JPH0462550A - Temperature controller for photosensitive material processor - Google Patents

Abstract

PURPOSE:To shorten the warm up time without increasing the power consumption by supplying total electric power to a heater for heating a processing solution when heated, and controlling so as to decrease the power supply when it reaches the specified temp. CONSTITUTION:A developer in a developing bath 14 is heated with a major heater 19A and a subheater 19B as the temp. rises, the developer in circulated in the developing bath 14 through a pipe line 71. When the developer becomes at the most suitable temp., the subheater 19B is turned off and simultaneously a heater for heating drying air 23 is turned on. In this case, the whole electric power for the warming up is supplied to the major heaters 19A and 19B, and the developer is heated. Depending upon whether the temp. of the developer is more than a proper temp. or not, the temp. of the developer is heed by controlling on or off for the major heater 19A.

Description

[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to a temperature control device for a photosensitive material processing apparatus, and in particular to a temperature control device for a photosensitive material processing apparatus, and in particular to a temperature control device for controlling a temperature of a processing solution and a drying chamber (hereinafter referred to as warm-up time). ) The present invention relates to a temperature control device for a processing liquid and a drying room of a photosensitive material processing apparatus, which can shorten the time required.

[Conventional technology]

A photosensitive material processing device such as an automatic processor that processes and dries photosensitive materials is equipped with a processing tank that stores a processing solution for processing the photosensitive material and a drying chamber that dries the processed photosensitive material. ). As a temperature control device for the processing liquid and the drying chamber, a processing liquid heater that heats the processing liquid and a drying air heater that heats the drying chamber are equipped. There are also some that increase the temperature inside the drying room. In this temperature control device, in order to ensure dryness, the capacity of the drying air heater is larger than the capacity of the processing liquid heater. When warm-up is performed using this temperature control device, the temperatures of the processing liquid and the drying chamber change as shown in FIG. In addition,
The graph indicated by the solid line A in FIG. 5 shows the relationship between the temperature of the drying chamber and the heating time in the conventional apparatus, and the solid line B shows the temperature of the processing liquid and the heating time. [Problem to be solved]] In the conventional apparatus described above, the drying air heater has a sufficient capacity, so the warm-up time of the drying chamber is short. However, due to the power consumption, the capacity of the heater for heating the processing liquid is large and important), so the warm-up time for the processing liquid becomes long, and the warm-up time for the second processing liquid becomes approximately equal to the total warm-up time. It's stored away. Therefore, not only does the warm-up time for the processing liquid become longer, but also the need for heating to maintain the temperature of the drying chamber at a predetermined temperature after the temperature of the drying chamber reaches the predetermined temperature T2 increases. Heat loss increases. In order to solve this problem, it is possible to shorten the warm-up time of the processing liquid by increasing the power consumption of the processing liquid heater, but there is a limit to the amount of power consumption that can be used and the cost increases. There are problems such as.

The present invention has been made in consideration of the above facts, and an object of the present invention is to provide a temperature control device for a processing liquid and a drying room of an automatic developing machine, which can shorten the warm amplifier time without increasing power consumption.

[Means to solve the problem]

In order to achieve the above problem, a temperature control device for a photosensitive material processing apparatus according to the invention of claim (1) includes a processing tank in which a processing solution for processing the photosensitive material is stored, and a processing tank that dries the processed photosensitive material in the processing tank. In a temperature control device of a photosensitive material processing apparatus that adjusts the temperature of a processing liquid and a drying chamber of a photosensitive material processing apparatus equipped with a drying chamber, a processing liquid heating heater that heats the processing liquid;
Supplying all the power for warm-up to the drying air heater for heating the drying chamber and the processing liquid heating heater, and supplying it to the processing liquid heating heater when the temperature of the processing liquid reaches a predetermined temperature. Control means is provided for controlling the temperature of the processing liquid using the electric power necessary to maintain the temperature of the processing liquid at the predetermined temperature by reducing the electric power, and supplying the remaining electric power to the dry air heater. It is characterized by

In order to achieve the above object, the temperature control device liquid of the photosensitive material processing apparatus according to the invention of claim (2) and the temperature control device of the drying room are connected to a processing tank in which a processing liquid for processing the photosensitive material is stored. In a temperature control device for a photosensitive material processing device that controls the temperature of a processing solution and a drying chamber of a photosensitive material processing device that is equipped with a drying chamber for drying a photosensitive material processed in a bath, a first temperature control device for heating the processing solution is used. a processing liquid heating means comprising a heater and a second heater; a dry air heating heater for heating the drying chamber; the first heater and the second heater are turned on to bring the processing liquid to a predetermined temperature; a control means that turns off one of the first heater and the second heater, controls the temperature of the processing liquid with the other heater, and turns on the dry air heating heater when the liquid is heated to
It is characterized by having the following.

