JPH0479192A - Construction for protecting electro-luminescence display panel - Google Patents

Construction for protecting electro-luminescence display panel

Info

Publication number
JPH0479192A
JPH0479192A JP2194358A JP19435890A JPH0479192A JP H0479192 A JPH0479192 A JP H0479192A JP 2194358 A JP2194358 A JP 2194358A JP 19435890 A JP19435890 A JP 19435890A JP H0479192 A JPH0479192 A JP H0479192A
Authority
JP
Japan
Prior art keywords
film
display panel
insulating film
back face
light emitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2194358A
Other languages
Japanese (ja)
Inventor
Tomoyuki Kawashima
河島 朋之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP2194358A priority Critical patent/JPH0479192A/en
Publication of JPH0479192A publication Critical patent/JPH0479192A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To maintain a small size and light weight and promote economical performance by providing a back face insulating film which covers, from the back face side the range of an EL display panel including the whole of an EL luminescent layer except for the end part for external connection of a transference electrode film and a back face electrode film, and a protective film made of metal which covers almost the whole of the back face insulating film from the back face side. CONSTITUTION:A protective construction is installed by being provided with a back face insulating film 20, which covers, from the back side the range of an EL display panel including the whole surface of an EL luminescent layer 5 except for the end part 2a for external connection of a transference electrode film 2 and a back face electrode film 6, and a protective film 30 made of metal, which covers almost the whole face insulating film 20 from the back side. In this case, the combination of the back face insulating film 20 and the protective film 30 made of metal can protect the EL luminescent layer 5 from the invasion of external air such as moisture or the like and from the contamination by a metal atom. Thus, an EL display panel can be satisfactorily economical and suitable to mass production without deteriorating such a small-sized and light-weight characteristic as the EL display panel has.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はエレクトロルミネッセンス(以下ELという)
表示パネルに対する外気の侵入防止用の保護構造に関す
る。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to electroluminescence (hereinafter referred to as EL).
The present invention relates to a protective structure for preventing outside air from entering a display panel.

〔従来の技術〕[Conventional technology]

周知のようにEL表示パネルは液晶表示パネルと同様に
フラットな形状に形成でき、しかもそれと異なり発光性
である利点を有するが、最近ではその表示輝度が一層向
上され、可変画像の表示に適するマトリックス形が開発
されて、CRT装置よりも小形かつ軽量で自己発光性を
もつ計)Ell等の表示装置として注目されている。
As is well known, EL display panels can be formed into a flat shape similar to liquid crystal display panels, and unlike them, they have the advantage of being luminescent.Recently, however, their display brightness has been further improved, and they have become suitable for displaying variable images. It is attracting attention as a display device such as ELL, which is smaller and lighter than a CRT device and has self-luminous properties.

かかる用途に適するように多数個の画素を行列配列した
最近のマトリックス形のEL表示パネルでは、そのEL
発光層がZnS等からなる発光膜と絶縁膜を積層して構
成されるが、できるだけ低い表示電圧により高い表示輝
度を得るにはこの積層構造中の絶縁膜の膜厚を薄く9g
通は0.54以下にする必要がある。このため、使用中
に外気特に湿気が僅かでも侵入すると絶縁膜の性能が落
ちて表示性能が低下しやすく、従ってこれに対し充分な
保護を施して置く必要がある。以下、第3図と第4図を
参照して、EL表示パネルの概要とその保護構造の従来
例をそれぞれ説明する。
In recent matrix-type EL display panels in which a large number of pixels are arranged in rows and columns to be suitable for such uses, the EL
The light emitting layer is constructed by laminating a light emitting film made of ZnS etc. and an insulating film, but in order to obtain high display brightness with as low a display voltage as possible, the thickness of the insulating film in this laminated structure must be reduced to 9 g.
The average value must be 0.54 or less. For this reason, if even a small amount of outside air, especially moisture, enters the display during use, the performance of the insulating film deteriorates and the display performance is likely to deteriorate, so it is necessary to provide sufficient protection against this. Hereinafter, an outline of an EL display panel and a conventional example of its protective structure will be explained with reference to FIGS. 3 and 4.

