JPH05154441A - Smoothing method for coated film - Google Patents
Smoothing method for coated filmInfo
- Publication number
- JPH05154441A JPH05154441A JP32453591A JP32453591A JPH05154441A JP H05154441 A JPH05154441 A JP H05154441A JP 32453591 A JP32453591 A JP 32453591A JP 32453591 A JP32453591 A JP 32453591A JP H05154441 A JPH05154441 A JP H05154441A
- Authority
- JP
- Japan
- Prior art keywords
- coating film
- coating
- substrate
- smooth
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、未硬化の塗膜を平滑化
する方法及び平滑化した硬化塗膜を得る方法に関する。FIELD OF THE INVENTION The present invention relates to a method for smoothing an uncured coating film and a method for obtaining a smoothed cured coating film.
【0002】[0002]
【従来の技術】未硬化の塗膜が平滑化に欠ける場合、そ
のまま硬化させると外観不良となる。例えば、光ディス
クにおけるハードコート剤、保護コート剤の塗布や、I
C製造におけるフォトレジスト剤の塗布に際して、これ
らの硬化塗膜が平滑性に欠ける場合、塗膜の波打ちによ
る光散乱を来たし、前者では記録再生のエラーとなり、
後者では正常に回路が描かれなくなるため、製造された
ICは誤動作を発生することになる。2. Description of the Related Art When an uncured coating film lacks smoothness, if it is cured as it is, the appearance becomes poor. For example, applying a hard coating agent or a protective coating agent on an optical disc,
When the cured coating film lacks smoothness during the application of the photoresist agent in the production of C, light scattering occurs due to waviness of the coating film, and the former causes a recording / reproduction error.
In the latter case, the circuit is not normally drawn, and the manufactured IC will malfunction.
【0003】従来、塗膜を平滑化させるには、溶剤を添
加することによって塗料の粘度調整を行なうか、例え
ば、シリコン化合物のような所謂レベリング剤を塗料に
添加していた。Conventionally, in order to smooth the coating film, the viscosity of the coating material is adjusted by adding a solvent, or a so-called leveling agent such as a silicon compound is added to the coating material.
【0004】しかしながら、前者の場合では、所謂セッ
ティング時間を充分に取る必要があり、また、溶剤蒸発
のためのエネルギーが必要であるという欠点を有してい
る。また、後者の場合では、レベリング剤の添加量の調
整が難しいという欠点がある。即ち、添加量が多すぎる
場合、本来の目的に反して、塗膜のはじきを誘発し、少
ない場合、レベリング作用を充分に発揮し得ない。However, in the former case, there is a drawback that it is necessary to take a so-called setting time sufficiently and energy for solvent evaporation is required. Further, in the latter case, there is a drawback that it is difficult to adjust the added amount of the leveling agent. That is, when the addition amount is too large, the repellency of the coating film is induced against the original purpose, and when the addition amount is too small, the leveling action cannot be sufficiently exhibited.
【0005】[0005]
【発明が解決しようとする課題】本発明が解決しようと
する課題は、塗料の粘度調整、塗料にレベリング剤を添
加することを必ずしも必要とせず、機械的手段によっ
て、未硬化の塗膜の平滑化を達成し、容易に平滑化した
硬化塗膜を得る方法を提供し、以て、塗膜が平滑性に欠
ける場合に発生する製品としての欠陥を防ぐことにあ
る。The problem to be solved by the present invention is that it is not always necessary to adjust the viscosity of the paint and to add a leveling agent to the paint, and to smooth the uncured coating film by mechanical means. To provide a cured coating film which is easily smoothed, thereby preventing defects as a product that occurs when the coating film lacks smoothness.
【0006】[0006]
【課題を解決するための手段】塗料を塗布した場合、そ
の塗膜面が凹凸を生じることは良く知られている。It is well known that when a paint is applied, the coating film surface has irregularities.