In order to achieve the above object, a temperature control device for a photosensitive material processing apparatus according to the invention of claim (3) provides a processing tank in which a processing solution for processing the photosensitive material is stored, and a processing tank for processing the photosensitive material processed in the processing tank. In a temperature control device for a photosensitive material processing device that adjusts the temperature of a processing solution and a drying chamber of a photosensitive material processing device equipped with a drying chamber for drying, a first heater and a second heater for heating the processing solution are provided. a drying air heater for heating the drying chamber;
When the processing liquid is heated to a predetermined temperature, one of the first heater and the second heater is turned off, and the dry air heating heater is turned on, and the temperature of the processing liquid is higher than the first predetermined temperature. The present invention is characterized by the provision of a control means for maintaining the temperature of the processing liquid by on/off control when the processing liquid is heated to a predetermined temperature.

[Effect]

In the invention of claim (1), since the entire power consumption is supplied to the processing liquid heater when the temperature of the processing liquid is raised to a predetermined temperature, the warm-amp time for the processing liquid can be shortened compared to the conventional method. That is, the warm-up time of the processing liquid can be shortened, which is approximately equal to the total warm-up time. After warming up the processing liquid, power for maintaining the temperature of the processing liquid is supplied to the processing liquid heater, and the remaining power is supplied to the dry air heater. Since the power of the processing liquid heater is smaller than that of the dry air heater, the power consumption for maintaining the temperature of the processing liquid can be reduced. Furthermore, since the remaining power is supplied to the drying air heater, the warm-up time of the drying chamber can be shortened compared to the conventional method. Therefore, the warm-up time can be shortened as a whole, and the power consumption for temperature maintenance can be reduced.

Further, in the invention according to claim (2), when the processing liquid is heated to a predetermined temperature by the first heater and the second heater,
One of the heaters is turned off and the dry air heater is turned on. Therefore, as with the invention of claim (1), the warm-up time for the processing liquid can be shortened, and the total warm-up time can be shortened.

Further, in the invention of claim (3), the dry air heating heater is turned on when the processing liquid is heated by the first heater and the second heater to the first temperature before being warmed up. Therefore, the total VM amplification time can be further reduced.

〔Example〕

This embodiment will be described in detail below with reference to the drawings. First, an automatic developing device 10 to which the present invention is applied will be described.

As shown in FIG. 1, the automatic developing device 10 is provided with a processing section 11 and a drying chamber 20 within a machine frame 12. As shown in FIG. The processing section 11 has partition walls 13 along the transport direction of the film F.
The developing tank 14 has a developing tank 14, a fixing tank 16, and a washing tank 18, which are divided by .

An insertion rack 17 for drawing the film F into the automatic developing device 10 is disposed at a position close to the film F insertion opening 15 of the automatic developing device 10 .

In the developer tank 14, a developer is stored, and a conveyor rack 24 having a conveyor roller 22 that is driven by a motor (not shown) and conveys the film F is disposed immersed in the developer. . A liquid temperature detection sensor 51 is installed in the developer tank 14 to detect the temperature of the developer. Further, in the developing tank 14, as shown in FIG.
B is placed in a state of being immersed in a developer.

The capacity of the main heater 19A is smaller than the capacity of the sub-heater, and is set to a size that can maintain the temperature of the developer after it has been warmed up. For example, the capacity of the main heater 19A can be made equal to the capacity of a conventional developer heater, and the capacity of the sub-heater 19B can be made equal to the capacity of a conventional dry air heater. Main heater 19A1 Sub-heater 19
B is controlled on and off by a control means. Also,
As shown in FIG. 2, both ends of a pipe line 71 for circulating the developer are connected to the developer tank 14.
A circulation pump 72 is provided in the middle part of 1.

Therefore, by operating the circulation pump 72, the developer is circulated through the pipe line 71, and the temperature of the developer in the developer tank 14 is made uniform.

