JPH0519118A - Production of color filter for display device - Google Patents

Abstract

PURPOSE:To allow the easy production of the color filter for a liquid crystal display device at a low cost with a short production process. CONSTITUTION:A sublimable dye receptive layer 2 is provided on a transparent substrate 1 and the color filters are formed by a transfer method using sublimable dyes on this sublimable dye receptive layer 2. Thermally sublimable ink ribbons 6 may be heated by a selective heating means or the sublimable dyes may be heated and transferred via a mask placed on the sublimable dye receptive layer 2 as the transfer method using the sublimable dyes.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter for a display device. More specifically, the present invention relates to a method of manufacturing a liquid crystal display device, particularly a color filter for a liquid crystal display device, using a sublimable dye.

[0002]

2. Description of the Related Art Conventionally, as a method for producing a color filter for a liquid crystal display device, mainly a dyeing method, a dispersion method, an electrodeposition method,
Four printing methods are known. Of these, the dyeing method is to form a dyeable water-soluble resin layer on a transparent substrate, and pattern the layer by photolithography so that a predetermined dyeable region can be formed, and then wet dyeing, R (red), G (green), B
This is a method of repeating each color of (blu-).

The dispersion method is a method in which a colored photosensitive resin layer is provided on a transparent substrate and a predetermined pattern is formed by a photolithography method for R, G, and B colored photosensitive resins.

In the electrodeposition method, a transparent electrode is provided on a transparent substrate,
In this method, the electrode part is immersed in an electrodeposition bath, a voltage is applied to each of the R, G, and B electrodes, and the electrode part is dried to form a color filter.

The printing method is a method of forming a color filter by offset printing using viscous ink.

[0006]

However, in the dyeing method, a dyeable water-soluble resin is applied on a transparent substrate for dyeing,
Since the drying process has to be repeated three times, the number of processes is increased, and after dyeing each color, a dye-proof film must be formed to prevent color mixture, which further complicates the process and reduces the manufacturing cost. There is a problem that is high.

The dispersion method also has a problem that the number of steps increases because the same steps must be repeated three times for each colored photosensitive resin. Further, since the photosensitive resin used is expensive, the material cost is high, and the yield is low, so that the manufacturing cost is high.

The electrodeposition method also has a problem that the number of steps is increased because the electrodeposition-drying step must be repeated for each color. In addition, since the transparent electrode must be formed before electrodeposition, the degree of freedom in patterning is lower than in other methods, and the TFT
There is also a problem in that it is difficult to form a triangle type pattern for use.

In the printing method, since viscous ink is used, the ends of the pattern may be distorted or misaligned, which makes it impossible to form a predetermined pattern with high accuracy, and the flatness is not achieved. There is a problem that the printing method is inferior to about ± 5 μm, whereas the other method is about ± 0.1 μm.

As described above, in the case of manufacturing the color filter with high accuracy by the conventional method, there is a problem that the number of manufacturing steps is large and complicated and the manufacturing cost is high by any of the methods.

The present invention is intended to solve the above problems of the prior art, and an object thereof is to make it possible to easily manufacture a highly accurate color filter with a short manufacturing process at a low cost. There is.

[0012]

In order to achieve the above object, the present invention provides a sublimable dye receiving layer on a transparent substrate, and transfers the sublimable dye to the sublimable dye receiving layer in a predetermined pattern. Provided is a method for manufacturing a color filter for a display device, which comprises forming a color filter.

The present invention applies a transfer method using a sublimable dye to the manufacture of a color filter for a display device. Hereinafter, the present invention will be specifically described with reference to the drawings. In the drawings, the same reference numerals indicate the same or equivalent constituent elements.

According to the present invention, as a base material of a color filter, a transparent substrate on which a sublimable dye-receiving layer is provided is formed, and a sublimation dye is used for the sublimable dye-receiving layer. Various forms can be adopted as long as the color filter is formed by. For example, as shown in FIG. 1, first, a sublimable dye receiving layer 2 is provided on a transparent substrate 1 such as glass, while as shown in FIG. A thermal sublimation ink ribbon 6 is prepared which is composed of the heat resistant slipping layer 5 and in which two color ink layers of R, G and B are sequentially arranged in plan view as shown in FIG.

