JPH05167172A - Narrow-band oscillation excimer laser equipment and its purging method - Google Patents
Narrow-band oscillation excimer laser equipment and its purging methodInfo
- Publication number
- JPH05167172A JPH05167172A JP35281291A JP35281291A JPH05167172A JP H05167172 A JPH05167172 A JP H05167172A JP 35281291 A JP35281291 A JP 35281291A JP 35281291 A JP35281291 A JP 35281291A JP H05167172 A JPH05167172 A JP H05167172A
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- Prior art keywords
- grating
- clean gas
- gas
- narrow band
- excimer laser
- Prior art date
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Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、狭帯域発振エキシマレ
ーザ装置およびそのパージ方法に係わり、特には、縮小
投影露光装置用の光源として用いられる狭帯域発振エキ
シマレーザ装置およびそのパージ方法の改良に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a narrow band oscillation excimer laser device and a purging method thereof, and more particularly to an improvement of a narrow band oscillation excimer laser device used as a light source for a reduction projection exposure apparatus and a purging method thereof. ..
【０００２】[0002]
【従来の技術】従来、特願平１−１２９３９２号、特開
平１ー１２３２３８号公報、特開平１ー１４３３７２号
公報等に開示されている技術では、複数個のエタロン又
はビームエキスパンダとグレーティングによって狭帯域
化を行っている。狭帯域化素子の熱負荷が大きかった
り、また、長期的に狭帯域レーザを運転する場合には、
空気中のダストや酸素等によって狭帯域化素子が損傷し
素子寿命を短くしているので、熱負荷を低減したり、狭
帯域素子寿命を延ばすために清浄なパージ気体を図８の
ように光学素子に直接吹き付けている。2. Description of the Related Art Conventionally, in the techniques disclosed in Japanese Patent Application Nos. 1-129392, 1-123238 and 1-143372, a plurality of etalons or beam expanders and a grating are used. The band is narrowed. When the heat load of the narrow band element is large, or when operating the narrow band laser for a long time,
Since the narrow band element is damaged by dust and oxygen in the air and shortens the element life, a clean purge gas is used as shown in Fig. 8 to reduce the heat load and extend the narrow band element life. It is sprayed directly on the element.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、グレー
ティングを狭帯域化素子として使用し、グレーティング
の溝表面に清浄気体を吹き付けるとグレーティングの溝
表面の気体屈折率が変化するためにレーザの発振波長及
びビームプロフィルに、図９、図１０に示すように揺ら
ぎが発生することを発見した。この発振波長の揺らぎは
ランダムに発生するため、揺らぎ以下に発振波長を安定
化することは出来なかった。また、ビームが揺らぐと露
光するときに均一に露光が出来なくなるためステッパ用
の光源としては不適当であった。However, when a grating is used as a band narrowing element and a clean gas is sprayed on the groove surface of the grating, the refractive index of the gas on the groove surface of the grating changes, so that the oscillation wavelength and the beam of the laser are changed. It was discovered that fluctuations occur in the profile as shown in FIGS. Since this fluctuation of the oscillation wavelength occurs at random, it was not possible to stabilize the oscillation wavelength below the fluctuation. Further, when the beam fluctuates, the exposure cannot be performed uniformly when the beam is exposed, which is unsuitable as a light source for a stepper.
【０００４】本発明は上記従来の問題点に着目し、狭帯
域発振エキシマレーザ装置およびそのパージ方法に係わ
り、特には、縮小投影露光装置用の光源として用いられ
る狭帯域発振エキシマレーザ装置およびそのパージ方法
の提供を目的としている。The present invention focuses on the above-mentioned conventional problems, and relates to a narrow band oscillation excimer laser device and a purging method thereof, and in particular, a narrow band oscillation excimer laser device used as a light source for a reduction projection exposure apparatus and its purging method. The purpose is to provide a method.
