JPH049169B2 - - Google Patents
Info
- Publication number
- JPH049169B2 JPH049169B2 JP59211700A JP21170084A JPH049169B2 JP H049169 B2 JPH049169 B2 JP H049169B2 JP 59211700 A JP59211700 A JP 59211700A JP 21170084 A JP21170084 A JP 21170084A JP H049169 B2 JPH049169 B2 JP H049169B2
- Authority
- JP
- Japan
- Prior art keywords
- hydro
- reaction
- dihalosilane
- organo
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 30
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 claims description 29
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 20
- 229910021529 ammonia Inorganic materials 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 12
- 125000000962 organic group Chemical group 0.000 claims description 11
- 239000002879 Lewis base Substances 0.000 claims description 10
- 150000007527 lewis bases Chemical class 0.000 claims description 10
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 10
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 claims description 5
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 5
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003118 aryl group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 239000002585 base Substances 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000005270 trialkylamine group Chemical group 0.000 claims description 2
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000002994 raw material Substances 0.000 description 10
- 239000000919 ceramic Substances 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 229920001709 polysilazane Polymers 0.000 description 8
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- -1 medityl Chemical group 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 125000004122 cyclic group Chemical group 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000001757 thermogravimetry curve Methods 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- YWWDBCBWQNCYNR-UHFFFAOYSA-N trimethylphosphine Chemical compound CP(C)C YWWDBCBWQNCYNR-UHFFFAOYSA-N 0.000 description 4
- AFABGHUZZDYHJO-UHFFFAOYSA-N 2-Methylpentane Chemical compound CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 3
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229930195733 hydrocarbon Natural products 0.000 description 3
- 239000005048 methyldichlorosilane Substances 0.000 description 3
- 150000001367 organochlorosilanes Chemical class 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- GXDHCNNESPLIKD-UHFFFAOYSA-N 2-methylhexane Natural products CCCCC(C)C GXDHCNNESPLIKD-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- HZHUAESPXGNNFV-UHFFFAOYSA-N diethyl(methyl)phosphane Chemical compound CCP(C)CC HZHUAESPXGNNFV-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- LEMQFDHLRUSMPZ-UHFFFAOYSA-N ethyl(dimethyl)phosphane Chemical compound CCP(C)C LEMQFDHLRUSMPZ-UHFFFAOYSA-N 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- GDOPTJXRTPNYNR-UHFFFAOYSA-N methylcyclopentane Chemical compound CC1CCCC1 GDOPTJXRTPNYNR-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 2
- HTDIUWINAKAPER-UHFFFAOYSA-N trimethylarsine Chemical compound C[As](C)C HTDIUWINAKAPER-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- PZHIWRCQKBBTOW-UHFFFAOYSA-N 1-ethoxybutane Chemical compound CCCCOCC PZHIWRCQKBBTOW-UHFFFAOYSA-N 0.000 description 1
- AWBIJARKDOFDAN-UHFFFAOYSA-N 2,5-dimethyl-1,4-dioxane Chemical compound CC1COC(C)CO1 AWBIJARKDOFDAN-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical class CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- NHTMVDHEPJAVLT-UHFFFAOYSA-N Isooctane Chemical compound CC(C)CC(C)(C)C NHTMVDHEPJAVLT-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N alpha-methyl toluene Natural products CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000005915 ammonolysis reaction Methods 0.000 description 1
- 229910000074 antimony hydride Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 150000001555 benzenes Chemical class 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229950005228 bromoform Drugs 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 125000000490 cinnamyl group Chemical group C(C=CC1=CC=CC=C1)* 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000002592 cumenyl group Chemical group C1(=C(C=CC=C1)*)C(C)C 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- PFMKUUJQLUQKHT-UHFFFAOYSA-N dichloro(ethyl)silicon Chemical compound CC[Si](Cl)Cl PFMKUUJQLUQKHT-UHFFFAOYSA-N 0.000 description 1
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 description 1
- JVSWJIKNEAIKJW-UHFFFAOYSA-N dimethyl-hexane Natural products CCCCCC(C)C JVSWJIKNEAIKJW-UHFFFAOYSA-N 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical class C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- GNVRJGIVDSQCOP-UHFFFAOYSA-N n-ethyl-n-methylethanamine Chemical compound CCN(C)CC GNVRJGIVDSQCOP-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- PORFVJURJXKREL-UHFFFAOYSA-N trimethylstibine Chemical compound C[Sb](C)C PORFVJURJXKREL-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004078 waterproofing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、特にセラミツク原料としてすぐれた
特性を有する高分子量のポリオルガノ(ヒドロ)
シラザンを高収率で製造する方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention is directed to high molecular weight polyorgano(hydro) which has excellent properties especially as a raw material for ceramics.
