JPH05114353A - Field emission type electron gun and its stabilizing method - Google Patents
Field emission type electron gun and its stabilizing methodInfo
- Publication number
- JPH05114353A JPH05114353A JP3274199A JP27419991A JPH05114353A JP H05114353 A JPH05114353 A JP H05114353A JP 3274199 A JP3274199 A JP 3274199A JP 27419991 A JP27419991 A JP 27419991A JP H05114353 A JPH05114353 A JP H05114353A
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- Prior art keywords
- electron gun
- field emission
- cathode
- emission electron
- irradiating
- Prior art date
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- Cold Cathode And The Manufacture (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、電子顕微鏡、電子ビー
ム露光装置、電子ビーム検査装置等に使用される電界放
射型電子銃の放射電流安定化方法及びその方法の実施に
使用される電界放射型電子銃に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for stabilizing a radiation current of a field emission type electron gun used in an electron microscope, an electron beam exposure apparatus, an electron beam inspection apparatus and the like, and a field emission used for implementing the method. Type electron gun.
【０００２】[0002]
【従来の技術】電子を発生する電子銃は熱陰極型と電界
放射型とに大別される。前者は加熱された陰極から放出
される熱電子を使用するもので、陰極表面において高い
加速電界を必要としないため陰極表面付近に空間電荷が
形成され、電流と電界との間に負帰還作用が成立して放
射電流は安定する。後者は、電子放出面積が小さく、ま
た、電流の広がりも少ないことから高輝度が得られるの
で、加速電圧を低くして試料に帯電する電荷を減少する
ことが可能であり、高分解能電子顕微鏡などに実用化さ
れ始めている。2. Description of the Related Art Electron guns that generate electrons are roughly classified into a hot cathode type and a field emission type. The former uses thermionic electrons emitted from the heated cathode and does not require a high accelerating electric field at the cathode surface, so space charges are formed near the cathode surface, and a negative feedback action occurs between the current and the electric field. When established, the emission current stabilizes. Since the latter has a small electron emission area and a small current spread, high brightness can be obtained, so it is possible to reduce the charge charged on the sample by lowering the accelerating voltage. Has begun to be put into practical use.
【０００３】ところが、電界放射型電子銃は、熱陰極型
と異なって高密度の空間電荷が形成されず、陰極表面の
吸着原子や分子による仕事関数の微妙な変化や、陰極近
傍で電離されたイオンが陰極を衝撃することによる陰極
表面形状の変化等によって放射電流が不安定になるとい
う欠点を有している。そこで、通常の電界放射型電子銃
はイオン衝撃を軽減するために高真空（10-9〜10-10 Ｔ
ｏｒｒ）に保持され、また、吸着原子や分子を陰極表面
から離脱させるためにフラッシングと称する清浄化工程
を実施している。However, unlike the hot cathode type, the field emission type electron gun does not form a high-density space charge, and is delicately changed in the work function due to adsorbed atoms or molecules on the cathode surface, or ionized near the cathode. It has a drawback that the emission current becomes unstable due to changes in the shape of the cathode surface due to the impact of ions on the cathode. Therefore, in order to reduce the ion bombardment, a normal field emission electron gun uses a high vacuum (10 -9 -10 -10 T
A cleaning process called flushing is carried out in order to remove adsorbed atoms and molecules from the cathode surface.
【０００４】このフラッシングは数秒乃至数分の期間陰
極表面を通電等によって加熱することによりなされる。
なお、電界放射型電子銃の陰極を常時１０００Ｋ〜２０
００Ｋの温度に保持する熱電界放射型電子銃と称する電
子銃が知られているが、この電子銃の場合には安定な電
流が得られている。This flushing is carried out by heating the cathode surface by energization for a period of several seconds to several minutes.
In addition, the cathode of the field emission type electron gun is always 1000K to 20K.
An electron gun called a thermal field emission type electron gun that holds a temperature of 00K is known, but in the case of this electron gun, a stable current is obtained.