【０００５】[0005]
【課題を解決するための手段】上記目的を達成するため
に、本発明では、狭帯域発振として少なくともグレーテ
ィングを配置した狭帯域レーザにおいて、前記狭帯域化
素子を筺体で囲う手段と、清浄気体で前記筺体内をパー
ジする手段と、パージすることによって前記グレーティ
ングの溝表面に清浄気体の流れが起きない手段を備えて
いる。In order to achieve the above object, in the present invention, in a narrow band laser in which at least a grating is arranged as a narrow band oscillation, a means for surrounding the narrow band element with a housing and a clean gas are used. A means for purging the inside of the housing and a means for preventing the flow of the clean gas on the groove surface of the grating by the purging are provided.
【０００６】このように、窒素あるいはヘリウム等の不
活性ガスまたは空気等のレーザ光に反応、および吸収し
ない気体をＨＥＰＡ等のフィルタを透過して清浄気体と
し、その清浄気体がグレーティングの溝表面に吹き付け
ないことによりレーザの発振波長およびビームプロフィ
ルの揺らぎをなくする。As described above, a gas that does not react with and absorbs an inert gas such as nitrogen or helium or laser light such as air passes through a filter such as HEPA to be a clean gas, and the clean gas is deposited on the groove surface of the grating. By not spraying, fluctuations in the laser oscillation wavelength and beam profile are eliminated.
【０００７】[0007]
【作用】上記構成によれば、グレーティングの溝表面に
清浄気体の流れを起こさないようにしているためにグレ
ーティング表面の気体の屈折率の変化がなくなり、出力
レーザ光の発振波長の揺らぎ及びビームプロフィルの揺
らぎがなくなる。また、熱負荷が大きな光学素子の表面
に清浄気体を吹き付けることにより光学素子の発熱を抑
えることができる。According to the above construction, since the flow of the clean gas is prevented from occurring on the groove surface of the grating, the change in the refractive index of the gas on the grating surface is eliminated, and the fluctuation of the oscillation wavelength of the output laser light and the beam profile are eliminated. Fluctuations disappear. Further, heat generation of the optical element can be suppressed by blowing a clean gas onto the surface of the optical element having a large heat load.
【０００８】[0008]
【実施例】以下に、本発明に係わる狭帯域発振エキシマ
レーザ装置の実施例につき、図面を参照して詳細に説明
する。図１は本発明の狭帯域発振エキシマレーザ装置の
第１実施例を示す全体構成図である。図１において、狭
帯域発振エキシマレーザ装置はフロントミラー１と、レ
ーザを起振するレーザチャンバ１０と、レーザを狭帯域
化する狭帯域化装置２０とからなっている。レーザチャ
ンバ１０は、図示しない電極とウインド１１とチヤンバ
ー１２とからなっている。狭帯域化装置２０は、プリズ
ムビームエキスパンダ２５とグレーティング３０と筺体
３５と、清浄気体装置４０からなっている。プリズムビ
ームエキスパンダ２５とグレーティング３０は筺体３５
で囲われている。プリズムビームエキスパンダ２５は第
１プリズム２７および第２プリズム２９よりなってい
る。筺体３５は狭帯域ボックスで形成されている。グレ
ーティング３０の溝表面３０ａの裏側３０ｂに清浄気体
装置４０からの清浄気体の導入口４２が配設されてい
る。Embodiments of the narrow band oscillation excimer laser device according to the present invention will be described below in detail with reference to the drawings. FIG. 1 is an overall configuration diagram showing a first embodiment of a narrow band oscillation excimer laser device of the present invention. In FIG. 1, the narrow band oscillation excimer laser device comprises a front mirror 1, a laser chamber 10 for exciting a laser, and a narrow band device 20 for narrowing the laser band. The laser chamber 10 is composed of an electrode (not shown), a window 11 and a chamber 12. The band narrowing device 20 includes a prism beam expander 25, a grating 30, a housing 35, and a clean gas device 40. The prism beam expander 25 and the grating 30 are housings 35.
It is surrounded by. The prism beam expander 25 includes a first prism 27 and a second prism 29. The housing 35 is formed of a narrow band box. An inlet 42 for the clean gas from the clean gas device 40 is arranged on the back side 30b of the groove surface 30a of the grating 30.
