JPH05173466A - Production of hologram - Google Patents
Production of hologramInfo
- Publication number
- JPH05173466A JPH05173466A JP3344486A JP34448691A JPH05173466A JP H05173466 A JPH05173466 A JP H05173466A JP 3344486 A JP3344486 A JP 3344486A JP 34448691 A JP34448691 A JP 34448691A JP H05173466 A JPH05173466 A JP H05173466A
- Authority
- JP
- Japan
- Prior art keywords
- hologram
- recording
- photosensitive
- electron beam
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000000463 material Substances 0.000 claims abstract description 37
- 238000010894 electron beam technology Methods 0.000 claims abstract description 26
- 239000011347 resin Substances 0.000 claims abstract description 22
- 229920005989 resin Polymers 0.000 claims abstract description 22
- 239000000178 monomer Substances 0.000 claims abstract description 14
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 abstract description 11
- 230000002411 adverse Effects 0.000 abstract description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- -1 polyethylene Polymers 0.000 description 6
- 230000001678 irradiating effect Effects 0.000 description 5
- 238000006116 polymerization reaction Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920005553 polystyrene-acrylate Polymers 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/18—Particular processing of hologram record carriers, e.g. for obtaining blazed holograms
- G03H1/182—Post-exposure processing, e.g. latensification
Landscapes
- Holo Graphy (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、感光性樹脂からなるホ
ログラム記録感材を使用したホログラム製造方法に関
し、とくに耐候性を付与したホログラムの製造方法に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a hologram production method using a hologram recording photosensitive material made of a photosensitive resin, and more particularly to a weatherproof hologram production method.
【０００２】[0002]
【従来の技術】光源からのレーザー光と物体からのレー
ザー光の２光束のレーザーの干渉によって生じる干渉縞
を感光性樹脂に記録することによってホログラムを製造
することが行われている。ホログラム記録感材として使
用する感光性樹脂には記録用のレーザー光に対して高感
度を有すると共に、解像度が高く、収縮、膨潤等がなく
耐候性に優れることが求められている。2. Description of the Related Art Holograms are manufactured by recording interference fringes, which are generated by the interference of laser beams from a light source and laser beams from an object, on a photosensitive resin. A photosensitive resin used as a hologram recording light-sensitive material is required to have high sensitivity to a laser beam for recording, high resolution, and excellent weather resistance without shrinkage or swelling.
【０００３】感光性樹脂からなるホログラム記録用感材
から製造したホログラムの耐候性が、レーザーによる干
渉縞の露光後に残存する感材中のモノマーによって悪影
響を受けることから、レーザー露光後に感材中に残存す
るモノマーに重合エネルギーを加えて重合し、安定化す
る方法が知られている。そして、重合エネルギーを加え
る手段として、紫外線を照射する方法、適当な温度で加
熱する方法が行われている。Since the weather resistance of a hologram produced from a photosensitive material for hologram recording made of a photosensitive resin is adversely affected by the monomer in the photosensitive material remaining after the exposure of the interference fringes by the laser, the weather resistance of the hologram after the laser exposure is increased. A method is known in which polymerization energy is added to the remaining monomer to polymerize and stabilize it. Then, as a means for applying polymerization energy, a method of irradiating with ultraviolet rays and a method of heating at an appropriate temperature are performed.
【０００４】[0004]
【発明が解決しようとする課題】ところが、従来行われ
ていた感光性樹脂からなるホログラム記録材料中に露光
後に残存するモノマーを重合する方法では、重合のエネ
ルギーを与える時間が長いと、ホログラムの光学的特性
に悪影響を及ぼすので、処理時間を長くすることはでき
なかった。その結果十分な重合を行うことができず、モ
ノマーの重合が不十分となり、結果として高温あるいは
高湿度などにおける十分な耐候性を有するホログラムを
得ることは困難であった。However, in the conventional method of polymerizing the monomer remaining after exposure in the hologram recording material made of a photosensitive resin, if the energy for polymerization is long, the hologram optical It was not possible to prolong the processing time because it adversely affects the physical properties. As a result, sufficient polymerization could not be performed, and the polymerization of the monomer was insufficient, and as a result, it was difficult to obtain a hologram having sufficient weather resistance at high temperature or high humidity.