The present invention relates to a method for producing silazane in high yield.
これまで、ポリシラザンは、メチルジクロロシ
ランのようなオルガノクロロシラン類を非反応性
溶媒中で乾燥アンモニアと反応させて製造されて
いる。ところが、この方法で得られる重合物は、
低重合度の環状体であるために、空気中の水分等
で加水分解を受けやすく、又、高温焼成時に蒸発
損失が大きく、セラミツク原料としては好ましく
なかつた。さらに、この製造法には収率が低いと
いう欠点があつた。そこで、このような低重合度
の環状体を原料とし、粘土質固体触媒の存在下で
100〜300℃に加熱して環状体を開環させて重合さ
せ、高分子量のポリシラザンを製造する方法が提
案されている(特開昭54−93100)が、この方法
では不溶性で固いポリマーが生成し、セラミツク
原料、ポリマー硬化剤や表面処理剤としては好ま
しくない。
Traditionally, polysilazane has been made by reacting organochlorosilanes such as methyldichlorosilane with dry ammonia in a non-reactive solvent. However, the polymer obtained by this method is
Since it is a cyclic body with a low degree of polymerization, it is easily hydrolyzed by moisture in the air, and also suffers from large evaporation loss during high-temperature firing, making it undesirable as a raw material for ceramics. Furthermore, this production method had the drawback of low yield. Therefore, using such a cyclic body with a low degree of polymerization as a raw material, in the presence of a clay solid catalyst,
A method has been proposed for producing high-molecular-weight polysilazane by heating to 100 to 300°C to open the ring and polymerize it (Japanese Patent Application Laid-Open No. 1983-93100), but this method produces an insoluble and hard polymer. However, it is not preferred as a ceramic raw material, polymer curing agent, or surface treatment agent.
一方、オルガノクロロシラン類を乾燥アンモニ
アと反応させた後、塩化アンモニウムを分離除去
して得た低重合度の環状シラザンに、さらに
KH、NaHなどの触媒を用いる方法が提案され
ている〔サスエスら(P.Seyferth et al);コミ
ニユケイシヨンズ オブ ザ アメリカン セラ
ミツク ソサエテイ(Communications of the
American Ceramic Society)C−132(6)1984〕。
この方法によると高分子量のはしご状ポリシラザ
ンが得られるが、オルガノクロロシラン類から
出発して2段階の製造工程を経なければならな
い、この間の収率は最高でも84%である、引
火性の高い溶媒や発火性の大きい触媒や乾燥剤を
使用しなければならない、使用する触媒や触媒
失活剤が高価であり再使用できない、という欠点
がある。 On the other hand, after reacting organochlorosilanes with dry ammonia, ammonium chloride is separated and removed to obtain a cyclic silazane with a low degree of polymerization.
A method using catalysts such as KH and NaH has been proposed [P. Seyferth et al; Communications of the American Ceramics Society].
American Ceramic Society) C-132(6)1984].
This method yields a ladder-like polysilazane with a high molecular weight, but it requires a two-step production process starting from organochlorosilanes, during which the yield is at most 84%, and a highly flammable solvent is used. Disadvantages include the need to use highly flammable catalysts and desiccants, and the catalysts and catalyst deactivators used are expensive and cannot be reused.
従つて、本発明は、セラミツク原料、特に窒化
珪素/炭化珪素体を効率よく製造できる原料とし
て用いるのに適した高分子量のポリオルガノ(ヒ
ドロ)シラザンを、高価な触媒を用いなくとも高
収率で製造できる方法を提供するものである。
Therefore, the present invention provides a high molecular weight polyorgano(hydro)silazane suitable for use as a raw material for ceramics, particularly as a raw material for efficiently producing silicon nitride/silicon carbide bodies, in high yield without using an expensive catalyst. The present invention provides a manufacturing method.
