JPH0474849A - Shadow mask material - Google Patents
Shadow mask materialInfo
- Publication number
- JPH0474849A JPH0474849A JP18834490A JP18834490A JPH0474849A JP H0474849 A JPH0474849 A JP H0474849A JP 18834490 A JP18834490 A JP 18834490A JP 18834490 A JP18834490 A JP 18834490A JP H0474849 A JPH0474849 A JP H0474849A
- Authority
- JP
- Japan
- Prior art keywords
- shadow mask
- mask material
- grain size
- alloy
- invar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 43
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 13
- 239000000956 alloy Substances 0.000 claims abstract description 13
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 7
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 7
- 229910052748 manganese Inorganic materials 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 239000013078 crystal Substances 0.000 claims abstract description 5
- 229910001566 austenite Inorganic materials 0.000 claims abstract description 4
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 3
- 239000000470 constituent Substances 0.000 claims description 4
- 238000005530 etching Methods 0.000 abstract description 19
- 229910052760 oxygen Inorganic materials 0.000 abstract description 3
- 229910052799 carbon Inorganic materials 0.000 abstract description 2
- 238000003825 pressing Methods 0.000 abstract description 2
- 229910001374 Invar Inorganic materials 0.000 abstract 3
- 235000019589 hardness Nutrition 0.000 abstract 3
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000000137 annealing Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 15
- 238000000465 moulding Methods 0.000 description 6
- 239000011148 porous material Substances 0.000 description 6
- 230000004313 glare Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000012937 correction Methods 0.000 description 2
- 229910000655 Killed steel Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Landscapes
- Electrodes For Cathode-Ray Tubes (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、カラーブラウン管用シャドウマスク材に関す
るものであり、特にシャドウマスクを製造する工程での
プレス成形前に行なわれる軟化焼鈍工程を必要としない
ように調整したシャドウマスク材に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a shadow mask material for color cathode ray tubes, and in particular, a shadow mask material that requires a softening annealing process before press forming in the process of manufacturing the shadow mask. Regarding shadow mask materials adjusted to avoid shadows.
カラーブラウン管のシャドウマスク材としては長年アル
ミキルド鋼が使用されてきたが、最近ではカラーテレビ
の大型化、デイスプレィの超高精細化等の要求により、
熱膨張率の低いＮ ｉ−Ｆ ｅ系合金であるアンバー合
金が用いられるようになってきている。Aluminum killed steel has been used as a shadow mask material for color cathode ray tubes for many years, but recently, due to the demand for larger color TVs and ultra-high definition displays,
Amber alloy, which is a Ni-Fe based alloy with a low coefficient of thermal expansion, has come to be used.
このようなアンバー合金を用いたシャドウマスクの製造
工程は一般に次の通りである。The manufacturing process of a shadow mask using such an amber alloy is generally as follows.
まず、材料の溶解および鋳造後適宜の圧延工程を経由し
、最終冷間加工にて所定の厚さを有するシャドウマスク
材を得る。次にシャドウマスク材はエツチング穿孔加工
されてフラットマスクとなり、このフラットマスクは軟
化焼鈍されてプレス成形性を付与され、その後プレスに
よりシャドウマスクの形状に応じた球面に成形される。First, the material is melted and cast, and then subjected to an appropriate rolling process, and finally cold worked to obtain a shadow mask material having a predetermined thickness. Next, the shadow mask material is etched and perforated to form a flat mask, and this flat mask is softened and annealed to give it press formability, and then is pressed into a spherical shape corresponding to the shape of the shadow mask.
球面成形されたマスクは黒化処理を施されシャドウマス
クとなる。The spherical mask is subjected to a blackening process and becomes a shadow mask.
上記工程のうち、プレス成形性を付与するために行なわ
れる軟化焼鈍工程は、フラットマスクを数十枚重ね合わ
せるか、１枚１枚吊り下げた状態で行なわれるため、生
産性に問題があった。Among the above processes, the softening annealing process, which is performed to impart press formability, is performed with dozens of flat masks stacked one on top of the other or suspended one by one, which poses productivity problems. .
また、軟化焼鈍工程において、フラットマスク同士の密
着による焼付あるいは焼鈍むらが発生するという問題も
あった。Further, in the softening annealing process, there was also a problem that seizure or annealing unevenness occurred due to close contact between flat masks.
このような問題に対し、特開昭６２−２３８００３号公
報あるいは特開平２−２５２０１号公報には、シャドウ
マスク材の表面粗さを大きくして、焼鈍時の材料同士の
密着を防ぎ焼付を低減することが提案されている。To address these problems, JP-A-62-238003 or JP-A-2-25201 discloses that the surface roughness of the shadow mask material is increased to prevent the materials from adhering to each other during annealing and to reduce seizure. It is proposed to do so.
また、シャドウマスク材にＳｉ、Ｍｎ、Ａ１等の酸化し
易い元素を添加することによって、表面に酸化膜を形成
し、焼付を防止することも知られている。It is also known that an oxidizable element such as Si, Mn, A1, etc. is added to the shadow mask material to form an oxide film on the surface to prevent seizure.
また、プレス成形前の焼鈍をなくすことも試みられてい
る。たとえば、特開昭６２−１４９８１９号公報では、
材料の強さをビッカース硬さ（以下Ｈｖという） Ｈｖ
１８０〜２２０とし、１０％以上の伸びを有するアンバ
ー合金を得ることにより、エツチング工程での材料の蛇
行の防止とプレス成形性を両立させプレス成形前の軟化
焼鈍工程を省略しようとしている。Also, attempts have been made to eliminate annealing before press forming. For example, in Japanese Patent Application Laid-Open No. 62-149819,
The strength of a material is Vickers hardness (hereinafter referred to as Hv).
By obtaining an amber alloy having an elongation of 180 to 220 and an elongation of 10% or more, the aim is to achieve both prevention of meandering of the material in the etching process and press formability, and to omit the softening annealing process before press forming.
上述したような表面粗さを大きくする方法では、エツチ
ングは表面粗さに影響されるのでエツチング穿孔部の形
状が不足となる問題がある。また、添加元素を加える方
法では、Ｓｉ、Ｍｎ、Ａ１などによりエツチングの均一
性が得られなかったり、黒化処理の劣化を招くという問
題があった。In the method of increasing the surface roughness as described above, since etching is affected by the surface roughness, there is a problem that the shape of the etched hole is insufficient. Further, in the method of adding additive elements, Si, Mn, A1, etc. cause problems in that uniformity of etching cannot be obtained and that the blackening process deteriorates.
このように軟化焼鈍工程で発生する問題を解決する従来
の方法では、他の特性を犠牲にする必要があった。Conventional methods for solving these problems occurring in the softening annealing process have required sacrificing other properties.
超高精細のシャドウマスク材に要求されるプレス成形性
とは成形精度が確保されることと超微細なエツチング孔
に破断等が発生しないことであるが、Ｈｖ１８０以上の
特開昭６２−１４９８１９号公報に記載されるような前
述の材料では、材料の弾性に起因するスプリングバック
が大きく、そのままではプレス成形による成形精度が得
られない。The press formability required for ultra-high-definition shadow mask materials is to ensure molding accuracy and to prevent breakage from occurring in ultra-fine etched holes. With the above-mentioned materials as described in the publication, the springback caused by the elasticity of the material is large, and forming accuracy by press molding cannot be obtained as it is.
また、超高精細のシャドウマスク材のエツチング性とし
ては、特に得られた細孔の形状がすべて均一に揃ってい
ることが必要とされる。Furthermore, for the etching properties of an ultra-high-definition shadow mask material, it is especially necessary that the shapes of the obtained pores are all uniform.
本発明の目的は、軟化焼鈍工程を省略しても良好なプレ
ス成形性を有し、しかも超高精細のシャドウマスク材の
穿孔にも対応できるシャドウマスク材を提供することで
ある。An object of the present invention is to provide a shadow mask material that has good press formability even if the softening annealing step is omitted, and can also be used for ultra-high definition perforation of shadow mask materials.
本発明は、結晶粒がＪＩＳによるオーステナイト結晶粒
度番号７より細粒であり、ビッカース硬さ１４０以下、
フラットマスク状態におけるシャドウマスク構成面積内
のビッカース硬さの最大値と最小値の差が１０以下のア
ンバー合金からなることを特徴とするシャドウマスク材
である。In the present invention, the crystal grains are finer than the austenite grain size number 7 according to JIS, and have a Vickers hardness of 140 or less.
This shadow mask material is characterized by being made of an amber alloy in which the difference between the maximum value and the minimum value of Vickers hardness within the shadow mask constituent area in a flat mask state is 10 or less.
また本発明は、重量％でＣ≦０．０５％、Ｓｉ≦０．０
５％、Ｍｎ≦０．４０％、Ｐ≦０．００５％、Ｓ≦０．
００５％、０５０．０１０％、Ｎ ｉ ３５．５−３６
．５％、残部実質的にＦｅのアンバー合金からなること
を特徴とする特許請求の範囲第１項に記載のシャドウマ
スク材である。Further, the present invention provides C≦0.05% and Si≦0.0% by weight.
5%, Mn≦0.40%, P≦0.005%, S≦0.
005%, 050.010%, Ni 35.5-36
．． The shadow mask material according to claim 1, characterized in that the shadow mask material consists of an amber alloy of 5% Fe and the remainder substantially Fe.
本発明は、アンバー合金よりなるシャドウマスク材の結
晶粒度、硬さおよび硬さのバラツキを所定の範囲内にす
ることによって、プレス成形前の軟化焼鈍を省略でき、
しかもエツチング性とプレス成形性に優れたシャドウマ
スクが得られることを見い出したものである。The present invention makes it possible to omit softening annealing before press forming by controlling the grain size, hardness, and variation in hardness of the shadow mask material made of an amber alloy within a predetermined range.
Moreover, it has been discovered that a shadow mask with excellent etching properties and press moldability can be obtained.
結晶粒度をＪＩＳによるオーステナイト結晶粒度番号７
より細かくするのは、エツチングにより得られる細孔の
形状を均一なものとするためである。結晶粒が５〜７番
程度であると、エツチングによって得られた細孔のエツ
チング面の滑らかさが損なわれ、エツチング面の粗さに
起因する乱反射によるギラツキ（いわゆるアラビ）が確
認されて形状不良となる。Austenite grain size number 7 according to JIS
The purpose of making the pores finer is to make the shape of the pores obtained by etching uniform. If the crystal grain size is around 5 to 7, the smoothness of the etched surface of the pores obtained by etching will be impaired, and glare (so-called arabic) due to diffused reflection due to the roughness of the etched surface will be observed, resulting in poor shape. becomes.
また、硬さをＨＶ１４０以下としたのは、Ｈｖ１４０を
越えると材料のスプリングバックが大きく、また伸びも
小さいためプレス成形で所望の形状が得られなかったり
、エツチングによって得た細孔に裂は目、破断等が発生
してしまうためである。In addition, the reason why the hardness is set to HV140 or less is because if the hardness exceeds HV140, the springback of the material will be large and the elongation will be small, so the desired shape cannot be obtained by press molding, and the pores obtained by etching will not have cracks. This is because breakage and the like may occur.
Ｈｖ１４０以下でも１枚の素材のシャドウマスク構成面
積内の硬度差がビッカース硬さ（）（ｖ）で】Ｏを越え
ると、プレス成形時に変形量の違いが発生し、成形ムラ
や細孔の破断といったプレス成形不良が生じるためフラ
ットマスク状態での１枚のシャドウマスク構成面積内の
高度差はビッカース硬さで１０以下でなければならない
。Even if Hv140 or less, if the difference in hardness within the constituent area of the shadow mask of one material exceeds the Vickers hardness () (v) of ]O, a difference in the amount of deformation will occur during press molding, resulting in uneven molding and rupture of pores. In order to avoid such press forming defects, the height difference within the constituent area of one shadow mask in a flat mask state must be 10 or less in terms of Vickers hardness.
このような特性は、製品板厚に冷間圧延した材料を７０
０℃以上、１０００℃以下の温度範囲で連続炉にて焼鈍
を行なうことによって得られる。７００℃より低温では
長時間加工しても材料の硬度は）（ｖ１４０以下には軟
化しない。また、１０００℃以上では、瞬時に結晶粒の
粗大化が生じて好ましくない。生産効率の点から焼鈍時
間を５分に設定した場合、８００℃〜９００℃がより好
ましい。焼鈍方法にはタイトコイルのままバッチ炉に装
入する方法と、コイルを巻き直しながら連続炉で加熱す
る方法があるがバッチ炉では温度ムラによる硬度バラツ
キが生じ易いため、連続炉処理が好ましい。These characteristics are achieved when the material is cold-rolled to a product plate thickness of 70%.
It is obtained by annealing in a continuous furnace at a temperature range of 0°C or higher and 1000°C or lower. At a temperature lower than 700°C, the hardness of the material will not soften even if processed for a long time (v140 or less).At a temperature higher than 1000°C, crystal grains will instantly coarsen, which is undesirable. From the point of view of production efficiency, annealing is When the time is set to 5 minutes, a temperature of 800°C to 900°C is more preferable.Annealing methods include charging the tight coil as it is into a batch furnace, and heating the coil in a continuous furnace while rewinding the coil. Continuous furnace treatment is preferable since hardness variations are likely to occur due to temperature unevenness in a furnace.
また、シャドウマスク材のＣ，Ｓｉ、Ｍｎ、Ｐ、Ｓ、Ｏ
は、エツチング性に有害な元素であり、エツチング速度
が低下し、開孔部面積が小さくなる原因となるため、そ
れぞれＣ≦０．０５％、Ｓ１≦０．０５％、Ｍｎ５０６
４０％、Ｐ≦０．００５％、Ｓ≦０．００５％、Ｏ≦０
．０１０％が好ましい。In addition, shadow mask materials C, Si, Mn, P, S, O
are elements that are harmful to etching properties and cause the etching rate to decrease and the opening area to become smaller.
40%, P≦0.005%, S≦0.005%, O≦0
．． 0.010% is preferred.
また、Ｎｉは、３６％で熱膨張係数が極小となり、これ
より低Ｎｉ側、高Ｎｉ側ともに熱膨張が大きくなるため
、Ｎｉは３５．５〜３６．５％が好ましい。Further, the coefficient of thermal expansion of Ni becomes minimum at 36%, and the thermal expansion increases from this on both the low Ni side and the high Ni side, so Ni is preferably 35.5 to 36.5%.
以下、本発明の実施例について詳しく説明する、第１表
に示す組成、結晶粒度、硬さ（Ｈｖ）を有する板厚０
、２５ｍｍ幅６００ｍｍのアンバー合金よりなるシャド
ウマスク材に対して、エツチング性およびプレス成形性
を評価した。Hereinafter, examples of the present invention will be described in detail.
The etching property and press formability of a shadow mask material made of an amber alloy with a width of 25 mm and a width of 600 mm were evaluated.
結晶粒度と硬さの調整は、製品板厚に冷間圧延した材料
を焼鈍する条件を変化させることにより行なった。この
うち、本発明の実施例Ｎｏ、１〜ＮＯ３４は冷間圧延し
たコイルを巻き直しながら連続炉で７５０℃〜９５０℃
で焼鈍したものであり、焼鈍温度と保持時間を変化させ
ることにより、結晶粒度番号と硬さの異なるシャドウマ
スク材が得られる。Grain size and hardness were adjusted by changing the conditions for annealing the cold-rolled material to the product thickness. Among them, Examples No. 1 to No. 34 of the present invention are heated at 750°C to 950°C in a continuous furnace while rewinding the cold-rolled coil.
By changing the annealing temperature and holding time, shadow mask materials with different grain size numbers and hardness can be obtained.
第１表に示すシャドウマスク材のコイルを、ＦｅＣ１，
溶液でエツチング加工してから切断し、０．７ｍ！１１
ピッチのスロット孔を有する２９インチテレビ用のフラ
ットマスクを得た。このフラットマスクを高滓製作所製
ビッカース硬度計を用い、幅方向５点、長手方向４点の
計２０点を荷重０．５ｋＪで測定し、その最高値（Ｈｖ
ＷＡＸ）と最高値と最小値の差である硬さのバラツキ
（Ｈｖ Ｒ）によって評価した。また、エツチング性の
うちエツチング速度は得られたシャドウマスクのエツチ
ング部を写真撮影し画像解析によって求めたシャドウマ
スク２５ｍｍ角分に占める開孔部の面積の割合である。Coils of shadow mask materials shown in Table 1 were made of FeC1,
Etched with solution and then cut to 0.7m! 11
A flat mask for a 29-inch television having pitched slot holes was obtained. This flat mask was measured at 20 points in total, 5 points in the width direction and 4 points in the longitudinal direction, using a Vickers hardness tester manufactured by Takafusa Seisakusho, and the highest value (Hv
WAX) and the variation in hardness (HvR), which is the difference between the highest value and the lowest value. Of the etching properties, the etching speed is the ratio of the area of the opening to a 25 mm square portion of the shadow mask, which was determined by photographing the etched portion of the obtained shadow mask and analyzing the image.
