JPH0480043U - - Google Patents

Info

Publication number
JPH0480043U
JPH0480043U JP12539090U JP12539090U JPH0480043U JP H0480043 U JPH0480043 U JP H0480043U JP 12539090 U JP12539090 U JP 12539090U JP 12539090 U JP12539090 U JP 12539090U JP H0480043 U JPH0480043 U JP H0480043U
Authority
JP
Japan
Prior art keywords
wafer
atmospheric pressure
cvd apparatus
pressure cvd
tray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12539090U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12539090U priority Critical patent/JPH0480043U/ja
Publication of JPH0480043U publication Critical patent/JPH0480043U/ja
Pending legal-status Critical Current

Links

JP12539090U 1990-11-27 1990-11-27 Pending JPH0480043U (US06653308-20031125-C00199.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12539090U JPH0480043U (US06653308-20031125-C00199.png) 1990-11-27 1990-11-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12539090U JPH0480043U (US06653308-20031125-C00199.png) 1990-11-27 1990-11-27

Publications (1)

Publication Number Publication Date
JPH0480043U true JPH0480043U (US06653308-20031125-C00199.png) 1992-07-13

Family

ID=31872990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12539090U Pending JPH0480043U (US06653308-20031125-C00199.png) 1990-11-27 1990-11-27

Country Status (1)

Country Link
JP (1) JPH0480043U (US06653308-20031125-C00199.png)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162275A (ja) * 1983-02-26 1984-09-13 ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 陰極スパツタリングにより基板上に回転対称の厚みプロフイ−ルを有する層を製造する装置及び該装置の運転法
JPH01318235A (ja) * 1988-06-20 1989-12-22 Kawasaki Steel Corp 半導体製造装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59162275A (ja) * 1983-02-26 1984-09-13 ライボルト−ヘレ−ウス・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング 陰極スパツタリングにより基板上に回転対称の厚みプロフイ−ルを有する層を製造する装置及び該装置の運転法
JPH01318235A (ja) * 1988-06-20 1989-12-22 Kawasaki Steel Corp 半導体製造装置

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