JPH05109123A - Method for polishing stamper for optical disk - Google Patents

Method for polishing stamper for optical disk

Info

Publication number
JPH05109123A
JPH05109123A JP29197991A JP29197991A JPH05109123A JP H05109123 A JPH05109123 A JP H05109123A JP 29197991 A JP29197991 A JP 29197991A JP 29197991 A JP29197991 A JP 29197991A JP H05109123 A JPH05109123 A JP H05109123A
Authority
JP
Japan
Prior art keywords
polishing
stamper
optical disk
tape
radial direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP29197991A
Other languages
Japanese (ja)
Other versions
JP3196259B2 (en
Inventor
Kazuyuki Chiba
和幸 千葉
Yasusuke Tanaka
庸介 田中
Yuko Yokomizo
祐幸 横溝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tosoh Corp
Original Assignee
Tosoh Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tosoh Corp filed Critical Tosoh Corp
Priority to JP29197991A priority Critical patent/JP3196259B2/en
Publication of JPH05109123A publication Critical patent/JPH05109123A/en
Application granted granted Critical
Publication of JP3196259B2 publication Critical patent/JP3196259B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To produce the stamper for optical disks which has high accuracy as a metallic mold at the time of injection molding and has high durability. CONSTITUTION:This method consists of a polishing stage 1 for moving a polishing tape in the radial direction of the stamper while pressing the polishing tape to the rear surface of the stamper for the rotating optical disk and a rotation and revolution type polishing stage 2 using a mechanochemical polishing material constituted of a polishing material and a chemical etching material.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光学ディスク用スタン
パの研磨方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of polishing a stamper for an optical disc.

【0002】[0002]

【従来の技術】光学ディスクは、フロッピーディスクや
ハードディスクに比べ、その容量の大きさ及び記録密度
の高さなどに特徴があり、現在盛んに研究開発が行われ
ている。一般に、光学ディスク用の基板は、上記の優れ
た特徴を保持しながら、大量生産が可能なように射出成
形によって生産されている。この際、上記の光学ディス
クには、スタンパに形成されたグルーブやピットが転写
されるようになっている。従って、上記のスタンパに
は、金型としての高度な精度および射出成形の際の耐久
性が要求される。
2. Description of the Related Art Optical discs are characterized by their large capacity and high recording density as compared with floppy discs and hard discs, and are currently being actively researched and developed. In general, a substrate for an optical disc is produced by injection molding so that it can be mass-produced while maintaining the above excellent characteristics. At this time, the grooves and pits formed on the stamper are transferred to the optical disc. Therefore, the above stamper is required to have a high degree of precision as a mold and durability in injection molding.

【0003】これまでの光学ディスク用スタンパの製造
方法は、例えば、以下に示すような方法で行われてい
る。即ち、表面研磨したガラス基板にレジストを必要な
厚さにスピンコート法で均一に塗布し、プリベーク後レ
ーザーカッティングマシーンで所望のパターンに露光し
た後、レジストを現像してピット及び/又はグルーブを
形成する。このピット及び/又はグルーブを有するレジ
スト付きガラス基板表面上にニッケルなどの薄膜をスパ
ッタ法などにより被覆し、導電性を保持させた後、電鋳
により任意の厚みのニッケルを折出させる。続いて、ニ
ッケルをガラス基板より剥離し、洗浄する。そのあと裏
面を研磨・洗浄し次いで内・外径を加工してスタンパと
して完成させる。
The conventional manufacturing method of the optical disk stamper is performed by the following method, for example. That is, a resist having a required thickness is uniformly applied to a surface-polished glass substrate by a spin coating method, and after prebaking, a desired pattern is exposed by a laser cutting machine, and then the resist is developed to form pits and / or grooves. To do. A thin film of nickel or the like is coated on the surface of the glass substrate with resist having the pits and / or grooves by a sputtering method or the like to maintain conductivity, and then nickel having an arbitrary thickness is extruded by electroforming. Subsequently, nickel is peeled off from the glass substrate and washed. After that, the back surface is polished and washed, and then the inner and outer diameters are processed to complete the stamper.

【0004】スタンパには、金型としての高度な精度お
よび射出成形の際の耐久性が要求されるために、特に、
スタンパ裏面の研磨工程が重要になる。これまでは主に
研磨剤と化学的エッチング剤を主成分とするメカノケミ
カルポリッシング剤を用いた自公転式研磨方法により行
われている。しかしながら、この方法では、スタンパの
研磨量の制御が困難であり、研磨剤の供給量のわずかな
変動による微小突起や微小凹みの発生などの問題があ
る。
The stamper is required to have a high degree of precision as a mold and durability in injection molding.
The polishing process on the back side of the stamper becomes important. Up to now, the method has been mainly performed by a rotation-and-revolution polishing method using a mechanochemical polishing agent containing an abrasive and a chemical etching agent as main components. However, with this method, it is difficult to control the polishing amount of the stamper, and there are problems such as the generation of minute protrusions and minute depressions due to slight fluctuations in the amount of polishing agent supplied.

