JPH0518866B2 - - Google Patents
Info
- Publication number
- JPH0518866B2 JPH0518866B2 JP19348682A JP19348682A JPH0518866B2 JP H0518866 B2 JPH0518866 B2 JP H0518866B2 JP 19348682 A JP19348682 A JP 19348682A JP 19348682 A JP19348682 A JP 19348682A JP H0518866 B2 JPH0518866 B2 JP H0518866B2
- Authority
- JP
- Japan
- Prior art keywords
- double bond
- photosensitive polymer
- polyamic acid
- proton
- polymer composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000203 mixture Substances 0.000 claims description 23
- 229920000642 polymer Polymers 0.000 claims description 23
- -1 aromatic azide compound Chemical class 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 229920005575 poly(amic acid) Polymers 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 229920006112 polar polymer Polymers 0.000 claims description 9
- 230000001235 sensitizing effect Effects 0.000 claims description 8
- 229910052757 nitrogen Chemical group 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
- 206010070834 Sensitisation Diseases 0.000 claims description 3
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 claims description 3
- 229920003986 novolac Polymers 0.000 claims description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 3
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 230000008313 sensitization Effects 0.000 claims description 3
- 229920001665 Poly-4-vinylphenol Polymers 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 claims 1
- 229920002451 polyvinyl alcohol Polymers 0.000 claims 1
- 230000035807 sensation Effects 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 21
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 18
- 230000035945 sensitivity Effects 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 6
- 125000002243 cyclohexanonyl group Chemical group *C1(*)C(=O)C(*)(*)C(*)(*)C(*)(*)C1(*)* 0.000 description 5
- 150000001336 alkenes Chemical group 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 125000002147 dimethylamino group Chemical group [H]C([H])([H])N(*)C([H])([H])[H] 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 4
- 239000002798 polar solvent Substances 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical group C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229920005601 base polymer Polymers 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- XUWHAWMETYGRKB-UHFFFAOYSA-N piperidin-2-one Chemical compound O=C1CCCCN1 XUWHAWMETYGRKB-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- ODZTXUXIYGJLMC-UHFFFAOYSA-N 2-hydroxycyclohexan-1-one Chemical compound OC1CCCCC1=O ODZTXUXIYGJLMC-UHFFFAOYSA-N 0.000 description 1
- PQXIGFCAMSKVHL-UHFFFAOYSA-N 3,5-bis[[4-(dimethylamino)phenyl]methylidene]piperidin-4-one Chemical compound C1=CC(N(C)C)=CC=C1C=C(CNC1)C(=O)C1=CC1=CC=C(N(C)C)C=C1 PQXIGFCAMSKVHL-UHFFFAOYSA-N 0.000 description 1
- KHMBXNKCMNGLKG-UHFFFAOYSA-N 4-(hydroxymethyl)cyclohexan-1-one Chemical compound OCC1CCC(=O)CC1 KHMBXNKCMNGLKG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- BXBJZYXQHHPVGO-UHFFFAOYSA-N 4-hydroxycyclohexan-1-one Chemical compound OC1CCC(=O)CC1 BXBJZYXQHHPVGO-UHFFFAOYSA-N 0.000 description 1