第3図はEL表示パネル10の要部の斜視図である。絶
縁基板1にはガラス等の透明なものが用いられ、その表
面上に例えばITO(インジューム錫酸化物)からなる
透明電極膜2がストライブ状のパターンで多数条並べて
形成される。この上に積層されるEL発光層5は例えば
図のように1対の絶縁膜3の間に発光膜4を挾んでなり
、この内の絶縁膜3は窒化シリコン等の1膜で、発光膜
4はMn等の遷移金属やTb等の稀土類を少量含むZn
S等の1119である。このEL発光層5の上にアルミ
等の裏面電極膜6が透明電極膜2と直交する方向のスト
ライブ状のパターンで多数条並べて配設される。なお、
EL発光層5中の2個の絶縁膜3の一方、特に透明電極
12側の絶縁膜3は適宜省略される場合がある。
FIG. 3 is a perspective view of the main parts of the EL display panel 10. A transparent material such as glass is used as the insulating substrate 1, and a large number of transparent electrode films 2 made of, for example, ITO (indium tin oxide) are formed on the surface thereof in a striped pattern. The EL light emitting layer 5 laminated thereon is made up of, for example, a light emitting film 4 sandwiched between a pair of insulating films 3 as shown in the figure, where the insulating film 3 is a film of silicon nitride or the like, and the light emitting layer 5 is made of a material such as silicon nitride. 4 is Zn containing a small amount of transition metals such as Mn and rare earths such as Tb.
1119 of S et al. On this EL light emitting layer 5, a large number of back electrode films 6 made of aluminum or the like are arranged in a striped pattern in a direction perpendicular to the transparent electrode film 2. In addition,
One of the two insulating films 3 in the EL light emitting layer 5, particularly the insulating film 3 on the transparent electrode 12 side, may be omitted as appropriate.

かかるマトリックス構造のEL表示パネル10では、透
明電極1112と裏面電極膜6の各交点に対応する範囲
のEL発光層5が表示上の各画素を構成し、各画素から
出るEL光は透明な絶縁基板1側から図の下方に向けて
取り出される。
In the EL display panel 10 with such a matrix structure, the EL light emitting layer 5 in the range corresponding to each intersection of the transparent electrode 1112 and the back electrode film 6 constitutes each pixel on the display, and the EL light emitted from each pixel is transmitted through a transparent insulator. It is taken out from the substrate 1 side toward the bottom of the figure.

第4図に示す保護構造例では上述のようなEL表示パネ
ルlOの裏面側に封止ケース40を取り付ける (特開
昭52−72196号公報や特開昭52−127790
号公報を参照)。ケース本体41は枠状体で、これにガ
ラスの蓋42を被せ、それらの周囲を接着剤43により
封止しかつ絶縁基板1に接着した上、蓋42の封入孔4
2aからシリコーンオイル等の封止液44をケース40
内に封入した後、封入孔42aをガラスの閉鎖板45と
接着剤46により塞いで封止ケース40内の封止液44
を封じ切る。なお、接続線50を接続すべき透明電極1
12の外部接続用端部2aは例えば図のように左右交互
に封止ケース40の外側に導出され、裏面電極膜6の外
部接続用端部も同様に図の前後方向に導出される。
In the example of the protective structure shown in FIG. 4, a sealing case 40 is attached to the back side of the EL display panel IO as described above.
(see publication). The case body 41 is a frame-shaped body, which is covered with a glass lid 42, the periphery of which is sealed with an adhesive 43, and bonded to the insulating substrate 1.
Apply a sealant 44 such as silicone oil to the case 40 from 2a.
After the sealing liquid 44 in the sealing case 40 is sealed, the sealing hole 42a is closed with a glass closing plate 45 and an adhesive 46.
Seal off. Note that the transparent electrode 1 to which the connection line 50 should be connected
For example, the twelve external connection ends 2a are led out to the outside of the sealing case 40 alternately on the left and right sides as shown in the figure, and the external connection ends of the back electrode film 6 are similarly led out in the front-rear direction in the figure.

〔発明が解決しようとする!Iff) 上述の従来の保護構造では、外気の侵入をほぼ完全に遮
断することができ、かつ絶縁耐力の高い封止液を用いる
ことにより裏面電極膜例の絶縁膜の絶縁性を高めること
もできるが、その反面次のような問題点がある。
[Invention tries to solve it! If) With the conventional protection structure described above, it is possible to almost completely block the intrusion of outside air, and by using a sealing liquid with high dielectric strength, it is also possible to improve the insulation properties of the insulating film of the back electrode film example. However, on the other hand, there are the following problems.

(1)封止ケースを取り付けるので、EL表示パネルの
厚みが元の2〜3倍になってフラットパネルとしての特
長が減殺され、重量も2倍以上に増えて軽量パネルとし
ての特長も減殺される。
(1) Since the sealing case is attached, the thickness of the EL display panel becomes 2 to 3 times the original thickness, which reduces its characteristics as a flat panel, and the weight also increases by more than twice, reducing its characteristics as a lightweight panel. Ru.

(2)表示パネルの面積のかなりの部分が封止ケースの
取り付は用に食われるので、パネルの総面積に対する有
効表示面積の比で表されるパネル面積の利用効率が低下
する。
(2) Since a considerable portion of the area of the display panel is consumed by the installation of the sealing case, the utilization efficiency of the panel area, expressed as the ratio of the effective display area to the total area of the panel, decreases.

(3)蓋を無アルカリガラスとする必要がある等のため
に、封止ケース用の材料費が高価につく。
(3) Since the lid needs to be made of alkali-free glass, the cost of materials for the sealed case is high.

