JPH0492894A - Vapor-phase synthesized diamond of high thermal conductivity - Google Patents
Vapor-phase synthesized diamond of high thermal conductivityInfo
- Publication number
- JPH0492894A JPH0492894A JP20697690A JP20697690A JPH0492894A JP H0492894 A JPH0492894 A JP H0492894A JP 20697690 A JP20697690 A JP 20697690A JP 20697690 A JP20697690 A JP 20697690A JP H0492894 A JPH0492894 A JP H0492894A
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- thermal conductivity
- vapor
- high thermal
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010432 diamond Substances 0.000 title claims abstract description 45
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 42
- 239000012808 vapor phase Substances 0.000 title claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 13
- 239000012495 reaction gas Substances 0.000 claims abstract description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 238000003786 synthesis reaction Methods 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 abstract description 18
- 239000007789 gas Substances 0.000 abstract description 10
- 238000000034 method Methods 0.000 abstract description 8
- 238000005268 plasma chemical vapour deposition Methods 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 239000013078 crystal Substances 0.000 description 5
- 239000012071 phase Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 229910002804 graphite Inorganic materials 0.000 description 3
- 239000010439 graphite Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 238000004050 hot filament vapor deposition Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
【発明の詳細な説明】
(a)産業上の利用分野
本発明は高出力のIC,レーザーダイオード、インバッ
トダイオード等の熱の除去に有効なダイヤモンドヒート
シンクに用いる高熱伝導性気相合成ダイヤモンドに関す
る。DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Application Field The present invention relates to a highly thermally conductive vapor-phase synthetic diamond used in a diamond heat sink that is effective in removing heat from high-power ICs, laser diodes, invat diodes, and the like.
[bl従来の技術
ダイヤモンドは22W/cm−にという物質中最も高い
熱伝導度を有しており、既にこの性質を利用してレーザ
ーダイオードやインバットダイオード等の高発熱素子の
安定な動作には欠くべからざる部品となっている。ダイ
ヤモンドの熱伝導度が大きいのはフォノンによる伝導機
構によっているが、強固な結晶のためにこの伝達速度が
大きいためである。[bl Conventional technology Diamond has the highest thermal conductivity of all materials at 22 W/cm-, and this property has already been used to stabilize the operation of high heat generating elements such as laser diodes and invat diodes. It has become an indispensable part. Diamond's high thermal conductivity is due to the phonon-based conduction mechanism, which has a high speed of transmission due to its strong crystal structure.
これまでこのようなダイヤモンドの性質を利用できるの
は単結晶を超高圧技術で作製して初めて可能となってい
た。すなわち、焼結ダイヤモンドでは超高圧技術でも多
量の結合物質を入れる必要があり、高熱伝導率は実現で
きなかったからである。このような単結晶を用いている
限り、大きさや価格上の制限によって実用範囲が極めて
狭い領域に限定されてしまう。Until now, it was only possible to take advantage of these properties of diamond by creating single crystals using ultra-high pressure technology. In other words, sintered diamond requires the addition of a large amount of bonding material even with ultra-high pressure technology, making it impossible to achieve high thermal conductivity. As long as such a single crystal is used, its practical range is limited to an extremely narrow range due to size and cost limitations.
tc+発明が解決しようとする課題
人工合成ダイヤモンドは含有窒素量を一定量以下とする
ことによって、上述の高い熱伝導率に近いものを製造す
ることが出来る。熱伝導度をさらに向上させるためには
結晶格子に存在する原子量の異なる原子の存在を減少さ
ることが必要である。Problems to be Solved by the tc+ Invention Artificially synthesized diamonds can be manufactured to have a high thermal conductivity close to the above-described high thermal conductivity by controlling the nitrogen content to a certain amount or less. In order to further improve thermal conductivity, it is necessary to reduce the presence of atoms with different atomic weights present in the crystal lattice.
天然の炭素は約1%の1sCを含んでおり、これも不純
物としてフォノンの散乱を起こし、熱伝導度の低下の原
因となっていることが知られている。Natural carbon contains about 1% of 1sC, which is also known to cause phonon scattering as an impurity and cause a decrease in thermal conductivity.
ダイヤモンドの熱伝導度にとっては他の不純物原子の存
在も重要な要因となるために、これらの含有量も最小限
とする必要がある。Since the presence of other impurity atoms is also an important factor for the thermal conductivity of diamond, the content of these atoms must also be minimized.
ダイヤモンドの気相合成技術はダイヤモンドの利用方法
を根本的に変革する技術として注目を集めている。従来
の超高圧技術では粒子状のダイヤモンドしか出来なかっ
たのに対して、気相合成技術では膜状のダイヤモンドを
得る事が可能である。Diamond vapor phase synthesis technology is attracting attention as a technology that will fundamentally change the way diamonds are used. While conventional ultra-high pressure technology could only produce diamond in the form of particles, vapor phase synthesis technology can produce diamond in the form of a film.
また、大きな面積や平面以外の形状にも形成できる。こ
れまで報告されてきた気相合成ダイヤモンドの性質は、
はぼ純粋なダイヤモンドである■a型のダイヤモンドと
同じとされている。しかし、熱伝導率に関しては16W
/Cm−に以下であると報告されている。この原因は通
常ではlsCが1%程度混入していることと、ダイヤモ
ンド以外の相が混入していることである。後者について
は極微量のグラファイト相もラマン分光法によってその
存在を評価することが可能である。Further, it can be formed in a large area or in a shape other than a plane. The properties of vapor-phase synthetic diamonds that have been reported so far are as follows:
It is said to be the same as Type A diamond, which is a very pure diamond. However, the thermal conductivity is 16W.
/Cm- is reported to be below. This is caused by the fact that approximately 1% of lsC is usually mixed in, and that phases other than diamond are mixed in. Regarding the latter, it is possible to evaluate the presence of even trace amounts of graphite phase by Raman spectroscopy.
(di課題を解決するための手段
気相合成技術によるダイヤモンドの作製に当たり、反応
ガスの中の炭素を12CもしくはlsCのどちらかとす
る。これはメタンに代表される原料ガスをどちらかの同
位体のみとなるように精製されたものとすることである
が、99.9%以上の純度とすることが必要である。(Means for solving the problem) When producing diamond using vapor phase synthesis technology, the carbon in the reaction gas is either 12C or IsC. The purity must be 99.9% or higher.
また、格子中に入り込める元素として窒素原子の混入を
制限する必要があるか、従来のダイヤモンドより有意に
高い熱伝導を得る為には異相の存在をも限定するために
、反応ガス中の窒素濃度を限定することを考えるに至っ
た。発明者らはこの限度について実験により確認したと
ころ、窒素の含有量が20ppm以下であることを発見
した。In addition, it is necessary to limit the incorporation of nitrogen atoms as an element that can enter the lattice, or to limit the presence of foreign phases in order to obtain significantly higher thermal conductivity than conventional diamond, the nitrogen concentration in the reaction gas must be I came to think of limiting the The inventors confirmed this limit through experiments and found that the nitrogen content was 20 ppm or less.
合成したダイヤモンドはグラファイト相がないことか好
ましいが、既出願(特願平1−51486)に示される
ようにグラファイト/ダイヤモンドのピーク比が0.0
5以下であるようであれば高熱伝導度が得られる。It is preferable that the synthesized diamond has no graphite phase, but as shown in the existing application (Japanese Patent Application No. 1-51486), the graphite/diamond peak ratio is 0.0.
If it is 5 or less, high thermal conductivity can be obtained.
(e1作用
上記のような条件で作製したダイヤモンド膜はl1IC
やSSCの純度は99.9%以上であり、Nの含有量は
数ppm以下となる。このように高純度のダイヤモンド
膜を形成できることから、高熱伝導度のダイヤモンドが
得られる。(e1 effect) The diamond film produced under the above conditions has l1IC
The purity of SSC is 99.9% or more, and the N content is several ppm or less. Since a diamond film of high purity can be formed in this way, diamond with high thermal conductivity can be obtained.
1ICと110ではフォノンエネルギーの観点から12
0が好ましいと考えられるが、いずれの場合にも従来の
純粋なダイヤモンド(IIa型)よりも有意に高熱伝導
率であることがわかった。1IC and 110 are 12 from the viewpoint of phonon energy.
0 is considered preferable, but in both cases it was found to have significantly higher thermal conductivity than conventional pure diamond (type IIa).
以上のような高熱伝導性気相合成ダイヤモンドは熱伝導
率が25W/Cm−に以上の値を有し、高出力のIC,
レーザーダイオード、インバットダイオード等の熱除去
に極めて有効であることがわかった。The high thermal conductivity vapor-phase synthetic diamond described above has a thermal conductivity of 25 W/Cm- or more, and is suitable for high-output ICs,
It was found to be extremely effective in removing heat from laser diodes, invat diodes, etc.
(f)実施例
実施例1
99.95%の”Cよりなるメタンガスを原料にして、
公知のマイクロ波プラズマCVDを用いてダイヤモンド
膜を形成した。このときメタン、水素の純度は9吐 9
999%及び99.99999%であった。反応ガスの
中に含まれる窒素の量をガスクロマトグラフィーで精密
に測定したところ、窒素の含有量は8ppmであった。(f) Examples Example 1 Using methane gas consisting of 99.95% "C" as a raw material,
A diamond film was formed using known microwave plasma CVD. At this time, the purity of methane and hydrogen is 9.
999% and 99.99999%. When the amount of nitrogen contained in the reaction gas was precisely measured by gas chromatography, the nitrogen content was 8 ppm.
メタンと水素の比率を1:100としてダイヤモンド砥
粒で傷を付けたシリコンウェハーを基板として500時
間の合成で約500μmの厚さのダイヤモンド膜を作製
した。酸によって基板を除去した後で研磨加工によって
300μmの厚さとした。A diamond film with a thickness of about 500 μm was produced by synthesis for 500 hours using a silicon wafer scratched with diamond abrasive as a substrate with a methane:hydrogen ratio of 1:100. After removing the substrate with acid, it was polished to a thickness of 300 μm.
この膜の熱伝導率を測定したところ30W/cm−にで
あった。The thermal conductivity of this film was measured and found to be 30 W/cm.
実施例2
実施例1と同様にして120の含有量を表1としたメタ
ンガスを使用してダイヤモンド膜を作製した。この膜の
熱伝導率を表1に示す。Example 2 A diamond film was produced in the same manner as in Example 1 using methane gas containing 120 as shown in Table 1. Table 1 shows the thermal conductivity of this film.
!20の含有率(%) 熱伝導率(W/cm4)99
.5 16
99.8 18
99.9 25
99.92 29
99.95 30
99、 99 335実施例3
実施例1と同様にして99.95%の”C炭素を含むメ
タンガスから表2のような窒素含有量の原料ガスとして
ダイヤモンド膜を作製した。得られたダイヤモンドの熱
伝導度を表2に示す。! Content rate (%) of 20 Thermal conductivity (W/cm4) 99
.. 5 16 99.8 18 99.9 25 99.92 29 99.95 30 99, 99 335Example 3 In the same manner as in Example 1, nitrogen as shown in Table 2 was extracted from methane gas containing 99.95% "C" carbon. A diamond film was prepared using a raw material gas containing a certain amount.The thermal conductivity of the obtained diamond is shown in Table 2.
窒素含有量(s+pm) 熱伝導率(W/cm−K
)実施例4
公知の熱フイラメントCVD法によって99゜92%の
IBCを含有するメタンガスからダイヤモンド膜を形成
した。この場合フィラメントはタングステンを線の0.
2mmΦを使用して、フィラメント温度は2080℃と
して基板温度950℃に保持した。反応ガス中の窒素の
含有量は10ppmであった。メタン濃度1.2%で6
00時間の合成で450μmの膜を作製して、基板除去
後に研磨加工で300μmの厚さとした。この膜の熱伝
導率は25W/Cm−にであった。Nitrogen content (s+pm) Thermal conductivity (W/cm-K
) Example 4 A diamond film was formed from methane gas containing 99.92% IBC by a known hot filament CVD method. In this case, the filament is made of tungsten.
Using 2 mmΦ, the filament temperature was 2080°C and the substrate temperature was maintained at 950°C. The nitrogen content in the reaction gas was 10 ppm. 6 at methane concentration 1.2%
A film of 450 μm was produced by synthesis for 00 hours, and after removing the substrate, the film was polished to a thickness of 300 μm. The thermal conductivity of this film was 25 W/Cm-.
(g1発明の効果
以上のように厳密に不純物の混入を制限したダイヤモン
ドは気相合成法であれば作製が可能である。プラズマC
VD、熱フィラメントCVD、プラズマジェット法、火
炎法などの公知の技術で対応が可能である。ただし、プ
ラグ、フジエツト法や火炎法においては空気中で合成す
ることは窒素の含有を制御できないために適当ではない
。(G1 Diamond with strictly limited impurity inclusion as described above can be produced using the vapor phase synthesis method. Plasma C
This can be done using known techniques such as VD, hot filament CVD, plasma jet method, and flame method. However, in the plug, fuget, and flame methods, synthesis in air is not appropriate because the nitrogen content cannot be controlled.