- FZRCKLPSHGTOAU-UHFFFAOYSA-N 6-amino-1,4-dimethylcyclohexa-2,4-diene-1-carbaldehyde Chemical compound CC1=CC(N)C(C)(C=O)C=C1 FZRCKLPSHGTOAU-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 229940117916 cinnamic aldehyde Drugs 0.000 description 1
- KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- SXWRTZOXMUOJER-UHFFFAOYSA-N hydron;piperidin-4-one;chloride;hydrate Chemical compound O.Cl.O=C1CCNCC1 SXWRTZOXMUOJER-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000002165 photosensitisation Effects 0.000 description 1
- JQKIHHHTOFFTAM-UHFFFAOYSA-N piperidin-4-one;hydrate Chemical compound O.O=C1CCNCC1 JQKIHHHTOFFTAM-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Description
〔発明の利用分野〕
本発明は、極性ポリマを用いることによる感光
重合体組成物を増感する方法に関する。
〔従来技術〕
従来、増感剤として著名なミヒラケトンの類縁
化合物として、シクロペンタノン、シクロヘキサ
ノン、またはシクロヘプタノンを主骨格に持つピ
ス(p−アミノフエニル(αβ−不飽和)ケトン
またはビス(p−アミノフエニルαβ、βγ不飽和)
ケトンが知られている。これらの化合物はミヒラ
ケトンに比べ、その光吸収域が可視部まで及んで
いるため、紫外部に吸収域を持つポリマをベース
とした感光性重合体組成物の増感にも効果的に用
いることができる。しかしながら、これらの化合
物は特に極性ポリマをベースとした場合、ポリマ
との相溶性に不十分な点が有り、実用上の問題点
があつた。この点が特に問題になるのは、これら
を用いた感光性重合体組成物または感光性重合体
をフオトレジストとして用いる時である。すなわ
ち、これらのワニスを基板上に塗布、乾燥して塗
膜とする時、ベースポリマとの相溶性が悪い場合
には、膜からこれらが微小結晶として析出した
り、分離するなどして欠陥を生じるのである。
また、これらの化合物は、極性ポリマを溶かす
極性溶媒に対する溶解性も不十分なため、ワニス
調製時に液の加温を必要とする手間を生じる欠点
のあるものもあつた。
〔発明の目的〕
本発明の目的は、上記した従来技術の欠点をな
くし、極性溶剤に対する溶解性が高く、極性ポリ
マとの相溶性の良い増感剤を用いることによつて
感光性重合体組成物を効果的に増感する方法を提
供することにある。
〔発明の概要〕
本発明者等は、上記の目的を達成するために
は、上記のような増感剤は、その構造において増
感効果の主な役割を果たす発色団と遠隔の位置
に、極性溶媒、極性ポリマとの相互作用の強い極
性基を導入すれば、増感効果を損なうことなく、
溶解性、相溶性が向上すると考えた。この考えの
もとに鋭意検討および試験を行なつた結果、本発
明方法に用いる増感剤を見出すに至つたのであ
る。
上記による本発明の感光性重合体組成物の増感
法の特徴とするところは、感光性重合体組成物を
増感するために、増感剤として、
下記の一般式〔〕
(但し、R1は低級アルキル基、R2は−H、Xは
炭素又は窒素原子、YはXが炭素原子の時には−
OH、Xが窒素原子の時には−H又は−COOR4
(ここにR4は低級アルキル基)を表し、nは0ま
たは1である)で表わされる化合物よりなる群中
から選択された化合物を用いることにある。この
ような本発明による感光剤を用いれば、感光性重
合体組成物または感光性重合体のワニスを調製す
る際に、加温することなく溶解させることがで
き、フイルムを形成する場合も欠陥の少ない膜を
得ることができ、かつ十分な増感を得ることがで
きるものである。
以下、本発明をさらに詳細に説明する。
本発明において用いる一般式〔〕で表わされ
る化合物によつて増感される感光性重合体組成物
の例としては、フエノールノボラツク樹脂または
ポリビニルフエノール樹脂と芳香族アジド化合物
から成るもの、ポリアミド酸と芳香族アジド基を
持つアミン化合物から成るもの、ポリアミド酸と
二重結合を持つアミン化合物から成るもの、ポリ
アミド酸とビスアジド化合分と二重結合を持つア
ミン化合物から成るもの、側鎖に二重結合を持つ
ポリアミド酸とビスアジド化合物から成るものな
どが挙げられるが、これらに限定されない。これ
らの具体的構成については、特公昭56−29261、
特開昭54−145794、特公昭53−34902、特願昭55
−177200、特願昭56−54408、特願昭56−157516
などに詳しく開示されている。
本発明において用いる、一般式〔〕で表わさ
れる化合物によつて増感される感光性重合体の例
としては、側鎖に二重結合または芳香族アジド基
を持つポリアミド酸またはポリアミドなどが挙げ
られるが、これらに限定されない。これらの具体
的構造については、特開昭49−115541、特開昭55
−45748などに詳しく開示されている。
本発明において用いる、一般式〔〕で表わさ
れる増感剤の具体的な例としては、
(ただし、R5は−OH、−CH2OH、−COOK、−
COONa、−COOH、−OCH3、−N(CH3)2から選
ばれた基、R7は−COOH、−COOCH3、−
COOC2H5、−COCH3、−H、−CH3から選ばれた
基、R6、R8は−Hまたは−CH3または−C2H5を
表わす)
などが挙げられるが、これらに限定されない。
本発明において用いる、一般式〔〕で表わさ
れる化合物は、ジアルキルアミノフエニルベンズ
アルデヒドまたはジアルキルアミノフエニルシン
ナムアルデヒドとシクロ構造を持つたケトンをア
ルコール溶媒中で水酸化ナトリウムや水酸化カリ
ウムなどのアルカリ触媒存在下における脱水縮合
反応によつて合成することができる。
本発明において用いる、一般式〔〕で表わさ
れる化合物は、通常感光性重合体組成物や感光性
重合体とともに溶剤に溶解して用いる。
本発明において用いる、一般式〔〕で表わさ
れる化合物の配合割合は、感光性重合体組成物の
場合、ポリマと感光性付与成分の総和を100重量
部、感光性重合体の場合、ポリマ重量100重量部
とした時、0.01重量部以上50重量部以下の割合で
配合するのが望ましい。この範囲より少ない場合
は十分な増感効果が得られず、この範囲より多い
時にはフイルム形成能に悪影響を及ぼす。
〔発明の実施例〕
以下、実施例につき、本発明をさらに具体的に
説明するとともに、比較例につき本発明の効果を