Next, the thermally sublimable ink ribbon 6 is superposed on the sublimable dye receiving layer 2 on the transparent substrate 1 shown in FIG. 1 from the ink layer 3 side, and a selective heating means such as a thermal head or a laser. The R, G, and B ink layers are sequentially heated in order to transfer the sublimable dye of the thermally sublimable ink ribbon 6 to the sublimable dye receiving layer 2 in a predetermined pattern to form a color filter.

Thermal heads and lasers used in this case
The form of the selective heating means such as Z is not particularly limited and can be determined according to the pattern of the color filter to be formed. For example, as shown in FIG. 3, three colors R, G, and B are arranged in a matrix (1 dot, 100 μm × 100 μm), and a light-shielding layer 7 having a width of 5 μm is formed between each dot. As shown in FIG. 4, the thermal head used to obtain
It is possible to use a head 8 in which a plurality of m × 110 μm heads are obliquely arranged in a plurality of rows so that the ends are overlapped by a width of 5 μm. By using such a thermal head, it is possible to transfer the adjacent R, G, and B colors in such a manner that 5 μm around them are overlapped with each other.
It is possible to form the color filter portion B and the light shielding layer 7 at the same time. As a form of the thermal head used for obtaining the color filter as shown in FIG. 3, heads arranged in one diagonal line, heads arranged in a Keima jumping type, or the like may be used. .

As a mode for carrying out the present invention, the sublimation property on the transparent substrate 1 as shown in FIG. 5 is used without using the selective heating means such as the thermal head or the laser as described above. A mask 9 having a predetermined pattern is placed on the dye receiving layer 2, a thermal sublimable ink ribbon 6 as shown in FIG. 2 is laid on the mask 9 from the ink layer 3 side, and a heating plate 10 is placed on the mask 9.
Alternatively, a color filter having a predetermined pattern may be formed on the sublimable dye receiving layer 2 by pressing.

In this case, the thermal sublimation ink ribbon 6 as shown in FIG. 2 is not used, but a base material coated with an ink of a sublimation dye of a predetermined color may be used. Good. Further, the pattern of the mask 9 can be determined according to the pattern of the color filter to be formed. For example, when the color filter as shown in FIG. 3 is obtained, it is as shown in FIG. A plurality of 110 μm × 110 μm
It is possible to use a plurality of openings 9a arranged obliquely so that the ends are overlapped by a width of 5 μm. Using the mask in the figure, one color of the color filter is
Since it is formed every time, this may be repeated three times by shifting the position of the mask for each color. Such a mask 9 can be formed, for example, by etching a stainless steel foil having a thickness of 3 μm, and can be formed with high accuracy by forming a pattern of the mask by a photolithography method.

As described above, the present invention can be carried out in various modes. In those modes, the transparent substrate 1 is used.
The sublimable dye-receiving layer 2 formed above can be formed from various resins. For example, a polyester resin obtained by reacting a long-chain dicarboxylic acid polyol, which is generally used as a sublimable dye receiving layer, other than polyvinyl butyral resin, polyol resin, epoxy resin, vinyl acetate resin, chloride Vinyl resin, acrylic-styrene copolymer resin, acrylonitrile-styrene copolymer resin, polyamide resin, chlorinated polyolefin resin, acrylic copolymer resin and the like can be used. Further, the sublimable dye-receiving layer made of such a resin can contain a metal complex salt, an ultraviolet absorber, a phenol derivative or the like as a dye stabilizer, and a heat-sublimable ink ribbon and a sublimable dye-receiving layer. Silicon compound, to prevent sticking with layers
Various other additives can also be included.

The thermal sublimation ink ribbon 6 used in the practice of the present invention may be the same as that generally used in a transfer method using a sublimation dye.
For example, anthraquinone series, azo series, indophenol
Of the sublimable dyes of styrene, styryl, indoaniline, and merocyanine, and the mixture ratio of the sublimable dye and the binder resin is 8: 2.
It is possible to use those which are mixed so as to be in the range of 1: 9, dispersed in a solvent and applied on a polyester film. In this case, examples of the binder resin include polyester resin, acrylic copolymer resin, cellulose resin, epoxy resin, phenoxy resin, polyvinyl butyral resin, vinyl chloride resin, vinyl acetate resin, vinyl chloride-vinyl acetate. A copolymer resin or the like can be used.
As the thermally sublimable ink ribbon 6, FIG. 2 shows an example in which the square areas of the ink layers 3 of R, G, and B are sequentially arranged on the base film 4, but of course each color. The array pattern of is not limited to this.

Further, the heat sublimable ink ribbon 6 has a structure shown in FIG.
It is preferable to provide the heat resistant slipping layer 5 as shown in, but in this case, a general heat resistant slipping layer can be provided.

The manufacturing method of the present invention as described above is a suitable method for manufacturing a color filter for a liquid crystal display device, but is not limited to this, and a color filter for various display devices is not limited to this. Can also be applied to the manufacture of

[0023]

According to the present invention, a sublimable dye receiving layer is provided on a transparent substrate, and a color filter for a liquid crystal display device is manufactured by a transfer method using a sublimable dye on the sublimable dye receiving layer. The color filter will be formed by a dry process. Therefore, in the manufacturing process of the color filter, a drying process which is required in a wet process such as a conventional dyeing method or an electrodeposition method is unnecessary, and the manufacturing process can be simplified.

Furthermore, since the sublimable dye is thermally transferred to the sublimable dye-receiving layer in a few seconds to a few tens of seconds, the time required for forming the color filter becomes 1/10 to 1 / 100th of that of the conventional example. The manufacturing time can be shortened.

Further, the sublimable dye-receiving layer formed on the transparent substrate can be easily formed smoothly, and the sublimable dye is transferred to the sublimable dye-receiving layer to form a color filter. , The smoothness of the color filter becomes excellent.

By carrying out the method of the present invention using a mask formed by the photolithography method, the pattern accuracy of the color filter can be increased,
It is possible to accurately form a fine pattern of a color filter as well as or more than the conventional dyeing method, dispersion method, and electrodeposition method.

Furthermore, since the thermally sublimable ink ribbon or the like used in the transfer method using the sublimable dye of the present invention can be obtained at low cost, the manufacturing cost of the color filter can be reduced.

[0028]

EXAMPLES The present invention will be specifically described below with reference to examples. Example 1 (i) Preparation of Color Filter-Substrate A sublimable dye-receptive layer-forming coating composition having the following composition was applied to one surface of a glass plate (thickness: 1.1 mm) by a spin coat, and then at 80 ° C. It was dried for 5 minutes and then at 120 ° C. for 10 minutes to form a sublimable dye receiving layer having a thickness of 10 μm.

* Composition of sublimable dye receiving layer forming coating Saturated polyester resin (Byron # 200, manufactured by Toyobo Co., Ltd.) 20 parts by weight Isocyanate (Coronet L, manufactured by Nippon Polyurethane Co., Ltd.) 2 parts by weight Methyl ethyl ketone 50 parts by weight Toluene 50 parts by weight (ii) Preparation of thermal sublimation ink ribbon A heat resistant slipping layer-forming coating material having the following composition was prepared, and the film thickness after drying was 1 μm on one surface of a polyester film (thickness 6 μm).
It was applied with a gravure coater so as to have m.

* Composition of heat resistant slipping layer forming coating Cellulose acetate (L-70, manufactured by Daicel Chemical Industries, Ltd.) 9 parts by weight Silicon oil (SF8410, manufactured by Toray Silicon Co., Ltd.) 1 part by weight Methyl ethyl ketone 63 parts by weight Diacetone Alco -27 parts by weight of the following, heat-sublimable ink compositions of the respective colors having the following compositions were prepared, and they were sequentially coated on the side of the polyester film on which the heat-resistant slip layer was not formed, the thickness after drying was 5 μm. Was applied by a gravure coater to form a thermal sublimation ink ribbon as shown in FIG.