【０００９】本実施例の狭帯域化方式はプリズムビーム
エキスパンダ２５とグレーティング３０を組み合わせた
方式であり、グレーティング３０はリトロー配置になっ
ている。第１プリズム２７、第２プリズム２９およびグ
レーティング３０は狭帯域化ボックス３５で覆われてお
り、管３７によりレーザチャンバー１０と接続されてい
る。清浄気体装置４０は、清浄気体ガスボンベ４４から
流量計４６を介して清浄気体は清浄気体の導入口４２か
ら吹き出される。清浄気体の導入口４２はグレーティン
グ３０の裏側３０ｂに配設されており、グレーティング
３０の溝表面３０ａには気体の流れが起こさずに狭帯域
化ボックス３５内および管３７内（狭帯域化ボックスと
ウインドウの間の光路）が清浄気体で満たされる。The band narrowing system of this embodiment is a system in which a prism beam expander 25 and a grating 30 are combined, and the grating 30 is arranged in a Littrow arrangement. The first prism 27, the second prism 29, and the grating 30 are covered with a band narrowing box 35, and are connected to the laser chamber 10 by a tube 37. In the clean gas device 40, the clean gas is blown from a clean gas gas cylinder 44 through a flow meter 46 through a clean gas inlet 42. The clean gas inlet 42 is disposed on the back side 30b of the grating 30. The gas flow does not occur on the groove surface 30a of the grating 30 in the narrow band box 35 and the pipe 37 (narrow band box). The optical path between the windows) is filled with clean gas.
【００１０】次に上記実施例において、作動について説
明する。レーザチャンバ１０内および狭帯域化装置２０
がレーザに反応しない気体の清浄気体で満たされると、
次に、レーザチャンバ１０内で放電励起され、狭帯域化
装置２０でレーザが狭帯域化された後にフロントミラー
１より出力される。このとき、グレーティング３０の溝
表面３０ａに気体の流れが起きないので出力光の中心波
長及びビームプロフィルの揺らぎがなくなる。また、ウ
インドウ１１、プリズム２７、２９、およびグレーティ
ング３０の周囲が清浄気体でみたされているため、狭帯
域化素子のプリズムビームエキスパンダ２５とグレーテ
ィング３０およびウインドウ１１の寿命は飛躍的に延び
る。Next, the operation of the above embodiment will be described. Inside laser chamber 10 and band narrowing device 20
Is filled with a clean gas, a gas that does not react to the laser,
Next, discharge excitation is performed in the laser chamber 10, the laser is narrowed by the narrowing device 20, and then the laser is output from the front mirror 1. At this time, since no gas flows on the groove surface 30a of the grating 30, fluctuations in the center wavelength of the output light and the beam profile are eliminated. Further, since the surroundings of the window 11, the prisms 27, 29, and the grating 30 are filled with clean gas, the life of the prism beam expander 25 of the band-narrowing element, the grating 30, and the window 11 is dramatically extended.
【００１１】なお、この狭帯域化ボックス３５または管
３７の密閉度はその内部が清浄気体で満たされる程度で
良い。もし、狭帯域化ボックス３５と管３７の密閉度を
高くした場合には清浄気体の小さな排出口を設置すれば
良い。この例では、清浄気体の導入口４２はグレーティ
ング３０の背面３０ｂに対向する筺体３５の側壁に設置
しているが、それに限定されるものでは無く、グレーテ
ィング３０ａの背面側であれば狭帯域化ボックスの底板
３５ａあるいは上板３５ｂに設置しても良い。 清浄気
体の例として、窒素ガスやヘリウム等の不活性ガスがあ
る。また、酸素が光学素子と反応したり、レーザ光を吸
収したりしない場合は、ＨＥＰＡフィルターを通過した
空気でパージしても良い。The tightness of the band-narrowing box 35 or the tube 37 may be such that the inside thereof is filled with clean gas. If the tightness of the band-narrowing box 35 and the pipe 37 is increased, a small clean gas outlet may be installed. In this example, the clean gas inlet 42 is installed on the side wall of the housing 35 facing the back surface 30b of the grating 30, but the invention is not limited to this, and if the back surface side of the grating 30a is, the band narrowing box is provided. It may be installed on the bottom plate 35a or the top plate 35b. Examples of the clean gas include nitrogen gas and an inert gas such as helium. Further, when oxygen does not react with the optical element or does not absorb the laser light, the air may be purged with the air that has passed through the HEPA filter.