例証する。
実施例 1
パラジメチルアミノシンナムアルデヒド()
7.7g(44m mole)と4−ヒドロキシシクロヘ
キサノン()2.28g(20m mole)を25mlの
エタノールに溶解した。この溶液に対し、2gの
40%水酸化ナトリウム水溶液を加え、室温で2日
間反応させた。析出した暗橙色結晶を吸引濾過に
よつて集めてエタノールで洗浄した後、2−メト
キシエタノールから再結晶して融点232〜235℃の
生成物3.4g(収率41%)を得た。この生成物は
以下の分析結果から2,6−ビス(p−ジメチル
アミノシンナミリデン)−4−ヒドロキシシクロ
ヘキサノン()と同定した。
NMRは日立R−24型核磁気共鳴装置(60Mz)
を用いて測定した。ケミカルシフトはテトラメチ
ルシランを内部標準とし、ppm単位のδ値で示
す。また、括弧内にはシグナルパターン、カツプ
リング定数、積分比、帰属を順に示す。NMR
(CDCl3)δ3.0(シングレツト、6H、ジメチルアミ
ノ基のメチルプロトン)、2.9〜3.5(ブロードマル
チプレツト、4H、シクロヘキサノン環のメチレ
ンプロトン)3.8〜4.2(ブロードマルチプレツト、
1H、シクロヘキサノン環のメチンプロトン)、
4.9(ブロードシングレツト、1H、ヒドロキシプ
ロトン)、6.7(ダブレツト、J=9Hz、4H、芳香
族プロトン)、6.6〜7.4(マルチプレツト、6H、オ
レフインプロトン)、7.3(ダブレツト、4H、J=
9Hz、芳香族プロトン)。
IRは日立200−10型分光光度計用い、KBr錠剤
法で測定した。IR(KBr)3350(O−H)、1580
(C=O)、1300(C−N)cm1。
上記の反応式は次のように示される。
次に、くり返し単位:
で表わされるポリアミド酸2g、パラアジド安息
香酸2−(N,N−ジメチルアミノ)エチル2.3
g、をN−メチル−2−ピロリドンに溶解して、
総計20gの溶液にし、溶液Aとした。
溶液Aに対し、増感剤として上記によつて合成
した2,6−ビス(p−ジメチルアミノシンナミ
リデン)−4−ヒドロキシシクロヘキサノン0.5g
を加え室温で30分間撹拌して均一溶液とし、次い
で、1μm孔のフイルタを用いて加圧ロ過した。
得られた溶液をスピンナでシリコンウエハ上に
回転塗布し、次いで、90℃、30分間乾燥して2μ
mを得た。この塗膜は23℃、湿度60%の条件下に
24時間放置しても、初期の清浄な膜状態が保たれ
ていた。
次に、この塗膜を縞模様のマスクで密着被覆
し、500Wの高圧水銀灯で紫外線照射した。露光
面での紫外線強度は365mmにおいて25mW/cm2で
あつた。露光後N−メチル−2−ピロリドン4
容、エタノール1容から成る混液で現像し、次い
でリンス液(エタノール)で洗浄してレリーフ・
パターンを得た。残存膜厚を照射量でプロツト
し、塗布膜厚を現像後膜厚で規格化した値で0.5
を与える照射量を感度として、感度13mJ/cm2を
得た。本実施例の増感剤を用いない時の感度は18
mJ/cm2であり、1.4倍の感度向上が観測された。
また、別途にXeランプを光源とする分光感度
計によつて分光感度を測定したところ、第1図お
よび第2図を参照して、増感剤を用いない第1図
に示す感度に比べ、本増感剤を用いた系の第2図
に示す感度は、感光領域が長波長に延び明らかな
増感効果が認められた。
実施例 2
パラジメチルアミノベンズアルデヒド()
3.28g(22m mole)と4−メチロールシクロ
ヘキサノン()1.28g(10m mole)のエタ
ノールに溶解した。この溶液に対し、3gの30%
水酸化ナトリウム水溶液を加え、室温で2日間反
応させた。析出した橙色結晶を集めてメタノール
で洗浄した後、メタノールと水の混液から再結晶
して融点235〜237℃の生成物1.83g(収率47%)
を得た。この生成物は以下の分析析出結果から、
2.6−ビス(p−ジメチルアミノアミノベンザル)
−4−メチロールシクロヘキサノン()と同定
した。
NMR(DM50−ds)δ1.5〜2.2(ブロードマルチ
プレツト、1H、シクロヘキサノン環のメチレン
プロトン)、3.0(シングレツト、6H、ジメチルア
ミノ基のメチルプロトン)、2.6〜3.3(マルチプレ
ツト、4H、シクロヘキサノン環のメチレンプロ
トン)、4.7(ブロードシングレツト、1H、ヒドロ
キシプロトン)、6.7(ダブレツト、J=9Hz、
4H、芳香族プロトン)、7.3(ダブレツト、J=9
Hz、4H、芳香族プロトン)、7.7(シングレツト、
2H、オレフインプロトン)。
IR(KBr)3450(O−H)、1580(C−O)、
1300(C−N)cm-1。
上記の反応式は次のように示される。
実施例1で調製した溶液A20gに対し、増感剤
として上記によつて合成した2,6−ビス(p−
ジメチルアミノベンザル)−4−メチロールシク
ロヘキサノン0.7gを加え、実施例1と同一のロ
過条件、成膜条件、照射条件で実験したところ、
形成した膜は23℃、湿度60%の条件に24時間放置
しても初期の清浄な膜状態が保たれており、かつ
1.3倍感度が増間された。
実施例 3
4−ピペリドンモノハイドレートハイドロクロ
ライド()1.54g(10m mole)を15mlのエ
タノールに溶解し、次にこの溶液に対して、1.0
gの水酸化ナトリウムを2mlの水に溶解した溶液
を加え、室温で1時間反応させた。析出した塩化
ナトリウムを濾別し、濾液に対してパラジメチル
アミノベンズアルデヒド()3.28g(22m
mole)を加えて室温で2日間反応させた。析出
した橙色結晶を吸引濾過によつて集め、メタノー
ルで洗浄した後2−メキシエタノールから再結晶
して融点240〜242℃の生成物2.1g(収率58%)
を得た。この生成物は以下の分析結果から、3,
5−ビス(p−ジメチルアミノベンザル)−4−
ピペリジノン()と同定した。
NMR(CDCl3)δ1.6(シングレツト、1H、アミ
ノプロトン)、3.0(シングレツト、6H、ジメチル
アミノ基のメチルプロトン)、4.1(シングレツト、
4H、シクロヘキサン環のメチレンプロトン)、
6.7(ダブレツト、J=9Hz、4H、芳香族プロト
ン)、7.3(ダブレツト、J=9Hz、4H、芳香族プ
ロトン、7.7(シングレツト、2H、オレフインプ
ロトン)。
IR(KBr)1590(C=O)、1320(C−N)cm
-1。
上記の反応式は次のように示される。
実施例1で調製した溶液A20gに対し、増感剤
として上記によつて合成した3,5−ビス(p−
ジメチルアミノベンザル)−4−ピペリジノン0.3
gを加え、実施例1と同一のロ過条件、成膜条
件、照射条件で実験したところ、形成した膜は23
℃、湿度60%の条件に24時間放置しても初期の清
浄な膜が保たれており、かつ1.2倍感度が増感さ
れた。
実施例 4
パラジメチルベンズアルデヒド()3.28g
(22m mole)とN−エトキシカルボニル−4−
ピペリドン()1.71g(10m mole)を10ml
のエタノールに溶解した。この溶液に対し、1g
の20%水酸化ナトリウム水溶液を加え、室温で5
日間反応させた。析出した橙色結晶を集めてエタ