【０００５】[0005]
【発明が解決しようとする課題】１００μｍ程度の微小
間隔をもって配設される複数の微小電子銃と微小電子光
学系とからなる電子ビーム検査装置等においては、構成
材料のすべてに耐熱性を要求することは困難であり、ま
た、被検査試料に近接させて（１ｍｍ程度）検査するた
めに試料自身の温度上昇が問題となる。したがって、電
子銃としては常温の電界放射型電子銃を使用せざるを得
ないが、常温の電界放射型電子銃の場合には前記のよう
に放射電流が不安定であるという問題がある。In an electron beam inspection apparatus or the like composed of a plurality of micro electron guns and micro electron optical systems arranged with a minute interval of about 100 μm, heat resistance is required for all constituent materials. This is difficult, and the temperature rise of the sample itself poses a problem because the sample is inspected in close proximity to the sample to be inspected (about 1 mm). Therefore, the field emission type electron gun at room temperature has to be used as the electron gun, but in the case of the field emission type electron gun at room temperature, there is a problem that the emission current is unstable as described above.
【０００６】本発明の目的は、この欠点を解消すること
にあり、常温の電界放射型電子銃の放射電流を安定化す
る方法とその方法の実施に使用される電界放射型電子銃
とを提供することにある。An object of the present invention is to eliminate this drawback, and to provide a method for stabilizing the emission current of a field emission type electron gun at room temperature and a field emission type electron gun used for implementing the method. To do.
【０００７】[0007]
【課題を解決するための手段】上記の目的のうち、電界
放射型電子銃の安定化方法は、下記いずれの手段によっ
ても達成される。Among the above objects, the method for stabilizing a field emission electron gun can be achieved by any of the following means.
【０００８】第１の手段は、電界放射型電子銃（２）の
陰極（３）の表面に、紫外光、レーザ光等の電磁波を照
射し、前記の陰極（３）表面に吸着されている原子また
は分子を離脱させて放射電流を安定化する電界放射型電
子銃の安定化方法である。The first means is to irradiate the surface of the cathode (3) of the field emission type electron gun (2) with electromagnetic waves such as ultraviolet light and laser light, which is adsorbed on the surface of the cathode (3). This is a method of stabilizing a field emission electron gun in which atoms or molecules are released to stabilize the emission current.
【０００９】第２の手段は、電界放射型電子銃（２）の
陰極（３）の表面に、電子線等の粒子線を照射し、前記
の陰極（３）表面に吸着されている原子または分子を離
脱させて放射電流を安定化する電界放射型電子銃の安定
化方法である。The second means is to irradiate the surface of the cathode (3) of the field emission electron gun (2) with a particle beam such as an electron beam so that atoms or atoms adsorbed on the surface of the cathode (3). This is a method of stabilizing a field emission electron gun in which molecules are released to stabilize the emission current.
【００１０】第３の手段は、電界放射型電子銃（２）に
反応性ラジカルを発生するガスを封入して、紫外光、レ
ーザ光等の電磁波を照射して反応性ラジカルを発生し、
前記の陰極（３）表面に吸着されている原子または分子
を離脱させて放射電流を安定化する電界放射型電子銃の
安定化方法である。A third means is to fill a field emission type electron gun (2) with a gas for generating a reactive radical and irradiate an electromagnetic wave such as ultraviolet light or laser light to generate the reactive radical.
It is a method for stabilizing a field emission type electron gun, in which atoms or molecules adsorbed on the surface of the cathode (3) are released to stabilize the emission current.
【００１１】第４の手段は、前記三つの手段のそれぞれ
と電界放射型電子銃の陰極（３）の加熱とを併用する電
界放射型電子銃の安定化方法である。上記の目的のう
ち、電界放射型電子銃は、下記いずれの手段によっても
達成される。A fourth means is a method for stabilizing a field emission electron gun, which uses each of the above three means together with heating of the cathode (3) of the field emission electron gun. Among the above objects, the field emission electron gun can be achieved by any of the following means.