開孔率とエツチング面の精度としてエツチング面のギラ
ツキの発生の有無を目視によって評価した。The presence or absence of glare on the etched surface was visually evaluated as the porosity and accuracy of the etched surface.
次にフラットマスクを軟化焼鈍しないで２００℃に加熱
した金型でシャドウマスクに成形した。Next, the flat mask was molded into a shadow mask using a mold heated to 200°C without softening annealing.
プレス成形は、プレス後にスロット孔に破断あるいは割
れ目が発生したものを不良とした。Press molding was judged to be defective if the slot hole was broken or cracked after pressing.
第１表にその結果を示す。Table 1 shows the results.
本発明のシャドウマスク材は、開孔率が大きく、エツチ
ング速度が速いことを示している。エツチング速度が速
いことは、それだけエツチング工程が短縮でき、開孔部
面積のバラツキが少なくなることを示す。また、本発明
のシャドウマスク材はギラツキもなく、精度の高いエツ
チング面が得られたことがわかる。The shadow mask material of the present invention has a large porosity and a high etching rate. A higher etching speed means that the etching process can be shortened and the variation in the area of the openings can be reduced. Further, it can be seen that the shadow mask material of the present invention had no glare and a highly accurate etched surface was obtained.
一方比較例から硬さの最高値（Ｈｖ ＷＡＸ）あるいは
バラツキ（Ｈｖ Ｒ）が本発明例より大きいことにより
プレス性が劣化すること、粒度番号が本発明例より小さ
いことにより、ギラツキが発生し、エツチング性が劣化
することがわかる。On the other hand, the comparative example shows that pressability deteriorates due to the maximum hardness (Hv WAX) or variation (Hv R) being larger than the inventive example, and glare occurs due to the particle size number being smaller than the inventive example. It can be seen that the etching properties deteriorate.
また、Ｐ、Ｓの値が他の本発明例よりもやや高い試料Ｎ
ｏ、４は開孔率が他の本発明例よりも小さく、Ｐ、 Ｓ
はそれぞれ０．００５％以下が好ましいことがわかる。In addition, sample N has slightly higher values of P and S than other examples of the present invention.
o, 4 has a smaller porosity than other examples of the present invention, P, S
It can be seen that 0.005% or less is preferable for each.
本発明によれば、従来生産性および品質面でトラブルの
多かったプレス成形前の軟化焼鈍を省略でき、しかも超
高精細のシャドウマスクに応じたエツチング性とプレス
性を兼ね備えたシャドウマスク材を提供することができ
る。According to the present invention, it is possible to omit softening annealing before press forming, which conventionally caused many troubles in terms of productivity and quality, and to provide a shadow mask material that has both etching and pressability suitable for ultra-high-definition shadow masks. can do.
出願人 日立金属株式会社 ４〕＼ ＼、−・／ 手続 補正書（自発） 平成 年２．１１．ｍ６ 日 事件の表示 平成２年 発明の名 補正をする 事件との関係 住 所 名 称 補正の対 特許願 第１８８３４４号 称 シャドウマスク材 者Applicant: Hitachi Metals, Ltd. 4〕＼ \、-・／ procedure Written amendment (voluntary) Heisei 2.11. m6 day Display of incidents 1990 name of invention make corrections Relationship with the incident address Name correction pair Patent Application No. 188344 Name: Shadow mask material person
Claims (1)
７より細粒であり、ビッカース硬さ１４０以下、フラッ
トマスク状態におけるシャドウマスク構成面積内のビッ
カース硬さの最大値と最小値の差が１０以下のアンバー
合金からなることを特徴とするシヤドウマスク材。 ２、重量％でＣ≦０．０５％、Ｓｉ≦０．０５％、Ｍｎ
≦０．４０％、Ｐ≦０．００５％、Ｓ≦０．００５％、
０≦０．０１０％、Ｎｉ３５．５〜３６．５％、残部実
質的にＦｅのアンバー合金からなることを特徴とする特
許請求の範囲第１項に記載のシャドウマスク材。[Claims] 1. Crystal grains are finer than austenite grain size number 7 according to JIS, Vickers hardness is 140 or less, and the maximum and minimum values of Vickers hardness within the shadow mask constituent area in a flat mask state. A shadow mask material comprising an amber alloy with a difference of 10 or less. 2. C≦0.05%, Si≦0.05%, Mn in weight%
≦0.40%, P≦0.005%, S≦0.005%,
The shadow mask material according to claim 1, characterized in that the shadow mask material consists of an amber alloy of 0≦0.010%, 35.5 to 36.5% Ni, and the remainder substantially Fe.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2188344A JP2988973B2 (en) | 1990-07-17 | 1990-07-17 | Shadow mask material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2188344A JP2988973B2 (en) | 1990-07-17 | 1990-07-17 | Shadow mask material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0474849A true JPH0474849A (en) | 1992-03-10 |
| JP2988973B2 JP2988973B2 (en) | 1999-12-13 |