本発明は、オルガノハロシラン類がルイス塩基
と借体(ルイス塩)を形成すること〔キヤンプベ
ル・フアーガソンら(H.J.Campbell−
Furgusonet al.)、J.Chem.Soc.(A)1508−1514、
1966〕に注目し、オルガノハロシラン類として、
分子内に水素原子を1個有するオルガノ(ヒド
ロ)ジハロシランを用いた上記錯体を反応原料と
して用いると、セラミツク原料用に特に適した高
分子量のポルオルガノシラザンが得られるとの知
見に基づくものである。
The present invention is based on the fact that organohalosilanes form a borrowing body (Lewis salt) with a Lewis base [HJCampbell et al.
Furgusonet al.), J.Chem.Soc.(A)1508−1514,
1966], as organohalosilanes.
This is based on the knowledge that when the above-mentioned complex using an organo(hydro)dihalosilane having one hydrogen atom in the molecule is used as a reaction raw material, a polyorganosilazane with a high molecular weight particularly suitable for ceramic raw materials can be obtained. .
すなわち、本発明は、オルガノ(ヒドロ)ジハ
ロシランとルイス塩基との借体に乾燥アンモニア
を反応させることを特徴とするポリオルガノ(ヒ
ドロ)シラザンの製造方法を提供するものであ
る。 That is, the present invention provides a method for producing polyorgano(hydro)silazane, which is characterized by reacting a matrix of organo(hydro)dihalosilane and a Lewis base with dry ammonia.
本発明で用いるオルガノ(ヒドロ)ジハロシラ
ンは、次の一般式():
(式中、Rはアルキル基、アリール基又は前記以
外でSiに直結する原子が炭素である基、Xはハロ
ゲンを示す。)
で表わされるものである。これらのうち、Rとし
ては、通常炭素数が1〜7、好ましくは1〜5、
さらに好ましくは1〜2のアルキル基、2〜7の
アルケニル基、5〜7のシクロアルキル基、アリ
ール基であり、Xとしては通常フツ素、塩素、臭
素及びヨウ素好ましくは塩素のものが使用され
る。アリール基としてはフエニル、トリル、キシ
リル、メジチル、クメニル、ベンジル、フエネチ
ル、α−メチルベンジル、ベンズヒドリル、トリ
チル、スチリル、シンナミル、ビフエニル、ナフ
チル等を使用することができる。このうちでも、
特にメチル(ヒドロ)ジクロロシラン、エチル
(ヒドロ)ジクロロシラン、ビニル(ヒドロ)シ
ラン、アリル(ヒドロ)シラン、フエニル(ヒド
ロ)ジクロロシラン、ベンジル(ヒドロ)シラン
等が好ましい。本発明においては、分子内に水素
原子を1個有する前記一般式()の化合物を用
いることが特に重要であり、分子内に水素原子を
1個も有しないジフエニルジクロロシランを用い
たのでは本発明の目的が達せられないのである。 The organo(hydro)dihalosilane used in the present invention has the following general formula (): (In the formula, R is an alkyl group, an aryl group, or a group other than the above in which the atom directly bonded to Si is carbon, and X is a halogen.) Among these, R usually has 1 to 7 carbon atoms, preferably 1 to 5 carbon atoms,
More preferred are 1-2 alkyl groups, 2-7 alkenyl groups, 5-7 cycloalkyl groups, and aryl groups, and X is usually fluorine, chlorine, bromine, and iodine, preferably chlorine. Ru. As the aryl group, phenyl, tolyl, xylyl, medityl, cumenyl, benzyl, phenethyl, α-methylbenzyl, benzhydryl, trityl, styryl, cinnamyl, biphenyl, naphthyl, etc. can be used. Among these,
Particularly preferred are methyl(hydro)dichlorosilane, ethyl(hydro)dichlorosilane, vinyl(hydro)silane, allyl(hydro)silane, phenyl(hydro)dichlorosilane, benzyl(hydro)silane, and the like. In the present invention, it is particularly important to use a compound of the general formula () having one hydrogen atom in the molecule; Therefore, the purpose of the present invention cannot be achieved.
本発明で用いるルイス塩基としては、オルガノ
(ヒドロ)ジハロシランと借体(ルイス塩)を形
成する反応以外の反応をしないで、さらに生成し
た借体がアンモニアで分解できるものが対象とさ
れる。例えば、3級アミン類(トリメチルアミ
ン、ジメチルエチルアミン、ジエチルメチルアミ
ン、及びトリエチルアミン等のトリアルキルアミ
ン、ピリジン、ピコリン、ジメチルアニリン及び
これらの誘導体)、フオスフイン、スチビン、ア
ルシン及びこれらの誘導体等(例えばトリメチル
フオスフイン、ジメチルエチルフオスフイン、メ
チルジエチルフオスフイン、トリエチルフオスフ
イン、トリメチルアルシン、トリメチルスチビ
ン、トリメチルアミン、トリエチルアミン等)を
挙げることができる。又、低沸点でアンモニアよ
り塩基性の小さい塩基(例えばピリジン、ピコリ
ン、トリメチルフオスフイン、ジメチルエチルフ
オスフイン、メチルジエチルフオスフイン、トリ
エチルフオスフイン)が好ましい。さらに、取り
扱いやすさ、経済性の点からピリジン又はピコリ
ンが好ましい。オルガノ(ヒドロ)ジハロシラン
に対するルイス塩基の量は、モル比で0.5以上、
好ましくは1.0以上、より好ましくは1.5以上とす
るのがよい。 The Lewis base used in the present invention is one that does not undergo any reaction other than the reaction that forms a borrowed body (Lewis salt) with an organo(hydro)dihalosilane, and can further decompose the formed borrowed body with ammonia. For example, tertiary amines (trialkylamines such as trimethylamine, dimethylethylamine, diethylmethylamine, and triethylamine, pyridine, picoline, dimethylaniline, and derivatives thereof), phosphine, stibine, arsine, and derivatives thereof (such as trimethylphosphine, phine, dimethylethylphosphine, methyldiethylphosphine, triethylphosphine, trimethylarsine, trimethylstibine, trimethylamine, triethylamine, etc.). Further, bases having a low boiling point and less basicity than ammonia (eg, pyridine, picoline, trimethylphosphine, dimethylethylphosphine, methyldiethylphosphine, triethylphosphine) are preferable. Furthermore, pyridine or picoline is preferable from the viewpoint of ease of handling and economy. The amount of Lewis base to organo(hydro)dihalosilane is 0.5 or more in molar ratio,
It is preferably 1.0 or more, more preferably 1.5 or more.
本発明では、上記のオルガノ(ヒドロ)ジハロ
シランにルイス塩基を付加させて借体(ルイス
塩)を形成させるが、その際、反応溶媒として
は、ルイス塩基単独、あるいは非反応性溶媒とル
イス塩基との混合物を用いるのがよい。非反応性
溶媒としては、脂肪族炭化水素、脂環式炭化水
素、芳香族炭化水素の炭化水素溶媒、ハロゲン化
メタン、ハロゲン化エタン、ハロゲン化ベンゼン
等のハロゲン化炭化水素、脂肪族エーテル、脂環
式エーテル等のエーテル類が使用できる。 In the present invention, a Lewis base is added to the above organo(hydro)dihalosilane to form a borrowing element (Lewis salt). At this time, the reaction solvent may be a Lewis base alone or a non-reactive solvent and a Lewis base. It is better to use a mixture of Non-reactive solvents include hydrocarbon solvents such as aliphatic hydrocarbons, alicyclic hydrocarbons, and aromatic hydrocarbons, halogenated hydrocarbons such as halogenated methane, halogenated ethane, and halogenated benzene, aliphatic ethers, and aliphatic hydrocarbons. Ethers such as cyclic ethers can be used.
