JPH05102309A - Semiconductor simulation apparatus - Google Patents

Abstract

PURPOSE:To achieve that a user grasps the function of a region and easily sets a value for the region by a method wherein the region to which a mask is applied is indicated by the function. CONSTITUTION:In order to simulate the operation of a CCD, a user sets the value of a voltage or the like to various regions of the CCD. At this time, a functional information storage means which stores functional information indicating a function (e.g. an electrode a sensory a channel or the like) to be fulfilled by a region to which a mask is applied is read out; the function which is to be fulfilled by the region is displayed on a display device in an interface part 2. The user selects the function (e.g. the sensor) of the region and sets a value to the selected function. Thereby, even when only the attribute of the mask is set, the user can grasp the function of the region. As a result, he can set a value for the region easily.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor simulation device for performing a semiconductor simulation using mask data regarding a mask.

[0002]

2. Description of the Related Art In general, when performing two-dimensional and three-dimensional simulations of semiconductors, chips are finely divided into meshes according to an applied mask and impurities, and a voltage or other voltage is applied to each divided region. It is necessary to set the value required for the simulation, but conventionally, the value was set for each of the areas divided into meshes while the user imagined what kind of function they would perform. ..

[0003]

In the conventional value setting method described above, a user who does not have detailed knowledge of semiconductors may erroneously set a value.

The present invention has been made in view of such a situation, and an object thereof is to provide a semiconductor simulation apparatus in which a value can be easily set in a region.

[0005]

According to a first aspect of the present invention, there is provided a semiconductor simulation apparatus which includes a function information storage unit for storing function information indicating a function to be performed by an area to which a mask is applied and an area to which the mask is applied. It is characterized by comprising processing means (for example, the position and value setting module 8 of the embodiment) for instructing by function information.

According to another aspect of the semiconductor simulation apparatus of the present invention, an attribute setting unit for setting the attribute of the mask (for example, the interface unit 2 of the embodiment), the attribute set by the attribute setting unit, and the mask are applied. Function extracting means (for example, the function extracting module 12 of the embodiment) that determines the function of the area to which the mask is applied according to a predetermined rule from other conditions given to the area. A function information storage unit that stores function information indicating a function that may possibly occur, and a processing unit that indicates the area to which the mask is applied by the function information (for example, the position and value setting module 8 of the embodiment). It is characterized by

[0007]

In the semiconductor simulation apparatus having the structure of the first aspect, since the area to which the mask is applied is designated by the function, the user can grasp the function of the area, and therefore the value can be set for the area. It can be done easily.

According to another aspect of the semiconductor simulation apparatus of the present invention, the function of the area to which the mask is applied is determined from the attribute set in the mask and other conditions given to the area to which the mask is applied. Since the area to which the mask is applied is specified by the function, the user can grasp the function of the area even if only the attribute of the mask is set. Therefore, it is easy to set the value for the area. You can

[0009]

DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows the configuration of an embodiment of the semiconductor simulation apparatus of the present invention. This embodiment relates to a semiconductor simulation device for designing a CCD chip. The interface unit 2 includes a display device including a CRT or an LCD, which is an output device from the semiconductor simulation device to the user, and a mouse and a keyboard, which are input devices from the user to the semiconductor simulation device.

The process processing module 4 displays various semiconductor manufacturing processes such as oxidation in a menu format on the display device of the interface unit 2, allows the user to select one manufacturing process by operating the mouse, and further displays a pop-up menu. Then, the user is allowed to select a parameter required in the selected manufacturing process, such as the amount of impurities. The manufacturing process and parameters selected by the user are stored in the process data storage device 5P by the process processing module 4 and sent to the area dividing module 10.

The mask processing module 6 displays the mask pattern on the display device of the interface section 2, changes the mask pattern according to a change instruction by the user operating the mouse or the keyboard, and outputs data indicating the changed mask pattern. The mask data is stored in the mask data storage device 5M and sent to the area dividing module 10. Further, the mask processing module 6 displays various mask attributes in a menu format on the display device of the interface unit 2, allows the user to select one manufacturing process by a mouse operation or the like, and stores the selected mask attribute in the mask data storage device. It is stored in 5M and sent to the area dividing module 10. The mask attribute means an attribute such as photosensitivity that the mask should have in a specific chip area to which the mask is applied.

The position and value setting module 8 provides the user with a CCD to simulate the operation of the CCD.
It is possible to set values such as voltage to various areas of the CCD, and not to let the user indicate the various areas of the CCD by coordinates, but the function to be performed by the area to which the mask is applied (for example, electrodes, sensors and A function information storage unit (not shown) that stores function information indicating a channel or the like is read out, the function to be performed by the area is displayed on the display device of the interface unit 2 in the menu format, and the area is displayed to the user (for example, Sensor) to set a value for the selected function. The values such as the voltage selected by the user are sent from the position and value setting module 8 to the area dividing module 10.

The area dividing module 10 receives the manufacturing process and parameters selected by the user sent from the process processing module 4, and the mask pattern and the mask attribute sent from the mask processing module 6, and receives the mask pattern. And the chip is divided into regions vertically and horizontally according to the impurities to be implanted using the mask, and the attribute of the mask is stored in the attribute storage means (not shown) as the attribute of the region to which the mask is applied (that is, the mask Copy attributes to masked area). When an attribute has already been set in the area to which the mask is applied, the attribute of the mask is added to this attribute (thus, a plurality of attributes are stored in the storage area corresponding to the mask application area of the attribute storage means). ). Further, the area dividing module 10 sends to the function extracting module 12 the value such as the voltage set for the function by the user sent from the position and value setting module 8.

The function extraction module 12 reads out the attribute of the area divided by the area division module 10 from the attribute storage means and determines what kind of function the area has (for example,
Whether the sensor function) is fulfilled is determined using a knowledge base described in a rule, and the value set by the user sent from the position and value setting module 8 through the area dividing module 10 is used as the function. Is set to the position of the area having.

Next, the operation of the embodiment of FIG. 1 will be described with reference to the flow chart of FIG. First, step S
1, the mask attribute is set. That is, as shown in FIG. 3, the mask processing module 6 causes the display device of the interface unit 2 to display various attributes of the mask (for example, a region to which the mask is applied becomes “electrode”, “photosensitivity”). “Having”, “become a channel”) are displayed in a menu format, and the user operates the mouse to place the cursor 20 at the position of the required attribute and click to set the mask attribute. In the example of FIG. 3, the user has selected “sensitivity”. This allows
The mask attribute is set to "light exposure".

Next, as shown in step S2, a value is set by the function name. That is, the position and value setting module 8 reads the function information storage means and displays the functions (for example, electrodes, sensors, etc.) to be performed by the area in the display device of the interface unit 2 in a menu format as shown in FIG. After displaying, the user operates the mouse to place the cursor 20 at the position of the required function and clicks it to select the function and set a value for the selected function from the keyboard. In the example of FIG.
The user selects the function "electrode V-1" and sets 5.0 V as the voltage value. In this way, the user can select the position not by the coordinates but by the function name, so that the value can be appropriately set even if the semiconductor knowledge is not sufficient and which part on the chip has what function. ..

Next, as shown in step S3, area division is performed. That is, the area dividing module 10 divides the chip into areas in the vertical and horizontal directions according to the mask pattern and the impurities implanted using the mask, and stores the mask attribute in the attribute storage means as the attribute of the area to which the mask is applied. (That is, copy the attributes of the mask to the mask application area). In FIG.
The attributes of the mask 30 (eg, photosensitivity) are copied to the mask application areas 31, 32, 33 and 34 below it. The dashed-dotted lines L1, L2, L3, and L4 in FIG. 5 are division lines before the region division is performed this time, and are indicated by the thick solid line M.
1, M2, M3 and M4 are dividing lines by this area division, and mask application areas 31, 32, 33 and 3
Reference numeral 4 is an area formed by the previous and present dividing lines.
When the attribute is already set in the mask application areas 31, 32, 33, and 34, the attribute of the mask 30 is added to this attribute (thus, a plurality of storage areas corresponding to the mask application area of the attribute storage means have a plurality of attributes). Will be stored attributes).

Next, as shown in step S4, the function is extracted and the value is set to the position corresponding to the function. That is, the function extraction module 12 reads out the attributes of the areas (for example, the mask application areas 31, 32, 33, and 34 in FIG. 5) divided in step S3 from the attribute storage unit, and determines what kind of function (for example, the area). , A sensor function) is determined by using the knowledge base described in the rule, and the value set by the user is set in the position of the area having the function. As shown in FIG. 4, when the user sets the voltage of 5.0 V on the electrode V-1, the function extraction module 12 sets the voltage of 5.0 V on the region having the function of the electrode V-1.

FIG. 6 shows an example of the function extraction rule. Figure 6
As shown in (a), the mask application area is LC
If it has S (channel stop) attribute, the area is
Judged to have a channel stop function. In addition, FIG.
As shown in (b), if the mask application area has the attribute of photosensitivity and does not have the LCS attribute, it is determined that the area has a sensor function. The function extraction module 12 can set the value set by the user at the position of the function name designated by the user by preparing the knowledge base in which the rules as shown in FIG. 6 are described and performing the function extraction.

[0020]

As is apparent from the above description, claim 1
According to the semiconductor simulation device described above, since the region to which the mask is applied is designated by its function, the user can grasp the function of the region, and thus the value can be easily set for the region. it can.

According to the semiconductor simulation apparatus of the second aspect, the function of the area to which the mask is applied is determined from the attribute set in the mask and other conditions given to the area to which the mask is applied. Since the function applies the area to which the mask is applied, the user can
Even if only the mask attribute is set, the function of the area can be grasped, so that the value can be easily set for the area.

[Brief description of drawings]

FIG. 1 is a block diagram showing a configuration of an embodiment of a semiconductor simulation device of the present invention.

FIG. 2 is a flowchart showing an operation example of the embodiment of FIG.

FIG. 3 is a display screen diagram showing an example of a mask attribute setting menu.

FIG. 4 is a display screen diagram showing a value setting menu in which a position can be designated by a function name.

FIG. 5 is an explanatory diagram showing that the attributes of the mask are copied to the mask application area as the area is divided.

FIG. 6 is a flowchart showing an example of a function extracting operation.

[Explanation of symbols]

 2 Interface part 4 Process processing module 6 Mask processing module 8 Position and value setting module 10 Area division module 12 Function extraction module

Continuation of front page (51) Int.Cl. ⁵ Identification number Office reference number FI technical display location H01L 27/14 7210-4M H01L 27/14 Z

Claims (2)

[Claims] 1. An information storage unit that stores functional information indicating a function to be performed by a region to which a mask is applied, and a processing unit that indicates the region to which the mask is applied by the functional information stored in the storage unit. A semiconductor simulation device comprising: 2. The mask according to a predetermined rule from attribute setting means for setting a mask attribute, the attribute set by the attribute setting means, and other conditions given to the area to which the mask is applied. , A function extracting unit that determines a function of an area to which the mask is applied, an information storage unit that stores function information indicating a function that may be determined by the function extracting unit, and a region to which the mask is applied is the function A semiconductor simulation device comprising: a processing unit that gives an instruction by information.