JPH0478268U - - Google Patents
Info
- Publication number
- JPH0478268U JPH0478268U JP11964190U JP11964190U JPH0478268U JP H0478268 U JPH0478268 U JP H0478268U JP 11964190 U JP11964190 U JP 11964190U JP 11964190 U JP11964190 U JP 11964190U JP H0478268 U JPH0478268 U JP H0478268U
- Authority
- JP
- Japan
- Prior art keywords
- beam source
- sample
- strip
- cooling device
- band
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005530 etching Methods 0.000 claims description 5
- 238000001816 cooling Methods 0.000 claims description 3
- 238000001179 sorption measurement Methods 0.000 claims 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11964190U JPH0478268U (enExample) | 1990-11-14 | 1990-11-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11964190U JPH0478268U (enExample) | 1990-11-14 | 1990-11-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0478268U true JPH0478268U (enExample) | 1992-07-08 |
Family
ID=31867586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11964190U Pending JPH0478268U (enExample) | 1990-11-14 | 1990-11-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0478268U (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015029072A (ja) * | 2013-06-10 | 2015-02-12 | エフ・イ−・アイ・カンパニー | 電子ビーム誘起エッチング |
| KR20180029261A (ko) * | 2015-08-07 | 2018-03-20 | 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. | 지향성 플라즈마 및 반응성 가스를 사용하여 기판들을 처리하기 위한 장치 및 기술들 |
-
1990
- 1990-11-14 JP JP11964190U patent/JPH0478268U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015029072A (ja) * | 2013-06-10 | 2015-02-12 | エフ・イ−・アイ・カンパニー | 電子ビーム誘起エッチング |
| US10304658B2 (en) | 2013-06-10 | 2019-05-28 | Fei Company | Electron beam-induced etching |
| KR20180029261A (ko) * | 2015-08-07 | 2018-03-20 | 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. | 지향성 플라즈마 및 반응성 가스를 사용하여 기판들을 처리하기 위한 장치 및 기술들 |
| JP2018523922A (ja) * | 2015-08-07 | 2018-08-23 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | 方向性プラズマ及び反応性ガスを用いて基板を処理する装置及び技術 |