(4)封止液の封入前に封止ケース内の水分やガスを除
去するため加熱や真空引きの前処理が必要で、そのため
にかなりの手間と費用を要する。また、封止ケースの本
体を表示パネルに接着する作業もかなり厄介で手間が掛
かり、かつ量産時に仕損じが発生しやすい。
(4) Before filling the sealing liquid, pretreatment such as heating and evacuation is required to remove moisture and gas within the sealing case, which requires considerable effort and cost. Furthermore, the work of adhering the main body of the sealing case to the display panel is quite cumbersome and time-consuming, and defects are likely to occur during mass production.

本発明はかかる従来の問題点を解消して、EL表示パネ
ルがもつ小形軽量の特長を減殺することなく、経済性に
優れ、かつ量産に適する保護構造を得ることを目的とす
る。
It is an object of the present invention to solve these conventional problems and provide a protective structure that is economical and suitable for mass production without diminishing the small size and light weight of the EL display panel.

〔課題を解決するための手段] この目的は本発明によれば、上述のように透明な絶縁基
板上に透明電極膜と、発光膜と絶縁膜を含むEL発光層
と、裏面電極膜とを順次積層してなるEL表示パネルに
対して、透明電極膜および裏面電極膜の外部接続用端部
を除いてEL発光層の全面を含む範囲をEL表示パネル
の裏面側から覆う裏面絶縁膜と、この裏面絶縁膜のほぼ
全面を裏面側から覆う金属の保護膜とを備えてなる保護
構造を設けることによって達成される。
[Means for Solving the Problem] According to the present invention, this object is to provide a transparent electrode film, an EL light emitting layer including a light emitting film and an insulating film, and a back electrode film on a transparent insulating substrate as described above. A back insulating film that covers the entire surface of the EL light-emitting layer from the back side of the EL display panel, excluding the external connection end portions of the transparent electrode film and the back electrode film, for an EL display panel formed by sequentially laminating the layers; This is achieved by providing a protective structure including a metal protective film that covers almost the entire surface of the back insulating film from the back side.

なお、上記構成中の裏面絶縁膜としては酸化シリコン、
燐シリケートガラス、窒化シリコン、アルミナ、酸化タ
リューム等の無機材料のばか有機絶縁材料も適宜用いる
ことができ、また保護膜用の金属にはアルミ、クローム
、タンタル、モリブデン、チタン等の単体金属のほかに
それらの合金材料を適宜に用いることができ、あるいは
これを複層構成の金属膜とすることもできる。さらに、
この保護膜の上を樹脂材料で覆って外傷や腐食等からこ
れを保護するのが有利である。
Note that the back insulating film in the above structure is silicon oxide,
Inorganic and organic insulating materials such as phosphorus silicate glass, silicon nitride, alumina, and talum oxide can also be used as appropriate, and metals for the protective film include single metals such as aluminum, chromium, tantalum, molybdenum, and titanium. These alloy materials can be used as appropriate, or this can be made into a metal film with a multilayer structure. moreover,
It is advantageous to cover this protective film with a resin material to protect it from damage, corrosion, etc.

(作用〕 本発明は金属の薄膜の外気、特に水分に対する気密性に
着目し、これを前項の構成にいう保護膜に利用すること
により、前述の課題の解決に成功したものである。
(Function) The present invention has succeeded in solving the above-mentioned problems by paying attention to the airtightness of a metal thin film against outside air, especially moisture, and utilizing this in the protective film mentioned in the above-mentioned configuration.

よく知られているように半導体装置では外気の侵入を遮
断するには絶縁膜、特に窒化シリコン膜を主に用いるが
、本件発明者の種々な実験の結果によれば、EL表示パ
ネルに関する限り窒化シリコン膜等の絶縁膜は不適、つ
まり外気の遮断性が不充分であり、恐らくは半導体技術
では保護対象が半導体層や金11:W!であるのに対し
て、EL表示パネルではEL発光層中の絶縁膜等が保護
対象である点が異なるためと考えられる。
As is well known, insulating films, especially silicon nitride films, are mainly used to block the intrusion of outside air in semiconductor devices, but according to the results of various experiments conducted by the inventor of the present invention, nitride films are used as far as EL display panels are concerned. Insulating films such as silicon films are unsuitable, that is, their barrier properties against outside air are insufficient, and this is probably because semiconductor technology protects semiconductor layers and gold 11:W! This is thought to be due to the fact that, in contrast, in an EL display panel, the insulating film and the like in the EL light emitting layer are protected.

この実験結果によれば、金属膜1例えばアルミ膜は1虜
程度の厚みでもEL発光層中の絶縁膜や物性上は絶縁性
の発光膜への外気の侵入防止効果が非常に高く、窒化シ
リコン膜等の絶縁膜に普通は若干認められる微視的なり
ラックやピンホールの発生もほぼ皆無である。
According to the experimental results, metal films such as aluminum films have a very high effect of preventing outside air from entering into the insulating film in the EL light-emitting layer and the light-emitting film, which is insulating in terms of physical properties, even when the thickness is about 1. There are almost no microscopic racks or pinholes that are normally observed in insulating films such as membranes.