ノールで洗浄した後、2−メトキシエタノールか
ら再結晶して融点250〜252℃の生成物2.2g(収
率51%)を得た。この生成物は以下の分析結果か
ら、3,5−ビス(p−ジメチルアミノベンザ
ル)−N−エトキシカルボニル−4−ピリジノン
()と同定した。
NMR(DMSO−ds)δ1.2(トリプレツト、J=
7Hz、3H、エチル基のメチルプロトン)、3.0(シ
ングレツト、6H、ジメチルアミノ基のメチルプ
ロトン)、4.1(カルテツト、J=7Hz、2H、エチ
ル基のメチレンプロトン)、4.7(シングレツト、
4H、シクロヘキサノン環のメチレンプロトン)
6.7(ダブレツト、J=9Hz、4H、芳香族プロト
ン)、7.3(ダブレツト、J=9Hz、4H、芳香族プ
ロトン)、7.7(シングレツト、2H、オレフインプ
ロトン)。
IR(KBr)1700(−CO2Etの
FIELD OF APPLICATION OF THE INVENTION The present invention relates to a method of sensitizing photopolymer compositions by using polar polymers. [Prior Art] Conventionally, as a related compound of Mihiraketone, which is famous as a sensitizer, p-aminophenyl (αβ-unsaturated) ketone or bis(p-aminophenyl (αβ-unsaturated) aminophenyl αβ, βγ unsaturated)
known as ketones. Compared to Mihiraketone, these compounds have a light absorption range that extends into the visible range, so they can be effectively used to sensitize photosensitive polymer compositions based on polymers that have absorption ranges in the ultraviolet range. can. However, these compounds, especially when based on polar polymers, have insufficient compatibility with the polymer, which poses a practical problem. This point becomes particularly problematic when a photosensitive polymer composition or a photosensitive polymer using these is used as a photoresist. In other words, when these varnishes are applied to a substrate and dried to form a coating film, if they are poorly compatible with the base polymer, they may precipitate as microcrystals from the film or separate, causing defects. It happens. In addition, these compounds have insufficient solubility in polar solvents that dissolve polar polymers, and therefore some of them have the drawback of requiring heating of the liquid during varnish preparation. [Object of the Invention] The object of the present invention is to eliminate the above-mentioned drawbacks of the prior art, and to improve the composition of photosensitive polymers by using a sensitizer that has high solubility in polar solvents and good compatibility with polar polymers. The objective is to provide a method for effectively sensitizing objects. [Summary of the Invention] In order to achieve the above object, the present inventors have discovered that the above-mentioned sensitizer is located at a position remote from the chromophore that plays a main role in the sensitizing effect in its structure. By introducing a polar group that strongly interacts with polar solvents and polar polymers, the sensitizing effect can be improved.
It was thought that solubility and compatibility would improve. As a result of extensive studies and tests based on this idea, we have discovered a sensitizer for use in the method of the present invention. The feature of the method for sensitizing the photosensitive polymer composition of the present invention as described above is that in order to sensitize the photosensitive polymer composition, the following general formula [] is used as a sensitizer. (However, R 1 is a lower alkyl group, R 2 is -H, X is a carbon or nitrogen atom, and Y is - when X is a carbon atom.
