JPH0497203A - Color filter and formation thereof - Google Patents
Color filter and formation thereofInfo
- Publication number
- JPH0497203A JPH0497203A JP2212869A JP21286990A JPH0497203A JP H0497203 A JPH0497203 A JP H0497203A JP 2212869 A JP2212869 A JP 2212869A JP 21286990 A JP21286990 A JP 21286990A JP H0497203 A JPH0497203 A JP H0497203A
- Authority
- JP
- Japan
- Prior art keywords
- transparent conductive
- light shielding
- protective film
- substrate
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title description 5
- 230000001681 protective effect Effects 0.000 claims abstract description 20
- 239000004020 conductor Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 239000011521 glass Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 18
- 238000000059 patterning Methods 0.000 claims 1
- 238000000206 photolithography Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
Landscapes
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は 液晶デイスプレィ等に使用されるカラーフィ
ルタおよびその形成方法に関す４従来の技術
従来 液晶デイスプレィ等のフラットデイスプレィ用カ
ラーフィルタとして（表 特開昭６２−１３６２号公報
などが公開されていも −例としてカラーフィルタの形
成方法の工程図を第４図に示し その形成工程を以下に
述べも
（１）第４図（ａ）に示すようにガラス基板１上にスパ
ッタリング法等を用いて酸化クロム膜を製ＭＬ、、フォ
トリソグラフィー法を用いてパターニングし 遮光部２
を形成すも
（２）第４図（ｂ）に示すように着色レジストからなる
＃ 緑 青の画素３をフォトリソグラフィー法を用いて
順次形成すも
（３）第４図（ｃ）に示すように遮光部２および画素３
上に高分子樹脂からなる保護膜４を塗布そして熱処理に
より硬化し 形成すも
（４）第４図（ｄ）に示すようにスパッタリング法等を
用いて透明導電膜５を形成すも
発明が解決しようとする課題
このような従来のカラーフィルタの形成方法でＣヨ
遮光部２と画素３の段差を平滑にするため保護膜４を形
成している力（保護膜４を形成しても遮光部２と画素３
の段差のため第５図に示すように大きな段差部ができも
このた厭 保護膜４上に形成した透明導電膜５は ス
テップガバレージが悪く、断線部（第５図中Ａ部）や膜
厚の薄い部分（第５図中Ｂ部）が発生すム また保護膜
４を形成しても遮光部２と画素３の交差部に対応すると
ころでは透明導電膜５のクラック（第５図中Ｃ部）が発
生する問題があった このため透明導電膜５の抵抗が増
大し 透明導電膜５に電圧を印加する入力端子から遠く
なるほど、電圧降下が犬きくなム すなわち入力端子か
らの距離により画素３に対して印加できる電圧が大きく
異なり、輝度むら等の問題を半量 高品質で大面積のデ
イスプレィを作製するのが困難であるという課題があっ
九
本発明は上記課題を解決するもので、遮光部と画素の段
差に起因する断線 膜厚が薄くなること、クラックの発
生による透明導電膜の抵抗の増加を防ぎ、高品質な大面
積のフラットデイスプレィを実現するためのカラーフィ
ルタおよびその形成方法を提供することを目的とするも
のであム課題を解決するための手段
本発明は上記目的を達成するために 基板上に形成され
た画素上に導電性物質よりなる遮光部と透明導電膜を直
接接して設けた構成よりなム作用
本発明は上記した構成により、導電性物質よりなる遮光
部と透明導電膜が電気的に接続されているたべ 透明導
電膜の断線 膜厚が薄くなること、クラックの発生によ
る透明導電膜の抵抗の増加等が防げも
実施例
以下、本発明の一実施例を添付図面に基づいて説明すも
第１図は本発明の一実施例であるカラーフィルタの形成
方法の工程図であム
その形成方法を以下に述べも
第１図（ａ）に示すようにガラス基板１１上にまず着色
レジストからなるＲ（赤）、Ｇ（緑）、Ｂ（青）の画素
１２をフォトリソグラフィー法を用いて形成すも つぎ
に第１図（ｂ）に示すように画素１２上に保護膜１３を
塗布し そして熱処理により硬化し 形成すも その後
第１図（Ｃ）に示すようにスパッタリング法等を用いて
導電性物質（例えばＣｒ、Ａ１等）を製膜し フォトリ
ソグラフィー法を用いてパターニングし 導電性物質よ
りなる遮光部１４を形成すも 最後に第１図（ｄ）に示
すようにスパッタリング法等を用いて透明導電膜１５を
形成すも
上記の形成方法により、第２図に示すように基板１１と
画素１２の段差に起因する透明導電膜１５の断線 膜厚
が薄くなること、クラックの発生が生じてＬ 導電性物
質よりなる遮光部１４と透明導電膜１５が電気的に接続
されているため透明導電膜１５の抵抗の増加を防ぐこと
ができもまた 本実施例で（よ 導電性物質よりなる遮
光部１４を形成した微 透明導電膜１５を形成した力交
第３図に示すように透明導電膜１５を形成した抵 導
電性物質よりなる遮光部１４を形成してもよく本実施例
に限定されるものではなｔ、％また 本実施例では フ
ォトリソグラフィー法により形成した着色レジストを画
素１２として用いている力丈 印刷法等により形成した
画素でもよく本実施例に限定されるものではな（〜また
本実施例では 画素１２の上に保護膜１３を形成した
抵 導電性物質よりなる遮光部１４と透明導電Ｗ１１５
を形成している力丈 保護膜１３を形成せずに導電性物
質よりなる遮光部１４と透明導電膜１５を形成してもよ
く本実施例に限定されるものではなｔ℃
発明の効果
以上の実施例から明らかなように本発明によれば 基板
上に形成された画素上に導電性物質よりなる遮光部と透
明導電膜を直接接して設けた構成よりなるので、透明導
電膜へ 画素端部での断線膜厚が薄くなること、クラッ
クの発生 抵抗の増加等を防ぐことで、輝度むら等の無
１．Ｘ、良好な表示性能を有する高品質な大面積のデイ
スプレィ用カラーフィルタおよびその形成方法を提供で
きもDETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a color filter used in a liquid crystal display, etc., and a method for forming the same. Although Publication No. 1362/1982 has been published, as an example, a process diagram of a method for forming a color filter is shown in Fig. 4, and the forming process is described below. (1) As shown in Fig. 4 (a) A chromium oxide film is formed on a glass substrate 1 using a sputtering method or the like, and is patterned using a photolithography method.
(2) As shown in FIG. 4(b), #green and blue pixels 3 made of colored resist are sequentially formed using the photolithography method.(3) As shown in FIG. 4(c) The light shielding part 2 and the pixel 3
A protective film 4 made of a polymeric resin is applied thereon and cured by heat treatment. (4) A transparent conductive film 5 is formed using a sputtering method or the like as shown in FIG. 4(d). Problems to be Solved by the conventional method of forming color filters
The force of forming the protective film 4 to smooth the difference in level between the light shielding part 2 and the pixel 3 (even if the protective film 4 is formed, the difference between the light shielding part 2 and the pixel 3
The transparent conductive film 5 formed on the protective film 4 has poor step coverage, resulting in a large step part as shown in Fig. 5 due to the step difference. Also, even if the protective film 4 is formed, cracks in the transparent conductive film 5 (part B in FIG. There was a problem that part C) occurred.As a result, the resistance of the transparent conductive film 5 increased, and the further away from the input terminal that applies voltage to the transparent conductive film 5, the greater the voltage drop. There is a problem in that the voltage that can be applied to the pixels 3 is greatly different, and it is difficult to produce a high-quality, large-area display that reduces problems such as uneven brightness by half.The present invention solves the above problems. Color filters and their formation to prevent disconnection due to the difference in level between the light-shielding part and the pixel, reduce the film thickness, and increase the resistance of the transparent conductive film due to cracks, and realize a high-quality, large-area flat display. SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a method and method for solving the problems.The present invention provides a light shielding portion made of a conductive material and a transparent conductive film on a pixel formed on a substrate. According to the present invention, the light-shielding part made of a conductive substance and the transparent conductive film are electrically connected to each other by the above-described structure. In the following, an embodiment of the present invention will be explained based on the accompanying drawings. Fig. 1 shows a color filter according to an embodiment of the present invention. The formation method will be described below.As shown in FIG. Next, as shown in FIG. 1(b), a protective film 13 is coated on the pixel 12 and hardened by heat treatment. Then, as shown in FIG. 1(C). As shown in Fig. 1, a conductive material (for example, Cr, A1, etc.) is formed into a film using a sputtering method, and patterned using a photolithography method to form a light shielding part 14 made of a conductive material. Although the transparent conductive film 15 is formed using a sputtering method or the like as shown in FIG. Since the light shielding part 14 made of a conductive material and the transparent conductive film 15 are electrically connected, an increase in the resistance of the transparent conductive film 15 can also be prevented. In this embodiment, as shown in FIG. In this example, a colored resist formed by a photolithography method is used as the pixel 12. Pixels formed by a printing method etc. may also be used. However, the invention is not limited to this embodiment (in addition, in this embodiment, a protective film 13 is formed on the pixel 12, a light shielding part 14 made of a conductive material, and a transparent conductive W 115).