【００１２】第１の手段は、電界放射型電子銃（２）の
陰極（３）の表面に、紫外線、レーザ光等の電磁波を照
射する電磁波照射手段（５）を有する電界放射型電子銃
である。The first means is a field emission electron gun having an electromagnetic wave irradiation means (5) for irradiating an electromagnetic wave such as ultraviolet rays or laser light on the surface of the cathode (3) of the field emission electron gun (2). is there.
【００１３】第２の手段は、電界放射型電子銃（２）の
陰極（３）の表面に、電子線等の粒子線を照射する粒子
線照射手段（８）を有する電界放射型電子銃である。第
３の手段は、電界放射型電子銃（２）の陰極（３）の表
面に、紫外線、レーザ光等の電磁波を照射する電磁波照
射手段（５）と、反応性ラジカルを発生するガスを供給
する反応性ラジカル発生用ガス供給手段とを有する電界
放射型電子銃である。The second means is a field emission type electron gun having a particle beam irradiation means (8) for irradiating a particle beam such as an electron beam on the surface of the cathode (3) of the field emission type electron gun (2). is there. The third means supplies an electromagnetic wave irradiating means (5) for irradiating an electromagnetic wave such as an ultraviolet ray or a laser beam and a gas for generating a reactive radical to the surface of the cathode (3) of the field emission type electron gun (2). A field emission type electron gun having a reactive radical generating gas supply means for
【００１４】なお、前記三つの手段のそれぞれに電界放
射型電子銃の陰極（３）を加熱する陰極加熱手段を付加
することは有効である。また、前記の電界放射型電子銃
を使用して露光装置、検査装置、または、測長装置を製
造すると好適である。It is effective to add cathode heating means for heating the cathode (3) of the field emission type electron gun to each of the three means. Further, it is preferable to manufacture an exposure apparatus, an inspection apparatus, or a length measuring apparatus by using the above-mentioned field emission type electron gun.
【００１５】[0015]
【作用】原子や分子が物質表面で結合するエネルギーと
物質表面からの距離との関係を図６に示す。図におい
て、Ａをもって示す状態にある場合を化学吸着と呼び、
Ｂをもって示す状態にある場合を物理吸着と呼ぶ。陰極
表面に吸着されている原子や分子は、図において、
Ｑ1 、Ｑ2 をもって示す活性化エネルギーが与えられる
ことによって表面から離脱することが可能である。[Function] FIG. 6 shows the relationship between the energy at which atoms and molecules are bound on the surface of a substance and the distance from the substance surface. In the figure, the case indicated by A is called chemisorption,
The case in the state indicated by B is called physical adsorption. The atoms and molecules adsorbed on the cathode surface are
It is possible to dissociate from the surface by giving activation energy shown by Q 1 and Q 2 .
【００１６】熱電界放射型電子銃の場合及び電界放射型
電子銃を加熱してフラッシングする場合には、この活性
化エネルギーは熱エネルギーをもって与えられ、１００
０Ｋ〜２０００Ｋの温度は０．１〜０．２ｅＶの活性化
エネルギーに相当する。In the case of the thermal field emission type electron gun and in the case where the field emission type electron gun is heated and flushed, this activation energy is given as thermal energy, and 100
A temperature of 0 K to 2000 K corresponds to an activation energy of 0.1 to 0.2 eV.
【００１７】一方、Ｘ線や紫外光は数ｎｍ〜数１００ｎ
ｍの波長を有し、数ＫｅＶ〜数１０ｅＶの活性化エネル
ギーに相当する。したがって、Ｘ線や紫外光を照射すれ
ば熱エネルギー以上の高い活性化エネルギーを与えるこ
とができ、表面に吸着されている原子や分子を離脱させ
ることが可能である（図７参照）。但し、光子と吸着さ
れている原子や分子との衝突の確率を考慮して十分な光
子数を照射する必要がある。On the other hand, X-rays and ultraviolet rays are several nm to several 100 n.