【０００５】[0005]
【課題を解決するための手段】本発明は、上記の問題点
を解決すべく種々研究の結果、感光性樹脂からなるホロ
グラム記録感材にレーザー光によってホログラムを記録
し、次いで紫外線、熱等によって処理をした後、あるい
はホログラムの記録後ただちに、電子線照射することに
より、感材中に残存しているモノマーを電子線照射によ
って短時間に完全に重合するものであり、ホログラムの
光学的な特性に悪影響を与えることなく、ホログラムに
耐候性を付与するものである。As a result of various studies to solve the above problems, the present invention records a hologram on a hologram recording light-sensitive material made of a photosensitive resin with a laser beam, and then records the hologram with an ultraviolet ray or heat. By irradiating with an electron beam immediately after processing or immediately after recording a hologram, the monomer remaining in the photosensitive material is completely polymerized in a short time by the electron beam irradiation. The weather resistance is imparted to the hologram without adversely affecting the hologram.
【０００６】本発明を図面を参照して説明する。図１
は、ホログラム記録感材を有する積層体の１例の断面を
示した図である。The present invention will be described with reference to the drawings. Figure 1
FIG. 3 is a view showing a cross section of an example of a laminate having a hologram recording photosensitive material.
【０００７】ベースとなる基材１上に感光性樹脂からな
るホログラム記録感材層２を形成し、感材層上にはホロ
グラムを保護するための保護膜３が設けられている。A hologram recording photosensitive material layer 2 made of a photosensitive resin is formed on a base material 1 as a base, and a protective film 3 for protecting a hologram is provided on the photosensitive material layer.
【０００８】このホログラム記録積層体の感材層に２光
束のレーザーの干渉により記録し、ホログラムを形成す
る。A hologram is formed by recording on the light-sensitive material layer of this hologram recording laminated body by interference of two light beams of laser.
【０００９】ホログラム記録積層体の基材には、ガラ
ス、ポリカーボネート、ポリエチレン、ポリプロピレ
ン、ポリエチレンテレフタレート、ポリスチレン、ポリ
メタクリル酸メチル等の合成樹脂を使用することがで
き、ホログラム記録感材には、アクリル樹脂系、ポリ酢
酸ビニル系、セルロース系等の光重合性樹脂からなるホ
ログラム感材を使用することができる。入手および作業
性が良好であることから市販品のホログラムグラム記録
用感材を用いることが好ましい。また、保護膜には、ポ
リエチレンテレフタレート、ポリカーボネート、ポリエ
チレン、ポリスチレン、ポリメタクリル酸メチルなどの
耐候性の良好な透明樹脂フイルムを用いることができ
る。Synthetic resins such as glass, polycarbonate, polyethylene, polypropylene, polyethylene terephthalate, polystyrene and polymethylmethacrylate can be used for the base material of the hologram recording laminate, and acrylic resin can be used for the hologram recording photosensitive material. It is possible to use a holographic photosensitive material made of a photopolymerizable resin such as a resin, a polyvinyl acetate or a cellulose. It is preferable to use a commercially available photosensitive material for hologramgram recording because it is easily available and workable. For the protective film, a transparent resin film having good weather resistance such as polyethylene terephthalate, polycarbonate, polyethylene, polystyrene, and polymethylmethacrylate can be used.
【００１０】ホログラムを記録した積層体は、紫外線に
よる露光処理、加熱等によって感材を硬化した後に、電
子線照射工程において電子線を照射するが、電子線照射
工程の前に、紫外線、熱などによる硬化処理を行わなく
ても十分な回折効率等の光学的な特性が得られる場合に
は、硬化処理を行わずに直接に電子線の照射工程におい
て電子線照射を行っても良い。The laminated body on which the hologram is recorded is irradiated with an electron beam in the electron beam irradiation step after the photosensitive material is cured by exposure treatment with ultraviolet rays, heating, etc., but before the electron beam irradiation step, ultraviolet rays, heat, etc. When sufficient optical characteristics such as diffraction efficiency can be obtained without performing the curing treatment by, the electron beam irradiation may be directly performed in the electron beam irradiation step without performing the curing treatment.