When OH, X is a nitrogen atom, -H or -COOR 4
(where R 4 is a lower alkyl group, and n is 0 or 1). If such a photosensitizer according to the present invention is used, it can be dissolved without heating when preparing a photosensitive polymer composition or a photosensitive polymer varnish, and there are no defects when forming a film. It is possible to obtain a small amount of film and to obtain sufficient sensitization. The present invention will be explained in more detail below. Examples of photosensitive polymer compositions sensitized with the compound represented by the general formula [] used in the present invention include those consisting of a phenol novolak resin or polyvinylphenol resin and an aromatic azide compound, and those consisting of a polyamic acid and an aromatic azide compound. Those consisting of an amine compound with an aromatic azide group, those consisting of an amine compound with a polyamic acid and a double bond, those consisting of an amine compound with a polyamic acid, a bisazide compound, and a double bond, those with a double bond in the side chain Examples include, but are not limited to, those consisting of a polyamic acid and a bisazide compound. Regarding the specific structure of these, please refer to Special Publication No. 56-29261,
Japanese Patent Publication No. 54-145794, Special Publication No. 53-34902, Special Patent Application No. 1987-145794
-177200, patent application 1984-54408, patent application 1982-157516
etc. are disclosed in detail. Examples of the photosensitive polymer used in the present invention and sensitized by the compound represented by the general formula [] include polyamic acid or polyamide having a double bond or an aromatic azide group in the side chain. However, it is not limited to these. Regarding these specific structures, please refer to JP-A-49-115541 and JP-A-55.
−45748, etc., are disclosed in detail. Specific examples of the sensitizer represented by the general formula [] used in the present invention include: (However, R 5 is −OH, −CH 2 OH, −COOK, −
A group selected from COONa, -COOH, -OCH3 , -N( CH3 ) 2 , R7 is -COOH, -COOCH3 , -
Groups selected from COOC 2 H 5 , -COCH 3 , -H, -CH 3 , R 6 and R 8 represent -H, -CH 3 or -C 2 H 5 ), etc. Not limited. The compound represented by the general formula [] used in the present invention is prepared by adding dialkylaminophenylbenzaldehyde or dialkylaminophenyl cinnamaldehyde and a ketone having a cyclo structure to an alkaline catalyst such as sodium hydroxide or potassium hydroxide in an alcohol solvent. It can be synthesized by a dehydration condensation reaction in the presence of The compound represented by the general formula [] used in the present invention is usually dissolved in a solvent together with a photosensitive polymer composition or a photosensitive polymer. In the case of a photosensitive polymer composition, the compounding ratio of the compound represented by the general formula [] used in the present invention is 100 parts by weight of the total of the polymer and the photosensitizing component; When expressed as parts by weight, it is preferable to mix in a proportion of 0.01 parts by weight or more and 50 parts by weight or less. When the amount is less than this range, a sufficient sensitizing effect cannot be obtained, and when it is more than this range, the film forming ability is adversely affected. [Examples of the Invention] Hereinafter, the present invention will be explained in more detail with reference to Examples, and the effects of the present invention will be illustrated with reference to Comparative Examples. Example 1 Paradimethylaminocinnamaldehyde ()
7.7 g (44 mmole) and 2.28 g (20 mmole) of 4-hydroxycyclohexanone () were dissolved in 25 ml of ethanol. For this solution, 2g
A 40% aqueous sodium hydroxide solution was added, and the mixture was allowed to react at room temperature for 2 days. The precipitated dark orange crystals were collected by suction filtration, washed with ethanol, and then recrystallized from 2-methoxyethanol to obtain 3.4 g (41% yield) of a product with a melting point of 232-235°C. This product was identified as 2,6-bis(p-dimethylaminocinnamylidene)-4-hydroxycyclohexanone () from the following analysis results. NMR is Hitachi R-24 type nuclear magnetic resonance device (60Mz)
Measured using Chemical shifts are expressed as δ values in ppm using tetramethylsilane as an internal standard. In addition, the signal pattern, coupling constant, integral ratio, and attribution are shown in order in parentheses. NMR
(CDCl 3 ) δ3.0 (singlet, 6H, methyl proton of dimethylamino group), 2.9-3.5 (broad multiplet, 4H, methylene proton of cyclohexanone ring) 3.8-4.2 (broad multiplet,
1H, methine proton of cyclohexanone ring),
4.9 (broad singlet, 1H, hydroxy proton), 6.7 (doublet, J=9Hz, 4H, aromatic proton), 6.6-7.4 (multiplet, 6H, olefin proton), 7.3 (doublet, 4H, J=
9Hz, aromatic proton). IR was measured using a Hitachi 200-10 spectrophotometer using the KBr tablet method. IR (KBr) 3350 (O-H), 1580
(C=O), 1300 (C-N) cm <1> . The above reaction formula is shown as follows. Next, repeat unit: 2 g of polyamic acid represented by, 2-(N,N-dimethylamino)ethyl paraazidobenzoate 2.3
g, dissolved in N-methyl-2-pyrrolidone,
A total of 20 g of solution was prepared and designated as Solution A. For solution A, 0.5 g of 2,6-bis(p-dimethylaminocinnamylidene)-4-hydroxycyclohexanone synthesized as above as a sensitizer.
was added and stirred at room temperature for 30 minutes to obtain a homogeneous solution, which was then filtered under pressure using a 1 μm pore filter. The obtained solution was spin-coated onto a silicon wafer using a spinner, and then dried at 90°C for 30 minutes to form a 2μ
I got m. This coating was applied under conditions of 23℃ and 60% humidity.