It has a wavelength of m and corresponds to an activation energy of several KeV to several 10 eV. Therefore, irradiation with X-rays or ultraviolet light can give high activation energy higher than thermal energy, and can dissociate atoms or molecules adsorbed on the surface (see FIG. 7). However, it is necessary to irradiate a sufficient number of photons in consideration of the probability of collision between photons and adsorbed atoms or molecules.
【００１８】通常、電子銃には負の電位が与えられる
が、これに正電位を与え、別の電子発生源から数ｅＶ〜
数10ｅＶに加速した電子を照射することによっても吸着
原子または分子に離脱のための活性化エネルギーを与え
ることができ、表面に吸着されている原子や分子を離脱
させることができる（図８参照）。また、酸素ガス、水
素ガス、塩素ガス等を封入して紫外光等を照射し、陰極
表面近傍に化学反応性の強い反応性ラジカルを発生さ
せ、これを、吸着原子や分子と化学結合または化学反応
させて、吸着原子や分子を陰極表面から離脱・除去させ
ることができる（図９参照）。Normally, a negative electric potential is applied to the electron gun, but a positive electric potential is applied to the electron gun so that a few eV to
By irradiating electrons accelerated to several tens of eV, activation energy for desorption can be given to the adsorbed atom or molecule, and the atom or molecule adsorbed on the surface can be desorbed (see FIG. 8). .. Also, by enclosing oxygen gas, hydrogen gas, chlorine gas, etc., and irradiating with ultraviolet light, etc., reactive radicals with strong chemical reactivity are generated near the cathode surface, and these are chemically bonded or chemically bonded to adsorbed atoms or molecules. By reacting, the adsorbed atoms and molecules can be detached and removed from the cathode surface (see FIG. 9).
【００１９】[0019]
【実施例】以下、図面を参照して、本発明の四つの実施
例に係る電界放射型電子銃の安定化方法及び電界放射型
電子銃について説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A field emission electron gun stabilization method and a field emission electron gun according to four embodiments of the present invention will be described below with reference to the drawings.
【００２０】第１例 図１に、陰極に紫外光等の電磁波を照射する電磁波照射
手段を有する電界放射型電子銃の断面図を示す。図にお
いて、１は鏡筒であり、２は陰極３と電子引き出し電極
４とからなる電界放射型電子銃であり、陰極３と電子引
き出し電極４との間に電圧が印加される。５は紫外光等
の電磁波を陰極３に照射する電磁波照射手段である。電
磁波照射手段５は図において左右に移動可能であり、照
射時には先端が電子銃２の光軸上に存在するように鏡筒
１内に挿入され、光ファイバ６によって導かれた電磁波
が先端に設けられたミラー７を介して陰極３に向かって
照射され、陰極３の表面に吸着されている原子または分
子は離脱・除去される。 First Example FIG. 1 shows a sectional view of a field emission type electron gun having an electromagnetic wave irradiating means for irradiating the cathode with an electromagnetic wave such as ultraviolet light. In the figure, 1 is a lens barrel, 2 is a field emission electron gun including a cathode 3 and an electron extraction electrode 4, and a voltage is applied between the cathode 3 and the electron extraction electrode 4. Reference numeral 5 is an electromagnetic wave irradiation means for irradiating the cathode 3 with an electromagnetic wave such as ultraviolet light. The electromagnetic wave irradiation means 5 is movable left and right in the figure, and is inserted into the lens barrel 1 so that the tip is on the optical axis of the electron gun 2 during irradiation, and the electromagnetic wave guided by the optical fiber 6 is provided at the tip. Atoms or molecules that are irradiated toward the cathode 3 through the mirror 7 and are adsorbed on the surface of the cathode 3 are removed and removed.
【００２１】第２例 図２に、電子線等の粒子線照射手段を有する電界放射型
電子銃の断面図を示す。図において、図１で示したもの
と同一のものは同一の記号をもって示してあり、８は電
子線を発生するリング状の熱陰極からなる粒子線照射手
段である。電子銃２の陰極３を正電位にして熱陰極８の
発生する電子を陰極３に向かって照射することによって
陰極３の表面に吸着されている原子または分子は離脱・
除去される。 Second Example FIG. 2 shows a sectional view of a field emission type electron gun having a particle beam irradiation means such as an electron beam. In the figure, the same parts as those shown in FIG. 1 are shown with the same symbols, and 8 is a particle beam irradiation means composed of a ring-shaped hot cathode for generating an electron beam. Atoms or molecules adsorbed on the surface of the cathode 3 are released by irradiating the cathode 3 with electrons generated by the hot cathode 8 by setting the cathode 3 of the electron gun 2 to a positive potential.
To be removed.
【００２２】第３例 チップ内に１００μｍ程度のピッチをもって多数の微小
電子銃及び微小電子光学系が形成されている電子ビーム
検査装置に本発明を適用する場合について説明する。 Third Example A case where the present invention is applied to an electron beam inspection apparatus in which a large number of micro electron guns and micro electron optical systems are formed with a pitch of about 100 μm in a chip will be described.
【００２３】図３に電子ビーム検査装置の平面図を示
す。図において、11は電子ビーム発生部であって複数の
微小マルチ電子鏡筒12からなっており、それぞれの微小
マルチ電子鏡筒12には１００μｍ程度のピッチをもって
多数の微小電子銃及び微小電子光学系が形成されてい
る。13は被検査試料であり、10は検査領域のチップであ
る。14は紫外光照射手段であってステージ15上に固定さ
れており、光ファイバ16を介して紫外光が導かれる。ス
テージ15を移動して紫外光照射手段14をチップ12の下に
移動し、チップ12の下面から紫外光を照射してチップ12
に形成されている微小電子銃の陰極に吸着されている原
子または分子を離脱・除去する。FIG. 3 shows a plan view of the electron beam inspection apparatus. In the figure, 11 is an electron beam generator, which is composed of a plurality of micro multi-electron lens barrels 12, and each micro multi-electron lens barrel 12 has a large number of micro electron guns and micro electron optical systems with a pitch of about 100 μm. Are formed. Reference numeral 13 is a sample to be inspected, and 10 is a chip in the inspection area. Reference numeral 14 denotes an ultraviolet light irradiation means, which is fixed on the stage 15 and guides the ultraviolet light through the optical fiber 16. The stage 15 is moved to move the ultraviolet light irradiation means 14 to below the chip 12, and the ultraviolet light is irradiated from the lower surface of the chip 12 so that the chip 12 is irradiated.
Atoms or molecules adsorbed on the cathode of the micro-electron gun formed on are removed and removed.
【００２４】図４は電子ビーム発生部11のチップ12の直
下に紫外光照射手段14を移動した状態の断面図を示す。
図において、17は微小電子銃であり、18は微小電子光学
系であり、いずれも同一基板に形成されている。19は紫
外光照射手段14に設けられたレンズであって、微小電子
銃17に対応して設けられており、このレンズ19を介して
下方のスリット20から導かれる紫外光を微小電子銃17に
照射する。FIG. 4 is a sectional view showing a state in which the ultraviolet light irradiating means 14 is moved just below the chip 12 of the electron beam generator 11.
In the figure, 17 is a micro electron gun, and 18 is a micro electron optical system, both of which are formed on the same substrate. Reference numeral 19 denotes a lens provided in the ultraviolet light irradiation means 14, which is provided corresponding to the micro electron gun 17, and the ultraviolet light guided from the lower slit 20 via this lens 19 is directed to the micro electron gun 17. Irradiate.
【００２５】第４例 図５に電子線照射手段を有する微小電子銃の断面図を示
す。図において、21は陰極であり、22は電子引き出し電
極であり、23はリング状の清浄化用陰極である。陰極21
を正電位とし、清浄化用陰極23から放出される電子を陰
極21に照射することによって陰極21の表面に吸着されて
いる原子または分子は離脱・除去される。 Fourth Example FIG. 5 shows a sectional view of a micro electron gun having an electron beam irradiation means. In the figure, 21 is a cathode, 22 is an electron extraction electrode, and 23 is a ring-shaped cleaning cathode. Cathode 21
Is set to a positive potential, and the electrons emitted from the cleaning cathode 23 are irradiated to the cathode 21, whereby the atoms or molecules adsorbed on the surface of the cathode 21 are desorbed and removed.
【００２６】なお、電子銃近傍にガスノズルを設けて、
酸素ガス、水素ガス、塩素ガス等を鏡筒内に封入して紫
外光等の電磁波を照射すれば、反応性ラジカルが発生し
て吸着原子または分子がこの反応性ラジカルと反応し
て、容易に離脱・除去される。また、電子銃及び電子光
学系の構成材料の耐熱性の範囲内で、かつ、被試験試料
の温度上昇が許される範囲内であれば、電子銃の加熱を
併用して吸着原子または分子の離脱を促進することが可
能である。A gas nozzle is provided near the electron gun,
If oxygen gas, hydrogen gas, chlorine gas, etc. are enclosed in the lens barrel and irradiated with electromagnetic waves such as ultraviolet light, reactive radicals are generated and the adsorbed atoms or molecules react with the reactive radicals, facilitating easy reaction. Removed / removed. Also, if the heat resistance of the constituent materials of the electron gun and the electron optical system is within the range and the temperature rise of the sample under test is allowed, the heating of the electron gun is also used to release the adsorbed atoms or molecules. Can be promoted.
【００２７】[0027]
【発明の効果】以上説明したとおり、本発明に係る電界
放射型電子銃の安定化方法及び電界放射型電子銃は、陰
極に電磁波や粒子線を照射することによって陰極表面に
吸着されている原子または分子に活性化エネルギーを与
えるか、または、反応性ラジカルを発生させて陰極表面
に吸着されている原子または分子と反応させることによ
って、これらの原子または分子は陰極表面から離脱・除
去されるので、原子または分子の離脱のために加熱する
ことが困難であるか、または、高温に保持することが困
難である電界放射型電子銃においても、電子銃の電流を
安定化することが可能である。As described above, the method for stabilizing a field emission electron gun and the field emission electron gun according to the present invention include atoms adsorbed on the cathode surface by irradiating the cathode with an electromagnetic wave or a particle beam. Or, by giving activation energy to molecules or by generating reactive radicals and reacting with atoms or molecules adsorbed on the cathode surface, these atoms or molecules are detached / removed from the cathode surface. , It is possible to stabilize the current of an electron gun even in a field emission electron gun that is difficult to heat due to the detachment of atoms or molecules or difficult to keep at high temperature ..
【図１】電磁波照射手段を有する電界放射型電子銃の構
成図である。FIG. 1 is a configuration diagram of a field emission electron gun having an electromagnetic wave irradiation means.
【図２】粒子線照射手段を有する電界放射型電子銃の構
成図である。FIG. 2 is a configuration diagram of a field emission electron gun having a particle beam irradiation means.
【図３】電子ビーム検査装置の構成図である。FIG. 3 is a configuration diagram of an electron beam inspection apparatus.
【図４】電子ビーム検査装置の微小電子銃に紫外光を照
射する状態を示す断面図である。FIG. 4 is a cross-sectional view showing a state in which a micro electron gun of an electron beam inspection apparatus is irradiated with ultraviolet light.
【図５】電子ビーム検査装置の微小電子銃に電子線を照
射する状態を示す断面図である。FIG. 5 is a cross-sectional view showing a state in which a micro electron gun of an electron beam inspection apparatus is irradiated with an electron beam.
【図６】原子や分子が物質表面で結合するポテンシャル
エネルギーと表面からの距離との関係を示すグラフであ
る。FIG. 6 is a graph showing the relationship between the potential energy of atoms and molecules binding on the surface of a substance and the distance from the surface.