【００１１】電子線の照射方法としては、電子線硬化樹
脂の処理において一般に行われている電子線照射手段を
使用することができ、コッククロフト−ウォルトン型、
バンデグラーフ型、共振変圧器型、絶縁コア変圧器型、
直線型、ダイナミトロン型、高周波型等の各種電子線加
速機で得られる５０〜１，０００ｋｅＶ好ましくは１０
０〜３００ｋｅＶのエネルギーを有する電子線を使用で
きる。感光性樹脂中に残存するモノマーを完全にポリマ
ー化するために必要な電子線照射線量は、基材や感光性
樹脂からなるホログラム記録感材の種類によって異なる
が、一般に０．１〜１００Ｍｒａｄが適当であり、好ま
しくは１〜１０Ｍｒａｄである。As the electron beam irradiating method, electron beam irradiating means generally used in the treatment of the electron beam curable resin can be used. Cockcroft-Walton type,
Van de Graaff type, resonance transformer type, insulation core transformer type,
50 to 1,000 keV, preferably 10 obtained by various electron beam accelerators such as linear type, dynamitron type and high frequency type.
An electron beam having an energy of 0 to 300 keV can be used. The electron beam irradiation dose required for completely polymerizing the monomers remaining in the photosensitive resin varies depending on the type of the hologram recording photosensitive material composed of the substrate and the photosensitive resin, but is generally 0.1 to 100 Mrad. And preferably 1 to 10 Mrad.
【００１２】電子線照射工程により、ホログラムが記録
された感光性樹脂からなる感材中に残存するモノマー
は、完全に反応してポリマー化し固定されるが、この反
応は極めて瞬時に進行するため電子線照射の前後での光
学特性に変化はない。By the electron beam irradiation step, the monomer remaining in the photosensitive material on which the hologram is recorded is completely reacted to be polymerized and fixed. There is no change in the optical characteristics before and after the line irradiation.
【００１３】上記工程により、ホトポリマー感材から作
製されたホログラムは表１に示すような環境下において
も、光学特性を維持することができた。従来の工程によ
るものが、これらの環境試験により光学特性が劣化して
しまうことを考えると、今回発明するに至った電子線照
射処理は耐候性付与の方法として極めて有効と考えられ
る。Through the above steps, the hologram produced from the photopolymer sensitive material was able to maintain the optical characteristics even under the environment shown in Table 1. Considering that the optical characteristics are deteriorated by these environmental tests by the conventional process, the electron beam irradiation treatment which has been invented this time is considered to be extremely effective as a method for imparting weather resistance.
【００１４】[0014]
【表１】 [Table 1]
【００１５】[0015]
【作用】ホログラム記録後の感光性樹脂からなるホログ
ラム記録感材を有する積層体を、電子線照射することに
よって、ホログラム記録後の感材中に存在する未反応モ
ノマーが高エネルギーの電子線により反応して、未反応
モノマーが完全に消失し、感光性樹脂からなる感材の構
造が安定となったためであり、従来の製造方法では得ら
れなかった高度の耐候性を付与することができる。[Function] By irradiating a laminated body having a hologram recording photosensitive material made of a photosensitive resin after hologram recording with an electron beam, unreacted monomers existing in the photosensitive material after hologram recording react with a high energy electron beam. This is because the unreacted monomer has completely disappeared and the structure of the photosensitive material made of a photosensitive resin has become stable, and it is possible to impart a high degree of weather resistance that cannot be obtained by the conventional manufacturing method.
【００１６】[0016]
実施例１ アクリル酸系およびビニルカルバゾール系のモノマーを
含む感光性樹脂からなるホログラム記録感材（ＨＲＦ−
３５２ デュポン社製）をガラス基板上に２５μｍの膜
厚みに塗布し、５１４ｎｍのアルゴンレーザーを用いて
ホログラム回折格子を作製した。Example 1 A hologram recording photosensitive material (HRF-) made of a photosensitive resin containing acrylic acid-based and vinylcarbazole-based monomers.
