to be plated is arranged at equal intervals on the cathode rotating shaft, and the cathode is rotated by a uniform force. Since it can be pressed against the shaft and the contact is constantly moved by being rotated by the rotation of the cathode rotating shaft, it is possible to reduce the difference in the plating thickness of the to-be-plated annular body itself and the plating thickness of a plurality of to-be-plated annular bodies. ..

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のめっき装置を示す平面図である。FIG. 1 is a plan view showing a plating apparatus of the present invention.

【図2】本発明のめっき装置を示す縦断面図である。FIG. 2 is a vertical sectional view showing a plating apparatus of the present invention.

【図3】非めっき時のアイドル静止軸とアイドル環状体
を示す断面図である。
FIG. 3 is a cross-sectional view showing an idle stationary shaft and an idle annular body during non-plating.

【図4】アイドル環状体の別の例を示し、図1に対応す
る(但しめっき槽は省略)平面図である。
FIG. 4 is a plan view showing another example of the idle annular body and corresponding to FIG. 1 (however, the plating tank is omitted).

【図5】閉じた環状体の内周に被めっき環状体を嵌めた
ものを示す平面図である。
FIG. 5 is a plan view showing an annular body to be plated fitted to the inner periphery of a closed annular body.

【図6】(a)はコンプレッションリングをクロムめっ
きした際のめっき厚さを測定した結果を示すグラフ、
(b)は測定個所を示す説明図である。
FIG. 6A is a graph showing a result of measuring a plating thickness when a compression ring is plated with chrome;
(B) is an explanatory view showing a measurement point.

【図7】従来の陰極治具を示す正面図である。FIG. 7 is a front view showing a conventional cathode jig.

【符号の説明】[Explanation of symbols]

1 陰極回転軸 2 外周面 3 環状溝 5 めっき槽 6 陽極 7 アイドル静止軸 8 スペーサ 9 アイドル環状体 10 被めっき環状体 11 閉じた環状体 DESCRIPTION OF SYMBOLS 1 cathode rotating shaft 2 outer peripheral surface 3 annular groove 5 plating tank 6 anode 7 idle stationary shaft 8 spacer 9 idle annular body 10 annular body to be plated 11 closed annular body

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 外周面に長手方向に等間隔を置いて複数
個の環状溝を有しており、前記環状溝が被めっき環状体
の径方向厚さよりも浅い深さをなしている水平な陰極回
転軸と、この陰極回転軸の上方に平行をなして配置する
アイドル静止軸と、前記アイドル静止軸に遊動可能に挿
入されており、少なくとも外周面が非導電材より形成さ
れている複数個のアイドル環状体とを備えていることを
特徴とする電気めっき装置の陰極部構造。
1. A horizontal surface having a plurality of annular grooves on the outer peripheral surface at equal intervals in the longitudinal direction, the annular grooves having a depth shallower than the radial thickness of the to-be-plated annular body. A cathode rotating shaft, an idle stationary shaft arranged in parallel above the cathode rotating shaft, and a plurality of idle shafts that are movably inserted in the idle stationary shaft and at least an outer peripheral surface of which is formed of a non-conductive material. And an idle annular body of 1. The cathode part structure of the electroplating apparatus.
【請求項2】 前記アイドル環状体は1つの被めっき環
状体または隣接する2つの被めっき環状体を押接する幅
を備えていることを特徴とする請求項1記載の電気めっ
き装置の陰極部構造。
2. The cathode part structure of an electroplating apparatus according to claim 1, wherein the idle annular body has a width for pressing one plated annular body or two adjacent plated annular bodies. ..
【請求項3】 前記アイドル環状体の少なくとも外周面
が非導電弾性材より形成されていることを特徴とする請
求項1または2記載の電気めっき装置の陰極部構造。
3. The cathode part structure of an electroplating apparatus according to claim 1, wherein at least an outer peripheral surface of the idle annular body is formed of a non-conductive elastic material.
JP5423692A 1992-02-05 1992-02-05 Cathode structure of electroplating equipment Expired - Fee Related JP2840994B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5423692A JP2840994B2 (en) 1992-02-05 1992-02-05 Cathode structure of electroplating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5423692A JP2840994B2 (en) 1992-02-05 1992-02-05 Cathode structure of electroplating equipment

