JPH0520812B2 - - Google Patents
Info
- Publication number
- JPH0520812B2 JPH0520812B2 JP25119183A JP25119183A JPH0520812B2 JP H0520812 B2 JPH0520812 B2 JP H0520812B2 JP 25119183 A JP25119183 A JP 25119183A JP 25119183 A JP25119183 A JP 25119183A JP H0520812 B2 JPH0520812 B2 JP H0520812B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- soft magnetic
- substrate
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 20
- 229920000642 polymer Polymers 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000005415 magnetization Effects 0.000 claims description 4
- 238000000354 decomposition reaction Methods 0.000 claims description 2
- 230000008018 melting Effects 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims description 2
- 238000000859 sublimation Methods 0.000 claims description 2
- 230000008022 sublimation Effects 0.000 claims description 2
- 239000010408 film Substances 0.000 description 30
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 8
- 239000010952 cobalt-chrome Substances 0.000 description 8
- 238000007796 conventional method Methods 0.000 description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 description 6
- 239000005020 polyethylene terephthalate Substances 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000004760 aramid Substances 0.000 description 3
- 229920003235 aromatic polyamide Polymers 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910000815 supermalloy Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
〔技術分野〕
磁気記録面に対して垂直方向に磁化容易軸を持
つ垂直磁気異方性膜と少なくとも一層以上の軟磁
性膜とを組み合わせた垂直磁気記録媒体を作成す
る方法に関する。
〔従来技術〕
従来、高分子成形物基板上への垂直磁気記録媒
体の製造方法として、蒸着・スパツタ等の薄膜製
造技術が用いられてきた。蒸着・スパツタで垂直
磁気記録媒体を製造する場合、薄膜中にどうして
もN2、O2、H2O等の気体分子が入り込み、磁気
特性の劣化が生じていた。特に下地としての軟磁
性膜の磁気特性の劣化は激しい。これは、膜中の
N2、O2、H2O等により軟磁性膜の不連続がもた
らされ、磁壁がピンニングされるためと考えられ
る。また、基板と軟磁性膜間のストレスが生じ、
それらのため再生出力の劣化、記録密度特性の劣
化が生じるという問題点があつた。
〔目的〕
本発明は上記の点に鑑み、軟磁性膜中の磁壁の
ピンニング及び基板と軟磁性膜間のストレスの原
因を除去し、軟磁性膜の磁気特性の向上、及び垂
直磁気異方性膜の磁気特性の向上を計るとともに
再生出力・記録密度特性の優れた垂直磁気記録媒
体を得ることを目的とするものである。
〔概要〕
本発明は、磁気記録面に対して垂直方向に磁化
容易軸を持つ垂直磁気異方性膜と少なくとも一層
以上の軟磁性膜とを組み合わせた垂直磁気記録媒
体において、前記媒体の軟磁性膜を作成した後、
前記媒体の基板である高分子成形物基板の溶融あ
るいは昇華あるいは分解の温度以下で熱処理を行
ない、垂直磁気異方性膜を作成しようというもの
である。
〔実施例〕
以下、本発明について実施例に基づき詳細に説
明する。
本実施例として、高分子成形物基板にはPET
（ポリエチレンテレフタラート）を用い、軟磁性
膜はCoTi・垂直磁気異方性膜はCoCrを用いた。
第１図に本実施例の媒体の断面図を示す。１は
PETで50μｍ厚、２はCoTi膜で0.5μｍ厚、３は
CoCr膜0.5μｍ厚である。
まずスパツタ装置にPETをセツトし、基板温
度を100℃でCoTiを0.5μｍスパツタする。その後
基板温度を150℃で１時間保持し、再度基板温度
を100℃まで冷却し、CoCrを0.5μｍスパツタす
る。一方、従来法ではCoTiもCoCrも100℃で連
続して0.5μｍずつスパツタする。表１に上述した
本発明と従来法による垂直磁気記録媒体の磁気特
性を示す。
[Technical Field] The present invention relates to a method for producing a perpendicular magnetic recording medium that combines a perpendicular magnetic anisotropic film having an axis of easy magnetization perpendicular to a magnetic recording surface and at least one soft magnetic film. [Prior Art] Conventionally, thin film manufacturing techniques such as vapor deposition and sputtering have been used as a method for manufacturing perpendicular magnetic recording media on polymer molded substrates. When manufacturing perpendicular magnetic recording media by vapor deposition or sputtering, gas molecules such as N 2 , O 2 , H 2 O, etc. inevitably enter the thin film, resulting in deterioration of magnetic properties. In particular, the deterioration of the magnetic properties of the soft magnetic film as an underlayer is severe. This is due to
This is thought to be because N 2 , O 2 , H 2 O, etc. cause discontinuity in the soft magnetic film and pin the domain wall. In addition, stress occurs between the substrate and the soft magnetic film,
