JPH05125538A - Method and apparatus for automatic manufacture - Google Patents

Abstract

PURPOSE:To provide a method and an apparatus for automatic manufacture, in which the variation of the equipment condition can be decided from informations of the equipment positional movement and the equipment driving and manufacturing conditions and informations of the product manufactured result. CONSTITUTION:The positional movement of a sputtering device 201 is monitored with a device controller 101 and the manufacturing condition and manufactured result for substrate is monitored with monitor stages 402, 301 and these are transmitted into a calculator 401 and both monitor data are transmitted into a calculator 100 to decide the condition of the sputtering device 201 from these monitor data.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automation technology for manufacturing equipment, and more particularly to an automatic manufacturing method and apparatus for manufacturing equipment suitable for fine processing equipment such as thin film formation and thin film processing.

[0002]

2. Description of the Related Art Conventional automation technology for manufacturing equipment has been implemented due to the progress of mechatronics centered on robots, and in particular, it has been applied to automation of machining and assembling work of mechanical parts of manufacturing equipment. In addition to this, as a report on automation in a thin-film manufacturing facility in which a physicochemical phenomenon centering on a semiconductor is applied to thin-film formation and thin-film microfabrication instead of mechanical processing, for example, “Solid State Technology” (May 1990) p. 149. To page 154 ("SOLID STATE TECHNOLOGY"
(May 1990) P149-154), "Integrated Processing Equipment"("Int
Egged Processing Equipm
ent ”). The thin film processing / manufacturing equipment in this report handles substrates and wafers for film formation and processing by applying conventional robot technology, and performs processing such as thin film formation and etching according to a predetermined sequence. This is an automatic manufacturing device.

In the past, a sputtering method has generally been popular in this kind of thin film forming technique. In this method, an inert argon gas is plasma-discharged in a vacuum chamber, and argon ions in the plasma are generated by an electric field. The thin film is formed by accelerating and colliding with the film forming material, discharging the film forming material into the space, and depositing the discharged film forming material particles on the film formation target substrate. In this sputtering method, the operating state of the manufacturing equipment before film formation and processing is the ultimate vacuum of the vacuum chamber, and the manufacturing operation sequence of the manufacturing equipment is whether the substrate to be film-formed is heated or not, and the pretreatment called sputter cleaning is performed. The flow rate and pressure of the argon gas introduced into the vacuum chamber, the plasma discharge voltage and current, the film formation time, the substrate heating power, and the temperature of the film formation target substrate Etc. This pre-deposition film can be realized in the equipment by deciding it in advance according to the purpose of the film and inputting them into the manufacturing equipment. The pressure, current, voltage, time, etc. are set in advance, and if they fluctuate from preset values during manufacturing, they are controlled by the control mechanism of the manufacturing equipment to correct fluctuations from the preset values. In this way, in the case of thin film formation or processing, the power supply of a preset facility, a flow meter, a pressure gauge, or the like is controlled to perform film formation or processing.

[0004]

In the above-mentioned prior art, the above-mentioned control parameters are for generating and maintaining plasma discharge in the ordinary sputtering method for forming a thin film, and what is the discharge state during film formation or processing. Since there is no direct relationship, that is, in the non-equilibrium state called weak ionization plasma in the case of applying a physicochemical phenomenon such as the above-mentioned plasma discharge, the plasma state of film formation or processing is set by the preset values of the above parameters. Since it does not monitor the essence, even if the preset values of voltage, current, pressure, etc. are the same, it is not possible to perform highly reproducible film formation and processing with different discharge conditions, and the manufacturing is automatically performed. In that case, there is a problem in that even if a defect occurs, it cannot be checked and a defective product is manufactured. In addition, recently, as the thin film formation and processing centering on semiconductors have become finer and the manufacturing conditions have become more stringent, a slight change in the state of the manufacturing equipment often causes defects as a result of manufacturing. However, even if a defect due to the manufacturing equipment is not reflected in the above-mentioned parameter as a defective phenomenon by the monitor of the control parameter set in the manufacturing equipment of the above-mentioned conventional technology, the phenomenon occurring at the time of manufacture may not be sufficiently grasped. Therefore, there is a problem that it is difficult to stably manufacture a product only by the function of the above-described conventional automatic manufacturing apparatus.

An object of the present invention is to provide information indicating the operation of parts of the manufacturing equipment, information indicating the operating status of the manufacturing equipment, and manufacturing results of products manufactured by operating the manufacturing equipment in order to grasp the manufacturing status of the manufacturing equipment. It is possible to grasp the fluctuation of the state of the manufacturing equipment by using the information shown and the quality information of the product that can judge the operating state of the manufacturing equipment, and the manufacturing state of the manufacturing equipment based on the data acquired regarding the fluctuation of the state of the manufacturing equipment. It is possible to constantly monitor the quality of the manufacturing state by making decisions based on the rules established in advance during manufacturing.Furthermore, the event of the manufacturing facility is analyzed based on the data acquired regarding the fluctuation of the state of the manufacturing facility, and the quality of the manufacturing facility is determined. An object of the present invention is to provide an automatic manufacturing method and an automatic manufacturing apparatus that can assist in establishing a usage rule.

[0006]

In order to achieve the above object, the automatic manufacturing method and the automatic manufacturing apparatus of the present invention provide information relating to the operation of parts of the manufacturing equipment and the operating state of the manufacturing equipment during the operation of the manufacturing equipment. At an inspection stage that acquires information related to the manufacturing state of the product in the manufacturing equipment as time series data, and further detects the manufacturing result of the product after processing in the chamber for manufacturing operations of the product in the manufacturing equipment. The product characteristic information indicating the quality condition of the manufactured product is acquired, and the time series data is in a form in which the time axis is matched, but the information related to the above manufacturing result is not the time series data but the product quality data for each product work. Since it is acquired, the time series data is linked to correspond to the operation of the parts of the manufacturing equipment, so that the fluctuation of the manufacturing state of the product of the manufacturing equipment, which is the time series data, is changed. As a result, the quality data of one product work, which is the production result of the product of the production equipment, corresponds to the detection of the end of production of one product work from the operation information of the parts of the production equipment and the quality of the inspection stage of the one product work. By connecting the above-mentioned time-series data and product quality data from the detection of data, it is possible to grasp the operating status and manufacturing status of the manufacturing equipment and the manufacturing result of the product in that manufacturing status, that is, the quality data of the product by associating them. It was done.

Further, according to the present invention, the condition data of the manufacturing equipment and the quality data of the product are divided into sections to be judged on the basis of the previously established rules for judging the operating condition and the manufacturing condition, and specified in the judging rule of the operating condition and the manufacturing condition. The characteristic amount of the state of the divided section of the manufacturing equipment is calculated by the characteristic amount calculation formula of the operating state or the manufacturing state peculiar to the determination, and the calculated characteristic amount is determined by the determination criterion formula determined by the determination rule. As a result, the product is manufactured while constantly checking the operating condition and manufacturing condition of the manufacturing equipment.

Furthermore, the present invention acquires and stores, as time-series data, the operation of the parts of the manufacturing equipment, the status related to the operating status of the manufacturing equipment during operation, and the information related to the manufacturing status during manufacturing of the products of the manufacturing equipment. And means for acquiring and storing product characteristic information representing a quality state of a product manufactured at an inspection stage or the like for detecting the manufacturing result of the product after processing in a chamber for manufacturing the product of the manufacturing facility. And connecting the time series data and the quality data of the product from the detection of the end of production of one product work based on the operation information of the parts of the manufacturing equipment and the detection of the quality data at the inspection stage of the one product work, The period (section) in which the linked data is analyzed is divided by product work identifiers, etc., and the data is analyzed for changes in operating and manufacturing conditions and product quality parameters. By displaying the dynamics on the same time axis, it is possible to easily obtain the knowledge of the fluctuation of the quality data of the product due to the fluctuation of the parameter during the manufacturing facility operation or manufacturing. It is intended to obtain the underlying knowledge.

[0009]

The above-described automatic manufacturing method and automatic manufacturing apparatus store the operation of the part of the manufacturing equipment during the operation of the manufacturing equipment as to the item operated by the part and the time when the part operates.
Information related to the operating status of the manufacturing equipment and the manufacturing status of the product is stored with respect to the momentary fluctuations of the operating status of the manufacturing equipment during operation and the manufacturing status during the manufacturing of the product, and the operating time, and the manufacturing equipment was manufactured. Acquire product characteristic information that represents the quality state of the product by an inspection stage that detects the manufacturing result, and match the operation data of the parts of the manufacturing equipment with the operating status data and manufacturing status data of the manufacturing equipment on the same time axis. The quality data of the product is also matched with the above-mentioned same time axis as the quality data of one product work, which is the production result corresponding to the operation data of the part of the manufacturing facility, and the time axis is adjusted in this way to make the product Since quality data can also be treated as time-series data, the operating status of manufacturing equipment, the manufacturing status of products, and the manufacturing results in that manufacturing status, that is, manufacturing Since it is possible to grasp the operating status of manufacturing equipment and fluctuations in manufacturing status by linking the quality data of the manufacturing equipment, it is possible to easily grasp the events occurring in the manufacturing equipment and accurately grasp the status of the manufacturing equipment to check the manufacturing equipment status. To facilitate the construction of a judgment rule (diagnosis rule) for judgment.

Further, according to the rule for judging the state of the manufacturing equipment constructed as described above, the characteristic quantity reflecting the state of the manufacturing equipment is calculated by the characteristic quantity calculation formula for the event occurring on the same time axis, and the characteristic quantity is calculated. Whether the operating condition of the manufacturing equipment or the manufacturing condition of the product is judged by applying features such as
Alternatively, it is determined whether or not the variation of the operating state of the manufacturing equipment or the manufacturing state of the product matched on the same time axis and the quality data of the manufacturing result of the product are applicable to the relationship of the predetermined determination rule. You can Furthermore, if there is an abnormality in the manufacturing equipment as a result of the above judgment, it is instructed to change the operating conditions of the manufacturing equipment or the manufacturing conditions of the product, or the operation of the part of the manufacturing equipment to be dealt with and its method. Can also be instructed.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a hardware configuration diagram of an automatic manufacturing apparatus of a film forming apparatus showing an embodiment of the automatic manufacturing method and the automatic manufacturing apparatus according to the present invention. FIG. 1 shows a configuration example of an automatic manufacturing apparatus when applied to a thin film deposition apparatus as manufacturing equipment. In this configuration, the equipment state determination computer 100 is used.
The apparatus controller (sequencer) 101 and the monitor data processing computer 401 are connected via a network 501, and the sputtering apparatus 201, which is a film forming apparatus, has a monitor data measurement correction stage 402 and a film formation result monitor stage 301. The wafer transfer paths 302 are connected to each other. Further, the sputter device 201, the monitor data measurement correction stage 402, and the film formation result monitor stage 301 are connected to the monitor data processing computer 401, and the sputter device 201 is connected to the device controller 101. The monitor data and the device part operation data can be communicated from the computer 401 and the device controller 101 to the facility state computer 100 via the network 501, respectively. Calculator 10 for equipment status determination
A display 110 and a keyboard 120 can also be connected to 0.

With this configuration, the film formation target substrate is carried into the sputtering apparatus 201 from the monitor data measurement / correction stage 402. The monitor data measurement / correction stage 402 shows the manufacturing state in which the film formation target substrate is formed by the sputtering apparatus 201. When measuring the parameter to be monitored, the characteristic value peculiar to the substrate is measured. For example, when the temperature in the manufacturing state is measured by the sputtering apparatus 201 by infrared rays, the radiation coefficient of the substrate is measured by the monitor data measurement / correction stage 402, and the film formation target substrate is heated by the monitor data measurement / correction stage 402. The gas released from the substrate can be monitored. The monitor data measured by the monitor data measurement / correction stage 402 before the film formation process is transmitted to the monitor data processing computer 401, and the monitor data processing computer 401 stores the transmission data and manufactures it in the sputtering apparatus 201. By linking the condition with the monitored data, it is stored as the actual measurement data of the manufacturing condition. Further, the monitor data of the manufacturing result of the film formation processing performed by the sputtering apparatus 201 is measured when the film formation target substrate is conveyed to the film formation result monitor stage 301. For example, in the case of semiconductor film formation processing by the sputtering apparatus 201, product characteristic data such as sheet resistance value, reflectance, and film thickness of a film are measured by the film formation result monitor stage 301, and by this film formation result monitor stage 301. Similarly, the monitor data measured after the film forming process is also transmitted to and stored in the monitor data processing computer 401. Further, the device controller (sequencer) 101 controls the sputtering device 201, monitors the operation of the parts of the device together with this, and transmits the information to the equipment state determination computer 100, and similarly performs monitor data processing. The monitor data stored as described above is also transmitted from the application computer 401 to the equipment state determination computer 100. The equipment state determination computer 100 is the device controller 1
01 and the data transmitted from the monitor data processing computer 401 determines the state of the sputtering apparatus 201, which is a manufacturing facility.

FIG. 2 is a schematic sectional view of the inside of the sputtering apparatus 201 showing an embodiment of FIG. In FIG.
Inside the processing chamber 215 of the film formation target substrate 220 of the sputtering apparatus 201, the film formation target substrate 220 is the film formation material 21.
1, the substrate 220 to be film-formed is transferred from the transfer chamber 216 of the substrate through the gate valve 234. The film-forming material 211 facing the film-forming target substrate 220 is mounted on the sputtering apparatus 201, and the sputtering electrode 210 is electrically connected to a discharge generating power supply (sputtering power supply) 212. In the processing chamber 215, the gas pipe 2 for the discharge gas
A gas is introduced from 31 through the gas introduction valve 232, and the vacuum exhaust pump 230 that evacuates the processing chamber 215 to a vacuum is provided through the main valve 233.
It is attached to 15. Further, in the processing chamber 215 of the sputtering apparatus 201, a thermometer 241 for measuring the temperature of the film formation target substrate 220 is provided as a monitor of the manufacturing state of the film formation target substrate 220, and the temperature is measured through the view port 240. Further, a mass spectrometer 242 is provided as a monitor of the vacuum state in the processing chamber 215 indicating the operating state of the sputtering apparatus 201, and the quality of the vacuum in the processing chamber 215 is monitored via the partition valve 243.

With this structure, the sputtering apparatus 201 is shown in FIG.
In the same manner as described above, the equipment state determination computer 100, the monitor data processing computer 401, the device controller (sequencer) 101, etc. are connected, and the device controller 10
Reference numeral 1 is a film formation target substrate 220, a gate valve 234, a discharge generation power source 212, and a discharge gas introduction valve 232.
The operation of each part such as the gas pipe 231, the vacuum exhaust pump 230, and the main valve 233 is monitored, and the item of the operated part and the time are stored. Further, the monitor data processing computer 401 acquires both monitor data of a thermometer 241 which is a monitor of a manufacturing state of the film formation target substrate 220 and a mass spectrometer 242 which is a monitor of a vacuum gas atmosphere in an operating state of the apparatus, The monitor data and the time are stored. The data stored in the apparatus controller 101 and the monitor data processing computer 401 is transmitted to the equipment state determination computer 100, and the state of the sputtering apparatus 201 is determined by the data.

FIG. 3 is a flow chart of a process showing an embodiment of a judgment process (diagnosis process) of the judgment system (diagnosis system) of the equipment state judgment computer 100 shown in FIGS. In FIG. 3, first, a computer 101 for equipment state determination (diagnosis)
Is a determination (diagnosis) of measurement data of the sputtering apparatus 201 of the manufacturing equipment, that is, each history of the operation of the portion of the sputtering apparatus 201 of the manufacturing equipment and processing (film forming) conditions of the film formation target substrate 220 of the sputtering apparatus 201. The measurement data is selected for the portion for performing (step S1). In this case, the amount of measured data is, for example, 2000 to 3000, and the amount of data is large, which is unsuitable for the determination (diagnosis) processing. Therefore, in this embodiment, for example, from the history data of the operation of the part of the sputtering apparatus 201 of the manufacturing equipment, The processing (film formation) condition data is classified according to the operation item of the manufacturing equipment based on the data selection rule of the rule such as "select only data from a certain operation of the manufacturing equipment" (process S2). ). Next, the classified processing (film formation) condition data is processed according to the method of calculating the feature amount of data according to the corresponding determination (diagnosis) rule, and the measured data is converted into a feature amount that can be judged by a computer (process S3). Then, processing is performed according to the method of evaluating and evaluating the feature quantity based on the criteria of the judgment (diagnosis) rule, and the measurement data can be judged (diagnosed) by comparing the feature quantities with each other or comparing the feature quantity with the reference value. It is made possible (process S4). Next, the evaluation result of the determination of the feature amount of the measurement data is output. The output of the determination (diagnosis) result of the measurement data is the determination (diagnosis) rule in the determination (diagnosis) rule when calculating the feature amount of the measurement data. )
Since the item is known in advance, it is possible to judge whether the measurement data is normal or abnormal with respect to the judgment (diagnosis) item as a judgment (diagnosis) result by judging (comparing) the characteristic amount of the measurement data. It is also possible to display a message indicating a coping method corresponding to the determination (diagnosis) result, or output control information for changing the operation of the part of the equipment in accordance with the determination (diagnosis) result. As the determination (diagnosis) rule, a diagnostic item, a formula for extracting a feature amount for diagnosis, a range of measurement data for calculating the feature amount,
The calculation of the judgment for judging the characteristic amount and the output of the judgment result can be used as the respective items (process S5).

FIG. 4 is a display diagram showing an embodiment of an output in which the operation data of the portion of the sputtering apparatus 201 of the manufacturing equipment of FIGS. 1 and 2 and the monitor data of the operating condition and the manufacturing condition are matched on the same time axis. is there. In FIG. 4, the main valve 233, the gas introduction valve 231, the gate valve 234, and the OPEN (O of the sputtering power source 212 of each part of the sputtering apparatus 201 of the manufacturing equipment by the apparatus controller 101 are open.
N) and CLOSE (OFF) operation monitor data are shown in time series on the time axis 3001, and the monitor data of the operating state and manufacturing state of the sputtering apparatus 201 by the monitor data processing computer 401 is used as the mass spectrometer 242 and the thermometer 241. A multi-axis trend diagram 3002 is shown for each monitor item.
Although the time axis in FIG. 4 is partially omitted, after the main valve 233 of FIG. 2 becomes OPEN (marked with ◯), the vacuum exhaust of the processing chamber 215 by the vacuum exhaust pump 230 is started. The operating state of the sputtering apparatus 201 is the mass NO. Of the mass spectrometry data of the mass spectrometer 242. 1 (H) and mass NO. 2 (H ₂ ) and the mass NO. It can be seen that the amount of gas such as 18 (H ₂ O) is decreasing. Then, the discharge gas introduction valve 232 is opened and the mass spectrometer 242 is opened.
Mass NO. The argon gas of 40 increased, which indicates that the sputtering apparatus 201 has started to prepare for the sputtering operation. Next, the OP of the gate valve 234
EN and CLOSE indicate entry and exit between the processing chamber 215 and the transfer chamber 216 of the film formation target substrate 220. Next, the start and end of film formation of the film formation target substrate 220 by the sputtering of the film formation material 211 are indicated by turning on and off (•) of the sputtering power source 212, and the film formation target substrate in the manufacturing state of the sputtering apparatus 201 ( Wafer) 220 thermometer 241 temperature data is shown. In this way, by comparing the operation data of each part of the sputtering apparatus 201 of the manufacturing equipment with the operating state and manufacturing state data on the same time axis, the operation of the part of the sputtering apparatus 201 and the operating state and manufacturing state can be compared with each other. It can be separated and output by (time) and displayed.

FIG. 5 is a display diagram showing an embodiment of an output for managing the product quality data of the sputtering apparatus 201 of the manufacturing equipment shown in FIGS. In FIG. 5, the horizontal axis represents the wafer NO of the target substrate 220 for film formation, and the vertical axis represents the sputtering apparatus 20.
1 shows an example of the quality data of the product after manufacturing (film formation). Here, the results of measuring the number of foreign substances on the wafer, the sheet resistance, and the reflectance are plotted as the quality data. From FIG. The sheet resistance and the reflectance were higher than those of the other wafers Nos. 9 and 10, and this state is all within the allowable standard section established in advance, but the wafer No. It can be seen that 9 and 10 show different tendencies as compared with other wafer Nos.

FIG. 6 is a display diagram showing an embodiment of the determination (diagnosis) process of the sputtering apparatus 201 of the manufacturing equipment of FIGS. 6, the wafer NO. Before and after 9, 10 the sputter power supply 212 is turned on,
OFF, the wafer temperature variation of the thermometer 241 of the manufacturing state monitor value, and the wafer reflectance in FIG. 5 are shown on the same time axis. The wafer NO in FIG. 6 is the ON state of the sputtering power source 212 by the apparatus controller 101 in FIGS. 1 and 2.
The start and end of the sputtering on the film formation target substrate 220 can be determined from the OFF operation data, and the wafer NO in FIG. Can be turned on. Therefore, from FIG. The wafer temperatures of Nos. 9 and 10 decreased, and correspondingly, the wafer No. It can be seen that fluctuations in the reflectance increase of 9 and 10 occurred. Further, from such knowledge, it is possible to review the determination (diagnosis) rule that the quality data of the product in FIG.

In the above-mentioned embodiment, a semiconductor was used as an example of a sputtering apparatus for manufacturing equipment. However, the sputtering apparatus is not limited to a semiconductor, but may be used for a magnetic medium of a magnetic disk or a wiring film or a resistor film of a wiring board. It can also be applied to things.
Further, the plasma etching or plasma CVD (Che (Che)
It can also be applied to a mechanical vapor deposition device by changing monitor items of the operating state and manufacturing state of the device.

[0020]

According to the present invention, the information indicating the operation of the parts of the manufacturing equipment, the information monitoring the operating status of the manufacturing equipment and the manufacturing status of the product, and the quality data of the manufacturing result of the product are placed on a common time axis. Since it is possible to display and interpret the meaning of those information and data on a computer, it is possible to automatically operate the manufacturing equipment while always judging (diagnosing) the operating status of the manufacturing equipment and the quality of the product manufacturing status. In the automatic driving of the present invention, a product defect may occur, but in the automatic operation of the present invention, a defect occurs during manufacturing by always judging the operating condition and manufacturing condition of the equipment together with the quality condition and manufacturing the product. Even when you do, you can deal with the minimum number of defects. Further, as described above, since the product can be manufactured while checking the quality in the manufacturing facility, the manufacturing facility can be stably operated continuously, so that unmanned operation can be performed.

[Brief description of drawings]

FIG. 1 is a hardware configuration diagram showing an embodiment of an automatic manufacturing method and an automatic manufacturing apparatus according to the present invention.

2 is a schematic sectional view of the sputtering apparatus of FIG.

FIG. 3 is a flow chart of the processing of FIGS. 1 and 2.

[Fig. 4] Fig. 4 shows the operation and operation of the manufacturing equipment parts of Fig. 1 and Fig. 2.
Matching display of manufacturing status data

FIG. 5 is a display diagram of product quality data management of FIGS. 1 and 2.

FIG. 6 is a display diagram of the determination / diagnosis processing of FIGS. 1 and 2;

[Explanation of symbols]

100 ... Calculator for equipment state determination, 101 ... Device controller, 110 ... Display, 120 ... Keyboard, 2
01 ... Sputtering device, 210 ... Sputtering electrode, 211 ...
Film forming material, 212 ... Discharge generating power supply (sputtering power supply),
215 ... Processing chamber, 216 ... Transfer chamber, 220 ... Substrate for film formation, 230 ... Vacuum exhaust pump, 231, ... Gas pipe, 232 ... Gas introduction valve, 233 ... Main valve,
234 ... Gate valve, 240 ... Viewport, 241
... thermometer, 242 ... mass spectrometer, 243 ... partition valve, 301 ... film formation result monitor stage, 302 ... wafer transfer path, 401 ... monitor data processing computer, 402
... Monitor data measurement / correction stage, 501 ... Network, 3001 ... Time axis, 3002 ... Multi-axis trend diagram

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Sadao Sadao, 292 Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa Inside the Hitachi, Ltd. Institute of Industrial Science (72) Inventor, Shu Kobayashi 292 Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa Banchi Co., Ltd. Hitachi, Ltd. Production Technology Laboratory

Claims (17)

[Claims] 1. When operating a manufacturing facility, information relating to the operation of the part of the manufacturing facility and the operating state of the manufacturing facility is respectively acquired as time-series data, and related to the operation of the part of the manufacturing facility and the operating state of the manufacturing facility. An automatic manufacturing method characterized in that data with information fluctuations is output with the time axis of these data aligned. 2. When operating the manufacturing equipment, information relating to the operation of the parts of the manufacturing equipment and the operating state of the manufacturing equipment and information relating to the manufacturing result of the product of the manufacturing equipment are respectively acquired as time series data, and the manufacturing equipment The data of the operation of the part and the fluctuation of the information related to the operating state of the manufacturing equipment are output by matching the time axis of these data, and the information related to the manufacturing result of the product of the manufacturing equipment is output for the manufacture of the operation of the part of the manufacturing equipment. An automatic manufacturing method characterized by outputting after operation. 3. Manufacturing of a product of a manufacturing facility, information on a change in operation of a part of the manufacturing facility during operation of the manufacturing facility, information on a manufacturing state of a product of the manufacturing facility, and information on a manufacturing result of a product of the manufacturing facility. An automatic manufacturing method, which is sometimes acquired in conjunction with product manufacturing work. 4. A means for respectively acquiring, as time-series data, an operation of a part of the manufacturing equipment and information relating to an operating state of the manufacturing equipment during operation of the manufacturing equipment, and an operation of the part of the manufacturing equipment and an operating status of the manufacturing equipment. An automatic manufacturing apparatus, which is provided with a means for outputting data regarding fluctuations in information relating to the above, with the time axis of these data aligned. 5. A means for storing a history of operating time changes of parts of a manufacturing equipment and a history of time changes of processing condition parameters when a product is processed in the manufacturing equipment, and means for displaying a list of the stored data. And an means for receiving selection of the displayed data and displaying the selected data with a common time axis. 6. A means for acquiring, as time-series data, the operation of a part of the manufacturing equipment and the information related to the operating state of the manufacturing equipment when the manufacturing equipment is operating, and an event to be diagnosed as a diagnostic rule established in advance. From the data classification rule that specifies the range of data related to the event for each diagnostic item, the feature amount calculation formula for calculating the feature amount unique to the event, the determination criteria and the determination result for the calculated feature amount And a means for storing the determination rule, and a means for applying the acquired time-series data according to a condition defined by the diagnostic rule to determine whether or not an event defined by the rule occurs. From the collected data, data that complies with the data classification rule is extracted for each diagnostic item of the above diagnostic rule, and the characteristic amount is calculated for this data using the characteristic amount calculation formula. An automatic manufacturing apparatus comprising: a determination unit that has a function of outputting the determination result of a corresponding event by applying the characteristic amount to a determination criterion of a determination rule. 7. A means for acquiring, as time-series data, the operation of a part of the manufacturing facility and information relating to the operating state of the manufacturing facility when the manufacturing facility is in operation, and an event to be diagnosed as a diagnostic rule established in advance. From the data classification rule that specifies the range of data related to the event for each diagnostic item, the feature amount calculation formula for calculating the feature amount unique to the event, the determination criteria and the determination result for the calculated feature amount And a means for storing the determination rule, and a means for applying the acquired time-series data according to a condition defined by the diagnostic rule to determine whether or not an event defined by the rule occurs. From the collected data, data that complies with the data classification rule is extracted for each diagnostic item of the above diagnostic rule, and the characteristic amount is calculated for this data using the characteristic amount calculation formula. A message indicating the determination means having a function of obtaining the determination result of the corresponding event by applying the feature amount to the determination criteria of the determination rule, and a message indicating the coping method of the equipment corresponding to the determination result of the determination means. An automatic manufacturing apparatus comprising: means for displaying. 8. A means for acquiring, as time-series data, information relating to the operation of a part of the manufacturing equipment and the operating state of the manufacturing equipment when the manufacturing equipment is operating, and an event to be diagnosed as a diagnostic rule established in advance. From the data classification rule that specifies the range of data related to the event for each diagnostic item, the feature amount calculation formula for calculating the feature amount unique to the event, the determination criteria and the determination result for the calculated feature amount And a means for storing the determination rule, and a means for applying the acquired time-series data according to a condition defined by the diagnostic rule to determine whether or not an event defined by the rule occurs. From the collected data, data that complies with the data classification rule is extracted for each diagnostic item of the above diagnostic rule, and the characteristic amount is calculated for this data using the characteristic amount calculation formula. A determination means having a function of obtaining the determination result of a corresponding event by applying the feature amount to the determination criteria of the determination rule, and changing the operation of the part of the equipment corresponding to the determination result of the determination means An automatic manufacturing apparatus having a diagnostic system for manufacturing equipment, comprising: 9. A means for acquiring, as time-series data, information relating to the operation of a part of the manufacturing facility and the operating state of the manufacturing facility and information relating to the manufacturing result of a product of the manufacturing facility when the manufacturing facility is operating, and the manufacturing. The data of the operation of the equipment part and the fluctuation of the information related to the operation of the manufacturing equipment are output by matching the time axis of these data, and the information related to the manufacturing result of the product of the manufacturing equipment is output. An automatic manufacturing apparatus comprising: means for outputting after a manufacturing operation. 10. Manufacturing of a product of a manufacturing facility, information on a change in operation of a part of the manufacturing facility during operation of the manufacturing facility, information on a manufacturing state of a product of the manufacturing facility, and information on a manufacturing result of a product of the manufacturing facility. An automatic manufacturing apparatus, characterized in that it is equipped with a means for acquiring the product at the time of manufacturing the product. 11. A means for storing a history of operating time change of a part of a manufacturing facility and a history of time change of parameters of a manufacturing state when a product is manufactured by the manufacturing facility, and manufacturing of the product manufactured by the manufacturing facility. Means for storing information on the inspection result,
An automatic manufacturing apparatus comprising: means for displaying a list of these two stored data; and means for accepting selection of the displayed data and displaying the selected data with a common time axis. .. 12. A means for acquiring, as time-series data, an operation of a part of the manufacturing equipment and information relating to a manufacturing state of a product of the manufacturing equipment when operating the manufacturing equipment, and preliminarily established from operation data of the part of the manufacturing equipment. Means for acquiring information relating to the manufacturing result of the manufacturing equipment in association with the operation of the part, means for storing a diagnostic rule established in advance, and both of the acquired data according to the conditions specified by the diagnostic rule. An automatic manufacturing apparatus comprising: means for manufacturing a product while applying the product to a manufacturing facility to determine the manufacturing state of the product. 13. A means for acquiring, as time-series data, an operation of a part of the manufacturing equipment and information relating to a manufacturing state of a product of the manufacturing equipment when the manufacturing equipment is in operation, and previously established from operation data of the part of the manufacturing equipment. Means for acquiring information relating to the manufacturing result of the manufacturing equipment in association with the operation of the part, means for storing a diagnostic rule established in advance, and both of the acquired data according to the conditions specified by the diagnostic rule. An automatic manufacturing apparatus comprising: means for determining whether or not an event defined by the rule has occurred. 14. A means for acquiring, as time-series data, operation of a part of the manufacturing equipment and information relating to a manufacturing state of a product of the manufacturing equipment when operating the manufacturing equipment, and preliminarily established from operation data of the part of the manufacturing equipment. Means for acquiring information relating to the manufacturing result of the manufacturing equipment in association with the operation of the part, means for storing a diagnostic rule established in advance, and both of the acquired data according to the conditions specified by the diagnostic rule. It is characterized by comprising means for determining whether or not an event defined by the rule has occurred, and means for displaying a message indicating a coping method of the facility corresponding to the determination result of the determining means. And automatic manufacturing equipment. 15. A means for acquiring, as time-series data, an operation of a part of the manufacturing equipment and information relating to a manufacturing state of a product of the manufacturing equipment when the manufacturing equipment is in operation, and previously established from operation data of the part of the manufacturing equipment. Means for acquiring information relating to the manufacturing result of the manufacturing equipment in association with the operation of the part, means for storing a diagnostic rule established in advance, and both of the acquired data according to the conditions specified by the diagnostic rule. A means for determining whether or not an event prescribed by the rule is applied and control information for changing the operation of the part of the equipment or the manufacturing state of the product corresponding to the determination result of the determining means are applied. An automatic manufacturing apparatus comprising: a means for outputting. 16. The manufacturing equipment is a film forming apparatus, and the film forming apparatus comprises a sequencer for controlling the operation of parts of the film forming apparatus and a gas analyzer for detecting gas components in the film forming apparatus.
Means for acquiring the operation of the part of the manufacturing equipment and the information relating to the operating state of the manufacturing equipment as time-series data during the movement of the manufacturing equipment is output from the sequencer of the film forming apparatus as the operation of the part of the manufacturing equipment. 5. A function for taking in the information indicating the operating state of each part of the device and the output of the gas analyzer as information relating to the operating condition of the manufacturing facility, with the information indicating the time attached thereto, respectively.
Alternatively, the automatic manufacturing apparatus according to claim 6 or claim 7 or claim 8. 17. The manufacturing equipment is a film forming apparatus, and the film forming apparatus comprises a sequencer for controlling the operation of parts of the film forming apparatus and a gas analyzer for detecting a gas component in the film forming apparatus.
As the operation of the part of the manufacturing equipment, the means for acquiring the information related to the operation of the part of the manufacturing equipment and the operating state of the manufacturing equipment and the information related to the manufacturing result of the product of the manufacturing equipment as the time-series data during the movement of the manufacturing equipment As information related to the operating status of each part of the film forming equipment and information related to the operating status of the manufacturing equipment that is output from the sequencer of the film forming equipment 10. The automatic manufacturing apparatus according to claim 9, further comprising a function of adding information indicating a time to each of the information on the resistance value and the reflectance and capturing the information.