【0007】この塗膜の断面を図1のように表わすと、
次式に従って塗膜は平滑化の方向に向かっていく。即
ち、塗膜面の山と谷の高さの差(Δh)が1/2になる
時間をt1/2とすると、The cross section of this coating film is shown in FIG.
The coating film is smoothed according to the following equation. That is, when the time at which the height difference (Δh) between the peak and the valley on the coating surface becomes 1/2 is t 1/2 ,
【0008】[0008]
【数1】t1/2=kηλ4/γh0 3 ## EQU1 ## t 1/2 = kηλ 4 / γh 0 3
【0009】である。ここで、k=0.001337、 η=塗
料粘度、γ=塗料の表面張力、 h0=塗膜の平均的膜
厚、λ=うねりの波長である。本発明者らは上記の式に
おいて、うねりの波長が小さければt1/2も小さくなる
ことに着目し、上記課題を解決するに至った。[0009] Here, k = 0.001337, η = paint viscosity, γ = paint surface tension, h 0 = average film thickness of coating film, and λ = wavelength of waviness. In the above equation, the inventors have paid attention to the fact that the smaller the wavelength of the swell is, the smaller t 1/2 is, and have solved the above problem.
【0010】即ち、本発明は上記課題を解決するため
に、未硬化の塗膜に微振動を与える特徴とする塗膜の平
滑化を促進する方法を提供する。That is, in order to solve the above-mentioned problems, the present invention provides a method for promoting smoothing of a coating film, which is characterized by giving a slight vibration to the uncured coating film.
【0011】本発明の方法では、塗料を供せられた基板
を直接又は間接に微振動させるが、効率的な方法とし
て、超音波を用いる。In the method of the present invention, the substrate provided with the coating is directly or indirectly vibrated slightly, but ultrasonic waves are used as an efficient method.
【0012】直接法の場合、例えば、図2のように平板
状の超音波発振子を用い、その上に基板を設置する。塗
料を基板状にアプリケーター等により供した後、超音波
を発振し、基板を通して塗料を振動せしめ、塗料の平滑
化図る。その後、発振を停止して塗膜を加熱、紫外線照
射又は電子線照射等のその塗料にあった硬化手段を取れ
ば良い。In the case of the direct method, for example, as shown in FIG. 2, a plate-shaped ultrasonic oscillator is used and a substrate is placed thereon. After applying the coating material to the substrate with an applicator, ultrasonic waves are oscillated to vibrate the coating material through the substrate to smooth the coating material. After that, the oscillation may be stopped and the coating film may be heated, ultraviolet ray irradiation, electron beam irradiation or the like may be taken as a curing means suitable for the coating material.
【0013】間接法の場合、例えば図3のように発振子
につながるステージを設け、その上に基板を設置する。
塗料を基板状にアプリケーター等により供した後、超音
波を発振し、ステージから基板を通して塗料を振動せし
め、塗料の平滑化を図る。その後、発振を停止して塗膜
を加熱、紫外線照射又は電子線照射等のその塗料にあっ
た硬化手段を取れば良い。In the case of the indirect method, a stage connected to an oscillator is provided as shown in FIG. 3, and a substrate is placed on the stage.
After applying the coating material to the substrate with an applicator, etc., ultrasonic waves are oscillated and the coating material is vibrated through the substrate from the stage to smooth the coating material. After that, the oscillation may be stopped and the coating film may be heated, ultraviolet ray irradiation, electron beam irradiation or the like may be taken as a curing means suitable for the coating material.
【0014】なお、超音波発振子、ステージの形状は各
図に限定されるものではなく、本発明に述べる手法によ
っていれば良い。The shapes of the ultrasonic oscillator and the stage are not limited to those shown in the figures, and the method described in the present invention may be used.
【0015】[0015]
【作用】以上のようにして得られた塗膜は、微振動によ
って初期のうねりの波長が小さくなるため、微振動前、
微振動後のうねりの波長を各々λ0、λとすれば、平滑
化に要する時間が1/(λ0/λ)4以下に短縮される。In the coating film obtained as described above, the wavelength of the initial waviness becomes small due to the microvibration, so before the microvibration,
If the undulation wavelengths after slight vibration are λ 0 and λ, respectively, the time required for smoothing can be shortened to 1 / (λ 0 / λ) 4 or less.
【0016】[0016]
【実施例】以下に実施例を示す。EXAMPLES Examples will be shown below.
【0017】(実施例1)(株)井内盛栄堂製の超音波
洗浄器「VS−100」に使用されている平型超音波発
振子を本体から分離し、10cm×10cmのガラス基板を
当該発振子上に静置した。次に、アプリケーターにて、
大日本インキ化学工業(株)製の紫外線硬化樹脂「EX
−704」を塗膜厚が5μmとなるように当該ガラス基
板上に塗布した後、当該超音波発振子を出力100Wで
10秒間発振し、発振終了後に紫外線を照射して塗膜を
硬化させた。(Example 1) A flat type ultrasonic oscillator used in an ultrasonic cleaner "VS-100" manufactured by Inei Morieido Co., Ltd. was separated from the main body, and a glass substrate of 10 cm x 10 cm was used. It was placed on the oscillator. Next, with an applicator,
UV curing resin "EX" manufactured by Dainippon Ink and Chemicals, Inc.
-704 "was applied on the glass substrate so that the coating thickness was 5 µm, the ultrasonic oscillator was oscillated at an output of 100 W for 10 seconds, and after the oscillation was completed, the coating was cured by irradiating ultraviolet rays. .
【0018】得られた硬化塗膜を観察したところ、平滑
性に優れた塗膜が得られていた。When the obtained cured coating film was observed, a coating film having excellent smoothness was obtained.
【0019】(実施例2)(有)大岳製作所製の超音波
ホモジナイザー「5203」のホーン先端にアルミニウ
ムにて制作した取り付けた円形ステージ上に10cm×1
0cmのガラス基板を静置した。次に、アプリケーターに
て、大日本インキ化学工業(株)製の紫外線硬化樹脂
「EX−704」を塗膜厚が5μmとなるように当該ガ
ラス基板上に塗布した後、当該超音波発振子を出力10
0Wで10秒間発振し、発振終了後に紫外線を照射して
塗膜を硬化させた。(Embodiment 2) 10 cm × 1 on a circular stage attached to the horn tip of an ultrasonic homogenizer “5203” manufactured by Odake Co., Ltd. made of aluminum.
A 0 cm glass substrate was left standing. Next, an applicator was used to apply an ultraviolet curable resin “EX-704” manufactured by Dainippon Ink and Chemicals, Inc. on the glass substrate so that the coating film thickness was 5 μm, and then the ultrasonic oscillator was applied. Output 10
The film was oscillated at 0 W for 10 seconds, and after the oscillation was completed, ultraviolet rays were irradiated to cure the coating film.
【0020】得られた硬化塗膜を観察したところ、平滑
性に優れた塗膜が得られていた。Observation of the obtained cured coating film revealed that a coating film having excellent smoothness was obtained.
【0021】(比較例1)10cm×10cmのガラス基板
に、アプリケーターにて、大日本インキ化学工業(株)
製の紫外線硬化樹脂「EX−704」を塗膜厚が5μm
となるように塗布した後、10秒間静置してから紫外線
を照射して塗膜を硬化させた。(Comparative Example 1) A 10 cm × 10 cm glass substrate was applied with an applicator to Dainippon Ink and Chemicals, Inc.
UV-curable resin "EX-704" manufactured by Japan
After coating, the coating was left to stand for 10 seconds and then irradiated with ultraviolet rays to cure the coating.
【0022】得られた硬化塗膜を観察したところ、うね
りのある塗膜が得られていた。When the obtained cured coating film was observed, a wavy coating film was obtained.
【0023】[0023]
【発明の効果】本発明の方法によれば、塗料の粘度調
整、塗料にレベリング剤を添加することを必ずしも必要
とせず、短時間で未硬化の塗膜の平滑化を達成し、容易
に平滑化した硬化塗膜を得ることができる。According to the method of the present invention, it is not always necessary to adjust the viscosity of the paint and to add a leveling agent to the paint, and it is possible to achieve smoothing of the uncured coating film in a short time and to easily smooth the paint. A cured coating film can be obtained.
【図1】塗布直後の塗膜の断面の概念図である。FIG. 1 is a conceptual diagram of a cross section of a coating film immediately after coating.
【図2】被塗基板に直接的に超音波を与える方法の概略
図である。FIG. 2 is a schematic view of a method of directly applying ultrasonic waves to a substrate to be coated.
【図3】被塗基板に間接的に超音波を与える方法の概略
図である。FIG. 3 is a schematic view of a method of indirectly applying ultrasonic waves to a substrate to be coated.
1 基板 2 塗料面 3 塗料の平均的膜厚 4 塗料面のうねりの波長 5 超音波発振子 6 ステージ 7 超音波発振ホーン 1 Substrate 2 Paint Surface 3 Average Thickness of Paint 4 Wavelength of Ripple on Paint Surface 5 Ultrasonic Oscillator 6 Stage 7 Ultrasonic Oscillation Horn
Claims (2)
る塗膜の平滑化を促進する方法。1. A method for promoting smoothing of a coating film, which is characterized by imparting a slight vibration to the uncured coating film.
いることを特徴とする請求項1記載の方法。2. The method according to claim 1, wherein an ultrasonic transmitter is used as a source of the slight vibration.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32453591A JPH05154441A (en) | 1991-12-09 | 1991-12-09 | Smoothing method for coated film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32453591A JPH05154441A (en) | 1991-12-09 | 1991-12-09 | Smoothing method for coated film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH05154441A true JPH05154441A (en) | 1993-06-22 |
Family
ID=18166888
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP32453591A Pending JPH05154441A (en) | 1991-12-09 | 1991-12-09 | Smoothing method for coated film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH05154441A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0654831A2 (en) * | 1993-11-18 | 1995-05-24 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing solar cell |
JP2002233807A (en) * | 2001-02-06 | 2002-08-20 | Tokyo Electron Ltd | Coating method and coating apparatus |
WO2006098478A1 (en) * | 2005-03-18 | 2006-09-21 | Fujifilm Corporation | Method and apparatus for curing coated film |
JP2009106821A (en) * | 2007-10-29 | 2009-05-21 | Sumitomo Bakelite Co Ltd | Formation method of coating film |
-
1991
- 1991-12-09 JP JP32453591A patent/JPH05154441A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0654831A2 (en) * | 1993-11-18 | 1995-05-24 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing solar cell |
US5538903A (en) * | 1993-11-18 | 1996-07-23 | Matsushita Electric Industrial Co., Ltd. | Method of manufacturing solar cell |
EP0654831A3 (en) * | 1993-11-18 | 1998-01-14 | Matsushita Battery Industrial Co Ltd | Method of manufacturing solar cell |
JP2002233807A (en) * | 2001-02-06 | 2002-08-20 | Tokyo Electron Ltd | Coating method and coating apparatus |
JP4508436B2 (en) * | 2001-02-06 | 2010-07-21 | 東京エレクトロン株式会社 | Coating method and coating apparatus |
WO2006098478A1 (en) * | 2005-03-18 | 2006-09-21 | Fujifilm Corporation | Method and apparatus for curing coated film |
US8007874B2 (en) | 2005-03-18 | 2011-08-30 | Fujifilm Corporation | Method and apparatus for curing coated film |
JP2009106821A (en) * | 2007-10-29 | 2009-05-21 | Sumitomo Bakelite Co Ltd | Formation method of coating film |
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