Even after being left for 24 hours, the initial clean membrane state was maintained. Next, this coating film was closely covered with a striped mask and irradiated with ultraviolet light using a 500W high-pressure mercury lamp. The intensity of ultraviolet rays on the exposed surface was 25 mW/cm 2 at 365 mm. After exposure N-methyl-2-pyrrolidone 4
Develop with a mixture of 1 volume of ethanol and 1 volume of ethanol, then wash with a rinse solution (ethanol) to create a relief.
I got the pattern. The remaining film thickness is plotted against the irradiation dose, and the coating film thickness is normalized by the film thickness after development, which is 0.5.
A sensitivity of 13 mJ/cm 2 was obtained, with the irradiation amount giving . The sensitivity in this example without using a sensitizer is 18
mJ/cm 2 , and a sensitivity improvement of 1.4 times was observed. In addition, the spectral sensitivity was separately measured using a spectral sensitometer using an X e lamp as a light source. In the sensitivity shown in FIG. 2 of the system using this sensitizer, the sensitive region extended to longer wavelengths, and a clear sensitizing effect was observed. Example 2 Paradimethylaminobenzaldehyde ()
3.28 g (22 mmole) and 1.28 g (10 mmole) of 4-methylolcyclohexanone () were dissolved in ethanol. For this solution, 3g of 30%
An aqueous sodium hydroxide solution was added, and the mixture was allowed to react at room temperature for 2 days. The precipitated orange crystals were collected and washed with methanol, and then recrystallized from a mixture of methanol and water to obtain 1.83 g of a product with a melting point of 235-237°C (47% yield).
I got it. This product is determined from the following analysis and precipitation results.
2.6-bis(p-dimethylaminoaminobenzal)
It was identified as -4-methylolcyclohexanone (). NMR (DM50-ds) δ1.5-2.2 (broad multiplet, 1H, methylene proton of cyclohexanone ring), 3.0 (singlet, 6H, methyl proton of dimethylamino group), 2.6-3.3 (multiplet, 4H, cyclohexanone ring) methylene proton), 4.7 (broad singlet, 1H, hydroxy proton), 6.7 (double, J=9Hz,
4H, aromatic proton), 7.3 (doublet, J=9
Hz, 4H, aromatic proton), 7.7 (singlet,
2H, olefin proton). IR (KBr) 3450 (O-H), 1580 (C-O),
1300(C-N)cm -1 . The above reaction formula is shown as follows. To 20 g of the solution A prepared in Example 1, 2,6-bis(p-
When 0.7 g of dimethylaminobenzal)-4-methylolcyclohexanone was added and an experiment was conducted under the same filtration conditions, film formation conditions, and irradiation conditions as in Example 1,
The formed film maintained its initial clean state even after being left at 23°C and 60% humidity for 24 hours.
Increased sensitivity by 1.3 times. Example 3 1.54 g (10 mmole) of 4-piperidone monohydrate hydrochloride () was dissolved in 15 ml of ethanol, and then 1.0 mmol of 4-piperidone monohydrate was dissolved in 15 ml of ethanol.
A solution of g of sodium hydroxide dissolved in 2 ml of water was added, and the mixture was allowed to react at room temperature for 1 hour. The precipitated sodium chloride was separated by filtration, and 3.28 g (22 m
mole) and allowed to react at room temperature for 2 days. The precipitated orange crystals were collected by suction filtration, washed with methanol, and then recrystallized from 2-mexiethanol to give 2.1 g of a product with a melting point of 240-242°C (yield 58%).
I got it. From the following analysis results, this product is 3.
5-bis(p-dimethylaminobenzal)-4-
It was identified as piperidinone (). NMR (CDCl 3 ) δ1.6 (singlet, 1H, amino proton), 3.0 (singlet, 6H, methyl proton of dimethylamino group), 4.1 (singlet,
4H, methylene proton of cyclohexane ring),
6.7 (doublet, J=9Hz, 4H, aromatic proton), 7.3 (doublet, J=9Hz, 4H, aromatic proton, 7.7 (singlet, 2H, olefin proton). IR (KBr) 1590 (C=O), 1320(C-N)cm
-1 . The above reaction formula is shown as follows. To 20 g of the solution A prepared in Example 1, 3,5-bis(p-
Dimethylaminobenzal)-4-piperidinone 0.3
When an experiment was conducted under the same filtration conditions, film formation conditions, and irradiation conditions as in Example 1, the formed film was 23 g.
Even after being left for 24 hours at ℃ and 60% humidity, the initial clean film was maintained and the sensitivity was increased by 1.2 times. Example 4 Paradimethylbenzaldehyde () 3.28g
(22m mole) and N-ethoxycarbonyl-4-
10ml of piperidone () 1.71g (10m mole)
was dissolved in ethanol. For this solution, 1g
Add 20% aqueous sodium hydroxide solution and stir at room temperature for 5 minutes.