Publications (2)

Publication Number Publication Date
JPH05214596A true JPH05214596A (en) 1993-08-24
JP2840994B2 JP2840994B2 (en) 1998-12-24

Family

ID=12964911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5423692A Expired - Fee Related JP2840994B2 (en) 1992-02-05 1992-02-05 Cathode structure of electroplating equipment

Country Status (1)

Country Link
JP (1) JP2840994B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104233426A (en) * 2014-09-05 2014-12-24 朱玉兵 Aluminum pipe profile anode oxidation tank
CN104250843A (en) * 2014-10-08 2014-12-31 仪征威龙发动机零部件有限公司 Piston ring plating device with rotary cathode
CN109518241A (en) * 2018-12-27 2019-03-26 中国电子科技集团公司第二研究所 The automatic loading/unloading and storing method of piston ring electroplating assembly line
CN114525571A (en) * 2020-11-23 2022-05-24 余姚市爱迪升电镀科技有限公司 Electroplating suspension device and electroplating method
CN115058758A (en) * 2022-07-12 2022-09-16 大连迪施船机有限公司 Hard chromium electroplating device for marine main engine piston ring groove, working method and process

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104233426A (en) * 2014-09-05 2014-12-24 朱玉兵 Aluminum pipe profile anode oxidation tank
CN104233426B (en) * 2014-09-05 2016-08-24 朱玉兵 Aluminum pipe section bar anodizing tank
CN104250843A (en) * 2014-10-08 2014-12-31 仪征威龙发动机零部件有限公司 Piston ring plating device with rotary cathode
CN109518241A (en) * 2018-12-27 2019-03-26 中国电子科技集团公司第二研究所 The automatic loading/unloading and storing method of piston ring electroplating assembly line
CN114525571A (en) * 2020-11-23 2022-05-24 余姚市爱迪升电镀科技有限公司 Electroplating suspension device and electroplating method
CN115058758A (en) * 2022-07-12 2022-09-16 大连迪施船机有限公司 Hard chromium electroplating device for marine main engine piston ring groove, working method and process

Also Published As

Publication number Publication date
JP2840994B2 (en) 1998-12-24

Similar Documents

Publication Publication Date Title
JPH05214596A (en) Structure of cathode part of electroplating device
US2433457A (en) Chrome plated wear resisting surface
US5285684A (en) Shape detecting roll
US4115156A (en) Method of manufacturing a bearing part
FR2454471A1 (en) PROCESS FOR CHROMIZING METAL PIECES SUCH AS STEEL PIECES AND CHROMIZED METAL PIECES
FR2260713A1 (en) Flanged shaft bush for a bearing - flange is formed by axially pressing the constant dia. bush
JPS6045717B2 (en) Piston rings for internal combustion engines
CN209773117U (en) Straightening roll assembly of stretch bending straightening machine
JPS5696088A (en) Bearing for internal combustion engine and its manufacture
KR101558638B1 (en) Holder for rolling bearing and rolling bearing
US2397177A (en) Apparatus for electroplating ball bearings
JPH0544839A (en) Combined oil ring
GB1518417A (en) One-piece conductor roller for electrolytic processing of strip materials
US3273944A (en) Die set having aluminum oxide bearing surface
ES269069U (en) Rotary metal brush for removing submerged anti-corrosive covering and method for using the same
CN209682031U (en) Fixture is used in a kind of detection of bearing roller convexity
JPS57116924A (en) Inner wire
US3751354A (en) Electroplating cell including magnetic means to couple concave workpieces to a plating rack
US3036967A (en) Piston ring groove plating fixture
RU2207410C1 (en) Method of electrolytic deposition of coating on flat articles
CN209741246U (en) Tappet is support for nitridation
CN213142161U (en) Tool for ion nitriding of steel balls
CN113106509A (en) Electroplating method for petroleum drilling equipment rotor
CN214082190U (en) Ceramic shaft end face verticality finishing clamp
CN219670699U (en) Suspension type support frame

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees