JPH05114676A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH05114676A
JPH05114676A JP27592591A JP27592591A JPH05114676A JP H05114676 A JPH05114676 A JP H05114676A JP 27592591 A JP27592591 A JP 27592591A JP 27592591 A JP27592591 A JP 27592591A JP H05114676 A JPH05114676 A JP H05114676A
Authority
JP
Japan
Prior art keywords
envelope
heat
wiring
heat transfer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27592591A
Other languages
Japanese (ja)
Inventor
Kazuhiro Shimada
和宏 島田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP27592591A priority Critical patent/JPH05114676A/en
Publication of JPH05114676A publication Critical patent/JPH05114676A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

PURPOSE:To provide an inexpensive semiconductor device which does not cause its semiconductor elements to be damaged, has an excellent high-frequency characteristic, and can be easily manufactured. CONSTITUTION:After a transmission circuit element 27 is mounted on a substrate 21 formed by sticking a wiring board 22 and heat transferring plate 23 to each other by fixing a heat radiating terminal 31 to the projecting section 29 of the opening 28 of the plate 23 and soldering leads 32 to wiring 25 on the board 22, the plate 23 is thermally connected with an envelope 33 by bringing the plate 23 into contact with the envelope 33 when the substrate 21 is fixed in the envelope 33 with screws 36. As a result, the heat generated from the element 27 is transferred through a heat conducting route formed between the plate 23 connected with the terminal 31 and envelope 33 which is in contact with the plate 23 and has a low heat resistance and radiated to the outside from the external surface of the envelope 33. Therefore, an excellent high- frequency characteristic can be obtained without damaging semiconductor elements, etc., with an inexpensive constitution.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、例えば光伝送モジュー
ルなどに好適な放熱機構が設けられた半導体装置に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device provided with a heat dissipation mechanism suitable for, for example, an optical transmission module.

【0002】[0002]

【従来の技術】周知の通り、光伝送モジュールなどでは
LD(Laser Diode )やLED(Light Emitting Diod
e)などの発光素子を大電流を流して駆動することを要
し、光送信部での発熱は大きなものとなっている。それ
故、光送信部で用いられる半導体素子の送信回路素子は
熱除去を行うための放熱機構を設ける構成となってい
る。一方、情報の高度化や情報量の増大などの点からよ
り高速の伝送が求められ、光送信部での発熱がさらに大
きなものとなる状況にある。例えば1Mビット/秒での
所要電流が5mA〜10mAであったものが、高速化し
て200Mビット/秒となると200mA程度の電流が
流れるようになる。そして、高速伝送を行うためには効
率的な熱除去が課題の1つとなっている。
As is well known, in an optical transmission module or the like, an LD (Laser Diode) or an LED (Light Emitting Diode) is used.
It is necessary to drive a light emitting element such as e) by supplying a large current, and the heat generation in the optical transmitter is large. Therefore, the transmitter circuit element of the semiconductor element used in the optical transmitter has a heat dissipation mechanism for removing heat. On the other hand, higher speed transmission is required from the standpoint of the sophistication of information and the increase in the amount of information, and the heat generation in the optical transmission section is further increased. For example, the required current at 1 Mbit / sec was 5 mA to 10 mA, but when the speed is increased to 200 Mbit / sec, a current of about 200 mA will flow. Further, efficient heat removal is one of the issues for high-speed transmission.

【0003】以下、従来の放熱機構が設けられた半導体
装置の例を、光伝送モジュールの光送信部の要部を示す
図面を参照して説明する。
Hereinafter, an example of a semiconductor device provided with a conventional heat dissipation mechanism will be described with reference to the drawings showing a main part of an optical transmission section of an optical transmission module.

【0004】先ず、第1の例を図5により説明する。図
5は断面図であって、絶縁材料でなる配線基板1の上面
に半導体素子の送信回路素子2が、配線基板1に設けら
れた配線3の所定の端子部分に送信回路素子2のリード
4が半田付けによって取り付けられている。また送信回
路素子2のパッケージの上面には接着により放熱用フィ
ン部分が外面側になるようにヒートシンク5が取着され
ている。そして、送信回路素子2が搭載された回路基板
1は、外囲器6の開口部7を有する凹部8に送信回路素
子2を位置させるようにしてねじ9によって螺着されて
いる。この時、開口部7からはヒートシンク5のフィン
部分が外部に露出するように取り付けられている。
First, a first example will be described with reference to FIG. FIG. 5 is a cross-sectional view showing a transmitter circuit element 2 of a semiconductor element on the upper surface of a wiring board 1 made of an insulating material, and a lead 4 of the transmitter circuit element 2 on a predetermined terminal portion of a wiring 3 provided on the wiring board 1. Are attached by soldering. Further, a heat sink 5 is attached to the upper surface of the package of the transmission circuit element 2 by adhesion so that the heat radiation fin portion is on the outer surface side. The circuit board 1 on which the transmission circuit element 2 is mounted is screwed by the screw 9 so that the transmission circuit element 2 is located in the recess 8 having the opening 7 of the envelope 6. At this time, the fins of the heat sink 5 are attached so as to be exposed to the outside from the opening 7.

【0005】このように構成されたものでは、送信回路
素子2の熱は、主として送信回路素子2のパッケージか
らヒートシンク5に伝えられ、さらに放熱用フィン部分
から外部に放熱されるようにして行われる。
With this structure, the heat of the transmission circuit element 2 is transferred mainly from the package of the transmission circuit element 2 to the heat sink 5, and is further radiated to the outside from the heat radiation fin portion. ..

【0006】このため、なるべく小さくて放熱性が高い
ヒートシンク5を実現しようとすると専用のものを実装
状況に合わせて削り出す必要があり、高価なものとなっ
てしまい、またヒートシンク5が送信回路素子2に接着
によって取着されており、確実な信頼性の高い取着を行
うために接着条件を厳密に管理する必要があり、組立工
程が繁雑なものとなる。さらにヒートシンク5の放熱用
フィン部分が直接開口部7を介して外部に露出してお
り、使用環境によっては開口部7の隙間から内部に塵埃
が侵入する虞があり、またヒートシンク5に外部から加
わる力が送信回路素子2に加わり損傷を与える虞があ
り、さらにまた場合によっては外観上見映えの点で問題
となる。
Therefore, in order to realize a heat sink 5 which is as small as possible and has a high heat dissipation property, it is necessary to cut out a dedicated heat sink in accordance with the mounting situation, which is expensive, and the heat sink 5 has a transmitting circuit element. No. 2 is attached by adhesion, and it is necessary to strictly control the adhesion conditions in order to perform reliable attachment with high reliability, and the assembly process becomes complicated. Further, the heat dissipation fin portion of the heat sink 5 is exposed to the outside directly through the opening 7, and there is a possibility that dust may enter the inside of the opening 7 through the gap of the opening 7 depending on the use environment, and the heat sink 5 may be added from the outside. A force may be applied to the transmission circuit element 2 to damage it, and in some cases, it becomes a problem in terms of appearance.

【0007】なお、開口部7をなくし、ヒートシンク5
の外面側を外囲器6の内面に当接させ外囲器6を大気へ
の放熱部とし、外に露出しないようにすると、開口部7
があるための不具合は解消されるが、外囲器6に加わる
外力がヒートシンク5を介してそのまま送信回路素子2
に加わり損傷を与える虞がある。
The opening 7 is eliminated and the heat sink 5
The outer surface side of the enclosure is brought into contact with the inner surface of the envelope 6 so that the envelope 6 serves as a heat radiating portion to the atmosphere and is not exposed to the outside.
However, the external force applied to the envelope 6 is directly transmitted via the heat sink 5 to the transmission circuit element 2
There is a risk that it may be damaged by being added to.

【0008】次に、第2の例を図6により説明する。図
6は断面図であって、配線基板10は金属材料でなる基
体11の上面に厚さ数十μmの絶縁膜12が形成され、
この絶縁膜12上に所定のパターンの配線13が形成さ
れている。そして、半導体素子の送信回路素子2が絶縁
膜12上に設けられ、リード4を配線13の所定の部分
に半田付けすることによって取り付けられている。また
送信回路素子2の放熱端子14は、送信回路素子2を配
線基板10に取り付ける際に先端部を配線基板10の基
体11に当接させることで、配線基板10に熱的に接続
される。そして、送信回路素子2が搭載された配線基板
10は、外囲器15の凹部16に送信回路素子2を位置
させるようにしてねじ9によって螺着されている。
Next, a second example will be described with reference to FIG. FIG. 6 is a cross-sectional view. In the wiring board 10, an insulating film 12 having a thickness of several tens of μm is formed on the upper surface of a base 11 made of a metal material.
A wiring 13 having a predetermined pattern is formed on the insulating film 12. Then, the transmission circuit element 2 of the semiconductor element is provided on the insulating film 12, and is attached by soldering the lead 4 to a predetermined portion of the wiring 13. Further, the heat dissipation terminal 14 of the transmission circuit element 2 is thermally connected to the wiring board 10 by bringing the tip end into contact with the base 11 of the wiring board 10 when the transmission circuit element 2 is attached to the wiring board 10. The wiring board 10 on which the transmission circuit element 2 is mounted is screwed by the screw 9 so that the transmission circuit element 2 is positioned in the recess 16 of the envelope 15.

【0009】このように構成されたものでは、送信回路
素子2の熱は、主として放熱端子14から配線基板10
の基体11に、あるいは絶縁膜12を介して配線基板1
0の基体11に伝えられ、基体11と外囲器15の螺着
による接触部分を経由して外囲器15に伝えられ、外囲
器15の外表面から外部に放熱される。
With the above-described structure, the heat of the transmission circuit element 2 is mainly transferred from the heat dissipation terminal 14 to the wiring board 10.
Wiring substrate 1 on the base body 11 or via the insulating film 12
0 is transmitted to the base body 11, is transmitted to the envelope body 15 via a contact portion by screwing the base body 11 and the envelope body 15, and is radiated to the outside from the outer surface of the envelope body 15.

【0010】このようにして行われる放熱は上述の第1
の例に比較し、非常に効率が良いが、配線基板10の配
線13が絶縁膜12を介して設けるようにしなければな
らず、また配線13は片面づつの形成となり、交差配線
や配線基板10の両面を接続して使用する場合には、別
途に接続線を後付けしなければならず、高価で組立てが
複雑なものとなってしまう。一方、配線13が薄い絶縁
膜12を介して基体11上に設けられる構造のため、配
線13の浮遊容量が大きくて高周波特性が悪く、光伝送
モジュールの構成の中でも使用できる範囲が限定された
ものとなっている。
The heat radiation performed as described above is the first
Although it is much more efficient than the above example, the wirings 13 of the wiring board 10 must be provided via the insulating film 12, and the wirings 13 are formed on each side, so that the cross wiring and the wiring board 10 are formed. When both sides are connected and used, a connecting line must be additionally attached, which is expensive and complicated to assemble. On the other hand, since the wiring 13 is provided on the substrate 11 via the thin insulating film 12, the stray capacitance of the wiring 13 is large and the high frequency characteristics are poor, and the usable range is limited in the configuration of the optical transmission module. Has become.

【0011】[0011]

【発明が解決しようとする課題】上記のような放熱効果
が良好でも高価であったり、高周波特性が悪くなってし
まうなどの状況に鑑みて本発明はなされたもので、その
目的とするところは製造が容易で且つ安価であって、内
装される半導体素子や部品等の損傷を来さず高周波特性
が良好な半導体装置を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the situation that the heat radiation effect is good but the cost is high, and the high frequency characteristics are deteriorated. The purpose of the present invention is as follows. It is an object of the present invention to provide a semiconductor device which is easy and inexpensive to manufacture and which does not cause damage to the semiconductor elements and components installed therein and has excellent high frequency characteristics.

【0012】[0012]

【課題を解決するための手段】本発明の半導体装置は、
熱伝導材料で形成された外囲器と、所定パターンの配線
が形成された配線基板と伝熱板とを積層するように設け
た基板と、この基板に伝熱板に放熱端子を固着し且つ配
線基板の配線にリードを固着するようにして取着された
半導体素子とを備えてなり、基板が外囲器の内部に伝熱
板を該外囲器に熱的に接続させるようにして取着されて
いることを特徴とするものである。
The semiconductor device of the present invention comprises:
An envelope formed of a heat conductive material, a substrate provided so as to stack a heat transfer plate and a wiring substrate on which wiring of a predetermined pattern is formed, and a heat dissipation terminal fixed to the heat transfer plate on the substrate and A semiconductor element attached to the wiring of the wiring board by fixing the leads to the wiring, and mounting the board so that the heat transfer plate is thermally connected to the inside of the envelope. It is characterized by being worn.

【0013】[0013]

【作用】上記のように構成された半導体装置は、配線基
板と伝熱板とを積層するように設けた基板に、半導体素
子を伝熱板に放熱端子を固着し且つ配線基板にリードを
固着するようにして取着させ、その基板を伝熱板を外囲
器に熱的に接続させるようにして外囲器の内部に取着さ
せる構成としており、半導体素子で発生した熱は、その
放熱端子が接続している基板の積層された伝熱板から、
伝熱板が熱的に接続された外囲器の間に形成される熱抵
抗の小さい熱伝導経路を順に伝えられ、外囲器の外面か
ら外部に放熱されることになる。このため安価に構成で
き、半導体素子等の損傷を来さずに、良好な高周波特性
を得ることができる。
In the semiconductor device configured as described above, the semiconductor element is fixed to the heat transfer plate with the heat radiation terminal and the lead is fixed to the wiring board on the substrate provided so as to stack the wiring board and the heat transfer plate. The heat is generated by the semiconductor element and the heat transfer plate is thermally connected to the enclosure so that it is attached to the inside of the enclosure. From the laminated heat transfer plate of the board to which the terminals are connected,
The heat transfer plates are sequentially transmitted through the heat conduction path having a small thermal resistance formed between the envelopes thermally connected to each other, and the heat is radiated to the outside from the outer surface of the envelope. Therefore, it can be constructed at low cost, and good high frequency characteristics can be obtained without damaging the semiconductor element or the like.

【0014】[0014]

【実施例】以下、本発明の実施例を光伝送モジュールの
光送信部の要部を示す図面を参照して説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings showing the main part of an optical transmission section of an optical transmission module.

【0015】先ず、第1の実施例を図1及び図2を用い
て説明する。図1は送信回路素子を取り付けた基板を示
す平面図であり、図2は基板を取り付けた外囲器の断面
図で、図中の基板は図1のA−A矢視方向の断面を示し
ている。
First, a first embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a plan view showing a substrate on which a transmission circuit element is attached, and FIG. 2 is a cross-sectional view of an envelope on which the substrate is attached. The substrate in the drawing shows a cross section taken along the line AA of FIG. ing.

【0016】図において、基板21は方形の配線基板2
2と伝熱板23とが張り合わされて形成されている。配
線基板22は、基材にガラス繊維を用いたエポキシ樹
脂、あるいは基材に紙を用いたフェノール樹脂で形成さ
れた基体24の表面に厚さが200μm以下、通常数十
μmの銅箔が張り付けられ、この銅箔を所定のパターン
に合わせたマスクを用いた公知のエッチング技術によっ
てエッチングして配線25が形成されている。なお配線
25は配線基板22の両面に形成されており、両面の配
線はスルーホールに設けられた導電部材26によって接
続されている。
In the figure, a board 21 is a rectangular wiring board 2.
2 and the heat transfer plate 23 are bonded to each other. In the wiring board 22, a copper foil having a thickness of 200 μm or less, usually several tens of μm, is attached to the surface of a base body 24 formed of an epoxy resin using glass fiber as a base material or a phenol resin using paper as a base material. Then, the copper foil is etched by a known etching technique using a mask matching a predetermined pattern to form the wiring 25. The wirings 25 are formed on both sides of the wiring board 22, and the wirings on both sides are connected by the conductive members 26 provided in the through holes.

【0017】また、伝熱板23は、厚さが100μm以
上、通常1mm以下の銅又は銅合金などの熱伝導材料で
なる板状のもので、中央部分には送信回路素子27の形
状より大きい略方形の開口部28が形成されており、開
口部28の長辺の中央部に凸部29が形成されている。
なお伝熱板23は、公知のプレス加工で配線基板22と
は別途に加工した後に配線基板22と張り合わせたり、
あるいは予め配線基板22に張り合わせておいてエッチ
ング加工で所定形状に加工するなどして形成される。
Further, the heat transfer plate 23 is a plate-shaped member made of a heat conductive material such as copper or copper alloy having a thickness of 100 μm or more and usually 1 mm or less, and has a central portion larger than the shape of the transmission circuit element 27. A substantially rectangular opening 28 is formed, and a protrusion 29 is formed at the center of the long side of the opening 28.
The heat transfer plate 23 is processed by a known press process separately from the wiring board 22 and then bonded to the wiring board 22.
Alternatively, it is formed by pasting the wiring substrate 22 in advance and processing it into a predetermined shape by etching.

【0018】また、送信回路素子27は、内蔵する半導
体チップ30の発生熱をパッケージの外に導出する放熱
端子31が開口部28の凸部29に固着され、放熱端子
31と伝熱板23とが熱的に接続されている。さらに半
導体チップ30の入・出力端子に接続しているリード3
2は配線25の所定の部分に半田付けされる。
Further, in the transmission circuit element 27, a heat dissipation terminal 31 for guiding the heat generated by the built-in semiconductor chip 30 to the outside of the package is fixed to the convex portion 29 of the opening 28, and the heat dissipation terminal 31 and the heat transfer plate 23 are connected to each other. Are thermally connected. Further, the leads 3 connected to the input / output terminals of the semiconductor chip 30.
2 is soldered to a predetermined portion of the wiring 25.

【0019】そして、送信回路素子27を搭載した基板
21は、熱伝導材料でなる外囲器33の内部に形成され
た凹部34内に送信回路素子27を位置させるように
し、基板21に穿設された取付孔35に挿通させたねじ
36より、伝熱板23が外囲器33の内面に接触するよ
うにして所定の部位に螺着されている。
The substrate 21 on which the transmission circuit element 27 is mounted is provided in the substrate 21 such that the transmission circuit element 27 is located in the recess 34 formed inside the envelope 33 made of a heat conductive material. The heat transfer plate 23 is screwed to a predetermined portion such that the heat transfer plate 23 is in contact with the inner surface of the envelope 33 by a screw 36 inserted through the mounting hole 35.

【0020】このように構成されているので、装置を動
作させることにより発生した熱は、半導体チップ30か
ら放熱端子31によって伝熱板23の凸部29に伝えら
れ、伝熱板23からさらに伝熱板23と外囲器33とが
螺着によって接触する部分を経由して外囲器33に伝え
られ、外囲器33の外表面から外部に放熱される。
With this structure, the heat generated by operating the device is transferred from the semiconductor chip 30 to the convex portion 29 of the heat transfer plate 23 by the heat dissipation terminal 31, and further transferred from the heat transfer plate 23. The heat plate 23 and the envelope 33 are transmitted to the envelope 33 via a portion where they are in contact with each other by screwing, and heat is radiated to the outside from the outer surface of the envelope 33.

【0021】本実施例は以上のように構成されているた
め、半導体チップ30の熱は、放熱端子31から伝熱板
23、さらに外囲器33へと熱伝導率が高い経路を通
り、外囲器33の外表面から効率の良い放熱が行なわれ
る。そして基板21は、配線25を直接基体24に張り
付けた銅箔で形成した配線基板22と伝熱板23とを張
り合わせて形成したもので、製造が容易であり、また配
線25が配線基板22の表・裏両面に形成されているた
め交差配線や接続線を後付けする必要がなく、組立てが
容易で安価である。
Since the present embodiment is configured as described above, the heat of the semiconductor chip 30 passes from the heat radiating terminal 31 to the heat transfer plate 23, and further to the envelope 33 through a path having a high thermal conductivity to the outside. Heat is efficiently radiated from the outer surface of the envelope 33. The board 21 is formed by laminating a heat transfer plate 23 and a wiring board 22 formed of a copper foil in which the wiring 25 is directly attached to the base 24, and is easy to manufacture. Since it is formed on both the front and back sides, there is no need to attach cross wiring or connection lines afterwards, and assembly is easy and inexpensive.

【0022】また、放熱端子31が伝熱板23を介して
外囲器33に接続されるため、放熱端子31と外囲器3
3とは低インピーダンスでの接続で同電位に安定して保
持され、別部品を付加することなく良好なシールド効果
を得ることができる。さらに、配線25の間及び配線2
5と伝熱経路の伝熱板23などとの距離を比較的大きく
とれるため、浮遊容量が小さくできて高周波特性を良好
なものとすることができる。
Since the heat dissipation terminal 31 is connected to the envelope 33 via the heat transfer plate 23, the heat dissipation terminal 31 and the envelope 3 are connected.
3 and 3 can be stably held at the same potential by a connection with low impedance, and a good shield effect can be obtained without adding another component. Further, between the wiring 25 and the wiring 2
Since the distance between the heat transfer plate 5 and the heat transfer plate 23 in the heat transfer path can be made relatively large, the stray capacitance can be reduced and the high frequency characteristics can be improved.

【0023】その他、外囲器33の外面に開口部が形成
され、その開口部からヒートシンクなどが露出すること
もなく、また外囲器33に加わった力が送信回路素子2
7に加わることもないため外囲器内への塵埃の侵入や外
観上の見映えの問題、さらには送信回路素子27が損傷
するなどの虞がない。
In addition, an opening is formed on the outer surface of the envelope 33 so that the heat sink and the like are not exposed from the opening, and the force applied to the envelope 33 is applied to the transmitting circuit element 2.
Since it is not added to the external device 7, there is no possibility of dust invading into the envelope, appearance problems, and damage to the transmission circuit element 27.

【0024】次に、第2の実施例を図3及び図4を用い
て説明する。本実施例は外囲器への基板の取付けが側壁
に近い位置に制限されている場合のもので、図3は基板
が取り付けられた外囲器を示す平面図であり、図4は図
3のB−B矢視方向の断面を示す断面図である。
Next, a second embodiment will be described with reference to FIGS. 3 and 4. In this embodiment, the mounting of the substrate on the envelope is limited to a position close to the side wall. FIG. 3 is a plan view showing the envelope to which the substrate is attached, and FIG. It is sectional drawing which shows the cross section of the BB arrow direction.

【0025】図において、基板41は方形の配線基板4
2と伝熱板43とが張り合わされて形成されている。配
線基板42は、第1の実施例と同様に絶縁材料で形成さ
れた基体44の表面に厚さが数十μmの銅箔が張り付け
られ、この銅箔を所定のパターンにエッチングして形成
した配線45が設けられている。なお配線45は配線基
板42を貫通する導電部材46で表・裏両面を接続する
にして形成されている。
In the figure, a board 41 is a rectangular wiring board 4.
2 and the heat transfer plate 43 are attached to each other. Similar to the first embodiment, the wiring board 42 is formed by sticking a copper foil having a thickness of several tens of μm on the surface of a base 44 made of an insulating material and etching the copper foil into a predetermined pattern. Wiring 45 is provided. The wiring 45 is formed by connecting the front and back surfaces with a conductive member 46 penetrating the wiring board 42.

【0026】また、伝熱板43は、厚さが0.2mmの
銅板でなり、中央部分には送信回路素子27の形状より
大きい略方形の開口部28が形成されており、開口部2
8の長辺の中央部に凸部29が形成されている。さらに
開口部28の長辺に平行な1辺の辺縁部は配線基板42
の張合わせ面とは逆側に直角に曲げられて形成された立
上り部47が設けられている。このように立上り部47
が形成されることで伝熱板43の1辺からこれに対応す
る開口部28までの距離が、例えば最小2mmであった
ものが0.5mm程度にまで小さくなるように形成され
る。なお伝熱板43は、公知のプレス加工で配線基板4
2とは別途に開口部28及び立上り部47を加工した後
に配線基板42と張り合わせられる。
The heat transfer plate 43 is made of a copper plate having a thickness of 0.2 mm, and a substantially rectangular opening 28 larger than the shape of the transmission circuit element 27 is formed in the central portion.
A convex portion 29 is formed at the center of the long side of 8. Further, the edge portion of one side parallel to the long side of the opening 28 is the wiring board 42.
A rising portion 47 formed by being bent at a right angle is provided on the side opposite to the laminating surface. In this way, the rising portion 47
By forming the heat transfer plate 43, the distance from one side of the heat transfer plate 43 to the corresponding opening 28 is reduced from, for example, 2 mm to 0.5 mm. The heat transfer plate 43 is formed on the wiring board 4 by a known press process.
After the opening 28 and the rising portion 47 are processed separately from 2, the wiring board 42 is attached.