好ましい溶媒は、塩化メチレン、クロロホル
ム、四塩化炭素、ブロモホルム、塩化エチレン、
塩化エチリデン、トリクロロエタン、テトラクロ
ロエタン等のハロゲン化炭化水素、エチルエーテ
ル、イソプロピルエーテル、エチルブチルエーテ
ル、ブチルエーテル、1,2−ジオキシエタン、
ジオキサン、ジメチルジオキサン、テトラヒドロ
フラン、テトラヒドロピラン等のエーテル類、ペ
ンタン、ヘキサン、イソヘキサン、メチルペンタ
ン、ヘプタン、イソヘプタン、オクタン、イソオ
クタン、シクロペンタン、メチルシクロペンタ
ン、シクロヘキサン、メチルシクロヘキサン、ベ
ンゼン、トルエン、キシレン、エチルベンゼン等
の炭化水素である。これらの溶媒のうち、安全性
などの点から、ジクロロメタンやピリジンが特に
好ましい。溶媒中のオルガノ(ヒドロ)ジハロシ
ランの濃度は任意とすることができるが、1〜15
重量%(以下、%と略称する)の範囲とするのが
よい。又借体を形成させる条件としては、温度は
反応系が液体となる範囲ならいずれでもよいが好
ましくは常温であり、圧力は常圧がよい。反応は
極めて速いので反応時間を任意に定めることがで
きる。 Preferred solvents are methylene chloride, chloroform, carbon tetrachloride, bromoform, ethylene chloride,
Halogenated hydrocarbons such as ethylidene chloride, trichloroethane, tetrachloroethane, ethyl ether, isopropyl ether, ethyl butyl ether, butyl ether, 1,2-dioxyethane,
Ethers such as dioxane, dimethyldioxane, tetrahydrofuran, tetrahydropyran, pentane, hexane, isohexane, methylpentane, heptane, isoheptane, octane, isooctane, cyclopentane, methylcyclopentane, cyclohexane, methylcyclohexane, benzene, toluene, xylene, ethylbenzene Hydrocarbons such as Among these solvents, dichloromethane and pyridine are particularly preferred from the viewpoint of safety. The concentration of organo(hydro)dihalosilane in the solvent can be arbitrary, but is between 1 and 15
It is preferably within the range of weight % (hereinafter abbreviated as %). Further, as conditions for forming a borrow body, the temperature may be any range as long as the reaction system becomes liquid, but preferably room temperature and normal pressure are preferable. Since the reaction is extremely fast, the reaction time can be set arbitrarily.
次に、このようにして製造した借体に乾燥アン
モニアを反応させて加安分解(アンモノリシス)
を行なわせる。この際使用するアンモニアは気体
でも液体でもよい。アンモニアの乾燥は、例えば
固体水酸化ナトリウムに通した後、金属ナトリウ
ムに通すなどの方法により行なうのがよい。アン
モニアの添加量は、オルガノ(ヒドロ)ジハロシ
ランに対して、モル比で0.5〜20倍、好ましくは
4〜15倍、より好ましくは5〜10倍とするのがよ
い。反応溶媒、反応温度、反応圧力、時間とも借
体形成時の条件と同じでよい。又、反応系中の水
分量は、例えば500ppm以下とするのが望ましい。
反応終了後、遠心分離などの常用手段を用いてポ
リシラザンを分離する。得られたポリシラザン
は、一般式():
(式中、Rは式(1)と同じ意味を有する。)
で表わされる構成単位を有するものであり、重合
度が4〜1700のものである。 Next, the borrowed body produced in this way is reacted with dry ammonia to perform ammonolysis.
have them do it. The ammonia used at this time may be either gas or liquid. Ammonia is preferably dried by, for example, passing it through solid sodium hydroxide and then passing it through metallic sodium. The amount of ammonia added is preferably 0.5 to 20 times, preferably 4 to 15 times, and more preferably 5 to 10 times the molar ratio of organo(hydro)dihalosilane. The reaction solvent, reaction temperature, reaction pressure, and time may be the same as those for forming the borrow body. Further, it is desirable that the amount of water in the reaction system is, for example, 500 ppm or less.
After the reaction is complete, polysilazane is separated using conventional means such as centrifugation. The obtained polysilazane has the general formula (): (In the formula, R has the same meaning as in formula (1).) It has a structural unit represented by the following and has a degree of polymerization of 4 to 1,700.
本発明の製造方法によれば、加熱減量が少な
く、高温強度の高いセラミツク減量が高収量で得
られるが、このほかにも種々の利点が得られるの
である。つまり、本発明の方法によつて製造した
ポリシランをポリエステル樹脂やエポキシ樹脂等
の硬化剤として用いると、引張り強度及び熱安定
性を向上させることができる。又、コーテイング
剤として用いると、耐摩耗性、防水加工性及び耐
酸性を向上できる。
According to the manufacturing method of the present invention, ceramics with low heat loss and high high temperature strength can be obtained in high yields, and various other advantages are also obtained. That is, when the polysilane produced by the method of the present invention is used as a curing agent for polyester resins, epoxy resins, etc., the tensile strength and thermal stability can be improved. Furthermore, when used as a coating agent, it can improve abrasion resistance, waterproofing properties, and acid resistance.
従つて、本発明の方法によつて製造されたポリ
シラザンは、シリコンカーバイト、窒化物などの
原料、各種合成樹脂用の硬化剤、コーテイング
剤、撥水剤、シリコンゴムの安定剤、フイルム等
極めて広範囲に使用されるのである。 Therefore, the polysilazane produced by the method of the present invention can be used as raw materials such as silicon carbide and nitrides, curing agents for various synthetic resins, coating agents, water repellents, stabilizers for silicone rubber, films, etc. It is used extensively.
