JPH0474868A - Method for plating fiber reinforced plastic structure - Google Patents
Method for plating fiber reinforced plastic structureInfo
- Publication number
- JPH0474868A JPH0474868A JP18674090A JP18674090A JPH0474868A JP H0474868 A JPH0474868 A JP H0474868A JP 18674090 A JP18674090 A JP 18674090A JP 18674090 A JP18674090 A JP 18674090A JP H0474868 A JPH0474868 A JP H0474868A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- copper
- layer
- fiber reinforced
- roll
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007747 plating Methods 0.000 title claims abstract description 79
- 238000000034 method Methods 0.000 title claims abstract description 15
- 229920002430 Fibre-reinforced plastic Polymers 0.000 title claims abstract description 10
- 239000011151 fibre-reinforced plastic Substances 0.000 title claims abstract description 10
- 229910052802 copper Inorganic materials 0.000 claims abstract description 19
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 7
- 238000005498 polishing Methods 0.000 claims abstract description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 18
- 239000010949 copper Substances 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 14
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 10
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 9
- 239000000835 fiber Substances 0.000 claims description 8
- KXZJHVJKXJLBKO-UHFFFAOYSA-N chembl1408157 Chemical compound N=1C2=CC=CC=C2C(C(=O)O)=CC=1C1=CC=C(O)C=C1 KXZJHVJKXJLBKO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 claims description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- 239000003518 caustics Substances 0.000 claims description 2
- 239000000805 composite resin Substances 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- 238000005488 sandblasting Methods 0.000 abstract description 10
- 229920000049 Carbon (fiber) Polymers 0.000 abstract description 9
- 239000004917 carbon fiber Substances 0.000 abstract description 9
- 238000009713 electroplating Methods 0.000 abstract description 4
- 229920003002 synthetic resin Polymers 0.000 abstract description 4
- 239000000057 synthetic resin Substances 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000007788 roughening Methods 0.000 abstract description 2
- 238000005096 rolling process Methods 0.000 abstract 3
- 239000003822 epoxy resin Substances 0.000 abstract 1
- 229920000647 polyepoxide Polymers 0.000 abstract 1
- 230000002787 reinforcement Effects 0.000 abstract 1
- 238000006748 scratching Methods 0.000 abstract 1
- 230000002393 scratching effect Effects 0.000 abstract 1
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 238000005422 blasting Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- 235000003385 Diospyros ebenum Nutrition 0.000 description 1
- 241000792913 Ebenaceae Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- PEVJCYPAFCUXEZ-UHFFFAOYSA-J dicopper;phosphonato phosphate Chemical compound [Cu+2].[Cu+2].[O-]P([O-])(=O)OP([O-])([O-])=O PEVJCYPAFCUXEZ-UHFFFAOYSA-J 0.000 description 1
- 229920003244 diene elastomer Polymers 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、一般に繊維強化プラスチ/り構造体のめっき
方法に関し、特に繊維強化プラスチツクロールのめっき
方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention This invention relates generally to a method for plating fiber reinforced plastic/plastic structures, and more particularly to a method for plating fiber reinforced plastic rolls.
従来技術の問題点
合成樹脂フィルム等の製造において金属ロールが長年に
互って用いられて来た。かかるロールには様々な特性か
要求される。例えは、フィルムの走行に対する追随性か
良好であること、ロールのたわみや摩耗が少ないこと、
またロール表面の平滑性に優れていること、熱膨張係数
か低い二と。Problems with the Prior Art Metal rolls have been used interchangeably for many years in the manufacture of synthetic resin films and the like. Various characteristics are required of such rolls. For example, the film should have good followability as it travels, and the roll should have little deflection or wear.
In addition, the roll surface has excellent smoothness and the coefficient of thermal expansion is low.
フィルム走行にともなって生ずるロールの帯電の防止ま
たは放電か良好なことなどである。This includes preventing the roll from being charged or discharging electricity that occurs as the film runs.