A fixing liquid is stored in the fixing tank 16, and a transport rack 28 having a transport roller 26 that is driven by a motor (not shown) and transports the film F is immersed in the fixing liquid (processing liquid). It is arranged. Although not shown, a liquid temperature detection sensor 51 is also installed in the fixing tank 16 to detect the temperature of the fixing liquid. Also, the control means 21
A main heater and a sub-heater, which are controlled on and off by the heater, are disposed immersed in the fixing liquid. As shown in FIG. 2, both ends of a conduit 75 for circulating the fixing liquid are connected to the fixing tank 16, and a circulation pump 76 is provided in the middle of the conduit 75. Therefore, by operating the circulation pump 76, the fixing liquid is circulated to the fixing tank 16 through the pipe line 75, and the temperature of the fixing liquid in the fixing tank 16 is made uniform.

Further, in the washing tank 18 shown in FIG. 1, washing water is stored, and a transport rack 32 having transport rollers 30 that is driven by a motor (not shown) and transports the film F is immersed in the washing water. It is arranged in.

Between the developing tank 14 and the fixing tank 16 and between the fixing tank 16 and the washing tank 1
Between 8 and 8 there is a crossover rack 34 on top of them.
is installed. This crossover rack 34 is
It is provided with a nipping conveyance roller 36 for conveying the film F from an upstream tank to a downstream tank in the conveyance direction of the film F, and a guide 38 for guiding the film F.

The film F developed in the developing tank 14 is sent to the fixing tank 16 by the crossover rack 34, and then transferred to the fixing tank 16 by the transport roller 26.
The image is transported through a fixing solution and subjected to fixing processing. The fixed film F is sent to the rinsing tank 18 by the crossover rack 34, and is conveyed through rinsing water by the conveying roller 30 and washed. In this way, the film F is processed with a processing liquid such as a developer.

Furthermore, a squeeze rack 40 is arranged between the washing tank 18 and the drying chamber 20. This squeeze rack 40 is
Film F sent out from the washing tank 18 and attached with washing water
A conveyance roller 4 conveys the material to the drying chamber 20 while squeezing it.
2 and a guide 43 for guiding the film F.

The drying chamber 20 includes a conveying roller 44 for conveying the film F, a temperature sensor 50 for detecting the temperature inside the drying chamber, a drying fan 45 for supplying drying air, and a drying air heating heater 23 (heating the drying air). Chamber 4 with built-in (Figure 3)
6 and heated drying air to the film F and the conveying roller 4.
4 and a spray pipe 47 that ejects water. The dry air heater 23 is controlled on and off by the control means 21 based on information from the temperature sensor 50 and the like. Further, the film F is conveyed obliquely upward at a drying turn portion 48 downstream of the conveyance roller 44 on the conveyance path.

In the automatic developing device 10, a receiving box 49 for storing the film F sent out from the drying turn section 48 is installed in the automatic developing device 1.
It is provided so as to protrude from the outer wall of 0.

The worm ampoule-chin according to the first embodiment of the present invention will be explained below using the flowcharts shown in FIGS. 4(A) and 4(B). Note that the warm amplifier of the processing liquid will be explained using the case of a developer as an example, but the same applies to other processing liquids such as a fixer. When the power switch is turned on, the routine of FIG. 4(A) is started, and in step 100, the control means 2
1 turns on the main heater 19A and the sub-heater 19B, and at the same time turns on the circulation pump 72. The developer in the developer tank 14 is heated by the main heater 19A and the sub-heater 19B, and as shown by the two-dot chain line in FIG. 14. Step 10
If it is determined in step 2 that the developing solution has reached the optimum temperature at which it can be processed (temperature T in FIG. 5), step 104
At this time, the sub-heater 19B is turned off and the dry air heater 23 is turned on. In this case, before the dry air heater 23 is turned on, the main heater 19A and the sub-heater 19B, that is, all the power for warm-up is supplied to the main heaters 19A and 19B to heat the developer. Warm-up time is reduced.

Further, the temperature of the drying air supplied into the drying chamber 20 is increased in proportion to the heating time, as shown by the two-dot chain line C in FIG.

Further, in step 106, the temperature of the developer in the developer tank 14 is maintained by the main heater 19A.

