JPH046154U - - Google Patents

Info

Publication number

JPH046154U

JPH046154U JP4638990U JP4638990U JPH046154U JP H046154 U JPH046154 U JP H046154U JP 4638990 U JP4638990 U JP 4638990U JP 4638990 U JP4638990 U JP 4638990U JP H046154 U JPH046154 U JP H046154U

Authority

JP

Japan

Prior art keywords

ion

ion implantation

semiconductor wafer

scanning

measuring

Prior art date

1990-04-27

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Pending

Links

• Espacenet
• Global Dossier
• Discuss

• 238000005468 ion implantation Methods 0.000 claims description 7
• 239000004065 semiconductor Substances 0.000 claims description 5
• 238000010884 ion-beam technique Methods 0.000 claims description 3
• 239000012535 impurity Substances 0.000 claims 1
• 230000001678 irradiating effect Effects 0.000 claims 1
• 239000000463 material Substances 0.000 claims 1