These problems caused deterioration of reproduction output and deterioration of recording density characteristics. [Purpose] In view of the above points, the present invention eliminates the causes of pinning of domain walls in a soft magnetic film and stress between the substrate and the soft magnetic film, improves the magnetic properties of the soft magnetic film, and improves perpendicular magnetic anisotropy. The purpose is to improve the magnetic properties of the film and to obtain a perpendicular magnetic recording medium with excellent reproduction output and recording density characteristics. [Summary] The present invention provides a perpendicular magnetic recording medium that combines a perpendicular magnetic anisotropic film having an axis of easy magnetization perpendicular to a magnetic recording surface and at least one layer of soft magnetic film. After creating the membrane,
The idea is to create a perpendicular magnetic anisotropic film by performing heat treatment at a temperature below the melting, sublimation, or decomposition temperature of the polymer molded substrate, which is the substrate of the medium. [Examples] Hereinafter, the present invention will be described in detail based on Examples. In this example, the polymer molded substrate is PET.
(polyethylene terephthalate), CoTi was used for the soft magnetic film, and CoCr was used for the perpendicular magnetic anisotropic film.
FIG. 1 shows a cross-sectional view of the medium of this example. 1 is
PET 50μm thick, 2 CoTi film 0.5μm thick, 3
The CoCr film is 0.5 μm thick. First, PET was set in a sputtering device, and CoTi was sputtered to a thickness of 0.5 μm at a substrate temperature of 100°C. Thereafter, the substrate temperature was maintained at 150°C for 1 hour, the substrate temperature was cooled again to 100°C, and CoCr was sputtered to a thickness of 0.5 μm. On the other hand, in the conventional method, both CoTi and CoCr are continuously sputtered by 0.5 μm at 100°C. Table 1 shows the magnetic properties of the perpendicular magnetic recording media according to the present invention and the conventional method described above.
【表】
表１に示す様に、本発明法による媒体は従来法
媒体に比較して磁気特性に関し、全ての面で優れ
ている。次に第２図に記録密度特性を示す。尚、
主磁極ヘツドの膜厚は0.3μｍで測定した。この第
２図のデータを表２にまとめる。ａは本発明、ｂ
は従来法による媒体である。[Table] As shown in Table 1, the media produced by the method of the present invention are superior to the media produced by the conventional method in all respects regarding magnetic properties. Next, FIG. 2 shows recording density characteristics. still,
The film thickness of the main pole head was measured at 0.3 μm. The data in FIG. 2 are summarized in Table 2. a is the present invention, b
is a conventional medium.
【表】
第２図・表２よりからわかるように再生出力で
は、本発明媒体は２倍の出力が出ている、また出
力が半分になる記録密度D50も２倍近く伸びてい
る。
また、他の実施例として、高分子成形基板とし
て耐熱性のあるアラミドを用いたものを示す。こ
れは、CoTiのスパツタ時の基板温度は150℃で、
その後基板温度を250℃で１時間保持し、再度基
板温度を150℃に冷却しCoCrをスパツタしたもの
である。膜厚は0.5μｍで同じである。また、従来
法としては基板にアラミドを用い、基板温度150
℃でCoTi・CoCrを連続してスパツタした。尚、
記録密度、再生出力は主磁極厚み0.3μｍのヘツド
を用いた。以下にそれらの諸特性を表３にまとめ
る。[Table] As can be seen from Figure 2 and Table 2, the reproduction output of the media of the present invention is twice as high, and the recording density D 50 at which the output is halved is also nearly twice as high. In addition, as another example, one using heat-resistant aramid as the polymer molded substrate will be shown. This means that the substrate temperature during CoTi sputtering is 150℃.