かかる要請から、ロール素材の軽量化のためにアルミニ
ウム製の軽量ロールか用いられて来たか、更に軽量化を
図るために繊維強化プラスチックを用いたロールの開発
か試みられている。In response to such demands, lightweight rolls made of aluminum have been used to reduce the weight of the roll material, and attempts have been made to develop rolls using fiber-reinforced plastic to further reduce the weight.
例えば、特開昭50−56331号には、繊維強化プラ
スチックス構造物の表面に導電性組成物の皮膜(エポキ
シ樹脂組成物100部に対して、共役ジエン系エラスト
マ組成物5〜100部、カーボンブラック(a)5〜1
25部、金属粉末(b)0〜110部、ただしa+b=
20−150部からなる組成物の皮膜)を形成し、13
0°C以下の温度で硬化して導電化し、該皮膜の表面を
研磨して粗化し、次いで直接電気めっきを施す方法か開
示されている。For example, JP-A-50-56331 discloses that a film of a conductive composition is coated on the surface of a fiber-reinforced plastic structure (5 to 100 parts of a conjugated diene elastomer composition, carbon Black (a) 5-1
25 parts, metal powder (b) 0 to 110 parts, where a+b=
forming a film of a composition consisting of 20-150 parts of
A method is disclosed in which the film is cured at a temperature of 0° C. or lower to become conductive, the surface of the film is roughened by polishing, and then electroplated directly.
また、特開昭61−194197号公報には、炭素繊維
トウを含む複合材料で構成された円筒状物の表面か、内
層より導電処理材料層、銅又はニッケル層及び硬質クロ
ム層て被覆されているローラを開示してしする。Furthermore, in JP-A No. 61-194197, the surface of a cylindrical object made of a composite material containing carbon fiber tow is coated from the inner layer with a conductive treatment material layer, a copper or nickel layer, and a hard chromium layer. I will reveal Laura who is there.
これらの公知文献においては、炭素繊維強化樹脂を用い
ているにも拘わらす、構造物の表面に炭素粉末、金属粉
末、銀粉末なとの導電性粉末を含む樹脂組成物を塗布し
て導電皮膜を形成し、その上にめっきを行っている。二
のことは、炭素繊維強化樹脂表面に直接にめっきを行う
二との技術的困難性を物語っている。In these known documents, although carbon fiber reinforced resin is used, a conductive film is formed by applying a resin composition containing conductive powder such as carbon powder, metal powder, or silver powder to the surface of the structure. is formed, and plating is performed on it. The second point shows the technical difficulty of directly plating the surface of the carbon fiber reinforced resin.
上述のめっき方法は、ロールの軽量化においてそれなり
の成果をもたらしているものの、導電層へのめっきにつ
いて下記の問題かあった。Although the above-mentioned plating method has brought about some results in reducing the weight of the roll, there are the following problems regarding plating on the conductive layer.
1、導電皮膜形成の前処理における繊維強化樹脂構造物
表面の研磨において、樹脂の脆性により表面の部分的な
破壊、脱落及び炭素繊維の部分的な破損が生し易い。1. When polishing the surface of a fiber-reinforced resin structure in pretreatment for forming a conductive film, the brittleness of the resin tends to cause partial destruction of the surface, falling off, and partial breakage of the carbon fibers.
2、研磨によって荒らされた表面に30μmの導電性皮
膜を形成する場合には導電性皮膜の厚さを均一に形成す
ることか困難であり、ま!:影形成れた導電性皮膜にお
ける導電性材料の均質化が難しい。2. When forming a 30 μm conductive film on a surface roughened by polishing, it is difficult to form the conductive film with a uniform thickness. : It is difficult to homogenize the conductive material in the shaded conductive film.