さらに、本発明は、高分子量のポリオルガノ
(ヒドロ)シラザンを得る方法において、その製
造工程を簡略化したものである。即ち、従来、高
分子量のポリシラザンを得る場合、一旦、低重合
度の環状体を製造し、これを更に別工程で重合さ
せることが必要であつたのに対し、本発明の方法
では、単一の反応器で全反応を行なうことができ
るのである。 Furthermore, the present invention simplifies the manufacturing process in a method for obtaining high molecular weight polyorgano(hydro)silazane. That is, in the past, in order to obtain a high molecular weight polysilazane, it was necessary to first produce a cyclic product with a low degree of polymerization and then polymerize it in another step, whereas in the method of the present invention, a single The entire reaction can be carried out in one reactor.
次に実施例により本発明を説明するが、本発明
はこれらに限定されるものではない。 Next, the present invention will be explained with reference to Examples, but the present invention is not limited thereto.
実施例 1
内容積200mlの4つ口フラスコにガス吹込管、
メカニカルスターラー、ジユワーコンデンサー及
び滴下ロートを装着した装置を用い、反応系内を
窒素ガスで置換した。この装置を氷浴で冷却し、
これにメチルジクロロシラン(CH3SiHCl2)6.0
g(52.2mmol)と乾燥ジクロロメタン70mlとを
入れた。次に滴下ロートを通して、乾燥ピリジン
16.6g(210mmol)を滴下しながら加えて借体
を形成させ、無色の溶液を得た。その後、この溶
液を撹拌しながら、これに乾燥アンモニア4.10g
(240mmol)を窒素ガスとともに吹き込んで加安
分解を行なつた。反応中、少量のフユームが生成
したが、ガス流路閉塞や反応器内壁固着堆積等の
トラブルは生じなかつた。アンモニアの添加によ
つて反応溶液は白色のスラリー状となつた。反応
終了後、反応混合物を遠心分離した後、過し
た。液から溶媒を減圧除去し、ポリメチル(ヒ
ドロ)シラザンを無色の粘性油として2.80g得
た。収率はSi基板で91%であつた。この粘性油を
蒸気圧降下法で測定したところ、平均分子量が
1.77×103で、平均重合度が30であることがわか
つた。
Example 1 A four-neck flask with an internal volume of 200 ml, a gas blowing tube,
Using a device equipped with a mechanical stirrer, a distiller condenser, and a dropping funnel, the inside of the reaction system was purged with nitrogen gas. Cool the device in an ice bath;
Add 6.0 methyldichlorosilane (CH 3 SiHCl 2 ) to this
g (52.2 mmol) and 70 ml of dry dichloromethane. Then pass through the dropping funnel the dry pyridine
16.6 g (210 mmol) was added dropwise to form a matrix and a colorless solution was obtained. Then, while stirring this solution, add 4.10 g of dry ammonia to it.
(240 mmol) was blown in with nitrogen gas to carry out the amyl decomposition. During the reaction, a small amount of fume was produced, but no problems such as gas flow path clogging or adhesion to the inner wall of the reactor occurred. The addition of ammonia turned the reaction solution into a white slurry. After the reaction was completed, the reaction mixture was centrifuged and filtered. The solvent was removed from the liquid under reduced pressure to obtain 2.80 g of polymethyl(hydro)silazane as a colorless viscous oil. The yield was 91% on the Si substrate. When this viscous oil was measured using the vapor pressure drop method, the average molecular weight was found to be
It was found that the average degree of polymerization was 1.77×10 3 and 30.
この生成物を熱重量分析計を用いて、窒素気流
中、昇温速度5℃/分、最高到達速度1000℃の条
件で焼成した。熱重量分析曲線を第1図に示す。
焼成後の黒色固体残留物重量は焼成前の44%であ
つた。従つて、本発明の方法により製造したポリ
シラザンはセラミツク原料を製造する方法として
経済性が高いことがわかる。 This product was calcined using a thermogravimetric analyzer in a nitrogen stream at a temperature increase rate of 5°C/min and a maximum reaching rate of 1000°C. The thermogravimetric analysis curve is shown in FIG.
The weight of the black solid residue after firing was 44% of that before firing. Therefore, it can be seen that the polysilazane produced by the method of the present invention is highly economical as a method for producing ceramic raw materials.