Thereafter, the substrate temperature was maintained at 250°C for 1 hour, and then the substrate temperature was cooled to 150°C again to sputter CoCr. The film thickness is the same at 0.5 μm. In addition, the conventional method uses aramid for the substrate, and the substrate temperature is 150
CoTi and CoCr were sputtered continuously at ℃. still,
For recording density and reproduction output, a head with a main magnetic pole thickness of 0.3 μm was used. Their characteristics are summarized in Table 3 below.
以上述べたように本発明によれば、垂直異方性
膜の磁気特性の向上、軟磁性膜の磁気特性の向
上、再生出力の向上、および記録密度特性の向上
が計られる。
尚、本実施例に示した高分子成形物基板には
PET、アラミドを用いたがポリイミドでも本発
明は有効である。また、軟磁性膜としてCoTi・
垂直磁気異方性膜としてCoCrを用いているが、
これら以外の軟磁性膜（パーマロイ、スーパーマ
ロイ、CoTa、CoZrNb等）・垂直磁化膜（CoW、
CoV等）でも本発明は有効である。さらに軟磁
性膜と垂直磁化膜を組み合わせた二層構造以外
に、三層以上の構造でも本発明は効果がある。そ
して本発明で熱処理した温度・保持時間は高分子
成形物基板の種類・軟磁性膜の材質で変わるもの
であり一概に言えないが、基本的に熱処理の温度
は、軟磁性膜の成膜時の基板温度以上であれば良
い。
As described above, according to the present invention, it is possible to improve the magnetic properties of the perpendicular anisotropic film, the magnetic properties of the soft magnetic film, the reproduction output, and the recording density characteristics. Note that the polymer molded substrate shown in this example has
Although PET and aramid were used, the present invention is also effective with polyimide. In addition, as a soft magnetic film, CoTi・
CoCr is used as the perpendicular magnetic anisotropic film, but
Other soft magnetic films (permalloy, supermalloy, CoTa, CoZrNb, etc.) and perpendicular magnetization films (CoW,
CoV, etc.), the present invention is also effective. Further, in addition to the two-layer structure in which a soft magnetic film and a perpendicularly magnetized film are combined, the present invention is also effective in a structure with three or more layers. The temperature and holding time of the heat treatment in the present invention vary depending on the type of polymer molded substrate and the material of the soft magnetic film, so it cannot be stated unconditionally, but basically the temperature of the heat treatment is the same as when forming the soft magnetic film. It is sufficient if the substrate temperature is equal to or higher than .
第１図は垂直磁気記録媒体の断面図であり、第
２図は本発明と従来法による記録密度特性図であ
る。
１……PET、２……CoTi膜、３……CoCr膜、
ａ……本発明による媒体、ｂ……従来法による媒
体。
FIG. 1 is a sectional view of a perpendicular magnetic recording medium, and FIG. 2 is a recording density characteristic diagram of the present invention and a conventional method. 1...PET, 2...CoTi film, 3...CoCr film,
a... Medium according to the present invention, b... Medium according to the conventional method.
Claims (1)
持つ垂直磁気異方性膜と少なくとも一層以上の軟
磁性膜とを組み合わせた垂直磁気記録媒体におい
て、前記媒体の軟磁性膜を作成した後、前記媒体
の基板である高分子成形物基板の溶融あるいは昇
華あるいは分解のいずれかの温度以下で熱処理を
行ない、その後、垂直磁気異方性膜を作成するこ
とを特徴とする磁気記録媒体の作成方法。1. In a perpendicular magnetic recording medium that combines a perpendicular magnetic anisotropic film having an axis of easy magnetization perpendicular to the magnetic recording surface and at least one layer of soft magnetic film, after creating the soft magnetic film of the medium, A method for producing a magnetic recording medium, characterized in that a polymer molded substrate, which is the substrate of the medium, is heat-treated at a temperature below any one of melting, sublimation, or decomposition temperature, and then a perpendicular magnetic anisotropic film is produced. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25119183A JPS60143436A (en) | 1983-12-28 | 1983-12-28 | Formation of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25119183A JPS60143436A (en) | 1983-12-28 | 1983-12-28 | Formation of magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60143436A JPS60143436A (en) | 1985-07-29 |
| JPH0520812B2 true JPH0520812B2 (en) | 1993-03-22 |
Family
ID=17219035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25119183A Granted JPS60143436A (en) | 1983-12-28 | 1983-12-28 | Formation of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60143436A (en) |
-
1983
- 1983-12-28 JP JP25119183A patent/JPS60143436A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60143436A (en) | 1985-07-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |