JPH05145996A - Electrostatic acoustic transducer - Google Patents

Electrostatic acoustic transducer

Info

Publication number
JPH05145996A
JPH05145996A JP30739491A JP30739491A JPH05145996A JP H05145996 A JPH05145996 A JP H05145996A JP 30739491 A JP30739491 A JP 30739491A JP 30739491 A JP30739491 A JP 30739491A JP H05145996 A JPH05145996 A JP H05145996A
Authority
JP
Japan
Prior art keywords
diaphragm
electret
fixed electrode
thin film
oxide silicon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP30739491A
Other languages
Japanese (ja)
Inventor
Isanaga Yasuno
功修 安野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP30739491A priority Critical patent/JPH05145996A/en
Publication of JPH05145996A publication Critical patent/JPH05145996A/en
Pending legal-status Critical Current

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  • Electrostatic, Electromagnetic, Magneto- Strictive, And Variable-Resistance Transducers (AREA)

Abstract

PURPOSE:To enable use under a high-temperature environment and to reduce a stray loss in the case of miniaturizing the device or improving an S/N by forming an oxide silicon thin film on a metal foil and using a diaphragm made into an electret. CONSTITUTION:The oxide silicon film is formed with the thickness from 1mum to 5mum on the surface of a fixed electrode 5 and made into the electret and a surface potential is kept at a prescribed potential. A fine gap 3 is changed by the oscillation of a diaphragm 1, and an electric signal is obtained corresponding to the change of electrostatic capacity between the diaphragm 1 and the fixed electrode 5. At such a time, since the oxide silicon has high heat resistance, the electret potential is not degraded even under the high-temperature environment but can maintain high sensitivity. Further, since the oxide silicon thin film can be formed extremely thin, the ratio of the electrostatic capacity and the effective capacity is increased, the device can be miniaturized and the S/N can be improved.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、音響を電気信号に、あ
るいは電気信号を音響に変換する変換器に関し、特に静
電型(コンデンサー型)音響変換器の振動板または固定
電極に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transducer for converting an acoustic signal into an electrical signal or an electrical signal into an acoustic signal, and more particularly to a diaphragm or a fixed electrode of an electrostatic (condenser type) acoustic transducer.

【0002】[0002]

【従来の技術】従来、この種の静電型音響変換器は、例
えば図5の構造を有する。すなわち、振動板1の背面側
には、一定の細隙3を介して固定電極5が対向して設け
られている。この振動板1と固定電極5との間にには前
もってバイアス電圧が与えられる。そして振動板1が音
響により振動すると、両者の間に形成される静電容量が
変化し、この変化に比例した起電圧を電気信号として固
定電極が取り出し、マイクロホンの働きをするものであ
る。またはスピーカの場合には、逆に、固定電極5に与
えられる電気信号により両者の間の起電圧が変化し、振
動板が振動し、根拠を発生する。
2. Description of the Related Art Conventionally, this type of electrostatic acoustic transducer has, for example, the structure shown in FIG. That is, on the back side of the diaphragm 1, the fixed electrodes 5 are provided so as to face each other with a certain slit 3 interposed therebetween. A bias voltage is applied in advance between the diaphragm 1 and the fixed electrode 5. When the diaphragm 1 vibrates acoustically, the electrostatic capacitance formed between the two changes, and the fixed electrode takes out an electromotive voltage proportional to this change as an electric signal to act as a microphone. Alternatively, in the case of a speaker, conversely, the electromotive voltage between the two is changed by the electric signal applied to the fixed electrode 5, the diaphragm vibrates, and the basis is generated.

【0003】振動板1は一般に軽くてヤング率の高いも
のがよく、例えばFEPフィルム7(4フッカエチレン
と6フッカプロピレンの共重合体)を用い、コロナ放
電、電子ビームなどで電荷を蓄えさせ半永久的に保持さ
せる。これにより常に表面に電位を持つので、外部から
バイアス電圧を与えることは不要となり、小形、計量化
が計られる。
Generally, the diaphragm 1 is preferably light and has a high Young's modulus. For example, a FEP film 7 (copolymer of 4 Huccaethylene and 6 Huccapropylene) is used and semipermanently stored by corona discharge, electron beam or the like. To be retained. As a result, since the surface always has a potential, it is not necessary to apply a bias voltage from the outside, and the size and the size can be reduced.

【0004】あるいは、図6及び図7に示すように、振
動板1にはポリエステルフィルムや金属箔(チタニウム
合金箔、ニッケル合金箔等)を用い、固定電極5側に上
記FEPフィルム7を熱溶着し、エレクトレット化す
る。
Alternatively, as shown in FIGS. 6 and 7, a polyester film or a metal foil (titanium alloy foil, nickel alloy foil, etc.) is used for the diaphragm 1, and the FEP film 7 is heat-welded to the fixed electrode 5 side. Then, it becomes an electret.

【0005】このようにエレクトレット化することで、
バイアス電圧を外部から与える必要なしに音響を電気に
変換し、あるいは電気を音響に変換できる。
By making the electret in this way,
Sound can be converted to electricity or electricity can be converted to sound without the need for externally applying a bias voltage.

【0006】[0006]

【発明の解決しようとする課題】しかしながら、上記従
来の静電型音響変換器では、(1)FEPに蓄えられる
電荷のエレクトレット電位が高温度環境下(約90℃以
上)で劣化するため、高温度環境下で使用される機器へ
の利用はできないものである。
However, in the above-mentioned conventional electrostatic acoustic transducer, (1) the electret potential of the electric charge stored in the FEP deteriorates in a high temperature environment (about 90 ° C. or higher), so that It cannot be used for equipment used in a temperature environment.

【0007】また(2)FEPフィルムの厚さはその性
質から10μm以下にできないため、変換器の小形化、
高S/N化を計る際に、外部からバイアス電圧を与える
外部バイアス方式に比較してストレーロス(浮遊損)の
割合が増し、振動板1あるいは固定電極5をエレクトレ
ット化するエレクトレット応用静電型音響変換器の問題
点となっていた。
(2) Since the thickness of the FEP film cannot be 10 μm or less due to its nature, downsizing of the converter,
When measuring a high S / N ratio, the ratio of stray loss (floating loss) increases compared to the external bias method of applying a bias voltage from the outside, and the electret-applied electrostatic sound that makes the diaphragm 1 or the fixed electrode 5 an electret. It was a problem of the converter.

【0008】本発明はこのような従来の問題を解決する
ものであり、90℃以上の高温度環境下でも使用を可能
にするとともに、小形化、高S/N化に際しストレーロ
スの割合を少なくできる優れた静電型音響変換器を提供
することを目的とする。
The present invention solves such a conventional problem, enables use even in a high temperature environment of 90 ° C. or higher, and can reduce the proportion of stray loss in miniaturization and high S / N ratio. An object is to provide an excellent electrostatic acoustic transducer.

【0009】[0009]

【課題を解決するための手段】本発は上記目的を達成す
るために、本発明に係る静電型音響変換器において、請
求項1記載の発明は、金属箔に酸化シリコン(Si
2)薄膜を1μm以上5μm以下形成することにより構
成しエレクトレット化した振動板と、この振動板に対向
し一定の細隙を介して設けた固定電極とを有するもので
ある。
In order to achieve the above object, the present invention provides an electrostatic acoustic transducer according to the present invention, wherein the invention according to claim 1 is characterized in that silicon oxide (Si
An O 2 ) thin film having a thickness of 1 μm or more and 5 μm or less is formed and has an electretized vibration plate, and a fixed electrode facing the vibration plate and provided with a certain gap therebetween.

【0010】また請求項2記載の発明は、振動板と、こ
の振動板に対向し一定の細隙を介して設け表面上に酸化
シリコン(SiO2)薄膜を1μm以上5μm以下形成す
ることにより構成しエレクトリット化した固定電極振動
板とを有するものである。
The invention according to claim 2 is constituted by a diaphragm and a silicon oxide (SiO 2 ) thin film of 1 μm or more and 5 μm or less formed on the surface of the diaphragm, facing the diaphragm with a certain gap. And an electret fixed electrode diaphragm.

【0011】[0011]

【作用】従って、本発明によれば、(1)従来のFEP
フィルムの代わりに酸化シリコン薄膜を用いることで、
酸化シリコンが高温度化(90℃以上)においても耐熱
性を有することにより表面電位すなわちエレクトレット
電位が劣化することがなく、外部からバイアス電圧を与
えなくても前記エレクトレット電位によるバイアス電圧
を一定に保ち、高温度環境下での使用を可能にできる。
また、(2)酸化シリコン薄膜は種々の蒸着方法により
5μm以下にすることができ、小形化、高S/N化に際
してもストレーロスを抑えることができる。
Therefore, according to the present invention, (1) the conventional FEP
By using a silicon oxide thin film instead of a film,
Since the surface potential of the silicon oxide, that is, the electret potential, does not deteriorate due to the heat resistance of silicon oxide even at a high temperature (90 ° C. or higher), the bias voltage due to the electret potential can be kept constant without applying a bias voltage from the outside. It can be used in high temperature environment.
Further, (2) the silicon oxide thin film can be made to have a thickness of 5 μm or less by various vapor deposition methods, and the stray loss can be suppressed even when the size is reduced and the S / N ratio is increased.

【0012】[0012]

【実施例】次に、本発明の実施例を図面に基づいて説明
する。
Embodiments of the present invention will now be described with reference to the drawings.

【0013】図1は本発明の第1の実施例の構成を示す
もので、従来例の図6に対応するものである。図1にお
いて、ケース9の表側には、音響を伝えるための孔11
が形成されている。このケース9の内部には、この孔1
1の側に振動板リング13を設け、振動板1を一定のテ
ンションで支持固定し、さらにスペーサ15により一定
の細隙3を介して固定電極5を対向させる。固定電極5
は絶縁体16によりケース9に対し保持させ、全体を一
体化している。
FIG. 1 shows the configuration of the first embodiment of the present invention, and corresponds to FIG. 6 of the conventional example. In FIG. 1, a hole 11 for transmitting sound is provided on the front side of the case 9.
Are formed. Inside the case 9, the hole 1
The vibrating plate ring 13 is provided on the side of 1, and the vibrating plate 1 is supported and fixed by a constant tension, and the fixed electrode 5 is opposed by the spacer 15 via the constant slit 3. Fixed electrode 5
Is held by the insulator 16 with respect to the case 9, and is integrated as a whole.

【0014】固定電極5の表面上には、酸化シリコン
(SiO2)薄膜17がPVD法C又はCVD法で1μm
以上5μm以下の厚さに形成される(図2)。この薄膜
17に対しコロナ放電、電子ビーム照射が行われ電荷を
蓄えさせ、半永久的に保存させることで、エレクトレッ
ト化し、表面電位を150Vから250Vとする。振動
板1は従来と同様にポリエステルフィルム、あるいは金
属箔(例えばチタニウム合金箔やニッケル合金箔)とす
ることができる。
On the surface of the fixed electrode 5, a silicon oxide (SiO 2 ) thin film 17 having a thickness of 1 μm is formed by PVD method C or CVD method.
The thickness is 5 μm or less (FIG. 2). The thin film 17 is subjected to corona discharge and electron beam irradiation to accumulate electric charges and semi-permanently store the same to form an electret, and the surface potential is changed from 150V to 250V. The diaphragm 1 can be a polyester film or a metal foil (for example, titanium alloy foil or nickel alloy foil) as in the conventional case.

【0015】次に上記第1の実施例の動作について説明
する。この実施例の音響変換器をマイクロホンとして使
用した場合には、振動板1が振動すると、細隙3の厚さ
が変化し、振動板1と固定電極5との間に形成される静
電容量が変化し、この変化に比例した起電圧を電気信号
として取り出すことができる。この静電容量を生じさせ
る元となるバイアス電圧は、前記固定電極5がエレクト
レット化することによって得られる表面電位(エレクト
レット電位)により与えられる。このため外部からバイ
アス電圧が与えられなくても、高いバイアス電圧を維持
でき高感度の電気信号を得ることができる。また、酸化
シリコンは高い耐熱性を有するので、酸化シリコン薄膜
17のエレクトレット電位は従来よりも高い温度の環境
下(約90℃以上で150℃以下)においても劣化せ
ず、高感度を維持できる。さらに、酸化シリコン薄膜1
7はPVD法あるいはCVD法により非常に薄く(5μ
m以下)とすることができ、従って振動板1と固定電極
5との間に形成される静電容量の実効容量の割合が高
く、従ってストレーキャパシテイー(浮遊容量)の割合
を低くできる。このため小形化、高感度化、高S/N化
を実現する効果を有する。
Next, the operation of the first embodiment will be described. When the acoustic transducer of this embodiment is used as a microphone, when the diaphragm 1 vibrates, the thickness of the slit 3 changes, and the electrostatic capacitance formed between the diaphragm 1 and the fixed electrode 5. Changes, and an electromotive voltage proportional to this change can be taken out as an electric signal. The bias voltage that causes this electrostatic capacitance is given by the surface potential (electret potential) obtained by the fixed electrode 5 being electretized. Therefore, even if a bias voltage is not applied from the outside, a high bias voltage can be maintained and a highly sensitive electric signal can be obtained. In addition, since silicon oxide has high heat resistance, the electret potential of the silicon oxide thin film 17 does not deteriorate even in an environment of a temperature higher than that of the related art (about 90 ° C. or more and 150 ° C. or less), and high sensitivity can be maintained. Furthermore, silicon oxide thin film 1
7 is very thin by PVD method or CVD method (5μ
Therefore, the ratio of the effective capacitance of the electrostatic capacitance formed between the diaphragm 1 and the fixed electrode 5 is high, and thus the ratio of the stray capacity (floating capacitance) can be reduced. Therefore, it has an effect of realizing miniaturization, high sensitivity, and high S / N.

【0016】図3は本発明の第2の実施例の構成を示す
ものであり、従来例の図5に対応する。図2において、
振動板1は金属箔19に酸化シリコン薄膜17をPVD
法あるいはCVD法により1μm以上5μm以下形成す
る。この薄膜17に対し、上記第1の実施例と同様にコ
ロナ放電または電子ビームなどでエレクトレット化を行
い、表面電位を150Vから250Vとする。このよう
に上記実施例が固定電極5をエレクトレット化するもの
であるのに対し、本実施例は振動板1をエレクトレット
化する。この場合でも上記実施例と略同等の効果を有す
る。
FIG. 3 shows the configuration of the second embodiment of the present invention and corresponds to FIG. 5 of the conventional example. In FIG.
The vibrating plate 1 is made of a metal foil 19 and a silicon oxide thin film 17 PVD
By 1 μm or more and 5 μm or less by the CVD method or the CVD method. The thin film 17 is electretized by corona discharge or electron beam as in the first embodiment, and the surface potential is changed from 150V to 250V. As described above, the fixed electrode 5 is electretized in the above-described embodiment, whereas the diaphragm 1 is electretized in the present embodiment. Even in this case, the same effect as that of the above embodiment is obtained.

【0017】なお、以上の実施例においては静電型音響
器は音響を電気信号に変えるマイクロホンとして説明し
たが、他の実施例においては電気信号を音響に変えるス
ピーカとして実施することも可能であり、この場合にも
高温度環境下での使用可、高小形化、高S/N、高感度
化等の効果を有する。
In the above embodiments, the electrostatic type acoustic device has been described as a microphone for converting sound into an electric signal, but in other embodiments, it can be implemented as a speaker for converting an electric signal into sound. Also in this case, it has the effects of being usable in a high temperature environment, having a small size, high S / N, and high sensitivity.