比較例 1
乾燥ピリジンを使用せずに、メチルジクロロシ
ラン5.5g(47.8mmol)、ジクロロメタン67ml及
び乾燥アンモニア4.1g(240mmol)の量とし
て、実施例1と同様の反応を行ない、反応生成物
1.995gを無色の液体として得た。収率はSi基準
で70.7%であつたが、この生成物の平均量は266
と低く、平均重合度は、4.5であつた。Comparative Example 1 The same reaction as in Example 1 was carried out using 5.5 g (47.8 mmol) of methyldichlorosilane, 67 ml of dichloromethane, and 4.1 g (240 mmol) of dry ammonia without using dry pyridine, and the reaction product was
Obtained 1.995 g as a colorless liquid. The yield was 70.7% based on Si, but the average amount of this product was 266%.
The average degree of polymerization was 4.5.
このものを、実施例1と同じ条件で熱重量分析
計を用いて焼成した。熱重量分析曲線を第2図に
示す。焼成後の黒色固体残留物重量は焼成前の14
%と低かつた。 This product was fired under the same conditions as in Example 1 using a thermogravimetric analyzer. The thermogravimetric analysis curve is shown in FIG. The black solid residue weight after firing is 14
% was low.
実施例 2
エチルジクロロシラン(C2H5SiHCl2)3.00g
(23.2mmol)、乾燥ピリジン7.43g(93.9mmol)、
乾燥アンモニア3.40g(200mmol)及び乾燥ジ
クロロメタン100mlを用いて、実施例1と同様の
反応を行なつたところ、ポリエチル(ヒドロ)シ
ラザンを無色の粘性油として1.61gを得た。収率
はSi基準で95%、平均分子量1170、平均重合度16
であつた。又、実施例1と同様の条件で焼成した
ところ、黒色固体が40%の収率で得られた。Example 2 Ethyldichlorosilane (C 2 H 5 SiHCl 2 ) 3.00 g
(23.2 mmol), dry pyridine 7.43 g (93.9 mmol),
The same reaction as in Example 1 was carried out using 3.40 g (200 mmol) of dry ammonia and 100 ml of dry dichloromethane to obtain 1.61 g of polyethyl (hydro)silazane as a colorless viscous oil. Yield is 95% based on Si, average molecular weight 1170, average degree of polymerization 16
It was hot. Further, when calcined under the same conditions as in Example 1, a black solid was obtained with a yield of 40%.
実施例 3
フエニルジクロロシラン(C6H5SiHCl2)4.12
g(23.3mmol)、乾燥ピリジン7.43g(93.9m
mol)、乾燥アンモニア3.40g(200mmol)及び
乾燥ジクロロメタン100mlを用いて、実施例1と
同様の反応を行なつたところ、ポリフエニル(ヒ
ドロ)シラザンを無色の高粘性油として2.82g得
た。収率はSi基準で100%、平均分子量683、平均
重合度5.6であつた。又、実施例1と同様の条件
で焼成したところ、黒色固体が44%の収率で得ら
れた。Example 3 Phenyldichlorosilane (C 6 H 5 SiHCl 2 ) 4.12
g (23.3 mmol), dry pyridine 7.43 g (93.9 m
When the same reaction as in Example 1 was carried out using 3.40 g (200 mmol) of dry ammonia and 100 ml of dry dichloromethane, 2.82 g of polyphenyl(hydro)silazane was obtained as a colorless, highly viscous oil. The yield was 100% based on Si, the average molecular weight was 683, and the average degree of polymerization was 5.6. Further, when calcined under the same conditions as in Example 1, a black solid was obtained with a yield of 44%.
第1図は、本発明の方法によつて製造したポリ
メチル(ヒドロ)シラザンの熱重量分析曲線を、
第2図は従来の方法で製造したポリメチル(ヒド
ロ)シラザンの熱重量分析曲線を示す。
FIG. 1 shows the thermogravimetric analysis curve of polymethyl(hydro)silazane produced by the method of the present invention.
FIG. 2 shows a thermogravimetric analysis curve of polymethyl(hydro)silazane produced by a conventional method.