これらの気相合成技術に用いる原料ガスは特許請求の範
囲を満足すれば問題はなく、メタン、エタン、アセチレ
ン、アルコール、ケトン、ベンゼン、Co、CCl2等
の炭素含有ガスは原料とじての効果に変わりはない。There is no problem with the raw material gas used in these gas phase synthesis techniques as long as it satisfies the scope of the claims, and carbon-containing gases such as methane, ethane, acetylene, alcohol, ketone, benzene, Co, and CCl2 have no effect as raw materials. There is no difference.
また、高純度のダイヤモンド膜を形成する手段として一
般的な酸素あるいは水等を反応ガスに添加することも本
発明の効果を利用するのに有効である。Furthermore, it is also effective to utilize the effects of the present invention to add general oxygen, water, or the like to the reaction gas as a means of forming a high-purity diamond film.
このような高熱伝導度を利用するには以下の3つの方法
が考えられる。The following three methods can be considered to utilize such high thermal conductivity.
■多結晶のダイヤモンドを形成してこれを基板から除去
して使用する
■高放熱性の金属、セラミックスの上に多結晶ダイヤモ
ンド膜を形成し使用する。■Form polycrystalline diamond and remove it from the substrate for use.■Form and use polycrystalline diamond film on highly heat dissipating metals or ceramics.
■従来の単結晶ダイヤモンドの上に形成して使用する。■It is used by forming it on top of conventional single crystal diamond.
Claims (1)
に際しその反応ガスは、炭素の99.9%以上が炭素の
同位体である^1^2Cもしくは^1^8Cで、窒素の
含有量が20ppm以下であることを特徴とする高熱伝
導性気相合成ダイヤモンド。(1) When forming a diamond film using vapor phase synthesis technology, the reaction gas is carbon isotope ^1^2C or^1^8C, in which 99.9% or more of the carbon is carbon, and the nitrogen content is A highly thermally conductive vapor-phase synthetic diamond characterized by having a content of 20 ppm or less.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20697690A JPH0492894A (en) | 1990-08-03 | 1990-08-03 | Vapor-phase synthesized diamond of high thermal conductivity |
EP19910113034 EP0469626B1 (en) | 1990-08-03 | 1991-08-02 | Chemical vapor deposition method of high quality diamond |
DE1991629314 DE69129314T2 (en) | 1990-08-03 | 1991-08-02 | CVD process for the production of diamond |
ZA916142A ZA916142B (en) | 1990-08-03 | 1991-08-05 | Chemical vapor deposition method of high quality diamond |
US08/115,783 US6162412A (en) | 1990-08-03 | 1993-09-03 | Chemical vapor deposition method of high quality diamond |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20697690A JPH0492894A (en) | 1990-08-03 | 1990-08-03 | Vapor-phase synthesized diamond of high thermal conductivity |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0492894A true JPH0492894A (en) | 1992-03-25 |
Family
ID=16532116
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20697690A Pending JPH0492894A (en) | 1990-08-03 | 1990-08-03 | Vapor-phase synthesized diamond of high thermal conductivity |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPH0492894A (en) |
ZA (1) | ZA916142B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009502705A (en) * | 2005-07-21 | 2009-01-29 | アポロ ダイヤモンド,インク | Separation of growing diamond from diamond seed mosaic |
WO2013031907A1 (en) | 2011-09-02 | 2013-03-07 | 住友電気工業株式会社 | Single crystal diamond and method for producing same |
JP2013514959A (en) * | 2009-12-22 | 2013-05-02 | エレメント シックス リミテッド | Synthetic CVD diamond |
JP2014148463A (en) * | 2005-04-15 | 2014-08-21 | Sumitomo Electric Ind Ltd | Single crystal diamond and production method thereof |
-
1990
- 1990-08-03 JP JP20697690A patent/JPH0492894A/en active Pending
-
1991
- 1991-08-05 ZA ZA916142A patent/ZA916142B/en unknown
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014148463A (en) * | 2005-04-15 | 2014-08-21 | Sumitomo Electric Ind Ltd | Single crystal diamond and production method thereof |
JP2009502705A (en) * | 2005-07-21 | 2009-01-29 | アポロ ダイヤモンド,インク | Separation of growing diamond from diamond seed mosaic |
JP2013514959A (en) * | 2009-12-22 | 2013-05-02 | エレメント シックス リミテッド | Synthetic CVD diamond |
WO2013031907A1 (en) | 2011-09-02 | 2013-03-07 | 住友電気工業株式会社 | Single crystal diamond and method for producing same |
US9725826B2 (en) | 2011-09-02 | 2017-08-08 | Sumitomo Electric Industries, Ltd. | Single-crystal diamond and manufacturing method thereof |
Also Published As
Publication number | Publication date |
---|---|
ZA916142B (en) | 1992-05-27 |
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