* Composition of thermal sublimation ink composition Ethyl hydroxycellulose (manufactured by Hercules Co.) 5 parts by weight R, G, B dyes (the following composition) 5 parts by weight Methyl ethyl ketone 10 parts by weight * R dye composition Sumiplast Yellow-G (Sumitomo Chemical Co., Ltd.) 2.5 parts by weight Sumiplast Red FB (Sumitomo Chemical Co., Ltd.) 2.5 parts by weight * G dye composition Sumiplast Yellow-G (Sumitomo Chemical Co., Ltd.) ) 2.2 parts by weight Sumiplast Bull-OA (Sumitomo Chemical Co., Ltd.) 2.8 parts by weight * B Dye composition Sumiplast Yellow-G (Sumitomo Chemical Co., Ltd.) 2.6 parts by weight Sumiplast Bull-OA (Sumitomo Chemical Co., Ltd.) Chemical Industry Co., Ltd.) 2.4 parts by weight (iii) Preparation of color filter In the sublimable dye-receiving layer of the base material of the color filter prepared in (i), the heat sublimable ink ribbon prepared in (ii) Of R color Superposed band, support has an area of 105 × 105 .mu.m from the back - the heat energy of 80μj / mm ² at thermal head - a sublimable dye color R is transferred to the sublimable dye-receiving layer by applying, color of R color -A filter was formed. Next, in the same manner, the G color was transferred so as to be positioned next to the R color, and the B color was transferred so as to be positioned between the G color and the R color, as shown in FIG. A pattern color filter was obtained. Example 2 A 3 μm thick stainless steel foil was etched to form a mask having a plurality of 110 μm × 110 μm openings 9a obliquely arranged as shown in FIG. This mask is used in Example 1.
Layered on the base material of the color filter obtained in step 1, and further in Example 1.
The R-colored area of the thermally sublimable ink ribbon obtained in (1) was overlapped, and a hot plate heated to 150 ° C. was pressed against the area for several seconds to form an R-colored color filter. The position of the mask is then shifted so that its opening overlaps the opening of the previous position by a width of 5 μm and the G-colored area of the thermally sublimable ink ribbon is used to make a similar G-colored color filter. -Is formed. Similarly, a B color filter was also formed to obtain the pattern color filter shown in FIG. Example 3 On the surface of the color filter obtained in Example 1, a 5% solution of dimethylformamide of aromatic polyamic acid was applied by a spin coat and dried at 150 ° C. for 2 hours to obtain a film having a thickness of about 2 μm. A polyimide resin film was formed. Then, a film for a transparent electrode of ITO is formed on this by vapor deposition, a pattern is formed by a photolithography method to form a transparent electrode of ITO, and a polyamic acid solution similar to the above is applied and dried, An alignment film was formed. Then, this was incorporated into a liquid crystal display device as shown in FIG. In the figure,
11 is a polarizing film, 12 is a glass substrate, 13 is an ITO electrode,
Reference numeral 14 is an alignment film, 15 is a liquid crystal, and 16 is a seal portion.

The color filter obtained in Example 2 was similarly incorporated into a liquid crystal display device.

As a result, a good color image could be obtained in the liquid crystal display device.

[0034]

According to the present invention, a highly accurate color filter can be easily manufactured at a low cost with a short manufacturing process.

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a substrate of a color filter used in the method of the present invention.

FIG. 2 is a cross-sectional view and a plan view of a thermally sublimable ink ribbon used for carrying out the method of the present invention.

FIG. 3 is a plan view of a color filter.

FIG. 4 is an array diagram of a thermal head used for carrying out the method of the present invention.

FIG. 5 is an explanatory diagram for carrying out the method of the present invention using a mask.

FIG. 6 is a plan view of a mask used for carrying out the method of the present invention.

FIG. 7 is an explanatory diagram of a liquid crystal display device incorporating a color filter.

[Explanation of symbols]

1 transparent substrate 2 Sublimable dye receiving layer 3 ink layer 4 Base film 5 Heat resistant slipping layer 6 Thermal sublimation ink ribbon 7 Light-shielding layer 8 heads 9 mask 10 hot plate

[Procedure amendment]

[Submission date] July 15, 1991

[Procedure Amendment 1]

[Document name to be corrected] Drawing

[Name of item to be corrected] Figure 7

[Correction method] Added

[Correction content]

[Figure 7]

Claims (3)

[Claims] 1. A sublimable dye-receiving layer is provided on a transparent substrate,
A method for producing a color filter for a display device, comprising forming a color filter by transferring a sublimable dye to the sublimable dye receiving layer in a predetermined pattern. 2. The method for producing a color filter for a display device according to claim 1, wherein the sublimable dye is transferred to a predetermined pattern by heating the thermally sublimable ink ribbon with a selective heating means. 3. The method for producing a color filter for a display device according to claim 1, wherein the sublimable dye is transferred to a predetermined pattern by transferring the sublimable dye to the sublimable dye receiving layer through a mask.