JPH049000U - - Google Patents
Info
- Publication number
- JPH049000U JPH049000U JP4952790U JP4952790U JPH049000U JP H049000 U JPH049000 U JP H049000U JP 4952790 U JP4952790 U JP 4952790U JP 4952790 U JP4952790 U JP 4952790U JP H049000 U JPH049000 U JP H049000U
- Authority
- JP
- Japan
- Prior art keywords
- monochromator
- plane
- film
- emitted
- monochromators
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000013078 crystal Substances 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 description 1
Description
第１図は、この考案の一実施例を示す側面図で
ある。第２図は、ＳＯＲ光装置の概要を示す平面
図である。第３図は、従来装置の側面図である。
第４図は、この考案の他の実施例を示す側面図で
ある。
４２，５８，６０……モノクロメータ、４４，
４６……単結晶体または人工多層膜体、４８，５
０……結晶格子面または膜面、５２，５４……表
面（傾斜面）。
FIG. 1 is a side view showing an embodiment of this invention. FIG. 2 is a plan view showing an outline of the SOR optical device. FIG. 3 is a side view of the conventional device.
FIG. 4 is a side view showing another embodiment of this invention. 42,58,60...monochromator, 44,
46...Single crystal body or artificial multilayer body, 48,5
0...Crystal lattice plane or film surface, 52, 54...Surface (slanted surface).
Claims (1)
して構成した単結晶体または多層膜体を２個具え
、これらを傾斜面どうしが対向し、かつ結晶格子
面または膜面が互いに略々平行となるように配置
してなり、一方の単結晶体または多層膜体の傾斜
面に入射されたＸ線がここでブラツグ反射されて
、他方の単結晶体または多層膜体の傾斜面に入射
されて、さらにここでブラツグ反射されて出射さ
れることを特徴とする拡大または縮小機能付モノ
クロメータ。 (2) 前記２個の単結晶体または多層膜体で１組
のモノクロメータを構成して、これを２組設けて
、互いに直交する２軸方向に配して、一方のモノ
クロメータから出射されるＸ線を他方のモノクロ
メータに入射することを特徴とする請求項１記載
の拡大または縮小機能付モノクロメータ。[Claims for Utility Model Registration] (1) Two single-crystal bodies or multilayer films each having an inclined surface with respect to a crystal lattice plane or a film plane, with the inclined surfaces facing each other, and The lattice planes or film planes are arranged so that they are approximately parallel to each other, and X-rays incident on the inclined plane of one single crystal or multilayer film are blurred and reflected here, and Alternatively, a monochromator with an enlargement or reduction function is characterized in that the light is emitted onto an inclined surface of a multilayer film body, where it is further reflected and emitted. (2) A set of monochromators is constructed from the two single crystal bodies or multilayer films, and two sets of monochromators are provided and arranged in two axes directions orthogonal to each other, so that the light emitted from one monochromator is 2. The monochromator with an enlargement or reduction function according to claim 1, wherein the X-rays are incident on the other monochromator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4952790U JPH049000U (en) | 1990-05-11 | 1990-05-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4952790U JPH049000U (en) | 1990-05-11 | 1990-05-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH049000U true JPH049000U (en) | 1992-01-27 |
Family
ID=31567290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4952790U Pending JPH049000U (en) | 1990-05-11 | 1990-05-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH049000U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002168997A (en) * | 2000-11-30 | 2002-06-14 | New Industry Research Organization | X-ray micro-beam generating device |
| JP2013210377A (en) * | 2003-06-13 | 2013-10-10 | Osmic Inc | Beam adjustment system |
-
1990
- 1990-05-11 JP JP4952790U patent/JPH049000U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002168997A (en) * | 2000-11-30 | 2002-06-14 | New Industry Research Organization | X-ray micro-beam generating device |
| JP2013210377A (en) * | 2003-06-13 | 2013-10-10 | Osmic Inc | Beam adjustment system |
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