3、導電層形成用の墜布材料中における導電材料の添加
量は、導電材料の比率か大きくなれは成る程導電性は増
大するか、塗膜の強度が低下し。3. Regarding the amount of conductive material added in the cloth material for forming the conductive layer, the larger the ratio of the conductive material, the more the conductivity increases or the strength of the coating film decreases.
脆化する。従って通常は導電材料の添加は10〜30%
程度とするのか一般である。この場合炭素繊維が50〜
55%を占める強化繊維に比して導電性が劣り、高密度
のめっきが得られなくなる。become brittle. Therefore, the addition of conductive material is usually 10 to 30%.
Generally speaking, it is considered as a degree. In this case, carbon fiber is 50~
The conductivity is inferior to that of reinforcing fibers, which account for 55%, and high-density plating cannot be obtained.
4、導電性皮膜の乾燥f長時間を要する。4. It takes a long time to dry the conductive film.
5、導電性皮膜におけ導電性粉末の分布を均質化し難い
。5. It is difficult to homogenize the distribution of conductive powder in the conductive film.
6、上記1〜3の結果として、耐久性のある良好なめっ
きが得られない。6. As a result of 1 to 3 above, durable and good plating cannot be obtained.
これらの問題は、何れも、高コスト化につながり、また
最終的なめっき層の強度、めっき表面の仕上がりが、従
来のアルミニウムロールのめっき製品に比して満足すべ
き水準には達していなかっIこ 。All of these problems lead to high costs, and the strength of the final plating layer and the finish of the plating surface do not reach a satisfactory level compared to conventional aluminum roll plating products. child .
問題点を解決する手段
本件出願人は、上述の問題を解決するべく鋭意研究を重
ねた結果、本発明を完成した。Means for Solving the Problems The present applicant has completed the present invention as a result of intensive research to solve the above problems.
本発明によれば、高密度の導電性繊維で強化した樹脂複
合材料より成形された構造体の表面をサンドブラストに
よって導電性繊維を露出させると共に表面を粗面化し、
しかる後表面を脱脂、洗浄して、該表面に直接に特殊組
成のめっき浴及びめっき条件のストライクめっきにより
1−10μmの銅めっき層、次いで電解銅めっきまたは
電解ニッケルめっきにより所望の厚さのめつき層を形成
し、必要に応じて表面研磨しく例えば、表面粗度0゜2
〜0.85)、Lかる、後電解硬質クロームめっきによ
り所望の厚さの硬質クロームめっき層を形成し、必要に
応じて表面研磨して所望の表面粗度とする。According to the present invention, the surface of a structure formed from a resin composite material reinforced with high-density conductive fibers is exposed by sandblasting, and the surface is roughened.
After that, the surface is degreased and washed, and a copper plating layer of 1-10 μm is applied directly to the surface by strike plating using a plating bath with a special composition and plating conditions, and then plated to a desired thickness by electrolytic copper plating or electrolytic nickel plating. A layer is formed and the surface is polished as necessary, for example, to a surface roughness of 0°2.
~0.85), a hard chrome plating layer of a desired thickness is formed by post-electrolytic hard chrome plating, and the surface is polished as necessary to obtain a desired surface roughness.
作 用
サンドブラスト処理により、基材表面の粗度を適切に調
整すると共に、導電性繊維を極度に破壊する事なく充分
に露出せしめて電着面積を増大させ、ストライクめっき
により、素地との高い密着力を確保し、その上lこ銅又
はニッケルめっきを施して必要に応して研磨し、所望の
平滑度(粗度)に仕上けた後、硬質クロームめっきを施
し、必要に応じて研磨することにより、充分な表面硬度
。Function The sandblasting process allows the roughness of the base material surface to be adjusted appropriately, and the conductive fibers are fully exposed without being destroyed to an extreme extent, increasing the electrodeposition area, and the strike plating achieves high adhesion to the base material. After securing the strength, apply copper or nickel plating and polish as necessary to achieve the desired smoothness (roughness), then apply hard chrome plating and polish as necessary. Provides sufficient surface hardness.