【0027】また、送信回路素子27は、内蔵する半導
体チップ30の発生熱をパッケージの外に導出する放熱
端子31が開口部28の凸部29に固着され、放熱端子
31と伝熱板43とが熱的に接続される。さらに半導体
チップ30の入・出力端子に接続しているリード32は
配線25の所定の部分に半田付けされる。
Further, in the transmitting circuit element 27, a heat radiating terminal 31 for leading out the heat generated by the built-in semiconductor chip 30 to the outside of the package is fixed to the convex portion 29 of the opening 28, and the heat radiating terminal 31 and the heat transfer plate 43 are provided. Are thermally connected. Further, the leads 32 connected to the input / output terminals of the semiconductor chip 30 are soldered to predetermined portions of the wiring 25.

【0028】そして、送信回路素子27を搭載した基板
41は、熱伝導材料でなる外囲器48の側壁49に近接
して内部に形成された所定の凹部50に、送信回路素子
27を位置させるようにし、また伝熱板43の立上り部
47を側壁49に対向させるようにしながら、基板41
に穿設された取付孔51に挿通させたねじ52より配線
基板42が外囲器48の内面に接触するようにして螺着
されている。
Then, the substrate 41 on which the transmission circuit element 27 is mounted has the transmission circuit element 27 positioned in a predetermined recess 50 formed inside in proximity to the side wall 49 of the envelope 48 made of a heat conductive material. In addition, while the rising portion 47 of the heat transfer plate 43 is made to face the side wall 49, the substrate 41
The wiring board 42 is screwed so as to come into contact with the inner surface of the envelope 48 by a screw 52 inserted through a mounting hole 51 formed in the enclosure.

【0029】このように構成されているので、装置を動
作させることにより発生した熱は、半導体チップ30か
ら放熱端子31によって伝熱板43の凸部29に伝えら
れ、伝熱板43からさらに伝熱板43から螺着している
ねじ52を経由して外囲器48に伝えられ、外囲器48
の外表面から外部に放熱される。
With this structure, the heat generated by operating the device is transferred from the semiconductor chip 30 to the convex portion 29 of the heat transfer plate 43 by the heat dissipation terminal 31, and is further transferred from the heat transfer plate 43. The heat is transmitted from the heat plate 43 to the envelope 48 via the screw 52 screwed to the envelope 48.
The heat is dissipated from the outer surface to the outside.

【0030】本実施例は以上のように構成されているた
め、第1の実施例と同様の作用、効果が得られると共
に、取付け上の制約を受け、外囲器48の側壁49との
距離が伝熱板43に、例えば最小2mmの幅の伝熱経路
が確保できないような部位へ基板41を取着する場合に
おいても、立上り部47を設けることによって伝熱経路
が十分な幅を有するようにして確保でき、外囲器48内
の隅々にまで基板41などを取着することができる。そ
して外囲器48の小型化や高機能の稠密化が実現でき
る。
Since the present embodiment is constructed as described above, the same operation and effect as those of the first embodiment can be obtained, and the distance from the side wall 49 of the envelope 48 is restricted due to restrictions in mounting. Even when the substrate 41 is attached to the heat transfer plate 43 at a site where a heat transfer path having a minimum width of 2 mm cannot be secured, the rising portion 47 is provided so that the heat transfer path has a sufficient width. The substrate 41 and the like can be attached to every corner of the envelope 48. Further, the miniaturization of the envelope 48 and the highly functional dense packing can be realized.