【図７】紫外光照射によって吸着原子または分子を離脱
する説明図である。FIG. 7 is an explanatory diagram of releasing adsorbed atoms or molecules by irradiation with ultraviolet light.
【図８】電子線照射によって吸着原子または分子を離脱
する説明図である。FIG. 8 is an explanatory diagram of releasing adsorbed atoms or molecules by electron beam irradiation.
【図９】反応性ラジカルを発生するガスを封入して紫外
光を照射し、吸着原子または分子を離脱する説明図であ
る。FIG. 9 is an explanatory diagram of enclosing a gas that generates a reactive radical and irradiating it with ultraviolet light to separate adsorbed atoms or molecules.
１ 鏡筒 ２ 電子銃 ３ 陰極 ４ 電子引き出し電極 ５ 電磁波照射手段 ６ 光ファイバ ７ ミラー ８ 粒子線照射手段 10 検査領域のチップ 11 電子ビーム発生部 12 微小マルチ電子鏡筒 13 被検査試料 14 紫外光照射手段 15 ステージ 16 光ケーブル 17 微小電子銃 18 微小電子光学系 19 レンズ 20 スリット 21 陰極 22 電子引き出し電極 23 清浄用陰極 1 lens barrel 2 electron gun 3 cathode 4 electron extraction electrode 5 electromagnetic wave irradiating means 6 optical fiber 7 mirror 8 particle beam irradiating means 10 chip in inspection area 11 electron beam generator 12 micro multi-electron tube 13 inspected sample 14 UV light irradiation Means 15 Stage 16 Optical cable 17 Micro electron gun 18 Micro electron optical system 19 Lens 20 Slit 21 Cathode 22 Electron extraction electrode 23 Cleaning cathode
Claims (7)
面に紫外光、レーザ光等の電磁波を照射し、前記陰極
（３）表面に吸着されている原子または分子を離脱させ
て放射電流を安定化することを特徴とする電界放射型電
子銃の安定化方法。1. A surface of a cathode (3) of a field emission electron gun (2) is irradiated with an electromagnetic wave such as ultraviolet light or laser light to dissociate atoms or molecules adsorbed on the surface of the cathode (3). A method for stabilizing a field emission electron gun, characterized by stabilizing a radiation current.
面に電子線等の粒子線を照射し、前記陰極（３）表面に
吸着されている原子または分子を離脱させて放射電流を
安定化することを特徴とする電界放射型電子銃の安定化
方法。2. A radiation current by irradiating a surface of a cathode (3) of a field emission electron gun (2) with a particle beam such as an electron beam to separate atoms or molecules adsorbed on the surface of the cathode (3). A method for stabilizing a field emission electron gun, comprising:
ルを発生するガスを封入して紫外光、レーザ光等の電磁
波を照射して反応性ラジカルを発生し、前記陰極（３）
表面に吸着されている原子または分子を離脱させて放射
電流を安定化することを特徴とする電界放射型電子銃の
安定化方法。3. A field emission electron gun (2) is filled with a gas that generates a reactive radical, and an electromagnetic wave such as ultraviolet light or laser light is irradiated to generate a reactive radical, and the cathode (3).
A method for stabilizing a field emission electron gun, which comprises desorbing atoms or molecules adsorbed on a surface to stabilize a radiation current.
射型電子銃の安定化方法において、前記電界放射型電子
銃の陰極（３）を加熱することを特徴とする電界放射型
電子銃の安定化方法。4. The method for stabilizing a field emission electron gun according to claim 1, 2, or 3, wherein the cathode (3) of the field emission electron gun is heated. How to stabilize the gun.
面に紫外線、レーザ光等の電磁波を照射する電磁波照射
手段（５）を有することを特徴とする電界放射型電子
銃。5. A field emission electron gun comprising an electromagnetic wave irradiation means (5) for irradiating an electromagnetic wave such as an ultraviolet ray or a laser beam on the surface of the cathode (3) of the field emission electron gun (2).