平滑性を有し、耐久性の優れためつき層が形成できる。It has smoothness and can form a durable layer.
以上に、本発明の概要を述へたか、本発明をより良く理
解するために、本発明の実施例を通じて更に本発明を詳
述する。The present invention has been outlined above, and in order to better understand the present invention, the present invention will be further described in detail through examples of the present invention.
実 施 例
高密度に炭素繊維を複数層に巻回した円筒状構造物で強
化されたエボキ/樹脂で形成された市販のロール(束燃
社製、外径100mm、長さ1800mm)を用意し、
サンドブラストによりロール表面を粗面化しj:。ブラ
スト材料、吹き付は空気圧力、噴射ノズル径等は、従来
から慣用されている範囲内において、適宜選択して行う
(例えば、ブラスト材料:エメリー、珪砂、グリソト、
カラ又ヒーズ等、吹き付は空気圧カニ3Kg/cm”−
3K g / c m ”、噴射ノズル径:5mm−1
0mm、粒径:100〜250メツツユ)。サンドブラ
スト処理の条件を変更して種々行ってみたか、サンドブ
ラストが不充分であっても、過剰であっテモ、後のスト
ライクめっき処理の結果に太いに影響を与えることか判
った。望ましいサンドブラストは、素材表面における樹
脂表面を微細な粗面とし、且つ導電性繊維を表面Iこ充
分に露出させて導電性表面を極力増大させるか、導電性
繊維そのものを破壊しない程度に止どめることか重要で
あることが判った。従って、ブラスト条件は、対象素材
の組織(繊維の番手、撚りの状態1巻き方、樹脂の種類
及び含浸状態等)を考慮して適宜選択する必要がある。Example A commercially available roll made of ebony/resin reinforced with a cylindrical structure made of multiple layers of highly densely wound carbon fiber (manufactured by Takunen Co., Ltd., outer diameter 100 mm, length 1800 mm) was prepared. ,
The roll surface is roughened by sandblasting. The blasting material, the air pressure for spraying, the diameter of the injection nozzle, etc. are appropriately selected within the conventional range (for example, blasting materials: emery, silica sand, grisotho, etc.).
Air pressure crab 3Kg/cm"-
3K g/cm”, injection nozzle diameter: 5mm-1
0 mm, particle size: 100-250 mm). I tried various methods of sandblasting by changing the sandblasting conditions, and found that even if the sandblasting was insufficient, it was too much, and it greatly affected the results of the subsequent strike plating process. Desirable sandblasting is to make the resin surface on the material surface into a finely roughened surface, and to fully expose the conductive fibers on the surface to increase the conductive surface as much as possible, or to limit the conductivity to such an extent that the conductive fibers themselves are not destroyed. It turned out to be something important. Therefore, the blasting conditions need to be appropriately selected in consideration of the structure of the target material (fiber count, twist state, winding method, type of resin, impregnation state, etc.).
ブラスト処理後、構造物表面を常法により脱脂。After blasting, the surface of the structure is degreased using conventional methods.
洗浄した。Washed.
次いで、ストライク銅めっきにより膜厚5μmの銅めっ
き層を形成した。本発明においては、シアン化銅30〜
60g/Q、ンアン化ソーダ5〜15 g/Q、遊離ノ
アン化ソーダ5〜10g/Q。Next, a copper plating layer with a thickness of 5 μm was formed by strike copper plating. In the present invention, copper cyanide 30~
60 g/Q, sodium chloride 5-15 g/Q, free sodium chloride 5-10 g/Q.
苛性カリ5〜lOg/Qの組成のめつき浴(pH12以
上)を用い、めっき浴温度55〜75℃、使用電圧10
〜15V、電流15−20A、陽極・陰極間距離を標準
距離の3〜5倍として行う。上述のサンドブラスト処理
による予備処理と、上述の特殊めっき浴の組成、高温の
めっき浴、高電圧。Using a plating bath (pH 12 or higher) with a composition of caustic potassium 5 to 10g/Q, plating bath temperature 55 to 75°C, working voltage 10
~15V, current 15-20A, anode-cathode distance 3-5 times the standard distance. The above-mentioned preliminary treatment by sandblasting, the above-mentioned special plating bath composition, high temperature plating bath, and high voltage.
高電流密度で通常の3〜5倍の電極間距離によるストラ
イクめっきの採用により極めて密着性の良いめっきが可
能となった。電極間距離は、めっきされるべき構造物の
形状によって変化する。本発明におけるストライクめっ
き浴の組成において、ラアン化銅ニジアン化ソーダ比を
逆転させて銅イオンの補給源であるシアン化銅の濃度を
大幅に高めた。遊離シアン化ソーダは、状況により調整
する。めっき浴温度は、55〜75°Cか適当であり、
浴温度が高くなると通電はし安くなり、陽極の溶解も促
進されるので、支障がない限り高温で行われる。まI;
使用電圧を上昇させると密着性か良好になるが、通常の
陰極・陽極間距離(D)では電流か上昇し通電中に「焼
け」が生じる。従って本発明においては、陰極・陽極間
距離を通常の3〜5倍の範囲で行う。By employing strike plating with a high current density and a distance between electrodes that is 3 to 5 times the normal distance, it has become possible to achieve plating with extremely good adhesion. The distance between the electrodes varies depending on the shape of the structure to be plated. In the composition of the strike plating bath in the present invention, the ratio of copper chloride to sodium dianide was reversed to significantly increase the concentration of copper cyanide, which is a supply source of copper ions. Free sodium cyanide may be adjusted depending on the situation. The plating bath temperature is 55 to 75°C or appropriate;
When the bath temperature is high, it becomes easier to conduct electricity and the dissolution of the anode is promoted, so it is carried out at a high temperature unless there is a problem. MaI;
Increasing the working voltage improves the adhesion, but with a normal cathode-anode distance (D), the current increases and "burning" occurs during energization. Therefore, in the present invention, the distance between the cathode and the anode is set to be 3 to 5 times the normal distance.
ストライクめっきのめっき条件は被めっき体の材質7表
面状態、形状によって上述の範囲内において調節するこ
とが必要である。形成される膜厚は少なくとも3〜5μ
mとするのかよい。膜厚の上限は特に制限はないか、l
opmを越えて形成することは意味がない。ストライク
銅めっきはシアン系のほか、ピロリン酸銅系にも適用で
きる。It is necessary to adjust the plating conditions for strike plating within the above-mentioned range depending on the surface condition and shape of the material 7 of the object to be plated. The film thickness formed is at least 3-5μ
Should it be m? Is there any particular upper limit to the film thickness?
It is meaningless to form more than opm. Strike copper plating can be applied not only to cyanide plating but also to copper pyrophosphate plating.
クローム、鉄、カドミウム、ニッケル等の金属素材に酸
性銅めっきを行うと、銅はこれらの金属より電位列が下
位にあるので、酸性銅めっき浴に浸漬されたそれらの素
材金属がイオン化して溶解し、その上に銅が析出するの
で密着性の良いめっきができない。When acid copper plating is applied to metal materials such as chromium, iron, cadmium, nickel, etc., since copper is lower in the potential series than these metals, the material metals immersed in the acidic copper plating bath ionize and dissolve. However, since copper precipitates on top of it, plating with good adhesion cannot be achieved.
これに対して、本発明におけるストライクめっきは、上
述のごとくシアン系の特殊めっき浴を使用し、且つ従来
のストライクめっきに比して陽極・陰極間の距離を大に
して高温、高電圧、高電流で行うことにより、瞬間的に
且つ全面的にめっき層を形成させることができる。本発
明のめつき浴中の銅イオン密度は非常に小さいので極め
て密着性の良いめっきが可能となる。On the other hand, the strike plating in the present invention uses a special cyan-based plating bath as mentioned above, and the distance between the anode and cathode is larger than that of conventional strike plating, resulting in high temperatures, high voltages, and high By using an electric current, a plating layer can be formed instantaneously and over the entire surface. Since the copper ion density in the plating bath of the present invention is extremely low, plating with extremely good adhesion is possible.
かくて形成されたストライクめっき層の上に電解めっき
により所望の厚さ(例えば、300μm)の銅めっき層
を形成する。電解めっき力条件は標準的なものであって
良い。形成された電解めっき層は必要に応して常法に従
い所望の表面粗度(例えば0.65)まで研磨する。A copper plating layer having a desired thickness (for example, 300 μm) is formed on the strike plating layer thus formed by electrolytic plating. Electrolytic plating force conditions may be standard. The formed electroplated layer is polished according to a conventional method to a desired surface roughness (for example, 0.65), if necessary.
次いで電解硬質クロームめっきにより100μmのめっ
き層を形成し、必要に応じて常法により所望の表面粗度
(例えは、0.23)まで仕上げ研磨を行った。Next, a 100 μm plating layer was formed by electrolytic hard chrome plating, and if necessary, final polishing was performed by a conventional method to a desired surface roughness (for example, 0.23).
以上により、表面粗度が0.23.表面硬度が900〜
950HVで耐摩耗性、剥離強度の優れためっきロール
が得られた。この製品は、−瞥して、従来の製品に比し
て優れた品質を有することが当業技術の熟達者には明ら
かであった。As a result of the above, the surface roughness is 0.23. Surface hardness is 900~
A plated roll with excellent wear resistance and peel strength was obtained at 950HV. At first glance, it was apparent to those skilled in the art that this product had superior quality compared to conventional products.
炭素繊維強化樹脂製の円筒体に導電材料を混和した塗料
で導電性皮膜を形成し、そのうえに銅めっき層を形成し
、更Iこ硬質クロームめっき層を形成した従来のローラ
と本発明によるローラとを用いて120°Cの温度で、
24時間使用した比較試験の結果、従来製品においては
細かい部分的な膨れか認められたが、本発明の製品にお
いては全く膨れは認められなかった。A conventional roller in which a conductive film is formed on a cylindrical body made of carbon fiber reinforced resin using paint mixed with a conductive material, a copper plating layer is formed thereon, and a hard chrome plating layer is further formed, and a roller according to the present invention. at a temperature of 120°C using
As a result of a comparative test using the product for 24 hours, only small blisters were observed in the conventional product, but no blisters were observed in the product of the present invention.
尚、本発明(こおける電解銅めっき層の厚さは、その前
の工程における表面の状態及び仕上げ後の表面の平滑性
の度合いによって変化する。クロームめっきの厚さも同
様である。また、本発明の方法は、めっきロールの製造
のみならす、他の繊維強化プラスチンク構造物のめっき
方法として利用可能であることは明らかである。The thickness of the electrolytic copper plating layer in the present invention varies depending on the surface condition in the previous step and the degree of surface smoothness after finishing.The same applies to the thickness of the chrome plating. It is clear that the method of the invention can be used not only for producing plating rolls, but also as a method for plating other fiber-reinforced plastic structures.
発明の効果 本発明によって奏せられる効果は下記のとおりである。Effect of the invention The effects achieved by the present invention are as follows.