【0031】尚、本発明は上記の各実施例のみに限定さ
れるものではなく、要旨を逸脱しない範囲内で適宜変更
して実施し得るものである。
The present invention is not limited to the above-described embodiments, but can be implemented with various modifications without departing from the scope of the invention.

【0032】[0032]

【発明の効果】以上の説明から明らかなように、本発明
は、配線基板と伝熱板とを積層するように設けた基板
に、半導体素子を伝熱板に放熱端子を固着し且つ配線基
板にリードを固着するようにして取着させ、基板を伝熱
板を外囲器に熱的に接続させるようにして取着させる構
成としたことにより、製造が容易で且つ安価になり、内
装される半導体素子や部品等の損傷を来さず、良好な高
周波特性が得られる等の効果が得られる。
As is apparent from the above description, according to the present invention, a semiconductor element is fixed to a heat transfer plate and a heat radiating terminal is fixed to a substrate provided with a wiring board and a heat transfer plate laminated on each other, and a wiring board. Since the leads are fixedly attached to the substrate, and the substrate is attached so that the heat transfer plate is thermally connected to the envelope, the manufacturing is easy and inexpensive, and the interior is It is possible to obtain an effect that good high-frequency characteristics can be obtained without damaging a semiconductor element or a component that does not exist.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例に係わる送信回路素子を
取り付けた基板を示す平面図である。
FIG. 1 is a plan view showing a substrate on which a transmission circuit element according to a first embodiment of the present invention is attached.

【図2】図1のA−A矢視方向の断面を用いて示す要部
断面図である。
FIG. 2 is a cross-sectional view of an essential part shown using a cross section taken along the line AA of FIG.

【図3】本発明の第2の実施例を示す要部平面図であ
る。
FIG. 3 is a plan view of an essential part showing a second embodiment of the present invention.

【図4】図3のB−B矢視方向の断面図である。FIG. 4 is a sectional view taken along the line BB of FIG.

【図5】従来の第1の例を示す断面図である。FIG. 5 is a cross-sectional view showing a first conventional example.

【図6】従来の第2の例を示す断面図である。FIG. 6 is a sectional view showing a second conventional example.

【符号の説明】[Explanation of symbols]

21…基板 22…配線基板 23…伝熱板 25…配線 27…送信回路素子 31…放熱端子 32…リード 33…外囲器 21 ... Substrate 22 ... Wiring substrate 23 ... Heat transfer plate 25 ... Wiring 27 ... Transmitting circuit element 31 ... Heat dissipation terminal 32 ... Lead 33 ... Envelope

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 熱伝導材料で形成された外囲器と、所定
パターンの配線が形成された配線基板と伝熱板とを積層
するように設けた基板と、この基板に前記伝熱板に放熱
端子を固着し且つ前記配線基板の配線にリードを固着す
るようにして取着された半導体素子とを備えてなり、前
記基板が前記外囲器の内部に前記伝熱板を該外囲器に熱
的に接続させるようにして取着されていることを特徴と
する半導体装置。
1. An envelope formed of a heat conductive material, a substrate provided so as to stack a heat transfer plate and a wiring substrate on which a predetermined pattern of wiring is formed, and the heat transfer plate on the substrate. And a semiconductor element attached so as to fix the heat radiation terminal and the lead to the wiring of the wiring board, wherein the board has the heat transfer plate inside the envelope. A semiconductor device which is attached so as to be thermally connected to the semiconductor device.
JP27592591A 1991-10-24 1991-10-24 Semiconductor device Pending JPH05114676A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27592591A JPH05114676A (en) 1991-10-24 1991-10-24 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27592591A JPH05114676A (en) 1991-10-24 1991-10-24 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH05114676A true JPH05114676A (en) 1993-05-07

Family

ID=17562339

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27592591A Pending JPH05114676A (en) 1991-10-24 1991-10-24 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH05114676A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000252663A (en) * 1999-03-01 2000-09-14 Sharp Corp Electronic circuit board device and electric equipment using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000252663A (en) * 1999-03-01 2000-09-14 Sharp Corp Electronic circuit board device and electric equipment using the same

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