【００１２】図２は本発明の狭帯域発振エキシマレーザ
装置の第２実施例を示す全体構成図であり、第１実施例
とは狭帯域化方式のプリズムビームエキスパンダ５０が
プリズム２５、２７とエタロン５１およびグレーティン
グ３０を用いている。この場合も、第１実施例と同様に
グレーティング３０の溝表面３０ａに気体の流れが起き
ないので出力光の中心波長及びビームプロフィルの揺ら
ぎがなくなる。このように狭帯域化方式としては上記実
施例に囚われることなくグレーティングを少なくとも配
置した狭帯域化方式であれば何でも良い。また、グレー
ティングは斜入射配置でも良い。FIG. 2 is an overall configuration diagram showing a second embodiment of the narrow band oscillation excimer laser device of the present invention. The narrow band type prism beam expander 50 is different from the first embodiment in that it has prisms 25 and 27. The etalon 51 and the grating 30 are used. Also in this case, as in the first embodiment, no gas flow occurs on the groove surface 30a of the grating 30, so that fluctuations in the center wavelength of the output light and the beam profile are eliminated. As described above, the band narrowing system is not limited to the above-mentioned embodiment, and any band narrowing system in which at least the grating is arranged may be used. Further, the grating may be arranged at an oblique incidence.
【００１３】図３は本発明の狭帯域発振エキシマレーザ
装置の第３実施例を示す全体構成図であり、第１実施例
とは、清浄気体の導入口５５の位置の変更と、壁５６、
５７を追加した実施例を示している。清浄気体の導入口
５５の位置はグレーティング３０の溝表面３０ａ側に配
置しており、また、壁５６はプリズムビームエキスパン
ダ２５とグレーティング３０との間で光路を妨げない位
置に配設している。このように、光路を囲うように壁５
６、５７を配設すれば清浄気体の導入口５５の位置はそ
の外側であれば何処に配置しても良い。この場合も、第
１実施例と同様にグレーティング３０の溝表面３０ａに
気体の流れが起きないので出力光の中心波長及びビーム
プロフィルの揺らぎがなくなる。FIG. 3 is an overall constitutional view showing a third embodiment of the narrow band oscillation excimer laser device of the present invention. The first embodiment is different from the position of the clean gas introduction port 55 and the wall 56,
An example in which 57 is added is shown. The position of the clean gas inlet 55 is arranged on the groove surface 30a side of the grating 30, and the wall 56 is arranged at a position that does not obstruct the optical path between the prism beam expander 25 and the grating 30. .. In this way, the wall 5 surrounds the optical path.
If 6 and 57 are provided, the position of the clean gas inlet 55 may be located anywhere outside thereof. Also in this case, as in the first embodiment, no gas flow occurs on the groove surface 30a of the grating 30, so that fluctuations in the center wavelength of the output light and the beam profile are eliminated.
【００１４】図４は本発明の狭帯域発振エキシマレーザ
装置の第４実施例を示す全体構成図であり、第３実施例
とは、第２実施例と同様に狭帯域化方式にプリズムビー
ムエキスパンダ４０がプリズム２５、２７とエタロン５
１およびグレーティング３０を用いている。この場合
も、光路を囲うように壁５６、５７を配設すれば清浄気
体の導入口５５の位置はその外側であれば何処に配置し
ても良い。FIG. 4 is an overall constitutional view showing a fourth embodiment of the narrow band oscillation excimer laser device of the present invention. The third embodiment is similar to the second embodiment in that the prism beam extract is applied to the narrow band narrowing system. Panda 40 has prisms 25 and 27 and etalon 5
1 and the grating 30 are used. Also in this case, if the walls 56 and 57 are arranged so as to surround the optical path, the position of the clean gas introduction port 55 may be arranged anywhere outside thereof.