It was allowed to react for several days. The precipitated orange crystals were collected, washed with ethanol, and then recrystallized from 2-methoxyethanol to obtain 2.2 g (51% yield) of a product with a melting point of 250-252°C. This product was identified as 3,5-bis(p-dimethylaminobenzal)-N-ethoxycarbonyl-4-pyridinone () from the following analysis results. NMR (DMSO-ds) δ1.2 (triplet, J=
7Hz, 3H, methyl proton of ethyl group), 3.0 (singlet, 6H, methyl proton of dimethylamino group), 4.1 (quartet, J = 7Hz, 2H, methylene proton of ethyl group), 4.7 (singlet,
4H, methylene proton of cyclohexanone ring)
6.7 (doublet, J=9Hz, 4H, aromatic proton), 7.3 (doublet, J=9Hz, 4H, aromatic proton), 7.7 (singlet, 2H, olefin proton). IR (KBr) 1700 ( −CO2Et )
【式】、1580(シ
クロヘキサン環のC=O)、1280(C−N)cm
-1。
上記の反応式は次のように示される。
フエノールノボラツク樹脂10g、パラアジド安
息香酸2−(N,N−ジメチルアミノ)エチル2
gをエチルセロソルブアセテート120gに溶解し、
感光性重合体組成物の溶液Bを調製した。これに
対し、増感剤として上記によつて合成した0.2g
の3,5−ビス(p−ジメチルアミノベンザル)
−N−エトキシカルボニル−4−ピペリジノンを
加えて室温で溶解し、0.2μmのフイルタを用いて
加圧ロ過した。得られた溶液をシリコンウエハ上
に回転塗布し、次いで70℃で20分間乾燥して0.9μ
m厚の塗膜を得た。この塗膜を縞模様のフオトマ
スクで被覆し、500Wの高圧水銀灯を用いて紫外
線照射した。0.1規定の水酸化ナトリウム水溶液
を用いて現像し、次いで水で洗浄してレリーフ・
パターンを得た。ここで形成された露光前の塗膜
は23℃、湿度60%の条件に24時間放置しても初期
の清浄な膜状態が保たれており、かつ、1.7倍感
度が増感された。
実施例 5
実施例4で調製した溶液Bに対し、増感剤とし
て実施例1によつて合成した0.2gの2,6−ビ
ス(p−ジメチルアミノシンナミリデン)−4−
ヒドロキシシクロヘキサノンを加えて室温で溶解
し、0.2μmのフイルタを用いて加圧ロ過した。得
られた溶液を実施例4と同一成膜条件、照射条件
で実験した。プリーベクによつて形成した塗膜は
23℃、湿度60%の条件に24時間放置しても初期の
情浄な膜状態が保たれており、かつ、1.5倍感度
が増感された。
実施例 6
窒素気流下に4,4′−ジアミノジフエニルエー
テル90g(0.45モル)、4,4′−ジアミノジフエ
ニルエーテル−3−カルボンアミド12.2g(0.05
モル)をN−メチル−2−ピロリドン1764gに溶
解し、アミン溶液を調合した。次にこの溶液を氷
冷によつて約15℃の温度に保ちながら、撹拌下に
ピロメリツト酸二無水物54.5g(0.25モル)、3,
3′,4,4′−ベンゾフエノンテトラカルボン酸二
無水物80.5g(0.25モル)を加えた。加え終えて
から、さらに約15℃で3時間反応させる粘度55ポ
アズ(30℃)のポリアミド酸:
(ただし、R17は[Formula], 1580 (C=O of cyclohexane ring), 1280 (C-N) cm
-1 . The above reaction formula is shown as follows. 10 g of phenol novolac resin, 2-(N,N-dimethylamino)ethyl paraazidobenzoate 2
Dissolve g in 120 g of ethyl cellosolve acetate,
Solution B of the photosensitive polymer composition was prepared. In contrast, 0.2g of the sensitizer synthesized above
3,5-bis(p-dimethylaminobenzal)
-N-ethoxycarbonyl-4-piperidinone was added and dissolved at room temperature, and filtered under pressure using a 0.2 μm filter. The resulting solution was spin-coated onto a silicon wafer and then dried at 70°C for 20 minutes to form a 0.9μ
A coating film of m thickness was obtained. This coating was covered with a striped photomask and exposed to ultraviolet light using a 500W high-pressure mercury lamp. Developed using 0.1N aqueous sodium hydroxide solution, then washed with water to create a relief.
I got the pattern. The coating film formed here before exposure maintained its initial clean state even after being left at 23°C and 60% humidity for 24 hours, and the sensitivity was increased by 1.7 times. Example 5 To the solution B prepared in Example 4, 0.2 g of 2,6-bis(p-dimethylaminocinnamylidene)-4- synthesized in Example 1 was added as a sensitizer.
Hydroxycyclohexanone was added, dissolved at room temperature, and filtered under pressure using a 0.2 μm filter. The obtained solution was tested under the same film forming conditions and irradiation conditions as in Example 4. The coating film formed by Priebek is
Even after being left at 23°C and 60% humidity for 24 hours, the initial pure film state was maintained, and the sensitivity was increased by 1.5 times. Example 6 90 g (0.45 mol) of 4,4'-diaminodiphenyl ether, 12.2 g (0.05 mol) of 4,4'-diaminodiphenyl ether-3-carbonamide under a nitrogen stream
mol) in 1764 g of N-methyl-2-pyrrolidone to prepare an amine solution. Next, while keeping this solution at a temperature of about 15°C by ice-cooling, 54.5 g (0.25 mol) of pyromellitic dianhydride, 3.