二のように金属の保IIW!、はEL発光層への外気の
侵入防止に適するが、導電性なので裏面電極麺と絶縁す
る必要があり、本発明では裏面絶縁膜により保filI
lを裏面電極膜から絶縁するとともに、これにEL発光
層の表面を不活性化しかつ保fIMの金属原子のEL発
光層へのマイグレーションを防止する役目を兼ねさせる
Like the second metal preservation IIW! is suitable for preventing outside air from entering the EL emitting layer, but since it is conductive, it must be insulated from the back electrode layer.
In addition to insulating the EL film from the back electrode film, it also serves to inactivate the surface of the EL light-emitting layer and prevent migration of metal atoms of the fIM to the EL light-emitting layer.

この裏面絶縁膜と金属の保護膜との組み合わせにより、
EL発光層を水分等の外気の侵入のほか金属原子による
汚染からも保護できるが、本発明ではさらに透明電極膜
や裏面電極膜の外部接続用端部から外気が侵入すること
がないよう、これら電極膜の外部接続用端部を除いて、
EL発光層の全面を含むEL表示パぶルの全範囲を裏面
側から覆うように裏面絶縁膜を設けた上で保1膜をその
ほぼ全面を覆うように設ける。
By combining this back insulating film and metal protective film,
Although the EL light emitting layer can be protected from intrusion of outside air such as moisture and contamination by metal atoms, in the present invention, these layers are further protected against intrusion of outside air from the external connection ends of the transparent electrode film and back electrode film. Excluding the external connection end of the electrode membrane,
A back insulating film is provided to cover the entire range of the EL display bubble including the entire surface of the EL light emitting layer from the back side, and then a protective film is provided to cover almost the entire surface.

本発明のかかる構成により、電極膜の外部接続用端部の
導出部を含めてEL発光層の外気の侵入や金属原子によ
る汚染に基づく発光特性の低下がほぼ完全に防止される
With this structure of the present invention, deterioration of the light emitting characteristics due to invasion of outside air or contamination by metal atoms into the EL light emitting layer, including the lead-out portion of the external connection end of the electrode film, is almost completely prevented.

[実施例] 以下、図を参照して本発明のEL表示パネルの保護構造
の実施例を説明する。第1図と第2図はそれぞれ本発明
の第1と第2の実施例の要部拡大断面図である。
[Example] Hereinafter, an example of a protective structure for an EL display panel of the present invention will be described with reference to the drawings. FIGS. 1 and 2 are enlarged sectional views of essential parts of first and second embodiments of the present invention, respectively.

第1図において、平坦で透明なガラス等の絶縁基板1の
上にITO等からなる0、2m程度の厚みの透明電極膜
2が第3図に示すようなストライプ状のパターンで数百
条並べて形成され、その外部接続用端部2aが絶縁基板
lの図の左右の両端部にこの実施例でも交互に形成され
る。
In FIG. 1, several hundred transparent electrode films 2 made of ITO or the like and having a thickness of about 0.2 m are arranged in a striped pattern as shown in FIG. 3 on a flat, transparent insulating substrate 1 made of glass or the like. In this embodiment as well, the external connection end portions 2a are alternately formed at both left and right ends of the insulating substrate l in the figure.

EL発光層5はこの実施例でも1対の絶縁膜3とそれら
に挟まれた発光膜4により構成されているが、透明電極
膜2例の絶縁膜3は適宜省略することが可能である。こ
の内の絶縁膜3には例えば窒化シリコンが用いられ、ス
パッタ法等によって0.4虜程度の厚みに成膜される0
発光膜4としては例えば0.5〜0.6 wt%のMn
を含むZnSが用いられ、通例のように電子ビーム蒸着
法により 0.5−程度の厚みに成膜される。
Although the EL light emitting layer 5 in this embodiment is also composed of a pair of insulating films 3 and a light emitting film 4 sandwiched between them, the insulating film 3 of the two examples of transparent electrode films can be omitted as appropriate. For example, silicon nitride is used for the insulating film 3, and the film is formed to a thickness of about 0.4 mm by sputtering or the like.
For example, the light emitting film 4 may contain 0.5 to 0.6 wt% Mn.
ZnS containing Zn is used, and the film is formed to a thickness of about 0.5 mm by the usual electron beam evaporation method.

絶縁l113と発光#4をフォトエツチングによりパタ
ーンニングしてEL発光層5を図示のように形成した後
、例えばアルミを0.5虜程度の厚みにスパッタ法等に
よって全面被着し、これをフォトエツチングすることに
より数百条の裏面電極膜6を透明電極1l12と直交す
る方向に並ぶストライプ状パターンに形成し、これでE
L表示パネル10への表示部分の組み込みを終える。な
お、この裏面電極膜6の外部接続用端部は透明電極#2
の場合と同様に、絶縁基板1の図の前後方向の端部上に
普通は交互に形成される。
After patterning the insulating layer 113 and the light emitting layer #4 by photoetching to form the EL light emitting layer 5 as shown in the figure, for example, aluminum is deposited on the entire surface to a thickness of about 0.5 mm by sputtering, and this is photo-etched. By etching, hundreds of back electrode films 6 are formed into a striped pattern arranged in a direction perpendicular to the transparent electrode 1l12, and this makes the E
The incorporation of the display portion into the L display panel 10 is completed. Note that the external connection end of this back electrode film 6 is transparent electrode #2.
As in the case of FIG.

この実施例では、本発明の保護構造を構成する裏面絶縁
膜20用にアルミナをスパッタ法等により0.5t1m
程度の膜厚に全面被着し、さらにその上に保護*30用
にアルミをスパッタ法等により0.5〜1虜の膜厚に全
面被着した後、まず保護膜30用のアルミを所望のパタ
ーンに化学エツチングし、次にこれをマスクとするドラ
イエツチングによって裏面絶縁膜20用のアルミナをこ
の例では保r1膜30と同しパターンに形成する。
In this example, alumina was deposited in a thickness of 0.5 t1 by sputtering or the like for the back insulating film 20 constituting the protective structure of the present invention.
After coating the entire surface to a film thickness of 0.5 to 1 mm thick, and then depositing aluminum for protection*30 on the entire surface by sputtering or the like to a thickness of 0.5 to 1 mm, first apply the desired aluminum for the protective film 30. Alumina for the back insulating film 20 is formed in the same pattern as the R1 film 30 in this example by chemical etching into a pattern, and then dry etching using this as a mask.

この際、裏面絶縁膜20と保護膜30は図のように透明
電極WA2の外部接続用端部2aと裏面電極膜6の図示
しない外部接続用端部がある絶縁基板1の周縁部のみを
露出させ、EL表示パネル10のEL発光層5の全面を
含む残余の全範囲を裏面側から覆うパターンに形成され
る。なお、裏面絶縁wI20と保護11130のかかる
パターンの周縁は図のようにシリコーン樹脂等をご<薄
<塗布しかつ硬化させた封止膜35によって念のため完
全に封止して置くのが最も望ましい。
At this time, the back insulating film 20 and the protective film 30 expose only the peripheral part of the insulating substrate 1 where the external connection end 2a of the transparent electrode WA2 and the external connection end (not shown) of the back electrode film 6 are located, as shown in the figure. A pattern is formed to cover the entire remaining area including the entire surface of the EL light emitting layer 5 of the EL display panel 10 from the back surface side. It is best to completely seal the periphery of the pattern with the back insulation wI20 and the protection 11130 with a sealing film 35 coated with a thin layer of silicone resin and cured as shown in the figure. desirable.

以上によってEL表示パネルIOへの保護構造の組み込
みが終わり、以後は画電極膜2および6の外部接続用端
部2a等を接続線50等の手段で外部の表示駆動回路と
接続できる。
With the above steps, the incorporation of the protective structure into the EL display panel IO is completed, and thereafter the external connection end portions 2a of the picture electrode films 2 and 6 can be connected to an external display drive circuit by means of the connection line 50 or the like.

なお、この実施例における保11130をアルミに例え
ばクロームを組み合わせた2層構成とするのが、金属薄
膜のピンホールの発生確率を減少させ外気に対する封止
効果を高める上で有利である。
It should be noted that it is advantageous to have a two-layer structure for the shield 11130 in this embodiment, which is a combination of aluminum and, for example, chromium, in order to reduce the probability of pinholes occurring in the metal thin film and to enhance the sealing effect against the outside air.

この場合0.5a以下の膜厚でも保rI膜30に非常に
高い封止効果を持たせることができる。
In this case, even with a film thickness of 0.5a or less, the rI retention film 30 can have a very high sealing effect.

しかし保護1I130の膜厚があまり薄いと外傷により
封止が破れやすいから、接続線50の接続前や後に保護
[130やEL表示パネル10の背面を樹脂膜で保護す
るのがよい、この樹脂膜は保護膜30の金属の腐食や発
錆を防止する上でも有用である。
However, if the film thickness of the protection 1I 130 is too thin, the sealing will easily break due to external damage, so it is better to protect the protection 130 and the back of the EL display panel 10 with a resin film before or after connecting the connection line 50. is also useful in preventing corrosion and rusting of the metal of the protective film 30.