352 manufactured by DuPont) was applied on a glass substrate to a film thickness of 25 μm, and a hologram diffraction grating was produced using an argon laser of 514 nm.
【００１７】このホログラム回折格子に、高圧水銀燈を
用いて紫外線を５０ｍＪ／ｃｍ2 照射後、さらに１００
℃で２時間熱処理を行った。This hologram diffraction grating was irradiated with ultraviolet rays at 50 mJ / cm 2 using a high pressure mercury lamp, and then 100 times.
It heat-processed at 2 degreeC for 2 hours.
【００１８】得られたホログラムの光学特性を５１４ｎ
ｍのアルゴンレーザーで測定したところ、回折効率は７
５％、回折角度は４５°であることがわかった。The optical characteristic of the obtained hologram is 514n.
The diffraction efficiency is 7 when measured with an argon laser of m.
It was found that the diffraction angle was 5% and the diffraction angle was 45 °.
【００１９】さらにこのホログラムに電子線照射装置
（日新ハイボルテージ社製）を用いて、加速電圧１７５
ｋｅＶ、照射線量１０Ｍｒａｄの条件で電子線を照射し
た。Further, an electron beam irradiation device (manufactured by Nisshin High Voltage Co., Ltd.) was used for this hologram, and an accelerating voltage of 175
The electron beam was irradiated under the conditions of keV and irradiation dose of 10 Mrad.
【００２０】電子線照射後のホログラムは、１００℃に
おける高温放置試験において、５００時間経過後も、回
折効率は７５％、回折角度は４５°であり、光学特性の
変化は全くなく、良好な耐候性を有していることがわか
った。The hologram after electron beam irradiation had a good weather resistance with no change in optical characteristics even after 500 hours in a high temperature storage test at 100 ° C., with a diffraction efficiency of 75% and a diffraction angle of 45 °. It was found to have sex.
【００２１】実施例２ ガラス基板上に、スピンコート法にて感光性樹脂からな
るホログラム記録感材（ＨＲＳ−６００：デュポン社
製）を１０μｍの膜厚に塗布し、膜厚５０μｍのポリエ
チレンテレフタレートフィルム（帝人（株）製、ＨＰ−
７）で被覆した。得られた積層体に５１４ｎｍのアルゴ
ンレーザーを用いて透過型のホログラム回折格子を作製
した。Example 2 A hologram recording photosensitive material (HRS-600: manufactured by DuPont) made of a photosensitive resin was applied on a glass substrate by a spin coating method to a film thickness of 10 μm, and a polyethylene terephthalate film having a film thickness of 50 μm was applied. (Manufactured by Teijin Limited, HP-
Coated with 7). A transmissive hologram diffraction grating was produced on the obtained laminated body by using a 514 nm argon laser.
【００２２】このホログラム回折格子に、実施例１と同
様の条件で紫外線、加熱、電子線処理を行った。This hologram diffraction grating was subjected to ultraviolet rays, heating, and electron beam treatment under the same conditions as in Example 1.
【００２３】処理後のホログラムの光学特性を５１４ｎ
ｍのアルゴンレーザーで測定したところ、回折効率は９
０％、回折角度は４８°であった。このホログラムを６
５℃、９５％ＲＨの高湿度下に２４０時間放置したとこ
ろ、光学特性に変化が認められなかった。The optical characteristics of the processed hologram are 514n.
The diffraction efficiency was 9 when measured with an argon laser of m.
The diffraction angle was 0% and the angle was 48 °. 6 this hologram
No change was observed in the optical characteristics when left for 240 hours under high humidity of 5 ° C. and 95% RH.
【００２４】比較例１ 実施例１のホログラム製造条件と電子線照射工程を含ま
ない点を除いて、実施例１と同様の条件でホログラム回
折格子を作製した。Comparative Example 1 A hologram diffraction grating was produced under the same conditions as in Example 1 except that the hologram production conditions of Example 1 and the electron beam irradiation step were not included.