That is, as shown in FIG. 4(B), it is determined in step 108 whether the temperature of the developer is above T1, and if it is determined to be above T1, the main heater 19A is switched off in step 110. . On the other hand, if it is determined that the temperature is lower than T1, the main heater 19A is turned on in step 112. In this way, the main heater 1
By controlling 9A on/off, the temperature of the developer can be adjusted to T.
It is held at 1.

In the next step 116, it is determined whether the temperature inside the drying chamber 20 is 12 or more based on the information from the temperature sensor 50, and if it is determined that the temperature is 12 or more, step 1
At 18, the drying chamber heater 23 is turned off. Drying room 2
If the temperature at 0 is lower than T2, the dry air heater 23 is turned on in step 120. When the drying chamber 20 is warmed up, since the temperature of the drying chamber 20 is less than 12, the drying air heater 23 is kept on and warmed up. After the warm-up is completed, the drying air heater is controlled on and off in steps 116 to 120, and the temperature of the drying chamber is maintained at T2. Step 122 by turning off the power switch, etc.
In this step, if it is determined that the processing has ended and the temperature of the developing solution and drying chamber 20 is not to be adjusted, this routine is ended and the temperature adjustment is ended.

Next, a second embodiment of the present invention will be described with reference to the flowchart of FIG.

Note that in the flowchart of FIG. 6, each step assigned the same reference numeral as in FIG. The temperature of the developing solution heated by the main heater 19A and the sub-heater 19B increases in proportion to the heating time, as shown by the double-dashed line E in FIG. The temperature of the developer is at step 124.
In T. (FIG. 7) If it is determined that the above is the case, the sub-heater 19B is turned off in step 125, and at the same time the dry air heater 23 is turned on. This temperature T. is lower than the temperature T1 after the warm-up of the developer, and the developer is heated to the temperature T using only the main heater 19A. The warm-up time of the drying chamber 20 is set to be equal or substantially equal to the time (t2 t+) required to raise the temperature from the temperature T1 to the temperature T1. Also in this second embodiment,
As in the first embodiment, before the dry air heater 23 is turned on, the main heater 19A and the sub-heater 19B are turned on.
However, in this embodiment, the dry air heater 2 is heated before the warm-up of the developer is completed.
3 is turned on, the warm-up time can be shorter than in the first embodiment.

Next, a third embodiment of the present invention will be explained.

In this embodiment, a processing liquid heater 25 that heats the developer is used.
This embodiment differs from the first and second embodiments in that only one is provided in the developing tank 14, and the electric power supplied to the processing liquid heater is controlled.

The operation of this embodiment will be explained below with reference to the flowcharts of FIGS. 9A and 9B. Note that in the flowcharts in FIGS. 9A and 9B, each step with the same reference numerals as in FIGS. Omitted.

In step 126 of FIG. 9(A), the processing liquid heating heater 25 is turned on, and the electric power W1 is applied to the processing liquid heating heater 25.
is supplied to heat the developer.

This power W1 is the total amount of power for warm-up. If it is determined in step 102 that the temperature of the developer is 12 or higher, the power of the processing solution heater is reduced to W2, which is smaller than W2.
(step 128).

This power W2 is a power necessary to maintain the temperature of the developer at T1. Further, in step 106, the temperature of the developer is controlled. In this step 106, the following processing is performed. That is, in step 108 of FIG. 9(B), when it is determined that the temperatures of the developer and the drying chamber 20 are equal to or higher than T1, the processing liquid heater 25 is turned off. If it is determined that the temperature of the developer is lower than T1, electric power w2 is supplied to the processing liquid heater 25.

When the temperature of the drying chamber 20 is less than 12, power of (W, ~W2) is supplied to the processing liquid heater 25 (step 1).
30) If the temperature is T2 or higher, the processing liquid heater 25 is turned off, and the temperature of the drying chamber 20 is controlled in the same manner as in the above embodiment.

In the third embodiment, as well as in the first and second embodiments, before the dry air heater 23 is turned on, processing corresponding to the main heater 19A and the sub-heater 19B in the first and second embodiments is performed. Since the developer is heated by the solution heater 25, the warm-up time is shortened. In addition, in this embodiment, only one heater is provided to heat the developer, and the heating of the developer is controlled by changing the power consumption supplied to this heater, so the structure of the heater for heating the developer can be simplified. The effect is that it can be done.

In the second embodiment, the temperature of the developer is T. After becoming
The drying room heater is turned on, but the temperature of the developer is T. It may be turned on when the range is from to less than T1.