【００１５】図５は本発明の狭帯域発振エキシマレーザ
装置の第５実施例を示す全体構成図であり、第３実施例
とは、壁６１、６２の位置が変更した実施例を示してい
る。壁６１によりグレーティング３０を含む部屋６３
と、プリズムビームエキスパンダ２５を含む部屋６５と
に分割し、清浄気体の導入口６４の位置はプリズムビー
ムエキスパンダ２５を含む部屋６５側に配置している。
この場合も、第１実施例と同様にグレーティング３０の
溝表面３０ａに気体の流れが起きないので出力光の中心
波長及びビームプロフィルの揺らぎがなくなる。しか
し、この場合もグレーティング３０を含む部屋６３は不
活性ガスで満たされることは言うまでもない。FIG. 5 is an overall configuration diagram showing a fifth embodiment of the narrow band oscillation excimer laser device of the present invention. The third embodiment shows an embodiment in which the positions of the walls 61 and 62 are changed. .. Room 63 with grating 30 by wall 61
And a room 65 containing the prism beam expander 25, and the position of the clean gas inlet 64 is located on the side of the room 65 containing the prism beam expander 25.
Also in this case, as in the first embodiment, no gas flow occurs on the groove surface 30a of the grating 30, so that fluctuations in the center wavelength of the output light and the beam profile are eliminated. However, it goes without saying that the chamber 63 including the grating 30 is filled with the inert gas in this case as well.
【００１６】図６は本発明の狭帯域発振エキシマレーザ
装置の第６実施例を示す全体構成図であり、第１実施例
とは、清浄気体の導入口７１の位置が変更されている。
この場合は、清浄気体の導入口７１の位置は第１プリズ
ム２７の第２の表面２７ｂに清浄気体を吹き付ける位置
にしている。また、このとき第１プリズム２７を冷却す
るために第１プリズム２７の第１面２７ａまたは両面２
７ａ、２７ｂを冷却するように清浄気体を吹き付ける位
置にしても良い。このようにすることにより、熱負荷の
一番大きい第１プリズム２７を冷却することができるた
め出力レーザ光のスペクトル線幅やビーム幅の変化を抑
えることができるとともに、寿命を飛躍的に延ばすこと
ができる。FIG. 6 is an overall configuration diagram showing a sixth embodiment of the narrow band oscillation excimer laser device of the present invention, in which the position of the inlet 71 for the clean gas is changed from that of the first embodiment.
In this case, the position of the clean gas inlet 71 is set to a position where the clean gas is blown onto the second surface 27b of the first prism 27. Further, at this time, in order to cool the first prism 27, the first surface 27a of the first prism 27 or both surfaces 2
It may be at a position where a clean gas is blown so as to cool 7a and 27b. By doing so, it is possible to cool the first prism 27 having the largest heat load, so that it is possible to suppress changes in the spectral line width and beam width of the output laser light, and to dramatically extend the life. You can
【００１７】なお、第１実施例、第２実施例において、
清浄気体の流量を変化させて波長およびビームプロフィ
ルの揺らぎを測定した結果、流量５l/min以下であれば
波長およびビームプロフィルの揺らぎが起こらなかっ
た。また、狭帯域化ボックス３５の清浄度をパーティク
ルカウンタで測定した結果、０．２l/min以上であれば
狭帯域化ボックス３５内は十分清浄であることが判明し
た。さらに、実施例３、４、５、６では流量５l/min以
上でも波長およびビームプロフィルの揺らぎは起こらな
かった。In the first and second embodiments,
As a result of measuring the fluctuation of the wavelength and the beam profile by changing the flow rate of the clean gas, the fluctuation of the wavelength and the beam profile did not occur if the flow rate was 5 l / min or less. Further, as a result of measuring the cleanliness of the band-narrowing box 35 with a particle counter, it was found that the inside of the band-narrowing box 35 was sufficiently clean if it was 0.2 l / min or more. Furthermore, in Examples 3, 4, 5, and 6, fluctuations in wavelength and beam profile did not occur even at a flow rate of 5 l / min or more.