The strength of forming the protective film 13 may be formed by forming the light shielding part 14 made of a conductive material and the transparent conductive film 15. This is not limited to this embodiment. As is clear from the embodiments, according to the present invention, the light shielding part made of a conductive material and the transparent conductive film are provided directly on the pixel formed on the substrate, so that the transparent conductive film is located at the edge of the pixel. This prevents uneven brightness, etc. by preventing the film thickness from becoming thinner due to disconnection, cracking, and increasing resistance. X. We can provide a high-quality large-area display color filter with good display performance and a method for forming the same.
第１図（ａ）〜（ｄ）は本発明の一実施例のカラーフィ
ルタおよびその形成方法を示す工程断面図 第２図は第
１図（ｄ）のカラーフィルタにおける透明導電膜が段差
で断線した場合にもその下の導電性物質よりなる遮光部
で電気的に接続される様子を示す断面図 第３図は第１
図におけるカラーフィルタの遮光部と透明導電膜の形成
順序を逆にした場合の断面図 第４図（ａ）〜（ｄ）は
従来のカラーフィルタおよびその形成方法を示す工程断
面図 第５図は第４図の従来のカラーフィルタにおける
透明導電膜の断線 膜が薄くなってくることおよびクラ
ックの状態を表わす断面図であ４
１１・・・ガラス等の基板、 １２・・・画素１３・・
・保護色 １４・・・遮光部 １５・・透明導電膜
代理人の氏名 弁理士 粟野重孝 はか１名第２図
１ど
ｌ
／２FIGS. 1(a) to (d) are process cross-sectional views showing a color filter according to an embodiment of the present invention and a method of forming the same. FIG. Figure 3 is a cross-sectional view showing how even if the
A cross-sectional view when the order of formation of the light shielding part and the transparent conductive film of the color filter in the figure is reversed. Figures 4 (a) to (d) are cross-sectional views showing a conventional color filter and its formation method. Figure 5 is Figure 4 is a cross-sectional view showing the thinning of the transparent conductive film and the state of cracks in the conventional color filter.
・Protective color 14... Light shielding part 15... Name of transparent conductive film agent Patent attorney Shigetaka Awano Haka 1 person Figure 2 1/2
Claims (5)
ストからなる画素と、その画素上を含む前記基板上に形
成された保護膜と、その保護膜上にパターン形成された
導電性物質よりなる遮光部と、その遮光部上を含む前記
保護膜上に形成された透明導電膜とを有するカラーフィ
ルタ。(1) A pixel made of a colored resist patterned on a substrate such as glass, a protective film formed on the substrate including the top of the pixel, and a conductive material patterned on the protective film. A color filter including a light shielding part and a transparent conductive film formed on the protective film including the top of the light shielding part.
ストからなる画素と、その画素上を含む前記基板上に形
成された保護膜と、その保護膜上に形成された透明導電
膜と、その透明導電膜上にパターン形成された導電性物
質よりなる遮光部とを有するカラーフィルタ。(2) A pixel made of a colored resist patterned on a substrate such as glass, a protective film formed on the substrate including the pixel, a transparent conductive film formed on the protective film, and A color filter having a light shielding part made of a conductive material patterned on a transparent conductive film.
カラーフィルタ。(3) The color filter according to claim (1) or (2), which does not include a protective film.
パターン形成した後、前記基板上に直接または保護膜を
介して導電性物質よりなる遮光部をパターン形成し、続
いてその上に透明導電膜を形成するカラーフィルタの形
成方法。(4) After forming a pattern of pixels made of a colored resist on a substrate such as glass, a light shielding part made of a conductive material is formed on the substrate directly or through a protective film, and then a transparent conductive material is formed on the substrate. A method for forming a color filter that forms a film.
ーン形成した後、前記基板上に直接または保護膜を介し
て透明導電膜を形成し、その透明導電膜上に導電性物質
よりなる遮光部をパターン形成するカラーフィルタの形
成方法。(5) After patterning pixels made of colored resist on a glass substrate, a transparent conductive film is formed on the substrate directly or through a protective film, and a light shielding part made of a conductive material is formed on the transparent conductive film. A method for forming a pattern-forming color filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2212869A JPH0497203A (en) | 1990-08-10 | 1990-08-10 | Color filter and formation thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2212869A JPH0497203A (en) | 1990-08-10 | 1990-08-10 | Color filter and formation thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0497203A true JPH0497203A (en) | 1992-03-30 |
Family
ID=16629628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2212869A Pending JPH0497203A (en) | 1990-08-10 | 1990-08-10 | Color filter and formation thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0497203A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017134426A (en) * | 2017-04-21 | 2017-08-03 | 凸版印刷株式会社 | Color filter and liquid crystal display device |
-
1990
- 1990-08-10 JP JP2212869A patent/JPH0497203A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017134426A (en) * | 2017-04-21 | 2017-08-03 | 凸版印刷株式会社 | Color filter and liquid crystal display device |
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