Furthermore, in the third embodiment, the dry air heater is turned on after the temperature of the developer reaches T1;
, it may be turned on before reaching .

Further, in the above embodiment, the processing liquid heater 23 is connected to the developing tank 1.
4, but outside the developer tank 14.
1 may be provided.

Further, the embodiments described above are not limited to the developer tank 14, but can also be applied to processing tanks such as the fixing tank 16.

〔Effect of the invention〕

As described above, according to the inventions of claims (1) to (3), the drying chamber heater is turned on after the temperature of the processing liquid is raised, so that the processing liquid reaches the optimum temperature at which it can be processed. The warm amplifier time required to heat the drying chamber to the optimum temperature for processing is shortened, and a small-capacity heater is used to maintain the temperature of the processing liquid during warm-up of the drying chamber, reducing power consumption. .

[Brief explanation of drawings]

Fig. 1 is a sectional view showing the main parts of an automatic developing machine to which the invention is applied, Fig. 2 is a systematic diagram of the circulation system of the developer and fixer;
FIG. 3 is a block diagram of the processing solution and drying chamber temperature control device of an automatic processor according to the first and second embodiments of the present invention, and FIG. 4 (A> and FIG. 4B) are A flowchart illustrating the operation of the processing liquid and the temperature control device of the drying chamber of the automatic processor according to the first embodiment of the invention, and FIGS. 5 and 7 show the relationship between the temperature and heating time of the processing liquid and the drying chamber. A graph shown in comparison with the conventional one, Fig. 6 is the second invention of the invention.
A flowchart illustrating the operation of the processing liquid of the automatic developing machine and the temperature control device of the drying chamber according to the embodiment, and FIG. FIGS. 9(A) and 9(B) are flowcharts illustrating the operation of the processing liquid and drying chamber temperature control devices of the automatic processor according to the third embodiment of the present invention. 1Q... 14... 16... 19A... 19B... 20... 21... 23... 25... Automatic developing device, developer tank, fixing tank, - Main heater, - Sub- Heater, drying room, control means, drying air heater, processing liquid heater.

Claims (3)

[Claims] (1) Photosensitive material processing equipment that is equipped with a processing tank that stores processing liquid for processing photosensitive materials and a drying chamber that dries the photosensitive material processed in the processing tank, and that controls the temperature of the processing liquid and drying chamber. In the temperature control device of the material processing equipment, full electric power for warming up is supplied to a processing liquid heater that heats the processing liquid, a dry air heater that heats the drying chamber, and the processing liquid heater. When the temperature of the liquid reaches a predetermined temperature, the temperature of the processing liquid is controlled by reducing the electric power supplied to the processing liquid heater to maintain the temperature of the processing liquid at the predetermined temperature. A temperature control device for a photosensitive material processing apparatus, comprising: control means for supplying remaining power to the dry air heater. (2) A photosensitive material processing device that is equipped with a processing tank that stores a processing solution for processing photosensitive materials and a drying chamber that dries the photosensitive material processed in the processing tank, and that controls the temperature of the processing solution and drying chamber. In the temperature control device of the material processing apparatus, a processing liquid heating means including a first heater and a second heater for heating the processing liquid, a dry air heating heater for heating the drying chamber, and the When the first heater and the second heater are turned on and the processing liquid is heated to a predetermined temperature, one of the first heater and the second heater is turned off and processing is performed using the other heater. A control means for controlling the temperature of the liquid and turning on a dry air heater;
1. A temperature control device for a photosensitive material processing device, characterized in that it is provided with: (3) Photosensitive material processing equipment that controls the temperature of the processing solution and drying chamber, which is equipped with a processing tank that stores a processing solution for processing photosensitive materials and a drying chamber that dries the photosensitive material processed in the processing tank. In the temperature control device of the material processing apparatus, a processing liquid heating means comprising a first heater and a second heater for heating the processing liquid, a dry air heating heater for heating the drying chamber, and a processing liquid heating means for heating the processing liquid. When the liquid is heated to the first predetermined temperature, either the first heater or the second heater is turned off and the dry air heater is turned on, so that the temperature of the processing liquid is lower than the first predetermined temperature. 1. A temperature control device for a photosensitive material processing apparatus, comprising: a control means for maintaining the temperature of a processing liquid by on/off control when heated to a high second predetermined temperature.