80.5 g (0.25 mol) of 3',4,4'-benzophenonetetracarboxylic dianhydride was added. After addition, polyamic acid with a viscosity of 55 poise (30°C) is further reacted at about 15°C for 3 hours: (However, R 17 is
【式】と[Formula] and
【式】が1:1、R18は[Formula] is 1:1, R 18 is
【式】と[Formula] and
以上詳述したように、本発明によれば、極性ベ
ースポリマと相溶性が良く、極性溶剤に溶け易い
増感剤を用いることができるので、極性ポリマを
ベースとする感光性重合体組成物に対し、フイル
ム形成時に欠陥が少なく、ワニス調製の容易な増
感法を提供することができるものである。
As detailed above, according to the present invention, it is possible to use a sensitizer that has good compatibility with a polar base polymer and is easily soluble in a polar solvent. On the other hand, it is possible to provide a sensitization method that causes fewer defects during film formation and facilitates the preparation of varnish.
第1図は、本発明による増感剤を用いない場合
の一例の感光性重合体組成物の分光感度を示すグ
ラフである。第2図は、本発明による増感剤を用
いた場合の一例の感光性重合体組成物の第1図と
同一の測定法による分光感度を示すグラフであ
る。
FIG. 1 is a graph showing the spectral sensitivity of an example of a photosensitive polymer composition without using a sensitizer according to the present invention. FIG. 2 is a graph showing the spectral sensitivity of an exemplary photosensitive polymer composition using the sensitizer according to the present invention, measured by the same method as in FIG. 1.
Claims (1)
の増感剤として、下記一般式〔1〕 〔但し、R1は低級アルキル基、R2は−H、Xは
炭素又は窒素原子、YはXが炭素原子の時には−
OH、Xが窒素原子の時には−H又は−COOR4
(ここにR4は低級アルキル基)を表し、nは0又
は1である〕で表わされる化合物よりなる群中か
ら選択された化合物を用いることを特徴とする極
性ポリマを成分とする感光性重合体組成物の増感
法。 2 上記極性ポリマを成分とする感光性重合体組
成物がフエノールノボラツク樹脂又はポリビニル
フエノール樹脂と芳香族アジド化合物、ポリアミ
ド酸と二重結合を持つアミン化合物、ポリアミド
酸とビスアジド化合物と二重結合を持つアミン化
合物、側鎖に二重結合を持つポリアミド酸とビス
アジド化合物の何れかであることを特徴とする特
許請求の範囲第1項記載の極性ポリマを成分とす
る感光性重合体組成物の増感法。 3 上記極性ポリマを成分とする感光性重合体組
成物は、その重合体が側鎖に二重結合又は芳香族
アジド基を持つポリアミド酸、ポリアミド若しく
はポリビニルアルコールであることを特徴とする
特許請求の範囲第1項記載の極性ポリマを成分と
する感光性重合体組成物の増感法。[Scope of Claims] 1 As a sensitizer for a photosensitive polymer composition containing a polar polymer as a component, the following general formula [1] [However, R 1 is a lower alkyl group, R 2 is -H, X is a carbon or nitrogen atom, and Y is - when X is a carbon atom.
When OH, X is a nitrogen atom, -H or -COOR 4
(wherein R 4 is a lower alkyl group) and n is 0 or 1]. Method for sensitization of coalescent compositions. 2. The photosensitive polymer composition containing the above polar polymer as a component is a phenol novolac resin or a polyvinylphenol resin and an aromatic azide compound, a polyamic acid and an amine compound having a double bond, a polyamic acid and a bisazide compound and a double bond. an amine compound having a double bond in a side chain, a polyamic acid having a double bond in a side chain, or a bisazide compound. Sensation method. 3. The photosensitive polymer composition containing the polar polymer as a component is characterized in that the polymer is polyamic acid, polyamide, or polyvinyl alcohol having a double bond or an aromatic azide group in the side chain. A method for sensitizing a photosensitive polymer composition comprising the polar polymer according to item 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19348682A JPS5984936A (en) | 1982-11-05 | 1982-11-05 | Sensitization of photosensitive polymer composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19348682A JPS5984936A (en) | 1982-11-05 | 1982-11-05 | Sensitization of photosensitive polymer composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5984936A JPS5984936A (en) | 1984-05-16 |
JPH0518866B2 true JPH0518866B2 (en) | 1993-03-15 |
Family
ID=16308829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19348682A Granted JPS5984936A (en) | 1982-11-05 | 1982-11-05 | Sensitization of photosensitive polymer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5984936A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2536594B2 (en) * | 1987-06-08 | 1996-09-18 | 日立化成工業株式会社 | Photopolymerization initiator and photopolymerizable composition using the same |
JPS63317553A (en) * | 1987-06-22 | 1988-12-26 | Mitsubishi Gas Chem Co Inc | Photosensitive polyamide acid composition |
JP2009516656A (en) * | 2005-11-22 | 2009-04-23 | ユニバーシティ オブ サスカチュワン | Antitumor active compound |
-
1982
- 1982-11-05 JP JP19348682A patent/JPS5984936A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5984936A (en) | 1984-05-16 |
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