Family
ID=16221977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2188344A Expired - Fee Related JP2988973B2 (en) | 1990-07-17 | 1990-07-17 | Shadow mask material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2988973B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1008028A4 (en) * | 1994-01-17 | 1995-12-12 | Philips Electronics Nv | Method for manufacturing of a shadow mask nickel iron type. |
| JPH0935993A (en) * | 1995-12-15 | 1997-02-07 | Matsushita Electric Ind Co Ltd | Layered capacitor and manufacture thereof |
-
1990
- 1990-07-17 JP JP2188344A patent/JP2988973B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE1008028A4 (en) * | 1994-01-17 | 1995-12-12 | Philips Electronics Nv | Method for manufacturing of a shadow mask nickel iron type. |
| US5716252A (en) * | 1994-01-17 | 1998-02-10 | U.S. Philips Corporation | Method of manufacturing a shadow mask of the nickel-iron type |
| US5811918A (en) * | 1994-01-17 | 1998-09-22 | U.S. Philips Corporation | Shadow mask of the nickel-iron type having specific composition |
| JPH0935993A (en) * | 1995-12-15 | 1997-02-07 | Matsushita Electric Ind Co Ltd | Layered capacitor and manufacture thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2988973B2 (en) | 1999-12-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6133886B2 (en) | ||
| US6824625B2 (en) | Magnetostriction control alloy sheet, a part of a braun tube, and a manufacturing method for a magnetostriction control alloy sheet | |
| EP0627494B1 (en) | Alloy sheet for shadow mask and method for manufacturing thereof | |
| JPH0474849A (en) | Shadow mask material | |
| JP2871414B2 (en) | Alloy thin plate for shadow mask excellent in press formability and method for producing the same | |
| JPS60128253A (en) | Manufacture of iron-nickel alloy for shadow mask which inhibits streaking during etching | |
| JPH03267320A (en) | Production of shadow mask material | |
| JP3379368B2 (en) | Method for producing low thermal expansion alloy sheet excellent in sheet shape and heat shrink resistance | |
| JP3557395B2 (en) | Method for producing Fe-Ni alloy material for press-molded flat mask | |
| US6489711B2 (en) | Shadow mask for color picture tube made of iron-base material having particular grain size number | |
| US6508893B2 (en) | Method of manufacturing Fe-Ni alloy | |
| JPH06184701A (en) | Fe-ni alloy sheet for shadow mask | |
| JP3379301B2 (en) | Method for producing low thermal expansion alloy thin plate for shadow mask excellent in plate shape and heat shrink resistance | |
| JP2933913B1 (en) | Fe-Ni-based shadow mask material and method of manufacturing the same | |
| JP3398418B2 (en) | Cold-rolled steel sheet for shadow masks with excellent press formability | |
| JP3401307B2 (en) | Material for shadow mask excellent in recrystallization characteristics and manufacturing method | |
| JP2004331997A (en) | HIGH-STRENGTH Fe-Ni-Co ALLOY FOR SHADOW MASK | |
| JP3288656B2 (en) | Fe-Ni shadow mask material | |
| JP2001098347A (en) | Fe-Ni MATERIAL FOR SHADOW MASK | |
| JPH0687398B2 (en) | Method for manufacturing shed mask | |
| JP3316909B2 (en) | Fe-Ni-based and Fe-Ni-Co-based alloy sheets for shadow masks with excellent blackening properties | |
| WO2000070108A1 (en) | Material for shadow mask, shadow mask and color image receiving tube having the shadow mask incorporated therein | |
| JPS6249324B2 (en) | ||
| JPH0657384A (en) | Fe-ni alloy thin sheet and fe-ni-co alloy thin sheet for shadow mask excellent in press-formability and production thereof | |
| JPS62149819A (en) | Production of 'invar(r)' alloy strip |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071008 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20081008 Year of fee payment: 9 |
|
| LAPS | Cancellation because of no payment of annual fees |