【００２５】このホログラムの回折効率は７５％、回折
角度は４５°であった。このホログラムは、１００℃に
おける高温放置試験を５００時間行ったところ、回折効
率は６０％、回折角度は５２°と変化し、耐候性が不十
分であった。The hologram had a diffraction efficiency of 75% and a diffraction angle of 45 °. When this hologram was subjected to a high temperature storage test at 100 ° C. for 500 hours, the diffraction efficiency changed to 60%, the diffraction angle changed to 52 °, and the weather resistance was insufficient.
【００２６】比較例２ 実施例２のホログラム製造条件と、電子線照射工程を含
まない点を除いて、実施例２と同様の条件でホログラム
回折格子を作製した。Comparative Example 2 A hologram diffraction grating was produced under the same conditions as in Example 2, except that the hologram production conditions of Example 2 and the electron beam irradiation step were not included.
【００２７】このホログラムの回折効率は９０％、回折
角度は４８°であった。このホログラムは、６５℃、９
５％ＲＨの高湿度下に２４０時間放置したところ、回折
効率は４０％、回折角度は５４°と変化し、耐候性が不
十分であった。The hologram had a diffraction efficiency of 90% and a diffraction angle of 48 °. This hologram is 65 ° C, 9
When left in a high humidity of 5% RH for 240 hours, the diffraction efficiency was changed to 40% and the diffraction angle was changed to 54 °, and the weather resistance was insufficient.
【００２８】[0028]
【発明の効果】本発明のホログラムの製造方法は、感光
性樹脂からなるホログラム記録感材にホログラムを記録
した後に、紫外線照射、熱処理等の工程の後に、あるい
はホログラムを記録した後に直ちに電子線を照射し、感
材中の残存モノマーを完全に反応させたので、光学特性
に悪影響を与えないで、耐候性を高めることができる。The method for producing a hologram of the present invention is characterized in that after the hologram is recorded on the hologram recording light-sensitive material made of a photosensitive resin, it is irradiated with an electron beam after a step such as ultraviolet irradiation, heat treatment, or immediately after the hologram is recorded. Since the residual monomer in the light-sensitive material is completely reacted by irradiation, weather resistance can be improved without adversely affecting optical characteristics.
【図１】ホログラム記録感材層を有する積層体の１例の
断面を示した図である。FIG. 1 is a view showing a cross section of an example of a laminate having a hologram recording light-sensitive material layer.
１…基材、２…感材層、３…保護膜 1 ... Substrate, 2 ... Sensitive material layer, 3 ... Protective film
Claims (2)
ログラム記録感材層に、レーザー光の干渉によって形成
される干渉縞を記録するホログラム製造方法において、
感材層への干渉縞の記録後に、紫外線照射、熱処理等に
よる感材層の硬化処理後、もしくは感材層への干渉縞の
記録後ただちに、電子線照射し感材層中の残存モノマー
を反応させることを特徴とするホログラム製造方法。1. A hologram manufacturing method for recording an interference fringe formed by interference of laser light on a hologram recording photosensitive material layer made of a photosensitive resin coated on a substrate,
Immediately after recording the interference fringes on the photosensitive layer, after curing the photosensitive layer by ultraviolet irradiation, heat treatment, etc., or immediately after recording the interference fringes on the photosensitive layer, electron beam irradiation was performed to remove residual monomers in the photosensitive layer. A method for producing a hologram, which comprises reacting.
類のモノマーを含有する体積型の感光性樹脂であること
を特徴とする請求項１記載のホログラム製造方法。2. The hologram manufacturing method according to claim 1, wherein the hologram recording photosensitive material is a volume type photosensitive resin containing at least one kind of monomer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3344486A JPH05173466A (en) | 1991-12-26 | 1991-12-26 | Production of hologram |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3344486A JPH05173466A (en) | 1991-12-26 | 1991-12-26 | Production of hologram |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05173466A true JPH05173466A (en) | 1993-07-13 |
Family
ID=18369639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3344486A Pending JPH05173466A (en) | 1991-12-26 | 1991-12-26 | Production of hologram |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05173466A (en) |
-
1991
- 1991-12-26 JP JP3344486A patent/JPH05173466A/en active Pending
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