【００１８】[0018]
【発明の効果】以上説明したように、本発明によれば、
狭帯域化素子を筺体で囲い、清浄気体で前記筺体をパー
ジすることによりダストや酸素等よより生ずる狭帯域化
素子の損傷がなくなり、狭帯域化素子の寿命が飛躍的に
のびる。また、グレーティングの溝表面に清浄気体の流
れを起こさないようにするために発振波長およびビーム
の揺らぎがなくなり、そのため発振波長の安定が向上
し、ステッパの光源として使用した場合に露光ムラがな
くなる。さらに、熱負荷の大きな光学素子の発熱を抑え
ることができるため、スペクトル線幅の変化やビームプ
ロフィルの変化を抑えることができ、光学素子寿命も向
上する。このためステッパ用の光源として最適なレーザ
が得られる。As described above, according to the present invention,
By enclosing the band narrowing element with a housing and purging the housing with a clean gas, damage of the band narrowing element caused by dust, oxygen, etc. is eliminated, and the life of the band narrowing element is dramatically extended. Further, the oscillation wavelength and the fluctuation of the beam are eliminated in order to prevent the flow of the clean gas on the groove surface of the grating, so that the stability of the oscillation wavelength is improved and the exposure unevenness is eliminated when it is used as the light source of the stepper. Furthermore, since it is possible to suppress the heat generation of the optical element having a large heat load, it is possible to suppress the change of the spectral line width and the change of the beam profile, and the life of the optical element is improved. Therefore, an optimum laser can be obtained as a light source for the stepper.
【図１】本発明の狭帯域発振エキシマレーザ装置の第１
実施例を示す全体構成図。FIG. 1 shows a first narrow-band oscillation excimer laser device of the present invention.
The whole block diagram which shows an Example.
【図２】本発明の狭帯域発振エキシマレーザ装置の第２
実施例を示す全体構成図。FIG. 2 is a second narrow band oscillation excimer laser device of the present invention.
The whole block diagram which shows an Example.
【図３】本発明の狭帯域発振エキシマレーザ装置の第３
実施例を示す全体構成図。FIG. 3 is a third example of the narrow band oscillation excimer laser device of the present invention.
The whole block diagram which shows an Example.
【図４】本発明の狭帯域発振エキシマレーザ装置の第４
実施例を示す全体構成図。FIG. 4 is a fourth example of the narrow band oscillation excimer laser device of the present invention.
The whole block diagram which shows an Example.
【図５】本発明の狭帯域発振エキシマレーザ装置の第５
実施例を示す全体構成図。FIG. 5 is a fifth example of the narrow band oscillation excimer laser device of the present invention.
The whole block diagram which shows an Example.
【図６】本発明の狭帯域発振エキシマレーザ装置の第６
実施例を示す全体構成図。FIG. 6 is a sixth view of the narrow band oscillation excimer laser device of the present invention.
The whole block diagram which shows an Example.
【図７】本発明のビームプロフィルを示す図。FIG. 7 is a diagram showing a beam profile of the present invention.
【図８】従来のクリーンなパージ気体を光学素子に直接
吹き付けている図。FIG. 8 is a diagram in which a conventional clean purge gas is directly blown to an optical element.
【図９】従来の発振波長の揺らぎを示す図。FIG. 9 is a diagram showing a conventional oscillation wavelength fluctuation.
【図１０】従来のビームプロフィルの揺らぎを示す図。FIG. 10 is a diagram showing fluctuations in a conventional beam profile.
１ フロントミラー １０ レーザチャンバ １１ ウインド １２ チヤンバー ２０ 狭帯域化装置 ２５、４０、５０ プリズムビームエキスパンダ ２７ 第１プリズム ２９ 第２プリズム ３０ グレーティング ３５ 狭帯域化ボックス（筺体） ３７ 管 ４０ 清浄気体装置 ４２、５５、６４、７１ 清浄気体の導入口 ４４ 清浄気体ガスボンベ ５１ エタロン ５６、５７、６１、６２ 壁 ６３、６５ 部屋 1 Front Mirror 10 Laser Chamber 11 Window 12 Chamber 20 Narrowing Band Device 25, 40, 50 Prism Beam Expander 27 First Prism 29 Second Prism 30 Grating 35 Narrow Band Box 37 Casing 40 Clean Gas Device 42, 55, 64, 71 Clean gas inlet 44 Clean gas gas cylinder 51 Etalon 56, 57, 61, 62 Wall 63, 65 Room
Claims (8)
ングを配置した狭帯域レーザにおいて、前記狭帯域化素
子を筺体で囲う手段と、清浄気体で前記筺体内をパージ
する手段と、前記グレーティングの溝表面へのパージ気
体流入防止手段を備えたことを特徴とする狭帯域発振エ
キシマレーザ装置。1. A narrow-band laser in which at least a grating is arranged for narrow-band oscillation, means for surrounding the narrow-band element with a housing, means for purging the inside of the housing with a clean gas, and a groove surface of the grating. A narrow band oscillation excimer laser device comprising a purge gas inflow prevention means.
