JPH0478539U - - Google Patents
Info
- Publication number
- JPH0478539U JPH0478539U JP12114690U JP12114690U JPH0478539U JP H0478539 U JPH0478539 U JP H0478539U JP 12114690 U JP12114690 U JP 12114690U JP 12114690 U JP12114690 U JP 12114690U JP H0478539 U JPH0478539 U JP H0478539U
- Authority
- JP
- Japan
- Prior art keywords
- gas
- piping
- temperature
- spray nozzle
- spray nozzles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007921 spray Substances 0.000 claims description 5
- 238000005070 sampling Methods 0.000 claims description 3
- 241000234435 Lilium Species 0.000 claims description 2
- 239000003595 mist Substances 0.000 claims 1
- 238000011144 upstream manufacturing Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図は本考案に係るガスサンプリング装置の
一例を示す構成図である。第２図は従来技術を説
明するための図である。
６……ベンチユリ、７……配管、８……吸引装
置、９……スプレーノズル、１３……温度センサ
、Ｇ……ガス。
FIG. 1 is a configuration diagram showing an example of a gas sampling device according to the present invention. FIG. 2 is a diagram for explaining the prior art. 6... Bench lily, 7... Piping, 8... Suction device, 9... Spray nozzle, 13... Temperature sensor, G... Gas.
Claims (1)
設けてなるガスサンプリング装置において、前記
配管内に、スプレーノズルと配管内を流れるガス
の温度を検出する温度センサとを、スプレーノズ
ルが上流側に位置するように適宜の間隔をおいて
配置し、検出されたガスの温度が設定値以上にな
ると、前記スプレーノズルからガスに対して水が
霧状に噴射されるようにしたことを特徴とするガ
スサンプリング装置。 In a gas sampling device in which a suction device is provided on the downstream side of a bench lily via piping, a spray nozzle and a temperature sensor for detecting the temperature of the gas flowing inside the piping are installed in the piping, and the spray nozzle is located on the upstream side. The spray nozzles are arranged at appropriate intervals so that when the temperature of the detected gas exceeds a set value, water is sprayed in the form of a mist onto the gas from the spray nozzles. Sampling equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990121146U JPH089627Y2 (en) | 1990-11-19 | 1990-11-19 | Gas sampling device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990121146U JPH089627Y2 (en) | 1990-11-19 | 1990-11-19 | Gas sampling device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0478539U true JPH0478539U (en) | 1992-07-08 |
| JPH089627Y2 JPH089627Y2 (en) | 1996-03-21 |
Family
ID=31869019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990121146U Expired - Lifetime JPH089627Y2 (en) | 1990-11-19 | 1990-11-19 | Gas sampling device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH089627Y2 (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60213846A (en) * | 1984-03-19 | 1985-10-26 | ホリバ インスツルメンツ インコーポレーテツド | Measuring device for content of discharged substance form internal combustion engine |
| JPS6227549U (en) * | 1985-08-03 | 1987-02-19 | ||
| JPH01161651A (en) * | 1987-12-18 | 1989-06-26 | Hitachi Ltd | Plasma small amount element analyzer |
| JPH01227048A (en) * | 1988-03-08 | 1989-09-11 | Fujitsu Ltd | Analyzing apparatus of composition of particle |
-
1990
- 1990-11-19 JP JP1990121146U patent/JPH089627Y2/en not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60213846A (en) * | 1984-03-19 | 1985-10-26 | ホリバ インスツルメンツ インコーポレーテツド | Measuring device for content of discharged substance form internal combustion engine |
| JPS6227549U (en) * | 1985-08-03 | 1987-02-19 | ||
| JPH01161651A (en) * | 1987-12-18 | 1989-06-26 | Hitachi Ltd | Plasma small amount element analyzer |
| JPH01227048A (en) * | 1988-03-08 | 1989-09-11 | Fujitsu Ltd | Analyzing apparatus of composition of particle |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH089627Y2 (en) | 1996-03-21 |