【0018】[0018]

【発明の効果】本発明は上記実施例より明らかなよう
に、振動板あるいは固定電極に酸化シリコン薄膜を形成
しエレクトレット化することにより、高温度環境下にお
いてもエレクトレット電位を劣化させず高温度環境下に
おける静電型音響変換器の使用を可能にする。さらに、
酸化シリコン薄膜は非常に薄く(5μm以下)形成する
ことができるので小形化、高感度化、高S/N化を実現
できる。
As is apparent from the above-described embodiments, the present invention forms a silicon oxide thin film on a vibration plate or a fixed electrode to form an electret, so that the electret potential is not deteriorated even in a high temperature environment and the high temperature environment is maintained. Allows the use of electrostatic acoustic transducers below. further,
Since the silicon oxide thin film can be formed extremely thin (5 μm or less), miniaturization, high sensitivity, and high S / N can be realized.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例における静電型音響変換器
を示す縦断面図
FIG. 1 is a longitudinal sectional view showing an electrostatic acoustic transducer according to a first embodiment of the invention.

【図2】図1の要部拡大図FIG. 2 is an enlarged view of a main part of FIG.

【図3】本発明の第2の実施例を示す縦断面図FIG. 3 is a vertical sectional view showing a second embodiment of the present invention.

【図4】図3の要部拡大図FIG. 4 is an enlarged view of a main part of FIG.

【図5】第1の従来例を示す縦断面図FIG. 5 is a vertical sectional view showing a first conventional example.

【図6】第2の従来例を示す縦断面図FIG. 6 is a vertical cross-sectional view showing a second conventional example.

【図7】図6の要部拡大図7 is an enlarged view of a main part of FIG.

【符号の説明】[Explanation of symbols]

1 振動板 3 細隙 5 固定電極 9 ケース 11 孔 13 振動板リング 15 スペーサ 16 絶縁体 17 酸化シリコン薄膜 1 Vibration Plate 3 Slit 5 Fixed Electrode 9 Case 11 Hole 13 Vibration Plate Ring 15 Spacer 16 Insulator 17 Silicon Oxide Thin Film

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 金属箔に酸化シリコン(SiO2)薄膜
を1μm以上5μm以下形成することにより構成しエレク
トレット化した振動板と、この振動板に対向し一定の細
隙を介して設けた固定電極とを有する静電型音響変換
器。
1. A vibrating plate which is formed by forming a silicon oxide (SiO 2 ) thin film on a metal foil in a thickness of 1 μm or more and 5 μm or less and is made into an electret, and a fixed electrode which faces the vibrating plate and is provided with a certain gap. And an electrostatic acoustic transducer having.
【請求項2】 振動板と、この振動板に対向し一定の細
隙を介して設け表面上に酸化シリコン(SiO2)薄膜
を1μm以上5μm以下形成することによりエレクトレッ
ト化した振動板とを有する静電型音響変換器。
2. A vibrating plate, and a vibrating plate facing the vibrating plate and having a silicon oxide (SiO 2 ) thin film of 1 μm or more and 5 μm or less provided on the surface with a certain gap provided therebetween. Electrostatic acoustic transducer.
JP30739491A 1991-11-22 1991-11-22 Electrostatic acoustic transducer Pending JPH05145996A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30739491A JPH05145996A (en) 1991-11-22 1991-11-22 Electrostatic acoustic transducer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30739491A JPH05145996A (en) 1991-11-22 1991-11-22 Electrostatic acoustic transducer

Publications (1)

Publication Number Publication Date
JPH05145996A true JPH05145996A (en) 1993-06-11

Family

ID=17968525

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30739491A Pending JPH05145996A (en) 1991-11-22 1991-11-22 Electrostatic acoustic transducer

Country Status (1)

Country Link
JP (1) JPH05145996A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006140861A (en) * 2004-11-15 2006-06-01 Audio Technica Corp Manufacturing method of electret condenser microphone unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006140861A (en) * 2004-11-15 2006-06-01 Audio Technica Corp Manufacturing method of electret condenser microphone unit

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