【0005】一方、最近では、研磨テープを回転してい
るスタンパの裏面に押し当てながらその半径方向に移動
させることによる研磨方法が用いられるようになってき
ているが、この方法では研磨上がりが粗い、スタンパの
反りの制御が困難などの問題点がある。
On the other hand, recently, a polishing method has been used in which the polishing tape is pressed against the back surface of a rotating stamper and moved in the radial direction thereof. However, there is a problem that it is difficult to control the warp of the stamper.

【0006】[0006]

【発明が解決しようとする課題】本発明の目的は、上記
問題点を解決し、射出成形の際の金型として高度な精度
を有し、かつ耐久性の大きい光学ディスク用スタンパを
製造するための研磨方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems and to manufacture a stamper for an optical disk which has a high degree of precision as a mold for injection molding and has a high durability. To provide a polishing method.

【0007】[0007]

【課題を解決するための手段】本発明者らは、上記問題
点を解決するために鋭意検討を行った結果、光学ディス
ク用スタンパ裏面の研磨を、2つの工程に分けることに
より本発明を完成するに至った。
As a result of intensive studies to solve the above problems, the present inventors have completed the present invention by dividing the polishing of the back surface of an optical disk stamper into two steps. Came to do.

【0008】即ち、本発明は、研磨テープを回転してい
るスタンパの裏面に押し当てながらその半径方向に移動
させることによる研磨工程1と、それに続く研磨材と化
学的エッチング材とから構成されるメカノケミカルポリ
ッシング材を用いた自公転式研磨工程2とからなること
を特徴とする光学ディスク用ニッケルスタンパの研磨方
法に関する。
That is, the present invention comprises a polishing step 1 in which an abrasive tape is pressed against the back surface of a rotating stamper and moved in the radial direction thereof, followed by an abrasive material and a chemical etching material. The present invention relates to a method for polishing a nickel stamper for an optical disk, which comprises a self-revolving polishing step 2 using a mechanochemical polishing material.

【0009】以下、本発明を詳細に説明する。The present invention will be described in detail below.

【0010】研磨工程1に用いられる研磨テープの種類
としては、特殊なものである必要はないが、その製品と
しての安定性や化学的反応性の低さなどの理由で、アル
ミナ、ダイヤモンドなどを主成分とするものを用いるこ
とが望ましく、またそのベースフィルムの材質、および
その幅は特に限定されるものではない。研磨テープの巻
取速度は研磨剤の大きさにもよるが、5ないし50cm
/分であることが望ましい。スタンパの回転速度は、研
磨テープの巻取速度あるいはスタンパの半径方向の移動
速度などにもよるが、50ないし2000rpmである
ことが望ましい。スタンパの半径方向の移動速度に関し
ては、研磨テープの幅にもよるが、1ないし50mm/
秒であることが望ましい。
The type of the polishing tape used in the polishing step 1 does not need to be special, but alumina, diamond, etc. may be used because of its stability as a product and low chemical reactivity. It is desirable to use the main component, and the material and width of the base film are not particularly limited. The winding speed of the polishing tape depends on the size of the polishing agent, but it is 5 to 50 cm.
/ Min is desirable. The rotation speed of the stamper depends on the winding speed of the polishing tape or the moving speed of the stamper in the radial direction, but is preferably 50 to 2000 rpm. Regarding the moving speed of the stamper in the radial direction, depending on the width of the polishing tape, it is 1 to 50 mm /
Seconds are preferred.

【0011】また、研磨時間はスタンパの裏面の粗さの
大きさなどにより任意に設定することが望ましい。これ
らの条件の範囲をはずれると、スタンパの反りの増大や
研磨しろの再現性の悪化などが生じる。また、砥粒つき
のテープのかわりに研削液を吐出する方法を用いても何
等差し支えない。
Further, it is desirable that the polishing time be arbitrarily set according to the roughness of the back surface of the stamper. If the range of these conditions is not satisfied, the warp of the stamper will increase and the reproducibility of the polishing margin will deteriorate. In addition, a method of discharging a grinding liquid may be used instead of the tape with abrasive grains.

【0012】研磨工程2に用いられる研磨剤としては上
述した理由からアルミナ、ダイヤモンドを主成分とする
ものを用いることが望ましい。その希釈率は0ないし1
00%の範囲がよく、供給量は希釈率にもよるが5ない
し100cc/分であることが望ましい。スタンパ回転
速度及びパッド回転速度は、研磨剤の希釈率および供給
量にもよるが5ないし100rpmであることが望まし
い。また、研磨時間は射出成形時に必要となるだけの粗
さおよび厚さが得られるように任意に設定される。これ
らの条件の範囲をはずれると、上述したような問題に加
え、研磨面の微小突起あるいは微小凹みなどの問題も生
じる。
As the polishing agent used in the polishing step 2, it is desirable to use one containing alumina or diamond as a main component for the reasons described above. The dilution rate is 0 to 1
The range of 00% is preferable, and the supply amount is preferably 5 to 100 cc / min depending on the dilution rate. The stamper rotation speed and the pad rotation speed are preferably 5 to 100 rpm, depending on the dilution rate and the supply amount of the polishing agent. Further, the polishing time is arbitrarily set so as to obtain the roughness and thickness required for injection molding. If these conditions are not met, problems such as minute protrusions or minute depressions on the polished surface will occur in addition to the problems described above.

【0013】[0013]

【実施例】本発明を更に詳細に説明するために実施例を
あげるが、本発明はこれらに限定されるものではない.
実施例1電鋳により得られたスタンパの信号面を、ポリ
酢酸ビニル及びポリ塩化ビニルを主成分とする高分子膜
で保護した後、中心部に固定用の穴を開け、テープ研磨
機に固定した。このスタンパをアルミナを主成分とする
幅1インチのテープを用いて、巻取速度20cm/分、
スタンパの回転速度100rpm、スタンパの半径方向
の移動速度20mm/秒で5分間研磨した。
EXAMPLES Examples will be given to explain the present invention in more detail, but the present invention is not limited thereto.
Example 1 A signal surface of a stamper obtained by electroforming was protected with a polymer film containing polyvinyl acetate and polyvinyl chloride as main components, and then a fixing hole was opened in the center and fixed to a tape polishing machine. did. Using a tape having a width of 1 inch containing alumina as a main component, the stamper was wound at a speed of 20 cm / min.
Polishing was performed for 5 minutes at a rotating speed of the stamper of 100 rpm and a moving speed of the stamper in the radial direction of 20 mm / sec.

【0014】続いて、このスタンパをテープ研磨機から
取り外し、両面粘着性テープを用いて自公転式研磨機の
治具に取り付けた。このスタンパを、アルミナを主成分
とする未希釈の研磨剤を用い、供給量20cc/分とし
てメカノケミカルポリッシングを行った。これにより、
研磨面の微小突起あるいは微小凹みなどもなく、反りの
小さいスタンパを得ることができた。
Subsequently, the stamper was removed from the tape polishing machine and attached to a jig of a revolving polishing machine using a double-sided adhesive tape. This stamper was subjected to mechanochemical polishing with an undiluted abrasive containing alumina as a main component at a supply rate of 20 cc / min. This allows
It was possible to obtain a stamper with a small warp, without any minute projections or minute depressions on the polished surface.

【0015】[0015]

【発明の効果】以上の説明から明らかなように、本発明
によれば、射出成形の際の金型として高度な精度を有
し、かつ耐久性の大きい光学ディスク用スタンパを製造
することが可能になる。
As is apparent from the above description, according to the present invention, it is possible to manufacture a stamper for an optical disc which has a high degree of accuracy as a mold for injection molding and has a high durability. become.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 光学ディスク用スタンパの裏面研磨方法
において、研磨テープを回転しているスタンパの裏面に
押し当てながらその半径方向に移動させることによる研
磨工程1と、それに続く研磨材と化学的エッチング材と
から構成されるメカノケミカルポリッシング材を用いた
自公転式研磨工程2とからなることを特徴とする光学デ
ィスク用スタンパの研磨方法
1. A method of polishing a back surface of a stamper for an optical disk, which comprises a polishing step 1 in which a polishing tape is pressed against the back surface of a rotating stamper and moved in the radial direction, followed by a polishing material and chemical etching. And a revolving polishing step 2 using a mechanochemical polishing material composed of a material and a polishing material for the optical disk stamper.
JP29197991A 1991-10-14 1991-10-14 Polishing method of stamper for optical disk Expired - Fee Related JP3196259B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29197991A JP3196259B2 (en) 1991-10-14 1991-10-14 Polishing method of stamper for optical disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29197991A JP3196259B2 (en) 1991-10-14 1991-10-14 Polishing method of stamper for optical disk

Publications (2)

Publication Number Publication Date
JPH05109123A true JPH05109123A (en) 1993-04-30
JP3196259B2 JP3196259B2 (en) 2001-08-06

Family

ID=17775945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29197991A Expired - Fee Related JP3196259B2 (en) 1991-10-14 1991-10-14 Polishing method of stamper for optical disk

Country Status (1)

Country Link
JP (1) JP3196259B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101973788B1 (en) * 2017-04-05 2019-09-02 장안하이텍주식회사 a scissors of safty

Also Published As

Publication number Publication date
JP3196259B2 (en) 2001-08-06

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