第・2図に示す本発明の第2実施例では保護構造が2重
に設けられる。絶縁基板1上に表示部分を組み込むまで
は前の実施例と同じであるが、その上に裏面絶縁膜21
用に酸化シリコンを0.34程度の厚みに5次に保護膜
31用金属としてタンタルを0.2−程度の厚みにそれ
ぞれスパッタ法によって順次被着した上で、1回目のフ
ォトエツチングにより両膜を前実施例と同様なパターン
に形成して1層目の保護構造とする。
In the second embodiment of the invention shown in FIG. 2, the protective structure is provided in two layers. The process is the same as the previous embodiment until the display part is incorporated on the insulating substrate 1, but a back insulating film 21 is formed on it.
Next, silicon oxide was deposited to a thickness of about 0.34 mm as a metal for the protective film 31, and tantalum was deposited to a thickness of about 0.2 mm as a metal for the protective film 31 by sputtering. is formed in the same pattern as in the previous example to form the first layer of protective structure.

さらに、この実施例では上述と同一構成の裏面絶縁1l
N22と保護膜32からなる2層目の保護構造を図のよ
うに1層目よりやや小さなパターンで形成する。なお、
この実施例においてもこれら2層の保護構造のパターン
の周縁を共通に覆うよう樹脂の封止膜35を設けるのが
望ましい。
Furthermore, in this embodiment, the back insulation 1l has the same configuration as described above.
A second protective structure made of N22 and a protective film 32 is formed in a slightly smaller pattern than the first layer as shown in the figure. In addition,
In this embodiment as well, it is desirable to provide a resin sealing film 35 so as to commonly cover the peripheries of the patterns of these two layers of protective structures.

この第2実施例では、裏面絶縁11121と22および
保護膜31と32のいずれも*aが第1実施例のほぼ半
分に、従って2層の保護構造の全体の厚みが前実施例の
保護構造と同程度とされるが、2重保護構造とすること
により、製作の手間は2倍掛かるものの、EL発光層5
に対する外気の遮断効果を一層高めることができる。な
お、この第2実施例の保護11231と32に用いるタ
ンタルは上述のような薄膜でも外気、特に湿気の遮断効
果が高いことが認められている。
In this second embodiment, the *a of both the back insulators 11121 and 22 and the protective films 31 and 32 is approximately half that of the first embodiment, so the total thickness of the two-layer protective structure is the same as that of the previous embodiment. Although it is said to be about the same level as the EL light emitting layer 5, although the double protection structure requires twice as much manufacturing time.
The effect of blocking outside air can be further enhanced. It is recognized that the tantalum used for the protectors 11231 and 32 of this second embodiment has a high effect of blocking outside air, especially moisture, even in the above-mentioned thin film.

以上説明した実施例に限らず、本発明は種々の態様で実
施することができる。例えば裏面絶縁膜には上述のアル
ミナや酸化シリコンのほか、窒化シリコン、燐シリケー
トガラス、酸化タンタル等の無機材料およびフォトプロ
セスによるパターンニングが可能なエポキシ樹脂、フェ
ノール樹脂等の有機高分子材料を適宜に利用できる。さ
らに、この裏面絶縁膜を酸化シリコンと窒化シリコンの
組み合わせのような複合膜として、外気に対する遮断性
能を一層高めることも可能である。
The present invention is not limited to the embodiments described above, and the present invention can be implemented in various embodiments. For example, in addition to the above-mentioned alumina and silicon oxide, the back insulating film is made of inorganic materials such as silicon nitride, phosphosilicate glass, and tantalum oxide, and organic polymeric materials such as epoxy resin and phenol resin that can be patterned by photo process. available for use. Furthermore, it is possible to further improve the barrier performance against outside air by forming the back surface insulating film into a composite film such as a combination of silicon oxide and silicon nitride.

また保護膜用の金属については、上述のアルミやタンタ
ルのほか、クローム、モリブデン、チタン等の単体材料
やAl−5t、 Al−5t−J+Mo−3i+Cr−
5i等の合金材料を用いることができ、あるいは必要に
応じて上述のアルミとクロームの組み合わせのような複
合膜を用いて外気に対する遮断効果を一層高めることが
できる。これら金属の成膜や保護膜へのパターンニング
の手段についても、実施例中の記載に限らず各材料にそ
れぞれ最も適した方法を採用すべきことはもちろんであ
る。
In addition to the above-mentioned aluminum and tantalum, metals for the protective film include single materials such as chromium, molybdenum, and titanium, as well as Al-5t, Al-5t-J+Mo-3i+Cr-
An alloy material such as 5i may be used, or if necessary, a composite membrane such as the above-mentioned combination of aluminum and chrome may be used to further enhance the barrier effect against outside air. It goes without saying that the methods for forming these metal films and patterning the protective film are not limited to those described in the examples, but should be adopted in a method most suitable for each material.