サンドブラストIこよって、素材表面の微細な粗面化と
導電性繊維を破壊することなく可及的に広い面積で露出
させること、及び特殊めっき浴、めっき条件によるスト
ライクめっきによって密着性の良い導電性表面を形成す
る二との組み合わせによって、素材表面に導電性組成物
を壁布する必要を無く、直接に銅めっき層を形成し、そ
の上にめっき層を重ねる二とによって耐久性の優イまた
めつき層を形成できる。Sandblasting I Therefore, by finely roughening the material surface and exposing the conductive fibers in as wide an area as possible without destroying them, and by strike plating using a special plating bath and plating conditions, it is possible to achieve good conductivity with good adhesion. In combination with the second layer that forms the surface, there is no need to coat the surface of the material with a conductive composition, and the copper plating layer is directly formed, and the second layer is layered on top of the copper plating layer, resulting in superior durability. A storage layer can be formed.
Claims (1)
成形された構造体の表面をサンドブラストによって導電
性繊維を露出させると共に表面を粗面化し、しかる後、
表面を脱脂,洗浄して、該表面に直接にストライクめっ
きにより1〜10μmの銅めっき層を形成し、次いで電
解銅めっきまたは電解ニッケルめっきにより所望の厚さ
のめっき層を形成し、必要に応じ表面研磨し、しかる後
電解硬質クロームめっきにより所望の厚さの硬質クロー
ムめっき層を形成し、必要に応じ表面研磨することを特
徴とする繊維強化プラスチック構造体のめっき方法。 [2]請求項第1項記載のめっき方法において、上記ス
トライクめっきが、シアン化銅30〜60g/l,シア
ン化ソーダ5〜15g/l,遊離シアン化ソーダ5〜1
0g/l,苛性カリ5〜10g/lの組成のめっき浴(
pH12以上)を用い、めっき浴温度55〜75℃、使
用電圧10〜15V,電流15〜20A、陽極・陰極間
距離を標準距離の3〜5倍の範囲で行うことを特徴とす
る繊維強化プラスチック構造体のめっき方法。[Scope of Claims] [1] The surface of a structure formed from a resin composite material reinforced with high-density conductive fibers is sandblasted to expose the conductive fibers and to roughen the surface, and then,
Degrease and clean the surface, form a copper plating layer of 1 to 10 μm directly on the surface by strike plating, then form a plating layer of the desired thickness by electrolytic copper plating or electrolytic nickel plating, as necessary. A method for plating a fiber-reinforced plastic structure, which comprises polishing the surface, forming a hard chrome plating layer of a desired thickness by electrolytic hard chromium plating, and polishing the surface if necessary. [2] In the plating method according to claim 1, the strike plating includes 30 to 60 g/l of copper cyanide, 5 to 15 g/l of sodium cyanide, and 5 to 1 g/l of free sodium cyanide.
Plating bath with a composition of 0 g/l and 5 to 10 g/l of caustic potassium (
A fiber-reinforced plastic characterized by plating at a plating bath temperature of 55 to 75°C, a working voltage of 10 to 15 V, a current of 15 to 20 A, and an anode-cathode distance of 3 to 5 times the standard distance. Structure plating method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18674090A JPH0474868A (en) | 1990-07-13 | 1990-07-13 | Method for plating fiber reinforced plastic structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18674090A JPH0474868A (en) | 1990-07-13 | 1990-07-13 | Method for plating fiber reinforced plastic structure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0474868A true JPH0474868A (en) | 1992-03-10 |
Family
ID=16193826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18674090A Pending JPH0474868A (en) | 1990-07-13 | 1990-07-13 | Method for plating fiber reinforced plastic structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0474868A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120292980A1 (en) * | 2011-05-20 | 2012-11-22 | Michael Lee | Wheel rim for bicycle and producing method of producing the same |
WO2012113926A3 (en) * | 2011-02-25 | 2013-05-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Selectively coated crp components and process for the production thereof |
JP2016047585A (en) * | 2014-08-28 | 2016-04-07 | ブラスト工業株式会社 | Blast processing device and blast processing method |
JP2016197483A (en) * | 2015-04-06 | 2016-11-24 | Tdk株式会社 | Rectification component for magnetic disk device |
US10144112B2 (en) | 2014-08-28 | 2018-12-04 | Subaru Corporation | Blast treatment device and blast treatment method |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5742736A (en) * | 1980-08-29 | 1982-03-10 | Hashimoto Forming Co Ltd | Production of synthetic resin molded article |
JPS6026694A (en) * | 1983-07-22 | 1985-02-09 | Mitsubishi Rayon Co Ltd | Method for plating metal on plastic molding |
-
1990
- 1990-07-13 JP JP18674090A patent/JPH0474868A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5742736A (en) * | 1980-08-29 | 1982-03-10 | Hashimoto Forming Co Ltd | Production of synthetic resin molded article |
JPS6026694A (en) * | 1983-07-22 | 1985-02-09 | Mitsubishi Rayon Co Ltd | Method for plating metal on plastic molding |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012113926A3 (en) * | 2011-02-25 | 2013-05-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Selectively coated crp components and process for the production thereof |
US9562301B2 (en) | 2011-02-25 | 2017-02-07 | Airbus Operations Gmbh | Selectively coated CRP components and process for the production thereof |
US20120292980A1 (en) * | 2011-05-20 | 2012-11-22 | Michael Lee | Wheel rim for bicycle and producing method of producing the same |
US20140374269A1 (en) * | 2011-05-20 | 2014-12-25 | Carbotec Industrial Co., Ltd. | Wheel rim for bicycle and producing method of producing the same |
JP2016047585A (en) * | 2014-08-28 | 2016-04-07 | ブラスト工業株式会社 | Blast processing device and blast processing method |
US10118275B2 (en) | 2014-08-28 | 2018-11-06 | Subaru Corporation | Blast treatment device and blast treatment method |
US10144112B2 (en) | 2014-08-28 | 2018-12-04 | Subaru Corporation | Blast treatment device and blast treatment method |
JP2016197483A (en) * | 2015-04-06 | 2016-11-24 | Tdk株式会社 | Rectification component for magnetic disk device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100573531B1 (en) | Galvanic bath, method for producing structured hard chromium layers and use thereof | |
EP0543293B1 (en) | Coated article and method for producing same | |
US3591468A (en) | Method of coating metal surfaces with a fluorine-containing polymer | |
JPH0257690A (en) | Aluminum plated substrate for anodic oxidation | |
JPH0474868A (en) | Method for plating fiber reinforced plastic structure | |
US2389131A (en) | Electrodeposition of antimony | |
US2002261A (en) | Rubber coated steel object and method of making the same | |
US3790355A (en) | Coated metal article and method of coating | |
KR101310124B1 (en) | Carbon fiber-reinforced plastics manufacturing method of metal plating roller and this made roller | |
US3594288A (en) | Process for electroplating nickel onto metal surfaces | |
CN105908183A (en) | Preparation method of wear resistant plating layer on surface of titanium or titanium alloy | |
JPH07151135A (en) | Carbon fiber reinforced resin roll and manufacture thereof | |
JPH07122157B2 (en) | Roll surface treatment method | |
JP4828891B2 (en) | Metal plating method of polyacetal resin molding and its plating product | |
US3202589A (en) | Electroplating | |
JP4206012B2 (en) | Formation method of underlayer for thermal spraying of carbon fiber reinforced plastic material surface | |
US4035247A (en) | Method of manufacturing a reflecting mirror | |
JP3345923B2 (en) | Textured mold with excellent wear resistance | |
JP2000282290A (en) | MANUFACTURE OF Ni PLATED STAINLESS STEEL SHEET HAVING EXCELLENT GLOSSINESS AND REDUCED CONTACT RESISTANCE | |
US2519858A (en) | Electrodeposition of nickel and nickel alloys | |
JPS6142797B2 (en) | ||
US1909716A (en) | Method of chromium plating | |
US2336568A (en) | Method of metal electroplating | |
JPS59185794A (en) | Surface treatment of drum for winder | |
JP2784088B2 (en) | Manufacturing method of cylinder shaft |