面に電子線等の粒子線を照射する粒子線照射手段（８）
を有することを特徴とする電界放射型電子銃。6. A particle beam irradiation means (8) for irradiating a surface of a cathode (3) of a field emission electron gun (2) with a particle beam such as an electron beam.
A field-emission electron gun having:
面に紫外線、レーザ光等の電磁波を照射する電磁波照射
手段（５）と反応性ラジカルを発生するガスを供給する
反応性ラジカル発生用ガス供給手段とを有することを特
徴とする電界放射型電子銃。7. A reactive radical for supplying a gas for generating a reactive radical with an electromagnetic wave irradiating means (5) for irradiating the surface of a cathode (3) of a field emission electron gun (2) with an electromagnetic wave such as ultraviolet rays or laser light. A field emission type electron gun having a gas supply means for generation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3274199A JP2964284B2 (en) | 1991-10-22 | 1991-10-22 | Field emission type electron gun stabilization method and field emission type electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3274199A JP2964284B2 (en) | 1991-10-22 | 1991-10-22 | Field emission type electron gun stabilization method and field emission type electron gun |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11043615A Division JPH11283491A (en) | 1999-01-14 | 1999-01-14 | Method for stabilizing field emission electron gun having minute cold negative electrode and field emission electron gun |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05114353A true JPH05114353A (en) | 1993-05-07 |
| JP2964284B2 JP2964284B2 (en) | 1999-10-18 |
Family
ID=17538416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3274199A Expired - Lifetime JP2964284B2 (en) | 1991-10-22 | 1991-10-22 | Field emission type electron gun stabilization method and field emission type electron gun |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2964284B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5969467A (en) * | 1996-03-29 | 1999-10-19 | Nec Corporation | Field emission cathode and cleaning method therefor |
| WO2001054155A3 (en) * | 2000-01-18 | 2002-08-08 | Motorola Inc | Field emission device |
| WO2012086419A1 (en) * | 2010-12-22 | 2012-06-28 | 株式会社日立ハイテクノロジーズ | Charged particle emission gun and charged particle ray apparatus |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4938573A (en) * | 1972-08-10 | 1974-04-10 | ||
| JPS58201237A (en) * | 1982-05-19 | 1983-11-24 | Hitachi Ltd | Field emission type electron gun |
| JPS6089035A (en) * | 1983-10-20 | 1985-05-18 | Sony Corp | Manufacture of cathode ray tube |
| JPH0422038A (en) * | 1990-05-17 | 1992-01-27 | Futaba Corp | Electron emission device |
-
1991
- 1991-10-22 JP JP3274199A patent/JP2964284B2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4938573A (en) * | 1972-08-10 | 1974-04-10 | ||
| JPS58201237A (en) * | 1982-05-19 | 1983-11-24 | Hitachi Ltd | Field emission type electron gun |
| JPS6089035A (en) * | 1983-10-20 | 1985-05-18 | Sony Corp | Manufacture of cathode ray tube |
| JPH0422038A (en) * | 1990-05-17 | 1992-01-27 | Futaba Corp | Electron emission device |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5969467A (en) * | 1996-03-29 | 1999-10-19 | Nec Corporation | Field emission cathode and cleaning method therefor |
| WO2001054155A3 (en) * | 2000-01-18 | 2002-08-08 | Motorola Inc | Field emission device |
| WO2012086419A1 (en) * | 2010-12-22 | 2012-06-28 | 株式会社日立ハイテクノロジーズ | Charged particle emission gun and charged particle ray apparatus |
| JP5462958B2 (en) * | 2010-12-22 | 2014-04-02 | 株式会社日立ハイテクノロジーズ | Charged particle emission gun and charged particle beam apparatus |
| US8835884B2 (en) | 2010-12-22 | 2014-09-16 | Hitachi High-Technologies Corporation | Charged particle beam apparatus with cleaning photo-irradiation apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2964284B2 (en) | 1999-10-18 |
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