気体流入防止手段として、清浄気体の導入口を前記グレ
ーティングの溝表面に対して裏側に配置した請求項１記
載の狭帯域発振エキシマレーザ装置。2. The narrow band oscillation excimer laser device according to claim 1, wherein a clean gas inlet is arranged on the back side of the groove surface of the grating as a means for preventing the purge gas from flowing into the groove surface of the grating.
気体流入防止手段として、前記グレーティングと光学素
子の間に光路を妨げない壁を配設し、前記壁の光路側の
反対側に清浄気体の導入口を配設した請求項１記載の狭
帯域発振エキシマレーザ装置。3. As a means for preventing purge gas from flowing into the groove surface of the grating, a wall that does not obstruct the optical path is provided between the grating and the optical element, and a clean gas is introduced to the opposite side of the wall from the optical path side. The narrow band oscillation excimer laser device according to claim 1, wherein a mouth is provided.
気体流入防止手段手段として、前記グレーティングと光
学素子の間に光路を妨げないように壁で囲い、前記壁で
囲われた光路以外の場所に清浄気体の導入口を配設した
請求項１記載の狭帯域発振エキシマレーザ装置。4. A means for preventing purge gas from flowing into the surface of the groove of the grating, which is surrounded by a wall so as not to obstruct the optical path between the grating and the optical element, and is cleaned in a place other than the optical path surrounded by the wall. The narrow band oscillation excimer laser device according to claim 1, wherein a gas inlet is provided.
気体流入防止手段手段として、前記筺体内を前記グレー
ティングを含む部屋とその他の光学素子の部屋に分ける
壁を配設し、グレーティングを含まない部屋に清浄気体
の導入口を前記グレーティングの溝表面に対して裏側に
配置した請求項１記載の狭帯域発振エキシマレーザ装
置。5. As a means for preventing purge gas from flowing into the groove surface of the grating, a wall that divides the housing into a room containing the grating and a room containing other optical elements is provided, and a room not containing the grating is provided. The narrow band oscillation excimer laser device according to claim 1, wherein an inlet for introducing the clean gas is arranged on the back side of the groove surface of the grating.
気体流入防止手段手段として、ビームエキスパンダの表
面に清浄気体を直接流す手段を備えた請求項１または請
求項３または請求項４または請求項５記載の狭帯域発振
エキシマレーザ装置。6. A means for preventing a purge gas from flowing into the groove surface of the grating, wherein a means for directly flowing a clean gas to the surface of the beam expander is provided. Narrow band oscillation excimer laser device described.
用し、レーザチャンバーから第１面または第２面あるい
は両面のプリズムビームエキスパンダ表面に清浄気体を
吹き付ける手段を備えた請求項１または請求項３または
請求項４または請求項５または請求項６記載の狭帯域発
振エキシマレーザ装置。7. A prism is used as the beam expander, and a means for spraying a clean gas from the laser chamber onto the surface of the prism beam expander on the first surface, the second surface, or both surfaces is provided. The narrow band oscillation excimer laser device according to claim 4, claim 5, or claim 6.