〔発明の効果〕〔Effect of the invention〕

以上の記載のとおり本発明では、絶縁基板上に透明電極
膜と、発光膜と絶縁膜を含むEL発光層と、裏面電極膜
とを順次積層したEL表示パネルに対して、透明電極膜
と裏面電極膜の外部接続用端部を除きEL発光層全体を
含むEL表示パネルの範囲を裏面側から覆う裏面絶縁膜
と、この裏面絶縁膜のほぼ全面を裏面側から覆う金属か
らなる保@膜とを備える保護構造を設けることにより、
次の効果を得ることができる。
As described above, in the present invention, for an EL display panel in which a transparent electrode film, an EL light emitting layer including a light emitting film and an insulating film, and a back electrode film are sequentially laminated on an insulating substrate, the transparent electrode film and the back A back insulating film that covers an area of the EL display panel including the entire EL light emitting layer except for the external connection ends of the electrode film from the back side, and a protective film made of metal that covers almost the entire surface of this back insulating film from the back side. By providing a protective structure with
You can get the following effects.

(a)金属薄膜の外気特に水分に対する優れた気密性に
着目してこれを保Il!Iに利用することにより、EL
発光層への外気の侵入をほぼ完全に防止することができ
る。また、裏面絶縁膜によりEL発光層表面を不活性化
し、かつ金属原子のマイグレーションを防止して、EL
表示パネルの使用期間中の発光輝度の低下を最低にでき
る。
(a) Focusing on the excellent airtightness of the metal thin film against outside air, especially moisture, this is maintained! By using I, EL
It is possible to almost completely prevent outside air from entering the light emitting layer. In addition, the back insulating film inactivates the surface of the EL light emitting layer and prevents the migration of metal atoms.
Decrease in luminance of light emission during the period of use of the display panel can be minimized.

(b)裏面絶縁膜と保護膜のいずれも一オーダの薄膜な
ので、保護構造のためEL表示パネルの厚みがほどんど
増すことがなく、フラットパネルとしての特長がそのま
ま生かされる。また、重量増加もほとんどないので、非
常に軽量なEL表示パネルを提供できる。
(b) Since both the back insulating film and the protective film are one-order thin films, the thickness of the EL display panel is hardly increased due to the protective structure, and the features as a flat panel can be utilized as is. Furthermore, since there is almost no increase in weight, an extremely lightweight EL display panel can be provided.

(C)従来構造のような封止ケース、従ってその取り付
はスペースが不要なので、絶縁基板の面積利用効率が向
上して従来よりも小形のEL表示パネルを提供できる。
(C) Since a sealing case like the conventional structure does not require space for its installation, the area utilization efficiency of the insulating substrate is improved, and it is possible to provide an EL display panel that is smaller than the conventional one.

(d)従来の封止ケースに比べて保護構造用の材料費が
大幅に減少するので、EL表示パネルの経済性を向上で
きる。
(d) Since the cost of materials for the protective structure is significantly reduced compared to conventional sealed cases, the economic efficiency of the EL display panel can be improved.

(e)従来のように封止ケースの取り付けや封止液の封
入のために人手を煩わす必要がなくなるので、EL表示
パネルの量産性が向上する。
(e) Since there is no need for labor to attach the sealing case and fill in the sealing liquid as in the past, the mass productivity of the EL display panel is improved.

かかる特長を備える本発明は、EL表示パネルの性能と
経済性の向上を通じてその一層の普及に貢献することが
期待される。
The present invention having such features is expected to contribute to further popularization of EL display panels by improving their performance and economic efficiency.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図から第3図までが本発明に関し、第1図は本発明
によるEL表示パネルの保ml構造の第1実施例を示す
その要部拡大断面図、第2図はその第2実施例の要部拡
大断面図、第3図はEL表示パネルの要部の斜視図であ
る。第4図は従来技術によるEL表示パネルの保護構造
の要部拡大断面図である。図において、 1:絶縁基板、2;透明電極膜、2a;透明電極膜の外
部接続用端部、3:EL発光層の絶縁膜、IEL発光層
の発光膜、5:EL発光層、6゜裏面電極膜、10:E
L表示パネル、20〜22:裏面絶縁膜、30〜32:
保iJ膜、である。
1 to 3 relate to the present invention; FIG. 1 is an enlarged cross-sectional view of essential parts showing a first embodiment of the ML structure of an EL display panel according to the present invention, and FIG. 2 is a second embodiment thereof. FIG. 3 is a perspective view of the main part of the EL display panel. FIG. 4 is an enlarged sectional view of a main part of a protection structure for an EL display panel according to the prior art. In the figure, 1: insulating substrate, 2: transparent electrode film, 2a: external connection end of transparent electrode film, 3: insulating film of EL light emitting layer, light emitting film of IEL light emitting layer, 5: EL light emitting layer, 6° Back electrode film, 10:E
L display panel, 20-22: Back insulating film, 30-32:
It is an iJ-preserving film.