Claims (1)
〜3のアルキル基を有するトリアルキルアミン若
しくはトリアルキルフオスフイン、ピリジン又は
ピコリンから選択された少なくとも1種のルイス
塩基との錯体に乾燥アンモニアを反応させること
を特徴とするポリオルガノ(ヒドロ)シラザンの
製造方法。 2 オルガノ(ヒドロ)ジハロシランが、炭素数
1〜10のアルキル(ヒドロ)ジクロロシラン又は
アリール(ヒドロ)ジクロロシランである特許請
求の範囲第1項記載の製造方法。 3 ルイス塩基が、ピリジン又はピコリンから選
択された少なくとも1種の塩基である特許請求の
範囲第1項記載の製造方法。 4 ルイス塩基の量がオルガノ(ヒドロ)ジハロ
シランの約0.5倍モル以上である特許請求の範囲
第1項記載の製造方法。[Claims] 1. Organo(hydro)dihalosilane and 1 carbon number
Production of polyorgano(hydro)silazane, characterized in that a complex with at least one Lewis base selected from trialkylamine or trialkylphosphine having ~3 alkyl groups, pyridine or picoline is reacted with dry ammonia. Method. 2. The manufacturing method according to claim 1, wherein the organo(hydro)dihalosilane is an alkyl(hydro)dichlorosilane or an aryl(hydro)dichlorosilane having 1 to 10 carbon atoms. 3. The manufacturing method according to claim 1, wherein the Lewis base is at least one base selected from pyridine or picoline. 4. The manufacturing method according to claim 1, wherein the amount of the Lewis base is about 0.5 times the mole or more of the organo(hydro)dihalosilane.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59211700A JPS6189230A (en) | 1984-10-09 | 1984-10-09 | Production of polyorganohydrosilazane |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59211700A JPS6189230A (en) | 1984-10-09 | 1984-10-09 | Production of polyorganohydrosilazane |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6189230A JPS6189230A (en) | 1986-05-07 |
JPH049169B2 true JPH049169B2 (en) | 1992-02-19 |
Family
ID=16610141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59211700A Granted JPS6189230A (en) | 1984-10-09 | 1984-10-09 | Production of polyorganohydrosilazane |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6189230A (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62156135A (en) * | 1985-12-28 | 1987-07-11 | Toa Nenryo Kogyo Kk | Polyorgano (hydro) silazane |
JPH0331326A (en) * | 1989-06-29 | 1991-02-12 | Tonen Corp | Random copolymer silazane and production thereof |
JP2704332B2 (en) * | 1991-10-11 | 1998-01-26 | 株式会社ノリタケカンパニーリミテド | Carbon fiber reinforced silicon nitride nanocomposite and method for producing the same |
US5747623A (en) * | 1994-10-14 | 1998-05-05 | Tonen Corporation | Method and composition for forming ceramics and article coated with the ceramics |
JP3479648B2 (en) | 2001-12-27 | 2003-12-15 | クラリアント インターナショナル リミテッド | Polysilazane treatment solvent and method for treating polysilazane using this solvent |
JP5160189B2 (en) | 2007-10-26 | 2013-03-13 | AzエレクトロニックマテリアルズIp株式会社 | Polysilazane compound-containing composition capable of obtaining a dense siliceous film |
JP4513912B2 (en) | 2008-03-21 | 2010-07-28 | 富士ゼロックス株式会社 | Image forming apparatus belt, belt stretching apparatus, and image forming apparatus |
US8802805B2 (en) * | 2009-12-22 | 2014-08-12 | 3M Innovative Properties Company | Process for preparing shelf-stable curable polysilazanes, and polysilazanes prepared thereby |
JP6060460B2 (en) | 2012-11-22 | 2017-01-18 | アーゼット・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Method for forming siliceous film and siliceous film formed by the same method |
US20160363881A1 (en) | 2015-06-12 | 2016-12-15 | Canon Kabushiki Kaisha | Electro-conductive member, process cartridge and electrophotographic apparatus |
JP2017200861A (en) | 2016-05-02 | 2017-11-09 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | Composition for dense siliceous film formation |
US10331054B2 (en) | 2016-05-11 | 2019-06-25 | Canon Kabushiki Kaisha | Electrophotographic member, process cartridge and electrophotographic image forming apparatus |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5546995A (en) * | 1978-09-28 | 1980-04-02 | Kyoto Ceramic | Pen point in ceramics |
-
1984
- 1984-10-09 JP JP59211700A patent/JPS6189230A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5546995A (en) * | 1978-09-28 | 1980-04-02 | Kyoto Ceramic | Pen point in ceramics |
Also Published As
Publication number | Publication date |
---|---|
JPS6189230A (en) | 1986-05-07 |
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