ングを配置した狭帯域レーザにおいて、窒素あるいはヘ
リウム等の不活性ガスまたは空気等のレーザ光に反応、
および吸収しない気体をＨＥＰＡ等のフィルタを透過し
て清浄気体とし、その清浄気体がグレーティングの溝表
面に吹き付けないことによりレーザの発振波長およびビ
ームプロフィルの揺らぎをなくしたことを特徴とする狭
帯域発振エキシマレーザ装置のパージ方法。8. A narrow band laser in which at least a grating is arranged as a narrow band oscillation, and reacts with a laser beam of an inert gas such as nitrogen or helium, or air,
Narrow band oscillation characterized by eliminating the fluctuation of the laser oscillation wavelength and the beam profile by passing the gas that does not absorb through the filter such as HEPA to make it a clean gas and not blowing the clean gas on the groove surface of the grating. Excimer laser device purging method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35281291A JP2696285B2 (en) | 1991-12-16 | 1991-12-16 | Narrow band oscillation excimer laser device and purging method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35281291A JP2696285B2 (en) | 1991-12-16 | 1991-12-16 | Narrow band oscillation excimer laser device and purging method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05167172A true JPH05167172A (en) | 1993-07-02 |
| JP2696285B2 JP2696285B2 (en) | 1998-01-14 |
Family
ID=18426609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP35281291A Expired - Lifetime JP2696285B2 (en) | 1991-12-16 | 1991-12-16 | Narrow band oscillation excimer laser device and purging method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2696285B2 (en) |
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| JP2000347233A (en) * | 1999-06-08 | 2000-12-15 | Sony Corp | Uv ray optical device |
| WO2001041268A1 (en) | 1999-11-30 | 2001-06-07 | Cymer, Inc. | High power gas discharge laser with helium purged line narrowing unit |
| EP1218985A1 (en) * | 1999-09-03 | 2002-07-03 | Cymer, Inc. | High power gas discharge laser with line narrowing unit |
| US6496528B2 (en) | 1999-09-03 | 2002-12-17 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
| US6504860B2 (en) | 2001-01-29 | 2003-01-07 | Cymer, Inc. | Purge monitoring system for gas discharge laser |
| US6539042B2 (en) | 1999-11-30 | 2003-03-25 | Cymer, Inc. | Ultra pure component purge system for gas discharge laser |
| US6738410B2 (en) | 1999-12-22 | 2004-05-18 | Cymer, Inc. | Line narrowed laser with bidirection beam expansion |
| US6785319B1 (en) | 1999-01-06 | 2004-08-31 | Komatsu Ltd. | Ultraviolet laser device |
| US6795474B2 (en) | 2000-11-17 | 2004-09-21 | Cymer, Inc. | Gas discharge laser with improved beam path |
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| KR100505087B1 (en) * | 2000-01-19 | 2005-07-29 | 우시오덴키 가부시키가이샤 | Narrow ArF eximer laser apparatus |
| US7321607B2 (en) | 2005-11-01 | 2008-01-22 | Cymer, Inc. | External optics and chamber support system |
| JP2008103604A (en) * | 2006-10-20 | 2008-05-01 | Komatsu Ltd | Laser device |
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|---|---|---|---|---|
| US6785319B1 (en) | 1999-01-06 | 2004-08-31 | Komatsu Ltd. | Ultraviolet laser device |
| JP2000347233A (en) * | 1999-06-08 | 2000-12-15 | Sony Corp | Uv ray optical device |
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| EP1218985A4 (en) * | 1999-09-03 | 2006-03-22 | Cymer Inc | High power gas discharge laser with line narrowing unit |
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| US6738410B2 (en) | 1999-12-22 | 2004-05-18 | Cymer, Inc. | Line narrowed laser with bidirection beam expansion |
| KR100505087B1 (en) * | 2000-01-19 | 2005-07-29 | 우시오덴키 가부시키가이샤 | Narrow ArF eximer laser apparatus |
| US6839372B2 (en) | 2000-11-17 | 2005-01-04 | Cymer, Inc. | Gas discharge ultraviolet laser with enclosed beam path with added oxidizer |
| US6795474B2 (en) | 2000-11-17 | 2004-09-21 | Cymer, Inc. | Gas discharge laser with improved beam path |
| US6504860B2 (en) | 2001-01-29 | 2003-01-07 | Cymer, Inc. | Purge monitoring system for gas discharge laser |
| EP1407521A1 (en) * | 2001-06-29 | 2004-04-14 | Cymer, Inc. | Line narrowing unit with flexural grating mount |
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