Claims (1)

【特許請求の範囲】[Claims]  透明な絶縁基板上に透明電極膜と、発光膜および絶縁
膜を含むエレクトロルミネッセンス発光層と、裏面電極
膜とを順次積層してなるエレクトロルミネッセンス表示
パネルに対する外気の侵入防止用の保護構造であって、
透明電極膜と裏面電極膜の外部接続用端部を除きエレク
トロルミネッセンス発光層の全面を含む範囲をエレクト
ロルミネッセンス表示パネルの裏面側から覆う裏面絶縁
膜と、この裏面絶縁膜のほぼ全面を裏面側から覆う金属
からなる保護膜とを備えてなるエレクトロルミネッセン
ス表示パネルの保護構造。
A protective structure for preventing outside air from entering an electroluminescent display panel, which is formed by sequentially laminating a transparent electrode film, an electroluminescent light emitting layer including a light emitting film and an insulating film, and a back electrode film on a transparent insulating substrate. ,
A back insulating film that covers the entire surface of the electroluminescent light emitting layer, excluding the external connection end of the transparent electrode film and the back electrode film, from the back side of the electroluminescent display panel, and a back insulating film that covers almost the entire surface of the back insulating film from the back side. A protective structure for an electroluminescent display panel comprising a protective film made of a covering metal.
JP2194358A 1990-07-23 1990-07-23 Construction for protecting electro-luminescence display panel Pending JPH0479192A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2194358A JPH0479192A (en) 1990-07-23 1990-07-23 Construction for protecting electro-luminescence display panel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2194358A JPH0479192A (en) 1990-07-23 1990-07-23 Construction for protecting electro-luminescence display panel

Publications (1)

Publication Number Publication Date
JPH0479192A true JPH0479192A (en) 1992-03-12

Family

ID=16323253

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2194358A Pending JPH0479192A (en) 1990-07-23 1990-07-23 Construction for protecting electro-luminescence display panel

Country Status (1)

Country Link
JP (1) JPH0479192A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100407487B1 (en) * 1996-09-25 2004-03-20 삼성에스디아이 주식회사 Field effect electron emitting device and method for sealing the same
JP2005347083A (en) * 2004-06-02 2005-12-15 Hitachi Displays Ltd Organic el display device
JP2008248641A (en) * 2007-03-30 2008-10-16 Yunison:Kk Frame body for construction
JP2015007292A (en) * 2008-05-07 2015-01-15 ザ、トラスティーズ オブ プリンストン ユニバーシティ Hybrid layers for use in coatings on electronic devices or other articles
JP2015018283A (en) * 1999-12-27 2015-01-29 株式会社半導体エネルギー研究所 Display device, display module, and electronic apparatus
JP2015207009A (en) * 2000-05-12 2015-11-19 株式会社半導体エネルギー研究所 display device
US9514670B2 (en) 2000-05-12 2016-12-06 Semiconductor Energy Laboratory Co., Ltd. Display device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396895A (en) * 1986-10-13 1988-04-27 株式会社小松製作所 Thin film el device
JPH0298091A (en) * 1988-10-04 1990-04-10 Seikosha Co Ltd Electroluminescent device
JPH02100289A (en) * 1988-10-06 1990-04-12 Sharp Corp Thin film el panel

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6396895A (en) * 1986-10-13 1988-04-27 株式会社小松製作所 Thin film el device
JPH0298091A (en) * 1988-10-04 1990-04-10 Seikosha Co Ltd Electroluminescent device
JPH02100289A (en) * 1988-10-06 1990-04-12 Sharp Corp Thin film el panel

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100407487B1 (en) * 1996-09-25 2004-03-20 삼성에스디아이 주식회사 Field effect electron emitting device and method for sealing the same
JP2015018283A (en) * 1999-12-27 2015-01-29 株式会社半導体エネルギー研究所 Display device, display module, and electronic apparatus
US9412309B2 (en) 1999-12-27 2016-08-09 Semiconductor Energy Laboratory Co., Ltd. Image display device and driving method thereof
US9536468B2 (en) 2000-05-12 2017-01-03 Semiconductor Energy Laboratory Co., Ltd. Display device
JP2015207009A (en) * 2000-05-12 2015-11-19 株式会社半導体エネルギー研究所 display device
US9514670B2 (en) 2000-05-12 2016-12-06 Semiconductor Energy Laboratory Co., Ltd. Display device
US10354589B2 (en) 2000-05-12 2019-07-16 Semiconductor Energy Laboratory Co., Ltd. Display device
US10867557B2 (en) 2000-05-12 2020-12-15 Semiconductor Energy Laboratory Co., Ltd. Display device
JP4589035B2 (en) * 2004-06-02 2010-12-01 株式会社 日立ディスプレイズ Organic EL display device
JP2005347083A (en) * 2004-06-02 2005-12-15 Hitachi Displays Ltd Organic el display device
JP2008248641A (en) * 2007-03-30 2008-10-16 Yunison:Kk Frame body for construction
JP2015007292A (en) * 2008-05-07 2015-01-15 ザ、トラスティーズ オブ プリンストン ユニバーシティ Hybrid layers for use in coatings on electronic devices or other articles
US9882167B2 (en) 2008-05-07 2018-01-30 The Trustees Of Princeton University Hybrid layers for use in coatings on electronic devices or other articles

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